JPH03159933A - Glaze and method for glazing - Google Patents
Glaze and method for glazingInfo
- Publication number
- JPH03159933A JPH03159933A JP29847889A JP29847889A JPH03159933A JP H03159933 A JPH03159933 A JP H03159933A JP 29847889 A JP29847889 A JP 29847889A JP 29847889 A JP29847889 A JP 29847889A JP H03159933 A JPH03159933 A JP H03159933A
- Authority
- JP
- Japan
- Prior art keywords
- glaze
- thermal expansion
- sio2
- amorphous
- quartz glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 48
- 229910021486 amorphous silicon dioxide Inorganic materials 0.000 claims abstract description 15
- 239000000126 substance Substances 0.000 claims abstract description 15
- 239000003795 chemical substances by application Substances 0.000 claims description 17
- 238000010304 firing Methods 0.000 claims description 7
- 229910021488 crystalline silicon dioxide Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims 1
- 229910045601 alloy Inorganic materials 0.000 claims 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 14
- 229910052681 coesite Inorganic materials 0.000 abstract description 12
- 239000000377 silicon dioxide Substances 0.000 abstract description 12
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 12
- 229910052682 stishovite Inorganic materials 0.000 abstract description 12
- 229910052905 tridymite Inorganic materials 0.000 abstract description 12
- 239000000463 material Substances 0.000 abstract description 8
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 7
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 abstract description 6
- 229910052593 corundum Inorganic materials 0.000 abstract description 4
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 abstract description 4
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract description 4
- 230000035939 shock Effects 0.000 description 7
- 229910010293 ceramic material Inorganic materials 0.000 description 5
- 239000013078 crystal Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910000502 Li-aluminosilicate Inorganic materials 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 238000003746 solid phase reaction Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/14—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
この発明は釉薬剤及び釉の形成方法に関する．（従来の
技術及び発明が解決しようとする課題）従来より、釉の
熱膨張係数を低くするために種々の方法が講じられてい
るが、その多くは釉薬剤中に低熱膨張物質を含有させ、
その低熱膨張物質の熱膨張係数及びその含有量に応じて
，釉全体の熱膨張係数を低下させるものであった。即ち
物質添加により、熱膨張係数の加成性により釉全体の熱
膨張係数を低下させるものであった．この場合、得られ
る熱膨張係数は十分に低くはな〈、従って得られる耐熱
衝撃温度差もせいぜい６００℃程度までであった。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) This invention relates to a glaze agent and a method for forming a glaze. (Prior Art and Problems to be Solved by the Invention) Conventionally, various methods have been taken to lower the thermal expansion coefficient of glaze, but most of them involve incorporating a low thermal expansion substance into the glaze agent,
The coefficient of thermal expansion of the entire glaze was lowered depending on the coefficient of thermal expansion of the low thermal expansion substance and its content. In other words, the addition of the substance lowers the coefficient of thermal expansion of the entire glaze due to the additivity of the coefficient of thermal expansion. In this case, the obtained thermal expansion coefficient was not sufficiently low, and therefore the obtained thermal shock resistance temperature difference was at most about 600°C.
ところで本発明者は先の特許願（特願昭６３−７２５４
０号）において、低熱膨張且つ緻密で耐熱衝撃性の高い
（耐熱衝撃温度差で８００℃以上が可能）セラミックス
材を提案している．かかるセラミックス材は、熱膨張が
低く優れた耐熱衝撃性を有することから、電気調理器用
天板その他耐熱衝撃製品の材料として用途が考えられて
いる。By the way, the present inventor has filed an earlier patent application (Japanese Patent Application No. 63-7254).
0), we have proposed a ceramic material that has low thermal expansion, is dense, and has high thermal shock resistance (a thermal shock resistance temperature difference of 800°C or more is possible). Since such ceramic materials have low thermal expansion and excellent thermal shock resistance, they are considered for use as materials for top plates for electric cookers and other thermal shock resistant products.
ところがこのセラミックス材のみにて電気調理器天板を
＃成した場合、鍋からのこぼれものによって表面が汚れ
易く、そこでこのようなセラミックス材の表面に釉を施
すことができれば、表面に付着した汚れものを容易に拭
き取って天板表面を常に清浄に保つことができ、また天
板表面を美しく仕上げることができて好都合である。However, when the top plate of an electric cooker is made only of ceramic materials, the surface is easily stained by spills from the pot, so if it is possible to apply a glaze to the surface of such ceramic materials, it will remove the dirt that has adhered to the surface. It is convenient because the surface of the top plate can be kept clean by easily wiping things off, and the surface of the top plate can be beautifully finished.
しかしながら従来の釉の場合、熱膨張係数の点で、従っ
て耐熱衝撃性の点で不十分であって、かかる釉を施した
セラミックス材を電気調理器天板として用いた場合、鍋
等からのこぼれものによって表面が急冷されたとき、釉
面に割れ等損傷を生じる恐れがある．
そこでこのような低熱膨張のセラミックス素地に対して
も適用し得るような低熱膨張の釉の開発が望まれていた
．
（課題を解決するための手段）
本発明はこのような課題を解決するためになされたもの
であり、而して本願の第一の解決手段は釉薬剤に係るも
のであって，その要旨は、ＳｉＯ２， Ａｌ２０３ ，
Ｌｆ２０を主成分とし、且つＳｉＯ２威分の少な〈と
も一部とレて石英ガラス等の非晶質ＳｉＯ２を含有させ
て或ることにある．（第一解決手段の作用及び効果）
本発明者は，釉薬剤中に種々の物質ないし威分を含有さ
せて、焼成により得られる釉の熱膨張係数を低下させる
実験を行った．その際に石英ガラス等の非晶質ＳｉＯ２
を含有させたところ、熱膨張係数が飛躍的に低下するこ
とが認められた．本発明はこのような知見に基づいて威
されたものである。However, in the case of conventional glazes, they are insufficient in terms of thermal expansion coefficient and therefore thermal shock resistance, and when ceramic materials with such glazes are used as top plates for electric cookers, spills from pots, etc. When the surface is rapidly cooled by something, there is a risk of cracking or other damage to the glaze surface. Therefore, it was desired to develop a glaze with low thermal expansion that could be applied to such low thermal expansion ceramic substrates. (Means for Solving the Problems) The present invention has been made to solve these problems, and the first solution of the present application relates to a glaze agent, and the gist thereof is as follows. , SiO2, Al203,
The main component is Lf20, and at least a portion of it contains amorphous SiO2 such as quartz glass, which has a small SiO2 content. (Operations and effects of the first solution) The present inventor conducted an experiment to lower the thermal expansion coefficient of the glaze obtained by firing by incorporating various substances or ingredients into the glaze agent. At that time, amorphous SiO2 such as quartz glass
It was observed that the coefficient of thermal expansion decreased dramatically when . The present invention was developed based on this knowledge.
前述したように、通常は釉薬剤中に或る物質ないし威分
を含有させた場合、加或性が威り立ち、その含有物質，
成分の熱膨張係数及び含有割合に応じて釉全体の熱膨張
係数が低下する．しかしながら石英ガラス等の非晶賀Ｓ
ｉＯ２を含有させた場合，その熱膨張係数及び含有量か
ら予期される値に比べて、釉全体の熱膨張係数が飛躍的
に低下していた．即ち、生威する釉の熱膨張係数が１．
２Ｘ １０−６℃−１となるような釉薬剤に対して、熱
膨張係数０．５Ｘ１０−６℃−１の石英ガラス等の非晶
質ＳｉＯ２を２０％だけ含有させた場合、加威性から予
想される釉全体の熱膨張係数は１．ＩＸ１０−６℃とな
るが、実際には釉全体の熱膨張係数は０．６ ＸＩＯ−
６℃−１まで低下していた。As mentioned above, normally when a certain substance or substance is contained in the glaze agent, its additive properties become stronger, and the contained substance,
The thermal expansion coefficient of the entire glaze decreases depending on the thermal expansion coefficient and content ratio of the components. However, amorphous glass such as quartz glass
When iO2 was included, the thermal expansion coefficient of the entire glaze was dramatically lower than the expected value based on its thermal expansion coefficient and content. That is, the coefficient of thermal expansion of the glaze to be used is 1.
If 20% of amorphous SiO2 such as quartz glass with a thermal expansion coefficient of 0.5X10-6℃-1 is added to a glaze that has a thermal expansion coefficient of 2X 10-6℃-1, The expected coefficient of thermal expansion of the entire glaze is 1. IX10-6℃, but actually the thermal expansion coefficient of the entire glaze is 0.6XIO-
The temperature had dropped to 6°C-1.
このことは、ＳｉＯ２ ， ＡＩ２０３ ， Ｌ＋
２０を主成分とする釉において，含有ｉせた石英ガラス
等の非晶質ＳｉＯ２が自身のｓＷｌ張係数に基づいて釉
全体の熱膨張係数を低下させたものとは考えられず、非
蟲質ＳｉＯ２（一部或いは全体）が釉薬剤中の他成分と
反応して極低熱膨張物質（リチウムアルミノ珪酸塩（Ｘ
Ｌｉ２０＊ ＹＡ１２０３ ＊ ＺＳｉＯｚ） ）を析
出し、この析出物の熱膨張係数に基づいて、釉全体の熱
膨張係数が低下したものと考えられる．
但し新しく生威した極低熱膨張物質が具体的に何である
か、或いはその生成のメカニズムについては現段階では
分っ゛ていない．
本発明においては、含有させた石英ガラス等の非晶質Ｓ
ｉＯ２が、焼威時に全体的に又は一部溶けた上で他成分
と反応して極低熱膨張物質を析出する場合、或いは溶け
ることな〈他成分と固相反応して極低熱膨張物質を析出
する場谷の何れの場合も含まれる．
更に固相反応の場合、表層部のみが部分的に反応して芯
の部分が非晶質ＳｉＯ２のまま残存している場合、及び
非晶ｊｊｓｉ０２粒が芯の部分まで全体的に反応した場
合の何れも含まれる．要するに、少な〈とも合有せしめ
た非晶質ＳｉＯ２の一部が反応して極低熱膨張物質を析
出する何れの場合も含むものである．これにより生威す
る釉全体の熱膨張係数が飛躍的に低下する効果が得られ
る．
尚、本発明者は石英ガラス等の非品質のＳｉＯ２のみな
らず、結晶質のＳｉＯ２の含有実験も併せて行った．し
かしながら本発明者が行った実験の範囲内では良好な結
果は得られなかった。その理由は、結品質のＳｉＯ２の
場合他成分との反応性が乏しく、十分に極低熱膨張物質
を析出し得なかったことによるものと考えられる．即ち
釉薬剤に含有させるＳｉＯ２分としては、石英ガラス等
の非晶質ＳｉＯ２が良好なのである．これは非晶質Ｓｉ
Ｏｚの場合、結晶構造をとっていないので焼成時に他威
分との反応性が高く、極低熱膨張物質をより析出させ易
いことによるものである．
本発明においては、ＳｉＯ２， ＡＩ２０３ ，
Ｌｉ２０として夫々重量％でＳｉＯ２：５０〜８ ５
， ＡＩ２０３： ５〜２５％ 、Ｌｉ２Ｏ：２〜２
０％とするのが望まし〈、また他の成分としてＺｎＯ：
Ｏ−１０％，ＭｇＯ ： Ｏ〜５％の各範囲で含有させ
るのが望ましい．このような組成範囲において特に良好
な結果の得られることが確認されている．
一方含有させる石英ガラス等の非晶質ＳｉＯ２とし？は
、その量を６０重量％以下とするのか望ましい。石英ガ
ラス等の非晶質Ｓｉｎ２はもともと融点の高い物質であ
り、従ってこれを６０％より多く含有させた場合、非晶
質Ｓｉｎ２か焼成時に釉中に十分に溶け込んでくれず、
釉か多孔質のいわゆるガサガサの釉となってしまう。尚
非晶賀ＳｉＯ■の含有量としてより望ましいのは５〜４
０重量％の範囲である。５重量％以上において効果が高
く現れ、また４０重量％以下とすることによってクリス
トバライト等の結晶の析出を可及的に低く抑えるととか
てきる。This means that SiO2, AI203, L+
In a glaze whose main component is 20, it is unlikely that the amorphous SiO2 contained in quartz glass or the like lowers the coefficient of thermal expansion of the entire glaze based on its own tensile coefficient, and is considered to be a non-crystalline glaze. SiO2 (in part or in whole) reacts with other components in the glaze to form an extremely low thermal expansion material (lithium aluminosilicate (X
It is thought that Li20*YA1203*ZSiOz)) was precipitated, and the thermal expansion coefficient of the entire glaze decreased based on the thermal expansion coefficient of this precipitate. However, at this stage, it is not clear what the newly produced extremely low thermal expansion material is or the mechanism of its formation. In the present invention, amorphous S such as quartz glass containing
When iO2 is completely or partially melted during combustion and then reacts with other components to precipitate an extremely low thermal expansion material, or when iO2 does not melt (iO2 reacts with other components in solid phase and forms an extremely low thermal expansion material) This includes any case where . Furthermore, in the case of a solid-phase reaction, there are cases in which only the surface layer partially reacts and the core remains as amorphous SiO2, and cases in which the amorphous jjsi02 grains react entirely up to the core. All are included. In short, it includes any case where at least a part of the combined amorphous SiO2 reacts to precipitate an extremely low thermal expansion substance. This has the effect of dramatically reducing the coefficient of thermal expansion of the entire glaze. Incidentally, the present inventors also conducted experiments containing not only non-quality SiO2 such as quartz glass but also crystalline SiO2. However, good results were not obtained within the range of experiments conducted by the inventor. The reason for this is thought to be that in the case of crystalline SiO2, the reactivity with other components was poor and it was not possible to sufficiently precipitate an extremely low thermal expansion substance. That is, amorphous SiO2 such as quartz glass is suitable as the SiO2 content to be included in the glaze agent. This is amorphous Si
This is because in the case of Oz, since it does not have a crystalline structure, it is highly reactive with other components during firing, making it easier to precipitate extremely low thermal expansion substances. In the present invention, SiO2, AI203,
SiO2: 50-85 in weight% as Li20
, AI203: 5-25%, Li2O: 2-2
It is desirable to set it to 0% (and other components include ZnO:
O-10%, MgO: It is desirable to contain each in the range of O to 5%. It has been confirmed that particularly good results can be obtained within this composition range. On the other hand, what about amorphous SiO2 such as quartz glass? It is desirable that the amount is 60% by weight or less. Amorphous Sin2 such as quartz glass originally has a high melting point, so if it is contained in an amount higher than 60%, the amorphous Sin2 will not dissolve sufficiently into the glaze during firing.
The glaze will be porous and rough. The more desirable content of amorphous SiO is 5 to 4.
It is in the range of 0% by weight. The effect is high when the content is 5% by weight or more, and the precipitation of crystals such as cristobalite can be suppressed as much as possible by setting the content to 40% by weight or less.
石英ガラス等の非晶質Ｓｉｎ２が結晶化する場合、一般
にこのようなクリストバライト等の結晶を析出するか、
この結晶は熱膨張係数が高く、従ってこのような結晶の
析出を極力抑えることによって、釉全体の熱膨張係数を
大きく低下させることができる。When amorphous Sin2 such as quartz glass crystallizes, it generally precipitates crystals such as cristobalite, or
These crystals have a high coefficient of thermal expansion, and therefore, by suppressing the precipitation of such crystals as much as possible, the coefficient of thermal expansion of the entire glaze can be greatly reduced.
（弟二解決手段）
本願の第二解決手段は釉の形戊方法に係り、その要旨は
，Ｓｌ０２１ ＡＩ２ｏ３． ＬｊＪを主成分とす
る？薬剤を被施釉物表面に施して焼威することにより、
該被施釉物表面に釉を形戒するに際して、該釉薬剤の戊
分として石英ガラス等の非晶質Ｓｉｎ，を被施釉物表面
に施し、焼成時に該石英ガラス等の非晶質ＳｉＯ２と他
威分とを反応させて低熱膨張物質を析出させることにあ
る。(Second Solution) The second solution of the present application relates to a glaze shaping method, the gist of which is given in Sl021 AI2o3. Is LjJ the main component? By applying a chemical to the surface of the glazed object and burning it,
When forming the glaze on the surface of the glazed object, amorphous Si such as quartz glass is applied to the surface of the glazed object as a part of the glaze agent, and during firing, amorphous SiO2 such as quartz glass and other The purpose is to precipitate a low thermal expansion substance by reacting with heat.
（第二解決手段の作用及び効果）
本解決手段の態様としては、上記のようにーの釉薬調合
物全体中に予め石英ガラス等の非晶質Ｓｉｎ２を含有さ
せておき、これを被施釉物表面に施して焼成する方法と
、釉薬剤な二液、例えば石英ガラス等の非晶質Ｓｉｎ２
を含む液とこれを含有しない液とに分け、それらを別々
に被施釉物表面に施した上、これを焼威し、そのときに
非晶質ＳｉＯ■を他の戒分と反応させて釉形威と同時に
釉中に極低熱膨張物質を析出させる方法とが考えられる
。(Operations and effects of the second solution) As an aspect of the present solution, as described above, amorphous Sin2 such as quartz glass is contained in the entire glaze mixture in advance, and this is applied to the object to be glazed. A method of applying it to the surface and firing it, and a two-component glaze agent, such as amorphous Sin2 such as quartz glass.
A liquid containing and a liquid not containing this are separately applied to the surface of the glazed object, which is then fired. At that time, the amorphous SiO is reacted with other ingredients to create a glaze. One possible method is to precipitate an extremely low thermal expansion substance into the glaze at the same time as adding shape.
（実施例）
次に本発明の特徴をより明確にすべく、以下にその実施
例を詳述する。(Example) Next, in order to clarify the characteristics of the present invention, examples thereof will be described in detail below.
第１表に示ず組威で釉薬剤な調合して第２表（Ａ）の■
の組威の低熱膨張セラミックス素地（使用原料の組威に
ついては第２表（Ｂ）を参照）に施し、これを第１表に
示す温度条件で焼威して、生威した釉の熱膨張係数測定
，耐熱衝撃試験を行った。結果か第１表に併せて示して
ある。If the glaze agent is not shown in Table 1, mix it with ■ in Table 2 (A).
The thermal expansion of the raw glaze was applied to a low thermal expansion ceramic base (see Table 2 (B) for the raw materials used) and fired under the temperature conditions shown in Table 1. We conducted coefficient measurements and thermal shock resistance tests. The results are also shown in Table 1.
（以下余白）
ｌ
１
ｌ
２
１
３
尚、第１表において予想熱膨張係数とは、石英ガラスを
含有させた場合に、その石英ガラスの熱膨張係数（ ０
．５Ｘ１０−６゜Ｃ−１）とその添加量とに基づいて、
加成性により釉全体の熱膨張係数が下がるとした場合の
予想熱膨張係数を意味している。(Left below) l 1 l 2 1 3 In Table 1, the expected coefficient of thermal expansion means the coefficient of thermal expansion of quartz glass (0
．． 5X10-6°C-1) and its addition amount,
It means the expected coefficient of thermal expansion assuming that the coefficient of thermal expansion of the entire glaze decreases due to additivity.
この結果から、生威した釉全体の熱膨張係数は予想され
る値より飛躍的に低下しており、従ってまた耐熱衝豪性
能も飛躍的に向上していることが解る。From these results, it can be seen that the thermal expansion coefficient of the whole glaze that has survived has been dramatically lowered than the expected value, and that the heat impact resistance has also been dramatically improved.
尚、素地としては第２表（Ａ）の■．■，■を用いた場
合にも結果は素地■の場合とほぼ同様であった。In addition, as for the base material, ■. of Table 2 (A) is used. When using ■ and ■, the results were almost the same as when using the substrate ■.
以上本発明の実施例を詳述したが、本発明はその他の態
様で実施することも可能である。Although the embodiments of the present invention have been described in detail above, the present invention can also be implemented in other embodiments.
例えば本発明の釉の用途として電気調理器用天板を例示
したが、本発明はその他各種用途に供される施釉製品に
も適用可能であるし、釉薬剤の組或も上記例示した以外
の種々の組或が可能であるなど、本発明はその主旨を逸
脱しない範囲において、当業者の知識に基づき様々な変
更を加えた態ｌ ４
様において実施可能てある。For example, although a top plate for an electric cooker has been exemplified as a use of the glaze of the present invention, the present invention is also applicable to glazed products for various other uses, and the combination of glaze agents and other types of glazes other than those exemplified above are also applicable. The present invention can be implemented in various modifications based on the knowledge of those skilled in the art without departing from the spirit thereof.
Claims (5)
分とし、且つＳｉＯ＿２成分の少なくとも一部として石
英ガラス等の非晶質ＳｉＯ＿２を含有させて成ることを
特徴とする釉薬剤。(1) A glaze agent comprising SiO_2, Al_2O_3, and Li_2O as main components, and containing amorphous SiO_2 such as quartz glass as at least a part of the SiO_2 component.
重量％でＳｉＯ＿２：５０〜８５％、Ａｌ＿２Ｏ＿３：
５〜２５％、Ｌｉ＿２Ｏ：２〜２０％の各量範囲で含有
させ、且つＳｉＯ＿２成分の少なくとも一部として石英
ガラス等の非晶質ＳｉＯ＿２を含有させて成ることを特
徴とする釉薬剤。(2) SiO_2, Al_2O_3, and Li_2O in weight%, respectively: SiO_2: 50-85%, Al_2O_3:
A glaze agent characterized by containing 5 to 25% of Li_2O and 2 to 20% of Li_2O, and containing amorphous SiO_2 such as quartz glass as at least a part of the SiO_2 component.
％以下の範囲で含有させて成ることを特徴とする請求（
１）又は（２）に記載の釉薬剤。(3) A claim (
The glaze agent according to 1) or (2).
重量％の範囲で含有させて成ることを特徴とする請求項
（１）又は（２）に記載の釉薬剤。(4) 3 to 40% of amorphous SiO_2 such as quartz glass
The glaze agent according to claim 1 or 2, characterized in that the glaze agent is contained in a range of % by weight.
分とする釉薬剤を被施釉物表面に施して焼成することに
より該被施釉物表面に釉を形成するに際して、該釉薬剤
の成分として石英ガラス等の非晶質ＳｉＯ＿２を被施釉
物表面に施し、焼成時に該石英ガラス等の非晶質ＳｉＯ
＿２と他成分とを反応させて低熱膨張物質を析出させる
ことを特徴とする釉の形成方法。(5) When forming a glaze on the surface of an object to be glazed by applying a glaze agent containing SiO_2, Al_2O_3, and Li_2O as main components to the surface of the object to be glazed and firing it, a non-alloy such as quartz glass is used as a component of the glaze agent. Crystalline SiO_2 is applied to the surface of the glazed object, and amorphous SiO such as quartz glass is applied during firing.
A method for forming a glaze, characterized by reacting _2 with other components to precipitate a low thermal expansion substance.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29847889A JPH03159933A (en) | 1989-11-16 | 1989-11-16 | Glaze and method for glazing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29847889A JPH03159933A (en) | 1989-11-16 | 1989-11-16 | Glaze and method for glazing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03159933A true JPH03159933A (en) | 1991-07-09 |
| JPH0582335B2 JPH0582335B2 (en) | 1993-11-18 |
Family
ID=17860219
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29847889A Granted JPH03159933A (en) | 1989-11-16 | 1989-11-16 | Glaze and method for glazing |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03159933A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7591918B2 (en) * | 2002-06-17 | 2009-09-22 | Hitachi Metals, Ltd. | Ceramic honeycomb structure and its production method and coating material used therefor |
-
1989
- 1989-11-16 JP JP29847889A patent/JPH03159933A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7591918B2 (en) * | 2002-06-17 | 2009-09-22 | Hitachi Metals, Ltd. | Ceramic honeycomb structure and its production method and coating material used therefor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0582335B2 (en) | 1993-11-18 |
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