JPH02287355A - Glass mask structure with protective member - Google Patents
Glass mask structure with protective memberInfo
- Publication number
- JPH02287355A JPH02287355A JP1108569A JP10856989A JPH02287355A JP H02287355 A JPH02287355 A JP H02287355A JP 1108569 A JP1108569 A JP 1108569A JP 10856989 A JP10856989 A JP 10856989A JP H02287355 A JPH02287355 A JP H02287355A
- Authority
- JP
- Japan
- Prior art keywords
- protective member
- frame
- mask structure
- glass mask
- glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、集積回路(以下ICと呼ぶ)製造などに用い
る保護部材つきガラスマスク構造に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a glass mask structure with a protective member used for manufacturing integrated circuits (hereinafter referred to as ICs).
〔発明の概要1
本発明は、保護部材つきガラスマスク構造に於て、(采
護部材を有するフレームに穴又は切り欠きを設けること
により、空気を流通させ気圧差による保護部材の変形を
防止するものである。[Summary of the invention 1] The present invention provides a glass mask structure with a protective member (by providing a hole or a cutout in a frame having a supporting member, air is circulated to prevent deformation of the protective member due to a pressure difference). It is something.
【従来の技術]
従来の保護部材つきガラスマスク構造には、フレームに
穴などの空間が無いため保護部材とガラスの間の空気が
密封されていた。[Prior Art] A conventional glass mask structure with a protective member does not have a hole or other space in the frame, so the air between the protective member and the glass is sealed.
〔発明が解決しようとする課題J
しかし、前述の従来技術では気圧変化などにより保護部
材が変形すると言う問題点を有する。そこで本発明はこ
の様な問題点を解決するもので。[Problem to be Solved by the Invention J] However, the above-mentioned prior art has a problem in that the protective member deforms due to changes in atmospheric pressure and the like. Therefore, the present invention is intended to solve these problems.
その目的とする所は保護部材の変形を防止した保護部材
つきガラスマスク構造を提供するところにある。The purpose is to provide a glass mask structure with a protective member that prevents deformation of the protective member.
〔課題を解決するための手段j
本発明の保護部材つきガラスマスク構造は、保護部材を
固着したフレームに穴又は切り欠きを設けたことを特徴
とする。[Means for Solving the Problems J] The glass mask structure with a protective member of the present invention is characterized in that a hole or a notch is provided in the frame to which the protective member is fixed.
本発明の上記の構成によれば、フレームに穴又は切り欠
きを設けたことにより空気を流通させ、保護部材の変形
を防止するものである。According to the above configuration of the present invention, the holes or notches are provided in the frame to allow air to circulate and prevent deformation of the protective member.
[実 施 例1
第1図は本発明の第一の実施例に於ける平面図であって
、■はガラス、2はフレーム、3aと3bはフレーム2
に設けた穴である。第2図は本発明の第一の実施例に於
ける断面図であって、4は保護部材である。第1図、第
2図に示すごと(。[Example 1] Figure 1 is a plan view of the first example of the present invention, where ■ is glass, 2 is a frame, and 3a and 3b are frame 2.
This is a hole made in the hole. FIG. 2 is a sectional view of the first embodiment of the present invention, and 4 is a protection member. As shown in Figures 1 and 2 (.
フレーム2に、穴3a、3bを設けることにより、ガラ
ス1と保護部材との間の空間は外部と空気流通が出来る
ようになっており、気圧の異なる地点に移動したり、温
度変化が生じた場合でも。By providing the holes 3a and 3b in the frame 2, the space between the glass 1 and the protective member allows air to circulate with the outside, so that the space between the glass 1 and the protective member can be moved to a point with a different atmospheric pressure or where a temperature change occurs. Even if.
該空間と外部に気圧差が生ぜず保護部材を変形させるこ
とがない、第3図は本発明の第二の実施例に於ける断面
図であり、フレーム2に切り欠き5aと5bを設けたも
のである。この場合には、フレーム作成時に、射出成形
で極めて容易に切り欠きを同時形成することが可能であ
る。第4図は本発明の第三の実施例の部分断面図であり
、第5図は本発明の第三の実施例の部分平面図である。FIG. 3 is a cross-sectional view of a second embodiment of the present invention, in which no pressure difference occurs between the space and the outside, and the protective member is not deformed. It is something. In this case, when creating the frame, it is possible to simultaneously form the notches extremely easily by injection molding. FIG. 4 is a partial sectional view of a third embodiment of the invention, and FIG. 5 is a partial plan view of the third embodiment of the invention.
この場合はフレームの底面に貫通しない切り欠き5を設
け、フレームの上部より穴6を切り欠き5部に貫通する
ように設けたものである。よって、外部からのごみなど
が内部に入りにくいと言う特徴を有する。またフレーム
の射出成形時に切り欠きと穴を同時に作成出来る。In this case, a notch 5 that does not penetrate through the bottom of the frame is provided, and a hole 6 is provided from the top of the frame so as to penetrate through the notch 5. Therefore, it has the characteristic that it is difficult for foreign matter to enter the inside. Also, notches and holes can be created at the same time when injection molding the frame.
[発明の効果]
以上述べたように発明によれば、フレームに穴又は切り
欠きを設けたことにより、気圧差や温度差などの環境変
化によっても、保護部材が変形しないと言う効果を有す
る。[Effects of the Invention] As described above, according to the invention, by providing the holes or notches in the frame, there is an effect that the protective member does not deform even due to environmental changes such as differences in air pressure and temperature.
更に、穴又は切り欠き形状を実施例のごとくすることに
より、安価に製造できると言う効果を有する。Furthermore, by forming the hole or cutout shape as in the embodiment, it is possible to manufacture the device at low cost.
第1図は本発明の保護部材つきガラスマスク構造の第一
の実施例を示す平面図。
第2図は本発明の保護部材つきガラスマスク構造の第一
の実施例を示す断面図。
第3図は本発明の保護部材つきガラスマスク構造の第二
の実施例を示す断面図。
第4図は本発明の保護部材つきガラスマスク構造の第三
の実施例を示す部分断面図。
第5図は本発明の保護部材つきガラスマスク構造の第三
の実施例を示す部分平面図。
l ・ ・
2 ・ ・
3 a、
4 ・ ・
5a。
6 ・ ・
7 ・
・ガラス
・フレーム
・穴
・保護部材
・切り欠き
・穴
・切り欠き
第
図
以
上
出願人 セイコーエプソン株式会社
代理人 弁理士 鈴 木 喜三部(他1名)第
図
第
図FIG. 1 is a plan view showing a first embodiment of a glass mask structure with a protective member according to the present invention. FIG. 2 is a sectional view showing a first embodiment of the glass mask structure with a protective member of the present invention. FIG. 3 is a sectional view showing a second embodiment of the glass mask structure with a protective member of the present invention. FIG. 4 is a partial sectional view showing a third embodiment of the glass mask structure with a protective member of the present invention. FIG. 5 is a partial plan view showing a third embodiment of the glass mask structure with a protective member of the present invention. l ・ ・ 2 ・ ・ 3 a, 4 ・ ・ 5 a. 6 ・ ・ 7 ・ ・Glass, frame, hole, protective member, notch, hole, notch Diagram and above Applicant: Seiko Epson Co., Ltd. Agent Patent attorney Kizobe Suzuki (1 other person) Diagram and diagram
Claims (1)
レームを固着し、該フレームの一部に穴又は切り欠きを
有することを特徴とする保護部材つきガラスマスク構造
。A glass mask structure with a protective member, characterized in that a frame supporting a protective member is fixed to a patterned surface of glass, and a part of the frame has a hole or a notch.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1108569A JPH02287355A (en) | 1989-04-27 | 1989-04-27 | Glass mask structure with protective member |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1108569A JPH02287355A (en) | 1989-04-27 | 1989-04-27 | Glass mask structure with protective member |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02287355A true JPH02287355A (en) | 1990-11-27 |
Family
ID=14488148
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1108569A Pending JPH02287355A (en) | 1989-04-27 | 1989-04-27 | Glass mask structure with protective member |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02287355A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05508487A (en) * | 1991-05-17 | 1993-11-25 | デュポン・フォトマスクス・インコーポレイテッド | pressure relief pellicle |
JP2021073536A (en) * | 2017-10-10 | 2021-05-13 | 信越化学工業株式会社 | Euv pellicle frame ventilation structure, euv pellicle, exposure original plate with euv pellicle, exposure method, method for producing semiconductor and method for producing liquid crystal display |
-
1989
- 1989-04-27 JP JP1108569A patent/JPH02287355A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05508487A (en) * | 1991-05-17 | 1993-11-25 | デュポン・フォトマスクス・インコーポレイテッド | pressure relief pellicle |
US6103427A (en) * | 1991-05-17 | 2000-08-15 | Dupont Photomasks, Inc. | Pressure relieving pellicle |
JP2021073536A (en) * | 2017-10-10 | 2021-05-13 | 信越化学工業株式会社 | Euv pellicle frame ventilation structure, euv pellicle, exposure original plate with euv pellicle, exposure method, method for producing semiconductor and method for producing liquid crystal display |
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