JPH02245071A - Conductive paste composition - Google Patents
Conductive paste compositionInfo
- Publication number
- JPH02245071A JPH02245071A JP6655189A JP6655189A JPH02245071A JP H02245071 A JPH02245071 A JP H02245071A JP 6655189 A JP6655189 A JP 6655189A JP 6655189 A JP6655189 A JP 6655189A JP H02245071 A JPH02245071 A JP H02245071A
- Authority
- JP
- Japan
- Prior art keywords
- group
- aromatic
- same
- conductive paste
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 title claims description 53
- 229920005992 thermoplastic resin Polymers 0.000 claims abstract description 73
- 229920005989 resin Polymers 0.000 claims abstract description 51
- 239000011347 resin Substances 0.000 claims abstract description 51
- 229910052709 silver Inorganic materials 0.000 claims abstract description 25
- 239000004332 silver Substances 0.000 claims abstract description 25
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 15
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 15
- 239000004962 Polyamide-imide Substances 0.000 claims abstract description 10
- 239000011231 conductive filler Substances 0.000 claims abstract description 10
- 229920002312 polyamide-imide Polymers 0.000 claims abstract description 10
- 239000002904 solvent Substances 0.000 claims abstract description 8
- 239000004721 Polyphenylene oxide Substances 0.000 claims abstract description 7
- 229920000570 polyether Polymers 0.000 claims abstract description 7
- 229920001721 polyimide Polymers 0.000 claims abstract description 7
- 229920003235 aromatic polyamide Polymers 0.000 claims abstract description 5
- 230000009477 glass transition Effects 0.000 claims abstract description 5
- 239000004642 Polyimide Substances 0.000 claims abstract description 4
- 229920000728 polyester Polymers 0.000 claims abstract description 4
- 125000003118 aryl group Chemical group 0.000 claims description 35
- -1 alicyclic tetracarboxylic acid Chemical class 0.000 claims description 28
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 17
- 125000000217 alkyl group Chemical group 0.000 claims description 15
- 239000000126 substance Substances 0.000 claims description 14
- 239000001257 hydrogen Substances 0.000 claims description 10
- 229910052739 hydrogen Inorganic materials 0.000 claims description 10
- 239000011256 inorganic filler Substances 0.000 claims description 9
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 9
- 238000001179 sorption measurement Methods 0.000 claims description 9
- 125000005843 halogen group Chemical group 0.000 claims description 6
- 125000001989 1,3-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([H])C([*:2])=C1[H] 0.000 claims description 5
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 claims description 4
- 229920002614 Polyether block amide Polymers 0.000 claims description 4
- 125000003545 alkoxy group Chemical group 0.000 claims description 4
- 239000004760 aramid Substances 0.000 claims description 4
- IFVTZJHWGZSXFD-UHFFFAOYSA-N biphenylene Chemical group C1=CC=C2C3=CC=CC=C3C2=C1 IFVTZJHWGZSXFD-UHFFFAOYSA-N 0.000 claims description 4
- IKJFYINYNJYDTA-UHFFFAOYSA-N dibenzothiophene sulfone Chemical group C1=CC=C2S(=O)(=O)C3=CC=CC=C3C2=C1 IKJFYINYNJYDTA-UHFFFAOYSA-N 0.000 claims description 4
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims description 4
- 125000001931 aliphatic group Chemical group 0.000 claims description 3
- 125000001033 ether group Chemical group 0.000 claims description 3
- 229920003055 poly(ester-imide) Polymers 0.000 claims description 3
- 239000009719 polyimide resin Substances 0.000 claims description 3
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 2
- 229920001225 polyester resin Polymers 0.000 claims description 2
- 239000004645 polyester resin Substances 0.000 claims description 2
- 125000001424 substituent group Chemical group 0.000 claims description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 1
- 150000003949 imides Chemical class 0.000 claims 1
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 abstract description 14
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 abstract description 10
- 238000013508 migration Methods 0.000 abstract description 9
- 230000005012 migration Effects 0.000 abstract description 9
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 abstract description 6
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 abstract description 5
- 229960004643 cupric oxide Drugs 0.000 abstract description 5
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 abstract description 5
- 229940112669 cuprous oxide Drugs 0.000 abstract description 5
- 229910021536 Zeolite Inorganic materials 0.000 abstract description 3
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 abstract description 3
- 239000010457 zeolite Substances 0.000 abstract description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 2
- 239000000945 filler Substances 0.000 abstract 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 abstract 1
- 238000013329 compounding Methods 0.000 abstract 1
- 229920006149 polyester-amide block copolymer Polymers 0.000 abstract 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 40
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 36
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 27
- 230000015572 biosynthetic process Effects 0.000 description 27
- 238000003786 synthesis reaction Methods 0.000 description 27
- 239000000843 powder Substances 0.000 description 23
- 239000001294 propane Substances 0.000 description 19
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- 238000002360 preparation method Methods 0.000 description 16
- 150000004984 aromatic diamines Chemical class 0.000 description 15
- 238000000034 method Methods 0.000 description 15
- 238000006243 chemical reaction Methods 0.000 description 12
- 239000000463 material Substances 0.000 description 12
- 150000004985 diamines Chemical class 0.000 description 11
- 238000001132 ultrasonic dispersion Methods 0.000 description 11
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 10
- MTHSVFCYNBDYFN-UHFFFAOYSA-N anhydrous diethylene glycol Natural products OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 10
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 9
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 9
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 8
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical compound C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 description 8
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 7
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 6
- LQOPXMZSGSTGMF-UHFFFAOYSA-N 6004-79-1 Chemical compound C1CC2C3C(=O)OC(=O)C3C1C2 LQOPXMZSGSTGMF-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 6
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- FDQSRULYDNDXQB-UHFFFAOYSA-N benzene-1,3-dicarbonyl chloride Chemical compound ClC(=O)C1=CC=CC(C(Cl)=O)=C1 FDQSRULYDNDXQB-UHFFFAOYSA-N 0.000 description 6
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 6
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 6
- 238000006068 polycondensation reaction Methods 0.000 description 6
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 5
- 239000011230 binding agent Substances 0.000 description 5
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- 229910001928 zirconium oxide Inorganic materials 0.000 description 5
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 4
- 150000008064 anhydrides Chemical class 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 150000002431 hydrogen Chemical class 0.000 description 4
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 4
- 239000012046 mixed solvent Substances 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 4
- LXEJRKJRKIFVNY-UHFFFAOYSA-N terephthaloyl chloride Chemical compound ClC(=O)C1=CC=C(C(Cl)=O)C=C1 LXEJRKJRKIFVNY-UHFFFAOYSA-N 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 239000001273 butane Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000001771 impaired effect Effects 0.000 description 3
- 238000004898 kneading Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 2
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 2
- GPAPPPVRLPGFEQ-UHFFFAOYSA-N 4,4'-dichlorodiphenyl sulfone Chemical compound C1=CC(Cl)=CC=C1S(=O)(=O)C1=CC=C(Cl)C=C1 GPAPPPVRLPGFEQ-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 2
- 150000004292 cyclic ethers Chemical class 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 229940018564 m-phenylenediamine Drugs 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000003444 phase transfer catalyst Substances 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 238000001308 synthesis method Methods 0.000 description 2
- NHGXDBSUJJNIRV-UHFFFAOYSA-M tetrabutylammonium chloride Chemical compound [Cl-].CCCC[N+](CCCC)(CCCC)CCCC NHGXDBSUJJNIRV-UHFFFAOYSA-M 0.000 description 2
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 2
- FHBXQJDYHHJCIF-UHFFFAOYSA-N (2,3-diaminophenyl)-phenylmethanone Chemical compound NC1=CC=CC(C(=O)C=2C=CC=CC=2)=C1N FHBXQJDYHHJCIF-UHFFFAOYSA-N 0.000 description 1
- IBRQUKZZBXZOBA-UHFFFAOYSA-N 1-chloro-3-(3-chlorophenyl)sulfonylbenzene Chemical compound ClC1=CC=CC(S(=O)(=O)C=2C=C(Cl)C=CC=2)=C1 IBRQUKZZBXZOBA-UHFFFAOYSA-N 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- OLQWMCSSZKNOLQ-UHFFFAOYSA-N 3-(2,5-dioxooxolan-3-yl)oxolane-2,5-dione Chemical compound O=C1OC(=O)CC1C1C(=O)OC(=O)C1 OLQWMCSSZKNOLQ-UHFFFAOYSA-N 0.000 description 1
- RXNYJUSEXLAVNQ-UHFFFAOYSA-N 4,4'-Dihydroxybenzophenone Chemical compound C1=CC(O)=CC=C1C(=O)C1=CC=C(O)C=C1 RXNYJUSEXLAVNQ-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 description 1
- UTDAGHZGKXPRQI-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenyl]sulfonylphenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=C(S(=O)(=O)C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1 UTDAGHZGKXPRQI-UHFFFAOYSA-N 0.000 description 1
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- YGYCECQIOXZODZ-UHFFFAOYSA-N 4415-87-6 Chemical compound O=C1OC(=O)C2C1C1C(=O)OC(=O)C12 YGYCECQIOXZODZ-UHFFFAOYSA-N 0.000 description 1
- OMIHGPLIXGGMJB-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]hepta-1,3,5-triene Chemical group C1=CC=C2OC2=C1 OMIHGPLIXGGMJB-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- 238000012696 Interfacial polycondensation Methods 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- XKKWNZFMDFDOHG-UHFFFAOYSA-N cyclopent-3-ene-1,1,2,2-tetracarboxylic acid Chemical compound OC(=O)C1(C(O)=O)CC=CC1(C(O)=O)C(O)=O XKKWNZFMDFDOHG-UHFFFAOYSA-N 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000003925 fat Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000003378 silver Chemical class 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- NJMOHBDCGXJLNJ-UHFFFAOYSA-N trimellitic anhydride chloride Chemical compound ClC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 NJMOHBDCGXJLNJ-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
- H05K1/095—Dispersed materials, e.g. conductive pastes or inks for polymer thick films, i.e. having a permanent organic polymeric binder
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/321—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
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Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野] 本発明は、導電性ペースト組成物に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a conductive paste composition.
銀を導電性充填剤とする導電性ペーストは、導電性が良
好なことから、抵抗器、コンデンサ及び配線板などの電
子部品の電極や配線導体として多用されている。Conductive pastes containing silver as a conductive filler have good conductivity and are therefore frequently used as electrodes and wiring conductors for electronic components such as resistors, capacitors, and wiring boards.
しかし、これらの電子部品を高湿下で放置あるいは使用
した場合、電極あるいは配線導体から銀イオンが流出し
、マイグレーションと称する銀の移行現象を生じ、電極
間が短絡するという欠点を有している。However, when these electronic components are left or used under high humidity, silver ions flow out from the electrodes or wiring conductors, causing a phenomenon called migration, which causes a short circuit between the electrodes. .
近年、これらの電子部品には、ますます小型化、高性能
化が要求されるようになり、マイグレーションによる不
良も増加する傾向にある。In recent years, these electronic components are increasingly required to be smaller and have higher performance, and there is a tendency for defects due to migration to increase.
この銀のマイグレーション不良の防止法よして、特開昭
55−149356号公報に示されているように、銀系
導電性ペーストにマンガン粉を混入させたもの、特開昭
5.3−35739号公報に示=7
されているように、亜鉛粉を混入させたもの、特開昭5
1−146450号公報に示されているように、インジ
ウム粉を混入させたもの及び特開昭56−62858号
公報に示されているようにイオン交換体粉末を混入させ
たものなどが提案されている。In order to prevent this silver migration failure, as shown in Japanese Patent Application Laid-Open No. 55-149356, manganese powder is mixed into a silver-based conductive paste, and Japanese Patent Application Laid-Open No. 5.3-35739 As shown in the publication = 7, the product mixed with zinc powder, JP-A-5
As shown in Japanese Patent Application No. 1-146450, there have been proposed methods in which indium powder is mixed in, and in Japanese Patent Application Laid-Open No. 56-62858, in which ion exchanger powder is mixed. There is.
特開昭55−149356号、同54
146450号、同53−35739号、同56−62
858号公報に示されている導電性ペースト組成物には
、有機バインダとして、従来より知られているフェノー
ル系、エポキシ系、セルロース系、アクリル系などのバ
インダが用いられている。これらの方法で示された導電
性ペースト組成物の硬化皮膜は、確かに室温付近では銀
イオンのマイグレーションによる短絡不良を低下させる
効果がみられた。しかしながら、これらの有機バインダ
は、耐熱性が低いため、高温高湿の条件下、例えば、1
21℃12気圧でのプレッシャークシカーテストのよう
な条件下では、かなりの銀イオンが導電性ペースト硬化
皮膜外へ流出するのが観察され、マイグレーションによ
る短絡が生ずる問題点があった。JP-A-55-149356, JP-A No. 54-146450, JP-A No. 53-35739, JP-A No. 56-62
The conductive paste composition disclosed in Japanese Patent No. 858 uses conventionally known phenolic, epoxy, cellulose, acrylic, and other binders as organic binders. The cured films of the conductive paste compositions produced by these methods were indeed effective in reducing short-circuit defects caused by silver ion migration at around room temperature. However, these organic binders have low heat resistance and cannot be used under high temperature and high humidity conditions, e.g.
Under conditions such as a pressure comb test at 21° C. and 12 atm, it was observed that a considerable amount of silver ions leaked out of the cured conductive paste film, resulting in a short circuit due to migration.
本発明は、高温高湿下においても、マイグレーションに
よる短絡不良を防止できる導電性ペースト組成物を提供
するものである。The present invention provides a conductive paste composition that can prevent short circuit failures due to migration even under high temperature and high humidity conditions.
本発明は、耐熱性熱可塑性樹脂100重量部、該樹脂を
溶解可能な溶剤300〜5500重量部及び導電性充填
剤とイオン吸着能を有する金属酸化物とからなる無機物
充填剤350〜3500重量部を含有してなる導電性ペ
ースト組成物に関する。The present invention comprises 100 parts by weight of a heat-resistant thermoplastic resin, 300 to 5,500 parts by weight of a solvent capable of dissolving the resin, and 350 to 3,500 parts by weight of an inorganic filler consisting of a conductive filler and a metal oxide having ion adsorption ability. The present invention relates to a conductive paste composition containing the following.
本発明に用いられる耐熱性熱可塑性樹脂は、ガラス転移
点が150″C以上であるものが好ましい。The heat-resistant thermoplastic resin used in the present invention preferably has a glass transition point of 150''C or higher.
ガラス転移点が低すぎると、プレッシャータンカーテス
)・条件(121℃12気圧)下で被膜強度が低下する
ため、導電性ペースト被膜より銀イオンの流出が観察さ
れるようになる。ガラス転移点は、180℃以上である
のがより好ましい。If the glass transition point is too low, the strength of the coating will decrease under pressure tanker conditions (121° C., 12 atm), and silver ions will be observed to flow out of the conductive paste coating. The glass transition point is more preferably 180°C or higher.
本発明に用いられる耐熱性熱可塑性樹脂としては、芳香
族ポリアミド、芳香族ポリアミドイミド、芳香族ポリエ
ステルイミド、ポリイミド、芳香族ポリエステル及び芳
香族ポリエーテルからなる群から選ばれる少なくとも1
種を使用することが好ましい。The heat-resistant thermoplastic resin used in the present invention is at least one selected from the group consisting of aromatic polyamide, aromatic polyamideimide, aromatic polyesterimide, polyimide, aromatic polyester, and aromatic polyether.
Preferably, seeds are used.
上に列挙した耐熱性熱可塑性樹脂の好ましい具体例を(
a)〜(h)として示す。Preferred specific examples of the heat-resistant thermoplastic resins listed above are (
Shown as a) to (h).
(a)−数式(1)
(式中、R1、R2、R3及びR4は水素、低級アルキ
ル基、低級アルコキシ基又はハロゲン原子を表し、これ
らは同一でも異なっていてもよく、Xはo−−s−−c
−−so□−
R6及びR6は、水素、低級アルキル基、トリフルオロ
メチル基又はフェニル基を示し、これらは同一でも異な
っていてもよく、Arは、m−フェニレン基、p−フェ
ニレン基、ジフェニレンエテル基又はジフェニレンスル
ホン基を表す)で表される繰り返し単位を有し、芳香族
ポリアミド樹脂の1種である芳香族ポリエーテルアミド
樹脂。(a) - Formula (1) (In the formula, R1, R2, R3 and R4 represent hydrogen, a lower alkyl group, a lower alkoxy group or a halogen atom, which may be the same or different, and X is o-- s--c
--so□- R6 and R6 represent hydrogen, a lower alkyl group, a trifluoromethyl group, or a phenyl group, and these may be the same or different, and Ar represents a m-phenylene group, a p-phenylene group, a di- An aromatic polyetheramide resin, which is a type of aromatic polyamide resin and has a repeating unit represented by a phenylene ether group or a diphenylene sulfone group.
ここで、上記−数式(1)におけるR3、R2、R3及
びR4が水素であって、XにおけるR5及びR6が水素
又は低級アルキル基である場合は、Arは、その70モ
ル%以上がm−フェニレン基であることが好ましい。m
−フェニレン基の割合が70モル%未満では、前記エー
テル化合物に不溶性になりやすい。Arは、その90モ
ル%以上がm−フェニレン基であるのが好ましく、10
0モル%Mがm−フェニレン基であることがより好まし
い。Here, when R3, R2, R3 and R4 in the above-mentioned formula (1) are hydrogen, and R5 and R6 in X are hydrogen or a lower alkyl group, 70 mol% or more of Ar is m- A phenylene group is preferred. m
- If the proportion of phenylene groups is less than 70 mol %, it tends to become insoluble in the ether compound. It is preferable that 90 mol% or more of Ar is m-phenylene group, and 10
More preferably, 0 mol % M is m-phenylene group.
上記芳香族ポリエーテルアミド樹脂は、既に公知の樹脂
であり、例えば、−数式(A)(式中、R,、R,、R
3、R1及びXは前記−数式(1)におけると同意義で
ある)で表される芳香族ジアミンと芳香族ジカルボン酸
又はその誘導体を溶液重合法、特開昭52−23198
号公報に開示されている方法等により反応させることに
より得ることができる。The above-mentioned aromatic polyetheramide resin is a known resin, for example, - formula (A) (wherein R,, R,, R
3, R1 and
It can be obtained by reaction according to the method disclosed in the above publication.
上記の芳香族ジアミンとしては、例えば2,2−ヒス(
4−(4−アミノフェノキシ)フェニル〕プロパン、ビ
ス(4−(4−アミノフェノキシ)フェニル〕メタン、
2,2−ビス〔3,5−ジメチル−4−(4−アミノフ
ェノキシ)フェニル〕プロパン、2.2−ビス〔3−メ
チル−4−(4−アミノフェノキシ)フェニル〕プロパ
ン、22−ビス〔3,5−ジブロモ−4−(4−アミノ
フェノキシ)フェニル〕プロパン、22−ビス(1−(
4−アミノフェノキシ)フェニル〕−11、l、3,3
.3−へキサフルオロプロパンなどがあり、これらの1
種以上を用いることができる。As the aromatic diamine mentioned above, for example, 2,2-his(
4-(4-aminophenoxy)phenyl]propane, bis(4-(4-aminophenoxy)phenyl)methane,
2,2-bis[3,5-dimethyl-4-(4-aminophenoxy)phenyl]propane, 2,2-bis[3-methyl-4-(4-aminophenoxy)phenyl]propane, 22-bis[ 3,5-dibromo-4-(4-aminophenoxy)phenyl]propane, 22-bis(1-(
4-aminophenoxy)phenyl]-11,l,3,3
.. 3-hexafluoropropane, etc., and these 1
More than one species can be used.
また、芳香族ジカルボン酸又はその誘導体としては、例
えば、テレフタル酸、イソフタル酸、ジフェニレンエー
テルジカルボン酸、ジフェニルスルホンジカルボン酸な
ど又はこれらのシバライドがある。Examples of aromatic dicarboxylic acids or derivatives thereof include terephthalic acid, isophthalic acid, diphenylene ether dicarboxylic acid, diphenylsulfone dicarboxylic acid, and cybalides thereof.
ただし、上記−数式(1)におけるR3、R2、R3及
びR4が水素であって、XにおけるR5及びR6が水素
又は低級アルキル基である場合は、芳香族ジカルボン酸
又はその誘導体としては、イソフタル酸及び/又はイソ
フタル酸のシバライドを70モル%以上用いることが好
ましい。90モル%以上用いることがより好ましい。1
00モル%用いることが特に好ましい。他の芳香族ジカ
ルボン酸或いはその誘導体としては、テレフタル酸、ジ
フェニルエーテルジカルボン酸、ジフェニルスルホンジ
カルボン酸あるいはこれらのシバライド等が用いられる
。However, when R3, R2, R3 and R4 in the above formula (1) are hydrogen and R5 and R6 in X are hydrogen or a lower alkyl group, the aromatic dicarboxylic acid or its derivative is isophthalic acid. It is preferable to use cybaride of isophthalic acid in an amount of 70 mol% or more. It is more preferable to use 90 mol% or more. 1
It is particularly preferable to use 00 mol%. As other aromatic dicarboxylic acids or derivatives thereof, terephthalic acid, diphenyl ether dicarboxylic acid, diphenylsulfone dicarboxylic acid, or their civalides are used.
また、上記芳香族ポリエーテルアミド樹脂の合成に当り
、ジアミン成分として、上記した芳香族ジアミン以外に
、m−フェニレンジアミン、pフェニレンジアミン等の
他の芳香族ジアミン、2ヘキサメチレンジアミン等の脂
肪族ジアミン、シリコンジアミンを本発明の目的を阻害
しない程度に使用してもよい。In addition, in the synthesis of the aromatic polyetheramide resin, in addition to the above-mentioned aromatic diamines, other aromatic diamines such as m-phenylene diamine and p-phenylene diamine, and aliphatic diamines such as 2-hexamethylene diamine are used as diamine components. Diamines and silicon diamines may be used to the extent that they do not impede the purpose of the present invention.
上記シリコンジアミンとしては、例えば−数式(式中R
は二価の炭化水素基であり、R1及びR2は一価の炭化
水素基を表し、それぞれ同一でも異なっていてもよく、
pは1以上の整数である)で表される化合物等がある。As the silicon diamine, for example, - formula (in the formula R
is a divalent hydrocarbon group, R1 and R2 represent a monovalent hydrocarbon group, and may be the same or different,
p is an integer of 1 or more).
Rは炭素数1〜5のアルキレン基、フェニレン基又はア
ルギル置換フェニレン基であることが好ましく、R1及
びRZは炭素数1〜5のアルキル基、フェニル基又はア
ルキル置換フェニル基であることが好ましい。具体的に
は、下記の化合物が挙げられる:
H3
H2N (CH2)3 St 0H3
CH。R is preferably an alkylene group having 1 to 5 carbon atoms, a phenylene group, or an argyl-substituted phenylene group, and R1 and RZ are preferably an alkyl group having 1 to 5 carbon atoms, a phenyl group, or an alkyl-substituted phenyl group. Specifically, the following compounds may be mentioned: H3 H2N (CH2)3 St 0H3 CH.
CH。CH.
Si (CHz)s Nl2 CH3 CH。Si (CHz)s Nl2 CH3 CH.
H2N (CH2)−Si OSi (CHz)
4 NHzCH3CH:+
Cb H5
HEN (CH2)3 Si−〇
Cb Hs
6H5
Si (CHz:h NH□
bH5
CH,CHz CH3
H2N (CH2)3 Si OSi OSi
(CH□)3−NH2CH,CHs CHl
一16=
(b)−数式(n)
肪族ジアミン、前記と同様のシリコンジアミンを本発明
の目的を阻害しない程度に使用してもよい。H2N (CH2)-Si OSi (CHz)
4 NHzCH3CH:+ Cb H5 HEN (CH2)3 Si-〇Cb Hs 6H5 Si (CHz:h NH□ bH5 CH, CHz CH3 H2N (CH2)3 Si OSi OSi
(CH□)3-NH2CH, CHs CHl-16= (b)-Formula (n) Aliphatic diamines and silicone diamines similar to those described above may be used to the extent that they do not impede the object of the present invention.
(c)−数式(III)
(式中、R1,R2、R3、R4及びχは、−数式(T
)におけると同意義である)で示される繰り返し単位を
有する芳香族ポリエーテルアミドイミド樹脂。(c) - Formula (III) (wherein, R1, R2, R3, R4 and χ are - Formula (T
) An aromatic polyetheramide-imide resin having a repeating unit represented by ).
この樹脂は、既に公知の樹脂であり、例えば、前記−数
式(A)で表される芳香族ジアミン等の芳香族ジアミン
と無水トリメリット酸又はそのモノクロライド等の誘導
体を、例えば特公昭4215637号、同49−407
7号及び同408910号公報に示される溶液重縮合法
、酸クロ法、直接重縮合法、溶融重縮合法等により合成
することができる。ジアミン成分としては、−数式(A
)で表されるものなど以外、m−フェニレンジアミン、
p−フェニレンジアミンなどの他の芳香族ジアミン、ヘ
キサメチレンジアミンなどの脂(式中、R1′及びR3
1は低級アルキル基であり、これらは同一でも異なって
いてもよく、R2’ は低級アルキル基又はハロゲン原
子を示し、m、m及びm″はそれぞれ、RI’ 、R2
′及びR%の置換基数を示し、0〜4の整数であって、
rn、m及びm″がそれぞれ2以上である場合、複数個
のR+’ 、R2’及びR31はそれぞれ同一でも異な
R4′
2個のX′は同一でも異なっていてもよく、ここでRa
’及びR,lは、水素、低級アルキル基、トリフルオロ
メチル基又はフェニル基を示し、これ=17
らは同一であっても、異なっていてもよい)で表される
繰り返し単位を有する芳香族ポリアミドイミド樹脂。This resin is already a known resin, and for example, an aromatic diamine such as the aromatic diamine represented by the above-mentioned formula (A) and a derivative such as trimellitic anhydride or its monochloride are used, for example, in Japanese Patent Publication No. 4215637. , 49-407
It can be synthesized by a solution polycondensation method, an acid chloromethane method, a direct polycondensation method, a melt polycondensation method, etc. shown in No. 7 and No. 408910. As the diamine component, - formula (A
), m-phenylenediamine,
Other aromatic diamines such as p-phenylene diamine, fats such as hexamethylene diamine (wherein R1' and R3
1 is a lower alkyl group, which may be the same or different, R2' represents a lower alkyl group or a halogen atom, and m, m and m'' are RI' and R2, respectively.
' and represents the number of substituents in R%, an integer from 0 to 4,
When rn, m and m'' are each 2 or more, the plurality of R+', R2' and R31 may be the same or different R4', and the two X' may be the same or different, where Ra
' and R and l represent hydrogen, a lower alkyl group, a trifluoromethyl group, or a phenyl group, and these = 17 may be the same or different). Polyamideimide resin.
この樹脂は、既に公知の樹脂であり、例えば、−数式(
B)
(ただし、式中、m、m’、m 、RI’、R2’R
、l及びX′は一般式(III)におけると同意義であ
る)で表される芳香族ジアミンと無水トリメリノ]・酸
又はそのモノクロリド等の誘導体を前記(b)の合成法
と同様な方法で合成することができる。This resin is a well-known resin, for example, - formula (
B) (However, in the formula, m, m', m, RI', R2'R
, l and X' have the same meanings as in general formula (III)) and a derivative such as trimerino anhydride or its monochloride by the same method as the synthesis method in (b) above. It can be synthesized with
上記−数式(B)で表される芳香族ジアミンとしては、
例えば、1.3−ビス(3−アミノフェノキシ)ベンゼ
ン、1.3−ビス(4−アミノフェノキシ)ベンゼン、
1.4−ビス(4−アミノフェノキシ)ベンゼン、4.
.1’−(1,3−フェニレンビス(1〜メチルエヂリ
デン)〕ビスアニリン、4.4’ −(1,4−フェニ
レンビス(1メチルエチリデン)〕ビスアニリン、3,
3′C1,,3−フェニレンビス(1−メチルエチリデ
ン)〕ビスアニリンなどがある。また、前記(b)と同
様に、他の芳香族ジアミン及び/又は脂肪族ジアミン、
シリコンジアミンをジアミン成分よして本発明の目的を
阻害しない程度に使用することができる。As the aromatic diamine represented by the above formula (B),
For example, 1.3-bis(3-aminophenoxy)benzene, 1.3-bis(4-aminophenoxy)benzene,
1.4-bis(4-aminophenoxy)benzene, 4.
.. 1'-(1,3-phenylenebis(1-methylethylidene))]bisaniline, 4.4'-(1,4-phenylenebis(1-methylethylidene))bisaniline, 3,
Examples include 3'C1,,3-phenylenebis(1-methylethylidene)]bisaniline. In addition, as in (b) above, other aromatic diamines and/or aliphatic diamines,
Silicon diamine can be used as a diamine component to the extent that the object of the present invention is not impaired.
(d)−数式(IV)
(式中、R1″、R2″、R,”及びR4″は低級アル
キル基、低級アルコキシ基又はハロゲン原子を示し、こ
れらは同一でも異なっていてもよく、Xは一般式(1)
におけると同意義である)で表される繰り返し単位を有
する芳香族ポリアミドイミド樹脂。(d) - Formula (IV) (wherein R1'', R2'', R,'' and R4'' represent a lower alkyl group, a lower alkoxy group, or a halogen atom, which may be the same or different, and X is General formula (1)
An aromatic polyamide-imide resin having a repeating unit represented by (same meaning as in).
この樹脂は、既に公知の樹脂であり、例えば、一般式(
C)
(式中、R1″、R2″、R3″、R4″及びXは一般
式(IV)におけると同意義である)で表される芳香族
ジアミンと無水トリメリント酸又はそのモノクロリド等
の誘導体を前記(b)の合成法と同様な方法で合成する
ことができる。This resin is already a known resin, for example, the general formula (
C) aromatic diamine represented by (wherein R1'', R2'', R3'', R4'' and X have the same meanings as in general formula (IV)) and derivatives such as trimellitic anhydride or its monochloride can be synthesized by the same method as the synthesis method (b) above.
上記−数式(C)で表される芳香族ジアミンとしては、
例えば、4,4′−ジアミノ−3,3′5.5′−テト
ラメチルジフェニルメタン、4゜4′−ジアミノ−3,
3’ 5.5’ −テトラメチルジフェニルメタン、
4,4′−ジアミノ−3゜3’ 5.5’ −テトラ
メチルジフェニルエーテル、4.4゛−ジアミノ−3,
3’ 5.5’ −テトラエチルジフェニルエーテル
、2.2− (4,4ジアミノ−3,3’ 5.5’
−テトラメチルジフェニル〕プロパンなどがある。ま
た、前記(b)と同様に他の芳香族ジアミン及び/又は
脂肪族ジアミン、シリコンジアミンを本発明の目的を阻
害しない範囲でジアミン成分として併用することができ
る。As the aromatic diamine represented by the above-mentioned formula (C),
For example, 4,4'-diamino-3,3'5,5'-tetramethyldiphenylmethane, 4°4'-diamino-3,
3'5.5'-tetramethyldiphenylmethane,
4,4′-diamino-3゜3′ 5.5′-tetramethyldiphenyl ether, 4.4′-diamino-3,
3'5,5' -tetraethyl diphenyl ether, 2,2- (4,4 diamino-3,3'5,5'
-tetramethyldiphenyl]propane, etc. Further, as in (b) above, other aromatic diamines, aliphatic diamines, and silicone diamines can be used in combination as diamine components within the range that does not impede the object of the present invention.
(e)−数式(V)
(式中、R、rrr、R、III、R、rrr、R、J
JT及びxは一般式(]I)におけると同意義であり、
R、”’、R、IIIR3’及びR、”’は、R1,R
2、R3及びR4と同様の基であり、X″はχと同様の
基であって、R1、R2、R3、R4、R、”’、R2
#l、R3#l及びRイ″′は同一でも異なっていても
よく、X及びX″は同一でも異なっていてもよい)で表
される繰り返し単位を有する芳香族ポリエーテルエステ
ルイミド樹脂。(e) - Formula (V) (wherein, R, rrr, R, III, R, rrr, R, J
JT and x have the same meanings as in general formula (]I),
R, "', R, IIIR3' and R, "' are R1,R
2, is a group similar to R3 and R4, and X″ is a group similar to χ, R1, R2, R3, R4, R, “’, R2
An aromatic polyether ester imide resin having a repeating unit represented by #l, R3, #l and R''' may be the same or different, and X and X'' may be the same or different.
この樹脂は、既に公知の樹脂であり、例えば、一般代(
A)で表される芳香族ジアミンなどの芳香族シアミンと
一般式(I))
ソトキジフェニル)ケトンニ無水物などがある。This resin is already a well-known resin, for example, a general resin (
Examples include aromatic cyamines such as aromatic diamines represented by A) and sotokydiphenyl)ketone dianhydrides of the general formula (I).
なお、ジアミン成分としては、前記(a)に記載した他
の芳香族ジアミン、脂肪族ジアミン、シリコンジアミン
を本発明の目的を阻害しない程度に併用することができ
る。In addition, as the diamine component, other aromatic diamines, aliphatic diamines, and silicone diamines described in the above (a) can be used in combination to the extent that the object of the present invention is not impaired.
(f)−数式(Vl)
o
(D) 0(式中、R,”’、R2”’、R3”
’、Ra ’及びx”は、−数式(V)におけると同意
義である)で表される芳香族テトラカルボン酸二無水物
を特開昭6049030号公報に示される溶液重縮合法
により合成することができる。−数式(T〕)で表され
る芳香族テトラカルボン酸二無水物としては、例えば、
2.2−ビス(p−トリメリットキシフェニル)プロパ
ンニ無水物、2.2−ビス(p−hリメリソトキシー3
5−ジメチルフェニル)プロパンニ無水物、ビス(p−
トリメリットキシフェニル)スルポンニ無水物、ビス(
p−1−リメリ(式中、X″′は芳香族ジアミンのアミ
ノ基を除いた2価の残基を示し、Yは脂肪族又は脂環式
テトラカルボン酸のカルボキシル基を除いた4価の残基
を示す)で表される繰り返し単位を有するポリイミド樹
脂。(f) - Formula (Vl) o
(D) 0 (in the formula, R, "', R2"', R3"
', Ra' and x'' have the same meanings as in formula (V)) are synthesized by the solution polycondensation method disclosed in JP-A-6049030. - As the aromatic tetracarboxylic dianhydride represented by the formula (T), for example,
2.2-bis(p-trimeritoxyphenyl)propanihydride, 2.2-bis(p-trimerisotoxyphenyl) 3
5-dimethylphenyl)propanihydride, bis(p-
Trimeroxyphenyl) sulponi anhydride, bis(
p-1-rimeri (wherein, A polyimide resin having a repeating unit represented by (representing a residue).
このポリイミド樹脂は、既に公知の樹脂であって、例え
ば、脂肪族テトラカルボン酸二無水物又は脂環式テトラ
カルボン酸二無水物と芳香族ジアミンを特開昭60−4
9030号公報に示される溶液重縮合法により合成する
ことができる。This polyimide resin is already a known resin, and for example, an aliphatic tetracarboxylic dianhydride or an alicyclic tetracarboxylic dianhydride and an aromatic diamine are used in JP-A-60-4.
It can be synthesized by the solution polycondensation method shown in Japanese Patent No. 9030.
脂肪族テトラカルボン酸二無水物としては、例えば、ブ
タンテトラカルボン酸二無水物を挙げることができる。Examples of the aliphatic tetracarboxylic dianhydride include butane tetracarboxylic dianhydride.
脂環式テトラカルボン酸二無水物としては、例えば、シ
クロブタンテトラカルボン酸二無水物、シクロペンテン
テトラカルボン酸二無水物、5.5′−チオビス(ノル
ボルナン−23−ジカルボン酸無水物)、5.5’ −
メチレンジチオビス(ノルボルナン−2,3−ジカルボ
ン酸無水物)、5.5’ −エチレンジチオビス(ノル
ボルナン−2,3−ジカルボン酸無水物)、55゛−プ
ロピレンジチオビス(ノルボルナン−23−ジカルボン
酸無水物L5,5’ −スルホニルビス(ノルボルナン
−2,3−ジカルボン酸無水tl)、5,5′−メチレ
ンジスルホニルビス(ノルボルナン−2,3−ジカルボ
ン酸無水物)、5゜5′−エチレンジスルホニルビス(
ノルボルナン2.3−ジカルボン酸無水物)、5.5’
−プロピレンジスルホニルビス(ノルボルナン−23
−ジカルボン酸無水物)、3.5.6−)ジカルボキシ
−2−カルボキシメヂルノルボルナン2:35:6二無
水物、2.3.5−トリカルボキシシクロペンチル酢酸
無水物などがある。芳香族ジアミンとしては、例えば、
ジアミノジフェニルエーテル、ジアミノジフェニルメタ
ン、ジアミノジフェニルスルホン、2.2−ジアミノジ
フェニルプロパン、ジアミノベンゾフェノン、1.3ビ
ス(4−アミノフェノキシ)ベンゼン、13−ビス(3
−アミノフェノキシ)ベンゼン、14−ビス(4−アミ
ノフェノキシ)ベンゼン、4゜4′−ジ(4−アミノフ
ェノキシ)ジフェニルスルボン、22′−ビス(4−(
4−アミノフェノキシ)フェニル〕プロパン、2.2′
−ビス(4−(4−アミノフェノキシ)フェニル〕−1
゜1.1,3,3.3−ヘキサフルオロプロパンなどが
ある。なお、ジアミン成分としては、前記(a)に記載
した他の脂肪族ジアミン、シリコンジアミンを本発明の
目的を阻害しない程度に併用することができる。Examples of the alicyclic tetracarboxylic dianhydride include cyclobutanetetracarboxylic dianhydride, cyclopententetracarboxylic dianhydride, 5.5′-thiobis(norbornane-23-dicarboxylic anhydride), 5.5 ' −
Methylene dithiobis (norbornane-2,3-dicarboxylic anhydride), 5,5'-ethylene dithiobis (norbornane-2,3-dicarboxylic anhydride), 55'-propylene dithiobis (norbornane-23-dicarboxylic acid) Anhydride L5,5'-sulfonyl bis(norbornane-2,3-dicarboxylic anhydride tl), 5,5'-methylenedisulfonyl bis(norbornane-2,3-dicarboxylic anhydride), 5゜5'-ethylene Disulfonylbis(
norbornane 2,3-dicarboxylic anhydride), 5.5'
-Propylene disulfonyl bis(norbornane-23)
-dicarboxylic acid anhydride), 3.5.6-) dicarboxy-2-carboxymethylnorbornane 2:35:6 dianhydride, and 2.3.5-tricarboxycyclopentyl acetic anhydride. Examples of aromatic diamines include:
Diaminodiphenyl ether, diaminodiphenylmethane, diaminodiphenylsulfone, 2.2-diaminodiphenylpropane, diaminobenzophenone, 1.3bis(4-aminophenoxy)benzene, 13-bis(3
-aminophenoxy)benzene, 14-bis(4-aminophenoxy)benzene, 4°4'-di(4-aminophenoxy)diphenylsulfone, 22'-bis(4-(
4-aminophenoxy)phenyl]propane, 2.2'
-bis(4-(4-aminophenoxy)phenyl)-1
゜1.1,3,3.3-hexafluoropropane, etc. In addition, as the diamine component, other aliphatic diamines and silicone diamines described in the above (a) can be used in combination to the extent that the object of the present invention is not impaired.
(g)−数式(■)
(式中、R1、R2、R8、R4及びXは、−数式(1
)におけると同意義であり、Ar”はp−フェニレン基
、m−フェニレン基、ジフェニレンエーテル基又はジフ
ェニレンスルホン基を示す)で表される繰り返し単位を
有する芳香族ポリエステル樹脂。(g) - Formula (■) (In the formula, R1, R2, R8, R4 and X are - Formula (1
), wherein Ar'' represents a p-phenylene group, m-phenylene group, diphenylene ether group or diphenylene sulfone group).
この芳香族ポリエステル樹脂は、既に公知の樹脂であっ
て、例えば、−数式(E)
(式中、R,、R,、R3、R4及びXは一般式(■)
におけると同意義である)で示される芳香族ジオールと
芳香族ジカルボン酸シバライドを、例えば特開昭48−
51094号公報、特開昭59187022号公報等に
示されている界面重縮合法や相間移動触媒を用いる方法
によって合成される。This aromatic polyester resin is already a well-known resin, for example - formula (E) (wherein R,, R,, R3, R4 and X are general formula (■)
For example, aromatic diols and aromatic dicarboxylic acid sybarides represented by
It is synthesized by an interfacial polycondensation method or a method using a phase transfer catalyst as disclosed in JP-A-51094, JP-A-59187022, and the like.
ここで、−数式(E)で示される芳香族ジオールとして
は、例えば4,4′−ジヒドロキシ−3゜3’ 、5.
5’−テトラメチルフェニル−2,2プロパン、44′
−ジヒドロキジー3.3′55′−テトラメチルジフェ
ニルメタン、4゜4′−ジヒドロキシ−33’、5.5
’ −テトラメチルベンゾフェノンなどがある。芳香族
ジカルボン酸シバライドとしては、例えば、テレフタル
酸ジクロライド、イソフクル酸ジクロライド、ジフェニ
ルエーテルジカルボン酸ジクロライド、ジフェニルスル
ホンジカルボン酸ジクロライドなどがある。Here, the aromatic diol represented by formula (E) is, for example, 4,4'-dihydroxy-3°3', 5.
5'-tetramethylphenyl-2,2propane, 44'
-dihydroxy-3.3'55'-tetramethyldiphenylmethane, 4°4'-dihydroxy-33', 5.5
'-Tetramethylbenzophenone, etc. Examples of the aromatic dicarboxylic acid civalide include terephthalic acid dichloride, isofucric acid dichloride, diphenyl ether dicarboxylic acid dichloride, and diphenylsulfone dicarboxylic acid dichloride.
(h)−数式(■)
(式中、R1、R2、R3、R4、R+ ” 、R2”
、R3” 、Ra” 、X及びX I+は一般式(V)
におけると同意義である)で表される繰り返し単位を有
する芳香族ポリエーテル樹脂。(h) - Numerical formula (■) (In the formula, R1, R2, R3, R4, R+ ", R2"
, R3'', Ra'', X and X I+ are general formula (V)
An aromatic polyether resin having a repeating unit represented by (same meaning as in).
この芳香族ポリエーテル樹脂は、既に公知の樹脂であっ
て、例えば、−数式(F)
(式中、Xは上記と同じものを示し、X rrrrは塩
素、臭素、フッ素などのハロゲンを示す)で表される芳
香族シバライドと一般式(G)
(式中、Rl ″、RZ” 、R’3”、R4″及びχ
″は一般式(■)におけると同意義である)で表される
芳香族ジオールのアルカリ金属塩を、例えば、アール・
エヌ・ジョンソン(R,N、 Johnson)らによ
るジャーナル・オブ・ポリマー・サイエンス(J。This aromatic polyether resin is already a well-known resin, and has the following formula: Aromatic cibaride represented by the general formula (G) (wherein Rl'', RZ'', R'3'', R4'' and χ
″ has the same meaning as in the general formula (■)).
Journal of Polymer Science (J. R.N. Johnson) et al.
Polym、 Sci、)パートA−1(Part A
−1)第5巻第2375頁(1967年)に示される
溶液重縮合法により反応させて得られる。ここに、上記
−数式(F)で示される芳香族シバライドとしては、例
えば4.4′−ジクロルジフェニルスルホン、44′−
ジフルオロジフェニルスルホン、4.4′−ジクロルジ
フェニルスルフィン、4゜4′−ジフルオロジフェニル
スルフィン、4.4’ジクロルジフエニルケトン、4.
4′−ジフルオロジフェニルケトンなどがあり、これら
の1種以上が用いられ、特に4,4′−ジクロルジフェ
ニルスルホンが好ましく用いられる。Polym, Sci,) Part A-1 (Part A
-1) Obtained by reaction using the solution polycondensation method shown in Vol. 5, p. 2375 (1967). Here, as the aromatic cybaride represented by the above-mentioned formula (F), for example, 4,4'-dichlorodiphenylsulfone, 44'-
Difluorodiphenylsulfone, 4.4'-dichlorodiphenylsulfine, 4°4'-difluorodiphenylsulfine, 4.4'dichlorodiphenylketone, 4.
There are 4'-difluorodiphenyl ketones, and one or more of these are used, and 4,4'-dichlorodiphenyl sulfone is particularly preferably used.
−数式(G)で表される芳香族ジオールとしては、例え
ば4.4′−ジヒドロキシジフェニル2.2−プロパン
、4,4′−ジヒドロキシジフェニルメタン、4.4′
−ジヒドロキシジフェニルスルホン、4.4’ −ジヒ
ドロキシベンゾフェノン、44′−ジヒドロキシジフェ
ニルエタン、44′−ジヒドロキシジフェニルシクロヘ
キサン、4,4′−ジヒドロキシジフェニル−2,2′
ブタン、4,4′−ジヒドロキシ−3,3′5.5′−
テトラメチルビフェニル、4,4′ジヒドロキシ−3,
3’ 、5.5’ −テトラメチルジフェニル−2,2
−プロパン、4,4′−ジヒドロキシ−3,3’ 、5
.5’ −テトラメチルジフェニルメタン、4.4′−
ジヒドロキシ−3゜3’ 、5.5’ −テトラメチル
ジフェニルスルホンなどがあげられ、これらの1種以上
が用いられ、特に、4.4′−ジヒドロキシジフェニル
−2゜2−プロパン、4.4′−ジヒドロキシ−3゜3
’ 、5.5’ −テトラメチルジフェニル−2゜2−
プロパンが好ましく用いられる。アルカリ金属塩のアル
カリ金属としては、Li、Na、になどが用いられる。- Examples of aromatic diols represented by formula (G) include 4,4'-dihydroxydiphenyl 2,2-propane, 4,4'-dihydroxydiphenylmethane, 4,4'
-dihydroxydiphenylsulfone, 4,4'-dihydroxybenzophenone, 44'-dihydroxydiphenylethane, 44'-dihydroxydiphenylcyclohexane, 4,4'-dihydroxydiphenyl-2,2'
Butane, 4,4'-dihydroxy-3,3'5,5'-
Tetramethylbiphenyl, 4,4'dihydroxy-3,
3',5,5'-tetramethyldiphenyl-2,2
-propane, 4,4'-dihydroxy-3,3', 5
.. 5'-tetramethyldiphenylmethane, 4.4'-
Examples include dihydroxy-3゜3', 5.5'-tetramethyldiphenylsulfone, and one or more of these are used, particularly 4,4'-dihydroxydiphenyl-2゜2-propane, 4.4'-tetramethyldiphenylsulfone, etc. -dihydroxy-3゜3
',5.5'-tetramethyldiphenyl-2゜2-
Propane is preferably used. As the alkali metal of the alkali metal salt, Li, Na, Ni, etc. are used.
以上に例示した樹脂の他、前記−数式(1)〜(■)の
繰り返し単位を分子中に2種以上有する樹脂を使用する
ことができる。In addition to the resins exemplified above, resins having two or more types of repeating units of formulas (1) to (■) above in the molecule can be used.
以上に例示した(a)〜(h)の耐熱性熱可塑性樹脂は
、還元粘度(0,2g/d1ジメチルホルムアミド溶液
として30℃で測定)が、0.2〜4.Oa/gのもの
が好ましく、0.2〜3. Oa/ gのものがより好
ましく、0.2〜2dl/gのものが特に好ましい。The heat-resistant thermoplastic resins (a) to (h) exemplified above have a reduced viscosity (measured as a 0.2 g/d1 dimethylformamide solution at 30°C) of 0.2 to 4. Oa/g is preferable, and 0.2 to 3. Oa/g is more preferable, and 0.2 to 2 dl/g is particularly preferable.
本発明に用いられる溶剤としては、特に制限はないが、
各種の線状あるいは環状エーテルが好ましい。線状ある
いは環状エーテルとしては、例えば、ジエチレングリコ
ールジメチルエーテル、ジオキサン、テトラヒドロフラ
ン等が挙げられ、これらを単独又は2種以上混合して用
いることができる。There are no particular restrictions on the solvent used in the present invention, but
Various linear or cyclic ethers are preferred. Examples of linear or cyclic ethers include diethylene glycol dimethyl ether, dioxane, and tetrahydrofuran, which may be used alone or in combination of two or more.
また、本発明の導電性ペースト組成物は、導電性充填剤
とイオン吸着能を有する金属酸化物とからなる無機物充
填剤を含む。この導電性充填剤としては、銀粉が好まし
い。他方、イオン吸着能を有する金属酸化物とは、銀イ
オン吸着現象を示す金属酸化物であり、例えば、活性ア
ルミナ、酸化ジルコニウム、合成ゼオライト、五酸化バ
ナジウム、酸化第一銅、酸化第二銅などを用いることが
できる。これらの金属酸化物は、粉末の形で用いること
ができ、単独又は2種以上を任意の割合で混合したもの
でもよい。本発明に用いられる無機物充填剤は、イオン
吸着能を有する金属酸化物を5〜50重量%の範囲で含
ませることが好ましい。Further, the conductive paste composition of the present invention includes an inorganic filler consisting of a conductive filler and a metal oxide having ion adsorption ability. Silver powder is preferred as this conductive filler. On the other hand, metal oxides having ion adsorption ability are metal oxides that exhibit a silver ion adsorption phenomenon, such as activated alumina, zirconium oxide, synthetic zeolite, vanadium pentoxide, cuprous oxide, cupric oxide, etc. can be used. These metal oxides can be used in the form of powder, and may be used alone or in combination of two or more in any proportion. The inorganic filler used in the present invention preferably contains a metal oxide having an ion adsorption ability in an amount of 5 to 50% by weight.
金属酸化物が5重量%未満であると、金属酸化物による
銀マイグレーシヨン抑止効果が不充分となり、50重量
%を越えると、導電性が低下する傾向がある。If the metal oxide content is less than 5% by weight, the effect of inhibiting silver migration by the metal oxide will be insufficient, and if it exceeds 50% by weight, the electrical conductivity will tend to decrease.
以上に述べた各材料は、耐熱性熱可塑性樹脂100重量
部に対して、該樹脂を溶解可能な溶剤300〜5500
重量部及び導電性充填剤とイオン吸着能を有する金属酸
化物からなる無機物充填剤350〜3500重量部を配
合して用いられる。Each of the above-mentioned materials contains 300 to 5,500 parts of a solvent capable of dissolving the resin, per 100 parts by weight of the heat-resistant thermoplastic resin.
350 to 3,500 parts by weight of an inorganic filler made of a conductive filler and a metal oxide having ion adsorption ability are used.
溶剤が300重量部未満では、固形分の比率が高いため
、塗布面を均一の厚みに保つことが難しくなり、550
0重量部を越えると、粘度が低いため無機物充填剤の分
散が困難になる。無機物充填剤が350重量部未満であ
ると、導電性が不足し、3500重量部を越えると、塗
布が困難になる。If the solvent is less than 300 parts by weight, the solid content will be high, making it difficult to maintain a uniform thickness on the coated surface.
If it exceeds 0 parts by weight, the viscosity will be low, making it difficult to disperse the inorganic filler. If the amount of inorganic filler is less than 350 parts by weight, conductivity will be insufficient, and if it exceeds 3,500 parts by weight, coating will become difficult.
これらの配合比は使用する耐熱性熱可塑性樹脂の種類に
応じて、適宜最適な配合を選択できるが、耐熱性熱可塑
性樹脂100重量部に対して、溶剤600〜3400重
量部、無機物充填剤500〜3000重量部を使用する
のが好ましい。また、導電性充填剤の分散性を向上させ
たり、基材との密着性を向上させるために、シラン系、
チタネート系、アルミキレート系などのカップリング剤
を添加することもできる。The optimum blending ratio of these can be selected depending on the type of heat-resistant thermoplastic resin used, but it is recommended that 600 to 3,400 parts by weight of the solvent and 500 parts by weight of the inorganic filler to 100 parts by weight of the heat-resistant thermoplastic resin. Preferably, ~3000 parts by weight are used. In addition, silane-based,
Coupling agents such as titanate and aluminum chelate may also be added.
本発明の導電性ペースト組成物は、前述した各材料を公
知の方法で混合・混練して得ることができる。The conductive paste composition of the present invention can be obtained by mixing and kneading the above-mentioned materials by a known method.
本発明の導電性ペースト組成物は、電子部品の導電性接
着剤、電極材及び配線板の配線導体として有用である。The conductive paste composition of the present invention is useful as a conductive adhesive for electronic components, an electrode material, and a wiring conductor for wiring boards.
次に、実施例により本発明をさらに詳しく説明するが、
本発明はこれらに制限されるものではない。Next, the present invention will be explained in more detail with reference to Examples.
The present invention is not limited to these.
実施例1
(1)下記繰り返し単位を有する耐熱性熱可塑性樹脂の
合成例
撹拌装置、窒素導入管、温度計及び還流管を備えた四つ
目フラスコに窒素雰囲気下に2,2−ビス(1−(4−
アミノフェノキシ)フェニル〕プロパン8.2g(0,
02モル)、トリエチルアミン4.44 g(0,04
4モル)及びN−メチルピロリドン40m2を加え、溶
解する。系内を一10℃に保ち、イソフタロイルクロラ
イド4.06g(0,02モル)を溶解したシクロヘキ
サノン溶液10m1を滴下した。このとき系内の温度は
、−10〜−5℃に制御した。反応系の粘度が高くなる
ので、所望の粘度になったら撹拌を停止し、反応液を大
量のメタノールに注ぎ、ポリマーを単離し、180℃で
減圧乾燥し、耐熱性熱可塑性樹脂Aを得た。Example 1 (1) Synthesis example of heat-resistant thermoplastic resin having the following repeating unit 2,2-bis(1 -(4-
Aminophenoxy)phenyl]propane 8.2g (0,
02 mol), triethylamine 4.44 g (0.04 mol), triethylamine 4.44 g (0.04
4 mol) and 40 m2 of N-methylpyrrolidone are added and dissolved. The inside of the system was maintained at -10° C., and 10 ml of a cyclohexanone solution in which 4.06 g (0.02 mol) of isophthaloyl chloride was dissolved was added dropwise. At this time, the temperature in the system was controlled to -10 to -5°C. The viscosity of the reaction system increased, so when the desired viscosity was reached, stirring was stopped, the reaction solution was poured into a large amount of methanol, the polymer was isolated, and it was dried under reduced pressure at 180°C to obtain heat-resistant thermoplastic resin A. .
このものの還元粘度(樹脂0.2g/dジメチルホルム
アミド溶液、30 ’C)を測定したところ、0.82
d1/gであった。Tgは203℃であった。The reduced viscosity of this material (resin 0.2 g/d dimethylformamide solution, 30'C) was measured and found to be 0.82.
It was d1/g. Tg was 203°C.
(2)導電性ペースト組成物の作製
(1)で得た耐熱性熱可塑性樹脂A100重量部をジエ
チレングリコールジメチルエーテル2500重量部に溶
解させ、これに平均粒径2.9μの鱗片状銀粉(以下単
に銀粉と呼ぶ)2750重量部と平均粒径0.4μの粒
状酸化アルミニウム粉(以下単に酸化アルミニウム粉と
呼ぶ)150重量部を加えて、らいかい機中で2時間混
練して銀ペーストを作製した。(2) Preparation of conductive paste composition 100 parts by weight of the heat-resistant thermoplastic resin A obtained in (1) is dissolved in 2,500 parts by weight of diethylene glycol dimethyl ether, and scaly silver powder (hereinafter simply referred to as silver powder) with an average particle size of 2.9μ is dissolved in 2,750 parts by weight of granular aluminum oxide powder (hereinafter simply referred to as aluminum oxide powder) having an average particle size of 0.4 μm were added and kneaded for 2 hours in a milling machine to prepare a silver paste.
実施例2
(1)下記繰り返し単位を有する耐熱性熱可塑性樹脂B
の合成例
撹拌装置、窒素導入管、温度計及び還流管を備えた四つ
目フラスコに窒素雰囲気下に2,2−ビス(4−(4−
アミノフェノキシ)フェニル〕プロパン8.2g(0,
02モル)、トリエチルアミン2.22 g (0,0
22モル)及びN−メチルピロリドン50m1を加え、
溶解した。系内を一10℃に保ち、無水トリメリット酸
クロライド4.2 ]、 g(0,02モル)を加えた
。このとき、系内の温度を−10〜−5“Cに制御した
。反応系の粘度が高くなるので、所望の粘度になったら
、無水酢酸10、0 g及びピリジン5gを加え、60
℃で一昼夜撹拌を続けた。反応液を大量のメタノールに
注ぎ、ポリマーを単離し、180℃で減圧乾燥し、耐熱
性熱可塑性樹脂Bを得た。このものの還元粘度(樹脂0
.2g/aジメチルホルムアミド溶液、30”C)は0
.13dll/gであった。Tgは240℃であった。Example 2 (1) Heat-resistant thermoplastic resin B having the following repeating unit
Synthesis example of 2,2-bis(4-(4-
Aminophenoxy)phenyl]propane 8.2g (0,
02 mol), triethylamine 2.22 g (0,0
22 mol) and 50 ml of N-methylpyrrolidone,
Dissolved. The inside of the system was maintained at -10°C, and 4.2 g (0.02 mol) of trimellitic anhydride chloride was added. At this time, the temperature in the system was controlled at -10 to -5"C.The viscosity of the reaction system would be high, so when the desired viscosity was reached, 10.0 g of acetic anhydride and 5 g of pyridine were added, and 60.0 g of pyridine was added.
Stirring was continued at ℃ overnight. The reaction solution was poured into a large amount of methanol to isolate the polymer, which was dried under reduced pressure at 180°C to obtain heat-resistant thermoplastic resin B. Reduced viscosity of this material (resin 0
.. 2g/a dimethylformamide solution, 30”C) is 0
.. It was 13 dll/g. Tg was 240°C.
(2)導電性ペースト組成物の作製
(1)で得た耐熱性熱可塑性樹脂8100重量部をジオ
キサン1500重量部に溶解させ、これに銀粉840重
量部及び酸化アルミニウム粉360重量部を加えて、ら
いかい機中で2時間混練して銀ペーストを作製した。(2) Preparation of conductive paste composition 8100 parts by weight of the heat-resistant thermoplastic resin obtained in (1) is dissolved in 1500 parts by weight of dioxane, and 840 parts by weight of silver powder and 360 parts by weight of aluminum oxide powder are added thereto. A silver paste was prepared by kneading the mixture for 2 hours in a mill.
実施例3
(1)下記二種の繰り返し単位を有する耐熱性熱可塑性
樹脂Cの合成例
撹拌装置、窒素導入管、温度計及び還流管を備えた四つ
目フラスコに窒素雰囲気下に2.2−ヒ゛ス(1−(4
−アミノフェノキシ)フェニル〕プロパン8.2g(0
,02モル)、l・リエチJレアミン4.44 g (
0,044モル)及びN−メチルピロリドン50m1を
加え、溶解した。このとき、系内を10℃に保ちながら
、イソフタロイルクロライド2.03 g (0,01
モル)及び無水トリメリ・ント酸クロライド2.11
g (0,01モル)を加えた。Example 3 (1) Synthesis example of heat-resistant thermoplastic resin C having the following two types of repeating units In a fourth flask equipped with a stirring device, a nitrogen introduction tube, a thermometer, and a reflux tube, 2.2 g -Heath(1-(4)
-aminophenoxy)phenyl]propane 8.2g (0
, 02 mol), 4.44 g (
0,044 mol) and 50 ml of N-methylpyrrolidone were added and dissolved. At this time, while maintaining the inside of the system at 10°C, 2.03 g of isophthaloyl chloride (0.01
mol) and anhydrous trimellinic acid chloride 2.11
g (0.01 mol) was added.
系内の温度は−10〜−5℃に制御した。反応系の粘度
が高くなるので、所望の粘度になったら無水酢酸5.0
g、ピリジン2.5gを加えて60゛Cで一昼夜撹拌を
続けた。反応液を大量のメタノ−/l/に注ぎ、ポリマ
ーを単離し、180℃で減圧乾燥し、耐熱性熱可塑性樹
脂Cを得た。このものの還元粘度(樹脂0.2g/di
、ジメチルホルムアミド、30 ’C)は1.2社/g
であった。Tgは220℃であった。The temperature in the system was controlled at -10 to -5°C. The viscosity of the reaction system increases, so when the desired viscosity is reached, add 5.0% acetic anhydride.
g and 2.5 g of pyridine were added thereto, and stirring was continued at 60°C all day and night. The reaction solution was poured into a large amount of methanol/l/, the polymer was isolated and dried under reduced pressure at 180°C to obtain a heat-resistant thermoplastic resin C. Reduced viscosity of this material (resin 0.2g/di
, dimethylformamide, 30'C) is 1.2 companies/g
Met. Tg was 220°C.
(2)導電性ペースト組成物の作製
(1)で得た耐熱性熱可塑性樹脂0100重量部をテト
ラヒドロフラン/ジエチレングリコールジメチルエーテ
ル−4/6(重量比)の混合溶剤1500重量部に溶解
させ、これに銀粉720重量部及び酸化アルミニウム粉
480重量部を加えて、振とうを10時間、超音波分散
を10時間行い、銀ペーストを作製した。(2) Preparation of conductive paste composition 0,100 parts by weight of the heat-resistant thermoplastic resin obtained in (1) is dissolved in 1,500 parts by weight of a mixed solvent of tetrahydrofuran/diethylene glycol dimethyl ether-4/6 (weight ratio), and silver powder is dissolved in this. 720 parts by weight and 480 parts by weight of aluminum oxide powder were added, followed by shaking for 10 hours and ultrasonic dispersion for 10 hours to prepare a silver paste.
実施例4
(1)下記繰り返し単位を有する耐熱性熱可塑性樹脂り
の合成例
撹拌装置、窒素導入管及び分留頭を備えた三つロフラス
コに、ビスフェノールA5.044g(0,022モル
)、50%水酸化ナトリウム水溶液3.74 g及びト
ルエン10m1を加え、160℃に昇温し、水とトルエ
ンの共沸物を系外に留去した。ジクロルジフェニルスル
ホン6、318 g(0,022モル)とジメチルスル
ホキシド17gを加え、160℃で1時間反応させた後
、反応液を大量のメタノール中に注ぎ、ポリマーを単離
し、180℃で減圧乾燥し、耐熱性熱可塑性樹脂りを得
た。このものの還元粘度(樹脂0.2g/dg/チルホ
ルムアミド溶液、30 ’C)は0.6Id/gであっ
た。Tgは] 90 ’Cであった。Example 4 (1) Synthesis example of heat-resistant thermoplastic resin having the following repeating unit Into a three-neck flask equipped with a stirring device, a nitrogen inlet tube, and a fractionating head, 5.044 g (0,022 mol) of bisphenol A and 50 g of bisphenol A were added. % aqueous sodium hydroxide solution and 10 ml of toluene were added, the temperature was raised to 160°C, and the azeotrope of water and toluene was distilled out of the system. After adding 6,318 g (0,022 mol) of dichlorodiphenyl sulfone and 17 g of dimethyl sulfoxide and reacting at 160°C for 1 hour, the reaction solution was poured into a large amount of methanol, the polymer was isolated, and the mixture was vacuumed at 180°C. It was dried to obtain a heat-resistant thermoplastic resin. The reduced viscosity of this product (resin 0.2 g/dg/chillformamide solution, 30'C) was 0.6 Id/g. Tg was] 90'C.
(2)導電性ペースト組成物の作製
(1)で得た耐熱性熱可塑性樹脂D100重量部をジオ
キサン/ジエチレングリコールジメチルエーテル−4/
6(重量比)の混合溶剤1700重量部に溶解させ、こ
れに銀粉1500重量部及び酸化アルミニウム粉375
重量部を加え、振とうを10時間、超音波分散を10時
間行い、銀ペーストを作製した。(2) Preparation of conductive paste composition 100 parts by weight of the heat-resistant thermoplastic resin D obtained in (1) was mixed with dioxane/diethylene glycol dimethyl ether-4/
6 (weight ratio) and 1,500 parts by weight of silver powder and 375 parts by weight of aluminum oxide powder.
Parts by weight were added, followed by shaking for 10 hours and ultrasonic dispersion for 10 hours to prepare a silver paste.
実施例5
(1)下記繰り返し単位を有する耐熱性熱可塑性樹脂E
の合成例
と呼ぶ)500重量部を加え、振とうを10時間、超音
波分散を10時間行い、銀ペーストを作製した。実施例
6
(1)下記繰り返し単位を有する耐熱性熱可塑性樹脂F
の合成例
実施例2の耐熱性熱可塑性樹脂Bの合成例において、2
.2−ビス(4−(4−アミノフェノキシ)フェニル〕
プロパン8.2g(0,02モル)の代わりに1.3−
ビス(3−アミノフェノキシ)ヘンゼン5.84 g
(0,02モル)を用いる以外は同様の方法で耐熱性熱
可塑性樹脂を得た。このものの還元粘度(樹脂0.2g
/ag/チルホルムアミド溶液、30’C)は0.59
df!、7gであったaTgは192℃であった。Example 5 (1) Heat-resistant thermoplastic resin E having the following repeating unit
500 parts by weight (referred to as Synthesis Example) were added, and shaking was performed for 10 hours and ultrasonic dispersion was performed for 10 hours to prepare a silver paste. Example 6 (1) Heat-resistant thermoplastic resin F having the following repeating unit
Synthesis Example In the synthesis example of heat-resistant thermoplastic resin B of Example 2, 2
.. 2-bis(4-(4-aminophenoxy)phenyl)
1.3- instead of 8.2 g (0.02 mol) of propane
Bis(3-aminophenoxy)henzen 5.84 g
A heat-resistant thermoplastic resin was obtained in the same manner except that (0.02 mol) was used. Reduced viscosity of this material (resin 0.2g
/ag/chillformamide solution, 30'C) is 0.59
df! , 7g, and aTg was 192°C.
(2)導電性ペースト組成物の作製
(1)で得た耐熱性熱可塑性樹脂8100重量部をジオ
キサン1700重量部に溶解させ、これに銀粉2000
重量部及び平均粒径3μの粒状酸化ジルコニウム粉(以
下単に酸化ジルコニウム粉実施例2の耐熱性熱可塑性樹
脂Bの合成例において、2,2−ビスC4−C4−アミ
ノフェノキシ)フェニル〕プロパン8.2g(0,02
モル)の代わりに4.4′−ジアミノ−3,3’ 、5
.5’テトラエチルジフエニルメタン6.2g(0,0
2モル)を用いる以外は同様の方法で耐熱性熱可塑性樹
脂Fを得た。このものの還元粘度(樹脂0.2g/准ジ
メジメチルホルムアミド溶液0℃)は、0.80み7g
であり、Tgは280℃であった。(2) Preparation of conductive paste composition 8100 parts by weight of the heat-resistant thermoplastic resin obtained in (1) is dissolved in 1700 parts by weight of dioxane, and 2000 parts by weight of silver powder is dissolved in this.
Particulate zirconium oxide powder (hereinafter simply referred to as zirconium oxide powder in the synthesis example of heat-resistant thermoplastic resin B of Example 2, 2,2-bisC4-C4-aminophenoxy)phenyl]propane having a weight part and an average particle size of 3 μm.8. 2g (0,02
4,4'-diamino-3,3',5
.. 5'tetraethyldiphenylmethane 6.2g (0,0
A heat-resistant thermoplastic resin F was obtained in the same manner except that 2 mol) was used. The reduced viscosity of this material (resin 0.2 g/semi-dimedimethylformamide solution at 0°C) is 0.80 and 7 g.
and Tg was 280°C.
(2)導電性ペースト組成物の作製
(1)で得た耐熱性熱可塑性樹脂F100重量部をテト
ラヒドロフラン/ジエチレングリコールジメチルエーテ
ル−6/4(重量比)の混合溶剤1700重量部に溶解
させ、これに銀粉1050重量部及び酸化ジルコニウム
粉170重量部を加えて、らいかい機中で2時間混練し
て銀ベーストを作製した。(2) Preparation of conductive paste composition 100 parts by weight of the heat-resistant thermoplastic resin F obtained in (1) is dissolved in 1700 parts by weight of a mixed solvent of tetrahydrofuran/diethylene glycol dimethyl ether-6/4 (weight ratio), and silver powder is dissolved in this. 1,050 parts by weight of zirconium oxide powder and 170 parts by weight of zirconium oxide powder were added and kneaded for 2 hours in a mill to prepare a silver base.
実施例7
(1)下記繰り返し単位を有する耐熱性熱可塑性樹脂G
の合成例
撹拌装置、窒素導入管、温度計及び還流管を備えた四つ
ロフラスコに窒素雰囲気下に2.2−ビスC4−C4−
アミノフェノキシ)フェニル〕プロパン8.2g(0,
02モル)及びN−メチルピロリドン50mflを加え
、溶解した。室温で2.2−ビス(p −トリメリット
キシフェニル)プロパン二無水物11.52 g (0
,02モル)を添加した。Example 7 (1) Heat-resistant thermoplastic resin G having the following repeating unit
Synthesis example of 2.2-bisC4-C4- in a four-loaf flask equipped with a stirrer, a nitrogen inlet tube, a thermometer and a reflux tube under a nitrogen atmosphere.
Aminophenoxy)phenyl]propane 8.2g (0,
02 mol) and 50 mfl of N-methylpyrrolidone were added and dissolved. 11.52 g (0
, 02 mol) was added.
室温で3時間反応させ、更に190℃で6時間反応させ
た。反応液を大量のメタノールに注ぎ、ポリマーを単離
し、180℃で減圧乾燥し、耐熱性熱可塑性樹脂Gを得
た。このものの還元粘度〔樹脂0.2g/Jジメヂルホ
ルムアミド溶液、30℃〕を測定したところ、0.69
d1/gであった。Tgは214℃であった。The reaction was allowed to proceed at room temperature for 3 hours, and further at 190° C. for 6 hours. The reaction solution was poured into a large amount of methanol to isolate the polymer, which was dried under reduced pressure at 180°C to obtain heat-resistant thermoplastic resin G. The reduced viscosity of this product [resin 0.2 g/J dimedylformamide solution, 30°C] was measured and found to be 0.69.
It was d1/g. Tg was 214°C.
(2)導電性ペースト組成物の作製
(1)で得た耐熱性熱可塑性樹脂6100重量部をジエ
チレングリコールジメチルエーテル1500重量部に溶
解させ、これに銀粉2000重量部及び平均粒径5μの
粒状合成ゼオライト800重量部を加えて、振とうを1
0時間、超音波分散を10時間行い、銀ペーストを作製
した。(2) Preparation of conductive paste composition 6,100 parts by weight of the heat-resistant thermoplastic resin obtained in (1) was dissolved in 1,500 parts by weight of diethylene glycol dimethyl ether, and 2,000 parts by weight of silver powder and 800 parts by weight of granular synthetic zeolite with an average particle size of 5 μm were added to the mixture. Add weight part and shake 1
After 0 hours, ultrasonic dispersion was performed for 10 hours to produce a silver paste.
実施例8
(1)下記繰り返し単位を存する耐熱性熱可塑性樹脂H
の合成例
実施例7の耐熱性熱可塑性樹脂Gの合成例において、2
,2−ビス(4−(4−アミノフェノキシ)フェニル〕
プロパン8.2g(0,02モル)の代わりにビス(4
−(4−アミノフェノキシ)フェニル〕スルホン8.6
4g(0,02モル)を用いる以外は同様の方法で耐熱
性熱可塑性樹脂Hを得た。このものの還元粘度(樹脂0
.2g/dジメチルホルムアミド溶液、30℃)は、0
.88d1./gであった。Tgは235℃であった。Example 8 (1) Heat-resistant thermoplastic resin H containing the following repeating unit
Synthesis Example In the synthesis example of heat-resistant thermoplastic resin G of Example 7, 2
,2-bis(4-(4-aminophenoxy)phenyl)
Bis(4
-(4-aminophenoxy)phenyl]sulfone 8.6
A heat-resistant thermoplastic resin H was obtained in the same manner except that 4 g (0.02 mol) was used. Reduced viscosity of this material (resin 0
.. 2g/d dimethylformamide solution, 30°C) is 0
.. 88d1. /g. Tg was 235°C.
(2)導電性ペースト組成物の作製
(1)で得た耐熱性熱可塑性樹脂H100重量部をテト
ラヒドロフラン/ジエチレングリコールジメチルエーテ
ル−6/4(重量比)の混合溶剤1700重量部に溶解
させ、これに銀粉1800重量部及び、平均粒径1μの
粒状五酸化バナジウム粉(以下、単に五酸化バナジウム
粉と呼ぶ)200重量部を加えて、振とうを10時間、
超音波分散を10時間行い、銀ペーストを作製した。(2) Preparation of conductive paste composition 100 parts by weight of the heat-resistant thermoplastic resin H obtained in (1) was dissolved in 1700 parts by weight of a mixed solvent of tetrahydrofuran/diethylene glycol dimethyl ether-6/4 (weight ratio), and silver powder was dissolved in this. 1,800 parts by weight and 200 parts by weight of granular vanadium pentoxide powder (hereinafter simply referred to as vanadium pentoxide powder) having an average particle size of 1 μ were added, and the mixture was shaken for 10 hours.
Ultrasonic dispersion was performed for 10 hours to produce a silver paste.
実施例9
(1)下記繰り返し単位を有する耐熱性熱可塑性樹脂I
の合成例
撹拌装置及び還流管を備えた三つロフラスコに4.4′
−ジヒドロキシフェニル−2,2−ブタン1.2.1
g (0,05モル)、相間移動触媒としてテトラブチ
ルアンモニウムクロライド0.3gを入れ、5%水酸化
ナトリウム水溶液100gを加えて溶解した。次に、テ
レフタ口イルクロライド5.08 g (0,025モ
ル)とイソフタロイルクロライド5.08g(0,02
5モル)を溶解した塩化メチレン溶液100mβを強力
に撹拌した系内に加えた。室温で更に1時間反応させ、
水相を捨てた。Example 9 (1) Heat-resistant thermoplastic resin I having the following repeating unit
Synthesis example of 4.4'
-dihydroxyphenyl-2,2-butane 1.2.1
g (0.05 mol), 0.3 g of tetrabutylammonium chloride as a phase transfer catalyst, and 100 g of a 5% aqueous sodium hydroxide solution were added and dissolved. Next, 5.08 g (0,025 mol) of terephthaloyl chloride and 5.08 g (0,02 mol) of isophthaloyl chloride were added.
A solution of 100 mβ of methylene chloride in which 5 mol) was dissolved was added to the vigorously stirred system. React for another 1 hour at room temperature,
The aqueous phase was discarded.
大量の水で洗浄後、大量のメタノール中に反応液を注ぎ
、ポリマーを単離し、180 ’Cで減圧乾燥し、耐熱
性熱可塑性樹脂■を得た。このものの還元粘度(樹脂o
、2g/dllジメチルホルムアミド溶液、30℃)を
測定したところ、0.95dfl/gであった。”rg
は203℃であった。After washing with a large amount of water, the reaction solution was poured into a large amount of methanol to isolate the polymer, which was dried under reduced pressure at 180'C to obtain a heat-resistant thermoplastic resin (2). Reduced viscosity of this material (resin o
, 2g/dll dimethylformamide solution, 30°C) was measured and found to be 0.95 dfl/g. "rg
was 203°C.
(2)導電性ペースト組成物の作製
(1)で得た耐熱性熱可塑性樹脂11.00重量部をジ
オキサン1700重量部に溶解させ、これに銀粉270
0重量部及び平均粒径1oμの酸化第二銅粉(以下単に
酸化第二銅と呼ぶ)300重量部を加えて、振とうを1
0時間、超音波分散を10時間行い、銀ペーストを作製
した。(2) Preparation of conductive paste composition 11.00 parts by weight of the heat-resistant thermoplastic resin obtained in (1) is dissolved in 1700 parts by weight of dioxane, and 270 parts by weight of silver powder is dissolved in this.
0 parts by weight and 300 parts by weight of cupric oxide powder (hereinafter simply referred to as cupric oxide) having an average particle size of 1 μm were added, and the mixture was shaken for 1 hour.
After 0 hours, ultrasonic dispersion was performed for 10 hours to produce a silver paste.
実施例10
(1)下記繰り返し単位を有する耐熱性熱可塑性樹脂J
の合成例
実施例9の耐熱性熱可塑性樹脂Iの合成例において、4
,4′−ジヒドロキジフェニル−22ブタン12、Ig
(0,05モル)の代わりに22−ビス(4−ヒドロキ
シフェニル)−へキザフルオロブロバン16゜8g(0
,05モル)を用いる以外は同様の方法で耐熱性熱可塑
性樹脂Jを得た。Example 10 (1) Heat-resistant thermoplastic resin J having the following repeating unit
Synthesis Example In the synthesis example of heat-resistant thermoplastic resin I of Example 9, 4
,4'-dihydroxydiphenyl-22butane 12, Ig
(0,05 mol) instead of 22-bis(4-hydroxyphenyl)-hexafluorobroban 16°8 g (0
Heat-resistant thermoplastic resin J was obtained in the same manner except that 05 mol) was used.
このものの還元粘度(樹脂0.2g/dジメチルホルム
アミド溶液、30 ”C)は0.77面/gであった。The reduced viscosity of this product (resin 0.2 g/d dimethylformamide solution, 30''C) was 0.77 surface/g.
Tgは190℃であった。Tg was 190°C.
(2)導電性ペースト組成物の作製
(1)で得た耐熱性熱可塑性樹脂1100重量部をジエ
チレングリコールジメチルエーテル1000重量部に溶
解させ、これに銀粉1000重量部及び酸化第二銅粉2
50重量部を加えて、振とうを10時間、超音波分散を
10時間行い、銀ペーストを作製した。(2) Preparation of conductive paste composition 1,100 parts by weight of the heat-resistant thermoplastic resin obtained in (1) is dissolved in 1,000 parts by weight of diethylene glycol dimethyl ether, and 1,000 parts by weight of silver powder and 2 parts by weight of cupric oxide powder are dissolved therein.
After adding 50 parts by weight, shaking was performed for 10 hours and ultrasonic dispersion was performed for 10 hours to prepare a silver paste.
実施例11
4 B=
(1)下記繰り返し単位を有する耐熱性熱可塑性樹脂に
の合成例
10時間行い、銀ペーストを作製した。Example 11 4B= (1) Synthesis example of a heat-resistant thermoplastic resin having the following repeating unit A silver paste was prepared by carrying out the synthesis for 10 hours.
実施例12
(1)下記繰り返し単位を有する耐熱性熱可塑性樹脂り
の合成例
実施例9の耐熱性熱可塑性樹脂Iの合成例において、4
.4′−ジヒドロキシフェニル−2,2−ブタン12.
1g(0,05モル)の代わりに4゜4′−ジヒドロキ
シ−3,3’ 5.5’−テトラメチルジフェニル−2
,2−プロパン14.2 g(0,05モル)を用いる
以外は同様の方法で耐熱性熱可塑性樹脂Kを得た。この
ものの還元粘度(樹脂0.2g/aジメチルホルムアミ
ド溶液、30’C)はIIdI!、/gであった。’r
gは230℃であった。Example 12 (1) Synthesis example of heat-resistant thermoplastic resin having the following repeating units In the synthesis example of heat-resistant thermoplastic resin I of Example 9, 4
.. 4'-dihydroxyphenyl-2,2-butane12.
4゜4'-dihydroxy-3,3'5.5'-tetramethyldiphenyl-2 instead of 1 g (0.05 mol)
A heat-resistant thermoplastic resin K was obtained in the same manner except that 14.2 g (0.05 mol) of 2-propane was used. The reduced viscosity of this product (resin 0.2 g/a dimethylformamide solution, 30'C) is IIdI! ,/g. 'r
g was 230°C.
(2)導電性ペースト組成物の作製
(1)で得た耐熱性熱可塑性樹脂K100重量部をジオ
キサン1000重量部に溶解させ、これに銀粉2100
重量部及び酸化第二銅粉900重量部を加えて、振とう
を10時間、超音波分散を実施例9の耐熱性熱可塑性樹
脂Iの合成例において、4.4′−ジヒドロキシフェニ
ル−2,2−ブタン12、Ig(0,05モル)の代わ
りに4゜4′−ジヒドロキシ−3,3’ 、5.5’
−テトラメチルジフェニル−2,2−プロパン7.1g
(0,025モル)と4,4′−ジヒドロキシ−33’
、5.5’ −テトラメチルジフェニルスルホン7.
65 g (0,025モル)を用いる以外は、同様の
方法で耐熱性熱可塑性樹脂りを得た。このものの還元粘
度(樹脂0.2g/d1ジメチルホルムアミド溶液、3
0’C)は0.59a、7gであった。Tgは259
”Cであった。(2) Preparation of conductive paste composition 100 parts by weight of the heat-resistant thermoplastic resin K obtained in (1) is dissolved in 1000 parts by weight of dioxane, and 2100 parts by weight of silver powder is dissolved in this.
In the synthesis example of heat-resistant thermoplastic resin I of Example 9, 4.4'-dihydroxyphenyl-2, 4゜4'-dihydroxy-3,3',5.5' instead of 2-butane 12, Ig (0.05 mol)
-Tetramethyldiphenyl-2,2-propane 7.1g
(0,025 mol) and 4,4'-dihydroxy-33'
, 5.5'-tetramethyldiphenylsulfone7.
A heat-resistant thermoplastic resin was obtained in the same manner except that 65 g (0,025 mol) was used. Reduced viscosity of this material (resin 0.2 g/d1 dimethylformamide solution, 3
0'C) was 0.59a, 7g. Tg is 259
“It was C.
(2)導電性ペースト組成物の作製
(1)で得た耐熱性熱可塑性樹脂5100重量部をテト
ラヒドロフラン/ジエチレングリコールジメチルエーテ
ル−6/4(重量比)の混合溶剤1000重量部に溶解
させ、これに銀粉1000重量部及び五酸化バナジウム
粉100重量部を加えて、振とうを10時間、超音波分
散を10時間行い、銀ペーストを作製した。(2) Preparation of conductive paste composition 5,100 parts by weight of the heat-resistant thermoplastic resin obtained in (1) is dissolved in 1,000 parts by weight of a mixed solvent of tetrahydrofuran/diethylene glycol dimethyl ether-6/4 (weight ratio), and silver powder is dissolved in this. 1000 parts by weight and 100 parts by weight of vanadium pentoxide powder were added, followed by shaking for 10 hours and ultrasonic dispersion for 10 hours to prepare a silver paste.
実施例13
(1)下記繰り返し単位を有する耐熱性熱可塑性樹脂M
の合成例
を用いる以外は、同様の方法で耐熱性熱可塑性樹脂Mを
得た。このものの還元粘度(樹脂0.2g/dジメチル
ホルムアミド溶液、30 ”C)は0.66di/gで
あった。Tgは217℃であった。Example 13 (1) Heat-resistant thermoplastic resin M having the following repeating unit
A heat-resistant thermoplastic resin M was obtained in the same manner except that the synthesis example was used. The reduced viscosity of this product (resin 0.2 g/d dimethylformamide solution, 30''C) was 0.66 di/g. Tg was 217°C.
(2)導電性ペースト組成物の作製
(1)で得た耐熱性熱可塑性樹脂N100重量部をジエ
チレングリコールジメチルエーテル1700重量部に溶
解させ、これに銀粉1500重量部及び五酸化バナジウ
ム粉500重量部を加えて、振とうを10時間、超音波
分散を10時間行い、銀ペーストを作製した。(2) Preparation of conductive paste composition 100 parts by weight of the heat-resistant thermoplastic resin N obtained in (1) was dissolved in 1,700 parts by weight of diethylene glycol dimethyl ether, and 1,500 parts by weight of silver powder and 500 parts by weight of vanadium pentoxide powder were added thereto. Then, shaking was performed for 10 hours and ultrasonic dispersion was performed for 10 hours to prepare a silver paste.
実施例14
(1)下記繰り返し単位を有する耐熱性熱可塑性樹脂N
の合成例
実施例4の耐熱性熱可塑性樹脂りの合成例において、ビ
スフェルールA5.044gの代わりに44′−ジヒド
ロキシ−3,3’ 、5.5’ −テトラメチルフェニ
ル−2,2−プロパン6、248 g実施例1の耐熱性
熱可塑性樹脂への合成例において、2.2−ビス[4−
(4−アミノフェノキシ)フェニル〕プロパン8.2g
(0,02モル)を2.2−ビス〔1−(4−アミノフ
ェノキシ)フェニル)−1,1,1,3,3,3−ヘキ
サフルオロプロパン10.36 g (0,02モル)
に、イソフタロイルクロライド4.06g(0,02モ
ル)をイソフタロイルクロライド2.03g(0,01
モル)とテレフタロイルクロライド2.03g(0,0
1モル)の混合物を用いる以外は、同様の方法で耐熱性
熱可塑性樹脂Nを得た。このものの還元粘度(樹脂0.
2g/d1ジメチルホルムアミド溶液、30℃)は1.
0dIV、7gであった。Tgは240 ’Cであった
。Example 14 (1) Heat-resistant thermoplastic resin N having the following repeating unit
Synthesis Example In the synthesis example of the heat-resistant thermoplastic resin of Example 4, 44'-dihydroxy-3,3',5,5'-tetramethylphenyl-2,2-propane was used instead of 5.044 g of bisferrule A. 6,248 g In the synthesis example for heat-resistant thermoplastic resin in Example 1, 2.2-bis[4-
(4-aminophenoxy)phenyl]propane 8.2g
(0.02 mol) to 2.2-bis[1-(4-aminophenoxy)phenyl)-1,1,1,3,3,3-hexafluoropropane 10.36 g (0.02 mol)
4.06 g (0.02 mol) of isophthaloyl chloride was added to 2.03 g (0.01 mol) of isophthaloyl chloride.
mol) and terephthaloyl chloride 2.03g (0,0
A heat-resistant thermoplastic resin N was obtained in the same manner except that a mixture of 1 mol) was used. The reduced viscosity of this material (resin 0.
2g/d1 dimethylformamide solution, 30°C) is 1.
It was 0dIV and 7g. Tg was 240'C.
(2)導電性ペースト組成物の作製
(1)で得た耐熱性熱可塑性樹脂N100重量部をジエ
チレングリコールジメチルエーテル1700重量部に溶
解させ、これに銀粉1500重量部及び平均粒径2μの
酸化第一銅粉(以下単に酸化第一銅粉と呼ぶ)500重
量部を加えて、振とうを10時間、超音波分散を10時
間行い、銀ペーストを作製した。(2) Preparation of conductive paste composition 100 parts by weight of the heat-resistant thermoplastic resin N obtained in (1) is dissolved in 1,700 parts by weight of diethylene glycol dimethyl ether, and 1,500 parts by weight of silver powder and cuprous oxide with an average particle size of 2 μm are dissolved therein. 500 parts by weight of powder (hereinafter simply referred to as cuprous oxide powder) was added, followed by shaking for 10 hours and ultrasonic dispersion for 10 hours to prepare a silver paste.
実施例15
(1)下記繰り返し単位を有する耐熱性熱可塑性樹脂0
の合成例
実施例7の耐熱性熱可塑性樹脂Gの合成例において、2
,2−ビス(4−(4−アミノフェノキシ)フェニル〕
プロパン8.2g(0,02モル)に代えて2.2−ビ
ス(4−(4−アミノフェノキシ)フェニル)−1,1
,1,3,3,3−へキサフルオロプロパン10.36
g (0,02モル)を、22−ビス(p−トリメリ
ットキシフェニル)プロパンニ無水物11.52 g
(0,02モル)に代えて、5.5’−スルホニルビス
(ノルボルナン−2,3−ジカルボン酸無水物)7.8
8 g(0,02モル)を用いる以外は、同様の方法で
耐熱性熱可塑性樹脂0を得た。このものの還元粘度は0
.71di/gであった6Tgは310’Cであった。Example 15 (1) Heat-resistant thermoplastic resin having the following repeating unit 0
Synthesis Example In the synthesis example of heat-resistant thermoplastic resin G of Example 7, 2
,2-bis(4-(4-aminophenoxy)phenyl)
2.2-bis(4-(4-aminophenoxy)phenyl)-1,1 in place of 8.2 g (0.02 mol) of propane
,1,3,3,3-hexafluoropropane 10.36
g (0.02 mol), 11.52 g of 22-bis(p-trimellitoxyphenyl)propanihydride
(0.02 mol), 5.5'-sulfonylbis(norbornane-2,3-dicarboxylic anhydride) 7.8
Heat-resistant thermoplastic resin 0 was obtained in the same manner except that 8 g (0.02 mol) was used. The reduced viscosity of this substance is 0
.. 6Tg which was 71di/g was 310'C.
(2)導電性ペースト組成物の作製
(1)で得た耐熱性熱可塑性樹脂0.100重量部をジ
エチレングリコールジメチルエーテル1500重量部に
溶解させ、これに銀粉1200重量部及び酸化第一銅粉
800重量部を加えて、振とうを10時間、超音波分散
を10時間行い、銀ペーストを作製した。(2) Preparation of conductive paste composition 0.100 parts by weight of the heat-resistant thermoplastic resin obtained in (1) is dissolved in 1,500 parts by weight of diethylene glycol dimethyl ether, and 1,200 parts by weight of silver powder and 800 parts by weight of cuprous oxide powder are dissolved therein. A silver paste was prepared by shaking for 10 hours and performing ultrasonic dispersion for 10 hours.
比較例1
(1)下記繰り返し単位を有する耐熱性熱可塑性樹脂P
の合成例
実施例1において、イソフタロイルクロライドの代わり
にテレフタロイルクロライドを用いる以外は、同様の方
法で耐熱性熱可塑性樹脂Pを得た。Comparative Example 1 (1) Heat-resistant thermoplastic resin P having the following repeating unit
Synthesis Example A heat-resistant thermoplastic resin P was obtained in the same manner as in Example 1, except that terephthaloyl chloride was used instead of isophthaloyl chloride.
このものの還元粘度は0.8041/g (0,2g/
dIN−メチルピロリドン溶液、30℃)であった。The reduced viscosity of this material is 0.8041/g (0.2g/
dIN-methylpyrrolidone solution, 30°C).
間混練し゛ζペーストを作製した。A ζ paste was prepared by kneading the mixture for a while.
比較例4
バインダとして、エポキシ樹脂〔エピコート825(油
化シェルエポキシ■)〕、硬化剤〔フェノールノボラッ
クH−1(明相化成■)〕の混合物100重量部をブチ
ルセロソルブ400重量部に溶解させ、これに銀粉1s
oo重量部、五酸化バナジウム粉200重量部を加えて
、らいかい機中で2時間混練してペーストを作製した。Comparative Example 4 As a binder, 100 parts by weight of a mixture of an epoxy resin [Epicoat 825 (oiled shell epoxy ■)] and a curing agent [phenol novolac H-1 (Meisho Kasei ■)] was dissolved in 400 parts by weight of butyl cellosolve. 1 s of silver powder
0 parts by weight and 200 parts by weight of vanadium pentoxide powder were added, and the mixture was kneaded for 2 hours in a grinder to prepare a paste.
実施例及び比較例で得られた導電性ペースト組成物を、
硬化物の被膜が50μmになるようガラス板に塗布し、
180℃で一時間乾燥した時の被膜の体積抵抗率を第1
表及び第2表に示す。The conductive paste compositions obtained in Examples and Comparative Examples,
Apply the cured product to a glass plate so that the film has a thickness of 50 μm,
The volume resistivity of the film when dried at 180°C for one hour is the first
Shown in Table and Table 2.
更番こ、この被膜2gをとり、脱イオン水10gを加え
、12ビCで2気圧の条件(プレッシャークツカーテス
ト条件)で24時間放置した後の水中の銀イオン濃度を
測定して第1表及び第2表に示す。First, take 2 g of this film, add 10 g of deionized water, and leave it for 24 hours at 12 BiC and 2 atm (pressure tester test conditions), then measure the silver ion concentration in the water. Shown in Table and Table 2.
(以下余白) Tgは247℃であった。(Margin below) Tg was 247°C.
(2)導電性ベースl−組成物の作製
(1)で得た耐熱性熱可塑性樹脂P100重量部をN−
メチルピロリドン1500重量部に溶解させ、これに銀
粉1200重量部を加えてらいかい機中で2時間混練し
て銀ペーストを作製した。(2) Preparation of conductive base l-composition 100 parts by weight of the heat-resistant thermoplastic resin P obtained in (1) was added to N-
The mixture was dissolved in 1,500 parts by weight of methylpyrrolidone, 1,200 parts by weight of silver powder was added thereto, and the mixture was kneaded for 2 hours in a milling machine to prepare a silver paste.
比較例2
実施例2において得られた耐熱性熱可塑性樹脂8100
重量部をジエチレングリコールジメチルエーテル250
0重量部に溶解させ、銀粉300重量部及び酸化アルミ
ニウム粉700重量部を加えて、らいかい機中で2時間
混練してベーストを作製した。Comparative Example 2 Heat-resistant thermoplastic resin 8100 obtained in Example 2
250 parts by weight of diethylene glycol dimethyl ether
0 parts by weight, 300 parts by weight of silver powder and 700 parts by weight of aluminum oxide powder were added, and the mixture was kneaded for 2 hours in a molding machine to prepare a base.
比較例3
バインダとして、Tg102”C1還元粘度(樹脂0.
2g/a、ジメチルホルムアミド溶液、30”C) 1
.2 di/ gのポリメタクリル酸メチル100重量
部を酢酸n−ブチル2500重量部に溶解させ、これに
銀粉2700重量部と酸化アルミニウム粉300重量部
を加えて、らいかい機中で2時第 1 表 体積抵抗率
と銀イオン流出預第
表
体積抵抗率と銀イオン流出量
(発明の効果〕
本発明に係る導電性ペースト組成物は、耐熱性及び機械
的強度に優れており、プレッシャークツカーテスト条件
のような高温、高湿度下でも導電性ペースト被膜の強度
を保持しており、導電性ペースト被膜からの銀イオンの
流出が少ないため、マイグレーションによる短絡不良を
防止できる。Comparative Example 3 As a binder, Tg102''C1 reduced viscosity (resin 0.
2g/a, dimethylformamide solution, 30”C) 1
.. 100 parts by weight of polymethyl methacrylate (2 di/g) was dissolved in 2500 parts by weight of n-butyl acetate, 2700 parts by weight of silver powder and 300 parts by weight of aluminum oxide powder were added thereto, and the mixture was heated at 2 o'clock in a sieve machine. Table Volume resistivity and silver ion outflow Table Volume resistivity and silver ion outflow (effects of the invention) The conductive paste composition according to the present invention has excellent heat resistance and mechanical strength, and has excellent heat resistance and mechanical strength. The strength of the conductive paste film is maintained even under high temperature and high humidity conditions, and because there is little silver ion leakage from the conductive paste film, it is possible to prevent short circuit failures due to migration.
本発明の導電性ペースト組成物は、電子部品の導電性接
着剤、電極材及び配線板の配線導体として有用である。The conductive paste composition of the present invention is useful as a conductive adhesive for electronic components, an electrode material, and a wiring conductor for wiring boards.
Claims (1)
能な溶剤300〜5500重量部及び導電性充填剤とイ
オン吸着能を有する金属酸化物とからなる無機物充填剤
350〜3500重量部を含有してなる導電性ペースト
組成物。 2、イオン吸着能を有する金属酸化物が、導電性充填剤
とイオン吸着能を有する金属酸化物とからなる無機物充
填剤の5〜50重量%の範囲で含まれる請求項1記載の
導電性ペースト組成物。 3、耐熱性熱可塑性樹脂がガラス転移点150℃以上の
熱可塑性樹脂である請求項1又は2記載の導電性ペース
ト組成物。 4、耐熱性熱可塑性樹脂が芳香族ポリアミド、芳香族ポ
リアミドイミド、芳香族ポリエステルイミド、ポリイミ
ド、芳香族ポリエステル及び芳香族ポリエーテルからな
る群から選ばれる少なくとも1種の樹脂である請求項1
、2、3又は4記載の導電性ペースト組成物。 5、芳香族ポリアミドが一般式( I ) ▲数式、化学式、表等があります▼( I ) (式中、R_1、R_2、R_3及びR_4は水素、低
級アルキル基、低級アルコキシ基又はハロゲン原子を表
し、これらは同一でも異なっていてもよく、Xは−O−
、−S−、▲数式、化学式、表等があります▼、−SO
_2−、▲数式、化学式、表等があります▼、▲数式、
化学式、表等があります▼又は▲数式、化学式、表等が
あります▼を表し、ここで、R_5及びR_6は水素、
低級アルキル基、トリフルオロメチル基又はフェニル基
を示し、これらは同一でも異なっていてもよく、Arは
m−フェニレン基、p−フェニレン基、ジフェニレンエ
ーテル基又はジフェニレンスルホン基を表す)で表され
る繰り返し単位を有する芳香族ポリエーテルアミド樹脂
である請求項4記載の導電性ペースト組成物。 6、芳香族ポリアミドイミドが一般式(II)▲数式、化
学式、表等があります▼(II) (式中、R_1、R_2、R_3、R_4及びXは前記
一般式( I )におけると同意義である)で表される繰
り返し単位を有する芳香族ポリエーテルアミドイミド樹
脂である請求項4記載の導電性ペースト組成物。 7、芳香族ポリアミドイミドが一般式(III)▲数式、
化学式、表等があります▼(III) (式中R_1′及びR_3′は低級アルキル基であり、
これらは同一でも異なっていてもよく、R_2′は低級
アルキル基又はハロゲン原子を示し、m、m’及びm”
はそれぞれR_1′、R_2′及びR_3′の置換基数
を示し、0〜4の整数であり、m、m’及びm”がそれ
ぞれ2以上である場合、複数個のR_1′、R_2′及
びR_3′はそれぞれ同一でも異なっていてもよく、X
′は−O−又は▲数式、化学式、表等があります▼を表
し、2個のX′は同一でも異なっていてもよく、ここで
、R_4′及びR_5′は水素、低級アルキル基、トリ
フルオロメチル基又はフェニル基を示し、これらは同一
でも異なっていてもよい)で表される繰り返し単位を有
する芳香族ポリアミドイミド樹脂である請求項4記載の
導電性ペースト組成物。 8、芳香族ポリアミドイミドが一般式(IV)▲数式、化
学式、表等があります▼(IV) (式中、R_1″、R_2″、R_3″及びR_4″は
、低級アルキル基、低級アルコキシ基又はハロゲン原子
を示し、これらは同一でも異なっていてもよく、Xは前
記一般式( I )におけると同意義である)で表される
繰り返し単位を有する芳香族ポリアミドイミド樹脂であ
る請求項4記載の導電性ペースト組成物。 9、芳香族ポリエステルイミドが一般式(V)▲数式、
化学式、表等があります▼(V) (式中、R_1、R_2、R_3、R_4及びXは前記
一般式( I )におけると同意義であり、R_1″′、
R_2″′、R_3″′及びR_4″′はR_1、R_
2、R_3及びR_4と同様の基であり、X″はXと同
様の基であり、R_1、R_2、R_3、R_4、R_
1″′、R_2″′、R_3″′及びR_4″′は同一
でも異なっていてもよく、X及びX″は同一でも異なっ
ていてもよい)で表される繰り返し単位を有する芳香族
ポリエーテルエステルイミド樹脂である請求項4記載の
導電性ペースト組成物。 10、ポリイミドが一般式(VI) ▲数式、化学式、表等があります▼(VI) (式中、X″′は芳香族ジアミンのアミノ基を除いた2
価の残基を示し、Yは脂肪族又は脂環式テトラカルボン
酸のカルボキシル基を除いた4価の残基を示す)で表さ
れる繰り返し単位を有するポリイミド樹脂である請求項
4記載の導電性ペースト組成物。 11、芳香族ポリエステルが一般式(VII) ▲数式、化学式、表等があります▼(VII) (式中、R_1、R_2、R_3、R_4及びXは前記
一般式( I )におけると同意義であり、Ar’はm−
フェニレン基、p−フェニレン基、ジフェニレンエーテ
ル基又はジフェニレンスルホン基を示す)で表される繰
り返し単位を有する芳香族ポリエステル樹脂である請求
項4記載の導電性ペースト組成物。 12、芳香族ポリエーテルが一般式(VIII) ▲数式、化学式、表等があります▼(VIII) (式中、R_1、R_2、R_3、R_4及びXは前記
一般式( I )におけると同意義であり、R_1″、R
_2″、R_3″及びR_4″はR_1、R_2、R_
3及びR_4と同様の基であり、X″はXと同様の基で
あり、R_1、R_2、R_3、R_4、R_1″、R
_2″、R_3″及びR_4″は同一でも異なっていて
もよく、X及びX″は同一でも異なっていてもよい)で
表される繰り返し単位を有する芳香族ポリエーテル樹脂
である請求項4記載の導電性ペースト組成物。 13、導電性充填剤が銀である請求項1記載の導電性ペ
ースト。[Claims] 1. 100 parts by weight of a heat-resistant thermoplastic resin, 300 to 5,500 parts by weight of a solvent capable of dissolving the resin, and an inorganic filler 350 consisting of a conductive filler and a metal oxide having ion adsorption ability. -3500 parts by weight of a conductive paste composition. 2. The conductive paste according to claim 1, wherein the metal oxide having ion adsorption ability is contained in an amount of 5 to 50% by weight of the inorganic filler consisting of the conductive filler and the metal oxide having ion adsorption ability. Composition. 3. The conductive paste composition according to claim 1 or 2, wherein the heat-resistant thermoplastic resin is a thermoplastic resin having a glass transition point of 150° C. or higher. 4. Claim 1, wherein the heat-resistant thermoplastic resin is at least one resin selected from the group consisting of aromatic polyamide, aromatic polyamideimide, aromatic polyesterimide, polyimide, aromatic polyester, and aromatic polyether.
, 2, 3 or 4. The conductive paste composition according to . 5. Aromatic polyamide has the general formula (I) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (I) (In the formula, R_1, R_2, R_3 and R_4 represent hydrogen, lower alkyl group, lower alkoxy group or halogen atom. , these may be the same or different, and X is -O-
, -S-, ▲There are mathematical formulas, chemical formulas, tables, etc.▼, -SO
_2−, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, ▲ Mathematical formulas,
There are chemical formulas, tables, etc. ▼ or ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, where R_5 and R_6 are hydrogen,
represents a lower alkyl group, trifluoromethyl group or phenyl group, which may be the same or different, Ar represents a m-phenylene group, p-phenylene group, diphenylene ether group or diphenylene sulfone group) 5. The conductive paste composition according to claim 4, which is an aromatic polyetheramide resin having repeating units. 6. Aromatic polyamideimide has the general formula (II) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (II) (In the formula, R_1, R_2, R_3, R_4 and X have the same meanings as in the above general formula (I) The conductive paste composition according to claim 4, which is an aromatic polyetheramide-imide resin having a repeating unit represented by the following. 7. Aromatic polyamideimide has the general formula (III)▲mathematical formula,
There are chemical formulas, tables, etc.▼(III) (In the formula, R_1' and R_3' are lower alkyl groups,
These may be the same or different, R_2' represents a lower alkyl group or a halogen atom, m, m' and m''
represents the number of substituents of R_1', R_2' and R_3', respectively, and is an integer from 0 to 4, and when m, m' and m'' are each 2 or more, multiple R_1', R_2' and R_3' may be the same or different, and
' represents -O- or ▲There are mathematical formulas, chemical formulas, tables, etc.▼, and the two X' may be the same or different, where R_4' and R_5' are hydrogen, lower alkyl group, trifluoro 5. The conductive paste composition according to claim 4, which is an aromatic polyamide-imide resin having a repeating unit represented by a methyl group or a phenyl group, which may be the same or different. 8. Aromatic polyamideimide has the general formula (IV) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (IV) (In the formula, R_1″, R_2″, R_3″ and R_4″ are lower alkyl groups, lower alkoxy groups, or The aromatic polyamide-imide resin according to claim 4, which has a repeating unit represented by a halogen atom, which may be the same or different, and X has the same meaning as in the general formula (I). Conductive paste composition. 9. Aromatic polyesterimide has general formula (V)▲mathematical formula,
There are chemical formulas, tables, etc.▼(V) (In the formula, R_1, R_2, R_3, R_4 and X have the same meanings as in the above general formula (I),
R_2″′, R_3″′ and R_4″′ are R_1, R_
2, R_3 and R_4 are the same groups, X'' is the same group as X, R_1, R_2, R_3, R_4, R_
1"', R_2"', R_3"' and R_4"' may be the same or different, and X and X" may be the same or different). The conductive paste composition according to claim 4, which is an imide resin. 10. The polyimide has the general formula (VI) ▲ Numerical formula, chemical formula, table, etc. ▼ (VI) (wherein, 2 excluding the group
5. The conductive resin according to claim 4, which is a polyimide resin having a repeating unit represented by (Y represents a tetravalent residue excluding a carboxyl group of an aliphatic or alicyclic tetracarboxylic acid). sex paste composition. 11. Aromatic polyester has the general formula (VII) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (VII) (In the formula, R_1, R_2, R_3, R_4 and X have the same meanings as in the above general formula (I). , Ar' is m-
The conductive paste composition according to claim 4, which is an aromatic polyester resin having a repeating unit represented by a phenylene group, a p-phenylene group, a diphenylene ether group, or a diphenylene sulfone group. 12. Aromatic polyether has the general formula (VIII) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (VIII) (In the formula, R_1, R_2, R_3, R_4 and X have the same meanings as in the above general formula (I) Yes, R_1″, R
_2″, R_3″ and R_4″ are R_1, R_2, R_
3 and R_4, X″ is the same group as X, R_1, R_2, R_3, R_4, R_1″, R
_2", R_3" and R_4" may be the same or different, and X and X" may be the same or different. Conductive paste composition. 13. The conductive paste according to claim 1, wherein the conductive filler is silver.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6655189A JPH02245071A (en) | 1989-03-17 | 1989-03-17 | Conductive paste composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6655189A JPH02245071A (en) | 1989-03-17 | 1989-03-17 | Conductive paste composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02245071A true JPH02245071A (en) | 1990-09-28 |
Family
ID=13319162
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6655189A Pending JPH02245071A (en) | 1989-03-17 | 1989-03-17 | Conductive paste composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02245071A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000061658A1 (en) * | 1999-04-09 | 2000-10-19 | Kaneka Corporation | Polyimide resin, resin composition with improved moisture resistance comprising the same, adhesive solution, filmy bonding member, layered adhesive film, and processes for producing these |
EP0995784A4 (en) * | 1997-07-04 | 2001-04-25 | Nippon Zeon Co | ADHESIVE FOR SEMICONDUCTOR COMPONENTS |
WO2008016148A1 (en) * | 2006-08-04 | 2008-02-07 | I.S.T. Corporation | Conductive paste, and conductive coating film and conductive film using the same |
-
1989
- 1989-03-17 JP JP6655189A patent/JPH02245071A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0995784A4 (en) * | 1997-07-04 | 2001-04-25 | Nippon Zeon Co | ADHESIVE FOR SEMICONDUCTOR COMPONENTS |
WO2000061658A1 (en) * | 1999-04-09 | 2000-10-19 | Kaneka Corporation | Polyimide resin, resin composition with improved moisture resistance comprising the same, adhesive solution, filmy bonding member, layered adhesive film, and processes for producing these |
US6693162B2 (en) | 1999-04-09 | 2004-02-17 | Kaneka Japan Corporation | Polyimide resin and resin composition, adhesive solution, film-state joining component,and adhesive laminate film improved in moisture resistance using it, and production methods therefor |
WO2008016148A1 (en) * | 2006-08-04 | 2008-02-07 | I.S.T. Corporation | Conductive paste, and conductive coating film and conductive film using the same |
JPWO2008016148A1 (en) * | 2006-08-04 | 2009-12-24 | 株式会社アイ.エス.テイ | Conductive paste, and conductive coating film and conductive film using the same |
US7998370B2 (en) | 2006-08-04 | 2011-08-16 | I.S.T. Corporation | Conductive paste as well as conductive coating and conductive film prepared from same |
KR101289328B1 (en) * | 2006-08-04 | 2013-07-29 | 가부시키가이샤 아이.에스.티 | Conductive paste, and conductive coating film and conductive film using the same |
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