JPH0267559A - Interference exposure device - Google Patents
Interference exposure deviceInfo
- Publication number
- JPH0267559A JPH0267559A JP63221109A JP22110988A JPH0267559A JP H0267559 A JPH0267559 A JP H0267559A JP 63221109 A JP63221109 A JP 63221109A JP 22110988 A JP22110988 A JP 22110988A JP H0267559 A JPH0267559 A JP H0267559A
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- lens
- luminous fluxes
- pitch
- refractive index
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 claims abstract description 29
- 230000004907 flux Effects 0.000 abstract description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 3
- 239000011295 pitch Substances 0.000 description 7
- 235000012431 wafers Nutrition 0.000 description 7
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 2
- 239000011449 brick Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、光の干渉を利用して特定のピッチの明暗の
縞をフォトレジストに感光させる干渉露光装置に関する
。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an interference exposure apparatus that uses light interference to expose a photoresist to light and dark stripes at a specific pitch.
第2図は従来の短いピッチを切る干渉露光装置を示す模
式断面図である。図において、filは光源となる紫外
線レーザ、(21、(sa)、(sb)はミラー(3a
)、(3b)はレンズ、(4)はビームスプリッタ、(
6)は光束、(7)は露光されるフォトレジストが塗布
されたウェハ、(8)はフォトレジストを侵さないよう
な液体で例えば水、 (9a)、(9b)は液体(8)
を押し除けるための枠、(10す、(xob)は光束(
6)が大気中から液体(8)に垂直に入射するように取
り付けた光透過窓である。FIG. 2 is a schematic cross-sectional view showing a conventional interference exposure apparatus for cutting short pitches. In the figure, fil is an ultraviolet laser serving as a light source, (21, (sa), (sb) are mirrors (3a
), (3b) is a lens, (4) is a beam splitter, (
6) is a light beam, (7) is a wafer coated with photoresist to be exposed, (8) is a liquid that does not attack the photoresist, such as water, (9a) and (9b) is a liquid (8)
The frame for pushing away (10s, (xob) is the luminous flux (
6) is a light transmitting window installed so that the liquid (8) is perpendicularly incident from the atmosphere.
次に動作について説明する。紫外線レーザ(11から出
射した光は、ミラー(2]で反射され、レンズ(3a)
、(3b)を通過することによりビームの径が広げられ
、ビームスブリック(4)で2方回に分割される。更1
7: < 5− (5a)、(5b)で反射さ第1′C
1光束(6)はウェハ(”、) ニ2 方向から照射し
、フォトレジストを感光する。このとき、液体(8)の
屈折率11は1より大きいので、液体(8)中での光束
(6)の波長は、大気中に比べて1/nに短くなる。し
たがって、大気中で露光する場合に比べて、1/n倍の
短い周期でフォトレジストを感光させることができる。Next, the operation will be explained. The light emitted from the ultraviolet laser (11) is reflected by the mirror (2) and passes through the lens (3a).
, (3b), the diameter of the beam is expanded, and the beam is divided into two beams by the beam brick (4). Further 1
7: < 5- 1'C reflected by (5a), (5b)
1 The light beam (6) is irradiated from the wafer ('',) 2 direction and exposes the photoresist.At this time, since the refractive index 11 of the liquid (8) is greater than 1, the light beam (6) in the liquid (8) is The wavelength of 6) is 1/n shorter than that in the atmosphere.Therefore, the photoresist can be exposed at a cycle 1/n times shorter than in the case of exposure in the atmosphere.
このとき、液体(8)を押し除ける枠(9す、(9b)
に付属している光透過窓(10す、(xob)は光束(
6)に対して常に垂直になるようにしてあり、光束(6
)の進行方向を大気と液体(8)の境界で変えないよう
になっている。At this time, the frame (9s, (9b)) that can push out the liquid (8)
The light transmission window (10s, (xob) attached to the
It is always perpendicular to the luminous flux (6).
) so that the direction of movement of the liquid (8) does not change at the boundary between the atmosphere and the liquid (8).
しかしながら、従来の短いピッチを切る干渉露光装置は
、光透過窓(1oa)、(1ob)が常に光束(6)ト
直交するように位置する必要があり、ピッチを変えるた
めにミラー(5λ)、(5b)を回転させると、それに
応じて液体(8)を押し除ける枠(91)、(9b)も
移動させなけわばならなかった。However, in the conventional interference exposure apparatus that cuts a short pitch, it is necessary to position the light transmission windows (1OA) and (1OB) so that they are always orthogonal to the light beam (6), and in order to change the pitch, a mirror (5λ), When (5b) was rotated, the frames (91) and (9b) for pushing away the liquid (8) had to be moved accordingly.
この発明は上記のような問題点を解消するためになされ
たもので、通常の干渉露光装置程度の可動部分があれば
露光できる装置を得ることを目的とする。The present invention was made to solve the above-mentioned problems, and an object of the present invention is to provide an apparatus that can perform exposure with only a movable part comparable to that of a normal interference exposure apparatus.
この発明に係る干渉露光装置は、クエへを浸した液体の
上部に、その液体と同じ屈折率を有する球状のレンズを
設けたものである。The interference exposure apparatus according to the present invention has a spherical lens having the same refractive index as the liquid above the liquid in which the liquid is immersed.
この発明における球状のレンズは、ウェハに光束がどの
方向から入射しても、その進行方向は、大気からとレン
ズに入射してからとで変化しないようになっている。ま
た1球状レンズの効果を利用して集光も行う。The spherical lens of the present invention is such that no matter which direction the light beam enters the wafer, its traveling direction does not change between from the atmosphere and after it enters the lens. It also collects light by utilizing the effect of a single spherical lens.
以下、この発明の一実施例を図について説明する。 An embodiment of the present invention will be described below with reference to the drawings.
第1図は干渉露光装置を示す模式断面図である。FIG. 1 is a schematic cross-sectional view showing an interference exposure apparatus.
図において、(1)〜(3す、(4)〜(8)は第2図
の従来例に示したものと同等であるので説明を省略する
。In the figure, (1) to (3) and (4) to (8) are the same as those shown in the conventional example of FIG. 2, so their explanation will be omitted.
αυは球状の固体で、例えばガラス又は球状の外殻例え
ば、ガラスでおおった液体列えば、水から成るレンズで
ある。αυ is a spherical solid, for example a lens made of glass or a spherical shell, such as a glass-covered liquid column, eg water.
久に動作について説明する。紫外線レーザ(1)から出
射した光は、ミラー(2)で反射され、レンズ(3りを
違った後にビームが広がりながらビームスプリッタ(4
)で2方向lζ分割されるc、2方向に分割された光束
(6)はミラー(sa)、(5b)で反射され、レンズ
αυに入射して平行光線になり、2方向からウェハ(7
)に液体(8)の中で照射する。このとき、干渉は自由
空間に比べて液体(8)中ではピッチが1/n(nは液
体(8)の屈折率)になるので、非常に短ピツチの干渉
を得ることができる。また、ピッチを変えるために、
ミラー(5a)、(5b)を動かし光束(6)の角度を
変えても、レンズ(9)に必ず垂直に入射するので、従
来の露光装置のように液体(8)に垂直に入射させるた
めの可動部分を必要としない。I will explain the operation shortly. The light emitted from the ultraviolet laser (1) is reflected by the mirror (2), and after passing through the lens (3), the beam spreads and passes through the beam splitter (4).
), the light beam (6) is reflected by the mirrors (sa) and (5b), enters the lens αυ, becomes a parallel ray, and hits the wafer (7) from two directions.
) in liquid (8). At this time, the pitch of interference in the liquid (8) is 1/n (n is the refractive index of the liquid (8)) compared to that in free space, so it is possible to obtain interference with a very short pitch. Also, to change the pitch,
Even if the angle of the light beam (6) is changed by moving the mirrors (5a) and (5b), it will always enter the lens (9) perpendicularly. does not require any moving parts.
以上のように、この発明によれば液体に光が入射する部
分をレンズ状にしたので、可動部分が一部省略でき、ま
た他のレンズが一枚省略可能で、装置が安価にできる効
果がある。As described above, according to the present invention, since the part where light enters the liquid is made into a lens shape, some movable parts can be omitted, and one lens can be omitted, which has the effect of making the device cheaper. be.
第1図はこの発明の一実施例による干渉露光装置を示す
模式断面図、第2図は従来の干渉露光装置を示す模式断
面図である。図において(1)は紫外線レーザ、(2J
、(5す、(5b)はミy −(3a)*(11) j
! L/ンズ、(4)はビームスプリッタ、(6)は光
束、(7)はウェハ、(81は液体、(51り、(9b
)は枠、(10す、(xob)は光透過窓である。なお
図中、同一符号は同−又は相当部分を示す。
I紫外線」−ブ
2、5a、5b:ミラー
3a、III/ン又
チに一瓜又フ゛ソッタ
≦tL
7ウエハ
It:”7資:イ本FIG. 1 is a schematic sectional view showing an interference exposure apparatus according to an embodiment of the present invention, and FIG. 2 is a schematic sectional view showing a conventional interference exposure apparatus. In the figure, (1) is an ultraviolet laser, (2J
, (5s, (5b) is mi y - (3a) * (11) j
! (4) is a beam splitter, (6) is a luminous flux, (7) is a wafer, (81 is a liquid, (51 is a liquid, (9b) is
) is a frame, (10, (xob) is a light transmitting window. In the figures, the same reference numerals indicate the same or corresponding parts. 7 wafers It: 7 wafers
Claims (1)
記液体中へ紫外線が入射する境界面を、球状に構成した
ことを特徴とする干渉露光装置。An interference exposure apparatus that performs exposure in a liquid, characterized in that a boundary surface through which ultraviolet light enters the liquid from the atmosphere is configured in a spherical shape.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63221109A JPH0267559A (en) | 1988-09-01 | 1988-09-01 | Interference exposure device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63221109A JPH0267559A (en) | 1988-09-01 | 1988-09-01 | Interference exposure device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0267559A true JPH0267559A (en) | 1990-03-07 |
Family
ID=16761623
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63221109A Pending JPH0267559A (en) | 1988-09-01 | 1988-09-01 | Interference exposure device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0267559A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006210923A (en) * | 2005-01-26 | 2006-08-10 | Taiwan Semiconductor Manufacturing Co Ltd | System and method for producing a pattern on a substrate |
JP2007324590A (en) * | 2006-05-31 | 2007-12-13 | Asml Holding Nv | System and method for printing interference pattern having pitch in lithography system |
US11131929B2 (en) * | 2018-11-07 | 2021-09-28 | Waymo Llc | Systems and methods that utilize angled photolithography for manufacturing light guide elements |
US11131934B2 (en) | 2019-10-29 | 2021-09-28 | Waymo Llc | Non-telecentric light guide elements |
-
1988
- 1988-09-01 JP JP63221109A patent/JPH0267559A/en active Pending
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8110345B2 (en) | 2002-12-04 | 2012-02-07 | Taiwan Semiconductor Manufacturing Company, Ltd. | High resolution lithography system and method |
JP2006210923A (en) * | 2005-01-26 | 2006-08-10 | Taiwan Semiconductor Manufacturing Co Ltd | System and method for producing a pattern on a substrate |
JP2007324590A (en) * | 2006-05-31 | 2007-12-13 | Asml Holding Nv | System and method for printing interference pattern having pitch in lithography system |
US8934084B2 (en) | 2006-05-31 | 2015-01-13 | Asml Holding N.V. | System and method for printing interference patterns having a pitch in a lithography system |
US11131929B2 (en) * | 2018-11-07 | 2021-09-28 | Waymo Llc | Systems and methods that utilize angled photolithography for manufacturing light guide elements |
US11994802B2 (en) | 2018-11-07 | 2024-05-28 | Waymo Llc | Systems and methods that utilize angled photolithography for manufacturing light guide elements |
US11131934B2 (en) | 2019-10-29 | 2021-09-28 | Waymo Llc | Non-telecentric light guide elements |
US11520236B2 (en) | 2019-10-29 | 2022-12-06 | Waymo Llc | Non-telecentric light guide elements |
US11868050B2 (en) | 2019-10-29 | 2024-01-09 | Waymo Llc | Non-telecentric light guide elements |
US12174547B2 (en) | 2019-10-29 | 2024-12-24 | Waymo Llc | Non-telecentric light guide elements |
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