JPH02202525A - Synthetic grinding stone - Google Patents
Synthetic grinding stoneInfo
- Publication number
- JPH02202525A JPH02202525A JP2358389A JP2358389A JPH02202525A JP H02202525 A JPH02202525 A JP H02202525A JP 2358389 A JP2358389 A JP 2358389A JP 2358389 A JP2358389 A JP 2358389A JP H02202525 A JPH02202525 A JP H02202525A
- Authority
- JP
- Japan
- Prior art keywords
- matrix
- polishing
- synthetic
- grinding stone
- fine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000227 grinding Methods 0.000 title abstract description 27
- 239000004575 stone Substances 0.000 title abstract 4
- 239000011159 matrix material Substances 0.000 claims abstract description 22
- 229920005989 resin Polymers 0.000 claims abstract description 18
- 239000011347 resin Substances 0.000 claims abstract description 18
- 239000011148 porous material Substances 0.000 claims abstract description 15
- 229920001187 thermosetting polymer Polymers 0.000 claims abstract description 12
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims abstract description 10
- 150000005846 sugar alcohols Polymers 0.000 claims abstract description 10
- 229920002554 vinyl polymer Polymers 0.000 claims abstract description 10
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229920000642 polymer Polymers 0.000 claims abstract description 9
- 239000000203 mixture Substances 0.000 claims abstract description 7
- 239000011354 acetal resin Substances 0.000 claims abstract description 6
- 229920006324 polyoxymethylene Polymers 0.000 claims abstract description 6
- 239000006061 abrasive grain Substances 0.000 claims description 30
- 239000008240 homogeneous mixture Substances 0.000 claims description 2
- 238000005498 polishing Methods 0.000 abstract description 44
- 229910052782 aluminium Inorganic materials 0.000 abstract description 15
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 15
- 229910052751 metal Inorganic materials 0.000 abstract description 13
- 239000002184 metal Substances 0.000 abstract description 13
- 239000002245 particle Substances 0.000 abstract description 11
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 abstract description 6
- 238000002156 mixing Methods 0.000 abstract description 5
- 229910010271 silicon carbide Inorganic materials 0.000 abstract description 5
- 229920000877 Melamine resin Polymers 0.000 abstract description 4
- 239000004640 Melamine resin Substances 0.000 abstract description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 25
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 10
- 239000007864 aqueous solution Substances 0.000 description 10
- 238000001723 curing Methods 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- 230000000694 effects Effects 0.000 description 8
- 239000007788 liquid Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 239000002002 slurry Substances 0.000 description 7
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 235000011187 glycerol Nutrition 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000003082 abrasive agent Substances 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 3
- 150000001241 acetals Chemical class 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 239000000839 emulsion Substances 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 239000005011 phenolic resin Substances 0.000 description 3
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- 229920002261 Corn starch Polymers 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229910000423 chromium oxide Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000008120 corn starch Substances 0.000 description 2
- 229940099112 cornstarch Drugs 0.000 description 2
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 230000008961 swelling Effects 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 101100348017 Drosophila melanogaster Nazo gene Proteins 0.000 description 1
- 229920002472 Starch Polymers 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910001651 emery Inorganic materials 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000002223 garnet Substances 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000007542 hardness measurement Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229920000592 inorganic polymer Polymers 0.000 description 1
- 230000000968 intestinal effect Effects 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007127 saponification reaction Methods 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Landscapes
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は平坦な表面を有する金属板、例えば、磁気ディ
スク基盤の素材たるアルミニウム合金製原盤(以下アル
ミディスクと略称する)等の軟質金属の表面の研削・琢
磨、すなわち研磨に供する合成砥石に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention is a metal plate having a flat surface, such as a soft metal such as an aluminum alloy master disk (hereinafter referred to as an aluminum disk) that is a material for a magnetic disk base. It relates to a synthetic whetstone used for surface grinding and polishing, that is, polishing.
(従来の技術)
従来、平坦な表面を有する金属板で比較的軟質なもの、
例えばアルミディスク等の表面研磨は、精密旋盤等を用
いた機械加工、炭化珪素等の微粉末スラリーを用いた所
謂ラッピング加工、あるいはレジノイド系砥石や、ウレ
タン系砥石等の合成砥石を用いた加工等が一般的であっ
た。(Prior art) Conventionally, a relatively soft metal plate with a flat surface,
For example, surface polishing of aluminum disks, etc. can be done by machining using a precision lathe, so-called lapping using a slurry of fine powder such as silicon carbide, or processing using a synthetic grindstone such as a resinoid grindstone or a urethane grindstone. was common.
しかしながら、精密旋盤等を用いた機械加工は、作業者
の熟練度により仕上がり精度、作業効率が異なる上、全
般的に作業性が悪く、小型の被研磨体を大量に処理する
ような場合、その効率の低さが顕著であった。However, machining using precision lathes, etc. has different finishing accuracy and work efficiency depending on the skill level of the worker, and is generally poor in workability. The efficiency was noticeably low.
また、炭化珪素等の低粒微粉末スラリーを用いたラッピ
ング加工法の場合は、スラリーのロス、使用量が多く経
済的に不利な上、周囲の作業環境や作業者を汚染し、更
にはその高濃度廃液の処理に大変な手間と費用とを要す
るという問題点があったO
かかる砥粒微粉末スラリーを用いるラッピング加工法に
代えて、合成砥石を用いた加工が近年急速に普及しつつ
ある。しかし合成砥石も、例えばビトリファイド系やレ
ジノイド系の硬質砥石等では、研磨性能が不充分で充分
な仕上り精度が得られなかったり、検索力が不足したり
、あるいは目詰まり現象等好ましからざる現象を惹起し
、高能率ともって一定の性能が得られない等の問題点が
あった。すなわち、平面部分の研磨、特にアルミディス
ク等、平坦度と面精度とが同時に要求される研磨におい
ては、被研磨体の表面と、研磨材の表面との面相瓦間を
接触させ、−時に研磨を進めてゆくことが必要であり、
例えばレジノイド系あるいはウレタン系等の独立気孔構
造の合成砥石を使用した場合は、研磨作用による研摩屑
、脱落砥粒等がこの気孔に入り込み、目詰まり現象を惹
き起こし易く、研磨効果の持続性に欠け、頻繁なドレッ
シング(表面更新)作業が必要となるのである。In addition, in the case of lapping processing using a slurry of low-grain fine powder such as silicon carbide, it is economically disadvantageous due to the loss of slurry and the amount used, and it also contaminates the surrounding working environment and workers, and furthermore, Processing using synthetic grindstones has been rapidly becoming popular in recent years, instead of the lapping process using a slurry of fine abrasive grains, which had the problem of requiring a great deal of time and money to process high-concentration waste liquid. . However, synthetic whetstones, such as vitrified or resinoid hard whetstones, have insufficient polishing performance and cannot obtain sufficient finishing precision, lack search power, or cause undesirable phenomena such as clogging. However, there were problems such as not being able to achieve a certain level of performance with high efficiency. In other words, when polishing flat surfaces, especially aluminum disks, etc., which require both flatness and surface precision, the surface of the object to be polished and the surface of the abrasive material are brought into contact with each other. It is necessary to advance the
For example, when using a resinoid-based or urethane-based synthetic whetstone with an independent pore structure, abrasive debris, fallen abrasive grains, etc. due to the polishing action can easily enter the pores, causing clogging, which may affect the sustainability of the polishing effect. This results in chipping and frequent dressing (surface renewal) work.
これに対して、連続気孔を有するポリビニルアセタール
系樹脂を結合材として用いたものは、研摩屑、脱落砥粒
等が気孔外に排出され易く、目詰まり現象を起こし難い
ため、優れた合成砥石として一般的に知られたものであ
るが、比較的耐水性に劣り、かかる精密研磨用途には不
向きであった。On the other hand, those using polyvinyl acetal resin with continuous pores as a bonding material are easy to discharge polishing debris, fallen abrasive grains, etc. to the outside of the pores, and are less likely to cause clogging, making them excellent synthetic grindstones. Although it is generally known, it has relatively poor water resistance and is not suitable for such precision polishing applications.
また、耐水性付与を目的として熱硬化性樹脂硬化体を配
合したものも、特公昭39−1898号および同53−
6752号各公報などに提案され、耐水性合成砥石とし
て公知のものである。特に後者の発明においては、熱硬
化性樹脂の配合比率を変えることにより、弾性のあるも
のから剛性に至るまでの性質を有する研磨材が得られ、
殊に粒度の細かい砥石は、軟質、硬質、難削材の研磨に
有用であるとされていたが、その研削力においては尚不
充分な面があり、平坦な表面を有する軟質金属板、特に
アルミディスク等の平面研磨に不向きであった。In addition, products containing a cured thermosetting resin for the purpose of imparting water resistance are also available in Japanese Patent Publications No. 39-1898 and No. 53-
It was proposed in various publications such as No. 6752, and is known as a water-resistant synthetic whetstone. In particular, in the latter invention, by changing the blending ratio of the thermosetting resin, an abrasive material with properties ranging from elastic to rigid can be obtained.
In particular, fine-grained whetstones were said to be useful for polishing soft, hard, and difficult-to-cut materials, but their grinding power was still insufficient, and they were particularly useful for polishing soft metal plates with flat surfaces. It was not suitable for flat surface polishing of aluminum disks, etc.
更にまた、ポリビニルアセタール系砥石の耐薬品性、抗
圧力の不足を補うと共に、研削材の接着。Furthermore, it compensates for the lack of chemical resistance and anti-pressure of polyvinyl acetal grinding wheels, and also serves as an adhesion for abrasive materials.
抱合力を増大させるために、珪酸ゲルをマトリックス中
に添加する方法が特公昭36−22443号として提案
されているが、この方法によって製造された従来の合成
砥石も上記同様、軟質金属板の精密研磨に適するとは云
えなかった。In order to increase the bonding force, a method of adding silicic acid gel to the matrix has been proposed in Japanese Patent Publication No. 36-22443, but conventional synthetic grindstones manufactured by this method also have the same effect on the precision of soft metal plates. It could not be said that it was suitable for polishing.
これらの問題点を解決するために特開昭61−1924
80号公報には、ポリビニルアセタール系砥石の表面硬
度と砥粒番手との関係を限定し、かつ珪酸ゲルをマトリ
ックス中に添加した合成砥石が提案されており、この合
成砥石は特にアルミディスク等の平面研磨に対して優れ
た平坦度と高い面精度とを同時に満足するものである。In order to solve these problems,
Publication No. 80 proposes a synthetic grinding wheel in which the relationship between the surface hardness of a polyvinyl acetal grinding wheel and the abrasive grain count is limited, and silicic acid gel is added to the matrix. It simultaneously satisfies excellent flatness and high surface precision for surface polishing.
そして、この合成砥石は通常研摩機に装着する前に水中
に投入し、12時間以上放置し、完全に湿潤状態に到ら
しめ、最大2%程度膨潤させ安定した後便われてきた。This synthetic whetstone is usually placed in water before being installed in a polishing machine, left for more than 12 hours, and allowed to reach a completely wet state, allowing it to swell by up to 2% and become stable before being disposed of.
ところが、冬期にこの合成砥石を水中に投入すると、水
が砥石内部に浸透する的に、膨潤による歪が原因で砥石
にひびが入り、砥石が割れるという問題があった。従っ
て、冬期には使用前に砥石を室温で保管した後、水中に
投入する必要があり、すぐに砥石が使用できず、その改
善が望まれていた。However, when this synthetic whetstone is placed in water during the winter, there is a problem in that as the water permeates inside the whetstone, the whetstone cracks and breaks due to distortion due to swelling. Therefore, in the winter, it is necessary to store the whetstone at room temperature and then put it into water before use, making it impossible to use the whetstone immediately, and an improvement has been desired.
(発明が解決しようとする問題点)
本発明者等は、上述の技術的現状と問題点とに鑑み、鋭
意研究を行なった結果、本発明を完成するに至ったもの
であり、その目的とするところは、優れた平坦度と高い
面精度とを同時に満足するように仕上げられた軟質金属
板、特にアルミディスク等、就中、極めて精密な用途に
供せられる特殊アル主合金の環状盤等に使用でき、しか
も冬期に水中に投入してもひび割れがおこらない合成砥
石を提供するにある。(Problems to be Solved by the Invention) The present inventors have completed the present invention as a result of intensive research in view of the above-mentioned technical current situation and problems. These include soft metal plates that have been finished to simultaneously satisfy both excellent flatness and high surface accuracy, especially aluminum disks, and especially annular disks made of special aluminum alloys that can be used for extremely precise applications. To provide a synthetic whetstone which can be used for various purposes and does not cause cracks even when put into water in winter.
(問題点を解決するための手段)
上述の目的は、連続微細気孔を具えた三次元網状組織を
なす構造体であって、該組織がポリビニルアセタール系
樹脂と少なくとも一種の熱硬化性樹脂の硬化体と珪酸塩
の非晶体と多価アルコールないしその誘導体あるいは重
合体との均一混合体よりなるマトリックスと、該マトリ
ックス中において相連接し実質的に連続状態をなして存
在する砥粒微細粒子との混合体からなることを特徴とす
る合成砥石により達成される。(Means for Solving the Problems) The above object is to provide a structure having a three-dimensional network structure with continuous fine pores, which structure is formed by curing polyvinyl acetal resin and at least one thermosetting resin. A matrix consisting of a homogeneous mixture of an amorphous body, a silicate, and a polyhydric alcohol or its derivative or polymer, and abrasive fine particles that are interconnected and exist in a substantially continuous state in the matrix. This is achieved by a synthetic grindstone characterized by being made of a mixture.
本発明砥石の微細三次元網状組織をなす構造体は、レジ
ノイド系やウレタン系人造砥石の独立気泡構造とは組織
を全く異にし、独立気泡は存在せず、空隙中に枝が立体
的に伸びた様な組織であり気孔は無限に連通したものと
なる。従って、研磨作業に起因する砥粒脱落物、研磨屑
はこの間隙から系外に排出され易く、また捕捉された場
合も他の独立気泡構造の砥石に見る如(、気泡部分にこ
れらが堆積し、目詰まり等好ましからざる現象を惹起し
難いものである。独立気泡構造の場合は目詰まり現象に
より研磨効果の持続性に欠け、頻繁なドレッシング作業
(表面更新)が必要となる。The fine three-dimensional network structure of the grindstone of the present invention is completely different from the closed cell structure of resinoid-based or urethane-based artificial grindstones; there are no closed cells, and branches extend three-dimensionally into the voids. The structure is like that, and the pores are infinitely connected. Therefore, abrasive particles and polishing debris caused by polishing work are easily discharged out of the system through these gaps, and even if they are captured, they are deposited in the air bubbles, as seen in other closed-cell whetstones. , it is difficult to cause undesirable phenomena such as clogging.In the case of a closed cell structure, the polishing effect lacks sustainability due to clogging, and frequent dressing operations (surface renewal) are required.
上述の効果が十分に得られるのは、平均気孔径10乃至
100μmの範囲であり、これを下回ると密すぎて、目
詰まり等の現象が出易い。また、これを上回ると、構造
的に粗すぎて物性の均一性という面でや1難がある。The above-mentioned effects can be sufficiently obtained within the range of average pore diameter of 10 to 100 μm; below this range, the pores are too dense and phenomena such as clogging tend to occur. Moreover, if it exceeds this, the structure will be too rough and there will be some difficulty in terms of uniformity of physical properties.
また気孔率は60〜85容′kk%の範囲にあることが
好ましい。60容量チ未満の場合は、独立気泡が存在す
るようになり、85%容量を超えると強度の面でや1不
十分なものとなる。Further, the porosity is preferably in the range of 60 to 85 volume'kk%. If the capacity is less than 60%, closed cells will be present, and if it exceeds 85% capacity, the strength will be insufficient.
砥粒の結合材としてポリビニルアセクール系樹脂と熱硬
化性樹脂の硬化体および珪酸塩の非晶体を用いた合成砥
石は特開昭61−192480号公報により公知のもの
であるが、この合成砥石は熱硬化性樹脂硬化体を配合し
ているため耐水性があり、また珪酸塩の非晶体を併用し
ているので軟質金属研磨用砥石として、極めて好ましい
研削力を有し、特に砥石自体の摩耗も少なく、且つ、目
詰まり等好ましからざる現象を引き起こしにくい性能が
付与されるのである。結合材であるマトリックスとして
上述の如く、ポリビニルアセタール系樹脂に熱硬化性樹
脂の硬化体、及び珪酸塩の非晶体を併用することにより
ポリビニルアセタール系合成砥石に特有な靭性(ねばり
)を低減せしめ、適度な冷性(もろさ)を有する合成砥
石となるものであり、持に珪酸塩非晶体は砥石に適度な
脆性を付与し、且つ、その研削力を向上させるという優
れた効果を有する。A synthetic whetstone using a hardened polyvinyl acecool resin, a thermosetting resin, and an amorphous silicate as a binder for abrasive grains is known from JP-A-61-192480. Because it contains a hardened thermosetting resin, it is water resistant, and because it also contains an amorphous silicate, it has extremely favorable grinding power as a grindstone for polishing soft metals, and it especially reduces wear on the grindstone itself. This provides performance that reduces the amount of water and causes less undesirable phenomena such as clogging. As mentioned above, the toughness (stickiness) characteristic of polyvinyl acetal synthetic grinding wheels is reduced by using polyvinyl acetal resin, a cured thermosetting resin, and an amorphous silicate as the matrix, which is a binding material. This is a synthetic whetstone with appropriate coldness (brittleness), and the amorphous silicate has the excellent effect of imparting appropriate brittleness to the whetstone and improving its grinding power.
本発明でどう熱硬化性樹脂としては、メラミン系樹脂、
フェノール系樹脂、尿素系樹脂、熱硬化型ウレタン系樹
脂、エポキシ樹脂等が挙げられるが、通常はメラミン系
樹脂、フェノール系樹脂が用いられる。In the present invention, the thermosetting resin includes melamine resin,
Examples include phenolic resins, urea resins, thermosetting urethane resins, and epoxy resins, but melamine resins and phenol resins are usually used.
本発明でどう珪酸塩の非晶体とは、二酸化珪素と各種の
塩基からなる種々の珪酸塩に酸を作用させることによっ
て生ずるゲル状物質を指し、塩基としては、例えばソー
ダ灰と使用した珪酸塩の場合、NazO・x8i0z
” yHtOなる化学式で示されるものであり、Nax
O/5iOtのモル比が2及び4のものを用いることが
好ましい。この場合、ゲル状物質の一般式は、
で示される無機高分子体が分子間架橋をし、非結晶性の
三次元化合物となったものとなる。塩基としては、この
他、水酸化アルミ等を用いる場合もある。In the present invention, the amorphous form of dosilicate refers to a gel-like substance produced by the action of acid on various silicates made of silicon dioxide and various bases. In the case of NazO・x8i0z
” It is represented by the chemical formula yHtO, and Nax
It is preferable to use those having a molar ratio of O/5iOt of 2 and 4. In this case, the general formula of the gel-like substance is an inorganic polymer represented by intermolecular crosslinking to form an amorphous three-dimensional compound. In addition to this, aluminum hydroxide or the like may be used as the base.
上記結合材マトリックスは、研磨の主材である砥粒微細
粒子を効果的に把持する役割をはだすもので、研磨作業
に際しては、1つの砥粒が表面を研磨して、系外に排除
されると同時に新しい低粒を自生させ、研磨作業を継続
させてゆくもの、すなわち、砥石は自身摩耗しつつ、研
磨を行うものであるが、上記珪酸塩非晶体の併用により
マトリックス自体も若干の研削力を有するものとなり得
、研削力が格段に向上すると同時釦砥石自体の摩耗も低
減し得るものである。The above-mentioned binder matrix plays the role of effectively holding fine abrasive particles, which are the main material of polishing. During polishing work, one abrasive grain polishes the surface and is eliminated from the system. At the same time, the grinding wheel generates new low-grade grains and continues the polishing work. In other words, the grindstone itself performs the polishing process while wearing itself. However, by using the silicate amorphous material mentioned above, the matrix itself also undergoes some grinding. The grinding force can be improved significantly, and at the same time, the wear of the button grindstone itself can be reduced.
マトリックス中に混合されるもう一つの成分である多価
アルコールは砥粒の結合材としてではなく、水の浸透剤
として添加されるものであり、マトリックス自体5も親
水性を有するものとなり得、水が急速に内部に浸透し、
f潤による歪が発生せず、ひび割れを防止し得るもので
ある。The polyhydric alcohol, which is another component mixed into the matrix, is added not as a binding material for abrasive grains but as a water penetrating agent, and the matrix itself 5 can also be hydrophilic, making it difficult to absorb water. rapidly penetrates into the inside,
Strain due to moisture does not occur, and cracks can be prevented.
ここで、多価アルコールとは、多価アルコールないし、
その誘導体、あるいはその重合体を指すものであるが、
通常はグリセリン、グリコール類。Here, polyhydric alcohol refers to polyhydric alcohol or
It refers to its derivatives or its polymers,
Usually glycerin or glycols.
ベトリオール(例えば商品名「クラレイソブレン拳ケミ
カル」)、エタノールアミン等が用いられる。この中で
も特に不揮発性(蒸気圧が極めて低い)、低毒性、可塑
効果のある吸湿性に富むものが好ましい。Vetriol (for example, trade name "Kurarayobrenken Chemical"), ethanolamine, etc. are used. Among these, those that are non-volatile (very low vapor pressure), have low toxicity, have a plasticizing effect and are highly hygroscopic are particularly preferred.
また、本発明に85砥粒微細粒子とは、ダイヤモンド、
窒化ホウ素、炭化珪素、熔融アルミナ。In addition, in the present invention, 85 abrasive fine particles include diamond,
Boron nitride, silicon carbide, fused alumina.
ガーネット、エメリー、酸化セリウム、酸化クロム等研
削力を有する化合物または単体からなる研磨材料のいず
れかを粉砕し、適当な方法にてJIS規格R6001に
規定された粒度に分級されたものを指すものであるが、
炭化珪素、熔融アルミナ。Refers to grinding materials made from compounds or single substances with grinding power, such as garnet, emery, cerium oxide, and chromium oxide, which are then classified using an appropriate method to the particle size specified in JIS Standard R6001. Yes, but
Silicon carbide, fused alumina.
酸化クロム、酸化セリウムよりなる群から選ばれた超硬
セラミックス砥粒の少なくとも1種を選定することが望
ましい。It is desirable to select at least one type of cemented carbide ceramic abrasive grains selected from the group consisting of chromium oxide and cerium oxide.
更に、本発明における要点は、研磨性能を持つ砥粒の配
位・分布状態に係る点である。すなわち、この種の合成
砥石においては、研摩面に存在する砥粒々子が摩擦して
脱落し、系外に排出されるという現象を縁り返し、砥石
は自らの厚みを減少させつつ、被研磨体表面を研磨して
ゆくものであるが、砥粒の比率が少ないと、1個の砥粒
が独立して存在することとなり、その砥粒が脱落した後
は、ミクロ的見方をすれば結合材のみで表面を摺擦する
。すなわち研磨力の少ない部分での摺擦を行う為、切れ
味(研削力)が劣るものとなる。特に本発明の如く、ア
ルミディスク等軟質金属の表面研磨を目的とする場合、
かかる現象は好ましくなく、表面斑、研磨斑等の問題に
つながり易い。Furthermore, the key point of the present invention is the coordination and distribution state of abrasive grains having polishing performance. In other words, in this type of synthetic whetstone, the abrasive grains existing on the polishing surface are rubbed off, fall off, and are discharged from the system. It polishes the surface of the body, but if the ratio of abrasive grains is small, each abrasive grain will exist independently, and after that abrasive grain falls off, from a microscopic point of view, it will not bond. Rub the surface with only the wood. In other words, since the rubbing is performed in areas with low abrasive force, the sharpness (grinding force) is poor. Especially when the purpose is to polish the surface of a soft metal such as an aluminum disk, as in the present invention,
Such a phenomenon is undesirable and tends to lead to problems such as surface unevenness and polishing unevenness.
本発明においては、かかる好ましからざる現象を回避す
る為、個々の砥粒がマトリックス中で各々独立して存在
せず、隣接した砥粒々子と相互に連接し、実質的に連続
した状態をなして分布していることが必要となる。かか
る砥粒の状態は、砥石のマトリックスが、60〜85容
凰チという高い気孔率をもって三次元的に均一に連通し
た、平均孔径10〜100μmの連続気孔構造をなし、
このようなマトリックスの微細骨格中に適度な粒度の砥
粒微細粒が充分な盪をもって、所謂、目白押しをなして
配位され、均一に分布していることに由来する。また、
かかる配位・分布を確実にするための好適な砥粒番手は
、少なくとも800番、含有量は混合体重量の25重鳳
チ以上、更に好適には混合体重量の50!量チ以上であ
る。In the present invention, in order to avoid such undesirable phenomena, individual abrasive grains do not exist independently in the matrix, but are interconnected with adjacent abrasive grains, forming a substantially continuous state. It needs to be distributed. The state of such abrasive grains is such that the matrix of the grinding wheel has a continuous pore structure with an average pore diameter of 10 to 100 μm, which is uniformly connected three-dimensionally with a high porosity of 60 to 85 μm,
This is due to the fact that fine abrasive grains of appropriate particle size are arranged in the fine skeleton of such a matrix with sufficient agitation, so to speak, and are uniformly distributed. Also,
In order to ensure such coordination and distribution, a suitable abrasive grain count is at least 800, and the content is 25 or more times the weight of the mixture, more preferably 50 times the weight of the mixture. It's more than enough.
そして、砥粒番手が低い程、すなわち砥粒々径が大きい
程、硬度を高めにすることが好ましい。Further, it is preferable that the lower the abrasive grain count, that is, the larger the diameter of the abrasive grains, the higher the hardness.
本発明にかかる砥石は次の如き方法にて製造される。The grindstone according to the present invention is manufactured by the following method.
すなわち、平均重合度300〜2000.鹸化度80モ
ル%以上のポリビニルアルコール、その誘導体または変
性体の1皿あるいはそれ以上を混合して水溶液となし、
それに熱硬化性樹脂のモノマー オリゴマーあるいは重
合体等からなる前駆体の水溶液、非水溶媒溶液、エマル
ジョン等、および珪酸塩の水溶液またはコロイドを加え
て均一に撹拌し更に砥粒、架槁剤としてのアルデヒド類
、瀦媒としての酸類、及び気孔生成剤としての澱粉。That is, the average degree of polymerization is 300 to 2000. Mixing one or more plates of polyvinyl alcohol with a degree of saponification of 80 mol% or more, its derivatives or modified products to form an aqueous solution,
To this, an aqueous solution, nonaqueous solvent solution, emulsion, etc. of a precursor consisting of a thermosetting resin monomer, oligomer or polymer, etc., and an aqueous solution or colloid of a silicate are added and stirred uniformly. aldehydes, acids as a filtration medium, and starch as a pore-forming agent.
類等を加え、均一粘稠スラリーを調製し、これを所定の
型枠に注型する。然る後、40乃至100°Cの温度に
て約−昼夜、腸浴あるいはその他の浴中で反応固化を行
なった後取り出し、水洗いして余剰のアルデヒド類、酸
類、気孔生成剤を除去し中間体を得る。etc. to prepare a uniformly viscous slurry, which is poured into a predetermined mold. After that, reaction solidification is carried out in an intestinal bath or other bath at a temperature of 40 to 100°C day and night, and then taken out and washed with water to remove excess aldehydes, acids, and pore-forming agents. Get a body.
次に熱硬化性樹脂のモノマー オリゴマーあるいは重合
体等からなる前駆体の水溶液、非水溶媒溶液、エマルシ
ヨン等、および多価アルコールないしその誘導体あるい
はその重合体を加えて均一に撹拌した溶液を準備し、前
記中間体をこれに含浸し、所定量に絞った後、100°
C程度の温度で加熱し水分を蒸発除去、乾燥する。その
後樹脂の硬化を行なう為の熱処理(キユアリング)f、
行なわねばならないが、キユアリングに必要な温度およ
び時間は使用した樹脂の種類および量によって微妙に異
なるものである。−船釣には100乃至250℃で20
乃至100時間のキユアリングを施せば、硬化反応はほ
ぼ達成される。Next, a solution is prepared by adding an aqueous solution, a non-aqueous solvent solution, an emulsion, etc. of a precursor consisting of a monomer, oligomer, or polymer of a thermosetting resin, and a polyhydric alcohol, its derivative, or its polymer, and stirring uniformly. , impregnated with the intermediate, squeezed to a predetermined amount, and then heated at 100°
Heat at a temperature of about C to evaporate moisture and dry. After that, heat treatment (curing) f for curing the resin,
However, the temperature and time required for curing will vary slightly depending on the type and amount of resin used. -20℃ at 100 to 250℃ for boat fishing
If curing is performed for 100 hours, the curing reaction is almost completed.
硬化が不充分であると靭性が大きく、まtコキュアリン
グ条件が過酷で硬化が進みすぎると熱分解が同時に生起
し、好ましからざる現象が起こり易いので、条件の選定
は慎重に行なう必要がある。If the curing is insufficient, the toughness will be high, and if the cocuring conditions are harsh and the curing progresses too much, thermal decomposition will occur at the same time, which is likely to cause undesirable phenomena, so conditions must be selected carefully. .
またキユアリングにおいて急激な昇温を避ける為、段階
的な昇温を行なったり、不活性ガス雰囲気の中で行ない
局部的酸化・劣化を抑制することも有効である。更に熱
硬化を促進するための触媒を併用することも有効である
。In order to avoid rapid temperature rise during curing, it is also effective to raise the temperature in stages or to perform it in an inert gas atmosphere to suppress local oxidation and deterioration. Furthermore, it is also effective to use a catalyst to promote thermal curing.
液状の樹脂は、水溶液、有機溶剤に溶解した溶液、エマ
ルシヨン、あるいは樹脂原液のいずれも使用しうるが、
作業性および混合比のコントロールのし易さから見て、
水溶液を使用する方法が最も好適である。The liquid resin may be an aqueous solution, a solution dissolved in an organic solvent, an emulsion, or a resin stock solution.
From the viewpoint of workability and ease of controlling the mixing ratio,
The method using an aqueous solution is most preferred.
(作用)
前述の如くして得られた砥石は所望の形状に成型された
後、水中に投入し、12時間以上放置し、完全に湿潤状
態に到らしめ、最大2チ程度膨潤させ安定した後軟質金
属の表面研磨用途に供せられるが、特にアルミディスク
等、特殊アルミ合金の環状盤の表面研磨の如き、極めて
精密な用途に供せられる場合、研磨前後の厚み、すなわ
ち研削屑が精度高く定められており、しかも平坦度、厚
みのバラツキが極端におさえられている為、−船釣な研
磨装置には適用されにりく、例えば両面ラッピング式研
磨機等、極めて精密な装置に装着して用いることが好ま
しい。ここで両面ラッピング式研磨機とは、円形または
環形盤状の金属性定盤を上下両面に備え、その間に被研
磨体を1枚またはそれ以上挾みこんで圧着し、上下両定
盤を逆方向に回転せしめ、被研磨体表面を摺動擦過して
、研磨を行なう装置を言い、本発明になる砥石を適用す
る場合には、まず、水中に投入し、12時間以上放置し
、完全に湿潤状態に到らしめ、最大2%程度膨潤させ安
定させるのである。その際、多価アルコール(誘導体、
重合体を含む)をマトリックス中に含有せしめているの
で、多価アルコールが浸透剤として働き、水が急速に内
部に浸透するので、膨潤による歪が発生せず、従ってひ
び割れが発生しないのである。(Function) After the whetstone obtained as described above was molded into the desired shape, it was placed in water and left for 12 hours or more to reach a completely wet state, swell by about 2 inches at most, and become stable. It is used for surface polishing of soft metals, but especially when it is used for very precise purposes such as surface polishing of special aluminum alloy annular discs such as aluminum disks, the thickness before and after polishing, that is, the grinding debris, will affect the accuracy. Because the flatness and thickness variations are extremely suppressed, it is difficult to apply it to polishing equipment used on boats; for example, it cannot be installed in extremely precise equipment such as double-sided lapping polishing machines. It is preferable to use it. Here, a double-sided lapping type polishing machine is equipped with circular or ring-shaped metal surface plates on both the upper and lower surfaces, and one or more objects to be polished are sandwiched between them and crimped, and both the upper and lower surface plates are rotated in opposite directions. When applying the grindstone of the present invention, it is first placed in water and left for at least 12 hours to completely wet the surface of the object to be polished. This is achieved by allowing the material to swell by a maximum of 2% and stabilize. At that time, polyhydric alcohols (derivatives,
Since the polyhydric alcohol acts as a penetrant and water quickly penetrates into the matrix, distortion due to swelling does not occur, and therefore cracks do not occur.
次に砥石が均一表面を形成するよう両定盤にこれを装着
して用いるのである。稼動時には研磨助剤たる液体を適
量流して、研磨面を濡らしつつ研磨が行なわれるもので
あるが、ここで用いられる液体、所謂、研磨液は、水、
ある皿の界面活性剤を含んだ水、あるいは有機溶剤等で
ある。Next, the grindstone is attached to both surface plates so that it forms a uniform surface. During operation, polishing is performed by flowing an appropriate amount of a polishing aid liquid to wet the polishing surface, but the liquid used here, the so-called polishing liquid, is water,
This may be water containing a surfactant in a dish, or an organic solvent.
かくして本発明になる砥石を両面ラッピング式研磨機に
装着し、例えばアルミディスクの研磨を行なうと、優れ
た耐水性と砥粒保持力とを有するマトリックス樹脂中に
均−且つ緻密に充填され、相互に連接した砥粒微細粒子
は、その砥粒番手とマトリックスの適度な硬度、弾性、
脆性などに由来する砥石表面硬度と相俟って、冴えた切
れ味、すなわち研磨力を示し、また砥粒粒子は摺擦研磨
作用により順次脱落しても背後に連接した新しい砥粒が
表面に現れて、砥面が直ちに更新再生されるとともに、
研磨剤、脱落砥粒等は連続微細気孔から排出され易いた
め、目詰まりを起こし難いから、高い研磨力が長期に亙
って維持される。また、本発明砥石の超微細砥粒の前述
せる特殊な配位自分布状態のために、研磨作業時、マト
リックス樹脂のみによる摺擦現象を生ずることなく、平
坦な被研磨体全面に亙って砥粒粒子が接触・摺擦し、常
時均一な研磨作用が行なわれる。従って、本発明砥石は
平坦な平面を有する軟質金属板に、研磨斑のない、高い
平滑度と優れた仕上がり面精度とを効率良く与九るもの
である。Thus, when the grinding wheel of the present invention is installed in a double-sided lapping type grinding machine to polish, for example, an aluminum disk, the grinding wheel is evenly and densely packed into the matrix resin, which has excellent water resistance and abrasive grain retention, and mutually The abrasive fine particles connected to the abrasive grain count and matrix have appropriate hardness, elasticity,
Combined with the hardness of the surface of the whetstone, which is derived from brittleness, it exhibits sharp cutting ability, that is, abrasive power, and even if the abrasive grains fall off one by one due to the abrasive action, new abrasive grains connected to the back appear on the surface. The abrasive surface is immediately refreshed and regenerated.
Abrasives, fallen abrasive grains, etc. are easily discharged from the continuous fine pores and are less likely to cause clogging, so high polishing power is maintained over a long period of time. In addition, due to the above-mentioned special coordination self-distribution state of the ultrafine abrasive grains of the grinding wheel of the present invention, during polishing work, the entire surface of the flat object to be polished can be coated without any rubbing phenomenon caused only by the matrix resin. The abrasive particles come into contact and rub against each other, and a uniform polishing action is performed at all times. Therefore, the grindstone of the present invention efficiently provides a soft metal plate having a flat surface with high smoothness without polishing spots and excellent finished surface accuracy.
(実施例) 以下実施例に従い本発明の実施態様を説明する。(Example) Embodiments of the present invention will be described below with reference to Examples.
砥粒として、炭化珪素粉末の3000番のものを選定し
た。3000番は平均粒径5.5〜4.5pmのもので
ある。重合度1700、完全鹸化のポリビニルアルコー
ルを水溶液となし、これに水溶性フェノール樹脂として
住人デュレズ■製P几−961Aを所定量と、触媒とし
ての硫酸、架橋剤としてのホルムアルデヒド、気孔生成
剤としてのコーンスターチとを加え、さらに二酸化珪素
にソーダ灰を加えた珪酸塩の水溶液を所定量加えた後、
前述砥粒と混合して均一のスラリー状液を調製した。こ
のスラリー液を所定の型枠に注型し、8゜Cにて1昼夜
反応固化せしめた。しかる後、水洗いし、過剰の酸、ホ
ルムアルデハイド、コーンスターチ等を除去して乾燥し
合成砥石の中間体を得た。また、水溶液のメラミン樹脂
として昭和高分子■製8M−700の水溶液の所定量と
グリセリンとして第一工業製薬■製DGの所定量を均一
に撹拌した溶液を準備し、前記中間体をこれに含浸し、
所定量に絞った後、乾燥し、130°Cの温度にて約5
0時間熱処理を行ない、硬化体を得た。As the abrasive grains, silicon carbide powder No. 3000 was selected. No. 3000 has an average particle size of 5.5 to 4.5 pm. Completely saponified polyvinyl alcohol with a degree of polymerization of 1700 is made into an aqueous solution, and a predetermined amount of P-961A manufactured by Jurez ■ is added as a water-soluble phenol resin, sulfuric acid is used as a catalyst, formaldehyde is used as a crosslinking agent, and formaldehyde is used as a pore forming agent. After adding cornstarch and a predetermined amount of a silicate aqueous solution containing silicon dioxide and soda ash,
A uniform slurry liquid was prepared by mixing with the abrasive grains described above. This slurry liquid was cast into a predetermined mold and allowed to react and solidify at 8°C for one day and night. Thereafter, it was washed with water to remove excess acid, formaldehyde, cornstarch, etc., and dried to obtain an intermediate for a synthetic grindstone. In addition, a solution was prepared by uniformly stirring a predetermined amount of an aqueous solution of 8M-700 manufactured by Showa Kobunshi ■ as an aqueous solution of melamine resin and a predetermined amount of DG manufactured by Daiichi Kogyo Seiyaku ■ as glycerin, and the intermediate was impregnated into this solution. death,
After squeezing it to a specified amount, dry it and heat it at a temperature of 130°C for about 50 minutes.
Heat treatment was performed for 0 hours to obtain a cured product.
かくして得られた硬化体を、第1図に示すが如き厚さ5
0mmの略扇形の形状(1)に切断成形し、本発明実施
例の合成砥石を得た。The thus obtained cured product has a thickness of 5 as shown in FIG.
It was cut and formed into a substantially fan-shaped shape (1) of 0 mm to obtain a synthetic grindstone of an example of the present invention.
本実施例で用いた砥石の組成は第1表に示す。The composition of the grindstone used in this example is shown in Table 1.
かくして得られた砥石を10°Cの大気中に24時間放
置後砥石表面の硬度を測定した後、砥石の底面を18°
Cの水に浸し砥石の上面まで水が浸透するまでの時間を
測定した。但し、硬度の測定は下記の条件で行なった。After leaving the thus obtained whetstone in the atmosphere at 10°C for 24 hours, the hardness of the whetstone surface was measured, and the bottom surface of the whetstone was bent at an angle of 18°.
The grindstone was immersed in water and the time required for the water to penetrate to the top surface of the grindstone was measured. However, the hardness was measured under the following conditions.
硬度計 松沢精機社製ロックウェル硬度計型式 E[A
RDNE88 TE8TERRXT−2型表面硬度測定
条件 ロックウエルスパーフィ結果を以下の第
シτル15−Yスケール
荷 重 15 kg
測定子 1/21nch鋼球
1表に記す。Hardness meter Rockwell hardness meter manufactured by Matsuzawa Seiki Co., Ltd. Model E[A
RDNE88 TE8TERRXT-2 type surface hardness measurement conditions Rockwell Sparphy results are shown in Table 1 below.
(以・・、下、合口)
第1表から明らかな如く、水の浸透時間から判断して水
を均一に速く含浸させるためには、1wtチ以上のグリ
セリンを含有させないとその効果が得られないことがわ
かる。また、特開昭61−192480号公報、特開昭
61−182774号公報に記載されているように砥粒
番手が3000番の場合ロックウェル硬度−180〜−
210の範囲内にある砥石がアルミディスク原盤を優れ
た平坦度と高い面精度に研磨仕上げできる基準ととらえ
ることができる。前記公報にも記載されであるように、
一般に硬度の高い砥石で研磨するとアルミディスクの仕
上がり面の面精度が粗< (Raが大きく)なる。また
反対に軟質になると砥石が目詰り現象を起こしきれが悪
くなり仕上がり面の平坦度も悪くなる。これらのことを
考慮すると、グリセリン付着量が10wt%以上の砥石
は硬質でアルミディスクの研磨には不適であると考えら
nる。よってグリセリンの含有率は、重量比において1
−10%であるように調製することが望ましい。(Hereinafter, below, abutment) As is clear from Table 1, in order to uniformly and quickly impregnate water, judging from the water penetration time, the effect cannot be obtained unless 1wt or more of glycerin is included. It turns out that there isn't. Furthermore, as described in JP-A-61-192480 and JP-A-61-182774, when the abrasive grain count is 3000, the Rockwell hardness is -180 to -
A grindstone within the range of 210 can be considered as a standard for polishing an aluminum disk master to excellent flatness and high surface precision. As stated in the above publication,
Generally, when an aluminum disk is polished with a highly hard whetstone, the finished surface of the aluminum disk will have rough surface precision (Ra is large). On the other hand, if the grinding wheel becomes soft, the grinding wheel will become clogged, making it difficult to grind and the flatness of the finished surface will also deteriorate. Considering these points, it is considered that a grindstone with a glycerin adhesion amount of 10 wt% or more is hard and unsuitable for polishing an aluminum disk. Therefore, the content of glycerin is 1 in weight ratio.
-10%.
(発明の効果)
以上詳述した様に、本発明による合成砥石は、冬期に砥
石を室温(使用雰囲気)で保管したのち、水中に投入す
る必要がなく、必要な時にすぐに(資)えるため作業性
が向上するのである。(Effects of the Invention) As detailed above, the synthetic whetstone according to the present invention does not require storing the whetstone at room temperature (usage atmosphere) during the winter and then putting it into water, so it can be used immediately when needed. This improves work efficiency.
また、本発明による合成砥石は優れた平坦度と高い面精
度とを同時に備えた、軟質金属板、例えばアルミディス
クを効率良く経済的有利に取得することが可能となった
ため、電子工業、事務機器産業等の発達に伴う情報蓄積
媒体としての高精度仕上アルミディスク等の品質向上な
らびに急速な需要増に十分対処することができると共に
、研磨作業効率の上昇は生産加工コストの低wtを可能
とするなど産業界への寄与は頗る大である。In addition, the synthetic whetstone according to the present invention makes it possible to efficiently and economically obtain soft metal plates, such as aluminum disks, which have both excellent flatness and high surface precision, and is used in the electronic industry, office equipment, etc. It is possible to fully cope with the quality improvement and rapid increase in demand for high-precision finished aluminum disks as information storage media accompanying the development of industry, etc., and the increase in polishing work efficiency makes it possible to lower production and processing costs wt. The contribution to industry is enormous.
第1図は本発明砥石の使用状況を説明するためのラッピ
ング式研磨機のラッピング盤の斜視図である。
(1)・・・砥石、 (2)・・・取付板、
(3)・・・ラッピング盤。FIG. 1 is a perspective view of a lapping machine of a lapping type polishing machine for explaining the usage of the grindstone of the present invention. (1)...Whetstone, (2)...Mounting plate,
(3)...wrapping disc.
Claims (2)
体であって、該組織がポリビニルアセタール系樹脂と少
なくとも一種の熱硬化性樹脂の硬化体と珪酸塩の非晶体
と多価アルコールないしその誘導体あるいはその重合体
との均一混合体よりなるマトリックスと、該マトリック
ス中において相連接し実質的に連続状態をなして存在す
る砥粒微細粒子との混合体からなることを特徴とする合
成砥石。(1) A structure having a three-dimensional network structure with continuous fine pores, which structure consists of a polyvinyl acetal resin, a cured product of at least one thermosetting resin, an amorphous silicate, and a polyhydric alcohol. A synthetic whetstone characterized by comprising a matrix consisting of a homogeneous mixture with a derivative thereof or a polymer thereof, and a mixture of fine abrasive grains that are interconnected and exist in a substantially continuous state in the matrix. .
の重合体の含有率が、重量比において1〜10%の範囲
である請求項(1)記載の合成砥石。(2) The synthetic whetstone according to claim 1, wherein the content of the polyhydric alcohol, its derivative, or its polymer is in the range of 1 to 10% by weight.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2358389A JP2684607B2 (en) | 1989-01-31 | 1989-01-31 | Synthetic whetstone |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2358389A JP2684607B2 (en) | 1989-01-31 | 1989-01-31 | Synthetic whetstone |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02202525A true JPH02202525A (en) | 1990-08-10 |
JP2684607B2 JP2684607B2 (en) | 1997-12-03 |
Family
ID=12114599
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2358389A Expired - Fee Related JP2684607B2 (en) | 1989-01-31 | 1989-01-31 | Synthetic whetstone |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2684607B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008183640A (en) * | 2007-01-26 | 2008-08-14 | Hiroshi Ishizuka | Diamond dispersed synthetic resin molding material and its manufacturing method |
-
1989
- 1989-01-31 JP JP2358389A patent/JP2684607B2/en not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008183640A (en) * | 2007-01-26 | 2008-08-14 | Hiroshi Ishizuka | Diamond dispersed synthetic resin molding material and its manufacturing method |
Also Published As
Publication number | Publication date |
---|---|
JP2684607B2 (en) | 1997-12-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH052466B2 (en) | ||
US4255164A (en) | Fining sheet and method of making and using the same | |
TW461845B (en) | Abrasive tools for grinding electronic components | |
US3928949A (en) | Hollow body grinding materials | |
USRE29808E (en) | Hollow body grinding materials | |
JP2523971B2 (en) | Abrasive article | |
JP7264663B2 (en) | Whetstone and method for manufacturing whetstone | |
KR20000047696A (en) | A member for polishing, surface plate for polishing and polishing method using the same | |
CN102066055B (en) | Self-bonded foamed abrasive articles and machining with such articles | |
JP2694705B2 (en) | Synthetic grindstone for high-purity aluminum substrate polishing | |
JPH02202525A (en) | Synthetic grinding stone | |
JP2593829B2 (en) | Synthetic whetstone | |
JPH05188B2 (en) | ||
JPH02185374A (en) | Synthetic grindstone | |
JPH02185373A (en) | Synthetic grindstone | |
JPH0360970A (en) | Polishing surface plate | |
JPH04122571A (en) | Precision polishing method for ceramics | |
JP2555000B2 (en) | Polishing method for hard and brittle materials | |
JPS61197164A (en) | Synthetic grindstone and its production method | |
JPS61209880A (en) | Precise polishing of hard metal surface | |
JPS62251078A (en) | Grinding material | |
JP2696776B2 (en) | Synthetic whetstone and method of manufacturing the same | |
JP2687241B2 (en) | Diamond grindstone manufacturing method | |
JPS62246474A (en) | Manufacture of super abrasive grain grindstone for mirror-like surface finishing | |
JPH0763936B2 (en) | Grinding stone and method for manufacturing the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080815 Year of fee payment: 11 |
|
LAPS | Cancellation because of no payment of annual fees |