JPH0274029U - - Google Patents
Info
- Publication number
- JPH0274029U JPH0274029U JP15450888U JP15450888U JPH0274029U JP H0274029 U JPH0274029 U JP H0274029U JP 15450888 U JP15450888 U JP 15450888U JP 15450888 U JP15450888 U JP 15450888U JP H0274029 U JPH0274029 U JP H0274029U
- Authority
- JP
- Japan
- Prior art keywords
- handle
- vertical
- horizontal
- wheel
- bent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 235000008331 Pinus X rigitaeda Nutrition 0.000 claims 1
- 235000011613 Pinus brutia Nutrition 0.000 claims 1
- 241000018646 Pinus brutia Species 0.000 claims 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Massaging Devices (AREA)
- Finger-Pressure Massage (AREA)
Description
第１図は、本考案の側面図、第２図は、本考案
の実施例を示す斜視図。
１は、中空軸基体、２は、車輪、３は、弾性小
突起、４は、縦ハンドル、５は、横ハンドル、６
は、係止具、７は、台座係止具。
FIG. 1 is a side view of the present invention, and FIG. 2 is a perspective view showing an embodiment of the present invention. 1 is a hollow shaft base, 2 is a wheel, 3 is a small elastic projection, 4 is a vertical handle, 5 is a horizontal handle, 6
is a locking tool, and 7 is a pedestal locking tool.
Claims (1)
に車輪２を回転自在に取り付けその車輪２の周辺
に複数の弾性小突起３を設ける。 (ロ) 中空軸基体１の下部を上部と同方向へ直角
に曲げ、縦と横に個別に独立した円筒状の回転自
在の縦ハンドル４、横ハンドル５を設け、その縦
４、横５両ハンドルの周面に複数の弾性小突起３
を設ける。 (ハ) 縦ハンドル４の両端に係止具６を設け、横
ハンドル５の両端には、下部がハンドルの外周よ
り突設した、台座状の係止具７を設ける。 以上の構成よりなるマツサージ用具。[Claims for Utility Model Registration] (a) The upper part of the hollow shaft base 1 is bent into a semicircular shape, a wheel 2 is rotatably attached to the tip, and a plurality of small elastic protrusions 3 are provided around the wheel 2. (b) The lower part of the hollow shaft base 1 is bent at a right angle in the same direction as the upper part, and a cylindrical rotatable vertical handle 4 and a horizontal handle 5 are provided separately in the vertical and horizontal directions, and the vertical handle 4 and the horizontal handle 5 are vertically 4 and horizontally 5. Multiple elastic small protrusions 3 on the circumference of the handle
will be established. (C) A locking device 6 is provided at both ends of the vertical handle 4, and a pedestal-shaped locking device 7 is provided at both ends of the horizontal handle 5, the lower portion of which protrudes from the outer periphery of the handle. The pine surge tool consists of the above structure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15450888U JPH0274029U (en) | 1988-11-28 | 1988-11-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15450888U JPH0274029U (en) | 1988-11-28 | 1988-11-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0274029U true JPH0274029U (en) | 1990-06-06 |
Family
ID=31431301
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15450888U Pending JPH0274029U (en) | 1988-11-28 | 1988-11-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0274029U (en) |
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6855368B1 (en) | 2000-06-28 | 2005-02-15 | Applied Materials, Inc. | Method and system for controlling the presence of fluorine in refractory metal layers |
| US6916398B2 (en) | 2001-10-26 | 2005-07-12 | Applied Materials, Inc. | Gas delivery apparatus and method for atomic layer deposition |
| US6936906B2 (en) | 2001-09-26 | 2005-08-30 | Applied Materials, Inc. | Integration of barrier layer and seed layer |
| US6998579B2 (en) | 2000-12-29 | 2006-02-14 | Applied Materials, Inc. | Chamber for uniform substrate heating |
| US7022948B2 (en) | 2000-12-29 | 2006-04-04 | Applied Materials, Inc. | Chamber for uniform substrate heating |
| US7094680B2 (en) | 2001-02-02 | 2006-08-22 | Applied Materials, Inc. | Formation of a tantalum-nitride layer |
| US7101795B1 (en) | 2000-06-28 | 2006-09-05 | Applied Materials, Inc. | Method and apparatus for depositing refractory metal layers employing sequential deposition techniques to form a nucleation layer |
| US7201803B2 (en) | 2001-03-07 | 2007-04-10 | Applied Materials, Inc. | Valve control system for atomic layer deposition chamber |
| US7211144B2 (en) | 2001-07-13 | 2007-05-01 | Applied Materials, Inc. | Pulsed nucleation deposition of tungsten layers |
| US7405158B2 (en) | 2000-06-28 | 2008-07-29 | Applied Materials, Inc. | Methods for depositing tungsten layers employing atomic layer deposition techniques |
| US7429516B2 (en) | 2002-02-26 | 2008-09-30 | Applied Materials, Inc. | Tungsten nitride atomic layer deposition processes |
| US7439191B2 (en) | 2002-04-05 | 2008-10-21 | Applied Materials, Inc. | Deposition of silicon layers for active matrix liquid crystal display (AMLCD) applications |
| US7501344B2 (en) | 2000-06-27 | 2009-03-10 | Applied Materials, Inc. | Formation of boride barrier layers using chemisorption techniques |
| US7595263B2 (en) | 2003-06-18 | 2009-09-29 | Applied Materials, Inc. | Atomic layer deposition of barrier materials |
| JP2011045560A (en) * | 2009-08-27 | 2011-03-10 | Highpower Senkaa:Kk | Roller instrument |
-
1988
- 1988-11-28 JP JP15450888U patent/JPH0274029U/ja active Pending
Cited By (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7501344B2 (en) | 2000-06-27 | 2009-03-10 | Applied Materials, Inc. | Formation of boride barrier layers using chemisorption techniques |
| US7465666B2 (en) | 2000-06-28 | 2008-12-16 | Applied Materials, Inc. | Method for forming tungsten materials during vapor deposition processes |
| US7405158B2 (en) | 2000-06-28 | 2008-07-29 | Applied Materials, Inc. | Methods for depositing tungsten layers employing atomic layer deposition techniques |
| US7235486B2 (en) | 2000-06-28 | 2007-06-26 | Applied Materials, Inc. | Method for forming tungsten materials during vapor deposition processes |
| US7101795B1 (en) | 2000-06-28 | 2006-09-05 | Applied Materials, Inc. | Method and apparatus for depositing refractory metal layers employing sequential deposition techniques to form a nucleation layer |
| US7115494B2 (en) | 2000-06-28 | 2006-10-03 | Applied Materials, Inc. | Method and system for controlling the presence of fluorine in refractory metal layers |
| US6855368B1 (en) | 2000-06-28 | 2005-02-15 | Applied Materials, Inc. | Method and system for controlling the presence of fluorine in refractory metal layers |
| US6998579B2 (en) | 2000-12-29 | 2006-02-14 | Applied Materials, Inc. | Chamber for uniform substrate heating |
| US7022948B2 (en) | 2000-12-29 | 2006-04-04 | Applied Materials, Inc. | Chamber for uniform substrate heating |
| US7094680B2 (en) | 2001-02-02 | 2006-08-22 | Applied Materials, Inc. | Formation of a tantalum-nitride layer |
| US7201803B2 (en) | 2001-03-07 | 2007-04-10 | Applied Materials, Inc. | Valve control system for atomic layer deposition chamber |
| US7211144B2 (en) | 2001-07-13 | 2007-05-01 | Applied Materials, Inc. | Pulsed nucleation deposition of tungsten layers |
| US7352048B2 (en) | 2001-09-26 | 2008-04-01 | Applied Materials, Inc. | Integration of barrier layer and seed layer |
| US6936906B2 (en) | 2001-09-26 | 2005-08-30 | Applied Materials, Inc. | Integration of barrier layer and seed layer |
| US7494908B2 (en) | 2001-09-26 | 2009-02-24 | Applied Materials, Inc. | Apparatus for integration of barrier layer and seed layer |
| US6916398B2 (en) | 2001-10-26 | 2005-07-12 | Applied Materials, Inc. | Gas delivery apparatus and method for atomic layer deposition |
| US7429516B2 (en) | 2002-02-26 | 2008-09-30 | Applied Materials, Inc. | Tungsten nitride atomic layer deposition processes |
| US7439191B2 (en) | 2002-04-05 | 2008-10-21 | Applied Materials, Inc. | Deposition of silicon layers for active matrix liquid crystal display (AMLCD) applications |
| US7595263B2 (en) | 2003-06-18 | 2009-09-29 | Applied Materials, Inc. | Atomic layer deposition of barrier materials |
| JP2011045560A (en) * | 2009-08-27 | 2011-03-10 | Highpower Senkaa:Kk | Roller instrument |