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JPH023626Y2 - - Google Patents

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Publication number
JPH023626Y2
JPH023626Y2 JP137484U JP137484U JPH023626Y2 JP H023626 Y2 JPH023626 Y2 JP H023626Y2 JP 137484 U JP137484 U JP 137484U JP 137484 U JP137484 U JP 137484U JP H023626 Y2 JPH023626 Y2 JP H023626Y2
Authority
JP
Japan
Prior art keywords
resin
semiconductor
semiconductor device
lead
semiconductor pellet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP137484U
Other languages
Japanese (ja)
Other versions
JPS60113637U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP137484U priority Critical patent/JPS60113637U/en
Publication of JPS60113637U publication Critical patent/JPS60113637U/en
Application granted granted Critical
Publication of JPH023626Y2 publication Critical patent/JPH023626Y2/ja
Granted legal-status Critical Current

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  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Wire Bonding (AREA)

Description

【考案の詳細な説明】 技術分野 本考案はフイルムキヤリア方式の半導体装置に
関する。
[Detailed Description of the Invention] Technical Field The present invention relates to a film carrier type semiconductor device.

背景技術 混成集積回路装置等の製造に用いられるフイル
ムキヤリアに支持された半導体装置の一例を第1
図及び第2図に示す。図において1はポリイミド
等の長尺のフイルムで、両側縁に沿つてスプロケ
ツト孔1aが穿設され、中央部に一直線状に一定
の間隔で矩形乃至方形の第1の透孔1bが穿設さ
れ、さらに第1の透孔1bの周囲に各辺に対応し
て第2の透孔1cが穿設されている。2はフイル
ム1の透孔1b,1cを塞ぐように貼り付けた銅
箔をエツチングして第1の透孔1b内に一端が位
置し、第2の透孔1cを横切つて形成した複数の
リードで、金や錫等の共晶化し易い金属あるいは
半田付けし易い金属にてメツキされている。3は
第1の透孔1b内に挿入した半導体ペレツトで、
一主面3aに側周面に沿つて複数のバンプ電極4
が形成されている。このバンプ電極4はリード2
と対応し、接合性の良好な金属で形成されてい
る。そして半田付けあるいは熱圧着によりバンプ
電極4がリード2に接続されている。
BACKGROUND ART An example of a semiconductor device supported by a film carrier used for manufacturing hybrid integrated circuit devices, etc.
As shown in Fig. and Fig. 2. In the figure, 1 is a long film made of polyimide or the like, in which sprocket holes 1a are drilled along both side edges, and rectangular or square first through holes 1b are drilled in a straight line at regular intervals in the center. Further, second through holes 1c are bored around each side of the first through hole 1b. 2 is a plurality of etched copper foils pasted to cover the through holes 1b and 1c of the film 1, one end of which is located within the first through hole 1b, and which is formed across the second through hole 1c. The lead is plated with a metal that easily forms a eutectic crystal, such as gold or tin, or a metal that is easy to solder. 3 is a semiconductor pellet inserted into the first through hole 1b;
A plurality of bump electrodes 4 are provided on one main surface 3a along the side peripheral surface.
is formed. This bump electrode 4 is connected to the lead 2
It is made of a metal with good bonding properties. The bump electrodes 4 are connected to the leads 2 by soldering or thermocompression bonding.

この半導体ペレツト3にリード2を接続した半
導体装置は、第2の透孔1c内でリード2を切断
すると共に各第2の透孔1c,1c間の連結部分
を切断して個々の半導体装置に分離され、混成集
積回路装置等の基板に供給されリード2の遊端が
基板上の導電パターンに一括して接続される。こ
の供給はフイルム1が可撓性があるためロール巻
きした状態で実施でき自動化が容易であるという
利点がある。
The semiconductor device in which the lead 2 is connected to the semiconductor pellet 3 is manufactured by cutting the lead 2 inside the second through hole 1c and cutting the connecting portion between each of the second through holes 1c, 1c to separate the semiconductor device into individual semiconductor devices. The leads 2 are separated and supplied to a substrate such as a hybrid integrated circuit device, and the free ends of the leads 2 are collectively connected to conductive patterns on the substrate. Since the film 1 is flexible, this supply can be carried out in a rolled state and has the advantage of being easy to automate.

ところでフイルム1をロール巻きした状態や一
直線上に引き延ばした状態でも半導体ペレツト3
に外力が加えられると、例えば第3図に示すよう
にリード2が変形し、半導体ペレツト3が傾いて
半導体ペレツト3の周縁部とリード2が近接乃至
接触して耐電圧の低下や短絡事故の原因となつた
り、リード2がバンプ電極4から剥離して断線事
故を起すことがあつて、一般的にリード2と半導
体ペレツト3の一主面3a間に樹脂をコーテイン
グしてリード2と半導体ペレツト3の不所望部分
の近接や接触を防止している。
By the way, even when the film 1 is rolled or stretched in a straight line, the semiconductor pellets 3
When an external force is applied to the lead 2, for example, as shown in Fig. 3, the lead 2 is deformed, the semiconductor pellet 3 is tilted, and the periphery of the semiconductor pellet 3 and the lead 2 come close to each other or come into contact with each other, resulting in a decrease in withstand voltage and a short-circuit accident. Otherwise, the lead 2 may peel off from the bump electrode 4, causing a disconnection accident. Generally, resin is coated between the main surface 3a of the lead 2 and the semiconductor pellet 3 to separate the lead 2 and the semiconductor pellet. This prevents the undesired parts of No. 3 from coming close to or coming into contact with each other.

この樹脂コーテイングは第4図に示すように半
導体ペレツト3の中央部上方にノズル5を配置
し、このノズル5から粘度調整された樹脂6を定
量滴下供給して半導体ペレツト3の主面3a上に
広げるようにしていた。
This resin coating is done by placing a nozzle 5 above the center of the semiconductor pellet 3 as shown in FIG. I was trying to spread it out.

ところが、この方法では図示例のように樹脂層
6aが主面3a中央部で盛り上り、周縁部分で厚
みが薄くなるという問題があつた。この主面3a
の中央部の厚みは、樹脂6の粘度、供給量、硬化
速度等により変化するが、厳密な定量供給が困難
な上、粘度が高いと広がる途中で硬化が進行して
中央部が厚く周縁部が薄い状態となつて絶縁が不
完全となるだけでなく半導体装置の厚みHが規格
を越えることがあつた。一方粘度が低いと広がり
性は良好であるがペレツト3からこぼれ易くな
り、またノズル5から樹脂の糸を引き易く、フイ
ルム1上の不所望部分を汚すことがあり、さらに
はペレツト側周面と隣接する部分の樹脂が薄くな
つて耐電圧低下等の問題を完全に除くことができ
なかつた。
However, this method has a problem in that the resin layer 6a bulges at the center of the main surface 3a and becomes thinner at the peripheral edge, as shown in the illustrated example. This main surface 3a
The thickness at the center of the resin 6 changes depending on the viscosity, supply amount, curing speed, etc. of the resin 6, but it is difficult to supply a precise amount, and if the viscosity is high, curing progresses while it spreads, resulting in a thick center and a thick peripheral area. Not only did the insulation become incomplete due to the thinness of the semiconductor device, but the thickness H of the semiconductor device sometimes exceeded the standard. On the other hand, if the viscosity is low, the spreadability is good, but the resin tends to spill from the pellet 3, and the resin threads are likely to be drawn from the nozzle 5, which may stain undesired areas on the film 1. Problems such as a decrease in withstand voltage due to the thinness of the resin in adjacent parts could not be completely eliminated.

また半導体装置はフイルム1上に連続的に形成
されているため厚みが規格を越えたものがあつて
も交換することができず、フイルム1を切断して
不良半導体装置を除去しフイルム1を継ぎ合せた
り、外形寸法不良のまま出荷せざるを得なかつ
た。
Furthermore, since the semiconductor devices are continuously formed on the film 1, even if there is a device whose thickness exceeds the standard, it cannot be replaced, so the film 1 is cut, the defective semiconductor device is removed, and the film 1 is spliced. They had no choice but to ship the products with defective external dimensions.

考案の開示 目 的 本考案は上記問題点に鑑み提案されたもので、
樹脂の盛上りをなくし半導体ペレツト周縁部の絶
縁を完全にした半導体装置を提供する。
Purpose of disclosure of the invention This invention was proposed in view of the above problems.
To provide a semiconductor device in which the bulge of resin is eliminated and the peripheral edge of a semiconductor pellet is completely insulated.

構 成 本考案は一主面の周縁に沿つて複数のバンプ電
極を形成した半導体ペレツトの各バンプ電極にリ
ボン状リードの一端を接続したものにおいて、上
記半導体ペレツトのバンプ電極に沿つて環状の樹
脂層を形成したことを特徴とする。
Structure The present invention is a semiconductor pellet in which a plurality of bump electrodes are formed along the periphery of one principal surface, and one end of a ribbon-shaped lead is connected to each bump electrode of the semiconductor pellet. It is characterized by forming a layer.

考案の実施例 以下に本考案の実施例を第1図半導体装置に適
用し、第5図及び第6図から説明する。図におい
て第1図及び第2図と同一符号は同一物を示し説
明を省略する。本考案の特徴は樹脂層7にある。
即ち樹脂層7は半導体ペレツト3′の一主面3
a′上にバンプ電極4に沿つて環状に形成されてい
る。第5図実施例では半導体ペレツト3′の中央
部に凹部8を設け凹部8と外周面で囲まれた主面
3a上に樹脂を供給することにより環状の樹脂層
7を形成している。
Embodiment of the invention An embodiment of the invention will be applied to the semiconductor device shown in FIG. 1 and will be explained below with reference to FIGS. 5 and 6. In the drawings, the same reference numerals as in FIGS. 1 and 2 indicate the same components, and the description thereof will be omitted. The feature of the present invention lies in the resin layer 7.
That is, the resin layer 7 is formed on one main surface 3 of the semiconductor pellet 3'.
It is formed in an annular shape along the bump electrode 4 on a'. In the embodiment shown in FIG. 5, an annular resin layer 7 is formed by providing a recess 8 in the center of the semiconductor pellet 3' and supplying resin onto the main surface 3a surrounded by the recess 8 and the outer peripheral surface.

従来の半導体装置では第7図に示すように半導
体ペレツト3に対して樹脂6の接触角θ、樹脂6
の接触長さLに対して樹脂6の厚みtが決定さ
れ、バンプ電極4位置での樹脂の厚みも薄かつた
のに対し、第5図装置では第8図に示すように従
来と同じ接触角θに対し、樹脂7の接触長さL′が
従来の半分以下となり樹脂7の厚みt′が薄くでき
る。反面樹脂7の頂点がバンプ電極4に近接する
ため樹脂7がリード2と主面3a′の間に入り込み
易くなる。
In the conventional semiconductor device, as shown in FIG. 7, the contact angle θ of the resin 6 with respect to the semiconductor pellet 3,
The thickness t of the resin 6 was determined for the contact length L of , and the thickness of the resin at the bump electrode 4 position was also thin, whereas in the device shown in FIG. 5, the same contact as before as shown in FIG. With respect to the angle θ, the contact length L' of the resin 7 is less than half of the conventional length, and the thickness t' of the resin 7 can be reduced. On the other hand, since the apex of the resin 7 is close to the bump electrode 4, the resin 7 easily enters between the lead 2 and the main surface 3a'.

そのため、樹脂層7の盛り上りが小さく、半導
体装置の厚みを一定値以下に規制し易く、またペ
レツト側周面と隣接する部分の樹脂層を厚く形成
でき、リードの変形による耐電圧の低下や短絡事
故を防止できる。
Therefore, the swelling of the resin layer 7 is small, making it easy to control the thickness of the semiconductor device to below a certain value, and making it possible to form a thick resin layer in the area adjacent to the pellet side peripheral surface, which prevents a drop in withstand voltage due to deformation of the leads. Short circuit accidents can be prevented.

第9図及び第10図は本考案の他の実施例を示
すもので、第5図装置と同一符号は同一物を示し
説明を省略する。第5図装置と相異するのは半導
体ペレツト3″で、その一主面3a″の中央部に樹
脂7に対して濡れ性の劣る部材9を被着し、一主
面3a″上の部材9と側周面との間に環状の樹脂層
7を形成している。
FIGS. 9 and 10 show other embodiments of the present invention, in which the same reference numerals as in the apparatus shown in FIG. What is different from the device shown in FIG. 5 is the semiconductor pellet 3'', in which a member 9 having poor wettability with respect to the resin 7 is adhered to the center of one main surface 3a'', and a member 9 on one main surface 3a'' is An annular resin layer 7 is formed between the resin layer 9 and the side peripheral surface.

これによれば第5図半導体装置と同様の効果が
得られる他、樹脂を半導体ペレツトの中央に供給
することができ、また樹脂の粘度に応じて部材7
の面積を変え樹脂の拡がりを一様にすることもで
きる。
According to this, in addition to obtaining the same effect as the semiconductor device shown in FIG. 5, the resin can be supplied to the center of the semiconductor pellet, and the member 7 can be
It is also possible to make the spread of the resin uniform by changing the area of the resin.

尚、本考案は上記実施例にのみ限定されること
なく、例えば、第5図装置の凹部8の代りに穴を
穿設してもよい。
Incidentally, the present invention is not limited to the above-mentioned embodiment, and for example, a hole may be provided in place of the recess 8 of the device shown in FIG.

考案の効果 以上のように本考案によれば、耐電圧の低下や
短絡事故を防止して、厚みを規定値以下に規制し
た半導体装置を実現できる。
Effects of the Invention As described above, according to the present invention, it is possible to realize a semiconductor device that prevents a drop in withstand voltage and short-circuit accidents, and whose thickness is regulated to a specified value or less.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はフイルムキヤリアに支持された半導体
装置の平面図、第2図は第1図A−A断面図、第
3図は第1図半導体装置の問題点を示す側断面
図、第4図は樹脂コーテイングを示す側断面図、
第5図は本考案の一実施例を示す平面図、第6図
は第5図の側断面図、第7図は従来の樹脂コーテ
イング状態を示す側面図、第8図は本考案による
半導体装置の樹脂コーテイング状態を示す側面
図、第9図は本考案の他の実施例を示す平面図、
第10図は第9図装置の側断面図を示す。 2……リード、3′,3″……半導体ペレツト、
3a′,3a″……一主面、4……バンプ電極、7…
…樹脂層。
FIG. 1 is a plan view of a semiconductor device supported by a film carrier, FIG. 2 is a sectional view taken along line A-A in FIG. 1, FIG. 3 is a side sectional view showing problems in the semiconductor device shown in FIG. is a side sectional view showing the resin coating,
FIG. 5 is a plan view showing an embodiment of the present invention, FIG. 6 is a side sectional view of FIG. 5, FIG. 7 is a side view showing a conventional resin coating state, and FIG. 8 is a semiconductor device according to the present invention. FIG. 9 is a side view showing the state of resin coating; FIG. 9 is a plan view showing another embodiment of the present invention;
FIG. 10 shows a side sectional view of the device of FIG. 9. 2...Lead, 3', 3''...Semiconductor pellet,
3a', 3a''...one main surface, 4...bump electrode, 7...
...Resin layer.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 一主面の周縁に沿つて複数のバンプ電極を形成
した半導体ペレツトの各バンプ電極にリボン状リ
ードの一端を接続したものにおいて、上記半導体
ペレツトのバンプ電極に沿つて環状の樹脂層を形
成したことを特徴とする半導体装置。
A semiconductor pellet having a plurality of bump electrodes formed along the periphery of one main surface, and one end of a ribbon-shaped lead connected to each bump electrode, wherein an annular resin layer is formed along the bump electrodes of the semiconductor pellet. A semiconductor device characterized by:
JP137484U 1984-01-09 1984-01-09 semiconductor equipment Granted JPS60113637U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP137484U JPS60113637U (en) 1984-01-09 1984-01-09 semiconductor equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP137484U JPS60113637U (en) 1984-01-09 1984-01-09 semiconductor equipment

Publications (2)

Publication Number Publication Date
JPS60113637U JPS60113637U (en) 1985-08-01
JPH023626Y2 true JPH023626Y2 (en) 1990-01-29

Family

ID=30474060

Family Applications (1)

Application Number Title Priority Date Filing Date
JP137484U Granted JPS60113637U (en) 1984-01-09 1984-01-09 semiconductor equipment

Country Status (1)

Country Link
JP (1) JPS60113637U (en)

Also Published As

Publication number Publication date
JPS60113637U (en) 1985-08-01

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