JPH02282378A - Production of acid anhydride - Google Patents
Production of acid anhydrideInfo
- Publication number
- JPH02282378A JPH02282378A JP10429289A JP10429289A JPH02282378A JP H02282378 A JPH02282378 A JP H02282378A JP 10429289 A JP10429289 A JP 10429289A JP 10429289 A JP10429289 A JP 10429289A JP H02282378 A JPH02282378 A JP H02282378A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- formula
- acid
- compound shown
- raw material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 150000008065 acid anhydrides Chemical class 0.000 title claims description 10
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 150000001875 compounds Chemical class 0.000 claims abstract description 42
- 125000000962 organic group Chemical group 0.000 claims abstract description 8
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 4
- 150000001340 alkali metals Chemical class 0.000 claims abstract description 4
- 239000000203 mixture Substances 0.000 claims abstract description 4
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 2
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims description 2
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 abstract description 21
- 150000002148 esters Chemical class 0.000 abstract description 13
- 239000002253 acid Substances 0.000 abstract description 11
- 239000002994 raw material Substances 0.000 abstract description 7
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 abstract description 5
- 239000002904 solvent Substances 0.000 abstract description 4
- 238000000354 decomposition reaction Methods 0.000 abstract description 3
- 238000006317 isomerization reaction Methods 0.000 abstract description 3
- AALUTIYNYXEFNT-UHFFFAOYSA-N trimethylsilane hydroiodide Chemical compound C[SiH](C)C.I AALUTIYNYXEFNT-UHFFFAOYSA-N 0.000 abstract description 3
- CURBACXRQKTCKZ-UHFFFAOYSA-N cyclobutane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1C(C(O)=O)C(C(O)=O)C1C(O)=O CURBACXRQKTCKZ-UHFFFAOYSA-N 0.000 abstract description 2
- 150000000000 tetracarboxylic acids Chemical class 0.000 abstract description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 abstract 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 abstract 1
- UIUXUFNYAYAMOE-UHFFFAOYSA-N methylsilane Chemical compound [SiH3]C UIUXUFNYAYAMOE-UHFFFAOYSA-N 0.000 abstract 1
- 239000001384 succinic acid Substances 0.000 abstract 1
- FVAUCKIRQBBSSJ-UHFFFAOYSA-M sodium iodide Chemical compound [Na+].[I-] FVAUCKIRQBBSSJ-UHFFFAOYSA-M 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 11
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 10
- 238000000034 method Methods 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 239000007795 chemical reaction product Substances 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- -1 isopropyldimethylsilane iodide Chemical compound 0.000 description 5
- 238000010992 reflux Methods 0.000 description 4
- 235000009518 sodium iodide Nutrition 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 3
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 2
- JARXNQUBGBXALE-UHFFFAOYSA-N C(C)[SiH](CC)CC.Cl Chemical compound C(C)[SiH](CC)CC.Cl JARXNQUBGBXALE-UHFFFAOYSA-N 0.000 description 2
- NIQCNGHVCWTJSM-UHFFFAOYSA-N Dimethyl phthalate Chemical compound COC(=O)C1=CC=CC=C1C(=O)OC NIQCNGHVCWTJSM-UHFFFAOYSA-N 0.000 description 2
- MUXOBHXGJLMRAB-UHFFFAOYSA-N Dimethyl succinate Chemical group COC(=O)CCC(=O)OC MUXOBHXGJLMRAB-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 150000001733 carboxylic acid esters Chemical class 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- HSZCZNFXUDYRKD-UHFFFAOYSA-M lithium iodide Chemical compound [Li+].[I-] HSZCZNFXUDYRKD-UHFFFAOYSA-M 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- WFUBYPSJBBQSOU-UHFFFAOYSA-M rubidium iodide Chemical compound [Rb+].[I-] WFUBYPSJBBQSOU-UHFFFAOYSA-M 0.000 description 2
- 229940014800 succinic anhydride Drugs 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- MDMUQRJQFHEVFG-UHFFFAOYSA-J thorium(iv) iodide Chemical compound [I-].[I-].[I-].[I-].[Th+4] MDMUQRJQFHEVFG-UHFFFAOYSA-J 0.000 description 2
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- YZBCICVNBHNLTK-UHFFFAOYSA-N 4,5-dihydroxyphthalic acid Chemical compound OC(=O)C1=CC(O)=C(O)C=C1C(O)=O YZBCICVNBHNLTK-UHFFFAOYSA-N 0.000 description 1
- MWRVRCAFWBBXTL-UHFFFAOYSA-N 4-hydroxyphthalic acid Chemical compound OC(=O)C1=CC=C(O)C=C1C(O)=O MWRVRCAFWBBXTL-UHFFFAOYSA-N 0.000 description 1
- CQMIJLIXKMKFQW-UHFFFAOYSA-N 4-phenylbenzene-1,2,3,5-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C(O)=O)=C1C1=CC=CC=C1 CQMIJLIXKMKFQW-UHFFFAOYSA-N 0.000 description 1
- DFGKGUXTPFWHIX-UHFFFAOYSA-N 6-[2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]acetyl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)C1=CC2=C(NC(O2)=O)C=C1 DFGKGUXTPFWHIX-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- BNSJULSSXRHPGB-UHFFFAOYSA-N CC[SiH](CC)CC.Br Chemical compound CC[SiH](CC)CC.Br BNSJULSSXRHPGB-UHFFFAOYSA-N 0.000 description 1
- SRFHMPYZUQUEOR-UHFFFAOYSA-N CC[SiH](CC)CC.I Chemical compound CC[SiH](CC)CC.I SRFHMPYZUQUEOR-UHFFFAOYSA-N 0.000 description 1
- VTIJFLNLHCYVPF-UHFFFAOYSA-N C[SiH](C)C.Br Chemical compound C[SiH](C)C.Br VTIJFLNLHCYVPF-UHFFFAOYSA-N 0.000 description 1
- 239000004805 Cyclohexane-1,2-dicarboxylic acid Substances 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 241000270295 Serpentes Species 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- 238000005903 acid hydrolysis reaction Methods 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- DVWBKCSKPCZFDE-UHFFFAOYSA-N bicyclo[2.2.1]hept-2-ene-2,3-dicarboxylic acid Chemical compound C1CC2C(C(=O)O)=C(C(O)=O)C1C2 DVWBKCSKPCZFDE-UHFFFAOYSA-N 0.000 description 1
- NIDNOXCRFUCAKQ-UHFFFAOYSA-N bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid Chemical compound C1C2C=CC1C(C(=O)O)C2C(O)=O NIDNOXCRFUCAKQ-UHFFFAOYSA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- XQPRBTXUXXVTKB-UHFFFAOYSA-M caesium iodide Chemical compound [I-].[Cs+] XQPRBTXUXXVTKB-UHFFFAOYSA-M 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 1
- RLWFMZKPPHHHCB-UHFFFAOYSA-N cyclopropane-1,2-dicarboxylate;hydron Chemical compound OC(=O)C1CC1C(O)=O RLWFMZKPPHHHCB-UHFFFAOYSA-N 0.000 description 1
- 239000012024 dehydrating agents Substances 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- MUHLLJVMANSPOE-UHFFFAOYSA-N dimethyl 4-[tert-butyl(dimethyl)silyl]oxybenzene-1,2-dicarboxylate Chemical compound COC(=O)C1=CC=C(O[Si](C)(C)C(C)(C)C)C=C1C(=O)OC MUHLLJVMANSPOE-UHFFFAOYSA-N 0.000 description 1
- KMUIVDDMCZNNEJ-UHFFFAOYSA-N dimethyl(propan-2-yl)silicon Chemical compound CC(C)[Si](C)C KMUIVDDMCZNNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- INHCSSUBVCNVSK-UHFFFAOYSA-L lithium sulfate Inorganic materials [Li+].[Li+].[O-]S([O-])(=O)=O INHCSSUBVCNVSK-UHFFFAOYSA-L 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000003541 multi-stage reaction Methods 0.000 description 1
- KHARCSTZAGNHOT-UHFFFAOYSA-N naphthalene-2,3-dicarboxylic acid Chemical compound C1=CC=C2C=C(C(O)=O)C(C(=O)O)=CC2=C1 KHARCSTZAGNHOT-UHFFFAOYSA-N 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- RBTVSNLYYIMMKS-UHFFFAOYSA-N tert-butyl 3-aminoazetidine-1-carboxylate;hydrochloride Chemical compound Cl.CC(C)(C)OC(=O)N1CC(N)C1 RBTVSNLYYIMMKS-UHFFFAOYSA-N 0.000 description 1
- QCIWZIYBBNEPKB-UHFFFAOYSA-N tert-butyl(dimethyl)silane Chemical class C[SiH](C)C(C)(C)C QCIWZIYBBNEPKB-UHFFFAOYSA-N 0.000 description 1
- ILMRJRBKQSSXGY-UHFFFAOYSA-N tert-butyl(dimethyl)silicon Chemical compound C[Si](C)C(C)(C)C ILMRJRBKQSSXGY-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Furan Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
「産業上の利用分野]
本発明は、工業原料などの用途として重要な酸無水物の
製造法に関するものである。DETAILED DESCRIPTION OF THE INVENTION "Field of Industrial Application" The present invention relates to a method for producing acid anhydrides, which are important for use as industrial raw materials.
[従来の技術]
一般的に、ポリカルボン酸エステルから酸無水物を製造
する方法としては、カルボン酸エステルを一旦加水分解
してポリカルボン酸にした後、酸無水物に変換する二段
階法が行なわれている。[Prior Art] Generally, the method for producing acid anhydrides from polycarboxylic esters is a two-step method in which the carboxylic esters are first hydrolyzed to form polycarboxylic acids and then converted to acid anhydrides. It is being done.
この二段階法における加水分解の方法としては、■水、
メタノール、エタノール、酢酸などの溶液中で、塩酸、
硫酸、臭化水素酸などとカルボン酸エステルとを室温以
上で反応させる酸加水分解法、■水、メタノール、エタ
ノールなどの溶液中で、水酸化ナトリウム、水酸化カリ
ウムなどとポリカルボン酸エステルとを室温以上で反応
させる塩基加水分解法が知られている。The hydrolysis method in this two-step method includes ■water,
In solutions such as methanol, ethanol, and acetic acid, hydrochloric acid,
Acid hydrolysis method, in which sulfuric acid, hydrobromic acid, etc., and carboxylic acid ester are reacted at room temperature or above, ■ Sodium hydroxide, potassium hydroxide, etc. and polycarboxylic ester are reacted in a solution of water, methanol, ethanol, etc. A base hydrolysis method in which the reaction is carried out at room temperature or higher is known.
また、ポリカルボン酸から酸無水物への変換法には、加
熱による方法、無水酢酸などの脱水剤を作用させる化学
的方法とが知られている。Furthermore, known methods for converting polycarboxylic acids into acid anhydrides include a heating method and a chemical method using a dehydrating agent such as acetic anhydride.
[発明が解決しようとする課題]
しかし、上記の二段階法による酸無水物の製造方法では
、原料化合物の分解や異性化を伴なう点に問題を有して
いた。[Problems to be Solved by the Invention] However, the two-step method for producing acid anhydrides described above has a problem in that it involves decomposition and isomerization of the raw material compound.
[課題を解決するための手段]
すなわち本発明は、
C−C0OR+
で表わされる構造(ここで、R1およびR2は同一でも
異なってもよく、−価の有機基を表わす)を有する化合
物を、
(1)R3R4R5SiIで表わされる化合物(ここで
、R3、R4およびR5は同一でも異なってもよく、−
価の有機基を表わし、以下「化合物■」という)
または
(2)R3R4R5SiXで表わされる化合物(ここで
、R3、R4およびR5は前記と同様であり、Xは塩素
原子または臭素原子を表わし、以下「化合物■」という
)とMIで表わされる化合物(ここで、Mはアルカリ金
属原子を表わし、以下「化合物IffJという)との混
合物
と反応させることを特徴とする酸無水物の製造方法を提
供するものである。[Means for Solving the Problems] That is, the present invention provides a compound having a structure represented by C-C0OR+ (where R1 and R2 may be the same or different and represent a -valent organic group), ( 1) Compound represented by R3R4R5SiI (where R3, R4 and R5 may be the same or different, -
or (2) a compound represented by R3R4R5SiX (where R3, R4 and R5 are the same as above, and X represents a chlorine atom or a bromine atom, and the following Provided is a method for producing an acid anhydride, which is characterized by reacting a mixture of a compound (referred to as "compound ■") and a compound represented by MI (herein, M represents an alkali metal atom, hereinafter referred to as "compound IfJ"). It is something.
ポリカルボン酸エステルが有する
C−C○ORI
式
%式%
で表わされる構造において R+およびR2である一価
の有機基としては、例えばメチル基、エチル基、プロピ
ル基、ブチル基などのアルキル基などを挙げることがで
き、これらのうちでは炭素数1〜5のアルキル基が好ま
しい。In the structure represented by C-C○ORI formula % formula % which the polycarboxylic acid ester has, monovalent organic groups which are R+ and R2 include, for example, alkyl groups such as methyl group, ethyl group, propyl group, butyl group, etc. Among these, an alkyl group having 1 to 5 carbon atoms is preferred.
ポリカルボン酸エステルとしては、例えばコバり酸、イ
タコン酸、リンゴ酸、酒石酸、オキサルプロピオン酸、
シクロプロパン−1,2−ジカルボン酸、シクロヘキサ
ン−1,2−ジカルボン酸、ノルボルネン−2,3−ジ
カルボン酸、5−ノルボルネン−2,3−ジカルボン酸
、フタル酸、4−ヒドロキシフタル酸、4,5−ジヒド
ロキシフタル酸、2,3−ナフタレンジカルボン酸、3
゜4−フランジカルボン酸などのジカルボン酸のジアル
キルエステル、および1,2,3.4−シクロブタンテ
トラカルボン酸、1. 2. 3.4−シクロペンタン
テトラカルボン酸、ノルボルネン−2,3,5,6−テ
トラカルボン酸、ピロメリット酸、3.3’ 、4.4
’ −ベンゾフェノンテトラカルボン酸、3.3’
、4.4’ −ビフェニルテトラカルボン酸などのテト
ラカルボン酸のテトラアルキルエステルを挙げることが
できる。Examples of polycarboxylic acid esters include cobalic acid, itaconic acid, malic acid, tartaric acid, oxalpropionic acid,
Cyclopropane-1,2-dicarboxylic acid, cyclohexane-1,2-dicarboxylic acid, norbornene-2,3-dicarboxylic acid, 5-norbornene-2,3-dicarboxylic acid, phthalic acid, 4-hydroxyphthalic acid, 4, 5-dihydroxyphthalic acid, 2,3-naphthalene dicarboxylic acid, 3
Dialkyl esters of dicarboxylic acids such as 4-furandicarboxylic acid, and 1,2,3,4-cyclobutanetetracarboxylic acid, 1. 2. 3.4-cyclopentanetetracarboxylic acid, norbornene-2,3,5,6-tetracarboxylic acid, pyromellitic acid, 3.3', 4.4
' -benzophenonetetracarboxylic acid, 3.3'
, 4,4'-biphenyltetracarboxylic acid and other tetraalkyl esters of tetracarboxylic acids.
化合物Iにおいて、R3、R4およびR5である一価の
有機基としては、前記R1およびR2と同様の基を挙げ
ることができ、化合物Iの具体例としては、ヨウ化トリ
メチルシラン、ヨウ化トリエチルシラン、ヨウ化イソプ
ロピルジメチルシラン、ヨウ化t−ブチルジメチルシラ
ンなどを挙げることができる。In compound I, the monovalent organic groups R3, R4, and R5 include the same groups as R1 and R2, and specific examples of compound I include trimethylsilane iodide, triethylsilane iodide, , isopropyldimethylsilane iodide, t-butyldimethylsilane iodide, and the like.
化合物■において、R3、R4およびR5である一価の
有機基としては、前記R1およびR2と同様の基を挙げ
ることができ、化合物Hの具体例としては、塩化トリメ
チルシラン、塩化トリエチルシラン、塩化イソプロピル
ジメチルシラン、塩化t−ブチルジメチルシラン、臭化
トリメチルシラン、臭化トリエチルシラン、臭化イソプ
ロピルジメチルシラン、臭化t−ブチルジメチルシラン
などを挙げることができる。In compound (1), the monovalent organic groups R3, R4, and R5 include the same groups as R1 and R2, and specific examples of compound H include trimethylsilane chloride, triethylsilane chloride, and triethylsilane chloride. Examples include isopropyldimethylsilane, chlorinated t-butyldimethylsilane, bromide trimethylsilane, bromide triethylsilane, bromide isopropyldimethylsilane, bromide t-butyldimethylsilane, and the like.
化合物■において、Mであるアルカリ金属としては、リ
チウム、ナトリウム、カリウム、ルビジウム、セシウム
などを挙げることができ、化合物■の具体例としては、
ヨウ化リチウム、ヨウ化ナトリウム、ヨウ化カリウム、
ヨウ化ルビジウム、ヨウ化セシウムなどを挙げることが
できる。In compound (■), examples of the alkali metal M include lithium, sodium, potassium, rubidium, cesium, etc., and specific examples of compound (■) are:
Lithium iodide, sodium iodide, potassium iodide,
Examples include rubidium iodide and cesium iodide.
ポリカルボン酸エステルと化合物Iまたは化合物■と化
合物■の混合物との反応には溶媒を用いることか好まし
い。It is preferable to use a solvent for the reaction between the polycarboxylic acid ester and Compound I or the mixture of Compound (1) and Compound (2).
ここで、溶媒としては、化合物I、化合物■および化合
物■と反応しない有機溶媒であり、好ましくはアセトニ
トリル、四塩化炭素、クロロホルム、ジクロロメタン、
スルホランなどであり、より好ましくはアセトニトリル
反応に用いる化合物■の量は、ポリカルボン酸エステル
が有する式−COORIで表わされる基1当量あたり1
モル以上で、好ましくは3〜5モルである。また、化合
物■と化合物■の混合比は任意であるが1:1が好まし
く、反応に必要な化合物■および化合物■の量は、ポリ
カルボン酸エステルが有する式−COORIで表わされ
る基1当量あたりそれぞれ1モル以上で、好ましくはそ
れぞれ3〜5モルである。Here, the solvent is an organic solvent that does not react with Compound I, Compound (1), and Compound (2), and is preferably acetonitrile, carbon tetrachloride, chloroform, dichloromethane,
sulfolane, etc., and more preferably the amount of compound (2) used in the acetonitrile reaction is 1 per equivalent of the group represented by the formula -COORI in the polycarboxylic acid ester.
The amount is more than 1 mole, preferably 3 to 5 moles. Further, the mixing ratio of compound (1) and compound (2) is arbitrary, but preferably 1:1, and the amount of compound (1) and compound (2) required for the reaction is per equivalent of the group represented by the formula -COORI possessed by the polycarboxylic acid ester. Each amount is 1 mol or more, preferably 3 to 5 mols each.
また、反応温度は0〜100℃、反応時間は1時間〜5
巳程度である。In addition, the reaction temperature is 0 to 100°C, and the reaction time is 1 hour to 5.
It is about the size of a snake.
反応終了後、得られる酸無水物は、通常、エーテル、酢
酸エチル、ジクロロメタン、クロロホルムなどを用いて
抽出し、洗浄後、乾燥する。After the reaction is completed, the acid anhydride obtained is usually extracted using ether, ethyl acetate, dichloromethane, chloroform, etc., washed, and then dried.
[実 施 例]
以下に実施例にて本発明をさらに詳細に説明するが、本
発明は実施例に限定されるものではない。[Examples] The present invention will be explained in more detail with reference to Examples below, but the present invention is not limited to the Examples.
実施例1 コハク酸ジメチルエステル2. Olg (13。Example 1 Succinic acid dimethyl ester2. Olg (13.
8 mmol)を四塩化炭素20mlに溶かした溶液に
、室温でヨウ化トリメチルシラン1 0. 5m1.
(82。Add 10.8 mmol of trimethylsilane iodide to a solution of 20 ml of carbon tetrachloride at room temperature. 5m1.
(82.
7mmol)を滴下し、10時間、50℃で加熱した。7 mmol) was added dropwise and heated at 50° C. for 10 hours.
反応終了後、水100mlを加え、分液ロートを用いク
ロロホルム100mlで反応生成物を抽出した。After the reaction was completed, 100 ml of water was added, and the reaction product was extracted with 100 ml of chloroform using a separating funnel.
抽出した有機層を、まず水、次に10重量%チオ硫酸す
トリウム水、さらに飽和食塩水それぞれ50mlで洗い
、無水硫酸すl・リウム10gで乾燥後、エバポレータ
を用い溶媒を減圧上留去し、コハク酸無水物1. 0
8g (10. 8mmol)を得た。The extracted organic layer was first washed with 50 ml each of water, then 10% by weight sodium thiosulfate solution, and then saturated brine, dried over 10 g of anhydrous sulfur and lithium sulfate, and then the solvent was distilled off under reduced pressure using an evaporator. , succinic anhydride 1. 0
8 g (10.8 mmol) was obtained.
実施例2 コハク酸ジメチルエステル2.05g (14。Example 2 Succinic acid dimethyl ester 2.05g (14.
On+mol)とヨウ化ナトリウム12.6g (84
。On+mol) and sodium iodide 12.6g (84
.
1 mmol)をアセトニトリル25mlに懸濁させ、
これに室温で塩化トリメチルシラン10. 8ml (
85、 1mmol)を滴下した後、常圧下、加熱還
流を4日間続けた。反応終了後、水100mlを加えて
エーテル100mlで反応生成物を抽出し、以下、実施
例1と同様にして、洗浄し、乾燥してコハク酸無水物1
. 13g (11. 3mmol)を得た。1 mmol) in 25 ml of acetonitrile,
To this was added 10% trimethylsilane chloride at room temperature. 8ml (
85, 1 mmol) was added dropwise, and heating and refluxing was continued for 4 days under normal pressure. After the reaction was completed, 100 ml of water was added and the reaction product was extracted with 100 ml of ether, washed and dried in the same manner as in Example 1 to obtain succinic anhydride 1.
.. 13 g (11.3 mmol) was obtained.
実施例3 フタル酸ジメチルエステル2.05g (10。Example 3 2.05 g of phthalic acid dimethyl ester (10.
6mmol)とヨウ化ナトリウム9.50g (63。6 mmol) and 9.50 g of sodium iodide (63.
4mmol)をアセトニトリル25mlに懸濁させ、こ
れに室温で塩化トリメチルシラン8. Oml (6
3。4 mmol) was suspended in 25 ml of acetonitrile, and 8.0 mmol of trimethylsilane chloride was suspended at room temperature. Oml (6
3.
0 mmol)を滴下した後、加熱還流を4日間続けた
。After dropping 0 mmol), heating under reflux was continued for 4 days.
反応終了後、水100mlを加えてエーテル100ml
で反応生成物を抽出し、以下、実施例1と同様にして、
洗浄し、乾燥してフタル酸無水物1.53g (10.
3mmol)を得た。After the reaction is complete, add 100ml of water and add 100ml of ether.
The reaction product was extracted, and the following procedure was performed in the same manner as in Example 1.
Wash and dry to remove 1.53 g of phthalic anhydride (10.
3 mmol) was obtained.
実施例4
4−t−ブチルジメチルシロキシフタル酸ジメチル0.
3 3 g (1. 0mmol)とヨウ化すト
リウム0。9 1 g (6. 1mmol)をアセ
トニトリル10mlに懸濁させ、これに室温で塩化トリ
メチルシラン0. 80ml (6. :3mmol
)を滴下した後、加熱還流を4日間続けた。反応終了後
、水100mlを加えてエーテル100mlで反応生成
物を抽出し、以下、実施例1と同様にして、洗浄し、乾
燥して1−t−ブチルジメチルシロキシフタル酸無水物
0、27g (0.97北of)を得た。Example 4 Dimethyl 4-t-butyldimethylsiloxyphthalate 0.
33 g (1.0 mmol) and 0.91 g (6.1 mmol) of thorium iodide were suspended in 10 ml of acetonitrile, and 0.9 g (6.1 mmol) of thorium iodide was added to the suspension at room temperature. 80ml (6.:3mmol
) was added dropwise, and heating and refluxing was continued for 4 days. After the reaction, 100 ml of water was added and the reaction product was extracted with 100 ml of ether, washed and dried in the same manner as in Example 1 to obtain 0.27 g of 1-t-butyldimethylsiloxyphthalic anhydride ( 0.97 north of) was obtained.
実施例5
3、9 2,10 4.8
[9. 2. 1. 1 、0 、0
] ]トリシクロペンタデカー5,12ジエン5
. 26g(16. 6mmol)とヨウ化ナトリ
ウム15.0g(0. 10mmol)をアセトニト
リル20mlに懸濁させ、これに室温で塩化トリメチル
シラン15。Example 5 3, 9 2, 10 4.8 [9. 2. 1. 1, 0, 0
] ] tricyclopentadecyl 5,12 diene 5
.. 26 g (16.6 mmol) and 15.0 g (0.10 mmol) of sodium iodide were suspended in 20 ml of acetonitrile, and trimethylsilane chloride 15 was added to the suspension at room temperature.
Oml (0. 1 18mmol)を滴下し、加熱
還流を5日間続けた。反応終了後、水100mlを加え
てエーテル100mlで反応生成物を抽出し、以下、実
施例1と同様にして、洗浄し、乾燥して[9. 2。Oml (0.1 18 mmol) was added dropwise and heating under reflux was continued for 5 days. After the reaction was completed, 100 ml of water was added and the reaction product was extracted with 100 ml of ether, followed by washing and drying in the same manner as in Example 1 [9. 2.
3、9 2,10 4.8
1、1 、0 、0 ]]トリシクロペン
タデカー5,12ジエン無水物3. 54g (13
、1mmol)を得た。3,9 2,10 4.8 1,1 ,0 ,0 ] ] Tricyclopentadecyl 5,12 diene anhydride 3. 54g (13
, 1 mmol) was obtained.
[発明の効果コ
本発明によれば、ポリカルボン酸エステルから原料化合
物の分解や異性化を伴なうことなく、段階の反応で酸無
水物を製造することができる。[Effects of the Invention] According to the present invention, an acid anhydride can be produced from a polycarboxylic acid ester through a stepwise reaction without decomposition or isomerization of the raw material compound.
特許出願人 日本合成ゴム株式会社Patent applicant: Japan Synthetic Rubber Co., Ltd.
Claims (1)
でも異なってもよく、一価の有機基を表わす)を有する
化合物を、 (1)R^3R^4R^5SiIで表わされる化合物(
ここで、R^3、R^4およびR^5は同一でも異なっ
てもよく、一価の有機基を表わす) または (2)R^3R^4R^5SiXで表わされる化合物(
ここで、R^3、R^4およびR^5は前記と同様であ
り、Xは塩素原子または臭素原子を表わす)とMIで表
わされる化合物(ここで、Mはアルカリ金属原子を表わ
す)との混合物 と反応させることを特徴とする酸無水物の製造方法。[Claims] Having a structure represented by the formula ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (where R^1 and R^2 may be the same or different and represent a monovalent organic group) (1) A compound represented by R^3R^4R^5SiI (
Here, R^3, R^4 and R^5 may be the same or different and represent a monovalent organic group) or (2) a compound represented by R^3R^4R^5SiX (
Here, R^3, R^4 and R^5 are the same as above, and X represents a chlorine atom or a bromine atom) and a compound represented by MI (here, M represents an alkali metal atom). A method for producing an acid anhydride, characterized by reacting it with a mixture of.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10429289A JPH02282378A (en) | 1989-04-24 | 1989-04-24 | Production of acid anhydride |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10429289A JPH02282378A (en) | 1989-04-24 | 1989-04-24 | Production of acid anhydride |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02282378A true JPH02282378A (en) | 1990-11-19 |
Family
ID=14376859
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10429289A Pending JPH02282378A (en) | 1989-04-24 | 1989-04-24 | Production of acid anhydride |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02282378A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1997008153A1 (en) * | 1995-08-30 | 1997-03-06 | Otsuka Pharmaceutical Factory, Inc. | Process for producing quinazolin-4-one derivatives |
-
1989
- 1989-04-24 JP JP10429289A patent/JPH02282378A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1997008153A1 (en) * | 1995-08-30 | 1997-03-06 | Otsuka Pharmaceutical Factory, Inc. | Process for producing quinazolin-4-one derivatives |
AU697199B2 (en) * | 1995-08-30 | 1998-10-01 | Otsuka Pharmaceutical Factory, Inc. | Process for producing quinazolin-4-one derivatives |
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