JPH0255330A - Production of oriented film for liquid crystal - Google Patents
Production of oriented film for liquid crystalInfo
- Publication number
- JPH0255330A JPH0255330A JP20762488A JP20762488A JPH0255330A JP H0255330 A JPH0255330 A JP H0255330A JP 20762488 A JP20762488 A JP 20762488A JP 20762488 A JP20762488 A JP 20762488A JP H0255330 A JPH0255330 A JP H0255330A
- Authority
- JP
- Japan
- Prior art keywords
- liquid crystal
- resin layer
- substrate
- crystal molecules
- ultraviolet light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 37
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 239000011347 resin Substances 0.000 claims abstract description 37
- 229920005989 resin Polymers 0.000 claims abstract description 37
- 239000000758 substrate Substances 0.000 claims abstract description 24
- 238000009826 distribution Methods 0.000 claims abstract description 5
- 230000001678 irradiating effect Effects 0.000 claims abstract description 4
- 239000010408 film Substances 0.000 claims description 22
- 238000000034 method Methods 0.000 claims description 18
- 239000007788 liquid Substances 0.000 claims description 6
- 238000005498 polishing Methods 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 2
- 239000010409 thin film Substances 0.000 claims description 2
- 238000005422 blasting Methods 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 5
- 239000002245 particle Substances 0.000 description 12
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 11
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 10
- 229910052804 chromium Inorganic materials 0.000 description 10
- 239000011651 chromium Substances 0.000 description 10
- 229920001721 polyimide Polymers 0.000 description 7
- 239000009719 polyimide resin Substances 0.000 description 6
- 238000005488 sandblasting Methods 0.000 description 6
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 5
- 235000017557 sodium bicarbonate Nutrition 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 239000010453 quartz Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229920005575 poly(amic acid) Polymers 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000004988 Nematic liquid crystal Substances 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 229910000423 chromium oxide Inorganic materials 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical group [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 150000001844 chromium Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 239000002964 rayon Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、高分子樹脂からなる液晶分子の配向膜の製法
に関する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method for producing an alignment film for liquid crystal molecules made of a polymer resin.
従来の技術
液晶分子の配向膜は、液晶デイスプレィには必須のもの
である。BACKGROUND OF THE INVENTION A liquid crystal molecule alignment film is essential for liquid crystal displays.
前記配向膜としては、無機質の斜方蒸着膜、ラビングさ
れた有機樹脂膜等が使われる(例えば、液晶エレクトロ
ニクスの基礎と応用、佐々木 昭夫編)。As the alignment film, an inorganic obliquely deposited film, a rubbed organic resin film, or the like is used (for example, Basics and Applications of Liquid Crystal Electronics, edited by Akio Sasaki).
発明が解決しようとする課題
しかしながら、無機質の斜方蒸着膜については、装置が
比較的高価なこと、真空プロセスなのでプロセス・コス
トが高くつくことに難がある。Problems to be Solved by the Invention However, the problem with obliquely deposited inorganic films is that the equipment is relatively expensive and the process cost is high because it is a vacuum process.
−aにラビング法が産業界では多用されているが、液晶
分子の捻り角の大きいモード、すなわちスーパー・ツィ
スティッド・ネマティック・モードでは、ラビング圧が
軽く、密度の高いラビングが必要となる。この条件を得
るためには、厳格な管理が必要となる。The rubbing method is often used in industry for -a, but in a mode where the twist angle of liquid crystal molecules is large, that is, a super twisted nematic mode, a light rubbing pressure and high density rubbing are required. Strict management is required to achieve this condition.
さらに、スーパー・ツィスティッド・ネマティック・モ
ードを用いた大容量表示においては、液晶分子のプレ・
チルト角を大きくする必要がある。Furthermore, in large-capacity displays using super twisted nematic mode, the pre-
It is necessary to increase the tilt angle.
今のところ、一致した考えは無いが、ブレ・チルト角と
しては、15°〜20°は欲しい。現在、配向膜材料と
して有機樹脂を用いた場合、ラビング法においては、再
現性と信頼性を考慮すると、約10゜が限度である。There is no consensus at the moment, but I want a shake/tilt angle of 15° to 20°. Currently, when an organic resin is used as an alignment film material, the rubbing method has a maximum angle of about 10° in consideration of reproducibility and reliability.
課題を解決するための手段
本発明は前述のような課題を解決するために、樹脂層を
主面に有する基板に平行紫外線光を、前記樹脂層に所定
の角度に照射するような液晶用配向膜の製法を提出する
ものである。Means for Solving the Problems In order to solve the above-mentioned problems, the present invention provides an alignment method for liquid crystal in which a substrate having a resin layer on its main surface is irradiated with parallel ultraviolet light and said resin layer is irradiated at a predetermined angle. The method for manufacturing the membrane will be submitted.
本発明は前述のような課題を解決するために、樹脂層を
主面に有する基板に平行紫外線光を、前記樹脂層に所定
の角度に照射し、更に前記樹脂層をラビングするような
液晶用配向膜の製法をも提供するものである。In order to solve the above-mentioned problems, the present invention provides a method for liquid crystal display in which a substrate having a resin layer on its main surface is irradiated with parallel ultraviolet light at a predetermined angle, and the resin layer is further rubbed. The present invention also provides a method for producing an alignment film.
また、本発明は前述のような課題を解決するために、前
に述べた平行紫外線光の照射において、照射強度の空間
的分布をマスクを用いて、変調することを特徴とする液
晶用配向膜の製法をも提供するものである。Furthermore, in order to solve the above-mentioned problems, the present invention provides an alignment film for liquid crystal, characterized in that the spatial distribution of the irradiation intensity is modulated using a mask in the irradiation with the parallel ultraviolet light described above. It also provides a manufacturing method.
また、本発明は前述のような課題を解決するために、前
述のマスクは紫外線光に対して透明な基板の主面上の、
前記紫外線光を吸収する物質からなる薄膜にサンド・ブ
ラスト法、液体ホーニング法、研磨法によって傷を生起
させることによって得られることを特徴とする前述の様
な液晶用配向膜の製法を提供するものである。In addition, in order to solve the above-mentioned problems, the present invention provides a method for using the above-mentioned mask on the main surface of a substrate that is transparent to ultraviolet light.
Provided is a method for producing an alignment film for a liquid crystal as described above, characterized in that it is obtained by creating scratches on a thin film made of a substance that absorbs ultraviolet light by a sand blasting method, a liquid honing method, or a polishing method. It is.
本発明は前述のような課題を解決するために、前述の平
行紫外線光がエキシマー・レーザーから得られることを
特徴とする前述の様な液晶用配向膜の製法を提供するも
のである。In order to solve the above problems, the present invention provides a method for producing an alignment film for liquid crystal as described above, characterized in that the parallel ultraviolet light described above is obtained from an excimer laser.
作用
液晶分子を配向させるためには、器壁界面での液晶分子
を配向させる必要がある。このために、界面に通常、配
向膜が設けられる。配向膜の表面は、分子レベル程度に
ミクロなある秩序が必要なのは理解される。この秩序は
、液晶分子と相互作用する基が規則的に並んでいる場合
もあるし、凹凸形状が規則的であって、結果として体積
排除効果による自由エネルギーの減少により液晶分子に
配向規制力を課することもあると考えられている。In order to align the working liquid crystal molecules, it is necessary to align the liquid crystal molecules at the vessel wall interface. For this purpose, an alignment film is usually provided at the interface. It is understood that the surface of the alignment film requires a certain degree of microscopic order on the molecular level. This order may be caused by the groups that interact with liquid crystal molecules being regularly arranged, or by having a regular uneven shape, which results in a decrease in free energy due to the volume exclusion effect, which exerts an alignment regulating force on liquid crystal molecules. It is believed that there may be charges.
本発明はこれらの配向メカニズムに関与していると考え
られる。It is believed that the present invention is involved in these orientation mechanisms.
紫外光そのものにより、または紫外光によって発生した
励起された酸素原子またはオゾンによる樹脂層の分解、
あるいは紫外光による分子レベルでの構造の変化によっ
て、樹脂層の体積が変化しがちである。decomposition of the resin layer by the ultraviolet light itself or by excited oxygen atoms or ozone generated by the ultraviolet light;
Alternatively, the volume of the resin layer tends to change due to structural changes at the molecular level caused by ultraviolet light.
紫外光そのものが強力な場合、樹脂層の分子の双極子と
作用し、ある配向をさせようとする力が働くと想定され
る。If the ultraviolet light itself is strong, it is assumed that it acts on the dipoles of the molecules in the resin layer, exerting a force that tends to cause a certain orientation.
本発明はこれらの事に基礎を置いている。しかしこれら
の証拠を明かにすることは難しい。エキシマー・レーザ
ーを使った実験では、観察の結果、樹脂層の体積の変化
が起こっていることは確実である。このことは顕微鏡に
よる観察により、確かめられる。The invention is based on these considerations. However, revealing this evidence is difficult. In experiments using an excimer laser, it is certain that the volume of the resin layer changes as a result of observation. This can be confirmed by observation using a microscope.
平行紫外光の微細な空間的分布を作ることによって、基
板上の有機樹脂層に、例えばより効果的に凹凸が付けら
れるだろうことは、確実である。It is certain that by creating a fine spatial distribution of collimated ultraviolet light, the organic resin layer on the substrate, for example, will be more effectively textured.
このような時、液晶分子は効果的に配向した。また、照
射角度や紫外光光源を選ぶことにより、また、場合によ
ってはこの後ラビングすることにより、高ブレ・チルト
配向が実現出来た。At such times, the liquid crystal molecules were effectively aligned. In addition, by selecting the irradiation angle and the ultraviolet light source, and in some cases by performing rubbing after this, it was possible to achieve high shake/tilt alignment.
前記平行紫外光の微細な空間的分布は、多分、光学系自
身に由来する光源の性質を利用するか、より効果的には
、基板上の有機樹脂層に密着させたマスクを利用する。The fine spatial distribution of the parallel ultraviolet light may be achieved by utilizing the properties of the light source originating from the optical system itself, or more effectively by utilizing a mask that is in close contact with the organic resin layer on the substrate.
このような微細なパターンのマスクは、人手が困難であ
る。はぼ、1ミクロン口に、数個以上の白パターンが必
要である。これは、例えば、以下の様にして得ることが
出来る。合成石英ブランクスに約500オングストロー
ムの膜厚のクロム層を形成し、重曹粒子を使ったサンド
・ブラスト法によって、または液体ホーニング法によっ
て、または酸化クロム粒子等を使った研磨法により無数
の傷を前記クロム層に発生させ、結果的に無数の白パタ
ーンを有するマスクを得る。サンド・ブラスト法や液体
ホーニング法においては、粒子の照射角度を変えること
により、平均的な白パターンの形状が変化し、ひいては
液晶分子の配向性やプレ・チルト角に影響を与える。Masks with such fine patterns are difficult to make manually. Several or more white patterns are required in the 1 micron opening. This can be obtained, for example, as follows. A chromium layer with a thickness of approximately 500 angstroms is formed on a synthetic quartz blank, and countless scratches are removed by sand blasting using baking soda particles, liquid honing, or polishing using chromium oxide particles. generated in the chromium layer, resulting in a mask with countless white patterns. In sand blasting and liquid honing, changing the particle irradiation angle changes the shape of the average white pattern, which in turn affects the orientation and pre-tilt angle of liquid crystal molecules.
紫外線光の光源としては、0.2ミクロン以下の短波長
の光が容易に得られること、照射エネルギーが比較的大
きいこと、平行光が得易いこと、大面積の一括照射が可
能なこと等から、エキシマー・レーザーが最も望ましい
。As a light source for ultraviolet light, it is possible to easily obtain light with a short wavelength of 0.2 microns or less, the irradiation energy is relatively large, it is easy to obtain parallel light, and it is possible to irradiate a large area at once. , excimer lasers are most preferred.
本発明による方法は、真空を必要とせず、この点、設備
費は小さい。The method according to the invention does not require a vacuum and, in this respect, the equipment costs are low.
また、従来の繊維等による樹脂膜のラビングにおいては
、ネマチック液晶分子のプレ・チルトを若干、水平より
立てようとすると、非情に微妙な条件設定と、樹脂膜材
料の選定が必要である。本発明による方法では、従来よ
りプレ・チルト角を大きく出来、再現性も向上し、また
樹脂材料の選択の自由度も広がった。Furthermore, in conventional rubbing of a resin film with fibers, etc., if the pre-tilt of the nematic liquid crystal molecules is to be raised slightly from the horizontal level, it is necessary to set extremely delicate conditions and to select the resin film material. With the method according to the present invention, the pre-tilt angle can be made larger than before, the reproducibility is improved, and the degree of freedom in selecting the resin material is expanded.
また、本発明において、紫外線光照射の後、ラビングす
るのは、基板近傍の液晶分子の並びの方向性を強めるた
めのもので、従来に比べて、より大きなプレ・チルト角
とか、安定性等の本発明の効果は損なわれない。In addition, in the present invention, the purpose of rubbing after irradiation with ultraviolet light is to strengthen the directionality of the arrangement of liquid crystal molecules near the substrate. The effects of the present invention are not impaired.
実施例
以下、本発明の一実施例について、図面を用いて説明す
る。EXAMPLE Hereinafter, an example of the present invention will be described with reference to the drawings.
本実施例では樹脂としてポリイミド樹脂(日本合成ゴム
株式会社製JIB−1、溶剤タイプ)、ポリアミック酸
樹脂(日産化学株式会社製5E−4110、溶剤タイプ
)を用いた。ポリイミド樹脂としては、ネマティック液
晶に対して、低ブレ・チルト角用のものであって、レジ
ンにおいて、もともとポリイミド・オリゴマーが含まれ
ているものである。ポリアミック酸樹脂でも、所定の加
熱処理により、イミド化は可能であり、本実施例ではイ
ミド化が可能な熱処理をした。In this example, polyimide resin (JIB-1, manufactured by Japan Synthetic Rubber Co., Ltd., solvent type) and polyamic acid resin (5E-4110, manufactured by Nissan Chemical Co., Ltd., solvent type) were used as the resins. The polyimide resin is used for low shake/tilt angles for nematic liquid crystals, and the resin originally contains polyimide oligomers. Even polyamic acid resins can be imidized by a predetermined heat treatment, and in this example, a heat treatment capable of imidization was performed.
まず、ポリイミド樹脂とポリアミック酸樹脂を溶剤で粘
度調整をし、スピナーでガラス基板上に回転、塗布した
。これを所定の温度で熱処理した。First, the viscosity of polyimide resin and polyamic acid resin was adjusted using a solvent, and the mixture was spun and coated onto a glass substrate using a spinner. This was heat-treated at a predetermined temperature.
かくて、ポリイミド樹脂層を主面上に有するガラス基板
を得た。In this way, a glass substrate having a polyimide resin layer on the main surface was obtained.
小型の紫外線照射装置を作製した。第1図にこの装置の
概略図を示す。第、1図において、1はラムダ・フィジ
ク社製、エキシマー・レーザー(タイプ、EMG 10
1−104 MSC)であって、アルゴン原子とフッ
素原子のエキシマ−を使うことにより、0.193ミク
ロンの平行紫外光を取り出せるものである。2は基板に
密着したマスク、3は樹脂層、4は基板である。同図に
おいて、aは基板の法線と紫外線光とのなす角である。We created a small ultraviolet irradiation device. FIG. 1 shows a schematic diagram of this device. In Fig. 1, 1 is an excimer laser (type, EMG 10) made by Lambda Physik.
1-104 MSC), which can extract parallel ultraviolet light of 0.193 microns by using an excimer of argon atoms and fluorine atoms. 2 is a mask in close contact with the substrate, 3 is a resin layer, and 4 is a substrate. In the figure, a is the angle between the normal line of the substrate and the ultraviolet light.
(実施例1)
第1図の如く、ただしaはOoとし、マスク2は省き、
直線紫外光を、ポリイミド樹脂層を主面上に有するガラ
ス基板に、すなわちポリイミド樹脂層に10秒照射した
。レーザーのパルス発振の周波数は50ヘルツとした。(Example 1) As shown in Fig. 1, a is Oo, mask 2 is omitted,
A glass substrate having a polyimide resin layer on its main surface, that is, the polyimide resin layer, was irradiated with linear ultraviolet light for 10 seconds. The frequency of laser pulse oscillation was 50 hertz.
次に、通常の方法で、レーヨン布を使って軽いラビング
を行った。Next, light rubbing was performed using a rayon cloth in the usual manner.
この様な基板2枚を、液晶分子がホモジニアス配向にな
るように貼り合わせ、液晶を注入し、液晶パネルを得た
。磁場法によるプレ・チルト測定の結果、12〜13°
のプレ・チルトが得られた。実際のパネルにおいても、
従来に比べて液晶分子のツイストにおける捻れ安定性は
向上した。Two such substrates were bonded together so that the liquid crystal molecules were homogeneously aligned, and liquid crystal was injected to obtain a liquid crystal panel. As a result of pre-tilt measurement using the magnetic field method, it was 12 to 13 degrees.
A pre-tilt of Even in the actual panel,
The twisting stability of liquid crystal molecules has been improved compared to the conventional method.
(実施例2)
実施例1の如く、紫外光を照射した。ただし、第1図に
おいて、aを40°とした。この場合には、ラビングは
行わなかった。(Example 2) As in Example 1, ultraviolet light was irradiated. However, in FIG. 1, a is set to 40°. In this case, no rubbing was performed.
実施例1と同様のプレ・チルト測定の結果、プレ・チル
トは15°以上であることが分かった。実際のスーパー
・ツィスティッド・ネマチック・パネル(STNパネル
)においては、簡単な検討の結果は総合的に特性が向上
することを示唆している。As a result of the same pre-tilt measurement as in Example 1, it was found that the pre-tilt was 15° or more. In actual super twisted nematic panels (STN panels), the results of a simple study suggest that the properties are improved overall.
(実施例3)
前記マスクを以下の如く、作製した。研磨された合成石
英板を入手した。まず、約500オングストロームの膜
厚のクロムを前記合成石英板の上に形成した。(Example 3) The mask was produced as follows. I obtained a polished synthetic quartz plate. First, a chromium film having a thickness of about 500 angstroms was formed on the synthetic quartz plate.
このクロム層に重曹粒子を使ったサンド・ブラスト法に
より、無数の傷を付けた。第2図にサンド・ブラスト法
を行う装置の概略図を示す。11は高圧空気を送るパイ
プ、12は重曹粒子を入れた容器、13は粒子の吹き出
し口、14はクロム層、15は基板であり、またbは粒
子の吹き出し方向と基板の法線とのなす角である。Numerous scratches were created on this chromium layer by sand blasting using baking soda particles. FIG. 2 shows a schematic diagram of an apparatus for performing sand blasting. 11 is a pipe for sending high-pressure air, 12 is a container containing baking soda particles, 13 is a particle outlet, 14 is a chromium layer, 15 is a substrate, and b is the relationship between the particle blowing direction and the normal to the substrate. It is a corner.
本実施例では、第2図すは0°とした。In this example, the angle in FIG. 2 was set to 0°.
つぎに実施例1の如く、エキシマー・レーザーによって
、ただしマスクを用いて、このマスクのクロムの面を樹
脂層に密着させて、樹脂層に紫外光を照射した。第1図
において、角度aはOo及び30°のもの、2条件につ
いて試みた。Next, as in Example 1, the resin layer was irradiated with ultraviolet light using an excimer laser, but using a mask with the chrome surface of the mask in close contact with the resin layer. In FIG. 1, two conditions were tested for angle a: Oo and 30°.
この後、通常のラビングを、樹脂層にラビング強度を小
さくして行った。Thereafter, the resin layer was subjected to normal rubbing at a low rubbing intensity.
液晶パネルを作製し、液晶分子のプレ・チルト角を測定
したところ、その値は15°〜30°の間にあり、これ
に至る諸条件に依存していた。再現性は十分、保証され
ていた。When a liquid crystal panel was manufactured and the pre-tilt angle of the liquid crystal molecules was measured, the value was between 15° and 30°, and it depended on various conditions leading to this value. Reproducibility was sufficient and guaranteed.
STNパネルにおいては、緒特性は優れたものであった
。The STN panel had excellent properties.
(実施例4)
実施例3の如く、マスクを作製した。ただし、重曹粒子
をクロム面に対して、第2図においてbが約70°にな
るようにした。(Example 4) A mask was produced as in Example 3. However, the angle b of the baking soda particles was approximately 70° in FIG. 2 with respect to the chromium surface.
つぎに実施例1の如く、エキシマー・レーザーによって
、ただしマスクを用いて、このマスクのクロムの面を樹
脂層に密着させて、樹脂層に紫外光を照射した。第1図
において、角度aはOo及び30’のもの、2条件につ
いて試みた。Next, as in Example 1, the resin layer was irradiated with ultraviolet light using an excimer laser, but using a mask with the chrome surface of the mask in close contact with the resin layer. In FIG. 1, two conditions were tested for angle a: Oo and 30'.
液晶パネルを作製し、液晶分子のプレ・チルト角を測定
したところ、その値は15°〜30°の間にあり、これ
に至る諸条件に依存していた。再現性は十分、保証され
ていた。When a liquid crystal panel was manufactured and the pre-tilt angle of the liquid crystal molecules was measured, the value was between 15° and 30°, and it depended on various conditions leading to this value. Reproducibility was sufficient and guaranteed.
STNパネルにおいては、緒特性は優れたものであった
。The STN panel had excellent properties.
(実施例5)
マスクを以下のように作製した。実施例3の様に、合成
石英板にクロムを形成し、1ミクロン以下の粒径のアル
ミナを使った液体ホーニング、または酸化クロムを使っ
た研磨により、前記クロムに無数の傷を生起させた。こ
のとき、液体ホーニングの場合には、粒子の方向とクロ
ム面の法線とのなす角度については、考慮を払った。ま
た、研磨の場合には、傷が方向性を有する条件と、そう
でない場合とについて検討を加えた。(Example 5) A mask was produced as follows. As in Example 3, chromium was formed on a synthetic quartz plate, and numerous scratches were created on the chromium by liquid honing using alumina with a particle size of 1 micron or less or polishing using chromium oxide. At this time, in the case of liquid honing, consideration was given to the angle between the direction of the particles and the normal to the chromium surface. In addition, in the case of polishing, we investigated conditions in which the scratches have directionality and cases in which they do not.
このマスクを用いて、実施例3、実施例4と同様の試み
をなした。Using this mask, attempts similar to those in Examples 3 and 4 were made.
結果は総合的に判断して、優れたものであった。Overall, the results were excellent.
発明の効果
以上本発明は液晶分子配向用樹脂膜を得るための方法を
提供するものであり、産業上の価値は大なるものがある
。Effects of the Invention The present invention provides a method for obtaining a resin film for aligning liquid crystal molecules, and has great industrial value.
第1図は樹脂層に平行紫外線を照射するための装置の概
略構成図、第2図はサンド・ブラスト法を行う装置の概
略構成図である。
1・・・・・・エキシマー・レーザー、2・・・・・・
基板に密着したマスク、3・・・・・・樹脂層、4・・
・・・・基板、11・・・・・・高圧空気を送るパイプ
、12・・・・・・重曹粒子を入れた容器、13・・・
・・・粒子の吹き出し口、14・・・・・・クロム層、
15・・・・・・基板。FIG. 1 is a schematic diagram of an apparatus for irradiating a resin layer with parallel ultraviolet rays, and FIG. 2 is a schematic diagram of an apparatus for performing sand blasting. 1...Excimer laser, 2...
Mask in close contact with the substrate, 3...Resin layer, 4...
... Substrate, 11 ... Pipe for sending high-pressure air, 12 ... Container containing baking soda particles, 13 ...
...Particle outlet, 14...Chromium layer,
15... Board.
Claims (5)
記基板に所定の角度に照射することを特徴とする液晶用
配向膜の製法。(1) A method for producing an alignment film for a liquid crystal, which comprises irradiating a substrate having a resin layer on its main surface with parallel ultraviolet light at a predetermined angle.
記樹脂層に所定の角度に照射し、更に前記樹脂層をラビ
ングすることを特徴とする液晶用配向膜の製法。(2) A method for producing an alignment film for a liquid crystal, which comprises irradiating a substrate having a resin layer on its main surface with parallel ultraviolet light at a predetermined angle, and then rubbing the resin layer.
用いて、変調することを特徴とする請求項(1)または
(2)のいずれかに記載の液晶用配向膜の製法。(3) The method for producing an alignment film for a liquid crystal according to claim 1, wherein the spatial distribution of the irradiation intensity of the parallel ultraviolet light is modulated using a mask.
、前記紫外線光を吸収する物質からなる薄膜にサンド・
ブラスト法、液体ホーニング法、研磨法によって傷を生
起させることによっていることを特徴とする請求項(1
)または(2)のいずれかに記載の液晶用配向膜の製法
。(4) The mask is a thin film made of a substance that absorbs ultraviolet light on the main surface of a substrate that is transparent to ultraviolet light.
Claim (1) characterized in that the scratches are caused by a blasting method, a liquid honing method, or a polishing method.
) or (2), the method for producing an alignment film for liquid crystal.
ることを特徴とする請求項(1)または(2)のいずれ
かに記載の液晶用配向膜の製法。(5) The method for producing an alignment film for liquid crystal according to claim 1 or 2, wherein the parallel ultraviolet light is obtained from an excimer laser.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20762488A JPH0255330A (en) | 1988-08-22 | 1988-08-22 | Production of oriented film for liquid crystal |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20762488A JPH0255330A (en) | 1988-08-22 | 1988-08-22 | Production of oriented film for liquid crystal |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0255330A true JPH0255330A (en) | 1990-02-23 |
Family
ID=16542879
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20762488A Pending JPH0255330A (en) | 1988-08-22 | 1988-08-22 | Production of oriented film for liquid crystal |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0255330A (en) |
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EP0613037A2 (en) * | 1993-01-29 | 1994-08-31 | Sharp Kabushiki Kaisha | A liquid crystal display apparatus,a method for producing the same,and a substrate |
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US5579141A (en) * | 1993-07-23 | 1996-11-26 | Sharp Kabushiki Kaisha | Liquid crystal display apparatus having regions with different pretilt angles |
US5594570A (en) * | 1993-07-30 | 1997-01-14 | Sharp Kabushiki Kaisha | Liquid crystal display device and method for producing the same |
US5627667A (en) * | 1993-01-29 | 1997-05-06 | Sharp Kabushiki Kaisha | Liquid crystal display apparatus, a method for producing the same, and a substrate |
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