JPH03122276A - Continuous vacuum deposition device - Google Patents
Continuous vacuum deposition deviceInfo
- Publication number
- JPH03122276A JPH03122276A JP26015989A JP26015989A JPH03122276A JP H03122276 A JPH03122276 A JP H03122276A JP 26015989 A JP26015989 A JP 26015989A JP 26015989 A JP26015989 A JP 26015989A JP H03122276 A JPH03122276 A JP H03122276A
- Authority
- JP
- Japan
- Prior art keywords
- roll
- substrate
- chamber
- seal
- rolls
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001771 vacuum deposition Methods 0.000 title description 3
- 239000000758 substrate Substances 0.000 claims abstract description 46
- 238000007740 vapor deposition Methods 0.000 claims abstract description 27
- 238000007789 sealing Methods 0.000 claims abstract description 13
- 238000001704 evaporation Methods 0.000 claims description 14
- 230000008020 evaporation Effects 0.000 claims description 14
- 238000007738 vacuum evaporation Methods 0.000 claims description 9
- 230000008021 deposition Effects 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 4
- 238000003860 storage Methods 0.000 claims description 3
- 230000006837 decompression Effects 0.000 claims description 2
- 230000000630 rising effect Effects 0.000 claims description 2
- 239000011888 foil Substances 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000002985 plastic film Substances 0.000 description 5
- 229920006255 plastic film Polymers 0.000 description 5
- 238000000151 deposition Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000000123 paper Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 206010040954 Skin wrinkling Diseases 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はプラスチックフィルム、紙及び金属箔等の薄く
、かつ傷つきやすい基板等の走行基板に連続的に真空蒸
着を施す装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an apparatus for continuously performing vacuum deposition on running substrates such as thin and easily damaged substrates such as plastic films, paper, and metal foils.
従来、プラスチックフィルム、紙及び金属箔等に対する
真空蒸着は予めコイル状に巻いた基板を真空容器内に装
填し、真空容器を充分排気した後、該基板を走行、蒸着
する方式で、1コイル毎に真空引き、加熱、走行、蒸着
、大気解放を繰返すバッチ方式であった。このバッチ方
式は生産性が悪く連続化の要求が高まっている。Conventionally, vacuum evaporation of plastic films, paper, metal foils, etc. is performed by loading a coiled substrate into a vacuum container, and after thoroughly evacuating the vacuum container, the substrate is moved and evaporated, one coil at a time. It was a batch method in which vacuuming, heating, running, vapor deposition, and release to atmosphere were repeated. This batch method has poor productivity and there is an increasing demand for continuous production.
第4図は鋼板などの基板を大気中から連続して真空中に
供給するための差動排気システムを蒸着室前後に付加し
た従来の真空蒸着装置の一態様を示す図である。第4図
において、蒸着室2はシールロールlla、llb、l
lc−・で仕切られ、それぞれ排気ポンプユニット13
と接続されている圧力室12a、12b。FIG. 4 is a diagram showing an embodiment of a conventional vacuum evaporation apparatus in which a differential pumping system is added before and after a evaporation chamber for continuously supplying substrates such as steel plates from the atmosphere into a vacuum. In FIG. 4, the deposition chamber 2 includes seal rolls lla, llb, l.
lc-, each having an exhaust pump unit 13.
Pressure chambers 12a, 12b connected to the pressure chambers 12a, 12b.
12c・・・からなる入側シール装置9と、同様な構成
の出側シール装置10を前後に接続され、大気側から蒸
着室2までシールロール11a、llb、lie・ ・
の抵抗による圧力勾配の発生によって所定の真空度に保
持される。An inlet sealing device 9 consisting of 12c... and an outlet sealing device 10 having a similar configuration are connected back and forth, and seal rolls 11a, llb, lie...
A predetermined degree of vacuum is maintained by the generation of a pressure gradient due to the resistance.
基板1は大気中から入側シール装置9を経て蒸着室2に
撤退され、冷却ロール4で蒸着時の温度上昇を減するよ
う冷却されながら蒸着装置5により蒸着された後、出側
シール装置10を経て大気中に搬出されることになる。The substrate 1 is withdrawn from the atmosphere to the vapor deposition chamber 2 via the inlet sealing device 9, and is vapor-deposited by the vapor deposition device 5 while being cooled by the cooling roll 4 to reduce the temperature rise during vapor deposition. It will then be carried out into the atmosphere.
蒸着装置5は蒸着材6、これを収納する収納容器7及び
該容器7の加熱装置9から構成され、蒸着材6を走行基
板1に向は蒸発させる。3はデフレフクロールである。The vapor deposition device 5 includes a vapor deposition material 6, a storage container 7 for storing the vapor deposition material 6, and a heating device 9 for the container 7, and evaporates the vapor deposition material 6 toward the running substrate 1. 3 is a deflation crawl.
上述したような連続真空蒸着装置が、プラスチックフィ
ルム、紙及び金属箔などの薄く、かつ傷つきやすい基板
に対して実施されていない要因として下記の点があげら
れる。The following points can be cited as reasons why the continuous vacuum evaporation apparatus as described above has not been applied to thin and easily damaged substrates such as plastic films, paper, and metal foils.
(1)鋼板を対象とした装置ではシールロールにより走
行基板をピンチし、各圧力空間のり−り面積を減少させ
る方式を採りうるが、上記のような薄く、かつ傷つきや
すい基板ではピンチにより傷が発生し、製品品質上致命
的な欠陥となるため、このような手法が採用できず、従
って大気側から高真空側へ圧力勾配を発生させるための
排気量が膨大となり排気ポンプ系が非常に大きくなる。(1) In equipment for steel plates, a method can be adopted in which the running board is pinched with a seal roll to reduce the area covered by each pressure space, but with thin and easily damaged boards such as those mentioned above, pinching may cause scratches. This method cannot be adopted because it would be a fatal defect in terms of product quality. Therefore, the exhaust volume required to generate a pressure gradient from the atmospheric side to the high vacuum side would be enormous, making the exhaust pump system extremely large. Become.
(2)圧力室を走行基板が通過する時、圧力室間の隙間
から流れ込む気流により基板がバタツキ、傷、破損の要
因となる。(2) When the traveling board passes through the pressure chambers, the airflow flowing through the gaps between the pressure chambers causes the board to flap, be scratched, and be damaged.
本発明は上記技術水準に鑑み、プラスチックフィルム、
紙及び金属箔等のような薄く、かつ傷つきやすい基板に
、上述した不具合を生じることのなく連続的に真空蒸着
を行うことができる装置を提供しようとするものである
。In view of the above-mentioned technical level, the present invention includes a plastic film,
The present invention aims to provide an apparatus that can continuously perform vacuum deposition on thin and easily damaged substrates such as paper and metal foil without causing the above-mentioned problems.
本発明は基板を連続的に大気中から減圧室を通して蒸着
室内部の冷却ロールに巻きつけ、該蒸着室内下部の蒸着
材収納容器よりの上昇蒸気により真空蒸着を施し、該減
圧室を通って大気中に連続的に蒸着基板を搬出する装置
であって、該減圧室は大気中から上記蒸着室までをシー
ル装置によって複数の差圧室に区切られ、該各シール装
置は同一直線上に並列する少なくとも入側ロールと出側
ロールよりなる1組のシールロール及びその両側に若干
の間隙をあけて上記直線上位置に設けた1対のシールバ
ーによって構成され、かつ入側基板及び出側蒸着基板の
蒸着面がガイドロールによって入側ロール及び出側ロー
ルに一定角度以上の角度で巻きつけられて走行するよう
に構成された連続真空蒸着装置において、出側蒸着基板
を案内するガイドロールをテンデンシーロールとしてな
ることを特徴とする連続真空蒸着装置である。In the present invention, a substrate is continuously passed from the atmosphere into a vacuum chamber, wound around a cooling roll inside the vapor deposition chamber, vacuum vapor deposited using rising steam from a vapor deposition material storage container at the bottom of the vapor deposition chamber, and passed through the vacuum chamber into the atmosphere. A device for continuously transporting deposition substrates into a vacuum chamber, the decompression chamber is divided from the atmosphere to the deposition chamber into a plurality of differential pressure chambers by sealing devices, and each of the sealing devices are arranged in parallel on the same straight line. It is composed of a pair of seal rolls consisting of at least an inlet roll and an outlet roll, and a pair of seal bars arranged on the above-mentioned straight line with a slight gap on both sides thereof, and an inlet substrate and an outlet vapor deposition substrate. In a continuous vacuum evaporation apparatus, the evaporation surface of the substrate is wound around an inlet roll and an outlet roll at a predetermined angle or more by a guide roll. This is a continuous vacuum evaporation device characterized by functioning as a sea roll.
本発明連続真空蒸着装置において、シールロールは少な
くとも入側ロールと出側ロールの2本が最低必要である
が、出側ロールとシールバーの間に更にもう1本のロー
ルを設け、万一出側ロールに対する出側蒸着基板の巻き
つけ不足によって出側蒸着基板が直接シールバーに触れ
て傷がつかないようにすることを好ましい態様とする。In the continuous vacuum evaporation apparatus of the present invention, at least two seal rolls, an inlet roll and an outlet roll, are required. A preferred embodiment is to prevent the exit vapor deposition substrate from directly touching the seal bar and being damaged due to insufficient wrapping of the exit vapor deposition substrate around the side roll.
(1)少なくとも入側ロールと出側ロールよりなる1組
のシールロールに、入側基板及び出側蒸着基板をガイド
ロールによって入側ロール及び出側ロールに一定角度以
上の角度で巻きつけられて走行するようにすることによ
って、シールロール間隙を流れる気流による走行基板の
バタツキを防止できる。(1) At least a set of seal rolls consisting of an inlet roll and an outlet roll, and the inlet substrate and the outlet vapor deposition substrate are wound around the inlet roll and the outlet roll at an angle greater than a certain angle by a guide roll. By allowing the substrate to travel, it is possible to prevent the traveling substrate from fluttering due to the airflow flowing through the gap between the seal rolls.
(2) ガイドロールは基板にスリップによる傷が発
生しないようモータ等で駆動され、その回転数が制御さ
れるが、何らかの外乱による瞬間的微妙な基板速度変化
や、加速、減速時における微妙な速度のずれは避けられ
ず、これに対応して回転数を制御することは極めて困難
であり、蒸着前のプラスチックフィルム、紙及び金属箔
等の非蒸着面に生ずる傷は、ある程度許容されるものの
、蒸着面についてはわずかの傷の発生によっても製品品
質上致命的な欠陥となるので、蒸着を施された後の基板
に対しては、その蒸着面側に配設したガイドロールをテ
ンデンシーロールとし、前記微妙な基板速度変化や、速
度のずれにモータの回転数を制御することなく追従する
ようにして蒸着面に傷を生じさせない。(2) The guide roll is driven by a motor, etc., and its rotation speed is controlled to prevent scratches from slipping on the board, but it may be subject to momentary and subtle changes in board speed due to some disturbance, or subtle speed changes during acceleration or deceleration. Misalignment is unavoidable, and it is extremely difficult to control the rotation speed accordingly.Although scratches that occur on non-evaporated surfaces such as plastic film, paper, and metal foil are tolerable to some extent, Even the slightest scratch on the evaporation surface can be a fatal defect in terms of product quality, so after evaporation has been applied to the substrate, use a guide roll placed on the evaporation surface side as a tendency roll. Then, the delicate substrate speed changes and speed deviations are followed without controlling the rotational speed of the motor, thereby preventing scratches on the deposition surface.
以下、本発明の一実施例を第1図によって詳述する。第
1図中、第4図と同一符号は第4図と同一部を示す。Hereinafter, one embodiment of the present invention will be described in detail with reference to FIG. In FIG. 1, the same reference numerals as in FIG. 4 indicate the same parts as in FIG. 4.
第1図において、走行基板1は図示省略の巻出しリール
に取りつけられ、シール装置14に送られる。In FIG. 1, a running board 1 is attached to an unillustrated unwinding reel and sent to a sealing device 14.
該シール装置14は同一直線上に並列する少なくとも2
本1組のシールロール(こ\では3本1組のシールロー
ルを示す)15a、15b。The sealing device 14 has at least two parallel
A set of seal rolls (herein, a set of three seal rolls is shown) 15a, 15b.
15c・・・と、その面側に若干の間隙をあけて上記直
線上位置に設けられた1対のシールパー16a、16b
、16c・ ・よりなるシール装置を複数組間隔を置い
て配設されることによって仕切られた圧力室17.a、
17b、17C・・・を有し、同圧力室17a、17b
。15c... and a pair of sealers 16a, 16b provided on the above-mentioned straight line with a slight gap on the surface side thereof.
, 16c... The pressure chamber 17. is partitioned by a plurality of sealing devices arranged at intervals. a,
17b, 17C..., and the same pressure chambers 17a, 17b
.
17c・・・と接続された排気ポンプユニット13によ
り蒸着室2に至るまで大気側から圧力勾配を発生させ蒸
着室2を所定の真空度に保っている。走行基板lは該シ
ールロール15a。A pressure gradient is generated from the atmospheric side up to the vapor deposition chamber 2 by the exhaust pump unit 13 connected to the vapor deposition chamber 2 to maintain the vapor deposition chamber 2 at a predetermined degree of vacuum. The traveling substrate l is the seal roll 15a.
15b、15c・ ・の3本ロールの内片側2本のロー
ル間隙間を次々と通過し、冷却ロール4上で蒸着装置5
によって蒸発された蒸着材6によって蒸着された後再び
シールロール15a。15b, 15c, .
The seal roll 15a is re-deposited by the evaporation material 6 evaporated by the evaporation process.
15b、15C・・・の3本ロールの内反対何2本のロ
ール間隙間を逆に走行しシール装置14から搬出される
。It travels in the opposite direction through the gaps between two of the three rolls 15b, 15C, . . . and is carried out from the sealing device 14.
18a、18b、18cm ・は各圧力室17a、1
7b、17c・ ・に設けられ蒸着前の走行基板1をシ
ールロール(第1図の15a、15b、15c・・・の
右端のロール)へ一定角度以上の角度で巻きつけるガイ
ドロール、19a、19b、19c・ ・は同じく蒸着
後の走行蒸着基板1をシールロール(第1図の15a、
15b、15cm ・の中央ロール)へ巻きつけるテ
ンデンシーロールである。これらはモータ等で駆動され
走行蒸着基板1と同速になるよう回転数が制御されるよ
うに構成されているものである。18a, 18b, 18cm ・ indicates each pressure chamber 17a, 1
Guide rolls 19a, 19b, which are provided at 7b, 17c, . , 19c, . . . similarly seal the running evaporation substrate 1 after evaporation with a seal roll (15a in FIG. 1,
15b, a 15cm2 central roll). These are driven by a motor or the like, and are configured so that the rotation speed is controlled to be the same speed as the traveling vapor deposition substrate 1.
換言すれば、各テンデンシーロールの回転・周速度は冷
却ロール4と同じ速度になるように制御されている。In other words, the rotational and circumferential speeds of each tension roll are controlled to be the same speed as the cooling roll 4.
テンデンシーロール19a、19b、19c・の−例を
第2図に示す。このものは第2図に示すように、ベアリ
ング22で保持され、例えばモータ24で駆動される小
径ロール20と、その外周にベアリング23を介して保
持される中空ロール21からなっている。An example of the tension rolls 19a, 19b, 19c is shown in FIG. As shown in FIG. 2, this roll consists of a small-diameter roll 20 held by a bearing 22 and driven by, for example, a motor 24, and a hollow roll 21 held on its outer periphery via a bearing 23.
各圧力室17a、17b、17cm・・に配設されたこ
れらのテンデンシーロール19a。These tension rolls 19a are arranged in each pressure chamber 17a, 17b, 17cm, .
19b、19Cにより走行蒸着基板1のシールロール(
第1図の 15a、15b、15cm・の中央ロール)
への巻きつけ角は一定以上が確保されている。19b and 19C seal the seal roll (
15a, 15b, 15cm center roll in Figure 1)
The wrapping angle is ensured to be above a certain level.
走行基板、走行蒸着基板1の巻きつけ角に、第3図に示
すように本発明者等の実験によって10度以上が適当で
あり、10度以上で巻きつければ走行基板及び走行蒸着
基板のバタツキは問題なくなることが確認されている。As shown in FIG. 3, experiments conducted by the present inventors have shown that a wrapping angle of 10 degrees or more is appropriate for the traveling substrate and the traveling vapor deposition substrate 1, and if the wrapping angle is 10 degrees or more, the traveling substrate and the traveling vapor deposition substrate 1 will not fluctuate. It has been confirmed that there will be no problem.
テンデンシーロール19a、19b、19c・は蒸着を
施された後の走行蒸着基板1に対して蒸着面と接する側
に配備されており、前記微妙な基板速度変化や速度のず
れに対して極めて困難な回転数の微妙な制御を行うこと
なく、小径ロール22と中空ロール21のスリップによ
り、これに追従することができる。The tendency rolls 19a, 19b, and 19c are disposed on the side of the running evaporation substrate 1 that contacts the evaporation surface after the evaporation has been performed, and are extremely effective against subtle substrate speed changes and speed deviations. This can be followed by the slip of the small diameter roll 22 and the hollow roll 21 without performing difficult and delicate control of the rotation speed.
シールロール部でのリーク隙間が小さくなるため、シー
ル性能が向上する。また走行基板及び走行蒸着基板が1
0度以上の巻きつき角度でシールロールへ巻きついてい
るためこれら基板のバタツキがなくなり、走行中のしわ
の発生、切断のおそれがない。Sealing performance is improved because the leak gap at the seal roll is reduced. In addition, the traveling substrate and the traveling vapor deposition substrate are 1
Since the substrate is wrapped around the seal roll at a wrapping angle of 0 degrees or more, there is no flapping of these substrates, and there is no risk of wrinkles or cuts during running.
更に走行蒸着基板をシールロールへ巻き付けるにあたり
、その蒸着面側にテンデンシーロールを配設することに
より製品品質上量も重要な蒸着面へのキズを防止できる
。Furthermore, when the traveling vapor deposition substrate is wound around the seal roll, by arranging a tendency roll on the vapor deposition surface side, it is possible to prevent scratches on the vapor deposition surface, which is also important in terms of product quality.
第1図は本発明の一実施例装置の概略図、第2図は本発
明装置に使用するテンデンシーロールの一態様の概略図
、第3図は本発明の効果を示すグラフ、第4図は従来の
連続真空蒸着装置の一態様の概略図である。FIG. 1 is a schematic diagram of a device according to an embodiment of the present invention, FIG. 2 is a schematic diagram of an embodiment of a tendency roll used in the device of the present invention, FIG. 3 is a graph showing the effects of the present invention, and FIG. The figure is a schematic diagram of one embodiment of a conventional continuous vacuum evaporation apparatus.
Claims (1)
の冷却ロールに巻きつけ、該蒸着室内下部の蒸着材収納
容器よりの上昇蒸気により真空蒸着を施し、該減圧室を
通って大気中に連続的に蒸着基板を搬出する装置であっ
て、該減圧室は大気中から上記蒸着室までをシール装置
によって複数の差圧室に区切られ、該各シール装置は同
一直線上に並列する少なくとも入側ロールと出側ロール
よりなる1組のシールロール及びその両側に若干の間隙
をあけて上記直線上位置に設けた1対のシールバーによ
って構成され、かつ入側基板及び出側蒸着基板の蒸着面
がガイドロールによって入側ロール及び出側ロールに一
定角度以上の角度で巻きつけられて走行するように構成
された連続真空蒸着装置において、出側蒸着基板を案内
するガイドロールをテンデンシーロールとしてなること
を特徴とする連続真空蒸着装置。The substrate is continuously passed from the atmosphere into a vacuum chamber, wound around a cooling roll inside the deposition chamber, vacuum-deposited using rising steam from a deposition material storage container at the bottom of the deposition chamber, and then continuously passed through the vacuum chamber into the atmosphere. The decompression chamber is divided from the atmosphere to the deposition chamber into a plurality of differential pressure chambers by a sealing device, and each sealing device is arranged in parallel on the same straight line at least on the entrance side. It consists of a set of seal rolls consisting of a roll and an exit roll, and a pair of seal bars placed on the above-mentioned straight line with a slight gap on both sides of the seal roll, and the vapor deposition surface of the entry side substrate and the exit side evaporation substrate. In a continuous vacuum evaporation device configured to run while being wound around an inlet roll and an outlet roll at an angle greater than a certain angle by a guide roll, the guide roll that guides the outlet evaporation substrate is used as a tendency roll. A continuous vacuum evaporation device characterized by:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1260159A JP2647513B2 (en) | 1989-10-06 | 1989-10-06 | Continuous vacuum deposition equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1260159A JP2647513B2 (en) | 1989-10-06 | 1989-10-06 | Continuous vacuum deposition equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH03122276A true JPH03122276A (en) | 1991-05-24 |
JP2647513B2 JP2647513B2 (en) | 1997-08-27 |
Family
ID=17344139
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1260159A Expired - Fee Related JP2647513B2 (en) | 1989-10-06 | 1989-10-06 | Continuous vacuum deposition equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2647513B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006089782A (en) * | 2004-09-22 | 2006-04-06 | Mitsubishi-Hitachi Metals Machinery Inc | Substrate cooling apparatus and substrate cooling method |
JP2012219322A (en) * | 2011-04-07 | 2012-11-12 | Ulvac Japan Ltd | Winding type film deposition system and winding type film deposition method |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63305142A (en) * | 1987-06-05 | 1988-12-13 | Hitachi Ltd | Vacuum continuous processing equipment |
JPH01212763A (en) * | 1988-02-22 | 1989-08-25 | Mitsubishi Heavy Ind Ltd | Continuous type vacuum deposition device |
-
1989
- 1989-10-06 JP JP1260159A patent/JP2647513B2/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63305142A (en) * | 1987-06-05 | 1988-12-13 | Hitachi Ltd | Vacuum continuous processing equipment |
JPH01212763A (en) * | 1988-02-22 | 1989-08-25 | Mitsubishi Heavy Ind Ltd | Continuous type vacuum deposition device |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006089782A (en) * | 2004-09-22 | 2006-04-06 | Mitsubishi-Hitachi Metals Machinery Inc | Substrate cooling apparatus and substrate cooling method |
JP4664637B2 (en) * | 2004-09-22 | 2011-04-06 | 三菱重工業株式会社 | Substrate cooling apparatus and substrate cooling method |
JP2012219322A (en) * | 2011-04-07 | 2012-11-12 | Ulvac Japan Ltd | Winding type film deposition system and winding type film deposition method |
Also Published As
Publication number | Publication date |
---|---|
JP2647513B2 (en) | 1997-08-27 |
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