JPH02201989A - Self-oscillation semiconductor laser device - Google Patents
Self-oscillation semiconductor laser deviceInfo
- Publication number
- JPH02201989A JPH02201989A JP2041589A JP2041589A JPH02201989A JP H02201989 A JPH02201989 A JP H02201989A JP 2041589 A JP2041589 A JP 2041589A JP 2041589 A JP2041589 A JP 2041589A JP H02201989 A JPH02201989 A JP H02201989A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor laser
- self
- diodes
- laser
- oscillation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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- Semiconductor Lasers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はパルス自励発振動作を行う半導体レーザに関す
るものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a semiconductor laser that performs pulsed self-oscillation operation.
従来、半導体レーザにおけるパルス自励発振回路とシテ
ハ第2図に示すもノ(SOVIBT PHYSIC3−
3BMICONDIICTORYS、 Yol、 2.
No、 8. p、 1012. February
、 1969)が知られている。Conventionally, the pulse self-excited oscillation circuit in a semiconductor laser and the circuit shown in Figure 2 (SOVIBT PHYSIC3-
3BMICONDIICTORYS, Yol, 2.
No, 8. p, 1012. February
, 1969) is known.
第2図において、左側の素子200がタンデム電極型レ
ーザダイオードを示し、右側の素子201がホトダイオ
ードである。この回路ではパルス発生器202からパル
ス的に電流を供給し、光増幅部200aでレーザ発振を
生じさせ、レーザ光をホトダイオード201で検出し、
電気信号に変えてタンデム電極型レーザダイオード20
0の光吸収部200bに帰還をかけ、レーザ発振を抑え
るという原理によって自励発振を生じさせている。In FIG. 2, an element 200 on the left side is a tandem electrode type laser diode, and an element 201 on the right side is a photodiode. In this circuit, a pulse generator 202 supplies current in a pulsed manner, an optical amplification section 200a generates laser oscillation, and a photodiode 201 detects the laser beam.
Tandem electrode type laser diode 20 instead of electric signal
Self-sustained oscillation is generated based on the principle of suppressing laser oscillation by applying feedback to the zero light absorption section 200b.
しかしながら、第2図に示す自励発振回路では、光を検
出するためのホトダイオードがレーザダイオードの他に
必要であり、そのための周辺結線回路も複雑になるとい
う問題がある。However, the self-excited oscillation circuit shown in FIG. 2 requires a photodiode for detecting light in addition to the laser diode, and there is a problem in that the peripheral connection circuit for this also becomes complicated.
本発明は上記問題点を解決するためのもので、半導体レ
ーザダイオード以外に他の素子を必要とせず、その結果
周辺結線回路を不要とした自励発振半導体レーザ装置を
提供することを目的とする。The present invention is intended to solve the above-mentioned problems, and aims to provide a self-oscillation semiconductor laser device that does not require any other elements other than a semiconductor laser diode, and as a result does not require peripheral connection circuits. .
第1図は本発明の自励発振半導体レーザ装置を示す図で
、第1図(a)は上面図、第1図(b)は第1図(a)
のA−A断面図である。図中、100は自励発振半導体
レーザ装置、101は高抵抗GaAs基板、]、 02
は高抵抗AlGaAs層、103はGaAs活性層、1
04はアンドープAAGaAsクラッド層、105aは
p−AflGaΔSクラッド層、105bはn −、A
12 G a A sクラッド層、106aはp−G
aAsキー?ツブ層、106bはn −G a A S
キャンプ層、107aはn電極、107bはn電極、1
.10はアンドープAfGaAsクラッド層である。FIG. 1 is a diagram showing a self-oscillation semiconductor laser device of the present invention, where FIG. 1(a) is a top view, and FIG. 1(b) is a top view.
It is an AA sectional view of. In the figure, 100 is a self-oscillation semiconductor laser device, 101 is a high-resistance GaAs substrate, ], 02
is a high resistance AlGaAs layer, 103 is a GaAs active layer, 1
04 is an undoped AAGaAs cladding layer, 105a is a p-AflGaΔS cladding layer, 105b is an n-, A
12 Ga As cladding layer, 106a is p-G
aAs key? The whelk layer, 106b is n-Ga A S
camp layer, 107a is an n-electrode, 107b is an n-electrode, 1
.. 10 is an undoped AfGaAs cladding layer.
第1図(b)において、高抵抗GaAs基板101上に
高抵抗AlGaAs層102を形成し、その上にGaA
s活性層103、アンドープAl1GaAsクラッド層
104を形成した後、活性層の左右にp A/GaA
sクラッド層105a。In FIG. 1(b), a high resistance AlGaAs layer 102 is formed on a high resistance GaAs substrate 101, and a GaAs layer 102 is formed on the high resistance GaAs substrate 101.
After forming the s active layer 103 and the undoped Al1GaAs cladding layer 104, p A/GaA is formed on the left and right sides of the active layer.
s cladding layer 105a.
n−Aj!GaAsクラッド@to5bを埋め込み形成
し、さらに活性層左右のクラッド層上にそれぞれキ+
ツブ層p−GaAs 106 a%n−GaAs106
b、I)電極107a、n電極107bを形成した構造
となっている。そして、第1図(a)に示すように高抵
抗層110で半導体レーザの電極を分離して光増幅領域
と光検出領域とを形成し、光増幅領域のダイオードのp
およびn電極と、光検出領域のnおよびn電極をそれぞ
れ逆接続することにより自励発振光回路を構成している
。n-Aj! A GaAs cladding@to5b is buried and formed, and a gate is formed on each of the cladding layers on the left and right sides of the active layer.
Tube layer p-GaAs 106 a%n-GaAs106
b, I) It has a structure in which an electrode 107a and an n-electrode 107b are formed. Then, as shown in FIG. 1(a), the electrodes of the semiconductor laser are separated by a high resistance layer 110 to form a light amplification region and a light detection region.
A self-oscillation optical circuit is constructed by connecting the n electrode and the n and n electrodes of the photodetection region in reverse, respectively.
本発明の詳細な説明する。 The present invention will be described in detail.
第1図(a)において左側のダイオードは順方向にバイ
アスされ、電流が活性層103に流れることにより、レ
ーザ発振を生じて光増幅(発生)領域として動作する。In FIG. 1(a), the diode on the left side is biased in the forward direction, and current flows into the active layer 103, thereby generating laser oscillation and operating as a light amplification (generation) region.
一方、右側のダイオードは第1図(a)のように結線す
ると、逆バイアスがかかり、光検出器として動作する。On the other hand, when the diode on the right is connected as shown in FIG. 1(a), it is reverse biased and operates as a photodetector.
即ち、右側ダイオードの活性層を伝搬するレーザ光の一
部が吸収され、光電流を発生する。その電流の向きは左
側ダイオードの順方向電流を減少させる方向に流れる。That is, a portion of the laser light propagating through the active layer of the right diode is absorbed, generating a photocurrent. The current flows in a direction that reduces the forward current of the left diode.
従って、レーザ光が発生すると右側のダイオードから逆
方向電流が左側のダイオードに流れ、レーザ光を減少さ
せる。そのため第1図のレーザダイオードは自励パルス
発振動作を行うことになる。Therefore, when laser light is generated, a reverse current flows from the right diode to the left diode, reducing the laser light. Therefore, the laser diode shown in FIG. 1 performs self-excited pulse oscillation operation.
以下、本発明の詳細な説明する。 The present invention will be explained in detail below.
第1図に示すものはGaAsとAlGaAsの材料系を
用いて実施したものである。光増幅領域においては左側
のp−クラッド層から正孔が、そして右側のn−クラッ
ド層から電子がそれぞれGaAs活性層103に注入さ
れることにより、再結合発光および光増幅が行われ、レ
ーザ発振が生ずる。レーザ光は光増幅領域および光検出
領域の活性層GaAs中を伝搬する。そして、光検出領
域においてレーザ発振光の一部が吸収され、電子、正孔
対が発生し、それぞれn−クラッド層、p−クラッド層
に流れて電流となる。その電流の向きは光増幅領域を流
れる電流を減少させる方向に流れるため、キャリア注入
量が減少して光増幅領域のレーザ発振が停止する。レー
ザ発振が停止すると光検出領域から光増幅領域へ流入す
る電流がなくなるので、光増幅領域においては再びキャ
リア注入量が増大してレーザ発振が生じ、以後このよう
にして自励発振が継続することになる。このような自励
発振半導体レーザはレーザのモードホッピング雑音を消
すのに有効である。The method shown in FIG. 1 was implemented using a material system of GaAs and AlGaAs. In the optical amplification region, holes are injected from the p-cladding layer on the left side and electrons from the n-cladding layer on the right side are injected into the GaAs active layer 103, thereby recombining light emission and optical amplification, resulting in laser oscillation. occurs. The laser light propagates through the GaAs active layer of the optical amplification region and the optical detection region. Then, a part of the laser oscillation light is absorbed in the photodetection region, and pairs of electrons and holes are generated, which flow through the n-cladding layer and the p-cladding layer, respectively, and become current. Since the current flows in a direction that reduces the current flowing through the optical amplification region, the amount of carrier injection decreases and the laser oscillation in the optical amplification region is stopped. When laser oscillation stops, no current flows from the photodetection region to the optical amplification region, so the amount of carrier injection increases again in the optical amplification region, causing laser oscillation, and self-sustained oscillation continues in this way. become. Such a self-oscillating semiconductor laser is effective in eliminating laser mode hopping noise.
なお、上記説明ではGaAs、AlGaAs系を例示し
ているが、本発明はInGaAsP系等他の材料を用い
る半導体レーザにおいても実施できることは明白である
。Although the above description uses GaAs and AlGaAs as examples, it is clear that the present invention can also be implemented in semiconductor lasers using other materials such as InGaAsP.
以上のように本発明によれば、従来不可能であった集積
型自励発振半導体レーザを実現することができ、半導体
レーザダイオード以外に他の素子を必要とせず、その結
果周辺結線回路を不要とすることができる。As described above, according to the present invention, it is possible to realize an integrated self-oscillating semiconductor laser, which was previously impossible, and does not require any other elements other than the semiconductor laser diode, resulting in the need for peripheral wiring circuits. It can be done.
第1図は本発明の自励発振半導体レーザ装置を示す図で
、第1図(a)は上面図、第1図(b)は第1図(a)
のA−A断面図、第2図は半導体レーザにおけるパルス
自励発振回路を示す図である。
100・・・自励発振半導体レーザ装置、101・・・
高抵抗GaAs基板、102・・・高抵抗Aj!GaA
S層、103・・・GaAs活性層、104・・・アン
ドープΔI!GaΔSクラッド層、105 a−p−A
AGaAsクラッド層、105 b−n−Aj!GaA
sクラッド層、107a・・・p電極、107b・・・
n電極、■10・・・アンドープAβGaAsクラッド
層。FIG. 1 shows a self-oscillation semiconductor laser device of the present invention, in which FIG. 1(a) is a top view, and FIG. 1(b) is a top view of FIG. 1(a).
FIG. 2 is a sectional view taken along line A-A of FIG. 2, and is a diagram showing a pulse self-oscillation circuit in a semiconductor laser. 100... Self-oscillation semiconductor laser device, 101...
High resistance GaAs substrate, 102...High resistance Aj! GaA
S layer, 103... GaAs active layer, 104... undoped ΔI! GaΔS cladding layer, 105 a-p-A
AGaAs cladding layer, 105 bn-Aj! GaA
s cladding layer, 107a...p electrode, 107b...
n electrode, ■10... undoped AβGaAs cladding layer;
Claims (1)
入クラッド層間に高抵抗層を設けて電極分離を行ったタ
ンデム電極型半導体レーザ装置であって、分離した半導
体レーザダイオードの異極性の電極同士を接続したこと
を特徴とする自励発振半導体レーザ装置。(1) A tandem electrode type semiconductor laser device in which electrodes are separated by providing a high resistance layer between carrier injection cladding layers of a horizontal junction type buried semiconductor laser device, in which electrodes of different polarities of separated semiconductor laser diodes are connected to each other. A self-oscillation semiconductor laser device characterized by:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2041589A JP2672851B2 (en) | 1989-01-30 | 1989-01-30 | Self-oscillation semiconductor laser device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2041589A JP2672851B2 (en) | 1989-01-30 | 1989-01-30 | Self-oscillation semiconductor laser device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02201989A true JPH02201989A (en) | 1990-08-10 |
JP2672851B2 JP2672851B2 (en) | 1997-11-05 |
Family
ID=12026406
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2041589A Expired - Lifetime JP2672851B2 (en) | 1989-01-30 | 1989-01-30 | Self-oscillation semiconductor laser device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2672851B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5956358A (en) * | 1995-02-23 | 1999-09-21 | Nec Corporation | Semiconductor laser having an improved lateral carrier injection structure to multiple quantum well layers |
JP2001244551A (en) * | 2000-02-28 | 2001-09-07 | Sony Corp | Pulsation laser |
JP2001251012A (en) * | 2000-03-03 | 2001-09-14 | Sony Corp | Pulsation laser |
-
1989
- 1989-01-30 JP JP2041589A patent/JP2672851B2/en not_active Expired - Lifetime
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5956358A (en) * | 1995-02-23 | 1999-09-21 | Nec Corporation | Semiconductor laser having an improved lateral carrier injection structure to multiple quantum well layers |
JP2001244551A (en) * | 2000-02-28 | 2001-09-07 | Sony Corp | Pulsation laser |
JP2001251012A (en) * | 2000-03-03 | 2001-09-14 | Sony Corp | Pulsation laser |
Also Published As
Publication number | Publication date |
---|---|
JP2672851B2 (en) | 1997-11-05 |
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