JPH02234102A - Antireflection film - Google Patents
Antireflection filmInfo
- Publication number
- JPH02234102A JPH02234102A JP1054661A JP5466189A JPH02234102A JP H02234102 A JPH02234102 A JP H02234102A JP 1054661 A JP1054661 A JP 1054661A JP 5466189 A JP5466189 A JP 5466189A JP H02234102 A JPH02234102 A JP H02234102A
- Authority
- JP
- Japan
- Prior art keywords
- antireflection
- antireflection film
- film layer
- layers
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 claims abstract description 21
- 239000000203 mixture Substances 0.000 claims abstract description 8
- 238000010030 laminating Methods 0.000 claims abstract description 4
- 239000012780 transparent material Substances 0.000 claims abstract description 3
- 238000000034 method Methods 0.000 abstract description 3
- 229910001635 magnesium fluoride Inorganic materials 0.000 abstract description 2
- 238000007740 vapor deposition Methods 0.000 abstract description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 abstract 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 229910052593 corundum Inorganic materials 0.000 abstract 1
- 230000008020 evaporation Effects 0.000 abstract 1
- 238000001704 evaporation Methods 0.000 abstract 1
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 19
- 230000003595 spectral effect Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 239000002356 single layer Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000005304 optical glass Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Surface Treatment Of Optical Elements (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、OA機器,カメラ,光通信,光情報処理など
に用いられる光学部品の反射防止膜に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an antireflection coating for optical components used in office automation equipment, cameras, optical communications, optical information processing, and the like.
従来、レンズなどの光学部品では、表面反射を防止する
ため、光学部品の表面に反射防止膜を設けることが行な
われている.
特に、゜レーザ光用の光学部品では、低コスト化を図る
ため、第5図に示すように、透明材料からなる光学部品
11の表面にMgFi (フッ化マグネシウム)からな
る反射防止膜12を被覆形成してなる単層膜構成の反射
防止膜が一般的に用いられている。Conventionally, in order to prevent surface reflection of optical parts such as lenses, an anti-reflection film has been provided on the surface of the optical parts. In particular, in order to reduce the cost of optical parts for use with laser beams, as shown in FIG. An antireflection film having a single-layer film structure is generally used.
ところで、一般に多用されている光学硝子材料としての
BK7の場合、従来のMgF2の単層膜構成からなる反
射防止膜では,第6図に示すように,反射率が中心波長
(λ,)で約1.3%残っているため,光学部品の反射
防止としては、充分な特性を有していない。特に、光学
系の構造や構成枚数によっては、有害な反射光をできる
だけ低くすることが必要とされるため、MgF,の単層
膜構成からなる反射防止膜では反射防止特性が悪く実用
的でない.
そこで、反射光を低減させるために、反射防止膜を多層
膜構成にする技術が提案されているが、3層膜構成以上
の多層膜にすると、干渉効果により反射率の曲線にリッ
プル(波打ち)現象が生じ,?光特性が悪くなるという
問題が生じ、また、多層膜による生産性の点からも3層
膜構成以上の多層膜にすると製造コストが高くなるとい
う問題が生じていた.
本発明は上記事情に鑑みてなされた゜ものであって、膜
暦数が少なく、反射防止特性の優れた反射防止膜を提供
することを目的とする.
〔課題を解決するための手段〕
上記目的を達成するため、本発明による反射防止膜では
、透明材料からなる光学部品の表面側からAM,O,と
ZrO,との混合物からなる第1の反射防止膜層と、M
gF■からなる第2の反射防止膜溜の2層を積層形成し
てなることを特徴とする.〔作 用〕
本発明では、透明性材料からなる光学部品の表面に、真
空蒸着法などの薄膜形成技術を用いて、AQ,03とZ
rO■との混合物を蒸着し、0.25λ。By the way, in the case of BK7, which is commonly used as an optical glass material, the reflectance of the conventional antireflection film consisting of a single layer of MgF2 is approximately Since 1.3% remains, it does not have sufficient properties for preventing reflection in optical components. In particular, depending on the structure of the optical system and the number of components, it is necessary to reduce harmful reflected light as much as possible, so an antireflection film consisting of a single layer of MgF has poor antireflection properties and is not practical. Therefore, in order to reduce reflected light, a technology has been proposed in which the antireflection film has a multilayer structure. However, if a multilayer film with three or more layers is used, the reflectance curve will ripple due to interference effects. A phenomenon occurs? A problem arises in that the optical characteristics deteriorate, and in addition, from the viewpoint of productivity due to the multilayer film, there is also a problem in that the production cost increases when a multilayer film having a structure of three or more layers is used. The present invention was made in view of the above circumstances, and it is an object of the present invention to provide an antireflection film that has a small number of coatings and has excellent antireflection properties. [Means for Solving the Problems] In order to achieve the above object, in the antireflection film according to the present invention, a first reflection film made of a mixture of AM, O, and ZrO is applied from the surface side of an optical component made of a transparent material. A preventive film layer, M
It is characterized by being formed by laminating two layers of the second antireflection film reservoir made of gF■. [Function] In the present invention, AQ, 03 and Z
Deposit a mixture with rO■, 0.25λ.
(λ。= 780nm)の膜厚の第1の反射防止膜層を
形成し、次に、この第1の反射防止膜層の上に、MgF
2を0.25λ。の膜厚で蒸着して第2の反射防止膜層
を積層形成することにより2層構成の反射防止膜を形成
するため、光学特性に優れた反射防止膜を低コストに得
ることができる.
〔実 施 例〕
以下、本発明の実施例について、図面を参照して詳細に
説明する.
第1図は本発明による反射防止膜が形成された光学部品
の一構成例を示す図であって、同図において、光学硝子
のBK7からなる光学部品1を精密洗浄後、所定の治具
にセットしたものを真空蒸着槽に入れ、光学部品を約2
80℃に加熱し、真空度が約I X IO−’ Tor
rの作成条件のもとて電子ビームを用いてAM,03と
ZrO,混合物(屈折率1.67)を0.25λ。(λ
, =780nm)の膜厚に形成し、第1の反射防止膜
層2を形成する.次に、MgFz(屈折率1.38)を
抵抗加熱法によって0.25λ。(λ。=780止)の
膜厚に形成して第2の反射防止膜層3とし、2層で構成
された反射防止膜を形成する。(λ.=780 nm), and then, on this first anti-reflection film layer, MgF
2 to 0.25λ. Since a two-layer antireflection film is formed by laminating the second antireflection film layer by vapor deposition to a film thickness of , an antireflection film with excellent optical properties can be obtained at low cost. [Examples] Examples of the present invention will be described in detail below with reference to the drawings. FIG. 1 is a diagram showing an example of the configuration of an optical component on which an antireflection film according to the present invention is formed. In the figure, an optical component 1 made of BK7 optical glass is placed in a predetermined jig after precision cleaning. Place the set into a vacuum evaporation tank and add about 2
Heating to 80℃, the degree of vacuum is about IXIO-' Tor
A mixture of AM,03 and ZrO (refractive index 1.67) was heated to 0.25λ using an electron beam under conditions of r. (λ
, =780 nm) to form the first antireflection film layer 2. Next, MgFz (refractive index 1.38) was heated to 0.25λ by a resistance heating method. (λ.=780 stops) to form the second antireflection film layer 3, thereby forming an antireflection film composed of two layers.
このようにして形成された反射防止膜の分光反射率を第
2図に示す。この第2図から明らかなように、本実施例
における反射防止膜では、中心波長く780止)で反射
率が0.1%以下であり、従来のものより反射特性の優
れた反射防止膜を得ることができる.
次に,本発明の別の実施例を示す.
先ず、前述の第1の実施例と同様な方法で、石英光学硝
子(屈折率1.45)からなる光学部品の表面に、A’
Q , O,とZrO.(7)混合物(屈折率1.67
)を0.25λ。(λ。= 780nm)の膜厚に形成
し、第工必反射防止膜層2を形成する.次に、MgF’
よ(屈折率1.38)を抵抗加熱法によって0.251
.(λ。=780nm)の膜厚に形成して第2の反射防
止膜層3を形成し、2層で構成された反射防止膜を形成
する.このようにして形成された反射防止膜の分光反射
率を第3図に示す.この第3図から明らかなように、こ
の実施例における反射防止膜では、中心波長(780n
m)で反射率が0.1%以下である.尚、第4図は,上
述と同様の石英光学硝子(屈折率1.45)からなる光
学部品の表面に被覆形成された、従来のMgF,単層反
射防止膜の分光反射率を示しており、この場合には、中
心波長(780止)において反射率が約1.8%存在し
ており、本発明による反射防止膜の方が従来のものより
格段に優れていることが判る。The spectral reflectance of the antireflection film thus formed is shown in FIG. As is clear from FIG. 2, the anti-reflection film in this example has a reflectance of 0.1% or less at a center wave length of 780 mm, and has better reflective properties than the conventional anti-reflection film. Obtainable. Next, another embodiment of the present invention will be shown. First, in the same manner as in the first embodiment described above, A'
Q, O, and ZrO. (7) Mixture (refractive index 1.67
) is 0.25λ. (λ = 780 nm) to form the first anti-reflection film layer 2. Next, MgF'
y (refractive index 1.38) to 0.251 by resistance heating method.
.. (λ.=780 nm) to form the second antireflection film layer 3, thereby forming an antireflection film composed of two layers. Figure 3 shows the spectral reflectance of the antireflection film formed in this way. As is clear from FIG. 3, the antireflection film in this example has a center wavelength (780 nm).
m) and the reflectance is 0.1% or less. Furthermore, Fig. 4 shows the spectral reflectance of a conventional MgF single-layer antireflection coating formed on the surface of an optical component made of quartz optical glass (refractive index 1.45) similar to that described above. In this case, the reflectance was approximately 1.8% at the center wavelength (stopping at 780), and it can be seen that the antireflection film according to the present invention is significantly superior to the conventional one.
以上説明したように、本発明による反射防止膜は、Al
l,○,とzro2との混合物からなる第1の反射防止
膜漕と、MgF,からなる第2の反射防止膜層の2層を
積層形成した構成からなるため、層数も少なく生産性も
よく、低コストで製造できる。As explained above, the antireflection film according to the present invention is made of Al
Since it has a structure in which two layers are laminated: the first anti-reflection film layer made of a mixture of l, ○, and zro2, and the second anti-reflection film layer made of MgF, the number of layers is small and productivity is low. Can be manufactured easily and at low cost.
したがって,本発明によれば、分光反射率特性に優れた
実用的に有利な反射防止膜を得ることができる.Therefore, according to the present invention, a practically advantageous antireflection film with excellent spectral reflectance characteristics can be obtained.
第1図は本発明による反射防止膜が形成された光学部品
の一構成例を示す図、第2図は本発明による反射防止膜
の分光反射率を示す図、第3図は本発明の他実施例の反
射防止膜の分光反射率を示す図、第4図及び第6図は従
来の単層反射防止膜の分光反射率を夫々示す図、第5図
は従来の反射防止膜が形成された光学部品の一構成例を
示す図である.
1・・・・透明性光学部品、
2・・・・第1の反射防止
膜層、
3・・・・第1の反射防止膜層。
最
印
うZ図
沢&(ル町
■都 齋\FIG. 1 is a diagram showing a configuration example of an optical component on which an anti-reflection film according to the present invention is formed, FIG. 2 is a diagram showing spectral reflectance of an anti-reflection film according to the present invention, and FIG. FIGS. 4 and 6 are diagrams showing the spectral reflectance of the anti-reflection film of the example, respectively, and FIG. 5 is a diagram showing the spectral reflectance of the conventional single-layer anti-reflection film. FIG. 2 is a diagram showing an example of the configuration of an optical component. DESCRIPTION OF SYMBOLS 1... Transparent optical component, 2... 1st antireflection film layer, 3... 1st antireflection film layer. Saiinu Z Zuzawa & (Le Town ■ Miyako Sai \
Claims (1)
防止膜であって、上記光学部品の表面側から、Al_2
O_3とZrO_2との混合物からなる第1の反射防止
膜層と、MgF_2からなる第2の反射防止膜層の2層
を積層形成してなることを特徴とする反射防止膜。An anti-reflection film coated on the surface of an optical component made of a transparent material, from the surface side of the optical component, Al_2
An antireflection film characterized by being formed by laminating two layers: a first antireflection film layer made of a mixture of O_3 and ZrO_2 and a second antireflection film layer made of MgF_2.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1054661A JPH02234102A (en) | 1989-03-07 | 1989-03-07 | Antireflection film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1054661A JPH02234102A (en) | 1989-03-07 | 1989-03-07 | Antireflection film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02234102A true JPH02234102A (en) | 1990-09-17 |
Family
ID=12976973
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1054661A Pending JPH02234102A (en) | 1989-03-07 | 1989-03-07 | Antireflection film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02234102A (en) |
-
1989
- 1989-03-07 JP JP1054661A patent/JPH02234102A/en active Pending
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