JPH03118619A - Temperature control method for thermostatic chamber - Google Patents
Temperature control method for thermostatic chamberInfo
- Publication number
- JPH03118619A JPH03118619A JP25623589A JP25623589A JPH03118619A JP H03118619 A JPH03118619 A JP H03118619A JP 25623589 A JP25623589 A JP 25623589A JP 25623589 A JP25623589 A JP 25623589A JP H03118619 A JPH03118619 A JP H03118619A
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- slope
- control
- difference
- temperature control
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 12
- 239000007788 liquid Substances 0.000 claims description 5
- 230000000630 rising effect Effects 0.000 abstract 3
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 241000862969 Stella Species 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000036962 time dependent Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Testing Resistance To Weather, Investigating Materials By Mechanical Methods (AREA)
- Control Of Temperature (AREA)
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明は、例えば液体クロマトグラフで使用される恒温
槽の温度制御方法に関する。DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a method for controlling the temperature of a constant temperature bath used, for example, in a liquid chromatograph.
〈従来の技術〉
液体クロマトグラフなどで使用される恒温槽の温度を比
例制御(P制御)だけで行なうと、設定温度と検出温度
との間に差がある場合だけ初めて出力が出るため、温度
偏差を生じて永久に設定温度に到達しないという現象が
生ずる。このため、該温度偏差を補うべく積分値を加え
た値を出力する比例積分制御(PI副制御が行われてい
る。この比例積分制御を行なう場合、ヒータに与える熱
量は、いわゆる比例帯や積分時間に依存する温度制御定
数によって決定される。また、所望の設定温度に最も早
く到達させ且つ安定させるためには、恒温槽温度の立上
り時に最適の熱量を恒温槽に供給する必要がある。<Conventional technology> If the temperature of a constant temperature chamber used in a liquid chromatograph is controlled only by proportional control (P control), an output is produced only when there is a difference between the set temperature and the detected temperature. A phenomenon occurs in which deviation occurs and the set temperature is never reached. For this reason, proportional-integral control (PI sub-control) is performed that outputs a value obtained by adding an integral value to compensate for the temperature deviation. When performing this proportional-integral control, the amount of heat given to the heater is determined by It is determined by a time-dependent temperature control constant.In order to reach the desired set temperature as soon as possible and stabilize it, it is necessary to supply the optimum amount of heat to the thermostatic oven at the time of startup of the thermostatic oven temperature.
一方、第2図は従来から行われている恒温槽の温度制御
方法を示す概略説明図であり、図中、横軸は時間(mi
n、)を示し縦軸は測定温度(。On the other hand, FIG. 2 is a schematic explanatory diagram showing a conventional temperature control method for a constant temperature bath. In the figure, the horizontal axis is time (mi
n, ), and the vertical axis is the measured temperature (.
C)を示している。この図において、制御開始時(T1
)に測定温度がt2を示しており、その後、温度制御さ
れて最終的に設定温度t2に至る。即ち、温度面差(t
l−t=2)>微小温度差tdである場合、積分制御動
作を停止しヒータが連続通電となるようにオンオフ制御
を行なう、このようにして、測定温度が(tl ta
)を超え、温度面差(tl t2)<微小温度差td
となった場合、積分動作をスタートさせ比例積分制御を
開始する。従って、制御開始時の温度t2が設定温度t
、から離れていても近接していても温度面差(tl
t2)=微小温度差(t、i )のときから比例積分制
御したのと同様の状態となる。C) is shown. In this figure, at the start of control (T1
), the measured temperature shows t2, and then the temperature is controlled and finally reaches the set temperature t2. That is, the temperature difference (t
If lt = 2) > minute temperature difference td, the integral control operation is stopped and on/off control is performed so that the heater is continuously energized.In this way, the measured temperature becomes (tl ta
), temperature difference (tl t2) < minute temperature difference td
If , the integral operation is started and proportional-integral control is started. Therefore, the temperature t2 at the start of control is the set temperature t
, the temperature difference (tl
When t2)=minimal temperature difference (t, i), a state similar to proportional-integral control is reached.
然しながら、恒温槽温度の立上り時に必要な最適熱量は
設定温度と周囲温度の差の関数になっている(例えば、
周囲温度が5°Cの時と周囲温度が55°Cの時では所
望の設定温度90°Cに安定させるなめに必要な最適熱
量は大きく異なる)。However, the optimal amount of heat required at the start-up of the thermostatic chamber temperature is a function of the difference between the set temperature and the ambient temperature (for example,
The optimal amount of heat required to stabilize the desired set temperature of 90°C is significantly different when the ambient temperature is 5°C and when the ambient temperature is 55°C.)
このなめ、ある条件で最適の熱量か他の条件下では大き
すぎたり小さすぎたりするということが生じ、恒温槽の
温度立上り時間に悪影響を及ぼしていた。即ち、熱量が
大きすぎると温度のオーバシュートが生じ小さすぎると
温度のアンダーシュートが生じるなどして設定温度に安
定するまで非常に時間がかかるようになっていた。Because of this, the amount of heat that is optimal under certain conditions may be too large or too small under other conditions, which has an adverse effect on the temperature rise time of the thermostatic chamber. That is, if the amount of heat is too large, temperature overshoot occurs, and if it is too small, temperature undershoot occurs, and it takes a very long time to stabilize the set temperature.
く考案が達成しようとする課題〉
本発明は、かかる従来例の欠点に鑑みてなされたもので
あり、その課題は、恒温槽温度の立上り時間が短くより
早く設定温度に安定させることができるような最適の温
度制御方法を提供することにある。The present invention has been made in view of the drawbacks of the conventional example, and its object is to shorten the rise time of the thermostatic chamber temperature so that it can be stabilized at the set temperature more quickly. The objective is to provide an optimal temperature control method.
く課題を解決するための手段〉
上述のような課題を解決する本発明の特徴は液体クロマ
トグラフ等で使用される恒温槽の温度を制御する方法に
おいて、予め種々の周囲温度における温度上昇曲線の傾
きと種々の差温における最適温度制御定数を求めて温度
制御プログラムの中に記憶させておき、前記恒温槽の温
度上昇曲線の傾きを測定し、この測定値から温度制御プ
ログラムの中に記憶されている温度上昇曲線の傾きに基
いて周囲温度を求め、該周囲温度と所望の設定温度から
差温を求め、該差温に最適な温度制御定数を温度制御グ
ロダラムの中に記憶されている値から求めることにある
。Means for Solving the Problems> A feature of the present invention that solves the problems described above is that in a method for controlling the temperature of a constant temperature bath used in a liquid chromatograph, temperature rise curves at various ambient temperatures are determined in advance. The slope and the optimum temperature control constant for various temperature differences are determined and stored in the temperature control program, the slope of the temperature rise curve of the thermostatic chamber is measured, and the slope is stored in the temperature control program from this measured value. The ambient temperature is determined based on the slope of the temperature rise curve, the temperature difference is determined from the ambient temperature and the desired set temperature, and the optimum temperature control constant for the temperature difference is determined from the value stored in the temperature control glodarum. It lies in seeking from.
く作用〉
本発明は次のように作用する。即ち、
予め実験等によって種々の周囲温度における温度上昇曲
線の傾さと種々の差湯における最適温度制御定数を求め
て温度制御プログラムの中に記憶させておき、恒温槽の
温度上昇曲線の傾きを測定し、この測定値から温度制御
プログラムの中に記憶されている温度上昇曲線の傾きに
基いて周囲温度を求める。このようにして求めた周囲温
度と所望の設定温度から差温を求め、該差温に最適な温
度制御定数を温度制御プログラムの中に記憶されている
値から求める。このようにして求めた温度制御定数をマ
イクロコンピュータなどに設定することにより、温度制
御定数を変更する。Function> The present invention functions as follows. That is, the slope of the temperature rise curve at various ambient temperatures and the optimum temperature control constant for various hot water differences are determined in advance through experiments, etc., and stored in the temperature control program, and the slope of the temperature rise curve of the thermostatic oven is measured. From this measured value, the ambient temperature is determined based on the slope of the temperature rise curve stored in the temperature control program. A temperature difference is determined from the ambient temperature thus determined and the desired set temperature, and a temperature control constant optimal for the temperature difference is determined from values stored in the temperature control program. By setting the temperature control constant obtained in this manner in a microcomputer or the like, the temperature control constant is changed.
〈実施例〉
以下、本発明について図を用いて詳細に説明する。第1
図は本発明に係わる温度制御方法を示すフローチャー1
・である6以下、この図を用いて本発明に係わる温度制
御方法を詳しく説明する。<Example> Hereinafter, the present invention will be described in detail using the drawings. 1st
The figure shows flowchart 1 showing the temperature control method according to the present invention.
6 Below, the temperature control method according to the present invention will be explained in detail using this figure.
最初、実験等によって種々の周囲温度における恒温槽温
度上昇曲線の傾きと種々の差温における最適温度制御定
数を求めておき、これらの曲線や値を予め温度制御プロ
グラムの中に記憶させておく、 その後、第1図のステ
ップ1に示すように恒温槽のヒータをオンにする。この
ヒータオンにより、第1図のステップ2に示すように恒
温槽ヒータのオンオフ制御が開始される。First, the slope of the temperature rise curve of the constant temperature chamber at various ambient temperatures and the optimal temperature control constant at various temperature differences are determined through experiments, etc., and these curves and values are stored in advance in the temperature control program. Thereafter, as shown in step 1 of FIG. 1, the heater of the thermostatic oven is turned on. By turning on the heater, on/off control of the constant temperature oven heater is started as shown in step 2 of FIG.
その後、第1図のステップ3に示すように恒温槽の温度
上昇曲線の傾きを測定する。Thereafter, as shown in step 3 of FIG. 1, the slope of the temperature rise curve of the thermostatic chamber is measured.
その後、予め温度制御グロダラムの中に記憶されている
温度上昇曲線の傾きに基いて上記第3ステツプで求めた
傾きから第1図のステップ4に示すように周囲温度を求
める。即ち、恒温槽の温度上昇は恒温槽から逃げて行く
熱量をヒータからの供給熱量から差し引いた熱量である
。このため、ヒータからの供給熱量を一定にした場合、
恒温槽から逃げて行く熱量によって恒温槽の温度上昇の
度合い(温度上昇曲線の傾き)が変わってくる6また、
恒温槽から逃げて行く熱量は周囲温度に比例している。Thereafter, based on the slope of the temperature rise curve previously stored in the temperature control glodarum, the ambient temperature is determined as shown in step 4 of FIG. 1 from the slope determined in the third step. That is, the temperature rise in the constant temperature oven is the amount of heat that is obtained by subtracting the amount of heat escaping from the constant temperature oven from the amount of heat supplied from the heater. Therefore, if the amount of heat supplied from the heater is constant,
The degree of temperature rise in the thermostatic oven (the slope of the temperature rise curve) changes depending on the amount of heat escaping from the thermostatic oven6.
The amount of heat escaping from the thermostatic oven is proportional to the ambient temperature.
従って、恒温槽の温度上昇の度合いく温度上昇曲線の傾
き)は周囲温度の関数とみなすことができるのである。Therefore, the degree of temperature rise in the thermostatic oven (the slope of the temperature rise curve) can be regarded as a function of the ambient temperature.
このような理由により、ヒータに連続通電した場合の恒
温槽の温度上昇曲線(更に詳しくは、温度上昇曲線の傾
き)は周囲温度に対応している。従って、該温度上昇曲
線の傾きから周囲温度を求めることができるのである。For this reason, the temperature rise curve (more specifically, the slope of the temperature rise curve) of the constant temperature oven when the heater is continuously energized corresponds to the ambient temperature. Therefore, the ambient temperature can be determined from the slope of the temperature rise curve.
その後、第1図のステラ15に示すように設定温度と周
囲温度から差温を求める。Thereafter, as shown by Stella 15 in FIG. 1, the temperature difference is determined from the set temperature and the ambient temperature.
その後、第1図のスデ・ツブ5で求めた差温に最適な温
度制御定数を予め温度制御プログラムの中に記憶されて
いる温度上昇曲線の傾きから求める。Thereafter, the optimum temperature control constant for the temperature difference found in step 5 of FIG. 1 is found from the slope of the temperature rise curve previously stored in the temperature control program.
その後、このようにして第1図の第6ステツプで求めた
温度制御定数をマイクロコンビュータナ)(に設定する
ことにより、第1図のステップ7に示すように温度制御
定数を変更する。Thereafter, the temperature control constant determined in step 6 of FIG. 1 is set in the microcomputer (), thereby changing the temperature control constant as shown in step 7 of FIG.
その後、第1図のステップ8に示すように温度面差(t
+ tz)<微小温度差(1,1)から比例積分制御
を開始する。Thereafter, as shown in step 8 of FIG.
+ tz)<minimal temperature difference (1, 1), proportional-integral control is started.
尚、本発明は上述の実施例に限定されることなく種々の
変形が可能である。Note that the present invention is not limited to the above-described embodiments, and can be modified in various ways.
〈発明の効果〉
以上詳しく説明したような本発明の実施例によれば、液
体クロマトグラフ等で使用される恒温槽の温度を制御す
る方法において、予め種々の周囲温度における温度上昇
曲線の傾きと種々の差温における最適温度制御定数を求
めて温度制御プログラムの中に記憶させておき、前記恒
温槽め温度上昇曲線の傾きを測定し、この測定値から温
度制御プログラムの中に記憶されている温度上昇曲線の
傾きに基いて周囲温度を求め、該周囲温度と所望の設定
温度から差温を求め、該差温に最適な温度制御定数を予
め温度制御プログラムの中に記憶されている値から求め
るように構成した。このなめ、周囲温度や設定温度など
全ての条件に対応した立上り時間の短い最適制御が実現
するという利点がある。また、周囲温度を測定するセン
サーを特別に設けることなく周囲温度を推定できるため
、恒温槽の製作コストが安いという利点もある。<Effects of the Invention> According to the embodiments of the present invention as described in detail above, in a method for controlling the temperature of a constant temperature bath used in a liquid chromatograph, etc., the slope of the temperature rise curve at various ambient temperatures and the The optimum temperature control constants for various temperature differences are determined and stored in the temperature control program, the slope of the temperature rise curve of the thermostatic chamber is measured, and the measured value is stored in the temperature control program. Determine the ambient temperature based on the slope of the temperature rise curve, determine the temperature difference from the ambient temperature and the desired set temperature, and determine the temperature control constant optimal for the temperature difference from the values stored in the temperature control program in advance. It was configured as desired. This advantage has the advantage of realizing optimal control with a short rise time that corresponds to all conditions such as ambient temperature and set temperature. Another advantage is that the manufacturing cost of the thermostatic chamber is low because the ambient temperature can be estimated without the need for a special sensor to measure the ambient temperature.
第1図は本発明に係わる温度制御方法を説明するための
フローチャート、
第2図は従来から行わ
れている恒温槽の温度制御方法を示す概略説明図である
。
tl・・・・・・設定温度、
t2・・・・・・指示温度FIG. 1 is a flowchart for explaining the temperature control method according to the present invention, and FIG. 2 is a schematic explanatory diagram showing a conventional temperature control method for a constant temperature oven. tl...set temperature, t2...indicated temperature
Claims (1)
する方法において、予め種々の周囲温度における温度上
昇曲線の傾きと種々の差温における最適温度制御定数を
求めて温度制御プログラムの中に記憶させておき、前記
恒温槽の温度上昇曲線の傾きを測定し、この測定値から
前記温度制御プログラムの中に記憶されている温度上昇
曲線の傾きに基いて周囲温度を求め、該周囲温度と所望
の設定温度から差温を求め、該差温に最適な温度制御定
数を前記温度制御プログラムの中に記憶されている値か
ら求めることを特徴とする恒温槽の制御方法。In a method of controlling the temperature of a constant temperature bath used in liquid chromatographs, etc., the slope of the temperature rise curve at various ambient temperatures and the optimal temperature control constant at various temperature differences are determined in advance and stored in the temperature control program. Then, measure the slope of the temperature rise curve of the thermostatic chamber, calculate the ambient temperature from this measured value based on the slope of the temperature rise curve stored in the temperature control program, and compare the ambient temperature with the desired temperature. A method for controlling a constant temperature oven, characterized in that a temperature difference is determined from a set temperature, and a temperature control constant optimal for the temperature difference is determined from a value stored in the temperature control program.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25623589A JPH03118619A (en) | 1989-09-29 | 1989-09-29 | Temperature control method for thermostatic chamber |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25623589A JPH03118619A (en) | 1989-09-29 | 1989-09-29 | Temperature control method for thermostatic chamber |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03118619A true JPH03118619A (en) | 1991-05-21 |
Family
ID=17289811
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP25623589A Pending JPH03118619A (en) | 1989-09-29 | 1989-09-29 | Temperature control method for thermostatic chamber |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03118619A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011252719A (en) * | 2010-05-31 | 2011-12-15 | Shimadzu Corp | Column oven |
WO2019239749A1 (en) * | 2018-06-12 | 2019-12-19 | 日本電信電話株式会社 | Calculation device, calculation method, and program |
-
1989
- 1989-09-29 JP JP25623589A patent/JPH03118619A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011252719A (en) * | 2010-05-31 | 2011-12-15 | Shimadzu Corp | Column oven |
US9310343B2 (en) | 2010-05-31 | 2016-04-12 | Shimadzu Corporation | Column oven |
WO2019239749A1 (en) * | 2018-06-12 | 2019-12-19 | 日本電信電話株式会社 | Calculation device, calculation method, and program |
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