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JPH03198390A - Gas laser oscillator - Google Patents

Gas laser oscillator

Info

Publication number
JPH03198390A
JPH03198390A JP33632989A JP33632989A JPH03198390A JP H03198390 A JPH03198390 A JP H03198390A JP 33632989 A JP33632989 A JP 33632989A JP 33632989 A JP33632989 A JP 33632989A JP H03198390 A JPH03198390 A JP H03198390A
Authority
JP
Japan
Prior art keywords
flow
point
discharge
distance
main discharge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP33632989A
Other languages
Japanese (ja)
Other versions
JP2685946B2 (en
Inventor
Tsutomu Sumino
努 角野
Yutaka Uchida
裕 内田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP33632989A priority Critical patent/JP2685946B2/en
Publication of JPH03198390A publication Critical patent/JPH03198390A/en
Application granted granted Critical
Publication of JP2685946B2 publication Critical patent/JP2685946B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/036Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/038Electrodes, e.g. special shape, configuration or composition

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)

Abstract

PURPOSE:To make possible a high-repeat laser oscillation by a method wherein the title device is provided with a duct, by which the flow of a laser medium is made to intersect obliquely to the direction of main discharge toward the side of a cathode and the repeat period of discharge is shortented. CONSTITUTION:In the conventional case where a flow A of a laser medium and a direction B of main discharge intersect orthogonally each other, it is assumed that a sputtered substance 5 produced at the time of the main discharge reaches a point S apart by a distance X1 in the direction of the flow A from a point P1 to correspond to the top part of a cathode 12 at a point of time of the generation of the following main discharge by the flow A. In this case, a flow C is going toward the side of the cathode 12 at an angle theta to the flow A. Therefore, if it is assumed that the flow velocity of the flow C is identical with that of the flow A, the position of the substance 5 is shifted on the side of the cathode 12, but the substance 5 is moved to a point T which is positioned in the form of a circular arc with the point P1 as its center. That is, the distance between the point P1 and the point T is X1 and assuming that arc discharge centers around the center P2 in the main discharge space of a main discharge axis B, the distance between the center P2 and the point S is R1 and the distance between the center P2 and the point T is R2. As the distance R1 is shorter than the distance R2, the discharge on the path of the distance R2 is hardly generated more than that on the path of the distance R1 and the repeat period of discharge is shortened.

Description

【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は横励起式のガスレーザ発振装置に関する。[Detailed description of the invention] [Purpose of the invention] (Industrial application field) The present invention relates to a horizontally pumped gas laser oscillation device.

(従来の技術) 横励起式としてはTEACO2レーザや、エキシマレー
ザが知られている。従来、この種のレーザ発振器では、
第3図に示すように、レーザ管内で循環されるガスレー
ザ媒質の放電部における流れ(A)は、陰極(1)とこ
れに対向して設けられた陽極(2)からなる主放電電極
の主放電軸(B)に直交している。
(Prior Art) TEACO2 lasers and excimer lasers are known as horizontally pumped lasers. Conventionally, in this type of laser oscillator,
As shown in Fig. 3, the flow (A) in the discharge section of the gas laser medium circulating within the laser tube is the main flow of the main discharge electrode, which consists of a cathode (1) and an anode (2) provided opposite thereto. It is perpendicular to the discharge axis (B).

(発明が解決しようとする課題) 放電が始まると、電子情報通信学会論文誌C7VOL、
  J 71−C,No 12. P11183. −
88゜12にも紹介されているように、流れ(A)の放
電部から出ていく側のいわゆる下流側に、グロー放電状
態になる主放電(3)と異なった円弧状のアーク放電(
4)が陰極(1)、陽極(2)との間で発生する。これ
は主放電(8)によって陰極(1)側より発生した放電
生成物流れ(A)が下流側に流される間で、放電生成物
に含まれている金属スパッタ物(5)等、導電性の高い
物質の介在が原因であると考えられている。上記アーク
放電(4)の発生を少なくするためには、金属スパッタ
物(5)を下流側にできるだけ遠ざけ、円弧状のアーク
放電の円弧半径を大きくし、電気絶縁距離を大きくする
必要がある。このためにはガスレーザ媒質を循環させる
送風機の出力が高く、高速回転可能な大形のものにしな
ければならないが、送風機が大型になればレーザ発振装
置自体も大形となり、また、高速回転による振動の影響
でレーザ発振が不安定になるという問題があった。した
がって、送風機をむやみに大型化できないため、高繰り
返しのレーザ発振を得ることが難しかった。
(Problem to be solved by the invention) When the discharge begins, the IEICE journal C7VOL,
J 71-C, No 12. P11183. −
As introduced in 88°12, on the so-called downstream side of the flow (A) exiting from the discharge section, there is an arc-shaped arc discharge (different from the main discharge (3) that becomes a glow discharge state).
4) occurs between the cathode (1) and the anode (2). This is because the discharge product flow (A) generated from the cathode (1) side by the main discharge (8) is flowed downstream, and conductive materials such as metal sputtered matter (5) contained in the discharge product are It is thought that this is due to the presence of substances with high levels of oxidation. In order to reduce the occurrence of the arc discharge (4), it is necessary to move the metal sputtered material (5) as far downstream as possible, increase the arc radius of the arc discharge, and increase the electrical insulation distance. To achieve this, the blower that circulates the gas laser medium must have a high output and be large enough to rotate at high speed.However, if the blower becomes large, the laser oscillation device itself must also become large, and vibrations caused by high-speed rotation must be made. There was a problem that laser oscillation became unstable due to the influence of Therefore, it has been difficult to obtain high-repetition laser oscillation because the blower cannot be made unnecessarily large.

本発明は装置の大型化を招くことなく、金属スパッタ物
等が原因とされるアーク放電の発生を抑制したガスレー
ザ発振装置を提供することを目的とする。
SUMMARY OF THE INVENTION An object of the present invention is to provide a gas laser oscillation device that suppresses the occurrence of arc discharge caused by sputtered metal materials without increasing the size of the device.

[発明の構成] (課題を解決するための手段と作用) 本発明は上記課題を解決するために、光共振方向と、陰
極および陽極とを対向して設けた主放電電極間で発生す
る主放電方向とにそれぞれ交わるガス流を形成した横励
起式のガスレーザ発振装置において、上記ガス流をt記
陰極側に向けて上記主放電方向に対して斜交させる斜交
手段を設けたもので、放電発生物は主放電の中心からア
ーク放電が発生し難い箇所に遠ざかる。
[Structure of the Invention] (Means and Effects for Solving the Problems) In order to solve the above problems, the present invention solves the above problems by reducing the main power generated between the optical resonance direction and the main discharge electrodes provided with the cathode and the anode facing each other. A horizontally excited type gas laser oscillation device that forms gas flows that intersect with the discharge direction, including an oblique means that directs the gas flow toward the cathode side and obliquely intersects with the main discharge direction, The discharge products move away from the center of the main discharge to locations where arc discharge is unlikely to occur.

(実施例) 以下、本発明を実施例を示す図面に基いて説明する。す
なわち、第1図において、ガスレーザ媒質が所定の圧力
で封入されたレーザ管(11)を有し、内部には放電手
段、ガスレーザ媒質循環手段が設けられている。上記放
電手段は主放電電極となる陰極(12)および陽極(1
3)とが支持板(14a) 、 (14b)によって電
気的に導通した状態で支持され、それぞれ高電圧、大電
流パルスを供給する電源(15)の高圧側およびアース
側に上記支持板(14a) 、 (14b)を通して接
続した構成になっている。陰極(12)側の支持板(1
4a)には波形成形のために、ピーキングコンデンサ(
16)を接続した上部ピン電極(17)が主放電空間(
18)における光軸に沿って陰極(12)の両側に所定
ピッチで設けられている。また、支持板(14b)には
各上部ピン電極(17)にそれぞれ対向して下部ピン電
極(19)が設けられ、これら上部、下部ピン電極で上
記主放電空間(18)を予ri?l!離する予備電離電
極を構成している。一方、ガスレーザ媒質循環は、レー
ザ管(11)内を循環して主放電空間(18)に供給す
るファン(20)と、ガスレーザ媒質の流れの上流側に
設けられた熱交換器(21)と、同じく下流側に設けら
れ、放電生成物を吸着するフィルター(22)とを備え
ている。ところで、上記上流側において、熱交換器(2
1)と一方の予備電離電極との間に、上記ガス流を上記
陰極側に向けて上記主放電方向に対して斜交させる斜交
手段としてのダクト(25)が設けられている。このダ
クト(25)の吹出し角度は陰極(12)に向けられ、
吹出されたガスレーザ媒質の流れ(C)が主放電軸(B
)に鈍角に交わる角度に設定されている。
(Example) Hereinafter, the present invention will be explained based on drawings showing examples. That is, in FIG. 1, there is provided a laser tube (11) in which a gas laser medium is sealed at a predetermined pressure, and a discharge means and a gas laser medium circulation means are provided inside. The discharge means includes a cathode (12) serving as a main discharge electrode and an anode (1
3) are supported in an electrically conductive state by the support plates (14a) and (14b), and the support plate (14a) is connected to the high voltage side and the ground side of the power source (15) that supplies high voltage and large current pulses, respectively. ) and (14b). Support plate (1) on the cathode (12) side
4a) is a peaking capacitor (
The upper pin electrode (17) connected to the main discharge space (
18) are provided at a predetermined pitch on both sides of the cathode (12) along the optical axis. Further, lower pin electrodes (19) are provided on the support plate (14b) to face each of the upper pin electrodes (17), and these upper and lower pin electrodes are used to pre-circulate the main discharge space (18). l! It constitutes a pre-ionization electrode that separates the ions. On the other hand, gas laser medium circulation is carried out by a fan (20) that circulates within the laser tube (11) and supplies it to the main discharge space (18), and a heat exchanger (21) provided on the upstream side of the flow of the gas laser medium. , and a filter (22) which is also provided on the downstream side and which adsorbs discharge products. By the way, on the upstream side, the heat exchanger (2
1) and one pre-ionization electrode, a duct (25) is provided as an oblique means for directing the gas flow toward the cathode and obliquely intersecting the main discharge direction. The blowing angle of this duct (25) is directed towards the cathode (12),
The flow of the blown gas laser medium (C) is along the main discharge axis (B
) is set at an obtuse angle.

次に上記構成の作用について、第1図における主放電部
を拡大して示した第2図を参照して説明する。すなわち
、ガスレーザ媒質の流れ(^)と主放電方向(B)とが
直交する従来の場合に、主放電時に生成されたスパッタ
物(5)が上記流れ(A)によって陰極(12)の頂部
に相当する点(pi)から次の主放電が生じる時点で、
流れ(^)方向における距離(xl)だけ離れた(S)
点に到達したとすると、本発明の構成では、流れ(C)
は流れ(A)に対して角度θで陰極(12)側に向かっ
ているので、流速が流れ(A)と同じだとすれば、位置
は陰極(12)側にずれるが、点(Pl)を中心にした
円弧状に位置する(T)点に移動する。すなわち、点(
PI)と(T)点との距離は(xi)である。上記アー
ク放電が主放電軸(B)の主放電空間における中点(p
2)を中心にして、(S)点までは距離(R1)となり
、(T)点までは(R2)となる。
Next, the operation of the above structure will be explained with reference to FIG. 2, which shows an enlarged view of the main discharge section in FIG. 1. That is, in the conventional case where the flow (^) of the gas laser medium and the main discharge direction (B) are perpendicular to each other, the sputtered matter (5) generated during the main discharge is deposited on the top of the cathode (12) by the flow (A). At the time when the next main discharge occurs from the corresponding point (pi),
(S) separated by a distance (xl) in the flow (^) direction
Assuming that the point is reached, in the configuration of the present invention, the flow (C)
is toward the cathode (12) at an angle θ with respect to the flow (A), so if the flow velocity is the same as the flow (A), the position will shift toward the cathode (12), but the point (Pl) Move to point (T) located in an arc with . That is, the point (
The distance between point PI) and point (T) is (xi). The arc discharge occurs at the midpoint (p) of the main discharge axis (B) in the main discharge space.
2), the distance to point (S) is (R1), and the distance to point (T) is (R2).

ここで、流れ(A)(流れ(B))の流速′をV、発振
周波数をfとすると、距離(Xl)−V・1 /’ f
で求められる。
Here, if the flow velocity of flow (A) (flow (B)) is V and the oscillation frequency is f, then distance (Xl) - V・1 /' f
is required.

また、 X2−xLψ cos  θ・・・・・・・・・・・・
・・・・・・(1)Y2−Yl+Xls  i  n 
θ・・・・・・・・・・・・・・・(2)R2−(X2
) 2 + (Y2) 2  ・・・・・・・・・(4
)(1)乃至(4)式から (R2) ” −(R1) ” −(X2)2  + (Y2)2− (Xi)2− (
Yl)2=(XI)2c o s 2θ十(Yl) 2
+ 2 (Xi)(Yl) sin θ+(XI)2s
  i  n  ’  θ(Xi) 2− (Yl) 
2 =(Xi)2 (c o s  2 θ+sin 2 
θ)+(Yl)2+ 2 (XI)(Yl)s  i 
 n  θ−(XI)2−(Yl)2   、::、4
’、CO52θ+5in2θ−1だから −2(XI)(Yl)s  i  n θ> 0−−−
−−−−・−−−−(5)上記(5)式から流速の方向
を変えることでアーク放電の円弧の半径が大きくなった
Also, X2−xLψ cos θ・・・・・・・・・・・・
......(1) Y2-Yl+Xls in
θ・・・・・・・・・・・・・・・(2) R2−(X2
) 2 + (Y2) 2 ・・・・・・・・・(4
)(1) to (4), (R2) ” −(R1) ” −(X2)2 + (Y2)2− (Xi)2− (
Yl)2=(XI)2cos 2θ+(Yl)2
+ 2 (Xi) (Yl) sin θ+(XI)2s
in' θ(Xi) 2- (Yl)
2 = (Xi)2 (cos 2 θ+sin 2
θ)+(Yl)2+ 2 (XI)(Yl)s i
n θ-(XI)2-(Yl)2 , ::, 4
', CO52θ+5in2θ-1, so -2(XI)(Yl)s in θ> 0---
------- (5) From the above equation (5), the radius of the arc of the arc discharge was increased by changing the direction of the flow velocity.

[発明の効果] 以上詳述したように、距離(R1)<距離(R2)なの
でアーク放電(4b)はアーク放電(4a)の外側にな
り、アーク放電(4a)に比べて生じ難くなり、その結
果、従来に比べ、ガスレーザ媒質を循環する送風機を特
に大型化しなくても、放電の繰返し周期が短くでき、高
繰返しレーザ発振が可能となった。
[Effects of the Invention] As detailed above, since distance (R1) < distance (R2), arc discharge (4b) is outside of arc discharge (4a), and is less likely to occur compared to arc discharge (4a). As a result, the discharge repetition period can be shortened and high-repetition laser oscillation can be achieved without increasing the size of the blower that circulates the gas laser medium, compared to the conventional method.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例を示す断面図、第2図は主放
電空間に放電作用を示す拡大図、第3図は従来例を示す
断面図である。 (11)・ 拳レーザ管 (12)・・・陰極 (13)・・・陽極 (25)・ ・ダクト(斜交手段)
FIG. 1 is a sectional view showing an embodiment of the present invention, FIG. 2 is an enlarged view showing the discharge action in the main discharge space, and FIG. 3 is a sectional view showing a conventional example. (11)・ Fist laser tube (12)... Cathode (13)... Anode (25)... Duct (oblique means)

Claims (1)

【特許請求の範囲】[Claims] 光共振方向と、陰極および陽極とを対向して設けた主放
電電極間で発生する主放電方向とにそれぞれ交わるガス
流を形成した横励起式のガスレーザ発振装置において、
上記ガス流を上記陰極側に向けて上記主放電方向に対し
て斜交させる斜交手段を設けたことを特徴とするガスレ
ーザ発振装置。
In a horizontally pumped gas laser oscillation device that forms gas flows that intersect the optical resonance direction and the main discharge direction generated between main discharge electrodes with a cathode and an anode facing each other,
A gas laser oscillation device comprising oblique means for directing the gas flow toward the cathode and obliquely intersecting the main discharge direction.
JP33632989A 1989-12-27 1989-12-27 Gas laser oscillation device Expired - Fee Related JP2685946B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33632989A JP2685946B2 (en) 1989-12-27 1989-12-27 Gas laser oscillation device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33632989A JP2685946B2 (en) 1989-12-27 1989-12-27 Gas laser oscillation device

Publications (2)

Publication Number Publication Date
JPH03198390A true JPH03198390A (en) 1991-08-29
JP2685946B2 JP2685946B2 (en) 1997-12-08

Family

ID=18297993

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33632989A Expired - Fee Related JP2685946B2 (en) 1989-12-27 1989-12-27 Gas laser oscillation device

Country Status (1)

Country Link
JP (1) JP2685946B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06291396A (en) * 1992-06-02 1994-10-18 Nissin Electric Co Ltd Excimer laser equipment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06291396A (en) * 1992-06-02 1994-10-18 Nissin Electric Co Ltd Excimer laser equipment

Also Published As

Publication number Publication date
JP2685946B2 (en) 1997-12-08

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