JPH02839A - Silver halide photographic sensitive material - Google Patents
Silver halide photographic sensitive materialInfo
- Publication number
- JPH02839A JPH02839A JP17350088A JP17350088A JPH02839A JP H02839 A JPH02839 A JP H02839A JP 17350088 A JP17350088 A JP 17350088A JP 17350088 A JP17350088 A JP 17350088A JP H02839 A JPH02839 A JP H02839A
- Authority
- JP
- Japan
- Prior art keywords
- group
- silver halide
- groups
- hydrogen atom
- emulsion layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- -1 Silver halide Chemical class 0.000 title claims abstract description 93
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 38
- 239000004332 silver Substances 0.000 title claims abstract description 38
- 239000000463 material Substances 0.000 title claims abstract description 35
- 239000000839 emulsion Substances 0.000 claims abstract description 37
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 17
- 125000000623 heterocyclic group Chemical group 0.000 claims abstract description 12
- 229910021607 Silver chloride Inorganic materials 0.000 claims abstract description 9
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 claims abstract description 9
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 5
- 150000001340 alkali metals Chemical class 0.000 claims abstract description 4
- 125000005496 phosphonium group Chemical group 0.000 claims abstract description 3
- 150000001875 compounds Chemical class 0.000 claims description 37
- 125000000217 alkyl group Chemical group 0.000 claims description 23
- 125000003118 aryl group Chemical group 0.000 claims description 19
- 125000004432 carbon atom Chemical group C* 0.000 claims description 19
- 125000001424 substituent group Chemical group 0.000 claims description 16
- 150000002429 hydrazines Chemical class 0.000 claims description 14
- 239000000084 colloidal system Substances 0.000 claims description 11
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 11
- 125000001931 aliphatic group Chemical group 0.000 claims description 9
- 239000000126 substance Substances 0.000 claims description 7
- 125000005842 heteroatom Chemical group 0.000 claims 1
- 125000001453 quaternary ammonium group Chemical group 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 20
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 abstract description 5
- 239000010410 layer Substances 0.000 description 26
- 239000000243 solution Substances 0.000 description 23
- 239000011248 coating agent Substances 0.000 description 18
- 238000000576 coating method Methods 0.000 description 18
- 108010010803 Gelatin Proteins 0.000 description 15
- 229920000159 gelatin Polymers 0.000 description 15
- 239000008273 gelatin Substances 0.000 description 15
- 235000019322 gelatine Nutrition 0.000 description 15
- 235000011852 gelatine desserts Nutrition 0.000 description 15
- 239000000975 dye Substances 0.000 description 14
- 239000003795 chemical substances by application Substances 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- 206010070834 Sensitisation Diseases 0.000 description 8
- 238000011161 development Methods 0.000 description 8
- 238000012545 processing Methods 0.000 description 8
- 150000003839 salts Chemical class 0.000 description 8
- 230000008313 sensitization Effects 0.000 description 8
- 229940090898 Desensitizer Drugs 0.000 description 7
- 125000003545 alkoxy group Chemical group 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 6
- 239000002202 Polyethylene glycol Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 229920001223 polyethylene glycol Polymers 0.000 description 6
- 229910019142 PO4 Inorganic materials 0.000 description 5
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 5
- 125000005843 halogen group Chemical group 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 235000021317 phosphate Nutrition 0.000 description 5
- 150000003283 rhodium Chemical class 0.000 description 5
- 239000003381 stabilizer Substances 0.000 description 5
- 239000000654 additive Substances 0.000 description 4
- 125000003342 alkenyl group Chemical group 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical group C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 125000004093 cyano group Chemical group *C#N 0.000 description 4
- 125000000753 cycloalkyl group Chemical group 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 239000004848 polyfunctional curative Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 229910052717 sulfur Inorganic materials 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical class NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 3
- OWIRCRREDNEXTA-UHFFFAOYSA-N 3-nitro-1h-indazole Chemical class C1=CC=C2C([N+](=O)[O-])=NNC2=C1 OWIRCRREDNEXTA-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 125000004442 acylamino group Chemical group 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 125000000304 alkynyl group Chemical group 0.000 description 3
- 125000003368 amide group Chemical group 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 150000003863 ammonium salts Chemical class 0.000 description 3
- CJPQIRJHIZUAQP-MRXNPFEDSA-N benalaxyl-M Chemical compound CC=1C=CC=C(C)C=1N([C@H](C)C(=O)OC)C(=O)CC1=CC=CC=C1 CJPQIRJHIZUAQP-MRXNPFEDSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 150000005205 dihydroxybenzenes Chemical class 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 208000015181 infectious disease Diseases 0.000 description 3
- 230000002458 infectious effect Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 description 3
- 229910000510 noble metal Inorganic materials 0.000 description 3
- 229920000120 polyethyl acrylate Polymers 0.000 description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 3
- 239000011593 sulfur Substances 0.000 description 3
- AIGNCQCMONAWOL-UHFFFAOYSA-N 1,3-benzoselenazole Chemical group C1=CC=C2[se]C=NC2=C1 AIGNCQCMONAWOL-UHFFFAOYSA-N 0.000 description 2
- 125000000355 1,3-benzoxazolyl group Chemical group O1C(=NC2=C1C=CC=C2)* 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- 125000006283 4-chlorobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1Cl)C([H])([H])* 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical group C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 125000005036 alkoxyphenyl group Chemical class 0.000 description 2
- 125000005037 alkyl phenyl group Chemical class 0.000 description 2
- 125000004414 alkyl thio group Chemical group 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 description 2
- 125000004104 aryloxy group Chemical group 0.000 description 2
- JEHKKBHWRAXMCH-UHFFFAOYSA-N benzenesulfinic acid Chemical compound O[S@@](=O)C1=CC=CC=C1 JEHKKBHWRAXMCH-UHFFFAOYSA-N 0.000 description 2
- 125000003785 benzimidazolyl group Chemical group N1=C(NC2=C1C=CC=C2)* 0.000 description 2
- WMUIZUWOEIQJEH-UHFFFAOYSA-N benzo[e][1,3]benzoxazole Chemical group C1=CC=C2C(N=CO3)=C3C=CC2=C1 WMUIZUWOEIQJEH-UHFFFAOYSA-N 0.000 description 2
- 150000001565 benzotriazoles Chemical class 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 125000002883 imidazolyl group Chemical group 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000004816 latex Substances 0.000 description 2
- 229920000126 latex Polymers 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- 125000002971 oxazolyl group Chemical group 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000006179 pH buffering agent Substances 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 2
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000003755 preservative agent Substances 0.000 description 2
- 230000002335 preservative effect Effects 0.000 description 2
- 230000003449 preventive effect Effects 0.000 description 2
- SONJTKJMTWTJCT-UHFFFAOYSA-K rhodium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Rh+3] SONJTKJMTWTJCT-UHFFFAOYSA-K 0.000 description 2
- 230000005070 ripening Effects 0.000 description 2
- 230000001235 sensitizing effect Effects 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 235000000346 sugar Nutrition 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical compound [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 2
- 125000000565 sulfonamide group Chemical group 0.000 description 2
- 125000004434 sulfur atom Chemical group 0.000 description 2
- 150000003464 sulfur compounds Chemical class 0.000 description 2
- 150000004764 thiosulfuric acid derivatives Chemical class 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical class OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 description 1
- AGBQKNBQESQNJD-SSDOTTSWSA-N (R)-lipoic acid Chemical compound OC(=O)CCCC[C@@H]1CCSS1 AGBQKNBQESQNJD-SSDOTTSWSA-N 0.000 description 1
- UGUHFDPGDQDVGX-UHFFFAOYSA-N 1,2,3-thiadiazole Chemical group C1=CSN=N1 UGUHFDPGDQDVGX-UHFFFAOYSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical class C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 1
- ODIRBFFBCSTPTO-UHFFFAOYSA-N 1,3-selenazole Chemical group C1=C[se]C=N1 ODIRBFFBCSTPTO-UHFFFAOYSA-N 0.000 description 1
- IFKVSABTHWCIGO-UHFFFAOYSA-N 1,5-dihydropyrazol-5-ide Chemical compound C=1C=NN[C-]=1 IFKVSABTHWCIGO-UHFFFAOYSA-N 0.000 description 1
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical compound SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 description 1
- SAVMNSHHXUMFRQ-UHFFFAOYSA-N 1-[bis(ethenylsulfonyl)methoxy-ethenylsulfonylmethyl]sulfonylethene Chemical compound C=CS(=O)(=O)C(S(=O)(=O)C=C)OC(S(=O)(=O)C=C)S(=O)(=O)C=C SAVMNSHHXUMFRQ-UHFFFAOYSA-N 0.000 description 1
- IXPNQXFRVYWDDI-UHFFFAOYSA-N 1-methyl-2,4-dioxo-1,3-diazinane-5-carboximidamide Chemical compound CN1CC(C(N)=N)C(=O)NC1=O IXPNQXFRVYWDDI-UHFFFAOYSA-N 0.000 description 1
- HAZJTCQWIDBCCE-UHFFFAOYSA-N 1h-triazine-6-thione Chemical class SC1=CC=NN=N1 HAZJTCQWIDBCCE-UHFFFAOYSA-N 0.000 description 1
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 1
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 1
- AYPSHJCKSDNETA-UHFFFAOYSA-N 2-chloro-1h-benzimidazole Chemical class C1=CC=C2NC(Cl)=NC2=C1 AYPSHJCKSDNETA-UHFFFAOYSA-N 0.000 description 1
- 229940080296 2-naphthalenesulfonate Drugs 0.000 description 1
- KFZMGEQAYNKOFK-UHFFFAOYSA-N 2-propanol Substances CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 1
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 1
- JSIAIROWMJGMQZ-UHFFFAOYSA-N 2h-triazol-4-amine Chemical class NC1=CNN=N1 JSIAIROWMJGMQZ-UHFFFAOYSA-N 0.000 description 1
- 125000004180 3-fluorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C(F)=C1[H] 0.000 description 1
- OCVLSHAVSIYKLI-UHFFFAOYSA-N 3h-1,3-thiazole-2-thione Chemical class SC1=NC=CS1 OCVLSHAVSIYKLI-UHFFFAOYSA-N 0.000 description 1
- NYYSPVRERVXMLJ-UHFFFAOYSA-N 4,4-difluorocyclohexan-1-one Chemical compound FC1(F)CCC(=O)CC1 NYYSPVRERVXMLJ-UHFFFAOYSA-N 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- CMGDVUCDZOBDNL-UHFFFAOYSA-N 4-methyl-2h-benzotriazole Chemical compound CC1=CC=CC2=NNN=C12 CMGDVUCDZOBDNL-UHFFFAOYSA-N 0.000 description 1
- UTMDJGPRCLQPBT-UHFFFAOYSA-N 4-nitro-1h-1,2,3-benzotriazole Chemical class [O-][N+](=O)C1=CC=CC2=NNN=C12 UTMDJGPRCLQPBT-UHFFFAOYSA-N 0.000 description 1
- GIQKIFWTIQDQMM-UHFFFAOYSA-N 5h-1,3-oxazole-2-thione Chemical compound S=C1OCC=N1 GIQKIFWTIQDQMM-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 241000251468 Actinopterygii Species 0.000 description 1
- 102000009027 Albumins Human genes 0.000 description 1
- 108010088751 Albumins Proteins 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- 235000008733 Citrus aurantifolia Nutrition 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- ZGTMUACCHSMWAC-UHFFFAOYSA-L EDTA disodium salt (anhydrous) Chemical compound [Na+].[Na+].OC(=O)CN(CC([O-])=O)CCN(CC(O)=O)CC([O-])=O ZGTMUACCHSMWAC-UHFFFAOYSA-L 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- CTKINSOISVBQLD-UHFFFAOYSA-N Glycidol Chemical class OCC1CO1 CTKINSOISVBQLD-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- RAXXELZNTBOGNW-UHFFFAOYSA-O Imidazolium Chemical compound C1=C[NH+]=CN1 RAXXELZNTBOGNW-UHFFFAOYSA-O 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 1
- 229920000881 Modified starch Polymers 0.000 description 1
- 229910018830 PO3H Inorganic materials 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 235000008331 Pinus X rigitaeda Nutrition 0.000 description 1
- 235000011613 Pinus brutia Nutrition 0.000 description 1
- 241000018646 Pinus brutia Species 0.000 description 1
- 241001315609 Pittosporum crassifolium Species 0.000 description 1
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 241000288906 Primates Species 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 1
- RWRDLPDLKQPQOW-UHFFFAOYSA-O Pyrrolidinium ion Chemical compound C1CC[NH2+]C1 RWRDLPDLKQPQOW-UHFFFAOYSA-O 0.000 description 1
- 229910021604 Rhodium(III) chloride Inorganic materials 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical group [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 229910021612 Silver iodide Inorganic materials 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- XOAAWQZATWQOTB-UHFFFAOYSA-N Taurine Natural products NCCS(O)(=O)=O XOAAWQZATWQOTB-UHFFFAOYSA-N 0.000 description 1
- JZFICWYCTCCINF-UHFFFAOYSA-N Thiadiazin Chemical group S=C1SC(C)NC(C)N1CCN1C(=S)SC(C)NC1C JZFICWYCTCCINF-UHFFFAOYSA-N 0.000 description 1
- 235000011941 Tilia x europaea Nutrition 0.000 description 1
- 241000981595 Zoysia japonica Species 0.000 description 1
- AYSYSOQSKKDJJY-UHFFFAOYSA-N [1,2,4]triazolo[4,3-a]pyridine Chemical group C1=CC=CN2C=NN=C21 AYSYSOQSKKDJJY-UHFFFAOYSA-N 0.000 description 1
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 1
- HOLVRJRSWZOAJU-UHFFFAOYSA-N [Ag].ICl Chemical compound [Ag].ICl HOLVRJRSWZOAJU-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- 125000000738 acetamido group Chemical group [H]C([H])([H])C(=O)N([H])[*] 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 125000004423 acyloxy group Chemical class 0.000 description 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
- 150000001346 alkyl aryl ethers Chemical class 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000005161 aryl oxy carbonyl group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 150000003851 azoles Chemical class 0.000 description 1
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 1
- 229910001864 baryta Inorganic materials 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- AMTXUWGBSGZXCJ-UHFFFAOYSA-N benzo[e][1,3]benzoselenazole Chemical group C1=CC=C2C(N=C[se]3)=C3C=CC2=C1 AMTXUWGBSGZXCJ-UHFFFAOYSA-N 0.000 description 1
- KXNQKOAQSGJCQU-UHFFFAOYSA-N benzo[e][1,3]benzothiazole Chemical group C1=CC=C2C(N=CS3)=C3C=CC2=C1 KXNQKOAQSGJCQU-UHFFFAOYSA-N 0.000 description 1
- 125000003354 benzotriazolyl group Chemical group N1N=NC2=C1C=CC=C2* 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- 150000001649 bromium compounds Chemical class 0.000 description 1
- 244000309464 bull Species 0.000 description 1
- 150000001661 cadmium Chemical class 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 239000005018 casein Substances 0.000 description 1
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 1
- 235000021240 caseins Nutrition 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000010537 deprotonation reaction Methods 0.000 description 1
- 125000004663 dialkyl amino group Chemical group 0.000 description 1
- UOPIRNHVGHLLDZ-UHFFFAOYSA-L dichlororhodium Chemical compound Cl[Rh]Cl UOPIRNHVGHLLDZ-UHFFFAOYSA-L 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000004945 emulsification Methods 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 150000002344 gold compounds Chemical class 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- QTNLQPHXMVHGBA-UHFFFAOYSA-H hexachlororhodium Chemical compound Cl[Rh](Cl)(Cl)(Cl)(Cl)Cl QTNLQPHXMVHGBA-UHFFFAOYSA-H 0.000 description 1
- 229920001477 hydrophilic polymer Polymers 0.000 description 1
- AKCUHGBLDXXTOM-UHFFFAOYSA-N hydroxy-oxo-phenyl-sulfanylidene-$l^{6}-sulfane Chemical compound SS(=O)(=O)C1=CC=CC=C1 AKCUHGBLDXXTOM-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 125000001041 indolyl group Chemical group 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 150000004694 iodide salts Chemical class 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 239000002563 ionic surfactant Substances 0.000 description 1
- 150000002503 iridium Chemical class 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000004571 lime Substances 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000002075 main ingredient Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- HNQIVZYLYMDVSB-UHFFFAOYSA-N methanesulfonimidic acid Chemical group CS(N)(=O)=O HNQIVZYLYMDVSB-UHFFFAOYSA-N 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- 125000006216 methylsulfinyl group Chemical group [H]C([H])([H])S(*)=O 0.000 description 1
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 235000019426 modified starch Nutrition 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- KVBGVZZKJNLNJU-UHFFFAOYSA-M naphthalene-2-sulfonate Chemical compound C1=CC=CC2=CC(S(=O)(=O)[O-])=CC=C21 KVBGVZZKJNLNJU-UHFFFAOYSA-M 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000002898 organic sulfur compounds Chemical class 0.000 description 1
- WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical group C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 125000006678 phenoxycarbonyl group Chemical group 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N phosphonic acid group Chemical group P(O)(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000003969 polarography Methods 0.000 description 1
- 229920002006 poly(N-vinylimidazole) polymer Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 1
- 235000019252 potassium sulphite Nutrition 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- QLNJFJADRCOGBJ-UHFFFAOYSA-N propionamide Chemical compound CCC(N)=O QLNJFJADRCOGBJ-UHFFFAOYSA-N 0.000 description 1
- 229940080818 propionamide Drugs 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 235000018102 proteins Nutrition 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- NDGRWYRVNANFNB-UHFFFAOYSA-N pyrazolidin-3-one Chemical class O=C1CCNN1 NDGRWYRVNANFNB-UHFFFAOYSA-N 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 1
- HBCQSNAFLVXVAY-UHFFFAOYSA-N pyrimidine-2-thiol Chemical class SC1=NC=CC=N1 HBCQSNAFLVXVAY-UHFFFAOYSA-N 0.000 description 1
- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- 125000001422 pyrrolinyl group Chemical group 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229930182490 saponin Natural products 0.000 description 1
- 150000007949 saponins Chemical class 0.000 description 1
- 235000017709 saponins Nutrition 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 125000003748 selenium group Chemical group *[Se]* 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229940045105 silver iodide Drugs 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000000661 sodium alginate Substances 0.000 description 1
- 235000010413 sodium alginate Nutrition 0.000 description 1
- 229940005550 sodium alginate Drugs 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007962 solid dispersion Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003431 steroids Chemical class 0.000 description 1
- 125000005415 substituted alkoxy group Chemical group 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- 125000000475 sulfinyl group Chemical group [*:2]S([*:1])=O 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 125000004964 sulfoalkyl group Chemical group 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229960003080 taurine Drugs 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 150000003536 tetrazoles Chemical group 0.000 description 1
- 150000003475 thallium Chemical class 0.000 description 1
- JJJPTTANZGDADF-UHFFFAOYSA-N thiadiazole-4-thiol Chemical class SC1=CSN=N1 JJJPTTANZGDADF-UHFFFAOYSA-N 0.000 description 1
- 150000003557 thiazoles Chemical class 0.000 description 1
- 125000002769 thiazolinyl group Chemical group 0.000 description 1
- 150000003567 thiocyanates Chemical class 0.000 description 1
- 150000003585 thioureas Chemical class 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 150000003852 triazoles Chemical group 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000003021 water soluble solvent Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
- G03C1/08—Sensitivity-increasing substances
- G03C1/09—Noble metals or mercury; Salts or compounds thereof; Sulfur, selenium or tellurium, or compounds thereof, e.g. for chemical sensitising
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明はハロゲン化銀写真感光材料に関し、特に印刷用
写真製版用の明室感光材料に適した超硬調ネガ型写真恣
光材料に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a silver halide photographic light-sensitive material, and more particularly to an ultra-high contrast negative type photographic light-sensitive material suitable as a bright-room light-sensitive material for photolithography for printing. be.
(従来技術)
グラフィック・アークの分野においては網点画像による
連続階調の画像の再生あるいは線画像の再生を良好なら
しめるために、超硬調(特にガンマが10以上)の写真
特性を示す画像形成システムが必要である。(Prior art) In the field of graphic arcs, image formation exhibiting photographic characteristics of ultra-high contrast (especially gamma of 10 or more) is used to improve the reproduction of continuous tone images or line images using halftone images. A system is necessary.
従来この目的のためにはリス現像液と呼ばれる特別な現
像液が用いられてきた。リス現像液は現像主薬としてハ
イドロキノンのみを含み、その伝染現像性を阻害しない
ように保恒剤たる亜硫酸塩をホルムアルデヒドとの付加
物の形にして用い遊離の亜硫酸イオンの濃度を極めて低
く (通常0゜1モルフ1以下)しである、そのためリ
ス現像液は極めて空気酸化を受けやすく3日を越える保
存に耐えられないという重大な欠点を持っている。Traditionally, a special developer called a Lith developer has been used for this purpose. Lith developer contains only hydroquinone as a developing agent, and uses sulfite as a preservative in the form of an adduct with formaldehyde so as not to inhibit its infectious development properties, and the concentration of free sulfite ions is extremely low (usually 0). Therefore, the Lith developer has the serious disadvantage that it is extremely susceptible to air oxidation and cannot be stored for more than 3 days.
高コントラストの写真特性を安定な現像液を用いて得る
方法としては米国特許第4.224,401号、同第4
,168,977号、同第4,166.742号、同第
4,311.781号、同第4.272,606号、同
第4.221.857号、同第4,243.739号等
に記載されているヒドラジン誘導体を用いる方法がある
。U.S. Pat. No. 4,224,401 and U.S. Pat.
, 168,977, 4,166.742, 4,311.781, 4.272,606, 4.221.857, 4,243.739 There is a method using a hydrazine derivative described in et al.
この方法によれば、超硬調で感度の高い写真特性が得ら
れ、更に現像液中に高濃度の亜硫酸塩を加えることが許
容されるので、現像液の空気酸化に対する安定性はリス
現像液に比べて飛躍的に向上する。According to this method, photographic properties with ultra-high contrast and high sensitivity can be obtained, and since it is permissible to add a high concentration of sulfite to the developer, the stability of the developer against air oxidation is better than that of the lithium developer. A dramatic improvement in comparison.
また、この方法による明室感光材料として、塩化銀乳剤
を主体とした感光材料が、特開昭60−140.338
、同60−140,339、同61−238,049、
特願昭60−221,498、同61−5715、同6
1−53461、同61−79,531、同61−99
.482などに記載されている。Furthermore, as a light-sensitive light-sensitive material produced by this method, a light-sensitive material based on a silver chloride emulsion was disclosed in Japanese Patent Application Laid-Open No. 60-140.338.
, 60-140,339, 61-238,049,
Patent application No. 60-221,498, No. 61-5715, No. 6
1-53461, 61-79,531, 61-99
.. 482, etc.
また、ハロゲン化銀写真感光材料には、保存中あるいは
、写真処理中のカプリを防止し、あるいは写真性能を安
定化させる目的で、種々のカプリ防止剤や安定剤を添加
することが知られている。It is also known that various anti-capri agents and stabilizers are added to silver halide photographic materials in order to prevent capri during storage or photographic processing, or to stabilize photographic performance. There is.
しかしながら、この塩化銀を主体としてハロゲン化銀乳
剤とヒドラジン誘導体を含む感光層にカプリ防止剤もし
くは安定剤を従来公知の組合せで用いると、感光材料の
製造上および性能上、重大な問題をひき起した。However, if an anti-capri agent or stabilizer is used in a conventionally known combination in a photosensitive layer containing silver chloride as a main ingredient, a silver halide emulsion, and a hydrazine derivative, serious problems will occur in the production and performance of the photosensitive material. did.
即ち、感光材料の製造上の問題としては、塗布液に析出
物を発生し、塗布面質が悪化すること、性能上の欠点と
して、写真処理液が疲労するにつれて、網点面積が大き
く変化する。In other words, a problem in the production of photosensitive materials is that precipitates are generated in the coating solution, which deteriorates the coating surface quality, and a performance disadvantage is that as the photographic processing solution becomes fatigued, the halftone dot area changes significantly. .
(発明の目的)
本発明者らは、鋭意研究の結果、これらの問題を解決し
、ヒドラジン誘導体による超硬化を利用した印刷用写真
製版用の明室感光材料を可能にした。(Object of the Invention) As a result of intensive research, the present inventors have solved these problems and have made possible a light-sensitive material for printing photolithography that utilizes supercuring with a hydrazine derivative.
本発明の第1の目的は、高品質で安定な画像を与える明
室返し用写真感光材料を提供するものである。A first object of the present invention is to provide a photosensitive material for bright room reversal that provides high quality and stable images.
本発明の第2の目的は、ヒドラジン誘導体による硬調化
を利用した明室返し用写真感光材料を提供するものであ
る。A second object of the present invention is to provide a photographic light-sensitive material for bright room reproduction that utilizes high contrast enhancement by a hydrazine derivative.
本発明の第3の目的は、製造安定性の高い明室返し用写
真感光材料を提供するものである。A third object of the present invention is to provide a photographic material for use in a bright room with high production stability.
本発明の第4の目的は、処理安定性の高い明室返し用写
真感光材料を提供するものである。A fourth object of the present invention is to provide a photographic material for use in a bright room with high processing stability.
(発明の構成)
本発明の上記目的は、少なくとも80モル%の塩化銀を
含有する少なくとも1層のハロゲン化銀感光乳剤層を有
し、該ハロゲン化銀乳剤層もしくはその他の親水性コロ
イド層に、ヒドラジン誘導体を少なくとも1種類と、次
の一般式(′I)で表わされる化合物を少なくとも1種
類とを含むことを特徴とするハロゲン化銀写真感光材料
によって達成された。(Structure of the Invention) The above object of the present invention is to have at least one silver halide photosensitive emulsion layer containing at least 80 mol % of silver chloride, and the silver halide emulsion layer or other hydrophilic colloid layer has This has been achieved by a silver halide photographic material containing at least one type of hydrazine derivative and at least one type of compound represented by the following general formula ('I).
一般式(1)
式中、Qは親水性基の少なくとも1種を直接または間接
に結合した複素環残基を表わす0Mは水素原子、アルカ
リ金属、四級ホスホニウムを表わす。General formula (1) In the formula, Q represents a heterocyclic residue to which at least one hydrophilic group is bonded directly or indirectly, and 0M represents a hydrogen atom, an alkali metal, or a quaternary phosphonium.
(発明の詳細な説明)
本発明において用いられるハロゲン化銀は、塩化銀、塩
臭化銀、塩沃化銀、あるいは塩奥沃化銀のいずれでも良
いが、そのハロゲン組成率において、塩化銀量が80モ
ル%以上であり、より好ましくは90モル%以上である
。塩化銀の含有率が小さくなると、明室感光材料として
重要な明室室内灯下での安全性が劣化してくる(カプリ
を生じてくる)、このため、明室感光材料の取扱いの作
業性を低下させ、実用上の障害となる。これは、塩化銀
の含有率が小さくなるほど、感光材料の分光悪魔が長波
長にのびるため、紫外線をカットした明室室内灯に対す
る感光性が出てくるため、安全性が劣化してくると考え
られる。(Detailed Description of the Invention) The silver halide used in the present invention may be silver chloride, silver chlorobromide, silver chloroiodide, or silver iodide; The amount is 80 mol% or more, more preferably 90 mol% or more. When the silver chloride content decreases, the safety under bright room light, which is important for bright room photosensitive materials, deteriorates (capri occurs), so the workability of handling bright room photosensitive materials deteriorates. This results in a practical obstacle. This is because as the content of silver chloride decreases, the spectral devil of the photosensitive material extends to longer wavelengths, making it more sensitive to bright room lights that cut off ultraviolet rays, and thus reducing safety. It will be done.
本発明に用いられるハロゲン化銀の平均粒子サイズは微
粒子(例えば0.7μ以下)の方が好ましく、特に0.
5μ以下が好ましい0粒子サイズ分布は基本的には制限
はないが、単分散である方が好ましい、ここでいう単分
散とは!i量もしくは粒子数で少なくともその95%が
平均粒子サイズの±40%以内の大きさを持つ粒子群か
ら構成されていることをいう。The average grain size of the silver halide used in the present invention is preferably fine (for example, 0.7 μm or less), particularly 0.7 μm or less.
There is basically no limit to the zero particle size distribution, which is preferably 5μ or less, but monodisperse is preferable.What does monodisperse mean here? i means that at least 95% of the amount or number of particles is composed of particles having a size within ±40% of the average particle size.
写真乳剤中のハロゲン化銀粒子は立方体、八面体のよう
な規則的(regular)な結晶体を有するものでも
よく、また球状、板状などのような変則的(irreg
ular)な結晶を持つもの、あるいはこれらの結晶形
の複合形を持つものであってもよいが、立方体が特に好
ましい。Silver halide grains in photographic emulsions may have regular crystals such as cubic or octahedral, or irregular crystals such as spherical or plate-like.
It may have ular crystals or a composite of these crystals, but cubic shapes are particularly preferred.
ハロゲン化銀粒子は内部と表層が均一な相から成ってい
ても、異なる相からなっていてもよい。The interior and surface layers of the silver halide grains may be composed of uniform phases or may be composed of different phases.
別々に形成した2種以上のハロゲン化銀乳剤を混合して
使用してもよい。Two or more silver halide emulsions formed separately may be used in combination.
本発明に用いるハロゲン化銀乳剤にはロジウム塩もしく
はその錯塩を含んでも良い。The silver halide emulsion used in the present invention may contain a rhodium salt or a complex salt thereof.
ロジウム塩としては、−塩化ロジウム、二塩化ロジウム
、三塩化ロジウム、ヘキサクロロロジウム酸アンモニウ
ム等が挙げられるが、好ましくは水溶性の三価のロジウ
ムのハロゲン話化合物例えばヘキサクロロロジウム(m
)Mもしくはその塩(アンモニウム塩、ナトリウム塩、
カリウム塩など)である。Examples of rhodium salts include rhodium chloride, rhodium dichloride, rhodium trichloride, ammonium hexachlororhodate, etc., but preferably water-soluble trivalent rhodium halogenated compounds such as hexachlororhodium (m
) M or its salts (ammonium salt, sodium salt,
potassium salts, etc.).
これらの水溶性ロジウム塩の添加量はハロゲン化銀1モ
ル当り1,0xlO−’モル〜1.0×1O−4モルの
範囲で用いられる。好ましくは5゜0XIO−’モル〜
5.0X10−’モルである。The amount of these water-soluble rhodium salts to be added is in the range of 1.0x1O-' mol to 1.0x1O-4 mol per 1 mol of silver halide. Preferably 5゜0XIO-'mol~
5.0 x 10-' moles.
ロジウム塩の添加時期としてはハロゲン化銀乳剤調製時
のハロゲン化銀粒子の形成又は物理熟成の過程で添加す
ると好ましい。The rhodium salt is preferably added during the formation of silver halide grains during the preparation of a silver halide emulsion or during the physical ripening process.
ロジウム塩の他にさらに、カドミウム塩、亜硫酸塩、鉛
塩、タリウム塩、イリジウム塩を共存させることもでき
る。In addition to rhodium salts, cadmium salts, sulfite salts, lead salts, thallium salts, and iridium salts can also be coexisting.
本発明の一般式(1)で表わされる化合物について詳細
に説明する。The compound represented by the general formula (1) of the present invention will be explained in detail.
一般式(1)においてQの親水性基としては、505M
、−3OJHR’ −NHCONHR’、−NH30
□RICOJHR’ N1(COR’、−PO3M
、−C00M、又はOHが好ましい。In general formula (1), the hydrophilic group of Q is 505M
, -3OJHR'-NHCONHR', -NH30
□RICOJHR'N1(COR', -PO3M
, -C00M, or OH are preferred.
ここにR1は水素原子又は炭素数1〜5のアルキル基を
表わす。R1 here represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.
一般式(1)のQで表わされる複素環残基として具体的
にはオキサゾール環、チアゾール環、イミダゾール環、
ゼレナゾール環、トリアゾール環、テトラゾール環、チ
アジアゾール環、オキサジアゾール環、ベンタゾール環
、ピリミジン環、チアシア環、トリアジン環、チアジア
ジン環など、または他の炭素環やヘテロ環と結合した環
例えばベンゾチアゾール環、ベンゾトリアゾール環、ベ
ンズイミダゾール環、ベンゾオキサゾール環、ベンゾセ
レナゾール環、ナフトオキサゾール環、トリアザインド
リジン環、ジアザインドリジン環、テトアザインドリジ
ン環などを表わす。Specifically, the heterocyclic residue represented by Q in general formula (1) includes an oxazole ring, a thiazole ring, an imidazole ring,
zelenazole ring, triazole ring, tetrazole ring, thiadiazole ring, oxadiazole ring, bentazole ring, pyrimidine ring, thiasia ring, triazine ring, thiadiazine ring, etc., or rings bonded to other carbocycles or heterocycles, such as benzothiazole ring, It represents a benzotriazole ring, benzimidazole ring, benzoxazole ring, benzoselenazole ring, naphthoxazole ring, triazaindolizine ring, diazaindolizine ring, tetrazaindolizine ring, etc.
一般式(1)で表わされるメルカプト複素環化合物のう
ちで、特に好ましいものとしては、一般式(IV)およ
び(V)で表わされるものを挙げることができる。Among the mercapto heterocyclic compounds represented by the general formula (1), particularly preferred are those represented by the general formulas (IV) and (V).
一般式(IV)
RI+
一般式(V)
一般式(IV)のy、zは、NまたはCRI!(R’l
は水素原子、置換もしくは無置換のアルキル基、置換も
しくは無置換のアリール基を表わす)R1は一303M
、−COOM、−SO□Nul+’ −NIICON
HR’。General formula (IV) RI+ General formula (V) y and z in general formula (IV) are N or CRI! (R'l
represents a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group) R1 is -303M
, -COOM, -SO□Nul+' -NIICON
HR'.
−NH3OtR’ C0tNHR’ −NHCOR
’、−PO3HまたはOHのうちの少な(とも1種で置
換された有機基であり、具体的には炭素数1〜20めア
ルキル基(例えばメチル基、エチル基、プロピル基、ヘ
キシル基、ドデシル基、オクタデシル基など)、炭素数
6〜20の了り−ル基(例えばフェニル基、ナフチル基
など)、またはアルキル基、アリール−3O□−などか
ら構成される連結基を介して構成される基を挙げること
ができる。-NH3OtR'C0tNHR' -NHCOR
', -PO3H or OH. octadecyl group, etc.), an aryl group having 6 to 20 carbon atoms (e.g. phenyl group, naphthyl group, etc.), or a linking group composed of an alkyl group, aryl-3O□-, etc. The following groups can be mentioned.
これらのアルキル基およびアリール基は、さらにハロゲ
ン原子(F、Cj!、Brなど)、アルコキシ基(メト
キシ基、メトキシエトキシ基など)、アリールオキシ基
(フェノキシ基なと)、アルキシ基(R1がアリール基
のとき)、アリール基(R11がアルキル基のとき)、
アミド基(アセトアミド基など)、カルバモイル基(メ
チルカルバモイル基など)、スルホンアミド基(メタン
スルホンアミド基など)、スルファモイル基(メチルス
ルファモイル基など)、スルホニル基(メチルスルホニ
ル基など)、スルフィニル基(メチルスルフィニル基な
ど)、シアノ基、アルコキシカルボニル基(メトキシカ
ルボニル基など)Jアリールオキシカルボニル基(フェ
ノキシカルボニル基など)、およびニトロ基などのたの
置換基によって置換されていてもよい。These alkyl groups and aryl groups further include halogen atoms (F, Cj!, Br, etc.), alkoxy groups (methoxy group, methoxyethoxy group, etc.), aryloxy groups (such as phenoxy groups), alkoxy groups (where R1 is aryl), group), an aryl group (when R11 is an alkyl group),
Amide group (acetamido group, etc.), carbamoyl group (methylcarbamoyl group, etc.), sulfonamide group (methanesulfonamide group, etc.), sulfamoyl group (methylsulfamoyl group, etc.), sulfonyl group (methylsulfonyl group, etc.), sulfinyl group (such as a methylsulfinyl group), a cyano group, an alkoxycarbonyl group (such as a methoxycarbonyl group), an aryloxycarbonyl group (such as a phenoxycarbonyl group), and a nitro group.
ここで、R11の置換基−505M、−C00M、−5
0,II)II?’−NICONHR’、−NH3OJ
’ −COJI(R’ NHCOR’、−PO!
l’lは−OHが2個以上あるときは同じでも異なって
もよい。Here, the substituents of R11 are -505M, -C00M, -5
0, II) II? '-NICONHR', -NH3OJ
'-COJI(R'NHCOR', -PO!
l'l may be the same or different when there are two or more -OH.
Mは一般式(1)で表わしたものと同義である。M has the same meaning as that expressed in general formula (1).
次に一般式(V)のXは硫黄原子、酸素原子、RI!
セレン原子もしくは−N−(R+3は水素原子、置換も
しくは無置換のアルキル基、置換もしくは無置換のアリ
ール基を表わす)を表わし、Lは−CONR14−NR
1GO−3OzNR14−−NR1′SO!−−OCO
−−COO−−5−−NR14−−CO−−50−−0
COO−−NR”C0NR” −−NR目COO−−O
CONR14−または−NRI4SO!NR”−を表わ
しく Rl 4、RI′は各々水素原子、置換もしくは
無置換のアルキル基、または置換もしくは無置換のアリ
ール基を表わす) R11、Mは一般式(1)および(
IV)で表わしたものと同様であり、nはOまたは1を
表わす。Next, X in general formula (V) is a sulfur atom, an oxygen atom, or RI! Represents a selenium atom or -N- (R+3 represents a hydrogen atom, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group), L is -CONR14-NR
1GO-3OzNR14--NR1'SO! --OCO
--COO--5--NR14--CO--50--0
COO--NR”C0NR” --NRth COO--O
CONR14-or-NRI4SO! NR"-; Rl 4 and RI' each represent a hydrogen atom, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group); R11 and M represent the general formula (1) and (
IV), where n represents O or 1.
さらに、RI!、R13、R14、RI′で表わされる
アルキル基、およびアリール基はR11の置換基として
挙げたもので置換されてもよい。Furthermore, RI! , R13, R14, and the alkyl group and aryl group represented by RI' may be substituted with the substituents listed for R11.
以下に本発明に用いられる一般式H)で表わされる好ま
しい化合物の具体例を挙げる。。Specific examples of preferred compounds represented by the general formula H) used in the present invention are listed below. .
CH2CHz CHI SOx Na
CHi CH!○H
CHffi COOH
Hs
一般式(1)で示される化合物は以下の文献に記載され
ている方法により合成することができる。CH2CHz CHI SOx Na CHi CH! ○H CHffi COOH Hs The compound represented by the general formula (1) can be synthesized by the method described in the following literature.
米国特許第2,585,388号、同2.541.92
4号、特公昭42−21,842号、特開昭53−50
,169号、英国特許第1,275.701号、
D、 A、 Berges et、 aj!、+
Journal ofHeterocyc)ic C
hemistry ”第15巻981号(1978号)
、“The Chemistry ofHeter
ocyclic Chemistry ” I
m1dazola andDerivatives
part L 3 3 6〜9 頁、 Che
micalAbstract、 58.7921号(1
963)、394頁。U.S. Patent No. 2,585,388, 2.541.92
No. 4, Special Publication No. 42-21,842, Japanese Patent Publication No. 53-50
, 169, British Patent No. 1,275.701, D. A. Berges et, aj! , +
Journal ofHeterocyc)ic C
hemistry” Volume 15, No. 981 (No. 1978)
, “The Chemistry of Heter
Cyclic Chemistry”I
m1dazola and Derivatives
part L 3 3 pages 6-9, Che
mical Abstract, No. 58.7921 (1
963), p. 394.
E、 Hoggartb Journal
of ChemicalSociety
’ 1160〜7頁(1949)、及びS、R,5an
dier + W、Karo l“OrganicFu
nctioner Group Preparatio
nwAcademic Press社312〜5頁(1
968)。E. Hoggartb Journal
of Chemical Society
'1160-7 (1949), and S, R, 5an
dier + W, Karo l “Organic Fu
ctioner Group Preparation
nwAcademic Press, pp. 312-5 (1
968).
1、 1. Kovtunouskaya Levsh
ine 、 Tr、Ukr、In5t。1, 1. Kovtunouskaya Levsh
ine, Tr, Ukr, In5t.
Eksperim Endokrinol * 18
jL 345頁(196l) 。Eksperim Endokrinol * 18
jL 345 pages (196l).
M、Chamdon、et al、、Bull、Che
+m、Fr、+ 723(1954)。M., Chamdon, et al., Bull, Che.
+m, Fr, + 723 (1954).
D、 A、 5hirley 、 D、 W、
Al1ey 、 J、Amer。D, A, 5hirley, D, W,
Alley, J., Amer.
Chem、Soc、、19 .4922 (1954
)A、 l1chl J、Marchwald、、Be
r、(ドイツ化学会誌)。Chem, Soc,, 19. 4922 (1954
) A, l1chl J, Marchwald,, Be
r, (Journal of the German Chemical Society).
22巻、568頁(1889)
Praphalla Chandra Guha 、
J、Awer、Chem、Soc、。Volume 22, page 568 (1889) Praphalla Chandra Guha,
J,Awer,Chem,Soc,.
11.1502〜10頁(1922)
米国特許第3,017,270号、英国特許第940.
169号、特公昭49−8,334、特開昭55−59
,463、
Advanced in Heterocyclic
Che+m1stry+ ’1 165〜209 (
196B) Khim 、 Geterotsikl
。11.1502-10 (1922) U.S. Patent No. 3,017,270, British Patent No. 940.
No. 169, Japanese Patent Publication No. 49-8, 334, Japanese Patent Publication No. 55-59
, 463, Advanced in Heterocyclic
Che+m1stry+ '1 165~209 (
196B) Khim, Geterotsikl
.
5oedin、、7 (7) 905〜9゜西独特許第
2,716.707号
The Chemistry of Heteroc
yclic Conpoundsis+1dazole
and Derivatives+Vol 1+ 3
84頁、Org、5ynth、 rV、、 569
(1963)L、 B、 5ebre11.C,E、
Booed 、 J、 Ataer。5 oedin, 7 (7) 905~9° West German Patent No. 2,716.707 The Chemistry of Heteroc
yclic compoundsis+1dazole
and Derivatives+Vol 1+ 3
84 pages, Org, 5ynth, rV,, 569
(1963) L, B, 5ebre11. C,E,
Booed, J., Ataer.
CheIIl、Soc、 +±5.2390 (192
3) 、特開昭50−89,034、同53−28.4
26、同55−21.007、同57−202531、
同57−116340、特公昭40−28,496本発
明の一般式(1)で表わされる化合物の使用量は、il
1モル当り1.0X10−Sモル−5゜0×1O−f
fiモル、好ましくは、lXl0−’モル〜5X10−
’モルがよい、これらの化合物は、水溶液、あるいはア
ルコール類(例えばメタノール、エタノール)、ケトン
類(例えばアセトン)、エステル類(例えば酢酸エチル
)などの有機溶媒の溶液として、添加することができる
。これらの化合物は、ハロゲン化鋤乳剤の製造時(例え
ば乳剤粒子形成時に添加、又は、後熟時に添加)、ある
いは、塗布のために用意された塗布液に添加される。CheIIl, Soc, +±5.2390 (192
3), JP-A-50-89,034, JP-A-53-28.4
26, 55-21.007, 57-202531,
57-116340, Japanese Patent Publication No. 40-28,496 The amount of the compound represented by the general formula (1) of the present invention is il
1.0×10-S mole-5゜0×1O-f per mole
fi mol, preferably lXl0-' mol to 5X10-
These compounds can be added in aqueous solutions or as solutions in organic solvents such as alcohols (e.g. methanol, ethanol), ketones (e.g. acetone), esters (e.g. ethyl acetate). These compounds are added during the production of the halogenated emulsion (for example, added during emulsion grain formation or during post-ripening) or added to a coating solution prepared for coating.
本発明に使用されるヒドラジン誘導体としては、既に知
られている種々のものがある。前記の(従来技術)の項
に示した多数の特許に記載のヒドラジン化合物のほかに
米国特許第4.272.614号、特開昭56−974
3、米国特許第4.323.643号、特開昭57−9
9,635、同60−179,734、同62−948
、同61−270,744、同62−160,438、
特願昭61−21,199、同61−175,234、
同61−251,482、同61−276゜283、同
62−58,513、同62−67゜509、同62−
67.510.同62−130゜819、同62−14
3,469に記載のものが使用できる。There are various known hydrazine derivatives used in the present invention. In addition to the hydrazine compounds described in the numerous patents listed in the (Prior Art) section above, U.S. Pat.
3. U.S. Patent No. 4.323.643, Japanese Unexamined Patent Publication No. 57-9
9,635, 60-179,734, 62-948
, 61-270,744, 62-160,438,
Patent application No. 61-21, 199, No. 61-175, 234,
61-251,482, 61-276゜283, 62-58,513, 62-67゜509, 62-
67.510. 62-130°819, 62-14
3,469 can be used.
特に好ましいヒドラジン誘導体は、次の一般式(n)で
表わされるウレイド基を有するものである。Particularly preferred hydrazine derivatives are those having a ureido group represented by the following general formula (n).
一般式(II)
式中、R1とR4は、同一でも異っていてもよく、それ
ぞれ水素原子、脂肪族残基、芳香族残基、又はヘテロ環
歿基を表わし、
Rsは水素原子、または脂肪族残基を表わし、Xは二価
の芳香族残基を表わす。General formula (II) In the formula, R1 and R4 may be the same or different and each represents a hydrogen atom, an aliphatic residue, an aromatic residue, or a heterocyclic group, and Rs is a hydrogen atom, or It represents an aliphatic residue, and X represents a divalent aromatic residue.
R8は水素原子あるいは、アルキル基(炭素数1〜3)
、又はフェニル基である。フェニル基には、上記と同様
の置換基を有しても良い。R8 is a hydrogen atom or an alkyl group (1 to 3 carbon atoms)
, or a phenyl group. The phenyl group may have the same substituents as above.
より具体的には、R3、R4で表わされる脂肪族残基に
は、直鎖及び分岐のアルキル基、シクロアルキル基及び
これらに置換基のついたもの、並びにアルケニル基やア
ルキニル基を含む、直鎖及び分岐のアルキル基としては
、例えば炭素数1〜18、好ましくは1〜10のアルキ
ル基であって、具体的には例えばメチル基、エチル基、
イソブチル基、l−オクチル基等である。More specifically, the aliphatic residues represented by R3 and R4 include straight chain and branched alkyl groups, cycloalkyl groups, and those with substituents, as well as straight chain and branched alkyl groups, and alkenyl groups and alkynyl groups. Examples of chain and branched alkyl groups include alkyl groups having 1 to 18 carbon atoms, preferably 1 to 10 carbon atoms, and specific examples include methyl groups, ethyl groups,
Examples include isobutyl group and l-octyl group.
また、シクロアルキル基としては、例えば炭素数3〜1
0のもので、具体的には例えばシクロペンチル基、シク
ロヘキシル基、アダマンチル基等である。置換基として
はアルコキシ基(例えばメトキシ基、エトキシ基、プロ
ポキシ基、ブトキシ基等)、アリールオキシ基(例えば
、フェノキシ基、ナフチルオキシ基など)、ハロゲン原
子(例えば塩素、臭素、沸素、沃素など)、アルコキシ
カルボニル基、アリール基(例えばフェニル基、ハロゲ
ン置換フェニル基、アルコキシフェニル基、アルキルフ
ェニル基)、ヒドロキシ基、シアノ基、スルホニル基等
であり、置換されたものの具体例としては3−メトキシ
プロピル基、4−クロロシクロヘキシル基、ベンジル基
、p−メチルベンジルL p−クロロベンジル基、2.
4−ジメチルアミルフェノキシプロビル基などを挙げ
ることができる。また、アルケニル基としては例えばア
リル(allyl)基を、アルキニル基としては、プロ
パルギル基を挙げることができる。Moreover, as a cycloalkyl group, for example, carbon number 3-1
0, specifically, for example, a cyclopentyl group, a cyclohexyl group, an adamantyl group, etc. Examples of substituents include alkoxy groups (e.g., methoxy, ethoxy, propoxy, butoxy, etc.), aryloxy groups (e.g., phenoxy, naphthyloxy, etc.), halogen atoms (e.g., chlorine, bromine, fluorine, iodine, etc.). ), alkoxycarbonyl group, aryl group (e.g. phenyl group, halogen-substituted phenyl group, alkoxyphenyl group, alkylphenyl group), hydroxy group, cyano group, sulfonyl group, etc. Specific examples of substituted groups include 3-methoxy Propyl group, 4-chlorocyclohexyl group, benzyl group, p-methylbenzyl L p-chlorobenzyl group, 2.
Examples include 4-dimethylamylphenoxyprobyl group. Further, examples of the alkenyl group include an allyl group, and examples of the alkynyl group include a propargyl group.
一方、R’ 、R’で表わされる芳香族残基としては、
フェニル基、ナフチル基及びこれらに置換基(例えばア
ルキル基、アルコキシ基、アシルヒドラジノ基、ジアル
キルアミノ基、アルコキシカルボニル基、シアノ基、カ
ルボキシル基、ニトロ基、アルキルチオ基、ヒドロキシ
基、スルホニル基、カルバモイル基、ハロゲン原子など
)のついたものを含む、置換基のついたものの具体例と
して、例えば、p−メトキシフェニル基、0−メトキシ
フェニル基、トリル基、p−ホルミルヒドラジノ基、p
−クロロフェニル基、m−フルオロフェニル基などを挙
げる事ができる。On the other hand, the aromatic residues represented by R' and R' are:
Phenyl group, naphthyl group and substituents thereof (for example, alkyl group, alkoxy group, acylhydrazino group, dialkylamino group, alkoxycarbonyl group, cyano group, carboxyl group, nitro group, alkylthio group, hydroxy group, sulfonyl group, carbamoyl group, Specific examples of those with substituents, including those with a halogen atom, etc., include p-methoxyphenyl group, 0-methoxyphenyl group, tolyl group, p-formylhydrazino group,
-chlorophenyl group, m-fluorophenyl group, etc.
R3、R’で表わされる複素環残基としては、酸素、窒
素、硫黄、又はセレン原子のうち少なくとも一つを有す
る三員もしくは六員の単環または縮合環で、これらに置
換基がついてもよい、具体的には例えば、ピロリン環、
ピリジン環、キノリン環、インドール環、オキサゾール
環、ベンゾオキサゾール環、ナフトオキサゾール環、イ
ミダゾール環、ベンゾイミダゾール環、チアゾリン環、
チアゾール環、ベンゾチアゾール環、ナフトチアゾール
環、セレナゾール環、ベンゾセレナゾール環、ナフトセ
レナゾール環などの残基を挙げることが出来る。The heterocyclic residue represented by R3 or R' is a three- or six-membered monocyclic ring or fused ring having at least one of oxygen, nitrogen, sulfur, or selenium atoms, even if a substituent is attached thereto. Good, specifically, for example, pyrroline ring,
Pyridine ring, quinoline ring, indole ring, oxazole ring, benzoxazole ring, naphthoxazole ring, imidazole ring, benzimidazole ring, thiazoline ring,
Examples include residues such as a thiazole ring, a benzothiazole ring, a naphthothiazole ring, a selenazole ring, a benzoselenazole ring, and a naphthoselenazole ring.
これらの複素環は、メチル基、エチル基等炭素数1〜4
のアルキル基、メトキシ基、エトキシ基等炭素数1〜4
のアルコキシ基、フェニル基等の炭素数6〜1Bの了り
−ル基や、クロル、ブロム等のハロゲン原子、アルコキ
シカルボニル基、シアノ基、アミド基等で置換されてい
てもよい。These heterocycles have 1 to 4 carbon atoms, such as a methyl group or an ethyl group.
Alkyl group, methoxy group, ethoxy group, etc. having 1 to 4 carbon atoms
may be substituted with an alkoxy group, a teryl group having 6 to 1 B carbon atoms such as a phenyl group, a halogen atom such as chloro or bromine, an alkoxycarbonyl group, a cyano group, an amide group, or the like.
R3とR4のうちどちらか一方が水素原子であることが
好ましい。It is preferable that either one of R3 and R4 is a hydrogen atom.
RSで表わされる脂肪族残基としては、直鎖もしくは分
岐のアルキル基、シクロアルキル基又はこれらに置換基
のついたもの、並びにアルケニル基、アルキニル基を含
む、直鎖又は分岐のアルキル基としては、例えば炭素数
1〜18、好ましくは1〜6のアルキル基であって具体
的には、メチル基、エチル基、イソプロピル基等である
。シクロアルキル基としては、例えば炭素数3〜1oの
もので、具体的にはシクロペンチル基、シクロヘキシル
基等である。置換基の例としては、アルコキシ基(例え
ばメトキシ基、エトキシ基、等)、アルコキシカルボニ
ル基、アリール基(例えばフェニル基、ハロゲン置換フ
ェニル基、アルコキシフェニル基、アルキルフェニル基
等)、アミド基、アシロキシ基、等である。置換された
ものの具体例としては、3−メトキシプロピル基、ペン
ジル基、p−クロロベンジル基、p−メトキシベンジ/
L4、p−メチルベンジル基等を挙げることができる。Aliphatic residues represented by RS include straight-chain or branched alkyl groups, cycloalkyl groups, or those with substituents, and straight-chain or branched alkyl groups including alkenyl groups and alkynyl groups. , for example, an alkyl group having 1 to 18 carbon atoms, preferably 1 to 6 carbon atoms, and specifically, a methyl group, an ethyl group, an isopropyl group, etc. Examples of the cycloalkyl group include those having 3 to 1 o carbon atoms, specifically cyclopentyl group, cyclohexyl group, and the like. Examples of substituents include alkoxy groups (for example, methoxy groups, ethoxy groups, etc.), alkoxycarbonyl groups, aryl groups (for example, phenyl groups, halogen-substituted phenyl groups, alkoxyphenyl groups, alkylphenyl groups, etc.), amide groups, acyloxy base, etc. Specific examples of substituted groups include 3-methoxypropyl group, penzyl group, p-chlorobenzyl group, p-methoxybenzi/
L4, p-methylbenzyl group, etc. can be mentioned.
アルケニル基としては炭素数3〜12のもので、例えば
アリル基、2−ブテニル基が好ましい。The alkenyl group has 3 to 12 carbon atoms, such as allyl group and 2-butenyl group.
RSは好ましくは水素原子である。RS is preferably a hydrogen atom.
Xは二価の芳香族残基を表わし、具体的には例えばフェ
ニレン基、ナフチレン!(1,2−11゜4−12.3
−11.5−11.8−など)及びこれらに置換基を有
するものである。X represents a divalent aromatic residue, specifically, for example, a phenylene group, naphthylene! (1,2-11゜4-12.3
-11.5-11.8-, etc.) and those having substituents.
二価の芳香族残基の置換基としては、例えば炭素数1〜
20のアルキル基(分枝を存してもよい)、アルキル部
の炭素数が1〜3のアラルキル基、アルコキシ基(好ま
しくは炭素数1〜20)、置換アルコキシ基(好ましく
は炭素数1〜20)、アルキル基又は置換アルキル基(
炭素数1〜20)でモノ−またはジー置換されたアミノ
基、脂肪族アシルアミノ基(好ましくは炭素数2〜21
)、芳香族アシルアミノ基、アルキルチオ基、ヒドロキ
シ基、ハロゲン原子(例えば塩素など)などを有するこ
とができる。Substituents for divalent aromatic residues include, for example, carbon atoms of 1 to
20 alkyl groups (which may be branched), aralkyl groups whose alkyl moiety has 1 to 3 carbon atoms, alkoxy groups (preferably 1 to 20 carbon atoms), substituted alkoxy groups (preferably 1 to 20 carbon atoms), 20), alkyl group or substituted alkyl group (
A mono- or di-substituted amino group with 1 to 20 carbon atoms, an aliphatic acylamino group (preferably 2 to 21 carbon atoms)
), an aromatic acylamino group, an alkylthio group, a hydroxy group, a halogen atom (for example, chlorine, etc.), and the like.
Xとしてより好ましいのはフェニレン基である。More preferred as X is a phenylene group.
好ましいヒドラジン誘導体の具体例を次に示す。Specific examples of preferred hydrazine derivatives are shown below.
■−1) ■−5) ■−2) ■−6) ■−3) ■−8) ■−4) ■−9) H3 !l−10) n−14) n−11) I[−Is) I[−12) n−16) CH。■-1) ■-5) ■-2) ■-6) ■-3) ■-8) ■-4) ■-9) H3 ! l-10) n-14) n-11) I[-Is) I[-12) n-16) CH.
n−17)
I[−15)
II−18)
本発明において、−船式(ff)で表わされる化合物を
写真感光材料中に含有させるときは、感光材料中の任意
の一つ又はそれ以上の親水性コロイド層に含有させるこ
とができる。一般式(n)で表わされる化合物は表面潜
像型ハロゲン化銀写真乳剤層中に含有させることが好ま
しいが、それ以外の非怒光層中、たとえば保護層、中間
層、フィルター層、アンチハレーション層等の層中に、
含有させてもよい、具体的にはアルコール類(例えばメ
タノール、エタノール)、エステル類(例えば酢酸エチ
ル)、ケトン類(例えばアセトン)などの水に混和しう
る有m溶媒の溶液とするか、水溶性の場合には水溶液と
して、親水性コロイド溶液に添加するか、あるいは、疎
水性の場合、ゼラチン水溶液もしくは他の親水性ポリマ
ー水溶液中に、乳化分散もしくは固体分散させて添加す
ることができる。n-17) I[-15) II-18) In the present invention, when a compound represented by the -ship formula (ff) is contained in a photographic light-sensitive material, any one or more of the compounds in the light-sensitive material It can be included in the hydrophilic colloid layer. The compound represented by the general formula (n) is preferably contained in the surface latent image type silver halide photographic emulsion layer, but it can also be contained in other non-irradiation layers, such as protective layers, intermediate layers, filter layers, antihalation layers, etc. In layers such as layers,
Specifically, it may be a solution of a water-miscible solvent such as alcohols (e.g. methanol, ethanol), esters (e.g. ethyl acetate), ketones (e.g. acetone), or a water-soluble solvent. If the compound is hydrophobic, it can be added as an aqueous solution to a hydrophilic colloid solution, or if it is hydrophobic, it can be added as an emulsion or solid dispersion in an aqueous gelatin solution or another hydrophilic polymer aqueous solution.
写真乳剤中に添加する場合、その添加は乳剤粒子作成後
から塗布前までの任意の時期に行ってよいが、塗布のた
めに用意された塗布液中に添加するのが好ましい。When added to a photographic emulsion, it may be added at any time from after emulsion grain preparation to before coating, but it is preferably added to a coating solution prepared for coating.
本発明の一般式(II)で表わされる化合物は、好まし
くはハロゲン化霊長1モル当り、10−モルないしI
X 10−’モル含有させるのが好ましく、特に10−
Sモルないし4X10−”モル含有させるのが好ましい
が、化合物の含有量は、ハロゲン化銀乳剤の粒子径、ハ
ロゲン組成、化学増感の方法と程度、含有する層と写真
乳剤層との関係、カブリ防止化合物の種類などに応じて
、最適の量を選択することが望ましい。The compound represented by the general formula (II) of the present invention is preferably used in an amount of 10-mol to 1-mol per mol of halogenated primate.
It is preferable to contain 10-' mol of X, especially 10-'
The content of the compound is preferably S mol to 4 x 10-'' mol, but the content of the compound depends on the grain size of the silver halide emulsion, the halogen composition, the method and degree of chemical sensitization, the relationship between the containing layer and the photographic emulsion layer, It is desirable to select the optimum amount depending on the type of antifoggant compound.
本発明の一般式(II)で示される化合物は、従来知ら
れているヒドラジン化合物と併用することもできる。併
用するヒドラジン化合物は、種々の化合物が使えるが、
具体的な例としては、特開昭53−20921号、同5
3−16.623号、同55−52050号、同55−
90940号、同55−174985号、同59−36
788号、同61−270744号、同61−2119
9号などに記載されているものが使える。The compound represented by the general formula (II) of the present invention can also be used in combination with conventionally known hydrazine compounds. Various hydrazine compounds can be used in combination, but
Specific examples include JP-A-53-20921 and JP-A-53-20921;
No. 3-16.623, No. 55-52050, No. 55-
No. 90940, No. 55-174985, No. 59-36
No. 788, No. 61-270744, No. 61-2119
You can use the ones listed in No. 9 etc.
併用する比率はモル比で、−a式(II)の化合物に対
して、0.01〜100倍、好ましくは0゜1〜10倍
である。The molar ratio of the compound used in combination is 0.01 to 100 times, preferably 0.1 to 10 times, relative to the compound of formula (II) -a.
本発明のハロゲン化銀写真感光材料は、有機減感剤を含
んでもよい、有機減感剤としては、好ましくは少くとも
1つの水溶性基又はアルカリ解離基を有するものがよい
。The silver halide photographic material of the present invention may contain an organic desensitizer. The organic desensitizer preferably has at least one water-soluble group or alkali dissociable group.
本発明に引られる有機減感剤は、その゛ポーラログラフ
半波電位、即ちポーラログラフイーで決定される酸化還
元電位により規定され、ボーラロ陽極電位と陰極電位の
和が正になるものである。The organic desensitizer used in the present invention is defined by its polarographic half-wave potential, that is, the redox potential determined by polarography, and the sum of polarographic anodic potential and cathodic potential is positive.
ポーラログラフの酸化還元電位の測定法については例え
ば米国特許!、!0/、307号に記載されている。有
機減感剤に少くとも1つ存在する水溶性基としては具体
的にはスルホン酸基、カルゼン酸基、ホスホン酸基など
が挙げられ、これらの基は有機塩基(例えば、アンモニ
ア、ピリジン、トリエチルアミン、ビイリジン、モルホ
リンなど)またはアルカリ金属(例えばナトリウム、カ
リウムなど)などと#1を形成していてもよい。For example, there is a US patent on the polarographic method for measuring redox potential! ,! 0/, No. 307. Specific examples of the water-soluble group present at least one in the organic desensitizer include a sulfonic acid group, a carzene acid group, and a phosphonic acid group. , biridine, morpholine, etc.) or an alkali metal (eg, sodium, potassium, etc.).
アルカリ解離性基とは現儂処理液のpH(通常p HP
−p H/ 3の範囲でらるが、これ以外のpHを示
す処理液もあシ得る。)tたはそれ以下のpHで脱プロ
トン反応を起こし、アニオン性をなる置換基をいう。具
体的KFi置換・未置換のスルファモイル基、置換・未
置換のカルバモイル基、スルホンアミド基、アシルアミ
ノ基、置換・未置換のウレイド基などの置換基で窒素原
子に結合した水素原子が少くとも1個存在する置換基お
よびヒドロキシ基を指す。The alkali-dissociable group refers to the pH of the current treatment solution (usually pH
-pH/3, but treatment liquids with other pH values may also be used. ) Refers to a substituent that undergoes a deprotonation reaction at a pH of t or lower and becomes anionic. Specific KFi At least one hydrogen atom bonded to a nitrogen atom with a substituent such as a substituted/unsubstituted sulfamoyl group, a substituted/unsubstituted carbamoyl group, a sulfonamide group, an acylamino group, a substituted/unsubstituted ureido group, etc. Refers to substituents and hydroxy groups present.
また含窒素へテロ環のへテロ環を構成する窒素原子上に
水素原子を有するヘテロ環基もアルカリ解離性基に含ま
れる。Further, a heterocyclic group having a hydrogen atom on the nitrogen atom constituting the nitrogen-containing heterocycle is also included in the alkali dissociable group.
これらの水溶性基およびアルカリ解離性基は有機減感剤
のどの部分に接続していてもよく、また2種以上全回時
に有していてもよい。These water-soluble groups and alkali-dissociable groups may be connected to any part of the organic desensitizer, and two or more types may be present at all times.
本発明に用いられる有機減感剤の好ましい具体例は、脣
願昭&/−2O9ItW号に記載されているが、その中
からいくつか例を次にあげる。Preferred specific examples of the organic desensitizer used in the present invention are described in No. 脣 Gansho &/-2O9ItW, and some examples are listed below.
有機減感剤はノ・ロゲン化銀乳剤層中に1.Ox/ 0
−8〜/ 、0X10−’モに/ln2、特にl。The organic desensitizer is contained in the silver halide emulsion layer in 1. Ox/0
-8~/, 0X10-'moni/ln2, especially l.
OX/ 0−7〜/ 、OX/ 0−”モルフ m2存
在せしめることが好ましい。OX/0-7~/, OX/0-'' morph m2 is preferably present.
本発明の乳剤層又は、その他の親水性コロイド層に、フ
ィルター染料として、あるいはイラジェーション防止そ
の他、種々の目的で、水溶性染料を含有してもよい。フ
ィルター染料としては、写真感度をさらに低めるための
染料、好ましくは、ハロゲン化銀の固有感度域に分光吸
収極大を有する紫外線吸収剤や、明室感光材料として取
シ扱われる際のセーフライト元に対する安全性を高める
ための、主としてJj(7mm〜AOOnmの領域に冥
質的な光吸収をもつ染料が用いられる。The emulsion layer or other hydrophilic colloid layer of the present invention may contain a water-soluble dye as a filter dye or for various purposes such as preventing irradiation. Filter dyes include dyes for further lowering photographic sensitivity, preferably ultraviolet absorbers having a spectral absorption maximum in the inherent sensitivity range of silver halide, and dyes for safelight sources when handled as bright room photosensitive materials. In order to increase safety, dyes that have subtense light absorption mainly in the region of Jj (7 mm to AOO nm) are used.
これらの染料は、目的に応じて乳剤層に添加するか、あ
るいはハロゲン化銀乳剤層の上部、即ち、支持体に関し
てハロゲン化銀乳剤層よシ遠くの非If&元性親水性コ
ロイド層に媒染剤とともに添加して固定して用いるのが
好ましい。These dyes may be added to the emulsion layer depending on the purpose, or they may be added together with a mordant to the top of the silver halide emulsion layer, i.e., to a non-If & original hydrophilic colloid layer far from the silver halide emulsion layer with respect to the support. It is preferable to use it by adding it and fixing it.
染料のモル吸光係数によシ異なるが、通常1O−2t
7m ”〜i f 7m 2の範囲て添加される。好ま
しくは10岬〜j00グ/m である。Although it depends on the molar extinction coefficient of the dye, it is usually 1O-2t.
It is added in a range of 7 m'' to 7 m2, preferably 10 g/m2 to 100 g/m2.
染料の具体例は!#願昭ぶ/−2OP/lり号に詳しく
記Mされているが、
SO3に
い(りかを次にらげる。Specific examples of dyes! #Ganshobu/-2OP/It is detailed in the first issue, but Rika will be placed next in SO3.
5(33K
S U a N a
S (J a N a
上記染料は適当な溶媒〔例えば水、アルコール(例えば
メタノール、エタノール、プロノノールなど)、アセト
ン、メチルセロソルブ、なト、するいはこれらの混合溶
媒〕K溶解して本発明の非感光性の親水性コロイドl用
塗布液中に添加される。5 (33K S U a N a S (J a N a ) The above dyes can be used in a suitable solvent [e.g., water, alcohol (e.g., methanol, ethanol, prononol, etc.), acetone, methyl cellosolve, etc., or a mixed solvent thereof. ]K is dissolved and added to the coating solution for the non-photosensitive hydrophilic colloid of the present invention.
これらの染料Fiλ種以上組合せて用いることもできる
。It is also possible to use a combination of two or more of these dyes Fiλ.
本発明の染料は、明室取扱いを、可能にするに必要な量
用いられる。The dyes of the invention are used in the amount necessary to enable bright room handling.
具体的な染料の使用量は、一般に1O−3f/m2〜l
t/m2、%に/ 0 ’ f 7m 2〜o 。The specific amount of dye used is generally 1O-3f/m2 to 1
t/m2,%/0'f7m2~o.
j 9 / m の範囲KIEましい量を見い出すこ
とかできる。It is possible to find a suitable quantity in the range KIE of j9/m.
写真乳剤の結合剤または保護コロイドとしては、ゼラチ
ンを用するのが有利であるが、それ以外の親水性コロイ
ドも用いることができる。たとえばゼラチン誘導体、ゼ
ラチンと他の高分子とのグラフトポリマー、アルブミン
、カゼイン等の蛋白質;ヒドロ中ジエチルセルロース、
カルボキシメチルセルロース、セルロース硫酸エステル
類等の如キセルロース誘導体、アルギン酸ソーダ、澱粉
誘導体などの糖誘導体、ポリビニルアルコール、ポリビ
ニルアルコール部分アセタール、ポリ−N−ビニルビク
リトン、ポリアクリル酸、ポリメータクリル酸、ポリア
クリルアミド、ポリビニルイミダゾール、ポリビニルピ
ラゾール等の単一あるいは共重合体の如き多種の合成親
水性高分子物質を用いることができる。Gelatin is advantageously used as a binder or protective colloid in photographic emulsions, but other hydrophilic colloids can also be used. For example, gelatin derivatives, graft polymers of gelatin and other polymers, proteins such as albumin and casein; diethylcellulose in hydrolyzate,
Carboxymethyl cellulose, cellulose derivatives such as cellulose sulfate esters, sugar derivatives such as sodium alginate and starch derivatives, polyvinyl alcohol, polyvinyl alcohol partial acetal, poly-N-vinyl vicritone, polyacrylic acid, polymethacrylic acid, polyvinyl alcohol, etc. A wide variety of synthetic hydrophilic polymeric materials can be used, such as single or copolymers of acrylamide, polyvinylimidazole, polyvinylpyrazole, and the like.
ゼラチンとしては石灰処理ゼラチンのほか、酸処理ゼラ
チンを用いてもよく、ゼラチン加水分解物、ゼラチン諺
素分解物も用いることができる。As the gelatin, in addition to lime-treated gelatin, acid-treated gelatin may be used, and gelatin hydrolysates and gelatin decomposition products can also be used.
本発明の方法で用いるハロゲン化銀乳剤は化学増感され
てbなくてもよいが、化学増感されていてもよい。ハロ
ゲン化銀乳剤の化学増悪の方法として、硫黄増感、還元
増感及び貴金属増感法が知られておシ、これらのいずれ
tも単独で用いても、又併用して化学増感してもよい。The silver halide emulsion used in the method of the present invention does not need to be chemically sensitized, but may be chemically sensitized. Sulfur sensitization, reduction sensitization, and noble metal sensitization are known methods for chemically sensitizing silver halide emulsions, and any of these methods may be used alone or in combination for chemical sensitization. Good too.
貴金属増感法のうち金増感法はその代表的なもので金化
合物、主として全錯塩を用いる。全以外の貴金属、たと
えば白金、ノセラジクム、イリジウム等の錯塩を含有し
ても差支えない。その具体例は米国特許j、4<4す、
otoヘ 英国特許t/r、o4i号などに記載されて
いる。Among the noble metal sensitization methods, the gold sensitization method is a typical method and uses a gold compound, mainly a total complex salt. There is no problem in containing complex salts of noble metals other than pure metals, such as platinum, nocerazicum, and iridium. A specific example is U.S. Patent J, 4<4S,
It is described in British patents t/r, o4i, etc.
硫黄増感剤としては、ゼラチン中に含まれる硫黄化合物
のほか、種々の硫黄化合物、たとえばチオ硫酸塩、チオ
尿素類、チアゾール類、ローダニン類等を用いることが
できる。As the sulfur sensitizer, in addition to the sulfur compounds contained in gelatin, various sulfur compounds such as thiosulfates, thioureas, thiazoles, rhodanines, etc. can be used.
還元増感剤としては第一すず塩、アミン類、ホルムアミ
ジンスルフィン酸、7ラン化合物などを用いることがで
きる。As the reduction sensitizer, stannous salts, amines, formamidine sulfinic acid, 7-ran compounds, etc. can be used.
本発明で用いられるハロゲン化銀乳剤層には、公知の分
光増感色素を添加してもよい。A known spectral sensitizing dye may be added to the silver halide emulsion layer used in the present invention.
本発明の感光材料には、感光材料の製造工程、保存中あ
るいは写真処理中のカプリ全防止しあるいは写真性能を
安定化させる目的で、種々の化合物全含有させることが
できる。すなわちアゾール類たとえばベンゾチアゾリウ
ム塩、ニトロインダゾール類、クロロベンズイミダゾー
ル類、グaモベンズイミダゾール類、メルカプトチアゾ
ール類、メルカプトベンゾチアゾール類、メルカプトチ
アジアゾール類、アミノトリアゾール類、ベンゾチアゾ
ール類、ニトロベンゾトリアゾール類、など;メルカプ
トピリミジン類;メルカプトトリアジン類;たとえばオ
キサゾリンチオンのようなテオクト化合物;アザインデ
ン類、たとえばトリアザインデン鵠、テトラアザインデ
ン類(特に≠−ヒドロキシ置換(/、J、Ja、7)テ
トラザインデン類)、ハンタアザインデン類など;ベン
ゼンチオスルフォン酸、ベンゼンスルフィン酸、ベンゼ
ンスルフオ/rRアミド等のようなカブリ防止剤または
安定剤として知られた多くの化合物を加えることができ
る。これらのものの中で、好ましいのはベンゾトリアゾ
ール類(fllえば、!−メチルーベンゾトリアゾール
)及びニトロインダゾール類(例えば!−ニトロインダ
ゾール)である。また、これらの化合物を処理液に含有
させてもよい。The light-sensitive material of the present invention may contain various compounds for the purpose of completely preventing capri or stabilizing the photographic performance during the manufacturing process, storage, or photographic processing of the light-sensitive material. That is, azoles such as benzothiazolium salts, nitroindazoles, chlorobenzimidazoles, guamobenzimidazoles, mercaptothiazoles, mercaptobenzothiazoles, mercaptothiadiazoles, aminotriazoles, benzothiazoles, nitrobenzotriazoles. Mercaptopyrimidines; Mercaptotriazines; Teocto compounds such as oxazolinthione; Azaindenes, such as triazaindenes, tetraazaindenes (especially ≠-hydroxy substituted (/, J, Ja, 7) tetra A number of compounds known as antifoggants or stabilizers can be added, such as benzenethiosulfonic acid, benzenesulfinic acid, benzenesulfo/rR amide, etc. Among these, preferred are benzotriazoles (eg !-methyl-benzotriazole) and nitroindazoles (eg !-nitroindazole). Further, these compounds may be included in the treatment liquid.
本発明の写真乳剤及び非感光性の親水性コロイドには無
機または有機の硬膜剤を含有してよい。The photographic emulsions and non-photosensitive hydrophilic colloids of the present invention may contain inorganic or organic hardeners.
例えば活性ビニル化合物(1,3,5−)リアクリロイ
ル−へキサヒドロ−5−)リアジン、ビス(ビニルスル
ホニル)メチルエーテル、N、N’−メチレンビス−(
β−(ビニルスルホニル)プロピオンアミド〕など)、
活性ハロゲン化合物(2,4−ジクロル−6−ヒドロキ
シ−3−トリアジンなど)、ムコハロゲンMi(ムコク
ロル酸なとン、N−カルバモイルピロジニウムIN((
1−モルホリ)カルボニル−3−ピリジニオ)メタンス
ルホナートなど)、へロアミジニウム塩類(1−(1−
り1:)ロー1−ピリジノメチレン)ピロリジニウム、
2−ナフタレンスルホナートなど)を単独または組合せ
て用いることがてきる。なかでも、特開昭53−412
20.同53−57257、同59−162546、同
60−80846に記載の活性ビニル化合物および米国
特許3゜325.287号に記載の活性ハロゲン化物が
好ましい。For example, the active vinyl compounds (1,3,5-)lyacryloyl-hexahydro-5-)riazine, bis(vinylsulfonyl)methyl ether, N,N'-methylenebis-(
β-(vinylsulfonyl)propionamide], etc.),
Active halogen compounds (2,4-dichloro-6-hydroxy-3-triazine, etc.), mucohalogen Mi (mucochlorate, N-carbamoylpyrodinium IN ((
1-morpholy)carbonyl-3-pyridinio)methanesulfonate, etc.), heroamidinium salts (1-(1-
1:) rho-1-pyridinomethylene) pyrrolidinium,
2-naphthalenesulfonate, etc.) can be used alone or in combination. Among them, JP-A-53-412
20. Preferred are the active vinyl compounds described in US Pat. No. 53-57257, US Pat. No. 59-162546, US Pat.
本発明に用いられる支持体は、ガラス、酢酸セルロース
フィルム、ポリエチレンテレフタレートフィルム、祇、
バライタ塗布紙、ポリオレフィン(例えばポリエチレン
、ポリプロピレンなど)ラミネート祇、ポリスチレンフ
ィルム、ポリカーボネートフィルム、アルミなどの金属
板なと゛がある。The supports used in the present invention include glass, cellulose acetate film, polyethylene terephthalate film,
Examples include baryta coated paper, polyolefin (eg, polyethylene, polypropylene, etc.) laminate, polystyrene film, polycarbonate film, and metal plates such as aluminum.
これらの支持体は、公知の方法でコロナ処理されてもよ
く、又、必要に応じて公知の方法で下引加工されても良
い。These supports may be corona treated by a known method, and may also be undercoated by a known method if necessary.
本発明を用いて作られる感光材料の写真乳剤層または他
の親水性コロイド層には塗布助剤、帯電防止、スにす性
改良、乳化分散、接着防止及び写真特性改良(例えば、
現像促進、硬調化、増感)等種々の目的で、種々の界面
活性剤を含んでもよい。The photographic emulsion layer or other hydrophilic colloid layer of the light-sensitive material prepared using the present invention may contain coating aids, antistatic properties, improved smearability, emulsification dispersion, anti-adhesion, and improved photographic properties (e.g.
Various surfactants may be included for various purposes such as development acceleration, high contrast, and sensitization.
例えばサポニン(ステロイド系)、アルキレンオキサイ
ド誘導体(例えばポリエチレングリコール、ポリエチレ
ングリコール/ポリプロピレングリコール縮合物、ポリ
エチレングリコールアルキルエーテル類又はポリエチレ
ングリコールアルキルアリールエーテル類、ポリエチレ
ンクリコールエステル類、ポリエチレングリコールソル
ビタンエステル類1.trリアルキレングリコールアル
キルアミン又はアミド類、シリコーンのポリエチレンオ
キサイド付加物類)、グリシドール誘導体(例えばアル
ケニルコハク酸ポリグリセリド、アルキルフェノールポ
リグリセリド)、多価アルコールの脂肪酸エステル類、
糖のアルキルエステル類などの非イオン性界面活性剤;
アルキルアミン塩類類ルキルスルフォン酸塩、アルキル
ベンゼンスルフォン酸塩、アルキルナフタレンスルフォ
ン酸塩、アルキル硫酸エステル類、アルキルリン酸エス
テルL N−アシル−N−アルキルタウリン類、スルホ
コハク酸エステル類、スルホアルキルポリオキシエチレ
ンアルキルフェニルエーテル類、ポリオキシエチレンア
ルキルリン酸エステル類などのような、カルボキシ基、
スルホ基、ホスホ基、硫酸エステル基、リン酸エステル
基等の酸性基を含むアニオン界面活性剤;アミノ酸類、
アミノアルキルスルホン酸類、アミノアルキル硫酸又は
リン酸エステル類、アルキルベタイン類、アミンオキシ
ド類などの両性界面活性剤;アルキルアミン塩類、脂肪
族あるいは芳香族第μ級アンモニウム塩類、ピリジニウ
ム、イミダゾリウムなどの複素環第μ級アンモニウム塩
類、及び脂肪族又は複素環を含むホスホニウム又はスル
ホ二りム塩類などのカチオン界面活性剤を用いることが
できる。For example, saponins (steroids), alkylene oxide derivatives (e.g. polyethylene glycol, polyethylene glycol/polypropylene glycol condensates, polyethylene glycol alkyl ethers or polyethylene glycol alkyl aryl ethers, polyethylene glycol esters, polyethylene glycol sorbitan esters 1.tr realkylene glycol alkylamines or amides, silicone polyethylene oxide adducts), glycidol derivatives (e.g. alkenylsuccinic acid polyglycerides, alkylphenol polyglycerides), fatty acid esters of polyhydric alcohols,
Nonionic surfactants such as alkyl esters of sugars;
Alkylamine salts Alkyl sulfonate, alkylbenzene sulfonate, alkylnaphthalene sulfonate, alkyl sulfate ester, alkyl phosphate ester L N-acyl-N-alkyl taurine, sulfosuccinate ester, sulfoalkyl polyoxyethylene Carboxy groups such as alkylphenyl ethers, polyoxyethylene alkyl phosphates, etc.
Anionic surfactants containing acidic groups such as sulfo groups, phospho groups, sulfate ester groups, phosphate ester groups; amino acids;
Ampholytic surfactants such as aminoalkyl sulfonic acids, aminoalkyl sulfates or phosphates, alkyl betaines, and amine oxides; complexes such as alkyl amine salts, aliphatic or aromatic μ-class ammonium salts, pyridinium, and imidazolium. Cationic surfactants such as ring μ-grade ammonium salts and phosphonium or sulfonium salts containing aliphatic or heterocycles can be used.
特に本発明において好ましく用いられる界面活性剤Fi
w公昭tr−5>≠lコ号公報に記載された分子量tO
O以上のポリアルキレンオキサイド類である。又、寸度
安定性の為にポリアルキルアクリレートの如きポリマー
ラテックスを含有せしめることができる。Surfactant Fi particularly preferably used in the present invention
w Kosho tr-5>≠Molecular weight tO stated in the l co-issue publication
It is a polyalkylene oxide of O or more. Additionally, a polymer latex such as polyalkyl acrylate may be included for dimensional stability.
本発明に用いるのに適した現像促進剤あるいは造核伝染
現像の促進剤としては、特開昭33−777/7.同3
μm37732、同13−/37゜133、同tO−/
410,3グ01同tO−/≠り!り、などに開示され
ている化合物の他、N又はS原子を含む各種の化合物が
有効である。As a development accelerator or a nucleating infectious development accelerator suitable for use in the present invention, JP-A-33-777/7. Same 3
μm37732, 13-/37°133, tO-/
410,3g01 sametO-/≠ri! In addition to the compounds disclosed in, et al., various compounds containing N or S atoms are effective.
次に具体例全列挙する。Next, all specific examples will be listed.
これらの促進剤は、化合物の種類によって最適添加量が
異なるが/、O×10−3〜0.117m2、好ましく
はj 、 OX / 0 −0 、 / f 7m2
の範囲で用いるのが望ましい。これらの促進剤は適当な
溶媒(H2O)メタノールやエタノールなどのアルコー
ル類、アセトン、ジメチルホルムアミド、メチルセルソ
ルブなど)に溶解して塗布液に添加される。The optimum addition amount of these accelerators varies depending on the type of compound;
It is desirable to use it within the range of . These promoters are dissolved in a suitable solvent (H2O, alcohols such as methanol and ethanol, acetone, dimethylformamide, methylcellosolve, etc.) and added to the coating solution.
これらの添加剤を複数の種類を併用してもよい。A plurality of types of these additives may be used in combination.
本発明のハロゲン化銀感光材料を用いて超硬調の写真特
性を得るには、従来の伝染現像液や米国特許筒コ、μ/
り、り7J号に記載されたpH/3に近い高アルカリ現
像液を用いる必要はなく、安定な現像液を用いることが
できる。In order to obtain ultra-high contrast photographic properties using the silver halide photosensitive material of the present invention, it is necessary to use the conventional infectious developer, the U.S. Patent Co., Ltd.
It is not necessary to use a highly alkaline developer with a pH close to 3 as described in R.I. No. 7J, and a stable developer can be used.
すなわち、本発明のハロゲン化銀感光材料は、保恒剤と
しての亜硫酸イオンfO,/にモル/1以上含み、pH
/ 0 、 j”/コ、3、特にpH//、0−/2.
0の現像液によって充分に超硬調のネガ画像を得ること
ができる。That is, the silver halide photosensitive material of the present invention contains sulfite ion fO,/1 mole/1 or more as a preservative, and has a pH of
/ 0, j''/ko, 3, especially pH //, 0-/2.
A sufficiently ultra-high contrast negative image can be obtained using a developer of 0.
本発明の方法において用いうる現像主薬には特別な制限
はなく、例えばジヒドロキシベンゼン類(例えばハイド
ロキノン)、3−ピラゾリドyQ(例えばl−フェニル
−3−ピラゾリドン、≠。There are no particular limitations on the developing agent that can be used in the method of the present invention, such as dihydroxybenzenes (eg, hydroquinone), 3-pyrazolide yQ (eg, l-phenyl-3-pyrazolidone, ≠).
仏−ジメチル−7−7エニルー3−ピラゾリドン)、ア
ミンフェノール類(例えばN−メチル−p−アミンフェ
ノール)などを単独あるいは組み合わせてもちいること
ができる。Dimethyl-7-7enyl-3-pyrazolidone), amine phenols (for example, N-methyl-p-amine phenol), etc. can be used alone or in combination.
本発明のハロゲン化銀g光材料は特に、主現像主薬とし
てジヒドロキシベンゼン類を、補助現像主薬として3−
ピラゾリドン類またはアミノフェノール類を含む現像液
で処理されるのに適している。好ましくはこの現像液に
おいてジヒドロキシベンゼン類は0.OJ〜0.jモル
/113−ピラゾリドン類またはアミノフェノール類は
0,01モモル/1以上範囲で併用される。In particular, the silver halide g-optical material of the present invention contains dihydroxybenzenes as a main developing agent and 3-3 as an auxiliary developing agent.
Suitable for processing with developers containing pyrazolidones or aminophenols. Preferably, the content of dihydroxybenzenes in this developer is 0. OJ~0. j mol/113-Pyrazolidones or aminophenols are used together in a range of 0.01 mole/1 or more.
また米国特許4tコtF9−タ号に記載されているよう
に、アミン類を現像液に添加することによって現像速度
全高め、現像時間の短縮化を実現することもできる。Further, as described in US Pat. No. 4, F9-T, by adding amines to the developer, it is possible to increase the overall development speed and shorten the development time.
現像液援はその他、アルカリ金属の亜硫酸塩、炭酸塩、
ホウ酸塩、及びリン酸塩の如きpH緩衝剤、臭化物、沃
化物、及び有機カプリ防止剤(lf!fに好ましくはニ
トロインダゾール類またはベンゾトリアゾール類)の如
き現像抑制剤ないし、カブリ防止剤などを含むことがで
きる。又必要に応じて、硬水軟化剤、溶解助剤、色調剤
、現像促進剤、界面活性剤(とくに好ましくは前述のポ
リアルキレンオキサイド類)、消泡剤、硬膜剤、フィル
ムの銀汚れ防止剤(例えば−−メルカプトベンズイミダ
ゾールスルホン酸類など)′f:含んでもよい。Other developer aids include alkali metal sulfites, carbonates,
pH buffering agents such as borates and phosphates, development inhibitors or antifoggants such as bromides, iodides, and organic anticaprilants (preferably nitroindazoles or benzotriazoles for lf!f), etc. can include. If necessary, water softeners, solubilizing agents, color toning agents, development accelerators, surfactants (especially preferably the aforementioned polyalkylene oxides), antifoaming agents, hardeners, and film silver stain preventive agents may be added. (For example -- mercaptobenzimidazole sulfonic acids, etc.)'f: May be included.
定着液としては一般に用いられる組成のものを用いるこ
とができる。定着剤としてはチオ硫酸塩、チオシアン酸
塩のほか、定着剤としての効果が知られている有機硫黄
化合物を用いることができる。As the fixer, one having a commonly used composition can be used. As the fixing agent, in addition to thiosulfates and thiocyanates, organic sulfur compounds known to be effective as fixing agents can be used.
定着液には硬膜剤として水溶性アルミニウム塩などを含
んでもよい。The fixing solution may contain a water-soluble aluminum salt or the like as a hardening agent.
本発明の方法における処理温度は普通tr”cからto
”cの間に選ばれる。Processing temperatures in the method of the invention are generally from tr''c to
“Chosen between c.
写真処理には自動現像機を用いるのが好ましいが、本発
明の方法によシ、感光材料を自動現像機に入れてから出
てくるまでのトータルの処理時間音20抄〜/20秒に
設定しても、充分に超硬調のネガ階調の写真特性が得ら
れる。It is preferable to use an automatic processor for photographic processing, but according to the method of the present invention, the total processing time from the time the photosensitive material is put into the automatic processor until it comes out is set to 20 sheets/20 seconds. Even with high contrast, it is possible to obtain photographic characteristics with sufficient ultra-high contrast and negative gradation.
本発明の現像液には銀汚れ防止剤として特開昭!t−2
弘、3≠7号に記載の化合物を用いることができる。現
像液中に添加する溶解助剤として特願昭40−10り、
74Lj号に記載の化合物を用いることができる。さら
に現像液に用いるpH緩衝剤として特開昭to−タj、
4133号に記載の化合物あるいは嗜I司ζ1−x97
Q8に記載の化会物全用いることができる。The developing solution of the present invention contains JP-A-Sho! as a silver stain preventive agent. t-2
The compounds described in Hiroshi, No. 3≠7 can be used. Patent application filed in 1977 as a dissolution aid added to the developer.
Compounds described in No. 74Lj can be used. Furthermore, as a pH buffering agent used in the developer,
The compound or compound described in No. 4133 ζ1-x97
All of the chemical compounds described in Q8 can be used.
以下実施例により、本発明の詳細な説明する。The present invention will be described in detail below with reference to Examples.
なお実施例に於ては下記処方の現像液音用いた。In the Examples, a developer having the following formulation was used.
現像液
ハイドロキノン ≠!、OfN・メ
チルP・アミノフェノ−
ル//コ硫酸塩 o、rt水酸化ナトリ
ウム ir、oy水酸化カリウム
!!、Of!−スルホサリチル@
≠!、O2ホウffl
Jj、Of亜硫酸カリウム ltO
,0?エチレンジアミン四酢酸二ナト
リウム塩 /、Ofコーメルカ
ブトベンツイミダゾ
ールJスルホン酸 0.3?臭化カリウ
ム ぶ、Of!メチルベンゾトリ
アゾール o、ttn・ブチルジェタノールアミ
ン /!、Of水t、フロえて
11(pH=//、&)
〔比較例−l〕
μO@Cに保ったゼラチン水溶液に@1モル当シバoy
、io−’モルのNH4Rhα6の存在下で硝酸銀水溶
液と塩化す) IJウム水水溶液間同時混合したのち、
当業界でよく知られた方法にて、可溶性塩を除去したの
ちにゼラチンを加え、化学熟成せずに安定化剤としてλ
−メチルーグーヒドロキシー/、J、Ja、7−チトラ
アザインデンを添加した。この乳剤は平均粒子サイズが
o、t5μの立方晶形をした単分散乳剤であった。この
乳剤に次のヒドラジン化合物と
31■/m′
1−フェニル−5−メルカプトテトラゾール2゜6■/
d1およびポリエチルアクリレートラテックスを固形分
で対ゼラチン3Qwt%添加し、硬膜剤として、1,3
−ビニルスルホニル−2−プロパツールを加え、ポリエ
ステル支持体上に3゜8g/nlのAg量になる様に塗
布した。ゼラチンは1.8g/mであった。この上に保
護層としてゼラチン1.5g/m、塗布助剤として、次
の界面活性剤、安定剤、およびマツに剤を含む保護層を
塗布し、乾燥した。Developer Hydroquinone ≠! ,OfN・Methyl P・Aminophenol//Cosulfate o,rt Sodium hydroxide ir,oy Potassium hydroxide
! ! , Of! -Sulfosalicyl@
≠! , O2 houffl
Jj, Of potassium sulfite ltO
,0? Ethylenediaminetetraacetic acid disodium salt / Of Komelkabutobenzimidazole J sulfonic acid 0.3? Potassium Bromide Of! Methylbenzotriazole o, ttn/butyljetanolamine /! , Of water, Float
11 (pH=//, &) [Comparative Example-l] Add @1 mol of Shiba oy to an aqueous gelatin solution maintained at μO@C.
, io-' moles of NH4Rhα6) and a silver nitrate aqueous solution in the presence of NH4Rhα6).
Using methods well known in the art, gelatin is added after removal of soluble salts and λ is added as a stabilizer without chemical ripening.
-Methyl-guhydroxy/, J, Ja, 7-titraazaindene was added. This emulsion was a cubic monodisperse emulsion with an average grain size of o,t5μ. The following hydrazine compound was added to this emulsion at 31 μ/m' 1-phenyl-5-mercaptotetrazole 2°6 μ/
d1 and polyethyl acrylate latex were added in a solid content of 3Qwt% based on gelatin, and as a hardening agent, 1,3
-vinylsulfonyl-2-propanol was added and coated on a polyester support to give an Ag content of 3.8 g/nl. Gelatin was 1.8 g/m. A protective layer containing 1.5 g/m of gelatin as a protective layer and the following surfactants, stabilizers, and pine additives as coating aids was coated thereon and dried.
CHx C00Ch H+5
CHC○0CiH+z
SO*Na
Cm F 、yS Ox N CHzC3H?
0OK
37■/rd
2.5■/d
チオクト酸
2.1■/耐
ヱヱ上爪
ポリメチルメタクリレート(平均粒径2.5μ)9.0
可/d
シリカ (平均粒径4.θμ)9.0■/耐大日本ス
クリーン(株)製明室プリンターp−607で、光学ウ
ェッジを通して露光し38℃30秒現像処理し、定着、
水洗、乾燥した。現像液として、新鮮液の他に、表−1
に説明した2つの疲労液を用いた。CHx C00Ch H+5 CHC○0CiH+z SO*Na Cm F,yS Ox N CHzC3H? 0OK 37■/rd 2.5■/d Thioctic acid 2.1■/Resistance upper nail polymethyl methacrylate (average particle size 2.5μ) 9.0
Acceptable/d Silica (average particle size 4.θμ) 9.0■/Dainippon Screen Co., Ltd. Meishuku printer p-607, exposed through an optical wedge, developed at 38°C for 30 seconds, fixed,
Washed with water and dried. As a developing solution, in addition to fresh solution, Table 1
Two fatigue solutions were used as described in .
得られた写真性の結果を表−1に示した。The photographic properties obtained are shown in Table 1.
表−1から本発明のサンプルは、疲労液で処理した時の
窓度が少ないことがわかる。1!pち、本発明のサンプ
ルは、長期間、現像液を連続使用した時、常に一定の性
能が得られる大きな特徴をもつことがわかる。From Table 1, it can be seen that the samples of the present invention have a small window degree when treated with a fatigue solution. 1! It can be seen that the samples of the present invention have the great feature that constant performance is always obtained when the developer is used continuously for a long period of time.
〔実施例−1〕
比較N−1において、■−フェニルー5−メルカプトテ
トラゾールの代りに本発明の化合物を用いて、その他は
比較例−1と同様にして実施した。[Example-1] Comparative Example N-1 was carried out in the same manner as Comparative Example-1 except that the compound of the present invention was used in place of ■-phenyl-5-mercaptotetrazole.
用いた化合物の種類と量は表−1に示した。The types and amounts of the compounds used are shown in Table-1.
このサンプルに網点面積が50%の原稿を重ね実施例−
2
比較例−1および実施例−1におけるサンプルを塗布す
るとき、次の2つの条件で塗布を行った。An example of overlapping this sample with a manuscript with a halftone dot area of 50% -
2 When coating the samples in Comparative Example-1 and Example-1, coating was performed under the following two conditions.
比較例−2および実施例−2と表示する。)魚止工
感光乳剤層の塗布液で、添加剤を添加したのち、すみや
かに(長くても1時間以内)、塗布する。They are indicated as Comparative Example-2 and Example-2. ) A coating solution for the fish stopper photosensitive emulsion layer, which should be applied immediately (within one hour at the most) after the additives have been added.
条理1
感光乳剤層の塗布液で、硬膜剤とポリエチルアクリレー
ト以外の添加剤を加えて、40℃で24時間経時させた
後、硬膜剤とポリエチルアクリレートを添加し、すみや
かに塗布する。Rule 1 Add a hardener and additives other than polyethyl acrylate to the coating solution for the light-sensitive emulsion layer, let it stand at 40°C for 24 hours, then add the hardener and polyethyl acrylate and coat immediately. .
実施例−1と同様に写真性を評価した結果を表−2に示
した。The photographic properties were evaluated in the same manner as in Example-1, and the results are shown in Table-2.
本発明のサンプルは、塗布液が経時しても、性能の変化
が少ないことがわかる。It can be seen that the samples of the present invention show little change in performance even when the coating liquid ages.
また、塗布液のろ過性をテストした。テスト方法と結果
を表−2に示した0表−2から比較例は、塗布液が経時
すると、液中に析出物が生じ、フィルターの目詰まりを
起こしろ過不能になるのに対して、本発明のサンプルは
、
起こさないことがわかる。The filterability of the coating solution was also tested. The test method and results are shown in Table 2. From Table 2, the comparative example shows that as the coating solution ages, precipitates form in the solution, which clogs the filter and makes filtration impossible. It can be seen that the sample of the invention does not occur.
はとんど目詰まりを
以上のように、本発明のサンプルは、安定に、常に性能
変動の少ない感光材料を製造するのに適していることが
わかる。As described above, the samples of the present invention are suitable for stably producing photosensitive materials with little fluctuation in performance.
実施例−3
実施例−1で、ヒドラジン誘導体および、−S式(1)
の化合物の種類を表−3に示したものを用いて、サンプ
ルを作成した。Example-3 In Example-1, a hydrazine derivative and -S formula (1)
Samples were prepared using the types of compounds shown in Table 3.
表−3かられかるように、本発明のサンプルは、いずれ
も、ろ過の目詰りが少なく、写真性の変化も少なく、極
めて、製造安定性にすぐれている。As can be seen from Table 3, all of the samples of the present invention have little clogging of the filtration, little change in photographic properties, and extremely excellent manufacturing stability.
Claims (2)
とも1層のハロゲン化銀感光乳剤層を有し、該ハロゲン
化銀乳剤層もしくはその他の親水性コロイド層に、ヒド
ラジン誘導体を少なくとも1種類と、次の一般式( I
)で表わされる化合物を少なくとも1種類とを含むこと
を特徴とするハロゲン化銀写真感光材料。 一般式( I ) Q−SM 式中、Qは親水性基の少なくとも1種を直接または間接
に結合した複素環残基を表わす。Mは水素原子、アルカ
リ金属、四級アンモニウム、又は四級ホスホニウムを表
わす。(1) having at least one silver halide photosensitive emulsion layer containing at least 80 mol% of silver chloride, and containing at least one type of hydrazine derivative in the silver halide emulsion layer or other hydrophilic colloid layer; The following general formula ( I
1. A silver halide photographic material comprising at least one compound represented by: General Formula (I) Q-SM In the formula, Q represents a heterocyclic residue to which at least one hydrophilic group is bonded directly or indirectly. M represents a hydrogen atom, an alkali metal, a quaternary ammonium, or a quaternary phosphonium.
る化合物より選ばれることを特徴とする特許請求の範囲
第1項のハロゲン化銀写真感光材料。 ▲数式、化学式、表等があります▼(II) 式中、R^3とR^4は同一でも異っていてもよく、そ
れぞれ水素原子、脂肪族残基、芳香族残基、又は、ヘテ
ロ環残基を、 R^5は水素原子、又は脂肪族残基を、 Xは二価の芳香族残基を表わす。 R^2は水素原子あるいは、アルキル基(炭素数1〜3
)、又はフェニル基である、フェニル基には、上記と同
様の置換基を有しても良い。(2) The silver halide photographic material according to claim 1, wherein the hydrazine derivative is selected from compounds represented by the following general formula (II). ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (II) In the formula, R^3 and R^4 may be the same or different, and each represents a hydrogen atom, an aliphatic residue, an aromatic residue, or a hetero R^5 represents a hydrogen atom or an aliphatic residue; X represents a divalent aromatic residue; R^2 is a hydrogen atom or an alkyl group (1 to 3 carbon atoms)
) or a phenyl group, the phenyl group may have the same substituents as above.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63173500A JP2640126B2 (en) | 1988-02-05 | 1988-07-12 | Silver halide photographic material |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2548688 | 1988-02-05 | ||
JP63-25486 | 1988-02-05 | ||
JP63173500A JP2640126B2 (en) | 1988-02-05 | 1988-07-12 | Silver halide photographic material |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02839A true JPH02839A (en) | 1990-01-05 |
JP2640126B2 JP2640126B2 (en) | 1997-08-13 |
Family
ID=26363108
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63173500A Expired - Fee Related JP2640126B2 (en) | 1988-02-05 | 1988-07-12 | Silver halide photographic material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2640126B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03253844A (en) * | 1990-03-02 | 1991-11-12 | Konica Corp | Silver halide photographic sensitive material with glass base |
JPH04161948A (en) * | 1990-10-25 | 1992-06-05 | Fuji Photo Film Co Ltd | Silver halide photo sensitive material |
JPH07120865A (en) * | 1993-10-21 | 1995-05-12 | Konica Corp | Silver halide photographic sensitive material |
US5739782A (en) * | 1996-07-26 | 1998-04-14 | Mitsubishi Denki Kabushiki Kaisha | Resistance ladder, D/A converter and A/D converter |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60140338A (en) * | 1983-12-28 | 1985-07-25 | Fuji Photo Film Co Ltd | Silver halide photosensitive material |
JPS62210453A (en) * | 1986-03-11 | 1987-09-16 | Konishiroku Photo Ind Co Ltd | Silver halide photographic sensitive material having improved shelf stability |
JPS62258446A (en) * | 1986-05-01 | 1987-11-10 | Fuji Photo Film Co Ltd | Silver halide photographic sensitive material for daylight room |
-
1988
- 1988-07-12 JP JP63173500A patent/JP2640126B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60140338A (en) * | 1983-12-28 | 1985-07-25 | Fuji Photo Film Co Ltd | Silver halide photosensitive material |
JPS62210453A (en) * | 1986-03-11 | 1987-09-16 | Konishiroku Photo Ind Co Ltd | Silver halide photographic sensitive material having improved shelf stability |
JPS62258446A (en) * | 1986-05-01 | 1987-11-10 | Fuji Photo Film Co Ltd | Silver halide photographic sensitive material for daylight room |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03253844A (en) * | 1990-03-02 | 1991-11-12 | Konica Corp | Silver halide photographic sensitive material with glass base |
JPH04161948A (en) * | 1990-10-25 | 1992-06-05 | Fuji Photo Film Co Ltd | Silver halide photo sensitive material |
JPH07120865A (en) * | 1993-10-21 | 1995-05-12 | Konica Corp | Silver halide photographic sensitive material |
US5739782A (en) * | 1996-07-26 | 1998-04-14 | Mitsubishi Denki Kabushiki Kaisha | Resistance ladder, D/A converter and A/D converter |
Also Published As
Publication number | Publication date |
---|---|
JP2640126B2 (en) | 1997-08-13 |
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