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JPH03159180A - Optical semiconductor device - Google Patents

Optical semiconductor device

Info

Publication number
JPH03159180A
JPH03159180A JP1298235A JP29823589A JPH03159180A JP H03159180 A JPH03159180 A JP H03159180A JP 1298235 A JP1298235 A JP 1298235A JP 29823589 A JP29823589 A JP 29823589A JP H03159180 A JPH03159180 A JP H03159180A
Authority
JP
Japan
Prior art keywords
layer
semiconductor device
photoelectric conversion
optical semiconductor
ground potential
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1298235A
Other languages
Japanese (ja)
Other versions
JP2763628B2 (en
Inventor
Masayuki Yamaguchi
正之 山口
Masaki Taniguchi
谷口 正記
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP1298235A priority Critical patent/JP2763628B2/en
Publication of JPH03159180A publication Critical patent/JPH03159180A/en
Application granted granted Critical
Publication of JP2763628B2 publication Critical patent/JP2763628B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To obtain excellent noise resistance having an excellent shielding effect by adding a layer for transmitting a light on the surface of a photoelectric converter, leading an electrode wiring from the layer, and connecting its potential to a ground potential. CONSTITUTION:In an only a photoelectric convertor 6 or an optical semiconductor device having the converter 6 integrated with an amplifier, a layer 7 for transmitting a light to the PN junction surface of the converter 6 is added to the entire surface, an electrode wiring is led from the layer 7, and its potential is connected to a ground potential. For example, N-type region 5 is formed on a P-type substrate 4, a photoelectric converter 4 is formed, and a shielding layer 7 is added in a stripe state to the converter 6. The width of the stripe is 100mum, a region having no stripe is 200mum, an electrode wiring is led from the layer 7, connected to an outer lead via an Au wire, etc., and connected to a ground potential. The layer 7 is formed of an sp layer of a layer for transmitting a light to provide 90% of transmittance to an infrared ray.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は光電変換部のみもしくは光電変換部と増幅回路
部が一体化された光半導体装置に関するもので、光電変
換部の表面にアース電位に接続される層を全面もしくは
一部に付設して、シールド効果をもたせることで、耐ノ
イズ性を要求される産業用光半導体装置を提供するもの
である。
[Detailed Description of the Invention] Industrial Application Field The present invention relates to an optical semiconductor device in which only a photoelectric conversion section or a photoelectric conversion section and an amplifier circuit section are integrated, and the surface of the photoelectric conversion section is connected to a ground potential. The present invention provides an industrial optical semiconductor device that requires noise resistance by attaching a layer to the entire surface or a part thereof to provide a shielding effect.

従来の技術 耐ノイズ性を要求される産業機器に光半導体が用いられ
る場合、これまでは第3図に示すように光半導体装置1
の周辺を金属板2もしくは導電性フィルムなどの材料で
囲み、アース電位に接続する構造でシールド効果をもた
らしていた。かかる構造では光電変換部の領域に開口部
3を設ける必要があり、この開口部を通して周辺ノイズ
を受けやすい欠点を有していた。
Conventional technology When optical semiconductors are used in industrial equipment that requires noise resistance, the optical semiconductor device 1 has been used as shown in Fig. 3.
The surrounding area is surrounded by a material such as a metal plate 2 or a conductive film, and the structure is connected to ground potential to provide a shielding effect. In such a structure, it is necessary to provide an opening 3 in the area of the photoelectric conversion section, which has the disadvantage that ambient noise is easily received through this opening.

発明が解決しようとする課題 シールド効果をもたらす従来の構造では、光半導体装置
の周辺に導電性材料を個別に付設する必要があり、手間
と取り付はコストがかかるという問題があった。また、
光電変換部の領域に開口部を設ける必要があり、耐ノイ
ズ性の向上がむずかしいという問題があった。
Problems to be Solved by the Invention In the conventional structure that provides a shielding effect, it is necessary to separately attach a conductive material around the optical semiconductor device, which poses a problem in that it is laborious and costly to install. Also,
Since it is necessary to provide an opening in the area of the photoelectric conversion section, there is a problem in that it is difficult to improve noise resistance.

課題を解決するための手段 上記の問題点を解決するために、本発明は、光半導体装
置の光電変換部の表面に光を透過するシールド層を新た
に付設し、かつその層から電極配線を引出し、その電位
をアース電位に接続することでシールド効果を大幅に向
上させる新しい構造のものである。
Means for Solving the Problems In order to solve the above-mentioned problems, the present invention adds a new shield layer that transmits light to the surface of the photoelectric conversion section of an optical semiconductor device, and connects electrode wiring from that layer. It has a new structure that greatly improves the shielding effect by drawing out the wire and connecting its potential to ground potential.

作用 本発明による新しいシールド構造によれば、光電変換部
のチップ表面に直接シールド層を付設するため後工程で
シールドの手間がいらないとともに、光を透過する層を
用いることで金属板のような開口部も不要であり、シー
ルド層の電位をアース電位に接続することで耐ノイズ性
を大幅に向上させることが可能となった。
Function: According to the new shield structure of the present invention, since the shield layer is attached directly to the chip surface of the photoelectric conversion section, there is no need for shielding in the subsequent process, and by using a layer that transmits light, it is possible to form an opening like a metal plate. By connecting the potential of the shield layer to the ground potential, noise resistance can be greatly improved.

実施例 本発明による一実施例を第1図に示す。(a)は本半導
体装置の光電変換部近傍の断面図を示し、(b)は平面
図を示す。P型基板4にN型領域5が形成されて光電変
換部6を構成している。光電変換部6は通常エピタキシ
ャル層がむきだしになっており、かつ回路の入力に接続
されているためコモンモードノイズを受けると誤動作を
引き起こしやすい問題があった。本発明では光電変換部
6の表面にシールド層7がストライプ状に新たに付設し
である。ストライプ幅は100μmで、ストライプのな
い領域を200μmにしである。このシールド層から電
極配線を引出し外部リード部にAuワイヤなどで接続し
アース電位につないでいる。シールド層は光を透過する
層であるsp層にて形成しており、本実施例では赤外光
に対し90%の透過率を有するため、光感度を低下させ
ることなくシールド効果を大幅に向上させている。
Embodiment An embodiment according to the present invention is shown in FIG. (a) shows a cross-sectional view of the vicinity of the photoelectric conversion section of the present semiconductor device, and (b) shows a plan view. An N-type region 5 is formed on a P-type substrate 4 to constitute a photoelectric conversion section 6 . Since the photoelectric conversion section 6 usually has an exposed epitaxial layer and is connected to the input of the circuit, there is a problem that common mode noise tends to cause malfunction. In the present invention, a shield layer 7 is newly attached to the surface of the photoelectric conversion section 6 in the form of a stripe. The stripe width is 100 μm, and the area without stripes is 200 μm. Electrode wiring is drawn out from this shield layer and connected to an external lead portion with an Au wire or the like and connected to ground potential. The shield layer is formed of an SP layer that transmits light, and in this example, it has a transmittance of 90% for infrared light, so the shielding effect is greatly improved without reducing photosensitivity. I'm letting you do it.

本発明の他の実施例としてチップ平面図を第2図に示す
。光電変換部は全面シールド層7を付設しており、アー
ス電位にシールド層が接続されている。本実施例では光
電変換部6と増幅回路部8が1チツプ内に付設された集
積回路チップ9を用いており、リードフレームにワイヤ
結線をしたのちその周辺を透明樹脂にて封止された光半
導体装置の構成となっている。
FIG. 2 shows a plan view of a chip as another embodiment of the present invention. The photoelectric conversion section is provided with a shield layer 7 over the entire surface, and the shield layer is connected to the ground potential. This embodiment uses an integrated circuit chip 9 in which a photoelectric conversion section 6 and an amplifier circuit section 8 are attached in one chip, and after wire connection is made to a lead frame, the periphery is sealed with transparent resin. It has the configuration of a semiconductor device.

発明の効果 本発明に示したように光電変換部の表面の一部もしくは
全面にシールド層を付設しアース電位に接続することで
、シールド効果のすぐれた耐ノイズ性の良好な光半導体
装置を提供することができる。かかる方法により、誤動
作のない装置を容易に実現できる。
Effects of the Invention As shown in the present invention, by attaching a shield layer to a part or the entire surface of the photoelectric conversion part and connecting it to the ground potential, an optical semiconductor device with excellent shielding effect and good noise resistance is provided. can do. With such a method, it is possible to easily realize a device that does not malfunction.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例であり、(a)は光電変換部
の断面図を、(b)は平面図、第2図は本発明の他の実
施例を示す平面図、第3図は従来の光半導体装置を示゛
す断面図である。 4・・・・・・P型基板、5・・・・・・N型領域、6
・・・・・・光電変換部、7・・・・・・シールド層。
FIG. 1 shows one embodiment of the present invention, (a) is a cross-sectional view of a photoelectric conversion section, (b) is a plan view, FIG. 2 is a plan view showing another embodiment of the present invention, and FIG. The figure is a sectional view showing a conventional optical semiconductor device. 4...P-type substrate, 5...N-type region, 6
. . . Photoelectric conversion section, 7 . . . Shield layer.

Claims (2)

【特許請求の範囲】[Claims] (1)光電変換部のみもしくは光電変換部と増幅回路部
が一体化された光半導体装置において、前記光電変換部
のPN接合表面に光を透過する層を全面に付設し、かつ
その層から電極配線を引出し、その電位をアース電位に
接続することを特徴とする光半導体装置。
(1) In an optical semiconductor device in which only a photoelectric conversion section or a photoelectric conversion section and an amplifier circuit section are integrated, a layer that transmits light is attached to the entire surface of the PN junction surface of the photoelectric conversion section, and an electrode is formed from the layer. An optical semiconductor device characterized by drawing out wiring and connecting its potential to ground potential.
(2)光電変換部のPN接合の表面の一部にストライプ
状、メッシュ状もしくは放射状の層を付設してアース電
位に接続することを特徴とする光半導体装置。
(2) An optical semiconductor device characterized in that a stripe-like, mesh-like, or radial layer is attached to a part of the surface of the PN junction of the photoelectric conversion part and connected to a ground potential.
JP1298235A 1989-11-16 1989-11-16 Optical semiconductor device Expired - Lifetime JP2763628B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1298235A JP2763628B2 (en) 1989-11-16 1989-11-16 Optical semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1298235A JP2763628B2 (en) 1989-11-16 1989-11-16 Optical semiconductor device

Publications (2)

Publication Number Publication Date
JPH03159180A true JPH03159180A (en) 1991-07-09
JP2763628B2 JP2763628B2 (en) 1998-06-11

Family

ID=17856985

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1298235A Expired - Lifetime JP2763628B2 (en) 1989-11-16 1989-11-16 Optical semiconductor device

Country Status (1)

Country Link
JP (1) JP2763628B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6160253A (en) * 1997-10-01 2000-12-12 Matsushita Electronics Corporation Photo detector having a plurality of semiconductor layers
US6208447B1 (en) 1997-02-25 2001-03-27 Matsushita Electric Industrial Co., Ltd. Optical receiver

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6411557U (en) * 1987-07-08 1989-01-20
JPS6437061A (en) * 1987-07-31 1989-02-07 Nec Corp Photodetector
JPH02275680A (en) * 1989-04-17 1990-11-09 Nec Corp Optical semiconductor integrated circuit device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6411557U (en) * 1987-07-08 1989-01-20
JPS6437061A (en) * 1987-07-31 1989-02-07 Nec Corp Photodetector
JPH02275680A (en) * 1989-04-17 1990-11-09 Nec Corp Optical semiconductor integrated circuit device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6208447B1 (en) 1997-02-25 2001-03-27 Matsushita Electric Industrial Co., Ltd. Optical receiver
KR100527969B1 (en) * 1997-02-25 2006-01-27 마츠시타 덴끼 산교 가부시키가이샤 Optical receiver
US6160253A (en) * 1997-10-01 2000-12-12 Matsushita Electronics Corporation Photo detector having a plurality of semiconductor layers
KR100575098B1 (en) * 1997-10-01 2006-08-11 마츠시타 덴끼 산교 가부시키가이샤 Receiver

Also Published As

Publication number Publication date
JP2763628B2 (en) 1998-06-11

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