JPH0321198B2 - - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a pin tuck device for a pin tuck sewing machine, and more particularly to a pin tuck device for a pin tuck sewing machine that can partially change the width of the pin tuck.

(Prior Art and its Problems) Generally, this type of pin tuck device forms pleated pin tucks by passing the sewing fabric through the gap formed by a pair of upper and lower bases. A plurality of cloth guide plates are fixed to each of the upper and lower bases. An upper cloth guide plate is provided on the lower surface of the upper base so as to have a comb-shaped cross section in the front-rear direction, and a lower cloth guide plate is fixed on the upper surface of the lower base so as to enter between the upper cloth guide plates. has been done. For this reason, the sewing fabric is fed through the interval formed by the upper and lower fabric guide plates while forming pleats.

The above upper and lower cloth guide plates expand radially in the front,
It is formed so that the sewing fabric gradually gathers in the center. This is a structure adopted to reduce the resistance to feeding the sewing fabric.

When the upper and lower cloth guide plates were fixed, only pin-tucks of a certain size could be achieved. but,
The width of the pin tuck can now be changed by forming the lower guide plate into the lower base and making it replaceable. In this case, the maximum pleat width was determined by the height of the upper fabric guide plate, and within this range, various pleat widths could be formed by replacing the lower fabric guide plate of the lower base.

However, even if the height of the upper fabric guide plate is within the maximum pleat width, if the heights of the adjacent lower fabric guide plates are extremely different, a large amount of sewing fabric that fits the large peak of the pintack will be applied to the lower fabric. This caused a problem in that the worker had to keep pulling the sewing fabric in the horizontal direction while the sewing fabric was being fed.

Furthermore, since the width of the pin tuck is determined by the width of the upper fabric guide plate, it is not possible to simultaneously form pin tucks with a width larger than the maximum pleat width of the upper fabric guide plate and an extremely small pin tuck. Nakatsuta.

Furthermore, due to the necessity of designing clothing, there is a strong demand for molding items with extremely different pintack widths adjacent to each other at the same time.

SUMMARY OF THE INVENTION In view of the above circumstances, it is an object of the present invention to provide a pintuck device that can simultaneously form pleats with extremely different pintuck widths.

(Means for Solving the Problems) In order to solve the above problems, the present invention includes the following configuration.

That is, fabric guide plates are provided on each opposing surface of a pair of bases arranged parallel to each other so that the cross section forms a comb shape, and the cloth guide plates of one base are positioned between the cloth guide plates of the other base, In the pin-tuck device of a pin-tuck sewing machine that forms pin-tucks on the sewing material by passing the sewing material between the cloth guide plates, one base is aligned with the edge of the cloth guide plate of the other base, and the edge of the cloth guide plate of the other base is An insertion base that allows the height of the cloth guide plates to be different is provided on one base in a removable manner, and the cloth guide plates on the other base that correspond to the cloth guide plates on the insertion base are set at different heights of the cloth guide plates on the insertion base. 1. A pin-tuck device for a pin-tuck sewing machine, characterized in that the pin-tuck device is detachably attached to the other base so that it can be replaced with a cloth guide plate having a height corresponding to the height of the pin-tuck sewing machine.

(Embodiments) Hereinafter, preferred embodiments of the present invention will be described in detail based on the accompanying drawings.

FIG. 1 is an explanatory diagram of a state in which sewing material is inserted into the pin tuck device.

10 is an upper base, and 12 is a lower base. The upper base plate 10 and the lower base plate 12 are located opposite to each other.

FIG. 2 is a plan view of the pin tuck device, and FIG. 3 is a plan view of the upper base plate.

FIG. 4 is a plan view of the lower base, FIG. 5 is a central sectional view of the lower base, and FIG. 6 is a side view of the lower fabric guide plate. Moreover, FIG. 9 shows a side view of the upper cloth guide plate.

A plurality of lower cloth guide plates 16 are provided on the lower base 12. This group of lower cloth guide plates 16 has rear end straight portions 16b formed at equal intervals, followed by guide portions 16a that extend radially forward. Therefore, the shapes of the lower cloth guide plates 16 differ depending on the position where the lower base plate 12 is disposed.

Here, an example of the shape of the lower cloth guide plate 16 for mounting the lower cloth guide plate 16 on the lower base plate 12 is shown. A front leg 17a and a rear leg 17b extend from the lower end of the lower cloth guide plate 16. In order to attach the front legs 17a and rear legs 17b of the lower cloth guide plate 16 to the lower base 12, front grooves 18a and rear grooves 18b are provided at corresponding positions of the front legs 17a and rear legs 17b. Further, the rear groove 18b is formed in the shape of a hole so as to penetrate through the back side. The rear leg 17b is attached to this rear groove 18b, and the protruding rear leg 17b is prevented from coming off.

Furthermore, as shown in FIGS. 7 and 8, the structure for attaching the lower fabric guide plate 16 to the lower base plate 12 may be formed as follows. A support groove 19 consisting of a straight groove 19b and a guide groove 19a corresponding to the straight part 16b and guide part 16a of the lower guide plate 16 is carved in the lower base 12, and a part of this support groove 19 is formed on the back side of the plate base 12. The leg portions 16c provided on the lower cloth guide plate 16 may be attached to the lower cloth guide plate 16 by drilling holes 18c therethrough.

On the other hand, the upper base plate 10 is divided into three parts (1
0a, 10b, 10c). On top of this, the base 10 has
Upper cloth guide plates 14 are attached to the lower base plate 12 so as to be positioned at intervals between the lower cloth guide plates 16 provided on the lower base plate 12. That is, the upper cloth guide plate 14 attached to the upper base plate 10 has rear end straight portions 16b of the lower cloth guide plate 16 formed at equal intervals, followed by guide portions 16a that spread radially forward. Similarly, as shown in FIG.
They are arranged so that their planar arrangement is fan-shaped.
Further, the upper base plate 10 is formed with front grooves and rear grooves for mounting front legs 15a and rear legs 15b extending from the upper edge of the upper cloth guide plate 14. Upper base 1
The front groove and rear groove for attaching the upper cloth guide plate 14 to the
They are formed in the same manner as the front groove 18a and rear groove 18b of the lower base 12.

Further, the upper base 10 is composed of divided bases 10a, 10b, and 10c divided into three parts.
The upper substrate 10 is divided at the center, and the other divided substrates 10b and 10c are obtained by further dividing the remaining upper substrate 10 in half. The divided bases 10a and 10c are located at the same height, and the divided base 10b is located lower. Therefore, the divided base 10b is fixed to the support arm 24 via the spacer 22 together with the divided base 10c. on the other hand,
The divided base 10a is fixed to a support arm 25.
Further, the divided bases 10a, 10b, and 10c are fixed by a support plate 26 to connect them together.

Upper cloth guide plates 14 of the same height are attached to the divided bases 10a and 10c, a narrow upper cloth guide plate 14 is attached to the divided base 10b, and the edge of the upper cloth guide plate 14 of the divided base 10b is attached to the upper cloth guide plate 14. The thickness of the spacer 22 is determined so as to be at a height such that it is flush with the end surface formed by the upper cloth guide plate 14 attached to the upper cloth guide plate 10. On the other hand, the upper cloth guide plate 14 is attached to the lower base 12.
The lower cloth guide plate 16 has a height that matches the height of
is installed.

On the other hand, at the rear ends of the lower cloth guide plate 16 and the upper cloth guide plate 14, folding guides 16c and 14c are provided for folding the pleats formed in the sewing cloth sideways.

Therefore, the pin tuck device of the present invention changes the height position of a portion of the upper substrate 10, and also changes the height position of the lower cloth guide plate 16 corresponding to the changed portion.
By changing the width of the fabric and inserting the sewing fabric from the front direction, pleats with various predetermined widths are formed.

In this embodiment, since the height positions of the divided bases 10a, 10b, and 10c constituting the upper base 10 can be freely changed, cloth guide plates 14 and 16 of extremely different heights can be mounted. . Furthermore, by partially removing the upper and lower fabric guide plates 14 and 16 of the upper and lower bases 10 and 12, it is possible to apply pin tucks to the sewing fabric with even greater variety.

Furthermore, in the above embodiment, since the dividing base 10a is divided at the center, the dividing edges are formed parallel to the direction of entry (feeding) of the sewing material. For this reason,
When the divided base 10a is used, the sewing fabric is not collected from the divided edge side, but is collected only from the other end side. Therefore, when pleats are formed in a wide sewing material by dividing it into multiple sections, pin-tucks can be performed accurately using the dividing edge as a reference.

Further, in the above embodiment, the upper substrate 10 is divided into three parts, but as shown in FIGS.
It may also be divided into multiple parts as necessary. Furthermore, as a method of joining the divided bases, a part of the support plate may be fixed so as to be bent downward without using a spacer.

Furthermore, FIG. 11 shows another embodiment.

A spacer 28 having an elongated hole corresponding to the upper cloth guide plate 14 of a predetermined width of the upper base 10 is inserted into the upper base 10.
Attach it from below. And this spacer 2
Lower fabric guide plate 1 of lower base 12 corresponding to position 8
Replace 6 with a narrower one. In this embodiment, the same effects as in the above embodiment can be achieved without dividing the upper substrate 10 as in the above embodiment. Furthermore, similar effects can be obtained by disposing spacers in the gaps between the upper cloth guide plates 14.

In each of the above embodiments, the split base 10b and spacer 22 of the first embodiment are included in the concept of an insertion base of the present invention. Also, the second
Spacer 28 and upper cloth guide plate 14 in the embodiment of
The spacer disposed between the two is included in the concept of the insertion base of the present invention. That is, the present invention partially changes the width of the upper cloth guide plate 14 from the plane (edge position) formed by the upper cloth guide plate 14 of the upper base 10, and the corresponding width of the upper cloth guide plate 14 on the lower base 12 is changed. By changing the width of the lower cloth guide plate 16, pin tucks of various widths can be formed.

(Effects of the Invention) As described above about the present invention, the pleat height of the sewing fabric formed by being inserted into the fabric guide can be partially changed, and various It has great effects such as being able to apply pin tucks at the same time.

[Brief explanation of the drawing]

Fig. 1 is an explanatory diagram of the state in which sewing fabric is inserted into the pin tuck device, Fig. 2 is a plan view of the pin tuck device, Fig. 3 is a plan view of the upper base, Fig. 4 is a plan view of the lower base, and Fig. 4 is a plan view of the lower base. Figure 5 is a longitudinal sectional view of the lower base, Figure 6 is a side view of the lower cloth guide plate, Figure 7 is a side view showing the shape of another lower cloth guide plate, and Figure 8 is the lower guide plate of Figure 7. 9 is a side view of the upper cloth guide plate, FIGS. 10 a to d are explanatory diagrams showing other divided states of the upper base, and FIG. 11 is another embodiment. FIG. 2 is an explanatory diagram showing a state in which sewing fabric is inserted into a pin tuck device. 10... upper base, 10a, 10b, 10c...
Divided base, 12...Lower base, 14...Upper fabric guide plate, 16...Lower fabric guide plate, 18...Support groove, 2
2... Spacer, 24, 25... Support arm, 26...
...Support plate.

Claims (1)

[Claims] 1. A cloth guide plate is provided on each opposing surface of a pair of bases arranged parallel to each other so that the cross section is comb-shaped,
In a pin-tuck device for a pin-tuck sewing machine that forms pin-tucks in sewing fabric by placing the fabric guide plates of one base between the fabric guide plates of the other base and passing the sewing fabric between the fabric guide plates, one An insertion base is removably provided on one of the bases, and the insertion base is aligned with the edge of the cloth guide plate on one base and the height of the cloth guide plate on the one base is different. The cloth guide plate of the other base corresponding to the insertion base can be replaced with a cloth guide plate having a height corresponding to the height of the cloth guide plate of the insertion base. A pin tuck device for a pin tuck sewing machine.