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JPH0280329A - Production of synthetic quartz glass - Google Patents

Production of synthetic quartz glass

Info

Publication number
JPH0280329A
JPH0280329A JP22933388A JP22933388A JPH0280329A JP H0280329 A JPH0280329 A JP H0280329A JP 22933388 A JP22933388 A JP 22933388A JP 22933388 A JP22933388 A JP 22933388A JP H0280329 A JPH0280329 A JP H0280329A
Authority
JP
Japan
Prior art keywords
particle size
silica
quartz glass
heating
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22933388A
Other languages
Japanese (ja)
Inventor
Masatoshi Takita
滝田 政俊
Takaaki Shimizu
孝明 清水
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP22933388A priority Critical patent/JPH0280329A/en
Priority to US07/404,585 priority patent/US4979973A/en
Priority to EP89402471A priority patent/EP0360659B1/en
Priority to DE8989402471T priority patent/DE68905735T2/en
Publication of JPH0280329A publication Critical patent/JPH0280329A/en
Pending legal-status Critical Current

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  • Glass Melting And Manufacturing (AREA)
  • Glass Compositions (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE:To produce synthetic quarts glass having extremely small OH group content by producing silica having a particle size within a predetermined range by hydrolyzing methyl silicate dissolved in methanol with NH3 as hydrolyzing agent, concentrating and then drying the hydrolyzed product, oxidizing the product by heating, sealing the pores and vitrifying, followed by crushing, then pulverizing and melting by heating. CONSTITUTION:After separating solid from liquid, in the silica having 200-3000nm average particle size which has been obtd. by the above discribed sol-gel process, the solid is concentrated and dried then heated in O2 atmosphere at about 500 deg.C to remove org. matters. The pores of the silica freed of org. matters are sealed and vitrified by heating at about 1500 deg.C in vacuum, etc. Thus, transparent lamps having almost a same specific gravity as ordinary quartz glass is obtd. The lump of glass is pulverized with a ball mill, etc., and the particle size of the pulverized product is adjusted to 50-200 mesh average particle size, and the product is washed with acid and melted by heating at >=1700 deg.C in vacuum, etc. As the result synthetic quartz glass having, for example, <=1ppm OH group content, and for example, 1-4X10<10> poise viscosity at 1400 deg.C is obtd.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は合成石英ガラスの製造方法、特にはOH基含有
量がippm以下と低く、高温粘性が高いことからシリ
コン単結晶の引上げ用るつぼ材として有用とされる合成
石英ガラスをゾル−ゲル法で製造する方法に関するもの
である6 (従来の技術と解決すべき課題) 半導体物質、特にシリコン単結晶の引上げ用るつぼは高
温での耐熱性にすぐれていることから天然石英ガラス製
のものが汎用されているが、天然石英ガラスは不純物を
含有していることから最近における半導体メモリの高集
積化のために歩留まりの低下が問題となり、この高純度
化が要望されている。
Detailed Description of the Invention (Industrial Field of Application) The present invention relates to a method for producing synthetic quartz glass, and in particular to a crucible material for pulling silicon single crystals, since it has a low OH group content of less than ippm and high viscosity at high temperatures. This article relates to a method for manufacturing synthetic quartz glass by the sol-gel method, which is useful as a semiconductor material.6 (Prior technology and issues to be solved) Crucibles for pulling semiconductor materials, especially silicon single crystals, have high heat resistance at high temperatures. Products made of natural quartz glass are widely used due to their superior properties. However, since natural quartz glass contains impurities, a decrease in yield has become a problem due to the recent increase in the integration density of semiconductor memories. Purification is desired.

このため、このるつぼを純度の高い合成石英ガラスで作
ることも検討されているが、■四塩化けい素などを酸水
素火炎中で加水分解させてシリカ微粒子とし、これを溶
融して石英ガラスとする方法にはガラス中にOH基が1
.OOOppmも残留し、高温粘性が低く、真空中高温
では発泡するという問題点があり、■この酸水素火炎を
プラズマ炎とする方法にはコストが高く、量産化も難し
いという不利があるため、これについてはアルコキシシ
ランをアルコール溶媒中で加水分解してシリカを作り、
これを溶融して合成石英を得るという、いわゆるゾル−
ゲル法によることも検討されており、これには高純度品
を安価に得ることができるという利益があるもののOH
基が残り易く。
For this reason, it is being considered to make this crucible out of highly pure synthetic silica glass, but it is possible to: Hydrolyze silicon tetrachloride in an oxyhydrogen flame to produce fine silica particles, which are then melted to form silica glass. In this method, there is one OH group in the glass.
.. There is a problem that OOOppm also remains, the high temperature viscosity is low, and foaming occurs at high temperatures in a vacuum. For this, silica is produced by hydrolyzing alkoxysilane in an alcohol solvent.
This is melted to obtain synthetic quartz, a so-called sol.
The gel method is also being considered, and although this has the advantage of being able to obtain high-purity products at low cost, the OH
The base tends to remain.

製造に長時間が必要とされるという不利があり、高温粘
性で特に高いものが得られ難いという欠点がある。
It has the disadvantage that it takes a long time to produce, and it is difficult to obtain a product with particularly high viscosity at high temperatures.

(課題を解決するための手段) 本発明はこのような不利を解決した合成石英ガラスの製
造方法に関するもので、これはメチルシリケートをメタ
ノール溶媒中でアンモニアを溶媒として加水分解させて
粒径が200〜3,000nmのシリカを調製し、濃縮
、乾燥後、加熱酸化し、閉孔、ガラス化し、粉砕して粒
度を整えたのち。
(Means for Solving the Problems) The present invention relates to a method for producing synthetic quartz glass that overcomes these disadvantages, and this invention involves hydrolyzing methyl silicate in a methanol solvent using ammonia as a solvent to obtain particles with a particle size of 200 mm. After preparing silica of ~3,000 nm, concentrating it, drying it, heating and oxidizing it, closing the pores, vitrifying it, and crushing it to adjust the particle size.

1.700℃以上で溶融することを特徴とするものであ
る。
1.It is characterized by melting at a temperature of 700°C or higher.

すなわち、本発明者らはシリコン単結晶の引上げ用るつ
ぼ材として使用し得る合成石英ガラスの製造方法につい
て種々検討した結果、メチルシリケートをメタノール溶
媒中でアンモニアを触媒として加水分解させると粒径が
200〜3.00OnI11のシリカが得られること、
このシリカを濃縮し、乾燥してから加熱酸化してさらに
閉孔化し、ガラス化するとOH基の少ない石英ガラス塊
が得られること、これを粉砕して粒径を揃えたのち1,
700℃以上で溶融ガラス化すると高温粘性の高い合成
石英ガラスが得られることを見出し、各工程についての
研究を進めて本発明を完成させた。
That is, the present inventors investigated various methods for producing synthetic quartz glass that can be used as a crucible material for pulling silicon single crystals, and found that when methyl silicate is hydrolyzed in a methanol solvent using ammonia as a catalyst, the particle size is 200 mm. ~3.00OnI11 silica is obtained;
This silica is concentrated, dried, heated and oxidized to further close the pores, and vitrified to obtain a quartz glass lump with few OH groups.
They discovered that synthetic quartz glass with high high temperature viscosity can be obtained by melting and vitrifying it at 700°C or higher, and completed research on each process to complete the present invention.

以下、これを詳述する。This will be explained in detail below.

本発明の方法はゾル−ゲル法によるものであるが、本発
明の方法では始発材としてメチルシリケートが使用され
る。すなわち、従来公知のゾル−ゲル法では通常エチル
シリケートを始発材とし、これをエタノール溶媒中でア
ンモニアまたは塩酸を触媒として加水分解させており、
この場合も500nl!1程度の粒径をもつシリカが得
られ、これを乾燥後1,050℃で焼結し、さらに1,
500℃で溶融ガラス化すれば透明な石英ガラスを得る
ことができるけれども、この石英ガラスはOH基含有量
が多く、高温粘性も低いという不利があることが判った
Although the method of the present invention is based on a sol-gel method, methyl silicate is used as a starting material in the method of the present invention. That is, in the conventionally known sol-gel method, ethyl silicate is usually used as a starting material, and this is hydrolyzed in an ethanol solvent using ammonia or hydrochloric acid as a catalyst.
In this case too, it is 500nl! Silica with a particle size of about 1 is obtained, which is dried and sintered at 1,050°C, and further silica with a particle size of about 1,
Although transparent quartz glass can be obtained by melting and vitrifying it at 500° C., it has been found that this quartz glass has the disadvantages of having a high OH group content and low high-temperature viscosity.

しかし、このエチルシリケートをメチルシリケートとす
るとコスト的に有利であることのほか、これをメタノー
ル溶媒中でアンモニアを触媒として加水分解させるとこ
の加水分解反応はメチルシリケート注加直後に始まって
瞬時にシリカの生成が行われるという有利性が与えられ
る。この加水分解で得られたシリカの粒径はこNに使用
するメタノール、アンモニア、メチルシリケートの重量
比1反応温度、攪拌速度によって制御可能とされるが、
OH基含有量の少ないシリカ粉を製造するためには平均
粒径が200nm以上のものとする必要があるし、乾燥
して塊状とするためにはある程度の微粉であることが必
要とされるので本発明の方法ではこぎに得られるシリカ
は平均粒径が200〜3.OOOnmのものとすること
が必要とされる。
However, if this ethyl silicate is replaced with methyl silicate, it is advantageous in terms of cost, and when this is hydrolyzed in a methanol solvent using ammonia as a catalyst, this hydrolysis reaction starts immediately after the methyl silicate is added, and the silica is instantly converted into methyl silicate. The advantage is that the generation of The particle size of the silica obtained by this hydrolysis can be controlled by the weight ratio of methanol, ammonia, and methyl silicate used for this N, reaction temperature, and stirring speed.
In order to produce silica powder with a low OH group content, it is necessary to have an average particle size of 200 nm or more, and in order to dry it into a lump, a certain degree of fineness is required. In the method of the present invention, the silica obtained by sawing has an average particle size of 200 to 3. OOOnm is required.

このようにして得られたシリカは遠心分離器またはフィ
ルタープレスで固液分離したのち、真空中あるいは窒素
ガス雰囲気中で濃縮、乾燥し、ついで空気中あるいは酸
素雰囲気で500℃程度に加熱すると有機物が除去され
たものとなるので、つぎにこれを真空中、ヘリウムガス
中または水素ガス中において1,500℃程度に加熱す
るとこのものはシリカが閉孔化されガラス化されて、透
明で通常の石英ガラスと同等の比重を有する塊状体とな
るが、このシリカが粒径3tO00n+a以下のものと
されているので上記における閉孔化は容易に進行し、泡
を含まないガラス塊が容易に得られる。
The silica thus obtained is subjected to solid-liquid separation using a centrifuge or filter press, concentrated and dried in a vacuum or nitrogen gas atmosphere, and then heated to about 500°C in air or an oxygen atmosphere to remove organic matter. When this is heated to about 1,500°C in vacuum, helium gas, or hydrogen gas, the silica becomes pore-closed and vitrified, making it transparent and normal quartz. The resulting silica has a specific gravity equivalent to that of glass, but since this silica has a particle size of 3 tO00n+a or less, the above-mentioned pore closure progresses easily, and a glass lump that does not contain bubbles can be easily obtained.

このようにして得られたガラス塊はついでボールミル、
ロールミル、ロッドミルなどで粉砕して平均粒径が50
から200メツシユのものに粒度を調整したのち、酸洗
浄を行ない真空中あるいは不活性ガス存在下で1,70
0℃以上に加熱し、溶融すれば合成石英ガラスとするこ
とができるが。
The glass lump obtained in this way is then ball milled.
Grind with a roll mill, rod mill, etc. to an average particle size of 50
After adjusting the particle size from 1 to 200 mesh, acid washing is performed and the particle size is reduced to 1,70 mesh in vacuum or in the presence of an inert gas.
If it is heated to 0°C or higher and melted, it can be made into synthetic quartz glass.

二へに得られた合成石英ガラスはOH基含有量が例えば
ippm以下というように低いし、これはまた上記方法
で作られたシリカが極めて規則正しい構造をもつもので
あり、上記した加熱溶融時にもこの構造が不規則になる
こともないので高温粘性が例えば1,400℃において
1〜4 X 10”ポイズと高い値を示すという特性を
もっているので、このものは特にシリコン単結晶引上げ
用るつぼ材として有用とされるという工業的な有利性を
もつものになる。
The synthetic quartz glass obtained in the second step has a low OH group content, for example less than ippm, and this is also because the silica made by the above method has an extremely regular structure, and even when heated and melted as described above. Since this structure does not become irregular, it has a high temperature viscosity of, for example, 1 to 4 x 10" poise at 1,400°C, so it is particularly useful as a crucible material for pulling silicon single crystals. It has an industrial advantage of being useful.

(実施例) つぎに本発明方法による実施例をあげる。(Example) Next, examples using the method of the present invention will be given.

実施例 反応容器にメタノール150モル、純水120モル、ア
ンモニア50モルを入れて20℃に保ち、こへにメチル
シリケート10モルを120分で滴下して加水分解反応
させ、反応終了後生成したシリカを自然沈降させてから
沈殿物を取り出し、真空中で150℃に加熱して乾燥し
たところ、平均粒径が700nmであるシリカ粉が得ら
れた。
Example: Put 150 moles of methanol, 120 moles of pure water, and 50 moles of ammonia into a reaction vessel, keep it at 20°C, and drop 10 moles of methyl silicate into it over 120 minutes to cause a hydrolysis reaction. After the reaction, the produced silica After allowing it to settle naturally, the precipitate was taken out and dried by heating at 150° C. in a vacuum to obtain silica powder with an average particle size of 700 nm.

ついで、このシリカ粉を空気中において500℃に加熱
して有機物を酸化除去したのち、真空中で1,500℃
に加熱してこのシリカを閉4孔化し。
Next, this silica powder was heated to 500°C in air to oxidize and remove organic matter, and then heated to 1,500°C in vacuum.
This silica is heated to 4 closed pores.

ガラス化したところ、粒径が1〜5+mである透明なガ
ラス塊を収率98%で得ることができた。
When vitrified, transparent glass lumps having a particle size of 1 to 5+ m could be obtained with a yield of 98%.

つぎにこの透明ガラス塊をコニカルボールミルで粉砕後
、50〜200メツシユに篩別し、塩酸で酸処理してか
ら800℃に仮焼後、磁力選鉱機で磁選し、この粉末を
アルゴンガス中において1゜950℃で溶融し、成形し
たところ、30IIaφ×厚さ5閣の不透明合成石英ガ
ラス板が得られ、このもののOH基含有量を赤外吸収ス
ペクトルでしらべたところ、これにはOH基は検出され
ず、またこれを化学分析したところ、この不純物量はA
l  60ppb、Fe  75ppb、Na  35
ppb、K  20ppbであった。
Next, this transparent glass lump is crushed in a conical ball mill, sieved into 50 to 200 meshes, acid-treated with hydrochloric acid, calcined at 800℃, magnetically separated in a magnetic separator, and the powder is placed in argon gas. When melted at 1°950°C and molded, an opaque synthetic quartz glass plate of 30IIaφ x 5cm thick was obtained.The OH group content of this glass was examined using an infrared absorption spectrum. It was not detected, and chemical analysis revealed that the amount of this impurity was A.
l 60ppb, Fe 75ppb, Na 35
ppb, K was 20 ppb.

また、上記で得た粉末の溶融を真空中において1.80
0℃に15分間加熱して行なったときは透明な合成石英
ガラス体が得られ、このものもOH基含有量は検出され
なかったし、さらにこの粉末をアーク溶融し、これから
るつぼを成形したところ、得られたるつぼは不透明で、
このものOH基含有量は溶融前における空気中からの吸
湿のためか15ppmとなっていた。
In addition, the powder obtained above was melted in a vacuum at a temperature of 1.80
When heated to 0°C for 15 minutes, a transparent synthetic quartz glass body was obtained, and no OH group content was detected.Furthermore, when this powder was arc melted and a crucible was formed from it, , the resulting crucible is opaque;
The OH group content of this product was 15 ppm, probably due to moisture absorption from the air before melting.

なお、上記で得た合成石英ガラスの高温粘性をファイバ
ー二ロンゲーション法でしらべたところ、アルゴンガス
中での常圧溶融品は1,400℃における粘度が2.5
 X 10”ポイズ、真空溶融品は3.7X10”ポイ
ズ、7  ’1 m融品ハ1 、9 X1010ボイズ
であり、いずれも高い高温粘性を示した。
In addition, when the high-temperature viscosity of the synthetic quartz glass obtained above was investigated using the fiber dilongation method, the viscosity at 1,400°C of the product fused at normal pressure in argon gas was 2.5.
X 10" poise, the vacuum melted product had 3.7 X 10" poise, the 7'1 m melted product had 9 X 1010 poise, and all showed high high temperature viscosity.

比較例1 反応容器にメタノール150モル、純水120モル、ア
ンモニア1モルを入れて80℃に保ち、こNにメチルシ
リケート10モルを120分で滴下して加水分解反応さ
せ、反応終了後生成したシリカを自然沈降させてから沈
殿物を取り出し、真空中で150℃に加熱して乾燥した
ところ、平均粒径が1100nであるシリカ粉が得られ
た。
Comparative Example 1 150 moles of methanol, 120 moles of pure water, and 1 mole of ammonia were placed in a reaction vessel and kept at 80°C, and 10 moles of methyl silicate was added dropwise to the reactor over 120 minutes to cause a hydrolysis reaction. After allowing the silica to settle naturally, the precipitate was taken out and dried by heating at 150° C. in a vacuum to obtain silica powder with an average particle size of 1100 nm.

ついで、このシリカ粉を空気中において500℃に加熱
して有機物を酸化除去したのち、真空中で1,500℃
に加熱してこのシリカを閉孔化し、ガラス化したが、こ
の場合は発泡して満足なガラス塊を得ることができなか
った。
Next, this silica powder was heated to 500°C in air to oxidize and remove organic matter, and then heated to 1,500°C in vacuum.
The silica was heated to close the pores and vitrified, but in this case it foamed and a satisfactory glass lump could not be obtained.

比較例2 反応容器にメタノール150モル、純水12Oモル、ア
ンモニア 50モルを入れて0℃に保ち、こNにメチル
シリケート 10モルを120分で滴下して加水分解反
応させ1反応重量後生成したシリカを自然沈降させてか
ら沈殿物を取り出し、真空中で150℃に加熱して乾燥
したところ、平均粒径が3,200nmであるシリカ粉
が得られた。
Comparative Example 2 150 moles of methanol, 120 moles of pure water, and 50 moles of ammonia were placed in a reaction vessel and kept at 0°C, and 10 moles of methyl silicate was added dropwise to the reactor over 120 minutes to cause a hydrolysis reaction. After allowing the silica to settle naturally, the precipitate was taken out and dried by heating at 150° C. in a vacuum to obtain silica powder with an average particle size of 3,200 nm.

ついで、このシリカ粉を空気中において500℃に加熱
して有機物を酸化除去したところ、このものは塊になら
ず粒径が3,2QQnmのシリカ粉のまシであったが、
このシリカ粉を真空中において1,500℃に加熱して
シリカの閉孔化、ガラス化を行なったところ、これは不
透明で泡を含んだ合成石英ガラス塊となった。
Next, when this silica powder was heated to 500°C in air to oxidize and remove organic matter, it did not form lumps and was a better silica powder with a particle size of 3.2QQnm.
When this silica powder was heated to 1,500° C. in a vacuum to close the pores and vitrify the silica, it became an opaque synthetic quartz glass lump containing bubbles.

つぎにこの合成石英塊をコニカルボールミルで粉砕し、
50〜200メツシユに篩別し、真空中において1,8
00℃に加熱して溶融したところ透明ガラス体が得られ
たが、これは大きな泡を含有するものであり、このもの
はOH基含有量のないものではあったが泡の大きさが1
1φ以上のものであるために実用性に問題のあるもので
あった。
Next, this synthetic quartz block is crushed in a conical ball mill,
Sieve into 50 to 200 meshes and sieve in a vacuum to 1.8
When heated to 00°C and melted, a transparent glass body was obtained, but this contained large bubbles, and although this one had no OH group content, the size of the bubbles was 1.
Since the diameter was more than 1φ, there was a problem in practicality.

Claims (1)

【特許請求の範囲】[Claims] メチルシリケートをメタノール溶媒中でアンモニアを触
媒として加水分解させて粒径が200〜3,000nm
のシリカを調製し、濃縮、乾燥後、加熱酸化し、閉孔、
ガラス化し、粉砕して粒度を整えたのち、1,700℃
以上で溶融することを特徴とする合成石英ガラスの製造
方法。
Methyl silicate is hydrolyzed in a methanol solvent using ammonia as a catalyst to obtain a particle size of 200 to 3,000 nm.
silica is prepared, concentrated, dried, heated and oxidized to close the pores,
After vitrification and pulverization to adjust the particle size, heat to 1,700℃
A method for producing synthetic quartz glass, characterized in that it is melted in the above manner.
JP22933388A 1988-09-13 1988-09-13 Production of synthetic quartz glass Pending JPH0280329A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP22933388A JPH0280329A (en) 1988-09-13 1988-09-13 Production of synthetic quartz glass
US07/404,585 US4979973A (en) 1988-09-13 1989-09-08 Preparation of fused silica glass by hydrolysis of methyl silicate
EP89402471A EP0360659B1 (en) 1988-09-13 1989-09-11 Synthetic fused silica glass and method for the preparation thereof
DE8989402471T DE68905735T2 (en) 1988-09-13 1989-09-11 SYNTHETIC MOLTEN QUARTZ GLASS AND METHOD FOR THE PRODUCTION THEREOF.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22933388A JPH0280329A (en) 1988-09-13 1988-09-13 Production of synthetic quartz glass

Publications (1)

Publication Number Publication Date
JPH0280329A true JPH0280329A (en) 1990-03-20

Family

ID=16890513

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22933388A Pending JPH0280329A (en) 1988-09-13 1988-09-13 Production of synthetic quartz glass

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Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06183769A (en) * 1992-12-18 1994-07-05 Showa Electric Wire & Cable Co Ltd Production of functional optical fiber rod
JP2019502642A (en) * 2015-12-18 2019-01-31 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー Preparation of synthetic quartz glass grains
JP2019503966A (en) * 2015-12-18 2019-02-14 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー Preparation of opaque quartz glass body
US11053152B2 (en) 2015-12-18 2021-07-06 Heraeus Quarzglas Gmbh & Co. Kg Spray granulation of silicon dioxide in the preparation of quartz glass
US11299417B2 (en) 2015-12-18 2022-04-12 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a quartz glass body in a melting crucible of refractory metal
US11339076B2 (en) 2015-12-18 2022-05-24 Heraeus Quarzglas Gmbh & Co. Kg Preparation of carbon-doped silicon dioxide granulate as an intermediate in the preparation of quartz glass
US11492285B2 (en) 2015-12-18 2022-11-08 Heraeus Quarzglas Gmbh & Co. Kg Preparation of quartz glass bodies from silicon dioxide granulate
US11492282B2 (en) 2015-12-18 2022-11-08 Heraeus Quarzglas Gmbh & Co. Kg Preparation of quartz glass bodies with dew point monitoring in the melting oven
US11708290B2 (en) 2015-12-18 2023-07-25 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a quartz glass body in a multi-chamber oven
US11952303B2 (en) 2015-12-18 2024-04-09 Heraeus Quarzglas Gmbh & Co. Kg Increase in silicon content in the preparation of quartz glass

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60226418A (en) * 1984-04-20 1985-11-11 Nippon Kogaku Kk <Nikon> Preparation of quartz glass mass

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60226418A (en) * 1984-04-20 1985-11-11 Nippon Kogaku Kk <Nikon> Preparation of quartz glass mass

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06183769A (en) * 1992-12-18 1994-07-05 Showa Electric Wire & Cable Co Ltd Production of functional optical fiber rod
JP2019502642A (en) * 2015-12-18 2019-01-31 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー Preparation of synthetic quartz glass grains
JP2019503966A (en) * 2015-12-18 2019-02-14 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー Preparation of opaque quartz glass body
US11053152B2 (en) 2015-12-18 2021-07-06 Heraeus Quarzglas Gmbh & Co. Kg Spray granulation of silicon dioxide in the preparation of quartz glass
US11236002B2 (en) 2015-12-18 2022-02-01 Heraeus Quarzglas Gmbh & Co. Kg Preparation of an opaque quartz glass body
US11299417B2 (en) 2015-12-18 2022-04-12 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a quartz glass body in a melting crucible of refractory metal
US11339076B2 (en) 2015-12-18 2022-05-24 Heraeus Quarzglas Gmbh & Co. Kg Preparation of carbon-doped silicon dioxide granulate as an intermediate in the preparation of quartz glass
US11492285B2 (en) 2015-12-18 2022-11-08 Heraeus Quarzglas Gmbh & Co. Kg Preparation of quartz glass bodies from silicon dioxide granulate
US11492282B2 (en) 2015-12-18 2022-11-08 Heraeus Quarzglas Gmbh & Co. Kg Preparation of quartz glass bodies with dew point monitoring in the melting oven
US11708290B2 (en) 2015-12-18 2023-07-25 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a quartz glass body in a multi-chamber oven
US11952303B2 (en) 2015-12-18 2024-04-09 Heraeus Quarzglas Gmbh & Co. Kg Increase in silicon content in the preparation of quartz glass

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