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JPH0244902B2 - NANJISEISEIMITSUBUHINNOHYOMENKOKASHORIHOHO - Google Patents

NANJISEISEIMITSUBUHINNOHYOMENKOKASHORIHOHO

Info

Publication number
JPH0244902B2
JPH0244902B2 JP27199085A JP27199085A JPH0244902B2 JP H0244902 B2 JPH0244902 B2 JP H0244902B2 JP 27199085 A JP27199085 A JP 27199085A JP 27199085 A JP27199085 A JP 27199085A JP H0244902 B2 JPH0244902 B2 JP H0244902B2
Authority
JP
Japan
Prior art keywords
plating
degreasing
soft magnetic
precision parts
treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP27199085A
Other languages
Japanese (ja)
Other versions
JPS62133079A (en
Inventor
Hitoshi Ito
Kyomitsu Suga
Keiichi Yonezawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seikosha KK
Original Assignee
Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seikosha KK filed Critical Seikosha KK
Priority to JP27199085A priority Critical patent/JPH0244902B2/en
Publication of JPS62133079A publication Critical patent/JPS62133079A/en
Publication of JPH0244902B2 publication Critical patent/JPH0244902B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/1803Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
    • C23C18/1824Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by chemical pretreatment
    • C23C18/1837Multistep pretreatment
    • C23C18/1844Multistep pretreatment with use of organic or inorganic compounds other than metals, first
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/1803Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
    • C23C18/1813Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by radiant energy
    • C23C18/1817Heat
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/32Coating with nickel, cobalt or mixtures thereof with phosphorus or boron

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Impact Printers (AREA)
  • Chemically Coating (AREA)

Description

【発明の詳細な説明】 [産業上の利用分野] この発明は、プリンターの印字駆動部に使用さ
れるアーマチアやヨークのように、磁気回路を構
成するとともに耐摩耗性が要求される精密部品の
表面硬化処理方法に関するものである。
[Detailed Description of the Invention] [Industrial Application Field] This invention is applicable to precision parts that constitute a magnetic circuit and require wear resistance, such as armatures and yokes used in the printing drive section of printers. The present invention relates to a surface hardening treatment method.

[従来の技術] 従来において、軟磁特性が要求される精密部
品、たとえばプリンターの印字駆動部のアーマチ
ア、ヨーク等には、電磁軟鉄、ケイ素鋼等の表面
に防錆および耐摩耗性を付与する目的でNiメツ
キ、Znメツキ、Crメツキ、Ni−P無電解メツキ
などがほどこされている。
[Prior Art] Conventionally, precision parts that require soft magnetic properties, such as armatures and yokes of printing drive parts of printers, have been made of electromagnetic soft iron, silicon steel, etc. for the purpose of imparting rust prevention and wear resistance to their surfaces. Ni plating, Zn plating, Cr plating, Ni-P electroless plating, etc. are applied.

[発明が解決しようとする問題点] 上記従来例において、Niメツキ、Znメツキは
表面硬度がHV400程度であり耐摩耗性で問題が
ある。CrメツキはHV800程度であり耐久性は有
利であるが電気メツキのため部品へのメツキの付
き回りにムラがあり、量産上不適当である。Ni
−Pメツキでも耐摩耗性がHV400以下と低いの
で問題である。なおNi−Pメツキ後400℃前後で
熱処理を行なうとHV800程度に向上するが、そ
の場合材料本来の磁気特性に劣化が生じるため使
用することができない。
[Problems to be Solved by the Invention] In the conventional example described above, the surface hardness of Ni plating and Zn plating is about HV400, and there is a problem in wear resistance. Cr plating has a rating of about HV800 and is advantageous in terms of durability, but because it is electroplated, the plating coverage on parts is uneven, making it unsuitable for mass production. Ni
Even with -P plating, the abrasion resistance is low at HV400 or less, which is a problem. Note that if heat treatment is performed at around 400°C after Ni-P plating, the HV will be improved to about 800, but in that case, the original magnetic properties of the material will deteriorate, so it cannot be used.

[問題点を解決するための手段] この発明はこうした従来例における問題点を解
決するためのものであり、ケイ素鋼部材に対し、
まず、磁気特性を得る目的、および表面の酸化膜
の形成防止を兼ねて真空中において焼鈍し、つい
でメツキのための前処理として、有機溶剤による
脱脂処理、アルカリによる脱脂処理、酸洗に処
理、さらに酸とインヒビターの混合液によるシリ
コン酸化物除去処理を施した後、コバルト・リン
系無電解化学メツキを施すことにより、被処理材
の磁性特性を損なうことなく、耐摩耗性の向上し
た表面硬化処理をするものである。
[Means for Solving the Problems] The present invention is intended to solve the problems in the conventional examples.
First, it is annealed in vacuum for the purpose of obtaining magnetic properties and to prevent the formation of an oxide film on the surface, and then, as a pretreatment for plating, it is degreased with an organic solvent, degreased with an alkali, and pickled. Furthermore, after performing silicon oxide removal treatment using a mixed solution of acid and inhibitor, we apply cobalt-phosphorus electroless chemical plating to harden the surface with improved wear resistance without impairing the magnetic properties of the treated material. It is for processing.

[実施例] まず素材として3%ケイ素鋼を用い、所定の部
品形状に加工しておく。このケイ素鋼は磁気特性
はすぐれているが、表面が活性のため酸化膜
(SiO2)を形成しやすい材料である。
[Example] First, 3% silicon steel is used as a material and processed into a predetermined part shape. Although silicon steel has excellent magnetic properties, it has an active surface and is prone to forming an oxide film (SiO2).

本発明による処理法は、第一ステツプとして、
ケイ素鋼本来の磁気特性を得る目的とともにケイ
素鋼表面に酸化膜の形成防止を兼ねて、真空中に
おいて850℃、1時間の焼鈍をおこなう。この場
合、真空雰囲気以外のN2、Ar等の無酸化雰囲気
では表面見かけ上光輝に仕上がるが、最終的なメ
ツキ仕上り後の密着性が不十分であり、真空雰囲
気による熱処理が必要とされる。
In the treatment method according to the present invention, as a first step,
In order to obtain the original magnetic properties of silicon steel and also to prevent the formation of an oxide film on the silicon steel surface, annealing is performed at 850°C for 1 hour in a vacuum. In this case, in a non-oxidizing atmosphere such as N2 or Ar other than a vacuum atmosphere, the surface appears to be bright, but the adhesion after the final plating finish is insufficient, and heat treatment in a vacuum atmosphere is required.

第二のステツプとして、無電解Coメツキの前
処理として次の工程の処理をする。
As a second step, the next process is performed as a pretreatment for electroless Co plating.

(1) 脱脂処理として、主に鉱物油の除去を目的と
して有機溶剤による処理をする。有機溶剤とし
て、例えば1−1−1トリクロルエタンの液中
に超音波をかけて約3分間浸漬する。
(1) Degreasing treatment is performed using organic solvents mainly to remove mineral oil. The sample is immersed in an organic solvent such as 1-1-1 trichloroethane for about 3 minutes by applying ultrasonic waves.

(2) ついで第二の脱脂処理として、主に動、植物
油の除去を目的として、アルカリと表面活性剤
の混合液、たとえばオルソケイ酸ソーダのよう
な市販のアルカリ脱脂剤で、被処理材を揺動し
ながら約3分間液中に浸漬する。
(2) Next, as a second degreasing treatment, the material to be treated is shaken with a mixture of alkali and a surfactant, such as a commercially available alkaline degreaser such as sodium orthosilicate, mainly for the purpose of removing animal and vegetable oils. Immerse it in the liquid for about 3 minutes while moving it.

(3) つぎに主に鉄の酸化物の除去を目的として、
7%の塩酸水溶液中で約10〜30秒被処理材を揺
動しながら浸漬する。
(3) Next, mainly for the purpose of removing iron oxides,
The material to be treated is immersed in a 7% hydrochloric acid aqueous solution for about 10 to 30 seconds while rocking.

(4) さらに主にシリコンの酸化物の除去を目的と
して、フツ素化合物を主成分とした、酸とイン
ヒビターの混合液の希釈液中に被処理物を揺動
しながら10〜30秒間浸漬する。
(4) Furthermore, the object to be treated is immersed for 10 to 30 seconds while rocking in a diluted mixture of acid and inhibitor, mainly containing fluorine compounds, for the purpose of removing silicon oxides. .

上記(1)〜(4)の前処理を施した後、最後に被処理
物の耐久性を上げる目的で、ジ亜リン酸ソーダを
還元剤としたコバルト無電解メツキ液中に浸漬し
て、コバルトに4〜6%程度のリンを添加した無
電解化学Coメツキを10〜20μm程度付着させる。
10μm未満では十分な耐久性を得ることはでき
ず、20μmを超えると量産性の点から問題があ
る。
After performing the pre-treatments in (1) to (4) above, finally, in order to increase the durability of the object to be treated, it is immersed in a cobalt electroless plating solution using sodium diphosphite as a reducing agent. Electroless chemical Co plating, which is made by adding about 4 to 6% phosphorus to cobalt, is deposited to a thickness of about 10 to 20 μm.
If it is less than 10 μm, sufficient durability cannot be obtained, and if it exceeds 20 μm, there are problems in terms of mass production.

以上の工程を経て得られた被処理材はCo−P
系の化学メツキの表面硬度はHV400〜500であ
り、従来のNiメツキに近いものであるが、潤滑
性が保持されているため、耐摩耗性が必要とされ
る精密部品に適したものである。
The treated material obtained through the above steps is Co-P.
The surface hardness of this type of chemical plating is HV400-500, which is close to conventional Ni plating, but it retains lubricity, making it suitable for precision parts that require wear resistance. .

インバクト型ドツドプリンタの印字機構のヨー
クに本発明の処理を施したものを用いて、従来の
Niメツキのものを使つたプリンタと印字回数を
比較すると、従来のものでは3000万字程度の耐久
性であつたのに対し、本発明のものでは約2億字
と耐久性が飛躍的に向上した。
By using the yoke of the printing mechanism of an impact-type dot printer that has been treated with the present invention,
Comparing the number of prints with a printer using Ni plating, the durability of the conventional printer was approximately 30 million characters, while the durability of the printer of the present invention was dramatically improved to approximately 200 million characters. .

[発明の効果] この発明によれば、軟磁性精密部品に対し、磁
性特性を保ちながら、表面硬度とともに潤滑性を
も付与することができ、耐久性を向上させること
ができる。
[Effects of the Invention] According to the present invention, it is possible to impart not only surface hardness but also lubricity to a soft magnetic precision component while maintaining its magnetic properties, thereby improving durability.

Claims (1)

【特許請求の範囲】 1 軟磁性ケイ素鋼よりなる精密部品に対し、 真空中で焼鈍する工程と、 メツキの前処理として、有機溶剤による脱脂処
理、アルカリによる脱脂処理、酸洗に処理、さら
に酸とインヒビターの混合液によるシリコン酸化
物除去処理を順次施す工程と、 コバルト・リン系無電解化学メツキを施す工程
とを含む軟磁性精密部品の表面硬化処理方法。
[Claims] 1 Precision parts made of soft magnetic silicon steel are annealed in a vacuum, and as pre-treatments for plating, degreasing with an organic solvent, degreasing with an alkali, pickling, and further treatment with an acid. A surface hardening treatment method for soft magnetic precision parts, comprising the steps of sequentially applying silicon oxide removal treatment using a mixed solution of and an inhibitor, and applying cobalt-phosphorus electroless chemical plating.
JP27199085A 1985-12-03 1985-12-03 NANJISEISEIMITSUBUHINNOHYOMENKOKASHORIHOHO Expired - Lifetime JPH0244902B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27199085A JPH0244902B2 (en) 1985-12-03 1985-12-03 NANJISEISEIMITSUBUHINNOHYOMENKOKASHORIHOHO

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27199085A JPH0244902B2 (en) 1985-12-03 1985-12-03 NANJISEISEIMITSUBUHINNOHYOMENKOKASHORIHOHO

Publications (2)

Publication Number Publication Date
JPS62133079A JPS62133079A (en) 1987-06-16
JPH0244902B2 true JPH0244902B2 (en) 1990-10-05

Family

ID=17507612

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27199085A Expired - Lifetime JPH0244902B2 (en) 1985-12-03 1985-12-03 NANJISEISEIMITSUBUHINNOHYOMENKOKASHORIHOHO

Country Status (1)

Country Link
JP (1) JPH0244902B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY139405A (en) 1998-09-28 2009-09-30 Ibiden Co Ltd Printed circuit board and method for its production
CN108796568B (en) * 2017-05-02 2020-07-14 贵州理工学院 Method and device for preparing high-silicon steel thin strip under low-intensity magnetic field

Also Published As

Publication number Publication date
JPS62133079A (en) 1987-06-16

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