JPH02199115A - Sealing agent - Google Patents
Sealing agentInfo
- Publication number
- JPH02199115A JPH02199115A JP2018089A JP2018089A JPH02199115A JP H02199115 A JPH02199115 A JP H02199115A JP 2018089 A JP2018089 A JP 2018089A JP 2018089 A JP2018089 A JP 2018089A JP H02199115 A JPH02199115 A JP H02199115A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- epoxy resin
- resin
- epoxy
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007789 sealing Methods 0.000 title abstract description 11
- 239000003822 epoxy resin Substances 0.000 claims abstract description 32
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 32
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 27
- 229920005989 resin Polymers 0.000 claims abstract description 21
- 239000011347 resin Substances 0.000 claims abstract description 21
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 3
- 150000002894 organic compounds Chemical class 0.000 claims abstract description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract 2
- 239000000565 sealant Substances 0.000 claims description 11
- 239000000126 substance Substances 0.000 claims description 10
- 125000005488 carboaryl group Chemical group 0.000 claims description 2
- 150000001412 amines Chemical class 0.000 abstract description 12
- 150000008065 acid anhydrides Chemical class 0.000 abstract description 6
- 125000003518 norbornenyl group Chemical group C12(C=CC(CC1)C2)* 0.000 abstract description 2
- 239000004952 Polyamide Substances 0.000 abstract 1
- 229920002647 polyamide Polymers 0.000 abstract 1
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 24
- 150000001875 compounds Chemical class 0.000 description 24
- -1 aliphatic alcohols Chemical class 0.000 description 19
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 15
- 238000006243 chemical reaction Methods 0.000 description 15
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 14
- 239000004593 Epoxy Substances 0.000 description 13
- XEKOWRVHYACXOJ-UHFFFAOYSA-N ethyl acetate Substances CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 13
- 239000002253 acid Substances 0.000 description 12
- 239000000047 product Substances 0.000 description 12
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 11
- 239000003054 catalyst Substances 0.000 description 11
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 10
- 229920003986 novolac Polymers 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 9
- 125000003700 epoxy group Chemical group 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 229920000768 polyamine Polymers 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 8
- 238000010521 absorption reaction Methods 0.000 description 8
- 239000001257 hydrogen Substances 0.000 description 8
- 229910052739 hydrogen Inorganic materials 0.000 description 8
- 125000002723 alicyclic group Chemical group 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 229960003742 phenol Drugs 0.000 description 7
- 125000001424 substituent group Chemical group 0.000 description 7
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- 239000011342 resin composition Substances 0.000 description 6
- 229910015900 BF3 Inorganic materials 0.000 description 5
- 239000004721 Polyphenylene oxide Substances 0.000 description 5
- 235000011054 acetic acid Nutrition 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000006735 epoxidation reaction Methods 0.000 description 5
- 229940083124 ganglion-blocking antiadrenergic secondary and tertiary amines Drugs 0.000 description 5
- 239000005011 phenolic resin Substances 0.000 description 5
- 229920000570 polyether Polymers 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 5
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 4
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 4
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 125000001931 aliphatic group Chemical group 0.000 description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 4
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 4
- 150000001735 carboxylic acids Chemical class 0.000 description 4
- 229930003836 cresol Natural products 0.000 description 4
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- 239000000945 filler Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- 239000012778 molding material Substances 0.000 description 4
- 150000004965 peroxy acids Chemical class 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000000862 absorption spectrum Methods 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 150000008064 anhydrides Chemical class 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 235000014113 dietary fatty acids Nutrition 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 239000012153 distilled water Substances 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 239000000194 fatty acid Substances 0.000 description 3
- 229930195729 fatty acid Natural products 0.000 description 3
- 150000004665 fatty acids Chemical class 0.000 description 3
- 239000005350 fused silica glass Substances 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000012044 organic layer Substances 0.000 description 3
- 229920006122 polyamide resin Polymers 0.000 description 3
- 229920005862 polyol Polymers 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 150000005846 sugar alcohols Polymers 0.000 description 3
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 3
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 2
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- DKIDEFUBRARXTE-UHFFFAOYSA-N 3-mercaptopropanoic acid Chemical compound OC(=O)CCS DKIDEFUBRARXTE-UHFFFAOYSA-N 0.000 description 2
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- CVKMDAZAUGXUFX-UHFFFAOYSA-N C1C2(C=C)CCC1C1C2O1 Chemical compound C1C2(C=C)CCC1C1C2O1 CVKMDAZAUGXUFX-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 229920006026 co-polymeric resin Polymers 0.000 description 2
- ZSWFCLXCOIISFI-UHFFFAOYSA-N cyclopentadiene Chemical compound C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- QXYJCZRRLLQGCR-UHFFFAOYSA-N dioxomolybdenum Chemical compound O=[Mo]=O QXYJCZRRLLQGCR-UHFFFAOYSA-N 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- DNJIEGIFACGWOD-UHFFFAOYSA-N ethanethiol Chemical compound CCS DNJIEGIFACGWOD-UHFFFAOYSA-N 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 235000019253 formic acid Nutrition 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 150000002432 hydroperoxides Chemical class 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 2
- 150000002902 organometallic compounds Chemical class 0.000 description 2
- CABDEMAGSHRORS-UHFFFAOYSA-N oxirane;hydrate Chemical compound O.C1CO1 CABDEMAGSHRORS-UHFFFAOYSA-N 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- DPBLXKKOBLCELK-UHFFFAOYSA-N pentan-1-amine Chemical compound CCCCCN DPBLXKKOBLCELK-UHFFFAOYSA-N 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 150000003077 polyols Chemical class 0.000 description 2
- SUVIGLJNEAMWEG-UHFFFAOYSA-N propane-1-thiol Chemical compound CCCS SUVIGLJNEAMWEG-UHFFFAOYSA-N 0.000 description 2
- 235000019260 propionic acid Nutrition 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229940014800 succinic anhydride Drugs 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 150000003573 thiols Chemical class 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 238000001721 transfer moulding Methods 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- CFQZKFWQLAHGSL-FNTYJUCDSA-N (3e,5e,7e,9e,11e,13e,15e,17e)-18-[(3e,5e,7e,9e,11e,13e,15e,17e)-18-[(3e,5e,7e,9e,11e,13e,15e)-octadeca-3,5,7,9,11,13,15,17-octaenoyl]oxyoctadeca-3,5,7,9,11,13,15,17-octaenoyl]oxyoctadeca-3,5,7,9,11,13,15,17-octaenoic acid Chemical compound OC(=O)C\C=C\C=C\C=C\C=C\C=C\C=C\C=C\C=C\OC(=O)C\C=C\C=C\C=C\C=C\C=C\C=C\C=C\C=C\OC(=O)C\C=C\C=C\C=C\C=C\C=C\C=C\C=C\C=C CFQZKFWQLAHGSL-FNTYJUCDSA-N 0.000 description 1
- XBTRYWRVOBZSGM-UHFFFAOYSA-N (4-methylphenyl)methanediamine Chemical compound CC1=CC=C(C(N)N)C=C1 XBTRYWRVOBZSGM-UHFFFAOYSA-N 0.000 description 1
- DTCCVIYSGXONHU-CJHDCQNGSA-N (z)-2-(2-phenylethenyl)but-2-enedioic acid Chemical compound OC(=O)\C=C(C(O)=O)\C=CC1=CC=CC=C1 DTCCVIYSGXONHU-CJHDCQNGSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 description 1
- XYPISWUKQGWYGX-UHFFFAOYSA-N 2,2,2-trifluoroethaneperoxoic acid Chemical compound OOC(=O)C(F)(F)F XYPISWUKQGWYGX-UHFFFAOYSA-N 0.000 description 1
- AHDSRXYHVZECER-UHFFFAOYSA-N 2,4,6-tris[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC(CN(C)C)=C(O)C(CN(C)C)=C1 AHDSRXYHVZECER-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- YSUQLAYJZDEMOT-UHFFFAOYSA-N 2-(butoxymethyl)oxirane Chemical compound CCCCOCC1CO1 YSUQLAYJZDEMOT-UHFFFAOYSA-N 0.000 description 1
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- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000012045 crude solution Substances 0.000 description 1
- 239000011353 cycloaliphatic epoxy resin Substances 0.000 description 1
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- 239000001530 fumaric acid Substances 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
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Landscapes
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、耐熱性、耐候性、耐水性に優れた脂環式エポ
キシ樹脂を用いな封止剤に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a sealant using an alicyclic epoxy resin having excellent heat resistance, weather resistance, and water resistance.
[従来技術]
従来、ダイオードや、トランジスタ、集積回路などの電
子部品を熱硬化性樹脂組成物を用いて封止する方法が行
われてきた。[Prior Art] Conventionally, methods have been used to seal electronic components such as diodes, transistors, and integrated circuits using thermosetting resin compositions.
樹脂を用いた刺止はガラス、金属、セラミックなどを用
いたハーメチックシール方式に比較して経済的に有利な
ため広く実用化されている。Stabbing using resin is economically advantageous compared to hermetic sealing methods using glass, metal, ceramic, etc., and is therefore widely put into practical use.
封止用の樹脂組成物としては、熱硬化性樹脂組成物の中
でも信頼性、および価格の点からエポキシ樹脂組成物が
最も一般的に用いられている。Among thermosetting resin compositions, epoxy resin compositions are most commonly used as sealing resin compositions in terms of reliability and cost.
産業界において現在最も広く使用されているエポキシ樹
脂はビスフェノールとエピクロルヒドリンとの反応によ
って製造される。いわゆる、エビ−ビス型エポキシ樹脂
である。The epoxy resins currently most widely used in industry are produced by the reaction of bisphenols and epichlorohydrin. This is a so-called Ebisu type epoxy resin.
この樹脂は液体から固体まで幅広い製品が得られ、しか
もエポキシ基の反応性は高く、ポリアミンで常温硬化で
きるという利点を有している。This resin can be used in a wide range of products, from liquids to solids, and has the advantage that the epoxy group has high reactivity and can be cured at room temperature with polyamines.
しかしながら、その硬化物は耐水性に優れ1強靭である
という特徴があるにもかかわらず耐候性が悪いこと、耐
トラツキング特性など電気的質が悪いこと、熱変形温度
が低いことなどの欠点がある。とくに最近、jtiiL
sIなどの封止用樹脂にフェノールやノボラック樹脂と
エピクロルヒドリンと反応させたエポキシ樹脂が使用さ
れているが。However, although the cured product has excellent water resistance and is tough, it has drawbacks such as poor weather resistance, poor electrical quality such as tracking resistance, and low heat distortion temperature. . Especially recently, jtiiL
Epoxy resins made by reacting phenol or novolak resin with epichlorohydrin are used as sealing resins such as sI.
樹脂中に塩素が数1100pp含まれ、それが電気部品
の電気特性を悪くするなどの問題が起きている。塩素を
含まず電気特性、耐熱性に優れたエポキシ樹脂としては
脂環式エポキシ樹脂がある。The resin contains several 1,100 pp of chlorine, which causes problems such as deteriorating the electrical characteristics of electrical parts. Alicyclic epoxy resins are examples of epoxy resins that do not contain chlorine and have excellent electrical properties and heat resistance.
これらは5R環、6員環のシクロアルケニル骨格を有す
る化合物のエポキシ化反応によって製造されている。These are produced by epoxidation reaction of compounds having a 5R ring and a 6-membered cycloalkenyl skeleton.
これらの樹脂のエポキシ基は、いわゆる、内部エポキシ
基であり1通常、酸無水物による加熱硬化が行なわれて
いるが1反応性が低いためポリアミンによる常温硬化は
できない。The epoxy groups of these resins are so-called internal epoxy groups and are usually cured by heating with acid anhydrides, but cannot be cured at room temperature with polyamines due to their low reactivity.
そのため脂環式エポキシ樹脂の使用範囲を著しく狭いも
のにしている。Therefore, the scope of use of alicyclic epoxy resins is extremely narrow.
脂環式エポキシ樹脂としては(II) 、 (III
)の構造を有するものが工業的に製造され、使用されて
いる。Examples of alicyclic epoxy resins include (II) and (III
) is manufactured and used industrially.
[発明が解決しようとする課題]
本発明の封止剤に用いる場合だけでなく、一般的に(I
I)はその粘度が非常に低いことゆえに耐熱性エポキシ
希釈剤に使用されているが、毒性が強く作業者の皮膚が
著しくかぶれるという問題がある。(III)は不純物
が少なく1色相が低く、その硬化物の熱変形温度は高い
が、エステル結合にもとすく耐水性の悪さが問題となっ
ている。[Problem to be solved by the invention] Not only when used in the sealant of the present invention, but also generally (I
I) is used as a heat-resistant epoxy diluent because of its very low viscosity, but it has the problem of being highly toxic and causing severe irritation to the skin of workers. Although (III) contains few impurities, has a low hue, and has a high heat deformation temperature of its cured product, it is susceptible to ester bonds and has poor water resistance.
このような背景から特開昭60−166675号公報(
USP4,565,859)にてオキシシクロヘキサン
骨格を有する新規なエポキシ樹脂が提案された。Against this background, Japanese Patent Application Laid-Open No. 166675/1983 (
A novel epoxy resin having an oxycyclohexane skeleton was proposed in US Pat. No. 4,565,859).
この樹脂は常温で固体であり、封止剤に用いる場合には
作業性などの点では好都合である。This resin is solid at room temperature, and is advantageous in terms of workability when used as a sealant.
しかしながら、耐熱性、耐湿性などの点を改善すること
が要望されている。However, it is desired to improve heat resistance, moisture resistance, and the like.
このような背景から1本発明者らはノルボルネン骨格を
導入したエポキシ樹脂を用いて封止すれば前記のような
問題が緩和されることを見出し。Against this background, the present inventors have discovered that the above-mentioned problems can be alleviated by sealing with an epoxy resin into which a norbornene skeleton has been introduced.
本発明に到達した。We have arrived at the present invention.
[発明の構成]
すなわち、本発明は
「(a)一般式<I)で表わされるエポキシ樹脂[但し
、R1は1ケの活性水素を有する有機化合物残基、nl
、R2・・・・・・njは0又は1〜100の整数で
、その和が1〜100である。jは1〜100の整数を
表わす]
「Aは次式で表わされる
R2はH,アルキル基、カーボアルキル基、カーボアリ
ール基の内のいずれか一つであるが。[Configuration of the Invention] That is, the present invention relates to "(a) an epoxy resin represented by the general formula <I) [wherein R1 is an organic compound residue having one active hydrogen, nl
, R2...nj is 0 or an integer from 1 to 100, and the sum thereof is from 1 to 100. j represents an integer from 1 to 100] "A is represented by the following formula, and R2 is any one of H, an alkyl group, a carboalkyl group, and a carboaryl group.
中に一個以上含まれることが必要である」(b)エポキ
シ樹脂用硬化剤
を必須成分とすることを特徴とする封止剤jである。(b) A sealing agent j characterized by containing as an essential component one or more curing agents for epoxy resins.
次に本発明について詳述する。Next, the present invention will be explained in detail.
本発明の封止剤の主成分として用いられる前記一般式(
I)で表わされる脂環式エポキシ樹脂において、R1は
活性水素を有する有機物残基であるが、その前駆体であ
る活性水素を有する有機物としては、アルコール類、フ
ェノール類、カルボン酸類、アミン類、チオール類等が
あげられる。The general formula (
In the alicyclic epoxy resin represented by I), R1 is an organic residue having active hydrogen, and examples of the precursor organic substance having active hydrogen include alcohols, phenols, carboxylic acids, amines, Examples include thiols.
アルコール類としては、1価のアルコールでも多価アル
コールでもよい。The alcohol may be a monohydric alcohol or a polyhydric alcohol.
例えばメタノール、エタノール、グロバノール、ブタノ
ール、ペンタノール、ヘキサノール、オクタツール等の
脂肪族アルコール、ベンジルアルコールのような芳香族
アルコール、エチレングリコール、ジエチレングリコー
ル、トリエチレングリコール、ポリエチレングリコール
、プロピレングリコール、ジプロピレングリコール、1
.3ブタンジオール、1.4ブタンジオール、ベンタン
ジオール、1.6ヘキサンジオール、ネオペンチルグリ
コール、オキシピバリン酸ネオペンチルグリコールエス
テル、シクロヘキサンジメタツール、グリセリン、ジグ
リセリン、ポリグリセリン、トリメチロールプロパン、
トリメチロールエタン、ペンタエリスリトール、ジペン
タエリスリトールなどの多価アルコール等がある。For example, aliphatic alcohols such as methanol, ethanol, globanol, butanol, pentanol, hexanol, octatool, aromatic alcohols such as benzyl alcohol, ethylene glycol, diethylene glycol, triethylene glycol, polyethylene glycol, propylene glycol, dipropylene glycol, 1
.. 3-butanediol, 1.4-butanediol, betanediol, 1.6-hexanediol, neopentyl glycol, oxypivalic acid neopentyl glycol ester, cyclohexane dimetatool, glycerin, diglycerin, polyglycerin, trimethylolpropane,
Examples include polyhydric alcohols such as trimethylolethane, pentaerythritol, and dipentaerythritol.
フェノール類としては、フェノール、クレゾール、カテ
コール、ピロガロール、ハイドロキノン、ハイドロキノ
ンモノメチルエーテル、ビスフェノールA、ビスフェノ
ールF、4,4°−ジ辷ドロキシベンゾフェノン、ビス
フェノールS、フェノール樹脂、クレゾールノボラック
樹脂等がある。Examples of the phenols include phenol, cresol, catechol, pyrogallol, hydroquinone, hydroquinone monomethyl ether, bisphenol A, bisphenol F, 4,4°-ditoxybenzophenone, bisphenol S, phenol resin, and cresol novolak resin.
カルボン酸類としてはギ酸、酢酸、10ピオン酸、酪酸
、動植物油の脂肪酸、フマル酸、マレイン酸、アジピン
酸、ドデカン2酸、トリメリット酸、ピロメリット酸、
ポリアクリル酸、フタル酸、イソフタル酸、テレフタル
酸等がある。また乳酸、クエン酸、オキシカプロン酸等
、水酸基とカルボン酸を共に有する化合物もあげられる
。Carboxylic acids include formic acid, acetic acid, 10-pionic acid, butyric acid, fatty acids from animal and vegetable oils, fumaric acid, maleic acid, adipic acid, dodecanoic acid, trimellitic acid, pyromellitic acid,
Examples include polyacrylic acid, phthalic acid, isophthalic acid, and terephthalic acid. Also included are compounds having both a hydroxyl group and a carboxylic acid, such as lactic acid, citric acid, and oxycaproic acid.
アミン類としてはメチルアミン、エチルアミン、10ビ
ルアミン、ブチルアミン、ペンチルアミン、ヘキシルア
ミン、シクロヘキシルアミン、オクチルアミン、ドデシ
ルアミン、4,4°−ジアミノジフェニルメタン、イソ
ホロンジアミン、トルエンジアミン、ヘキサメチレンジ
アミン、キシレンジアミン、ジエチレントリアミン、ト
リエチレンテトラミン、エタノールアミン等がある。Examples of amines include methylamine, ethylamine, 10-bylamine, butylamine, pentylamine, hexylamine, cyclohexylamine, octylamine, dodecylamine, 4,4°-diaminodiphenylmethane, isophorone diamine, toluenediamine, hexamethylene diamine, xylene diamine, Examples include diethylenetriamine, triethylenetetramine, and ethanolamine.
チオール類としてはメチルメルカプタン、エチルメルカ
プタン、プロピルメルカプタン、フェニルメルカプタン
等のメルカプト類、メルカプトプロピオン酸あるいはメ
ルカプトプロピオン酸の多価アルコールエステル、例え
ばエチレングリコールジメルカプト10ピオン酸エステ
ル、トリメチロールプロパントリメルカプトプロピオン
酸、ペンタエリスリトールペンタメルカプト10ピオン
酸等があげられる。Examples of thiols include mercapto compounds such as methyl mercaptan, ethyl mercaptan, propyl mercaptan, and phenyl mercaptan, mercaptopropionic acid or polyhydric alcohol esters of mercaptopropionic acid, such as ethylene glycol dimercapto-10-pionic acid ester, and trimethylolpropane trimercaptopropionic acid. , pentaerythritol pentamercapto 10 pionic acid, and the like.
さらにその他、活性水素を有する化合物としてはポリビ
ニルアルコール、ポリ酢酸ビニル部分加水分解物、デン
プン、セルロース、セルロースアセテート、セルロース
アセテートブチレート、bドロキシエチルセルロース、
アクリルポリオール樹脂、スチレンアリルアルコール共
重合樹脂、スチレン−マレイン酸共重合樹脂、アルキッ
ド樹脂、ポリエステルポリオール樹脂、ポリエステルカ
ルボン酸樹脂、ポリカプロラクトンポリオール樹脂、ポ
リプロピレンポリオール、ポリテトラメチレングリコー
ル等がある。Furthermore, other compounds having active hydrogen include polyvinyl alcohol, polyvinyl acetate partial hydrolyzate, starch, cellulose, cellulose acetate, cellulose acetate butyrate, b-droxyethylcellulose,
Examples include acrylic polyol resin, styrene allyl alcohol copolymer resin, styrene-maleic acid copolymer resin, alkyd resin, polyester polyol resin, polyester carboxylic acid resin, polycaprolactone polyol resin, polypropylene polyol, polytetramethylene glycol, and the like.
また、活性水素を有する化合物は、その骨格中に不飽和
2重結合を有していても良く、具体例としては、アリル
アルコール、アクリル酸、メタクリル酸、3−シクロヘ
キセンメタノール、テトラしドロフタル酸等がある。Further, the compound having active hydrogen may have an unsaturated double bond in its skeleton, and specific examples include allyl alcohol, acrylic acid, methacrylic acid, 3-cyclohexenemethanol, tetra-dolphthalic acid, etc. There is.
この場合、エポキシ樹脂の一般式(I)において不飽和
2重結合は全部または1部がエポキシ化された構造もの
となる。In this case, the unsaturated double bond in the general formula (I) of the epoxy resin has a structure in which all or part of it is epoxidized.
一般式(I)におけるn 、n ・・・・・・nj
は0または1〜100の整数である。n in general formula (I), n...nj
is 0 or an integer from 1 to 100.
その和が1〜100であるが、100以上では融点の高
い樹脂となり取り扱いに<<、実際上は使用できるよう
なものとはならない。The sum is from 1 to 100, but if it exceeds 100, the resin will have a high melting point and will be difficult to handle and cannot be used in practice.
オは1〜100までの整数である。o is an integer from 1 to 100.
式(1)におけるAの置換基Xのうち、ことが、必須で
あるが、
が多ければ多い程好ましい。Of the substituents X of A in formula (1), it is essential, but it is preferable that there are as many of them.
は少なければ少ない程好ましい。The smaller the number, the better.
すなわち、本発明においては、置換基Xはが主なもので
ある。That is, in the present invention, the substituent X is the main one.
本発明の封止剤の主成分として用いられる前記一般式(
I)で表わされる脂環式エポキシ樹脂の製造は以下の順
序で行われる。The general formula (
The production of the alicyclic epoxy resin represented by I) is carried out in the following order.
まづ、活性水素を有する有機化合物を開始剤にして5−
ビニルビシクロ[2,2,1]ヘプト−2−エン−2−
オキシドを開環重合させることによってポリエーテル化
合物を製造する。First, 5-
vinylbicyclo[2,2,1]hept-2-ene-2-
Polyether compounds are produced by ring-opening polymerization of oxides.
このポリエーテル化合物は前記一般式(I)で表わされ
るエポキシ樹脂におけるAの部分の側鎖Xがビニル基の
まま残っている構造式で表わされる。このビニル基側鎖
を有するポリエーテル化合物のビニル基部分な過酸等の
酸化剤でエポキシ化することによって本発明の封止、剤
の主成分となる脂環式エポキシ樹脂を製造することがで
きる。This polyether compound is represented by a structural formula in which the side chain X of the portion A in the epoxy resin represented by the general formula (I) remains as a vinyl group. By epoxidizing the vinyl group portion of this polyether compound having a vinyl group side chain with an oxidizing agent such as a peracid, an alicyclic epoxy resin, which is the main component of the sealing agent of the present invention, can be produced. .
5−ビニルビシクロ[2,2,11ヘプト−2−エン−
2−オキシドはブタジェンとシクロペンタジェンのディ
ールスアルダー反応によって得られる5−ビニルビシク
ロ[2,2,1]へブドー2−エンを過酢酸などによっ
て部分エポキシ化することによって得られる。5-vinylbicyclo[2,2,11hept-2-ene-
2-oxide can be obtained by partially epoxidizing 5-vinylbicyclo[2,2,1]hebdo-2-ene obtained by the Diels-Alder reaction of butadiene and cyclopentadiene with peracetic acid or the like.
5−ビニルビシクロ[2,2,1]ヘプト−2−エン−
2−オキシドを活性水素存在下に重合させてポリエーテ
ル化合物を合成する際には触媒を使用することが好まし
い。5-vinylbicyclo[2,2,1]hept-2-ene-
It is preferable to use a catalyst when synthesizing a polyether compound by polymerizing 2-oxide in the presence of active hydrogen.
触媒としてはメチルアミン、エチルアミン、プロピルア
ミン、ピペラジン等のアミン類、ピリジン類、イミダゾ
ール類等の有機塩基酸、ギ酸、酢酸、プロピオン酸等の
有tlA酸類、硫酸、塩酸等の無機酸、ナトリウムメチ
ラート等のアルカリ金属類のアルコラード類、KOH,
NaOH−のアルカリ類、BF3、Zncj2 、Aj
Cj 、SnCj4等のルイス酸又はそのコンプレッ
クス類、トリエチルアルミニウム、ジエチル亜鉛等の有
機金属化合物をあげることができる。Examples of catalysts include amines such as methylamine, ethylamine, propylamine, and piperazine; organic basic acids such as pyridines and imidazoles; tlA acids such as formic acid, acetic acid, and propionic acid; inorganic acids such as sulfuric acid and hydrochloric acid; Alcolades of alkali metals such as Lato, KOH,
Alkalies of NaOH-, BF3, Zncj2, Aj
Examples include Lewis acids such as Cj and SnCj4 or their complexes, and organometallic compounds such as triethylaluminum and diethylzinc.
これらの触媒は出発原料に対して0.01〜10%、好
ましくは0.1〜5%の範囲で使用することができる。These catalysts can be used in an amount of 0.01 to 10%, preferably 0.1 to 5%, based on the starting material.
反応温度は一70〜200℃、好ましくは一30℃〜1
00℃である。The reaction temperature is -70 to 200°C, preferably -30°C to 1
It is 00℃.
反応は溶媒を用いて行なうこともできる。The reaction can also be carried out using a solvent.
溶媒としては活性水素を有しているものは使用すること
ができない。A solvent containing active hydrogen cannot be used.
すなわち、アセトン、メチルエチルケトン、メチルイソ
ブチルケトンのようなケトン類、ベンゼン、トルエン、
キシレンのような芳香族溶媒その他エーテル、脂肪族炭
化水素、エステル類等を使用することができる。i.e., ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, benzene, toluene,
Aromatic solvents such as xylene, ethers, aliphatic hydrocarbons, esters, etc. can be used.
このようにして合成したビニル基側鎖を有するポリエー
テル化合物をエポキシ化剤によってエポキシ化し、本発
明の封止剤の主成分として用いられる前記一般式(I)
で表わされる脂環式エポキシ樹脂を製造する。The thus synthesized polyether compound having a vinyl group side chain is epoxidized with an epoxidizing agent, and the resultant compound has the general formula (I), which is used as the main component of the sealant of the present invention.
A cycloaliphatic epoxy resin represented by:
エポキシ化剤としては、過酸類およびハイドロパーオキ
サイド類を用いることができる。As the epoxidizing agent, peracids and hydroperoxides can be used.
過酸類としては過ギ酸、過酢酸、過安息香酸、トリフル
オロ過酢酸等を用いることができる。As peracids, performic acid, peracetic acid, perbenzoic acid, trifluoroperacetic acid, etc. can be used.
このうち特に過酢酸は工業的に安価に入手可能で、かつ
安定度も高く、好ましいエポキシ化剤である。Among these, peracetic acid is a particularly preferred epoxidizing agent because it is industrially available at low cost and has high stability.
ハイドロパーオキサイド類としては、過酸化水素、ター
シャリブチルハイドロパーオキサイド、クメンパーオキ
サイド等を用いることができる。As the hydroperoxides, hydrogen peroxide, tert-butyl hydroperoxide, cumene peroxide, etc. can be used.
エポキシ化の際には必要に応じて触媒を用いることがで
きる。A catalyst can be used during epoxidation if necessary.
たとえば過酸の場合、炭酸ソーダなどのアルカリや硫酸
などの酸を触媒として用い得る。For example, in the case of a peracid, an alkali such as soda carbonate or an acid such as sulfuric acid may be used as a catalyst.
また、ハイドロパーオキサイドの場合、タングステン酸
と苛性ソーダの混合物を過酸化水素とあるいは有m酸を
過酸化水素と、あるいはモリブデンヘキサカルボニルを
ターシャリブチルハイドロパーオキサイドと使用して触
媒効果を得ることができる。In the case of hydroperoxide, the catalytic effect can be obtained by using a mixture of tungstic acid and caustic soda with hydrogen peroxide, a molar acid with hydrogen peroxide, or molybdenum hexacarbonyl with tert-butyl hydroperoxide. can.
エポキシ化反応は、装置や原料物性に応じて溶媒使用の
有無や反応温度を調節して行なう。The epoxidation reaction is carried out by adjusting the presence or absence of a solvent and the reaction temperature depending on the equipment and physical properties of the raw materials.
用いるエポキシ化剤の反応性によって使用できる反応温
度域は定まる。The usable reaction temperature range is determined by the reactivity of the epoxidizing agent used.
好ましいエポキシ化剤である過酢酸についていえば0〜
70℃が好ましい。Regarding peracetic acid, which is a preferred epoxidizing agent, 0 to
70°C is preferred.
0℃以下では反応が遅く、70℃では過酢酸の分解がお
きる。At temperatures below 0°C, the reaction is slow, and at 70°C, peracetic acid decomposes.
又、ハイドロパーオキサイドの1例であるターシャルブ
チルハイドロパーオキサイド/モリブデン二酸化物ジア
セチルアセトナート系では同じ理由で20℃〜150℃
が好ましい。Also, for the tertiary butyl hydroperoxide/molybdenum dioxide diacetylacetonate system, which is an example of hydroperoxide, the temperature is 20°C to 150°C for the same reason.
is preferred.
溶媒は原料粘度の低下、エポキシ化剤の希釈による安定
化などの目的で使用することができる。The solvent can be used for purposes such as lowering the viscosity of the raw material and stabilizing the epoxidizing agent by diluting it.
過酢酸の場合であれば芳香族化合物、エーテル化合物、
エステル化合物、ケトン化合物などを溶媒として用いる
ことができる。In the case of peracetic acid, aromatic compounds, ether compounds,
Ester compounds, ketone compounds, etc. can be used as solvents.
不飽和結合に対するエポキシ化剤の仕込みモル比は不飽
和結合をどれくらい残存させたいかなどの目的に応じて
変化させることができる。The molar ratio of the epoxidizing agent to the unsaturated bonds can be changed depending on the purpose, such as how much unsaturated bonds are desired to remain.
エポキシ基が多い化合物が目的の場合、エポキシ化剤は
不飽和基に対して等モルかそれ以上加えるのが好ましい
。When the objective is to obtain a compound with a large number of epoxy groups, it is preferable to add the epoxidizing agent in an amount equivalent to or more than the amount of the unsaturated group.
ただし、経済性、及び次に述べる副反応の問題から2倍
モルを越えることは通常不利であり、過酢酸の場合1〜
1.5倍モルが好ましい。However, it is usually disadvantageous to exceed 2 times the molar amount due to economic efficiency and the problem of side reactions described below, and in the case of peracetic acid, 1 to
1.5 times the molar amount is preferable.
エポキシ化反応の条件によってオレフィン結合のエポキ
シ価と同時に原料中の置換基
や生成してくる
がエポキシ化剤と反応を起こした結果、変性された置換
基が生じ、目的化合物中に含まれてくる。Depending on the conditions of the epoxidation reaction, the epoxy value of the olefin bond is accompanied by substituents in the raw materials, and as a result of the reaction with the epoxidation agent, modified substituents are generated and included in the target compound. .
目的化合物中の置換基および変性された置換基の3者の
比はエポキシ化剤の種類、エポキシ死刑オレフィン結合
のモル比、反応条件によって定まる。The ratio of the substituents in the target compound and the modified substituents is determined by the type of epoxidizing agent, the molar ratio of the epoxy olefin bond, and the reaction conditions.
変性された置換基はエポキシ化剤が過酢酸の場合、下の
様な構造のものが主であり、生成したエポキシ基と副生
じた酢酸から生じる。(以下余白)目的化合物は濃縮等
の通常の化学工学的手段によって反応粗液から取り出す
ことができる。When the epoxidizing agent is peracetic acid, the modified substituents mainly have the structure shown below, and are generated from the produced epoxy group and the by-produced acetic acid. (Left below) The target compound can be extracted from the crude reaction solution by conventional chemical engineering means such as concentration.
また、本発明の封止剤の主成分となるエポキシ樹脂は、
組成物の特性を損わない限り、他のエポキシ樹脂と混合
して用いることができる。In addition, the epoxy resin that is the main component of the sealant of the present invention is
It can be used in combination with other epoxy resins as long as the properties of the composition are not impaired.
ここで他のエポキシ樹脂とは、一般に用いられているも
のであれば何でも良いが、例えばエビビス型エポキシ、
ビスフェノールFエポキシ、ノボラックエポキシ、脂環
型エポキシ及びスチレンオキシド、ブチルグリシジルエ
ーテル等のエポキシ稀釈剤が含まれる。Here, the other epoxy resin may be any commonly used epoxy resin, such as Ebibis type epoxy,
Included are epoxy diluents such as bisphenol F epoxy, novolac epoxy, cycloaliphatic epoxy and styrene oxide, butyl glycidyl ether.
次に2本発明の封止剤の主成分となるエポキシ樹脂を硬
化させるために用いる硬化剤について述べる。Next, the curing agent used for curing the epoxy resin which is the main component of the sealant of the present invention will be described.
硬化剤としては公知のエポキシ樹脂に用いられる硬化剤
を使用することができ、アミン類、ポリアミド樹脂、酸
無水物、ポリメルカプタン樹脂、ノボラック樹脂、ジシ
アンジアミド、三フッ化ホウ素のアミン錯体等が含まれ
る。As the curing agent, curing agents used for known epoxy resins can be used, and include amines, polyamide resins, acid anhydrides, polymercaptan resins, novolak resins, dicyandiamide, amine complexes of boron trifluoride, etc. .
ここで、アミン類としては、以下のものが含まれる。Here, the amines include the following.
ジエチレントリアミン、トリエチレンテトラミン、メン
センジアミン、メタキシリレンジアミン、ビス〈4−ア
ミノ−3−メチルシクロヘキシル)メタン等の脂肪族ポ
リアミン及び前記脂肪族ポリアミンと公知のエポキシ化
合物とのアダクト、アクリロニトリルとの反応物、ケト
ンとの反応物。Aliphatic polyamines such as diethylenetriamine, triethylenetetramine, menzendiamine, metaxylylenediamine, bis<4-amino-3-methylcyclohexyl)methane, adducts of the aliphatic polyamines and known epoxy compounds, and reaction with acrylonitrile. substances, reactants with ketones.
メタフェニレンジアミン、ジアミノジフェニルメタン、
ジアミノジフェニルスルホン、ジアミノジフェニルスル
フィド等の芳香族ポリアミン及び前記芳香族ポリアミン
と公知のエポキシ化合物とのアダクト、トリス(ジメチ
ルアミノメチル)フェノール、ピペリジン、イミダゾー
ル及びその誘導体等の第2、第3アミン及びその塩、及
び前記アミン類の混合物等が用いられる。metaphenylenediamine, diaminodiphenylmethane,
Aromatic polyamines such as diaminodiphenylsulfone and diaminodiphenylsulfide, adducts of the aromatic polyamines and known epoxy compounds, secondary and tertiary amines such as tris(dimethylaminomethyl)phenol, piperidine, imidazole and derivatives thereof, and their derivatives. Salts, mixtures of the above amines, etc. are used.
ポリアミド樹脂としては、脂肪酸、ダイマー酸トリマー
酸等の脂肪酸と脂肪族ポリアミンとの反応物が含まれる
。Polyamide resins include fatty acids, reaction products of fatty acids such as dimer acid and trimer acid, and aliphatic polyamines.
酸無水物としては以下のものが含まれる。Acid anhydrides include the following:
無水フタル酸、無水トリメリット酸、無水ピロメリット
酸、ベンゾフェノンテトラカルボン酸二無水物、無水テ
トラしドロフタル酸、無水へキサヒドロフタル酸、無水
メチルテトラしドロフタル酸、無水メチルヘキサしドロ
フタル酸、無水メチルナジック酸、無水コハク酸、無水
ドデセニルコハク酸、無水コハク酸等の酸無水物及び前
記酸無水物の混合物。Phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, benzophenonetetracarboxylic dianhydride, tetra-dolphthalic anhydride, hexahydrophthalic anhydride, methyltetra-dolphthalic anhydride, methylhex-dolphthalic anhydride, methyl anhydride Acid anhydrides such as nadic acid, succinic anhydride, dodecenylsuccinic anhydride, succinic anhydride, and mixtures of the above acid anhydrides.
ノボラック樹脂としてはフェノール又はフェノールとク
レゾール、ジしドロキシベンゼンの混合物とホルムアル
デヒドとの縮合によって作られる低分子量の樹脂状生成
物が含まれる。Novolak resins include low molecular weight resinous products made by the condensation of phenol or a mixture of phenol and cresol, di-hydroxybenzene, and formaldehyde.
三フッ化ホウ素のアミン錯体としてはモノエチルアミン
、ピペリジン、アニリン、ブチルアミン、ジブチルアミ
ン、シクロヘキシルアミン、ジシクロヘキシルアミン、
トリブチルアミン、トリエタノールアミン等の低分子量
のアミン化合物と三フッ化ホウ素との錯体が含まれる。Amine complexes of boron trifluoride include monoethylamine, piperidine, aniline, butylamine, dibutylamine, cyclohexylamine, dicyclohexylamine,
Includes complexes of low molecular weight amine compounds such as tributylamine and triethanolamine and boron trifluoride.
また、その他の硬化剤としては四フッ化ホウ素、六フッ
化リン、六フッ化ヒ素等の超強酸のジアゾニウム塩、ヨ
ウドニウム塩、ブロモニウム塩、スルフィニウム塩等の
塩がある。Further, other curing agents include salts such as diazonium salts, iodonium salts, bromonium salts, and sulfinium salts of super strong acids such as boron tetrafluoride, phosphorus hexafluoride, and arsenic hexafluoride.
また、これら硬化剤のうち、脂肪族ポリアミン、芳香族
ポリアミン、ポリアミド樹脂、ポリメルカプタン樹脂は
任意の割合で混合して使用することができ、単独又は硬
化速度を調整する目的で硬化促進剤を併用することもで
きる。In addition, among these curing agents, aliphatic polyamines, aromatic polyamines, polyamide resins, and polymercaptan resins can be used in combination in any ratio, and can be used alone or in combination with a curing accelerator for the purpose of adjusting the curing speed. You can also.
硬化剤の配合量は樹脂組成物に対して0.5〜10重量
%、好ましくは、1〜Sjl量%である。The blending amount of the curing agent is 0.5 to 10% by weight, preferably 1 to Sjl% by weight, based on the resin composition.
0.5%未満では硬化が不十分であり、また。If it is less than 0.5%, curing will be insufficient.
10%を越えると成形物の機械的強度を付与することが
できない。If it exceeds 10%, mechanical strength cannot be imparted to the molded product.
ここで、硬化促進剤としては前記第2及び第3アミン顕
を用いることができる。Here, the aforementioned secondary and tertiary amines can be used as the curing accelerator.
酸無水物はそのままで使用することもできるが又硬化速
度の調整、硬化物の物性の向上の目的で硬化触媒、硬化
促進剤を併用することもできる。The acid anhydride can be used as it is, but a curing catalyst and a curing accelerator can also be used together for the purpose of adjusting the curing rate and improving the physical properties of the cured product.
ここで、硬化触媒としては前記第2及び第3アミン類及
びオクチル酸スズである。Here, the curing catalysts are the aforementioned secondary and tertiary amines and tin octylate.
硬化促進剤としては、水、エタノール、プロパツール、
イソプロパツール、シクロヘキサノール。As curing accelerators, water, ethanol, propatool,
Isopropanol, cyclohexanol.
エチレングリコール等のアルコール類、酢酸、プロピオ
ン酸、コハク酸、ヘキサヒドロフタル酸等のカルボン酢
及びエチレンジアミン、ジエチレントリアミン等の活性
水素を有するアミン類である。ノボラック樹脂は単独で
・又は硬化速度の118の目的で硬化触媒を併用するこ
とができる。These include alcohols such as ethylene glycol, carboxylic acids such as acetic acid, propionic acid, succinic acid, and hexahydrophthalic acid, and amines having active hydrogen such as ethylenediamine and diethylenetriamine. The novolac resin can be used alone or in combination with a curing catalyst for the purpose of curing speed.
ここで、硬化触媒としては前記第2及び第3アミン類で
ある。Here, the curing catalysts are the aforementioned secondary and tertiary amines.
ジシアンジアミドは、単独で又は硬化速度の調整の目的
で硬化触媒と併用することができる。Dicyandiamide can be used alone or in combination with a curing catalyst for the purpose of adjusting the curing rate.
ここで、硬化触媒としては前記第2及び第3アミンであ
る。Here, the curing catalysts are the aforementioned secondary and tertiary amines.
三フッ化ホウ素のアミン錯体は、単独で又は硬化速度の
調整の目的で硬化速度調整剤を併用・することができる
。The amine complex of boron trifluoride can be used alone or in combination with a curing rate regulator for the purpose of adjusting the curing rate.
ここで、硬化速度調整剤としては従来のエポキシ樹脂に
用いることのできるものであれば、何でも良いが、具体
的には、例えばカルボン酸類、アミン類、金属のアセチ
ルアセトン錯体、チタン、スズ等の金属の有機金属化合
物、グリコール類、有機ホウ素化合物等が含まれる。Here, any curing rate regulator may be used as long as it can be used in conventional epoxy resins, but specific examples include carboxylic acids, amines, acetylacetone complexes of metals, metals such as titanium, tin, etc. These include organometallic compounds, glycols, organoboron compounds, etc.
本発明の封止剤の主成分となるエポキシ樹脂には前記硬
化剤、硬化促進剤の他に必要に応じて充填剤も用いるこ
とができる。In addition to the curing agent and curing accelerator described above, a filler can also be used in the epoxy resin which is the main component of the sealant of the present invention, if necessary.
用い得る充填剤としては、樹脂用の充填剤として用いる
ことのできるものであれば何でも良いが、具体的にはケ
イ砂、シリカ、アルミナ、ケイソウ土、炭酸カルシウム
、アスベスト、ガラス、炭酸マグネシウム、カオリン、
金属粉等がある。形状としては、繊維状のもの、フレー
ク状のものなど種々のものが用いられる。Any filler that can be used as a filler for resins may be used, but specific examples include silica sand, silica, alumina, diatomaceous earth, calcium carbonate, asbestos, glass, magnesium carbonate, and kaolin. ,
There is metal powder, etc. Various shapes can be used, such as fibrous, flake, etc.
充填剤の配合量は樹脂組成物に対して25〜90%であ
ることが望ましい。The blending amount of the filler is preferably 25 to 90% based on the resin composition.
25%未満では機械的特性を改善することができず、ま
た、90%を越えると成形性などが悪くなり実用的でな
い。If it is less than 25%, mechanical properties cannot be improved, and if it exceeds 90%, moldability deteriorates and is not practical.
[発明の効果]
このようにして得られた本発明の封止剤は耐湿性がよく
、耐熱性も高<、ei械的特性に優れ、かつ、成形性に
優れてい企ため電子、電機部品などに用いた場合、十分
な信頼性を発揮する。[Effects of the Invention] The sealant of the present invention thus obtained has good moisture resistance, high heat resistance, excellent mechanical properties, and excellent moldability, and is suitable for use in electronic and electrical parts. It exhibits sufficient reliability when used in applications such as
次に実施例を挙げて本発明を説明する。Next, the present invention will be explained with reference to Examples.
「合成例−1」
[5−ビニルビシクロ[2,2,11ヘプト−2−エン
−2−オキシド(ビニルノルボルネンオキシド)の合成
]
5−ビニルビシクロC2,2,11ヘプト−2−エン(
ビニルノルボルネン)1697.4g(14,15モル
)を反応器に仕込み、これに過酢酸1075.8g(1
4,15モル)t−酢酸エチル溶液として反応温度を4
0℃に保持しながら5.5時間に亘って滴下した。"Synthesis Example-1" [Synthesis of 5-vinylbicyclo[2,2,11hept-2-ene-2-oxide (vinylnorbornene oxide)] 5-vinylbicycloC2,2,11hept-2-ene (
1,697.4 g (14.15 mol) of vinylnorbornene) was charged into the reactor, and 1,075.8 g (14.15 mol) of peracetic acid was added to the reactor.
4,15 mol) as a t-ethyl acetate solution at a reaction temperature of 4.
The mixture was added dropwise over 5.5 hours while maintaining the temperature at 0°C.
過酢酸仕込み終了後40℃でさらに1時間熟成した。得
られた反応粗液を蒸溜水で充分に洗浄した。有機層部分
を蒸溜塔を用いて精溜することにより透明な液体を得た
・。After the completion of charging peracetic acid, the mixture was further aged at 40°C for 1 hour. The obtained reaction crude liquid was thoroughly washed with distilled water. A transparent liquid was obtained by rectifying the organic layer using a distillation column.
この液体の沸点は25To r rで91℃であった。The boiling point of this liquid was 91° C. at 25 Torr.
生成物の赤外線吸収スペクトル分析により810cm、
1270cmにエポキシ基の吸収が存在すること、更に
、1640cm、1820cmにビニル基の吸収が存在
していること、また、NMRによる分析で本化合物は次
式で示され、る5−ビニルビシクロ[2,2,1]ヘプ
ト−2−エン−2−オキシドであることが確認された。According to infrared absorption spectrum analysis of the product, 810 cm,
The presence of an epoxy group absorption at 1270 cm, and the presence of vinyl group absorption at 1640 cm and 1820 cm, and NMR analysis revealed that this compound is represented by the following formula, 5-vinylbicyclo[2 ,2,1]hept-2-ene-2-oxide.
「合成例−2」
トリメチロールプロパン9.8g (0,073モル)
、5−ビニルビシクロ[2,2,1]へブドー2−エン
−2−オキシド(ビニルノルボルネンオキシド)150
g (1,1モル)にB F 3エーテラート13.0
5g (0,092モル)の酢酸エチル溶液を50℃で
混合し、オキシラン酸素含有率が1%未満になるまで反
応させた。"Synthesis Example-2" Trimethylolpropane 9.8g (0,073 mol)
, 5-vinylbicyclo[2,2,1]hebdo-2-en-2-oxide (vinylnorbornene oxide) 150
g (1.1 mol) of B F 3 etherate 13.0
A solution of 5 g (0,092 mol) of ethyl acetate was mixed at 50° C. and reacted until the oxirane oxygen content was less than 1%.
得られた反応粗液を蒸溜水で充分に洗浄した。The obtained reaction crude liquid was thoroughly washed with distilled water.
有機層部分を濃縮することにより粘稠な液体が得られた
。A viscous liquid was obtained by concentrating the organic layer.
生成物の赤外線吸収スペクトル分析により原料に見られ
た810cm 、1270cm−1にエボキシ基の吸
収がなくなっていること、1080cm−11150c
m−’にエーテル結合による吸収が存在すること、さら
に、1640cm 、182部cm−’にビニル基の
吸収が残存していること。Infrared absorption spectrum analysis of the product revealed that there was no absorption of epoxy groups at 810 cm and 1270 cm observed in the raw material, and 1080 cm - 11150 cm.
Absorption due to ether bond exists at m-', and absorption due to vinyl group remains at 1640 cm and 182 parts cm-'.
また、NMRによる分析で本化合物は次式で示される骨
格を有することが確認された。Furthermore, NMR analysis confirmed that this compound has a skeleton represented by the following formula.
CHO−[A]。1−H
CH3CH2CCH20−[A]。2HCH20−[A
]。3H
[ただし、Aは下記の構造を表わし。CHO-[A]. 1-H CH3CH2CCH20-[A]. 2HCH20-[A
]. 3H [However, A represents the following structure.
nl、 R2,n3=平均5
この化合物80gを酢酸エチルに溶解して反応器に仕込
み、これに過酢酸42「を酢酸エチル溶液として反応温
度を50℃に保持しながら2時間に亘って滴下した。nl, R2, n3 = average 5 80 g of this compound was dissolved in ethyl acetate and charged into a reactor, and 42" peracetic acid was added dropwise to this as an ethyl acetate solution over 2 hours while maintaining the reaction temperature at 50 ° C. .
過酢酸仕込み終了後50℃でさらに4時間熟成した0反
応粗液に酢酸エチルを追加し、蒸溜水で洗浄し、続いて
有機層を濃縮して粘ちよな液体を得た。After the completion of charging peracetic acid, ethyl acetate was added to the O-reaction crude solution that was further aged at 50° C. for 4 hours, washed with distilled water, and then the organic layer was concentrated to obtain a viscous liquid.
この化合物はオキシラン酸素含有率が5.77%で赤外
線吸収スペクトルで1260011−’にエポキシ基に
よる特許吸収が見られた。さらに1640cm−’に残
存ビニル基による吸収が見られること、3450 ex
−’にOH基、1730csa−1に0 にC−0−
よる吸収が見られることから本化合物は一般式(I)の
構造(R1ニトリメチロールプロパン残、n =平均
5、エポキシ
基1=3、nl、R23
基に酢酸が付加した基を1部含む)であることを確認し
た。This compound had an oxirane oxygen content of 5.77%, and a patent absorption due to the epoxy group was observed at 1260011-' in the infrared absorption spectrum. Furthermore, absorption due to residual vinyl groups is observed at 1640 cm-', and 3450 ex
-' is an OH group, and 1730csa-1 shows absorption due to C-0- at 0. This compound has the structure of general formula (I) (R1 nitrimethylolpropane residue, n = average 5, epoxy group 1 = 3). , nl, containing a portion of the R23 group with acetic acid added thereto).
「実施例−1」
合成例−2で得たエポキシ化合物100重量部にノボラ
ック型フェノール樹脂(群栄化学PSF4300、フェ
ノール当量110)50部、2−ウンデシルイミダゾー
ル(C,1Z 、四国化成工業)1重量部、溶融シリカ
粉末400重量部を常温で混合して90〜95℃で混練
して冷却後、粉砕し。"Example-1" 100 parts by weight of the epoxy compound obtained in Synthesis Example-2, 50 parts of novolac type phenol resin (Gun-ei Chemical PSF4300, phenol equivalent 110), and 2-undecylimidazole (C, 1Z, Shikoku Kasei Kogyo) 1 part by weight and 400 parts by weight of fused silica powder were mixed at room temperature, kneaded at 90 to 95°C, cooled, and then pulverized.
て成形材料を得た。A molding material was obtained.
得られた成形材料をタブレット化して予熱し。The obtained molding material is made into tablets and preheated.
トランスファー成形で170℃に加熱した金型内に注入
して成形品を得た。A molded product was obtained by injecting the mixture into a mold heated to 170° C. by transfer molding.
この成形品について緒特性を測定してその結果を表−1
に示した。The properties of this molded product were measured and the results are shown in Table 1.
It was shown to.
「比較例−1」
クレゾールノボラック型フェノール樹脂(エポキシ当量
201)100部にノボラック型フェノール樹脂(群栄
化学PSF4300.フェノール当量110)50部、
2−ウンデシルイミダゾール(Ci 1Z 、四国化成
工業)1重量部、溶融シリカ粉末400重量部を常温で
混合して実施例−1と同じ条件でトランスファー成形し
て成形品を得た。この成形品について緒特性を測定して
その結果を表−1に併せて示した。"Comparative Example-1" 50 parts of novolac type phenol resin (Gun-ei Chemical PSF4300. Phenol equivalent: 110) in 100 parts of cresol novolac type phenol resin (epoxy equivalent: 201),
1 part by weight of 2-undecylimidazole (Ci 1Z, Shikoku Kasei Kogyo) and 400 parts by weight of fused silica powder were mixed at room temperature and transfer molded under the same conditions as in Example 1 to obtain a molded article. The mechanical properties of this molded article were measured and the results are also shown in Table 1.
「実施例−2」
合成例−2で得たエポキシ化合物100重量部にノボラ
ック型フェノール樹脂(群栄化学PSF4300、フェ
ノール当量110)100部、2−ウンデシルイミダゾ
ール(C112、四国化成工業)3重量部、溶融シリカ
粉末400重量部を常温で混合して90〜95℃で混練
して冷却後、粉砕し、て成形材料を得た。得られた成形
材料をタブレット化して予熱し、トランスファー成形で
170℃に加熱した金型内に注入して成形品を得た。"Example-2" 100 parts by weight of the epoxy compound obtained in Synthesis Example-2, 100 parts by weight of novolac type phenol resin (Gun-ei Chemical PSF4300, phenol equivalent weight 110), and 3 parts by weight of 2-undecylimidazole (C112, Shikoku Kasei Kogyo) and 400 parts by weight of fused silica powder were mixed at room temperature, kneaded at 90 to 95°C, cooled, and pulverized to obtain a molding material. The obtained molding material was made into a tablet, preheated, and injected into a mold heated to 170° C. by transfer molding to obtain a molded product.
この成形品について緒特性を測定してその結果を表−1
に示した。The properties of this molded product were measured and the results are shown in Table 1.
It was shown to.
表−1
(以下余白)
注=1
曲げ強さ1曲げ弾性率の単位はいずれもkg/Itn
。Table-1 (blank space below) Note: 1 Bending strength 1 Bending modulus is in kg/Itn
.
上段は20℃、下段は120℃二おける測定値。The upper row is the measured value at 20°C, and the lower row is the measured value at 120°C.
注:2
温熱サイクル試験は(クラック数/サンプル数)の数値
で、クラック数は30x25x5inの成形品の底面に
25X25X3imの銅板を埋め込み。Note: 2 The thermal cycle test is a numerical value of (number of cracks/number of samples), and the number of cracks is a 25 x 25 x 3 inch copper plate embedded in the bottom of a 30 x 25 x 5 inch molded product.
−40℃と200℃の恒温槽に各30分間づつ入れ、1
5サイクル繰り返した後の樹脂のクラック数を測定した
もの。Place it in a constant temperature bath at -40℃ and 200℃ for 30 minutes each.
Measurement of the number of cracks in the resin after 5 cycles.
注=3
耐湿試験は封止用樹脂組成物を用いて2本のアルミニウ
ム配線を有する電気部品を170℃で3分間トランスフ
ァー成形してその後180℃で8時間硬化させた。この
ようにして得られた封止電気部品100個について12
0℃の高圧水蒸気中で行い、アルミニウム腐蝕による5
0%断線(不良発生)の起きる時間を測定したもの。Note=3 In the moisture resistance test, an electrical component having two aluminum wirings was transfer-molded at 170°C for 3 minutes using the sealing resin composition, and then cured at 180°C for 8 hours. 12 for 100 sealed electrical components obtained in this way.
5 due to aluminum corrosion when carried out in high pressure steam at 0°C.
Measurement of the time at which 0% wire disconnection (defect occurrence) occurs.
表−1の結果から明らかに本発明の封止剤を用いたもの
は耐湿性、耐熱性、耐クラツク性に優れていることがわ
かる。From the results in Table 1, it is clearly seen that the sealants using the sealant of the present invention are excellent in moisture resistance, heat resistance, and crack resistance.
Claims (1)
、化学式、表等があります▼( I ) [但し、R^1はlケの活性水素を有する有機化合物残
基、n1、n2……nlは0又は1〜100の整数で、
その和が1〜100である、lは1〜100の整数を表
わす] 「Aは次式で表わされる ▲数式、化学式、表等があります▼ ただし、Xは▲数式、化学式、表等があります▼、−C
H=CH2、 ▲数式、化学式、表等があります▼ R^2はH、アルキル基、カーボアルキル基、カーボア
リール基の内のいずれか一つであるが、▲数式、化学式
、表等があります▼は一般式( I )で表わされる樹脂 中に一個以上含まれることが必要である」 (b)エポキシ樹脂用硬化剤 を必須成分とすることを特徴とする封止剤。[Claims] (a) Epoxy resin represented by the general formula (I) ▲There are mathematical formulas, chemical formulas, tables, etc.▼(I) [However, R^1 is an organic compound residue having l active hydrogens , n1, n2... nl is 0 or an integer from 1 to 100,
The sum is 1 to 100, l represents an integer from 1 to 100] "A is represented by the following formula ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ However, X is ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼、-C
H=CH2, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ R^2 is any one of H, an alkyl group, a carboalkyl group, a carboaryl group, ▲ There are mathematical formulas, chemical formulas, tables, etc. It is necessary that one or more ▼ be contained in the resin represented by the general formula (I).'' (b) A sealant characterized by containing a curing agent for epoxy resin as an essential component.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018089A JPH02199115A (en) | 1989-01-30 | 1989-01-30 | Sealing agent |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018089A JPH02199115A (en) | 1989-01-30 | 1989-01-30 | Sealing agent |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02199115A true JPH02199115A (en) | 1990-08-07 |
Family
ID=12019981
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018089A Pending JPH02199115A (en) | 1989-01-30 | 1989-01-30 | Sealing agent |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02199115A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998059004A1 (en) * | 1997-06-20 | 1998-12-30 | Nippon Zeon Co., Ltd. | Electronic component-protecting material |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6361019A (en) * | 1986-08-30 | 1988-03-17 | Nissan Motor Co Ltd | Novel epoxy resin |
JPS649216A (en) * | 1986-08-26 | 1989-01-12 | Daicel Chem | Epoxy resin |
-
1989
- 1989-01-30 JP JP2018089A patent/JPH02199115A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS649216A (en) * | 1986-08-26 | 1989-01-12 | Daicel Chem | Epoxy resin |
JPS6361019A (en) * | 1986-08-30 | 1988-03-17 | Nissan Motor Co Ltd | Novel epoxy resin |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998059004A1 (en) * | 1997-06-20 | 1998-12-30 | Nippon Zeon Co., Ltd. | Electronic component-protecting material |
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