JPH0234663A - Polyphenylene sulfide film - Google Patents
Polyphenylene sulfide filmInfo
- Publication number
- JPH0234663A JPH0234663A JP18336088A JP18336088A JPH0234663A JP H0234663 A JPH0234663 A JP H0234663A JP 18336088 A JP18336088 A JP 18336088A JP 18336088 A JP18336088 A JP 18336088A JP H0234663 A JPH0234663 A JP H0234663A
- Authority
- JP
- Japan
- Prior art keywords
- film
- polymer
- polyphenylene sulfide
- desirably
- density
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920000069 polyphenylene sulfide Polymers 0.000 title claims abstract description 38
- 239000004734 Polyphenylene sulfide Substances 0.000 title claims abstract description 37
- 239000000126 substance Substances 0.000 claims abstract description 3
- 229920000642 polymer Polymers 0.000 abstract description 43
- 238000000034 method Methods 0.000 abstract description 37
- 238000010438 heat treatment Methods 0.000 abstract description 11
- 238000004519 manufacturing process Methods 0.000 abstract description 9
- XWUCFAJNVTZRLE-UHFFFAOYSA-N 7-thiabicyclo[2.2.1]hepta-1,3,5-triene Chemical group C1=C(S2)C=CC2=C1 XWUCFAJNVTZRLE-UHFFFAOYSA-N 0.000 abstract description 5
- 239000010408 film Substances 0.000 description 104
- 239000000203 mixture Substances 0.000 description 14
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 9
- 238000001816 cooling Methods 0.000 description 9
- 239000000155 melt Substances 0.000 description 8
- 238000002844 melting Methods 0.000 description 7
- 230000008018 melting Effects 0.000 description 7
- 239000000843 powder Substances 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 238000011109 contamination Methods 0.000 description 6
- -1 polyethylene terephthalate Polymers 0.000 description 6
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 239000008188 pellet Substances 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 239000007858 starting material Substances 0.000 description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 4
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 3
- SOHCOYTZIXDCCO-UHFFFAOYSA-N 6-thiabicyclo[3.1.1]hepta-1(7),2,4-triene Chemical compound C=1C2=CC=CC=1S2 SOHCOYTZIXDCCO-UHFFFAOYSA-N 0.000 description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 3
- 229920006269 PPS film Polymers 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 239000004695 Polyether sulfone Substances 0.000 description 2
- 229920001400 block copolymer Polymers 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229920002492 poly(sulfone) Polymers 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920006393 polyether sulfone Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- KOBVMCLMUHZDRD-UHFFFAOYSA-N 2,4-dioxa-3$l^{4}-thiabicyclo[3.2.2]nona-1(7),5,8-triene 3-oxide Chemical group O1S(=O)OC2=CC=C1C=C2 KOBVMCLMUHZDRD-UHFFFAOYSA-N 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 241000283986 Lepus Species 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- QXDMQSPYEZFLGF-UHFFFAOYSA-L calcium oxalate Chemical compound [Ca+2].[O-]C(=O)C([O-])=O QXDMQSPYEZFLGF-UHFFFAOYSA-L 0.000 description 1
- AAEHPKIXIIACPQ-UHFFFAOYSA-L calcium;terephthalate Chemical compound [Ca+2].[O-]C(=O)C1=CC=C(C([O-])=O)C=C1 AAEHPKIXIIACPQ-UHFFFAOYSA-L 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000013043 chemical agent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- WZPDTOPYCQOUJT-UHFFFAOYSA-N disodium;sulfide;dihydrate Chemical compound O.O.[Na+].[Na+].[S-2] WZPDTOPYCQOUJT-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 229940057995 liquid paraffin Drugs 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 239000002362 mulch Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229940079101 sodium sulfide Drugs 0.000 description 1
- 229910052979 sodium sulfide Inorganic materials 0.000 description 1
- ZGHLCBJZQLNUAZ-UHFFFAOYSA-N sodium sulfide nonahydrate Chemical compound O.O.O.O.O.O.O.O.O.[Na+].[Na+].[S-2] ZGHLCBJZQLNUAZ-UHFFFAOYSA-N 0.000 description 1
- 229940048181 sodium sulfide nonahydrate Drugs 0.000 description 1
- WMDLZMCDBSJMTM-UHFFFAOYSA-M sodium;sulfanide;nonahydrate Chemical compound O.O.O.O.O.O.O.O.O.[Na+].[SH-] WMDLZMCDBSJMTM-UHFFFAOYSA-M 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 125000000101 thioether group Chemical group 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Shaping By String And By Release Of Stress In Plastics And The Like (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明はポリフェニレンスルフィドフィルムに関する。[Detailed description of the invention] [Industrial application field] The present invention relates to polyphenylene sulfide films.
更に詳しくは、機械的強度、耐熱性に優れたポリフェニ
レンスルフィドフィルムに関する。More specifically, the present invention relates to a polyphenylene sulfide film having excellent mechanical strength and heat resistance.
従来、汎用の工業用フィルムとしてポリエチレンテレフ
タレートフィルムが常用されてきたが、近年、特に耐熱
性の改良されたフィルムが求められている。Conventionally, polyethylene terephthalate film has been commonly used as a general-purpose industrial film, but in recent years, there has been a demand for a film with particularly improved heat resistance.
高耐熱性フィルムの代表的なものとして芳香族ポリアミ
ドフィルムやポリイミドフィルムが知られているが、こ
れらは出発原料が高価である上、製膜手段としていわゆ
る流延法を採用せざるを得ないため極めてコストが高い
ものとなる。Aromatic polyamide films and polyimide films are known as typical highly heat-resistant films, but the starting materials for these are expensive, and the so-called casting method must be used as a film forming method. This will result in extremely high costs.
一方、製膜コストの点で有利である溶融製膜法が適用可
能かつ比較的耐熱性に優れる素材として、例えばポリカ
ーボネート、ポリエステルカーボネート、ポリスルホン
、ポリエーテルイミド、ポリエーテルスルホン等が知ら
れているが、これらはいずれも非品性であるためフィル
ムとした際に機械的強度が不足する。On the other hand, polycarbonate, polyester carbonate, polysulfone, polyetherimide, polyether sulfone, etc. are known as materials to which the melt film forming method, which is advantageous in terms of film forming cost, can be applied and which have relatively excellent heat resistance. , these are all inferior and therefore lack mechanical strength when made into a film.
従って、現在比較的安価で、かつ耐熱性及び機械的特性
に優れたフィルムが強く求められており、この目的を達
成し得る可能性のあるフィルムトシてポリ−p−フェニ
レンスルフィド(以下PPSと略記する)フィルムが注
目されている。Therefore, there is currently a strong demand for a film that is relatively inexpensive and has excellent heat resistance and mechanical properties, and a film that has the potential to achieve this purpose is poly-p-phenylene sulfide (hereinafter abbreviated as PPS). ) film is attracting attention.
このPPSフィルムについては、例えば特公昭!ワー!
0タタ号公報、特公昭!ター3700号公報、特公昭3
9−j/θ/号公報等に製膜条件が記載されておフ、ま
たその代表的なフィルム物性、例えば熱的特性、機械的
特性及び電気的特性等も公知である。Regarding this PPS film, for example, Tokukosho! Wow!
0 Tata issue, Tokko Akira! Tar No. 3700, Special Publication Show 3
The film forming conditions are described in 9-j/θ/, etc., and typical film properties such as thermal properties, mechanical properties, electrical properties, etc. are also known.
しかしながら、かかるPPSフィルムを実際に製造し、
基材フィルムとして用いるためには、いくつかの問題点
を克服しなければならない。However, when such a PPS film is actually manufactured,
In order to use it as a base film, several problems must be overcome.
PPSフィルムの耐熱寸法安定性を向上させるため、フ
ィルム化の際に特定の条件で熱処理を行なう方法が、例
えば特公昭19−j−099号公報、特開昭77−20
1//l”号公報、特開昭1t−20♂O/り号公報等
で提案されている。In order to improve the heat-resistant dimensional stability of a PPS film, methods of heat-treating under specific conditions during film formation are disclosed, for example, in Japanese Patent Publication No. 197-J-099 and Japanese Patent Application Laid-open No. 77-20.
This method has been proposed in Japanese Patent Application Laid-Open No. 1//l'', Japanese Patent Application Laid-Open No. 1997-20♂O/R, etc.
しかしながらこれらの方法によシ得られたフィルムの耐
熱寸法安定性はある程度向上するものの、反面かかる熱
処理により、ポリマー中に存在するオリゴマーがフィル
ム表面にブリードアウトし、フィルムの透明性が低下し
たり、またフィルムを製造あるいは加工する際にオリゴ
マーがフィルム表面から移行して装置を汚染する等の問
題がしばしば生じてしまう。However, although the heat-resistant dimensional stability of the films obtained by these methods is improved to some extent, on the other hand, the oligomers present in the polymer bleed out to the film surface due to such heat treatment, resulting in a decrease in the transparency of the film. Furthermore, during film production or processing, problems such as oligomers migrating from the film surface and contaminating equipment often occur.
本発明者は上記した問題点を解決すべく鋭意検討を重ね
た結果、フィルム密度をある特定値以上とし、且つオリ
ゴマー量を特定量以下であるフィルムが、耐熱寸法安定
性および透明性に優れることを見出し本発明を完成する
に至った0すなわち本発明の要旨は、少くとも一軸方向
に延伸すしたポリフェニレンスルフィドフィルムであっ
て、該フィルムの70モルチ以上が繰り返し単位−(−
o−8−ウー で構成され、密度が7.34tθ以上、
かつ含有オリゴマー量が/、2重量%以下であることを
特徴とするポリフェニレンスルフィドフィルムに存スる
。As a result of intensive studies to solve the above-mentioned problems, the inventor of the present invention has found that a film having a film density of a certain value or more and an oligomer content of a certain amount or less has excellent heat-resistant dimensional stability and transparency. The gist of the present invention is to provide a polyphenylene sulfide film stretched at least uniaxially, in which 70 moles or more of the film contains repeating units -(-
Composed of o-8-woo, with a density of 7.34tθ or more,
The polyphenylene sulfide film is characterized in that the amount of oligomers contained is 2% by weight or less.
以下、本発明を更に詳細に説明する。The present invention will be explained in more detail below.
本発明で用いられるPPS組成物としては、耐熱性及び
機械的物性を同時に且つ高度に満足させるためには最終
的にp−フェニレンスルフィト単位を7θモルチ以上含
有することが必要であり、好ましくは10モルチ以上で
ある。In order to simultaneously and highly satisfy heat resistance and mechanical properties, the PPS composition used in the present invention must ultimately contain p-phenylene sulfite units of 7θ mol or more, and preferably It is 10 molti or more.
本発明において用いることのできるPPS組成物の例と
して、(1)PPSを主体とするポリマ、(2)PPS
共重合体、(3) P P Sを主体とするポリマーと
PPS共重合体とのブレンド物、(4)m−フェニレン
スルフィドを主たる繰り返し単位とするポリマーと(1
)又は(2)とのブレンド物等を挙げることができる。Examples of PPS compositions that can be used in the present invention include (1) polymers mainly composed of PPS, (2) PPS
copolymer, (3) a blend of a polymer mainly composed of PPS and a PPS copolymer, (4) a polymer containing m-phenylene sulfide as a main repeating unit, and (1
) or a blend with (2).
ここで言うPPSを主体トスるポリマーとはp−7工ニ
レンスルフイド単位をりOモルチ以上含有してなるポリ
フェニレンスルフィドを指す。また、本発明で言うPP
S共重合体としては繰り返し単位の一部が例、tハ(X
SOz+S−1合o合s −されたポリp−フェニレン
スルフィドを指す0本発明においては、これらの中でも
耐熱性に特に優れる点でPPSを主体とするポリマーが
、また耐熱性を維持しつつ製膜性を向上させ得る点から
、PPSを主体とするポリマーとPPS共重合体とのブ
レンド物が好ましく用いられる。The term "polymer mainly composed of PPS" as used herein refers to polyphenylene sulfide containing 0 mol or more of p-7 nylene sulfide units. In addition, PP referred to in the present invention
As an S copolymer, some of the repeating units are, for example, t(X
SOz+S-1 refers to poly p-phenylene sulfide combined with SOz+S-1. In the present invention, polymers mainly composed of PPS are preferred because they have particularly excellent heat resistance. A blend of a polymer mainly composed of PPS and a PPS copolymer is preferably used because it can improve properties.
後者ブレンド物の例として、例えば下記(1)及び(2
)の2種類のポリフェニレンスルフィドをフレンドする
ことにより得られるm−フェニレンスルフィド単位を好
ましくは20モルチ未満、更に好ましくはコ〜10モル
チ含有して成るポI7 フェニレンスルフィドが挙げら
れる。Examples of the latter blends include the following (1) and (2).
Polyphenylene sulfide containing preferably less than 20 moles, more preferably co-10 moles of m-phenylene sulfide units obtained by friending two types of polyphenylene sulfides () is mentioned.
(1)m−フェニレンスルフィト単位t”/−tモル−
以上含有して成るポリフェニレンスルフィド
(2)p−フェニレンスルフィ)1位t−9tモルチ以
上含有して成るポリフェニレンスルフィド
特に厚さ70μm以下の薄いフィルムを製造する場合は
製膜性に優れることが必要となるため、上記(1)と(
2)とのブレンド物が好ましく用いられる。勿論、本発
明の趣旨を損なわない限り、これ以外のPPS組成物を
用いてもよい。(1) m-phenylene sulfite unit t"/-t mol-
Polyphenylene sulfide containing (2) p-phenylene sulfide) Polyphenylene sulfide containing 1-t-9t mole or more Especially when producing a thin film with a thickness of 70 μm or less, it is necessary to have excellent film formability. Therefore, the above (1) and (
Blends with 2) are preferably used. Of course, other PPS compositions may be used as long as they do not impair the spirit of the present invention.
本発明で用いるこれらのPPSの重合方法としては、種
々の方法が例示されるが、通常以下の方法が好ましく採
用される。Various methods are exemplified as methods for polymerizing these PPSs used in the present invention, but the following methods are usually preferably employed.
即ち、硫化アルカリ、就中、硫化ナトリウムと該当する
ジハロベンゼン(例えばp−ジクロロベンゼン)及び必
要に応じて他の繰り返し単位を与えるハロゲン置換モノ
マーをN−メチルピロリドン等のアミド系極性溶媒中で
重合助剤の存在下足高温、高圧下で反応させる方法であ
る。That is, an alkali sulfide, especially sodium sulfide, the corresponding dihalobenzene (e.g., p-dichlorobenzene), and optionally a halogen-substituted monomer providing other repeating units are polymerized in an amide polar solvent such as N-methylpyrrolidone. This method involves reacting in the presence of a chemical agent at high temperature and under high pressure.
従来、PPSの粘度を高める方法としてPPSを酸素の
存在下2θ0℃〜ポリマー融点の温度で加熱処理して架
橋させる方法が一般に知られている。しかしながら、か
かる方法で粘度を高めたポリマーをフィルム原料として
用いると、特て溶融時にS02等のガスの発生が認めら
れ。Conventionally, as a method of increasing the viscosity of PPS, a method of heat-treating PPS at a temperature of 2θ0° C. to the melting point of the polymer in the presence of oxygen to crosslink it is generally known. However, when a polymer whose viscosity has been increased by such a method is used as a film raw material, gases such as S02 are generated, especially during melting.
また、溶融状態が不均一となるため得られたフィルムに
ムラが生成する等の問題が生ずる。従って本発明におい
ては、かかる加熱処理にょる増粘方法を採らないことが
好ましい。Further, since the melted state becomes non-uniform, problems such as unevenness occur in the obtained film arise. Therefore, in the present invention, it is preferable not to use such a method of thickening by heat treatment.
本発明者はポリマー鎖が枝分れ可能となる3官能単位を
好ましくは0.1モルチ以上5モルチ以下、更に好まし
くは0.2モルチ以上3モルチ以下含有させることによ
り高粘度化したポリマーが本発明に好適であることを知
見した。かがる3官能単位としては、
等が挙げられ、これらの7種または2種以上を含有させ
ればよい。中でも反応性、コスト等の単位を含有させる
ためには、上記したハロゲン置換モノマーの7種として
対応する3官能化合物(例えば/、2.’it−トリク
ロロベンゼン)を添加し、反応させればよい。また、本
発明においてフィルム化に適した粘度は、300℃での
溶融粘度として、剪断速度20θ(秒)−1のもとでS
OOポイズ以上200,00θポイズ以下である0
次KかかるPPSを用いたフィルムの製造法について述
べる。The present inventor has discovered that a polymer having a high viscosity by containing a trifunctional unit that allows the polymer chain to branch, preferably from 0.1 molty to 5 molty, more preferably from 0.2 molty to 3 molty, is the present invention. It was found that it is suitable for the invention. Examples of the trifunctional unit include the following, and seven or more of these may be contained. Among them, in order to contain units for reactivity, cost, etc., a trifunctional compound (for example, 2.'it-trichlorobenzene) corresponding to the seven types of halogen-substituted monomers described above may be added and reacted. . In addition, in the present invention, the viscosity suitable for film formation is the melt viscosity at 300°C, S
A method for producing a film using PPS having a zero-order K of OO poise or more and 200,00 θ poise or less will be described.
本発明においては、かかるPPSをエクストルーダーに
代表される周知の溶融押出装置に供給し、該組成物の融
点以上の温度に加熱し溶融する。次いで溶融したPPS
をスリ、ト状のダイから押し出し、回転冷却ドラム上で
ガラス転移温度以下の温度になるように急冷固化し、実
質的に非晶状態の未配向シートを得る。この場合シート
の平面性を向上させるため、シートと回転冷却ドラムと
の密着性を高める必要があシ、本発明においては、静電
印加密着法及び/又は液体塗布密着法が好ましく採用さ
れる。In the present invention, such PPS is supplied to a well-known melt extrusion device such as an extruder, and heated to a temperature equal to or higher than the melting point of the composition to melt it. Then melted PPS
The material is extruded through a slot-shaped die and rapidly cooled and solidified on a rotating cooling drum to a temperature below the glass transition temperature to obtain an unoriented sheet in a substantially amorphous state. In this case, in order to improve the flatness of the sheet, it is necessary to increase the adhesion between the sheet and the rotating cooling drum, and in the present invention, an electrostatic application adhesion method and/or a liquid application adhesion method are preferably employed.
静電印加密着法とは、通常シートの上面側にシートの流
れと直交する方法に線状電極を張り、該電極に約!〜1
0Kvの直流電圧を印加することによりシートに静電荷
を与え、ドラムとの密着性を向上させる方法である。ま
た、液体塗布密着法とは回転冷却ドラム表面の全体また
は一部(例えばシートの両端部と接触する部分のみ)に
液体を均一に塗布することによりドラムとシートとの密
着性を向上させる方法である。本発明においては、必要
に応じ両者を併用してもよい0
本発明においては、このようにして得られたシートを少
なくとも/軸方向に延伸することが必要である。延伸方
法としては、ロール間の周速差を利用した縦延伸の他、
テンター法やチー−プラー法を採用し得る。The electrostatic application contact method usually involves placing a linear electrode on the upper surface of the sheet in a direction perpendicular to the flow of the sheet. ~1
In this method, a DC voltage of 0 Kv is applied to impart an electrostatic charge to the sheet, thereby improving its adhesion to the drum. In addition, the liquid application adhesion method is a method that improves the adhesion between the drum and the sheet by uniformly applying a liquid to the entire or part of the surface of the rotating cooling drum (for example, only the parts that contact both ends of the sheet). be. In the present invention, both may be used in combination if necessary. In the present invention, it is necessary to stretch the sheet thus obtained at least in the axial direction. Stretching methods include longitudinal stretching using the difference in circumferential speed between rolls,
The tenter method or the Cheapler method may be employed.
延伸条件について具体的に述べると、前記未延伸シート
を好ましくは70〜720℃、更に好ましくは♂0〜i
ot℃の温度範囲で一方向にロールもしくはテンタ一方
式の延伸機によ92〜6倍に延伸する。また、さらに/
段目と直交する方向に好ましくは70〜/410℃、更
て好ましくは?θ〜/−2θ℃の温度範囲で/、!〜6
倍に延伸し、コ軸に配向したフィルムを得ることもでき
る。また、前記未延伸シートを面積倍率が3〜30倍に
なるように同時コ軸延伸することも可能である。用途に
もよるが、通常は耐熱寸法安定性、及び機械的強度の異
方性の点でコ軸延伸フィルムとすることが好ましい。Specifically speaking about the stretching conditions, the unstretched sheet is preferably heated at 70 to 720°C, more preferably ♂0 to i
The film is stretched 92 to 6 times in one direction using a roll or tenter type stretching machine in a temperature range of ot°C. Also, further/
Preferably 70~/410°C in the direction perpendicular to the steps, more preferably ? In the temperature range of θ~/-2θ℃/,! ~6
It is also possible to obtain a co-axis oriented film by stretching it twice. It is also possible to simultaneously coaxially stretch the unstretched sheet so that the area magnification becomes 3 to 30 times. Although it depends on the use, it is usually preferable to use a coaxially stretched film in terms of heat-resistant dimensional stability and mechanical strength anisotropy.
かくして得られた延伸フィルムは主として寸法安定性を
向上させるために熱処理を行なうことが好ましいが、必
要に応じ熱処理を行なう前又は後に再度縦及び/又は横
方向に延伸し配向を高め機械的強度をより向上させるこ
とも可能である。The stretched film obtained in this way is preferably heat-treated mainly to improve dimensional stability, but if necessary, it may be stretched again in the longitudinal and/or transverse directions before or after the heat treatment to increase orientation and improve mechanical strength. It is also possible to improve it further.
以上の方法を適宜選択することにより、少なくとも/軸
に配向したフィルムを得ることができるが、本発明にお
いては該フィルムの密度力;/、3/ltO以上である
ことが必要であシ好ましくはへ3!O以上、更に好まし
くは/、33!以上である。フィルムの密度がへ34t
O未満では耐熱寸法安定性、が劣るようになるため好ま
しくない。フィルムの密度をへ34t0以上とするため
には、製膜工程において、延伸後に20%以内の制限収
縮もしくは伸長、または定長下で好ましくは2グ0℃以
上ポリマーの融点以下の温度で、更に好ましくは2!O
℃以上ポリマーの融点以下の温度で熱処理を行なう方法
が好ましく採用される。なお、該熱処理はλ段階以上で
行なってもよい。熱処理をλ段階以上で行なう場合は、
その中の少なくとも/段階を好ましくは24tθ℃以上
ポリマーの融点以下の温度で、更に好ましくは2!0℃
以上ポリマーの融点以下の温度で行なう。By appropriately selecting the above methods, it is possible to obtain a film oriented in at least the / axis, but in the present invention, it is necessary that the density force of the film be at least /,3/ltO. To 3! O or more, more preferably /, 33! That's all. The density of the film is 34t
If it is less than 0, the heat resistance and dimensional stability will be deteriorated, which is not preferable. In order to make the density of the film 34t0 or more, in the film forming process, after stretching, limited shrinkage or elongation is performed within 20%, or at a constant length, preferably 2g at a temperature of 0°C or more and below the melting point of the polymer, and further Preferably 2! O
A method in which the heat treatment is carried out at a temperature of .degree. C. or above and below the melting point of the polymer is preferably employed. Note that the heat treatment may be performed at the λ stage or higher. When heat treatment is performed at λ stage or higher,
At least/step thereof is preferably performed at a temperature of 24tθ°C or higher and lower than the melting point of the polymer, more preferably 2!0°C.
The above is carried out at a temperature below the melting point of the polymer.
かくして本発明のフィルムは、耐熱寸法安定性に優れた
フィルムとして得られるが、その今一つの特徴は、含有
するオリゴマー量が一定値以下であることにある0
即ち、フィルム中のオリゴマー量がへλ重量チ以下であ
ることが必要であり、好ましくは/、0重量%以下であ
る。Thus, the film of the present invention can be obtained as a film with excellent heat-resistant dimensional stability, but another feature of the film is that the amount of oligomer contained is below a certain value.In other words, the amount of oligomer in the film is below λ It is necessary that the amount is less than or equal to 0% by weight, and preferably less than 0% by weight.
本発明においては耐熱寸法安定性に優れたフィルムを得
るために上記した厳しい条件下、熱処理を行なうことに
より密度の高い、即ち高結晶化度のフィルムを得るが、
かかるフィルムにあっても該フィルムに含まれるオリゴ
マー量が7.2重量%を越えるとフィルム表面にオリゴ
マーがブリードアウトしてフィルムの透明性が低下した
り、フィルム製造工程あるいはフィルムを加工する際に
オリゴマーがフィルム表面から移行して、フィルム製造
装置や加工装置を汚染する等の問題が生ずるようになる
ため好ましくない。In the present invention, in order to obtain a film with excellent heat resistance and dimensional stability, heat treatment is performed under the above-mentioned severe conditions to obtain a film with high density, that is, high crystallinity.
Even in such films, if the amount of oligomers contained in the film exceeds 7.2% by weight, the oligomers may bleed out onto the film surface, reducing the transparency of the film or causing problems during the film manufacturing process or during film processing. This is not preferable because the oligomers migrate from the film surface and cause problems such as contaminating film manufacturing equipment and processing equipment.
フィルムて含まれるオリゴマーの量は、ポリマー製造条
件、ポリマーの分子景、成形条件、熱履歴等によって異
なるが、出発原料のポリマーに多く含まれている場合は
、フィルム中のそれを低減させることは困難となる。こ
のような場合、ポリマーに含まれているオリゴマーの量
を減少させる必要があるがその方法としては周知の方法
が採用できる。例えばポリマー製造後、好ましくは粉末
の状態で適当な有機溶媒で処理してオリゴマーを除去す
る方法が挙げられる。The amount of oligomers contained in a film varies depending on the polymer manufacturing conditions, molecular structure of the polymer, molding conditions, thermal history, etc., but if it is contained in a large amount in the starting material polymer, it is not possible to reduce it in the film. It becomes difficult. In such a case, it is necessary to reduce the amount of oligomer contained in the polymer, and a well-known method can be used to reduce the amount of oligomer contained in the polymer. For example, after the polymer is produced, the oligomer is removed by treating the powder preferably with an appropriate organic solvent.
この処理に使用できる有機溶媒の例としては、塩化メチ
レン、クロロホルム、トルエン、キシレン、Nメチルピ
ロリドン等が挙げられ、常圧または加圧下好ましくは3
0℃以上、更に好ましくは50℃以上で処理する。Examples of organic solvents that can be used in this treatment include methylene chloride, chloroform, toluene, xylene, N-methylpyrrolidone, etc., preferably at normal pressure or under pressure.
The treatment is carried out at a temperature of 0°C or higher, more preferably 50°C or higher.
一方、フィルム成形時にオリゴマーを低減させる方法の
一例として、例えばエクストルーダーとして7箇所以上
の排気用ベントを備えたものを用い、該ペント部を減圧
に保ちオリゴマー等の成分を排出しながら成形を行なう
方法を挙げることができる。この方法はポリマー粉体を
ペレット状に成形する工程、あるいはポリマー粉体及び
/又はペレットをシートに成形する工程等の任意の段階
で採用できる。On the other hand, as an example of a method for reducing oligomers during film molding, for example, an extruder equipped with seven or more exhaust vents is used, and the pent part is maintained at a reduced pressure while molding is performed while discharging components such as oligomers. Here are some methods. This method can be employed at any stage, such as the process of forming polymer powder into pellets, or the process of forming polymer powder and/or pellets into a sheet.
もちろん、本発明においてはフィルム中に含まれるオリ
ゴマーの量を減少させる方法はこれらの方法に限定され
る訳ではなく上記した方法以外の方法も採用できる0
なお、本発明においては製膜て供するポリフェニレンス
ルフィド全量に対し10重量−程度以下の他のポリマー
(例えばポリエステル、ポリアミド、ポリエチレン、ポ
リスチレン、ポリカーボネート、ポリスルホン、ポリエ
ーテルスルホン、ポリイミド等)及び/又は10重量%
程度以下の有機もしくは無機の化合物(例えばテレフタ
ル酸カルシウム、シュウ酸カルシウム、ガラスファイバ
ー カーボンファイバー タルク、カオリン、酸化チタ
ン、酸化珪素、カーボンブラック、炭酸カルシウム等)
を含有させることができる。また、必要に応じ酸化防止
剤、熱安定剤、潤滑剤、紫外線吸収剤等の添加剤を配合
してもよい。Of course, in the present invention, the method for reducing the amount of oligomers contained in the film is not limited to these methods, and methods other than those described above can also be adopted. Other polymers (e.g. polyester, polyamide, polyethylene, polystyrene, polycarbonate, polysulfone, polyethersulfone, polyimide, etc.) and/or 10% by weight or less based on the total amount of sulfide
Organic or inorganic compounds (e.g. calcium terephthalate, calcium oxalate, glass fiber, carbon fiber, talc, kaolin, titanium oxide, silicon oxide, carbon black, calcium carbonate, etc.)
can be contained. Additionally, additives such as antioxidants, heat stabilizers, lubricants, and ultraviolet absorbers may be added as necessary.
このようにして得られた本発明のポリフェニレンスルフ
ィドフィルムは、その優れた耐熱寸法安定性、機械的特
性に加え、化学的安定性、電気的特性、耐候性等にも優
れでいることから、電気絶縁用フィルム、コンデンサ誘
電体用フィルム、フレキシブルプリント基板、感熱転写
用フィルム、磁気記録媒体用フィルム、写真用フィルム
、包装材料等に好適に用いることができる。The polyphenylene sulfide film of the present invention thus obtained has excellent heat resistance, dimensional stability, mechanical properties, and chemical stability, electrical properties, weather resistance, etc. It can be suitably used for insulating films, capacitor dielectric films, flexible printed circuit boards, thermal transfer films, magnetic recording media films, photographic films, packaging materials, and the like.
なお、本発明においてはそのフィルム厚みは通常O6夕
〜/!θμm好まし゛くは/〜roμmの範囲である。In addition, in the present invention, the film thickness is usually O6~/! θμm is preferably in the range of /~roμm.
以下、実施例によシ本発明を更に詳細に説明するが、本
発明はその要旨を越えない限シ以下の実施例によって限
定されるものではない。Hereinafter, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited to the following Examples unless the gist thereof is exceeded.
本発明で用いた測定法及び評価法は次の通りである。The measurement method and evaluation method used in the present invention are as follows.
(1) オリゴマー量
試料を約夕個角の小片に裁断し、その約51を精秤する
。該試料を約/ I O、lの塩化メチレンを入れたソ
ックスレー抽出器内にセットし、60℃の湯煎で24を
時間抽出する。その後、予め秤量した風袋を用いて抽出
液の溶媒を減圧留去し、続いて60℃で5時間真空乾燥
した後、シリカゲルを入れたデシケータ中で室温まで冷
却して重量を測定する。(1) Amount of oligomer: Cut the sample into small pieces of approximately 100 cm square, and accurately weigh approximately 51 pieces. The sample was placed in a Soxhlet extractor containing about 100,000 liters of methylene chloride, and extracted in a water bath at 60° C. for 24 hours. Thereafter, the solvent of the extract is distilled off under reduced pressure using a pre-weighed tare bag, followed by vacuum drying at 60° C. for 5 hours, and then cooled to room temperature in a desiccator containing silica gel, and the weight is measured.
得られた結果を次式にあてはめオリゴマー量(重量%)
を求める。Apply the obtained results to the following formula to calculate the amount of oligomer (wt%)
seek.
A:乾燥後の(抽出物+風袋)の重量(1)B:風袋の
重量(2)
C:抽出前の試料の重量(2)
(2) フィルム密度
臭化リチウム水溶液を用いた密度勾配管によシ測定した
。A: Weight of (extract + tare) after drying (1) B: Weight of tare (2) C: Weight of sample before extraction (2) (2) Film density Density gradient tube using lithium bromide aqueous solution I measured it.
(3) 溶融粘度
高化式フローテスターを使用し、/■径、長さ70咽の
口金を使用し3θo℃にて剪断速度200(秒)−1の
もとで測定した。(3) Using a melt viscosity enhancement type flow tester, using a nozzle with a diameter of /■ and a length of 70 mm, it was measured at 3θoC and a shear rate of 200 (seconds) -1.
(4)熱収縮率
試料を無張力状態で所定温度雰囲気のオーラフ910分
間熱処理し、その前後のサンプルの長さを測定し、次式
にて算出した。(4) Thermal shrinkage rate The sample was heat-treated for 910 minutes at a predetermined temperature in an atmosphere without tension, and the length of the sample before and after was measured and calculated using the following formula.
熱収縮率(チ)=
(熱処理前のサンプル長)M
×/θ0
(5) フィルムの耐ハンダ浴性
フィルムを20 MRX 20 raの正方形に切シ出
し、2jO℃のハンダ浴中に70秒間浸漬した。浸漬後
のフィルムの大きさa mm X b mmを測定し、
面積保持率を次式にて算出し、耐ハング浴性の尺度とし
た
測定は!点打ない、その平均値を求めた。Heat shrinkage rate (chi) = (sample length before heat treatment) M x / θ0 (5) Solder bath resistance of the film Cut the film into a square of 20 MRX 20 ra and immerse it in a solder bath at 2jO ℃ for 70 seconds. did. Measure the size of the film after dipping, a mm x b mm,
Calculate the area retention rate using the following formula and measure it as a measure of hanging bath resistance! No points were scored, and the average value was calculated.
(6) フィルムヘーズ
JIS−に47/4tに準じ日本電色工業■製分球式濁
度計NDH−,20[)によシフィルムの濁度を測定し
た。(6) Film haze The turbidity of the film was measured according to JIS-47/4t using a sphere-type turbidimeter NDH-20 [manufactured by Nippon Denshoku Kogyo ■].
フィルムヘース測定値をHl、フィルム表面に流動パラ
フィンを塗布したあとのヘーズの測定値を内部ヘーズH
,とすると、表面ヘーズΔHは下式で定義される
ΔH=H1−HO
(7)製膜時の装置汚染状況
製膜時の、オリゴマーによる装置の汚染状況を観察し、
以下の基準に従って評価した。The measured value of film haze is Hl, and the measured value of haze after applying liquid paraffin to the film surface is internal haze H.
, then the surface haze ΔH is defined by the following formula: ΔH=H1−HO (7) Equipment contamination during film formation Observe the equipment contamination due to oligomers during film formation,
Evaluation was made according to the following criteria.
ランク/ 製膜開始後5時間以内でロールへのオリゴマ
ーの付着が認められた。Rank: Adhesion of oligomers to the roll was observed within 5 hours after the start of film formation.
ランク2 製膜開始後/オ時間以内でロールへのオリゴ
マーの付着が認められた。Rank 2: Adhesion of oligomers to the roll was observed within 1 hour after the start of film formation.
ランク3 製膜を/!時間行なった後もオリゴマーの付
着なし。Rank 3 Film production/! No oligomer adhesion even after hours of treatment.
オリゴマーによる汚染状況については /)ダイスから
押出された溶融シートを急冷固化せしめるための回転冷
却ロール、2)縦方向にロール延伸する際の高速側の冷
却ロール、及び 3)延伸フィルムの巻き取り装置のガ
イドロールの3箇所に関して評価を行なった。Regarding contamination by oligomers: /) Rotary cooling roll for rapidly cooling and solidifying the molten sheet extruded from the die, 2) Cooling roll on the high speed side during longitudinal roll stretching, and 3) Winding device for stretched film. An evaluation was performed on three locations on the guide roll.
実施例/
(ポリフェニレンスルフィドの製造)
p−ジクロロベンゼン、m−’)クロロベンゼン、/、
2.’I−トリクロロベンゼン及び硫化ナトリウム9水
塩を出発原料として、m−フェニレンスルフィド単位を
ブロック的に6θモルチ含有し、且つ3官能単位をθ、
!モルチ含有するポリフェニレンスルフィドブロック共
重合体を得た。該ポリマーを水洗、乾燥した後、4tθ
℃の塩化メチレンにて一時間ずつ2回の抽出処理を行な
い、再び乾燥して溶融粘度2j−00ポイズの白色粉体
ポリマー(A)を得た。Example/ (Production of polyphenylene sulfide) p-dichlorobenzene, m-') chlorobenzene, /,
2. 'I-trichlorobenzene and sodium sulfide nonahydrate are used as starting materials, m-phenylene sulfide units are contained in block form in 6θ moles, and trifunctional units are θ,
! A polyphenylene sulfide block copolymer containing mulch was obtained. After washing the polymer with water and drying, 4tθ
Extraction treatment was carried out twice with methylene chloride at 1 hour each time, and the mixture was dried again to obtain a white powder polymer (A) having a melt viscosity of 2j-00 poise.
次にp−ジクロロベンゼン、/、2.’I−トリクロロ
ベンゼン及び硫化ナトリウムヮ水塩を出発原料として3
官能単位をO0J′モルチ含有するポリp−7エニレン
スルフイドを製造し、水洗、乾燥後9to℃の塩化メチ
レンにて2時間ずつ2回の抽出処理を行ない、再び乾燥
して溶融粘度3!00ポイズの白色粉体ポリマー(B)
を得た。Next, p-dichlorobenzene, /, 2. 'I-trichlorobenzene and sodium sulfide dihydrate as starting materials
Poly p-7 enylene sulfide containing O0J' functional units was produced, washed with water, dried, extracted twice with methylene chloride at 9 to C for 2 hours each time, and dried again to have a melt viscosity of 3! 00 poise white powder polymer (B)
I got it.
次にポリマー(A)を2部、ポリマー(B)をり2部、
平均粒径が0.3μmの酸化チタン0.3部を混合し、
該混合物を排気用ベントを備えたλ軸押出機にて排気を
行ないながら十分混練して押出し、ペレット状に成形し
た。Next, 2 parts of polymer (A), 2 parts of polymer (B),
Mixing 0.3 parts of titanium oxide with an average particle size of 0.3 μm,
The mixture was thoroughly kneaded and extruded using a λ-axis extruder equipped with an exhaust vent while exhausting the air, and was formed into pellets.
(ポリフェニレンスルフィドフィルム+7)IJ 造)
上記の操作によシ得られた組成物を、溶融押出機に供給
し、幅300m、リップ間隔oJ mmの口金からシー
ト状に押出し、表面温度をグ0℃に設定した回転冷却ロ
ールで静電印加冷却法を利用して急冷固化させ、厚み7
00μmの実質的に非晶質シートを得た。(Polyphenylene sulfide film + 7) IJ construction)
The composition obtained by the above operation was supplied to a melt extruder, extruded into a sheet from a die with a width of 300 m and a lip interval of oJ mm, and electrostatically charged with a rotating cooling roll whose surface temperature was set to 0°C. Rapidly solidify using the applied cooling method to a thickness of 7.
A substantially amorphous sheet of 00 μm was obtained.
次いで該シートを縦方向に93℃でグ、2倍、横方向に
700℃で<1.0倍に延伸し、更に26θ℃で70秒
間熱処理を行ない、厚み6μmの二軸配向フィルムを得
た。The sheet was then stretched 2 times in the machine direction at 93°C and <1.0 times in the transverse direction at 700°C, and further heat treated at 26θ°C for 70 seconds to obtain a biaxially oriented film with a thickness of 6 μm. .
得られたフィルムの特性及び製膜時のロールの汚染状況
観察結果を表−/に示した。Table 1 shows the characteristics of the obtained film and the observation results of the roll contamination during film formation.
実施例2
実施例/で用いたポリマー(33) / 0θil[平
均粒径0.9μmのシリカ粒子0.2部を混合して製膜
用原料とし、実施例/と同様にして、厚み6μmの二軸
配向フィルムを製造した。Example 2 Polymer (33) used in Example / 0θil [0.2 parts of silica particles with an average particle size of 0.9 μm were mixed to prepare a film-forming raw material, and a film with a thickness of 6 μm was prepared in the same manner as in Example /. A biaxially oriented film was produced.
実施例3
実施例/で用いたポリマー(A)と同様にしてm−7エ
ニレンスルフイド単(i17”ロック的ニ60モルチ含
有し、且つ3官能単位を0.7モル%含有するポリフェ
ニレンスルフィドブロック共重合体を得た。該ポリマー
を水洗、乾燥した後、60℃のN→チルピロリドンにて
一時間ずつ2回の抽出を行ない再び水洗、乾燥して白色
粉体ポリマー(C)を得た。溶融粘度は22θθポイズ
であった。Example 3 Polyphenylene sulfide containing 60 mol of m-7 enylene sulfide monomer (i17'' locking unit) and 0.7 mol % of trifunctional units was prepared in the same manner as the polymer (A) used in Example 3. A block copolymer was obtained.The polymer was washed with water, dried, extracted twice with N→tilpyrrolidone at 60°C for 1 hour each, washed again with water, and dried to obtain a white powder polymer (C). The melt viscosity was 22θθ poise.
また、ポリマー(B)と同様にして、3官能単位を0.
7モルチ含有するポリp−フェニレンスルフィドを製造
した。該ポリマーを水洗、乾燥した後、10℃のN−メ
チルピロリドンにて2時間ずつ2回の抽出処理を行ない
、再び水洗、乾燥して白色粉体ポリマー(D)を得た。Further, in the same manner as polymer (B), 0.
A poly p-phenylene sulfide containing 7 molti was produced. After the polymer was washed with water and dried, it was extracted twice with N-methylpyrrolidone at 10° C. for 2 hours each time, and washed again with water and dried to obtain a white powder polymer (D).
溶融粘度は3600ポイズであった。The melt viscosity was 3600 poise.
次にポリマー(C)を2部、ポリマー(D)を?2部、
平均粒径が0.3μmの酸化チタン0.3部を混合し、
該混合物を排気用ベントを備えたコ軸押出機にて排気を
行ないながら、十分混練して押出し、ペレット状に成型
した。該組成物を用い、実施例/と同様にして厚み乙μ
mの二軸配向フィルムを製造した。但し、二軸延伸後の
熱処理は、24tO℃にて70秒間行ない、−旦冷却し
た後さらに2tO℃で10秒間行なつた0
実施例/、2および3で得られたフィルムは本発明の条
件を満たしているため、耐熱寸法安定性に優れている。Next, add 2 parts of polymer (C) and 2 parts of polymer (D)? 2nd part,
Mixing 0.3 parts of titanium oxide with an average particle size of 0.3 μm,
The mixture was thoroughly kneaded and extruded using a coaxial extruder equipped with an exhaust vent while exhausting the air, and was molded into pellets. Using the composition, the thickness O μ was obtained in the same manner as in Example
A biaxially oriented film of m was produced. However, the heat treatment after biaxial stretching was carried out at 24 tO ℃ for 70 seconds, and after cooling, it was further carried out for 10 seconds at 2 tO ℃. It has excellent heat resistance and dimensional stability.
即ち熱収縮率が小さく、耐ハンダ浴性に関しても高い面
積保持率を有する。That is, it has a low thermal shrinkage rate and a high area retention rate in terms of solder bath resistance.
また、含有オリゴマーが少ないため、製膜工程において
ロール等の装置を汚染する事がなく、製膜性も良好でフ
ィルムの破断等のトラブルもなく長時間安定してフィル
ムを製造する事ができた。In addition, because the content of oligomers is small, there is no contamination of equipment such as rolls during the film-forming process, and the film-forming properties are good, allowing stable film production for long periods of time without problems such as film breakage. .
得られたフィルムの表面ヘーズは低い値であり、オリゴ
マーによる透明性の低下は認められない。The surface haze of the obtained film was a low value, and no decrease in transparency due to the oligomer was observed.
比較例/
実施例/において熱処理温度を/り0℃とする以外は実
施例/と同様にして厚みにμmの二軸配向フィルムを製
造した。得られたフィルムは密度かへ334tと低いも
のであり、耐熱寸法安定性に劣るものであった。Comparative Example/A biaxially oriented film having a thickness of μm was produced in the same manner as in Example/, except that the heat treatment temperature in Example/ was set to 0°C. The obtained film had a low density of 334 tons and was poor in heat resistance and dimensional stability.
比較例コ
塩化メチレンによる抽出処理を行なわない以外は、実施
例/のポリマー(A)と同様にして溶融粘度2100ポ
イズのポリフェニレンスルフィドプロ、り共重合体(E
)、ポリマー(B)と同様にして溶融粘度!30θポイ
ズのポリp−フェニレンスルフィ)’ (F) ’t”
得り。Comparative Example A polyphenylene sulfide copolymer (E
), melt viscosity in the same manner as for polymer (B)! Poly p-phenylene sulfy of 30θ poise)' (F) 't'
Profitable.
次にポリマー(E)を♂部、ポリマー(F)を92部、
平均粒径0.3μmの酸化チタン0.3部を混合して製
膜用原料とし、実施例/と同様にして厚み33mの二軸
配向フィルムを製造した。Next, add ♂ parts of polymer (E), 92 parts of polymer (F),
A biaxially oriented film with a thickness of 33 m was produced in the same manner as in Example 1 by mixing 0.3 parts of titanium oxide with an average particle size of 0.3 μm to prepare a film-forming raw material.
比較例コで得られたフィルムの耐熱寸法安定性は良好で
あったが、製膜中ロールへのオリゴマーの付着があり、
除去するためにしばしば製膜を中断しなければならない
という問題が生じた0
また、該フィルムの表面ヘーズは、大きな値を示した。The heat-resistant dimensional stability of the film obtained in Comparative Example 7 was good, but there was some oligomer adhesion to the roll during film formation.
A problem arose in that the film formation had to be frequently interrupted for removal.0 Also, the surface haze of the film showed a large value.
即ち、該フィルムのオリゴマー含有量が多いため、フィ
ルム表面にオリゴマーがブリードアウトし、フィルムの
透明性が低下した。That is, since the oligomer content of the film was high, the oligomer bleed out onto the film surface, resulting in a decrease in the transparency of the film.
本発明のポリフェニレンスルフィドフィルムは、耐熱寸
法安定性および透明性に優れ、しかも含有するオリゴマ
ーに基づく製膜装置、やフィルムの加工装置の汚染がな
いという特徴を有し、その工業的価値は高い。The polyphenylene sulfide film of the present invention has excellent heat-resistant dimensional stability and transparency, and is characterized in that there is no contamination of film forming equipment or film processing equipment based on the oligomers it contains, and its industrial value is high.
出願人 ダイアホイル株式会社 代理人 弁理士 長谷用 − ほか/名Applicant: Diafoil Co., Ltd. Agent: Patent Attorney Hase - Others/names
Claims (1)
ルフィドフィルムであって、該フィルムの70モル%以
上が繰り返し単位 ▲数式、化学式、表等があります▼で構成され、密度が
1.340以 上、かつ含有オリゴマー量が1.2重量%以下であるこ
とを特徴とするポリフェニレンスルフィドフィルム。(1) A polyphenylene sulfide film stretched at least uniaxially, in which 70 mol% or more of the film is composed of repeating units ▲There are mathematical formulas, chemical formulas, tables, etc.▼, and the density is 1.340 or more, and A polyphenylene sulfide film having an oligomer content of 1.2% by weight or less.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18336088A JPH0234663A (en) | 1988-07-22 | 1988-07-22 | Polyphenylene sulfide film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18336088A JPH0234663A (en) | 1988-07-22 | 1988-07-22 | Polyphenylene sulfide film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0234663A true JPH0234663A (en) | 1990-02-05 |
Family
ID=16134396
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18336088A Pending JPH0234663A (en) | 1988-07-22 | 1988-07-22 | Polyphenylene sulfide film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0234663A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001261959A (en) * | 2000-03-21 | 2001-09-26 | Toray Ind Inc | Biaxially oriented film, metallized film and film capacitor |
JP2006316245A (en) * | 2004-12-21 | 2006-11-24 | Asahi Kasei Chemicals Corp | Polyphenylene sulfide resin composition |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62121761A (en) * | 1985-11-22 | 1987-06-03 | Dainippon Ink & Chem Inc | resin film |
JPS6333427A (en) * | 1986-07-25 | 1988-02-13 | Diafoil Co Ltd | Polyphenylene sulfide film |
JPS63242522A (en) * | 1987-03-30 | 1988-10-07 | Kureha Chem Ind Co Ltd | Formed object of high crystallized polyarylene thioether |
-
1988
- 1988-07-22 JP JP18336088A patent/JPH0234663A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62121761A (en) * | 1985-11-22 | 1987-06-03 | Dainippon Ink & Chem Inc | resin film |
JPS6333427A (en) * | 1986-07-25 | 1988-02-13 | Diafoil Co Ltd | Polyphenylene sulfide film |
JPS63242522A (en) * | 1987-03-30 | 1988-10-07 | Kureha Chem Ind Co Ltd | Formed object of high crystallized polyarylene thioether |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001261959A (en) * | 2000-03-21 | 2001-09-26 | Toray Ind Inc | Biaxially oriented film, metallized film and film capacitor |
JP2006316245A (en) * | 2004-12-21 | 2006-11-24 | Asahi Kasei Chemicals Corp | Polyphenylene sulfide resin composition |
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