[go: up one dir, main page]

JPH03146689A - Solder and tin plating solution - Google Patents

Solder and tin plating solution

Info

Publication number
JPH03146689A
JPH03146689A JP28555889A JP28555889A JPH03146689A JP H03146689 A JPH03146689 A JP H03146689A JP 28555889 A JP28555889 A JP 28555889A JP 28555889 A JP28555889 A JP 28555889A JP H03146689 A JPH03146689 A JP H03146689A
Authority
JP
Japan
Prior art keywords
plating
alcohol
plating solution
brightener
solder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP28555889A
Other languages
Japanese (ja)
Inventor
Susumu Nishiwaki
進 西脇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Renesas Semiconductor Manufacturing Co Ltd
Kansai Nippon Electric Co Ltd
Original Assignee
Renesas Semiconductor Manufacturing Co Ltd
Kansai Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renesas Semiconductor Manufacturing Co Ltd, Kansai Nippon Electric Co Ltd filed Critical Renesas Semiconductor Manufacturing Co Ltd
Priority to JP28555889A priority Critical patent/JPH03146689A/en
Publication of JPH03146689A publication Critical patent/JPH03146689A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electroplating And Plating Baths Therefor (AREA)

Abstract

PURPOSE:To improve the throwing power of plating and to reduce the rate of rejects by regulating the concn. of alcohol in a solder and tin plating soln. contg. a brightener as an org. acid bath to a specified range. CONSTITUTION:A brightener is dissolved in alcohol, mixed with a surfactant and added to a plating soln. as a liq. The concn. of the alcohol in the resulting solder and tin plating soln. contg. the brightener as an org. acid bath is regulated to a low level of 0-15ml/l. When the plating soln. is used, throwing power of plating is improved and ununiformity in thickness of plating on a body to be plated can be reduced in spite of its complex shape. In case of barrel plating, bodies to be plated can be prevented from sticking to each other and getting entangled.

Description

【発明の詳細な説明】 星粟上立且且分圧 この発明は、表面処理のうち、湿式電気メッキ法で半日
または錫メッキを行う際に用いる半田メッキ液及び錫メ
ッキ液に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a solder plating solution and a tin plating solution used when carrying out half-day or tin plating using a wet electroplating method among surface treatments.

従来二皮雄 電気メッキ法による錫、半田メッキのメッキ液には、光
沢剤の添加が必要である。光沢剤は、そのままではメッ
キ液に溶けないので、−度アルコールに溶かした後、界
面活性剤を加え、液体としてメッキ液に投入している。
It is necessary to add a brightener to the plating solution for tin and solder plating using the conventional two-skin electroplating method. Since the brightener does not dissolve in the plating solution as it is, it is dissolved in alcohol, a surfactant is added, and the liquid is poured into the plating solution.

従来、光沢剤そのもののメッキ液中での濃度は、規格を
設定し管理しているが、同時にメッキ液に入うてしまう
アルコールについては、明確な規定がなく、60〜80
WL1/!の間で変動していた。
Conventionally, standards have been set and managed for the concentration of the brightener itself in the plating solution, but there are no clear regulations regarding the alcohol that enters the plating solution, and the concentration is between 60 and 80%.
WL1/! It fluctuated between.

しかし、従来のメッキ液では、被メッキ物の形状・寸法
によっては、メッキの均一電着性が悪く、バレルメッキ
に於いては、被メッキ物どうしが、メッキによってくっ
ついてしまうことが多かった。例えば、第3図に示すよ
うに、2本のリード1,1がハトメ2にガラス3を介し
て封止されている時計用の水晶振動子用気密端子の場合
は、そのような傾向が顕著であった。また、これらの不
具合は変動が大きく、メッキ液を建浴したり、調整した
りすると、急に悪化していた。
However, with conventional plating solutions, uniform electrodeposition of plating is poor depending on the shape and size of the objects to be plated, and in barrel plating, objects to be plated often stick together due to plating. For example, as shown in Fig. 3, such a tendency is noticeable in the case of an airtight terminal for a watch crystal oscillator, in which two leads 1, 1 are sealed to an eyelet 2 through a glass 3. Met. Furthermore, these problems were highly variable and suddenly worsened when the plating solution was prepared or adjusted.

;   2の 変動要因について徹底的に調査の結果、不具合の原因は
、メッキ液中のアルコールにあることが分かった。
As a result of a thorough investigation into the variable factor 2, it was found that the cause of the problem was the alcohol in the plating solution.

この発明は、このような知見に基づいて、上記の問題点
を解決する為に、メッキ液中のアルコール濃度を0〜1
5w1/ノに規定するものである。
Based on this knowledge, this invention aims to solve the above problems by increasing the alcohol concentration in the plating solution from 0 to 1.
5w1/no.

その方法として、■光沢剤をアルコールに溶解する時に
、飽和量の80〜90%まで溶解する。
The method is as follows: (1) When the brightener is dissolved in alcohol, it is dissolved to 80 to 90% of the saturation amount.

■界面活性剤を加えた後は、アルコールは不要となるの
で、この溶液をばっ気するなどして、アルコールを揮発
する。などがあげられ、この後メッキ液に投入する。
■After adding the surfactant, alcohol is no longer needed, so volatilize the alcohol by aerating the solution. After that, it is added to the plating solution.

■ 上記のアルコール濃度に規定したメッキ液を用いると、
均一電着性が良くなり、複雑な形状のものでも、被メッ
キ物の部位の違いによるメッキ厚のばらつきを小さくす
ることができ、バレルメッキに於いては、被メッキ物ど
うしのくっつき、からまりなどを少なくできる。
■ If you use a plating solution with the alcohol concentration specified above,
Uniform electrodeposition is improved, and variations in plating thickness due to different parts of the plated object can be reduced even when the plated object has a complex shape. etc. can be reduced.

夾胤旌 この発明について図面を用いて説明する。夾胤旌 This invention will be explained using the drawings.

第3図は被メッキ物である水晶振動子用気密端子で、例
えば、φD”2−m、φd=0.2mm、 L=8+a
m程度のものである。これは金属であるリード1とハト
メ2をガラス3で封着した後、金属部分に半田メッキが
施される。第1図は、この気密端子を、アルカノールス
ルホン酸浴で平均電流密度IA/dt/、60分間、S
n:Pb=5:95のバレルメッキ行ったときの、イン
ナーリード1aおよびハトメ2のメッキ厚と、アルコー
ル濃度の関係を示したものである。第2図は、アルコー
ル濃度を変えてメッキ液を建浴したときの不良率の推移
である。
Figure 3 shows an airtight terminal for a crystal oscillator which is to be plated, for example, φD"2-m, φd=0.2mm, L=8+a
It is about m. After the leads 1 and eyelets 2, which are metal, are sealed with glass 3, the metal parts are plated with solder. Figure 1 shows that this hermetic terminal was heated in an alkanol sulfonic acid bath at an average current density IA/dt/ for 60 minutes at
This figure shows the relationship between the plating thickness of the inner lead 1a and the eyelet 2 and the alcohol concentration when barrel plating is performed with n:Pb=5:95. FIG. 2 shows the change in defect rate when plating solutions were prepared with varying alcohol concentrations.

この実施例によれば、メッキ液中のアルコール濃度を1
5d/Jまで小さくすれば、十分なメッキ厚の均一性が
得られ、しかも被メッキ物どうしのメッキ厚のばらつき
も小さくなり、くっつき、からまり等の不良が著しく少
なくなるという利点がある。これは濃度を小さくするこ
とで、アルコールが光沢剤の妨害をあまりしなくなり、
光沢剤本来の働きである均一電着性の向上が発揮できた
のと、光沢剤がうまく働いて、緻密なメッキとなり、気
密端子どうしの摩擦が小さくなり、バレル内での動きが
良くなり、くっつき、からまりが減少したものと推定さ
れる。
According to this example, the alcohol concentration in the plating solution is 1
If it is reduced to 5 d/J, sufficient uniformity of plating thickness can be obtained, and variations in plating thickness between objects to be plated are also reduced, which has the advantage that defects such as sticking and tangling are significantly reduced. This is because by reducing the concentration, the alcohol will not interfere with the brightener as much.
We were able to improve uniform electrodeposition, which is the original function of brighteners, and the brighteners worked well, resulting in dense plating, reducing friction between airtight terminals, and improving movement within the barrel. It is presumed that sticking and tangles have been reduced.

また、この気密端子には、水晶振動子製造の際の要求と
して、インナーリード1aとハトメ2の両方が、メッキ
厚の規格を満足することが必要であるが、第2図より、
アルコール濃度が15wL1/1以下であれば達成でき
る。
In addition, this airtight terminal requires that both the inner lead 1a and the eyelet 2 satisfy the plating thickness standard, as required when manufacturing the crystal resonator, but from Fig. 2,
This can be achieved if the alcohol concentration is 15wL1/1 or less.

また、5n100%の錫メッキ液についても、第1図お
よび第2図と同様に、アルコール濃度を15id#以下
にしたときに好結果が得られた。
Further, with respect to the 5N100% tin plating solution, good results were obtained when the alcohol concentration was set to 15id# or less, as in FIGS. 1 and 2.

免肌Δ炊敦 以上説明したように、この発明はメッキ液中のアルコー
ル濃度を0〜15d#と規定したことにより、メッキの
均一電着性を向上させ、不良率を小さくすることができ
る。又アルコール濃度を小すい方に規定することにより
、アルコールの、揮発による濃度変動も小さくなり、安
定した品質のものが得られるようになった。
As explained above, in the present invention, by specifying the alcohol concentration in the plating solution to 0 to 15 d#, it is possible to improve the uniform electrodeposition of plating and reduce the defective rate. Furthermore, by regulating the alcohol concentration to a smaller value, fluctuations in concentration due to alcohol volatilization are also reduced, making it possible to obtain products of stable quality.

その他、従来は均一電着性を良くする方法として、メッ
キ電流密度を小さくする方法をとっていたが、そうする
と、メッキ時間を長くしなければならなかった。上記の
メッキ液を用いれば、電流密度を小さくしなくてもよく
、作業性が向上する。
In addition, a conventional method for improving uniform electrodeposition was to reduce the plating current density, but this required a longer plating time. If the above-mentioned plating solution is used, the current density does not need to be reduced, and workability is improved.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、気密端子をメッキした時のアルコール濃度と
、インナーリード1aおよびハトメ2のメッキ厚の関係
を示した特性図である。 第2図は、アルコール濃度を変えてメッキ液を建浴し、
気密端子をメッキした時の不良率の推移図である。 第3図は、この発明を実施した時に被メッキ物として用
いた水晶振動子用気密端子の斜視図であ75 6o    45 アルコール5襄漫 0 (机1/l ) ]5 第 ] 図 ロット
FIG. 1 is a characteristic diagram showing the relationship between the alcohol concentration and the plating thickness of the inner lead 1a and the eyelet 2 when the airtight terminal is plated. Figure 2 shows the plating solution prepared by changing the alcohol concentration.
FIG. 3 is a graph showing the change in defective rate when plating airtight terminals. Figure 3 is a perspective view of an airtight terminal for a crystal resonator used as an object to be plated when this invention was put into practice.

Claims (1)

【特許請求の範囲】 1、光沢剤を含む有機酸浴半田メッキ液において、アル
コール濃度を0〜15ml/lに規定したことを特徴と
する半田メッキ液。 2、光沢剤を含む有機酸浴錫メッキ液において、アルコ
ール濃度を0〜15ml/lに規定したことを特徴とす
る錫メッキ液。
[Scope of Claims] 1. A solder plating solution in an organic acid bath containing a brightener, characterized in that the alcohol concentration is regulated to 0 to 15 ml/l. 2. An organic acid bath tin plating solution containing a brightener, characterized in that the alcohol concentration is regulated to 0 to 15 ml/l.
JP28555889A 1989-10-31 1989-10-31 Solder and tin plating solution Pending JPH03146689A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28555889A JPH03146689A (en) 1989-10-31 1989-10-31 Solder and tin plating solution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28555889A JPH03146689A (en) 1989-10-31 1989-10-31 Solder and tin plating solution

Publications (1)

Publication Number Publication Date
JPH03146689A true JPH03146689A (en) 1991-06-21

Family

ID=17693104

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28555889A Pending JPH03146689A (en) 1989-10-31 1989-10-31 Solder and tin plating solution

Country Status (1)

Country Link
JP (1) JPH03146689A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109518233A (en) * 2018-11-27 2019-03-26 东莞美坚化工原料有限公司 A kind of conducting solution and preparation method thereof preventing miniature electronic component bonding die
CN109596681A (en) * 2017-09-30 2019-04-09 上海梅山钢铁股份有限公司 A kind of detection method of tin methane sulfonate system electroplate liquid covering power

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4921212A (en) * 1972-06-16 1974-02-25
JPS5333942A (en) * 1976-09-10 1978-03-30 Ooku Entaa Puraizu Kk Process for fabricating automobile wheel rim of aluminum alloys
JPS5832237A (en) * 1981-08-20 1983-02-25 Matsushita Electric Ind Co Ltd Optical pickup device
JPS5967387A (en) * 1982-10-08 1984-04-17 Hiyougoken Tin, lead and tin-lead alloy plating bath
JPS602396A (en) * 1983-06-20 1985-01-08 Mitsubishi Paper Mills Ltd Fixable-type thermal recording material
JPS609115A (en) * 1983-06-29 1985-01-18 株式会社東芝 Method of producing eectret
JPS60245797A (en) * 1984-05-18 1985-12-05 Nippon Steel Corp Non-aqueous electroplating liquid and its manufacturing method
JPS6148589A (en) * 1984-08-16 1986-03-10 Keigo Obata Tin-lead alloy plating bath

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4921212A (en) * 1972-06-16 1974-02-25
JPS5333942A (en) * 1976-09-10 1978-03-30 Ooku Entaa Puraizu Kk Process for fabricating automobile wheel rim of aluminum alloys
JPS5832237A (en) * 1981-08-20 1983-02-25 Matsushita Electric Ind Co Ltd Optical pickup device
JPS5967387A (en) * 1982-10-08 1984-04-17 Hiyougoken Tin, lead and tin-lead alloy plating bath
JPS602396A (en) * 1983-06-20 1985-01-08 Mitsubishi Paper Mills Ltd Fixable-type thermal recording material
JPS609115A (en) * 1983-06-29 1985-01-18 株式会社東芝 Method of producing eectret
JPS60245797A (en) * 1984-05-18 1985-12-05 Nippon Steel Corp Non-aqueous electroplating liquid and its manufacturing method
JPS6148589A (en) * 1984-08-16 1986-03-10 Keigo Obata Tin-lead alloy plating bath

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109596681A (en) * 2017-09-30 2019-04-09 上海梅山钢铁股份有限公司 A kind of detection method of tin methane sulfonate system electroplate liquid covering power
CN109596681B (en) * 2017-09-30 2021-07-09 上海梅山钢铁股份有限公司 Method for detecting uniform plating capacity of tin methanesulfonate electroplating solution
CN109518233A (en) * 2018-11-27 2019-03-26 东莞美坚化工原料有限公司 A kind of conducting solution and preparation method thereof preventing miniature electronic component bonding die

Similar Documents

Publication Publication Date Title
DE602004000179T2 (en) Tin or tin alloy electroplating on composite substrates
JPH06173074A (en) Electroplated alloy of gold, copper and silver
JPH03146689A (en) Solder and tin plating solution
AU8979391A (en) Method for forming a sieve material having low internal stress and sieve material so obtained
DE2027156C3 (en) Process for anodic polishing of niobium parts
DE2508130A1 (en) GOLD-PLATINUM PLATING BATH
JP2005510632A (en) Silver-tin alloy electrodeposition electrolytic cell
CA2377953A1 (en) Method for electrolytic coloring of aluminum material
JPH11181589A (en) Tin alloy electroplating solution and plating method
US2409983A (en) Electrodeposition of indium
SU467145A1 (en) Electrolyte for precipitation of tin-bismuth alloy
JPH0423000B2 (en)
SE8106495L (en) COMPOSITION AND PROCEDURE FOR GALVANIC QUICK EXPOSURE OF SILVER
SU396431A1 (en) „::; MAJOR
US2900314A (en) Bright plating solution and method
JPH02254200A (en) Plating metal amount adjusting tank, plating device using the same and method for replenishing plating metal
JPS63297583A (en) Manufacture of high-purity electrolytic copper
KR940019888A (en) Electrodeposition method of high density reflective tin or tin-lead alloy and solution therefor
JP3401117B2 (en) Method for preventing increase of zinc ion concentration in alkaline zinc plating bath
SU380749A1 (en) METHOD OF ELECTROLYTIC DEPOSITION OF A TIN-ALLOY ALLOY
GB799280A (en) Improvements relating to the electro-deposition of lead-indium alloys
SU87594A1 (en) Electrolytic galvanizing method in alkaline electrolytes
SU58095A1 (en) Method of preparing acidic electrolyte for tinning
GB2093069A (en) Gold electroplating bath and process
JPH06336693A (en) Anodic oxidation and device therefor