JPH0219575B2 - - Google Patents
Info
- Publication number
- JPH0219575B2 JPH0219575B2 JP2425881A JP2425881A JPH0219575B2 JP H0219575 B2 JPH0219575 B2 JP H0219575B2 JP 2425881 A JP2425881 A JP 2425881A JP 2425881 A JP2425881 A JP 2425881A JP H0219575 B2 JPH0219575 B2 JP H0219575B2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- shadow mask
- electron beam
- color picture
- shadow
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
- H01J9/142—Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Electrodes For Cathode-Ray Tubes (AREA)
Description
【発明の詳細な説明】
本発明はマスク集束型カラー受像用のシヤドウ
マスク成形法に関し、更に詳述すれば二枚の電極
を一定間隔を有して対向せしめ、これに所定の電
位差を与えてシヤドウマスクの電子ビーム通過孔
に電子レンズを形成するマスク集束型カラー受像
管用のシヤドウマスク成形法に関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for forming a shadow mask for mask-focused color image reception, and more specifically, the present invention relates to a method for forming a shadow mask for mask-focused color image reception. The present invention relates to a method for forming a shadow mask for a mask focusing type color picture tube, in which an electron lens is formed in an electron beam passage hole of a mask focusing type color picture tube.
マスク集束型カラー受像管のシヤドウマスクと
してはシヤドウマスク電極とシヤドウマスクレン
ズ電極の二つの電極を対向せしめ、それらの間に
所定の電位差を与え電子ビーム通過孔に電子レン
ズを形成せしめるものである。このようなシヤド
ウマスクについては特公昭45−4819号公報、特公
昭47−20451号公報、特公昭47−8261号公報、特
公昭47−28188号公報及び特公昭47−28789号公報
等に示されている。これらについて第1図をもと
に説明すると、シヤドウマスク電極1及びシヤド
ウマスクレンズ電極2は絶縁物3を介して対向し
ており、これ等のシヤドウマスク1及び2には電
子ビーム7の通過孔となる多数の通過孔8が設け
られている。このシヤドウマスクに対向して受像
管のフエースガラス4には、三原色螢光体層5及
びメタルバツク層6が設けられている。 The shadow mask of the mask-focusing color picture tube has two electrodes, a shadow mask electrode and a shadow mask lens electrode, facing each other, and a predetermined potential difference is applied between them to form an electron lens in the electron beam passage hole. Such shadow masks are disclosed in Japanese Patent Publication No. 45-4819, Japanese Patent Publication No. 20451-1982, Publication No. 8261-1982, Publication No. 28188-1988, Publication No. 28789-1989, etc. There is. To explain these based on FIG. 1, a shadow mask electrode 1 and a shadow mask lens electrode 2 are opposed to each other with an insulator 3 in between. A large number of passage holes 8 are provided. Opposed to this shadow mask, a three primary color phosphor layer 5 and a metal back layer 6 are provided on the face glass 4 of the picture tube.
上記の如き構造の受像管においてシヤドウマス
クレンズ電極2に加速電圧またはそれに近い電圧
を印加せしめると共に、シヤドウマスク電極1に
は上記シヤドウマスクレンズ電極2より低い電圧
を印加することにより電子ビーム通過孔8には矢
印で示す電気力線が発生し静電レンズが形成され
る。このような電界の存在する各孔内を走行する
電子ビームは上記静電レンズの作用により孔の中
心軸に向つて集束され螢光体層5に衝突する。こ
の衝突時の電子ビーム径は前記集束作用により通
過孔8の面積よりも相当小さいものになる。以上
のような構造のシヤドウマスクを使用すれば電子
ビームの利用率が上がり明るい画面が得られると
共に色純度及び解像度を一段と向上せしめる事が
可能である。マスク集束型カラー受像管は二枚の
電極を対向せしめる際目的とする電子ビーム通過
孔が完全に対応して得られなければ静電レンズ効
果が薄れると共に集束電子ビーム形状がゆがみ画
像品位の向上が望めないばかりか逆に電子ビーム
の螢光面へのランデイングエラーを引起す何能性
が有る。 In the picture tube having the above structure, an accelerating voltage or a voltage close to it is applied to the shadow mask lens electrode 2, and a voltage lower than that of the shadow mask lens electrode 2 is applied to the shadow mask electrode 1, so that the electron beam passage hole is 8, electric lines of force shown by arrows are generated and an electrostatic lens is formed. The electron beam traveling through each hole where such an electric field exists is focused toward the central axis of the hole by the action of the electrostatic lens and collides with the phosphor layer 5. The diameter of the electron beam at the time of this collision becomes considerably smaller than the area of the passage hole 8 due to the above-mentioned focusing effect. By using a shadow mask having the above structure, it is possible to increase the utilization rate of electron beams, obtain a bright screen, and further improve color purity and resolution. In a mask focusing type color picture tube, when two electrodes are made to face each other, if the targeted electron beam passage holes are not perfectly matched, the electrostatic lens effect will be weakened and the shape of the focused electron beam will be distorted, resulting in poor image quality. Not only is this not desirable, but it also has the potential to cause a landing error of the electron beam on the fluorescent surface.
一般にマスク集束型カラー受像管用シヤドウマ
スクは通常のカラー受像管と同様或る曲率を持た
せるために成形が行なわれるが、この方法の1例
として米国特許第4112563号公報に各々のマスク
を独立に引張りながら直交させ、二枚のマスク間
に熱拡散結合剤となる金属層を絶縁層両面に形成
したシートを介し下部より或る曲率を有する金型
を押し上げ圧着しながら高温炉を通して成形する
方法が示されている。しかしマスク両端を平担な
状態で一定の張力にて引張る事はマスク全体にか
かる応力が異なることと合せ金型を押し上げ圧着
することにより更に大きなひずみ応力がかかるこ
とによりマスク孔の伸びのばらつきが発生する。
この結果電子ビーム通過孔にゆがみが発生し画像
品位の向上が望めないという欠点を有する。 In general, shadow masks for mask-focusing color picture tubes are molded to have a certain curvature just like normal color picture tubes, but as an example of this method, U.S. Pat. No. 4,112,563 describes a method in which each mask is stretched independently A method is shown in which a mold having a certain curvature is pushed up from below through a sheet with a metal layer formed on both sides of the insulating layer and a metal layer serving as a heat diffusion bonding agent is formed between two masks, and the mold is passed through a high-temperature furnace while being pressed. has been done. However, pulling both ends of the mask flat with a constant tension means that the stress applied to the entire mask differs, and pushing up and crimping the mating mold will apply even greater strain stress, which may cause variations in the elongation of the mask holes. Occur.
As a result, distortion occurs in the electron beam passage hole, resulting in a drawback that no improvement in image quality can be expected.
上記に述べた如く二枚のシヤドウマスクの間に
例えばガラス又はポリイミドフイルムなどの絶縁
物を介する構造の場合、この絶縁物に電子ビーム
が衝突すると絶縁物が帯電し充分な電子ビームの
集束作用が得られないばかりか非点収差の原因に
なり、この構造により得られる極めて優れた利点
が生かされないという欠点が有る。一方絶縁物を
介さずに二枚のシヤドウマスクを平担な状態で重
ね合せ電子ビーム通過孔の位置合せを行なつた後
通常のカラー受像管シヤドウマスクと同様プレス
にて成形を行ない、成形後二枚のシヤドウマスク
間に所望する間隔を持せる構造の場合、プレス時
における二枚のマスク間のスベリ及び伸びのばら
つきにより電子ビーム通過孔のゆがみが発生する
ことから画像品位の向上が望めないという欠点を
有する。 As mentioned above, in the case of a structure in which an insulating material such as glass or polyimide film is interposed between two shadow masks, when an electron beam collides with this insulating material, the insulating material becomes electrically charged and a sufficient electron beam focusing effect is obtained. This has the drawback that not only does it not work, but it also causes astigmatism, making it impossible to take advantage of the extremely excellent advantages provided by this structure. On the other hand, two shadow masks are laid flat without an insulator interposed between them, the electron beam passage holes are aligned, and then molded using a press in the same way as a normal color picture tube shadow mask. In the case of a structure that allows a desired spacing between the shadow masks, the disadvantage is that the electron beam passage hole is distorted due to variations in slippage and elongation between the two masks during pressing, making it impossible to expect improvement in image quality. have
本発明は絶縁物を介さずに対向する二枚のシヤ
ドウマスク電極間に一定の間隔を持たせたマスク
集束型カラー受像管用シヤドウマスクの成形法に
関するものである。 The present invention relates to a method of forming a shadow mask for a mask focusing type color picture tube in which a constant distance is maintained between two shadow mask electrodes facing each other without an insulator interposed therebetween.
即ち本発明は以上の点に鑑みてなされたもので
二枚のシヤドウマスク電極を重ね合せ電子ビーム
通過孔の位置合せを行なつた後所望の曲率を持た
せる為のプレス成形時にゆがみのない目的とする
電子ビーム通過孔が得られるマスク集束型カラー
受像管用のシヤドウマスク成形法を提供するもの
である。 That is, the present invention has been made in view of the above points, and the purpose is to avoid distortion during press molding to have a desired curvature after overlapping two shadow mask electrodes and aligning the electron beam passage hole. The present invention provides a method for forming a shadow mask for a mask-focusing color picture tube, which provides an electron beam passage hole that allows the electron beam to pass through.
以下本発明の詳細について実施例をあげて詳述
する。尚、カラー受像管として他の構成は第1図
と同様であるので説明は省略する。 The details of the present invention will be described below with reference to Examples. Note that the other configurations of the color picture tube are the same as those shown in FIG. 1, so explanations will be omitted.
通常のカラー受像管用シヤドウマスクと同様フ
オトエツチングにて所望する孔を有するシヤドウ
マスク電極を形成し且つこのシヤドウマスクには
電子ビーム通過孔の位置合せを容易に行なえるよ
うにする為マスク有効面11外に位置合せガイド
孔14が設けられている。次いで第2図に示すよ
うにガイドピン10のついた位置合せ治具9を用
いて二枚のマスク1及び2を重ねた後、所望する
曲率をつける際のプレス時におけるマスク同志の
ずれによる電子ビーム通過孔のゆがみを防止する
ためマスク有効面11以外の周囲をシーム溶接1
2又はスポツト溶接13し二枚のマスク同志を固
定する。溶接位置の1例を第3図に示す。この後
通常のカラー受像管用シヤドウマスク成形と同様
所望する曲率を有する雌雄の金型を用いてプレス
成形を行ない目的とする曲率をつけた後溶接部を
含む有効面外を機械的に又はレーザー光などを用
いて切断する。この方法にて形成したマスク集束
型カラー受像管用シヤドウマスクは二枚のマスク
を比較した場合に板厚分の曲率が異なるため微視
的にはシヤドウマスク材質の不均一及びプレス時
に圧力のかかり方の違いによつて若干マスク孔の
伸びにばらつきが発生する。しかし電子ビーム通
過孔が大きな場合にはこの伸びのばらつきによる
電子ビーム通過孔のゆがみによつて発生する静電
レンズ効果の減少は無視できる範囲内であつた。
しかし電子ビーム通過孔が小さな場合、上記方法
による電子ビーム通過孔のゆがみは無視できず大
きな問題となる。 A shadow mask electrode having a desired hole is formed by photo-etching in the same way as a normal color picture tube shadow mask, and the shadow mask is located outside the mask effective surface 11 in order to easily align the electron beam passage hole. A matching guide hole 14 is provided. Next, as shown in FIG. 2, after overlapping the two masks 1 and 2 using a positioning jig 9 equipped with a guide pin 10, electrons due to misalignment between the masks during pressing to create a desired curvature are generated. Seam welding 1 around the area other than the mask effective surface 11 to prevent distortion of the beam passage hole
2 or spot weld 13 to fix the two masks together. An example of welding positions is shown in Figure 3. After this, press molding is performed using male and female molds with the desired curvature, as in the case of normal color picture tube shadow mask molding. Cut using. When comparing the two masks formed using this method, the curvature of the mask for color picture tubes is different due to the difference in the curvature of the plate thickness, so microscopically there are non-uniformities in the shadow mask material and differences in the way pressure is applied during pressing. Due to this, there will be some variation in the elongation of the mask hole. However, when the electron beam passage hole is large, the reduction in the electrostatic lens effect caused by the distortion of the electron beam passage hole due to this variation in elongation was within a negligible range.
However, when the electron beam passage hole is small, the distortion of the electron beam passage hole caused by the above method cannot be ignored and becomes a serious problem.
以下に上述した方法の欠点を補ない更に精度の
高いシヤドウマスク成形法について述べる。 A more accurate shadow mask forming method that does not compensate for the drawbacks of the above-mentioned methods will be described below.
通常のカラー受像管用シヤドウマスクと同様フ
オトエツチングにて所望する孔を有するシヤドウ
マスク電極を形成し、且つこのシヤドウマスクに
は電子ビーム通過孔の位置合せを容易に行なえる
ようにする為マスク有効面外に位置合せガイド孔
が設けられている。次いで第2図に示すように位
置合せ治具を用いて二枚のマスクを重ねた後所望
する曲率をつける際のプレス時におけるマスク同
志のズレによる電子ビーム通過孔のゆがみを防止
するためマスク有効面外の周囲をシーム溶接又は
スポツト溶接し二枚のマスク同志を固定する。こ
こまでの工程は前述の成形法と同じである。 A shadow mask electrode with a desired hole is formed by photo-etching in the same way as a normal color picture tube shadow mask, and in order to easily align the electron beam passage hole, this shadow mask has a hole located outside the effective surface of the mask. A matching guide hole is provided. Next, as shown in Figure 2, the mask is effective to prevent distortion of the electron beam passage hole due to misalignment of the two masks during pressing to give the desired curvature after overlapping the two masks using an alignment jig. The two masks are fixed together by seam welding or spot welding around the outside of the plane. The steps up to this point are the same as the molding method described above.
次いで第4図に示すように電子ビーム通過孔8
をレジン15で埋める。これに用いられるレジン
としては例えばフエノール、エポキシ、ポリビニ
ル、酢酸ビニル、セルロース、ポリアミド系レジ
ン等が挙げられる。しかしプレス成形後用いられ
たレジンが容易に取除かれねばならず、種々の実
験の結果ポリビニルアルコールジンを用いるのが
好適であつた。ポリビニルアルコールレジンを電
子ビーム通過孔に埋めた後約100℃の熱風で充分
乾燥させることにより、電子ビーム通過孔壁への
接着力及びプレス時の耐破壊に対し充分な効果を
発揮した。しかし更に二枚のマスクのプレス時に
おける極微少なズレを起させない為にこのレジン
をキユアリングする事が望ましい。このキユアリ
ングの方法としては熱風乾燥後ホルマリン溶液、
タンニン酸溶液又はクロム酸溶液に浸漬するか又
はスプレーする方法が好適である。この後通常の
カラー受像管用シヤドウマスクの成形と同様所望
する曲率を有る雌雄の金型を用いてプレスを行な
い目的とする曲率をつける。この後充填したレジ
ンを除去し溶接部を含む有効面外を機械的に又は
レーザー光などを用いて切断するが、ポリビニル
アルコールレジンを用いた場合の除去方法は成形
したシヤドウマスクをアルカリ溶液例えば水酸化
ナトリウム、水酸化カリウム、アンモニア水又は
過酸化水素水に浸漬するかスプレーする方法が好
適である。この方法にて形成したマスク集束型カ
ラー受像管用シヤドウマスクはプレス時のマスク
孔の微少な伸びのズレも二枚のマスク間で一対一
で発生するため最終的には目的とする電子ビーム
通過孔を得ることができた。 Next, as shown in FIG.
Fill with resin 15. Examples of resins used for this include phenol, epoxy, polyvinyl, vinyl acetate, cellulose, and polyamide resins. However, the resin used must be easily removed after press molding, and as a result of various experiments, it was found that polyvinyl alcohol resin was suitable. By filling the electron beam passage hole with polyvinyl alcohol resin and thoroughly drying it with hot air at approximately 100°C, sufficient effects were achieved in terms of adhesive strength to the electron beam passage hole wall and fracture resistance during pressing. However, it is desirable to cure this resin in order to prevent minute misalignment during pressing of the two masks. This curing method involves using formalin solution after drying with hot air.
Immersion or spraying in tannic or chromic acid solutions is preferred. Thereafter, pressing is carried out using male and female molds having the desired curvature to obtain the desired curvature, in the same manner as in the molding of ordinary color picture tube shadow masks. After this, the filled resin is removed and the outside of the effective surface, including the welded part, is cut mechanically or using a laser beam. However, when polyvinyl alcohol resin is used, the molded shadow mask is removed using an alkaline solution such as hydroxide. Preferred methods include immersion or spraying in sodium, potassium hydroxide, aqueous ammonia or aqueous hydrogen peroxide. In the mask-focusing type color picture tube shadow mask formed by this method, even slight deviations in the elongation of the mask holes during pressing occur in a one-to-one manner between the two masks, so in the end, the desired electron beam passing hole cannot be formed. I was able to get it.
以上述べてきたように本発明によれば、電子ビ
ーム通過孔に電子レンズを形成し電子ビームを絞
ることにより電子ビーム利用率を向上させるマス
ク集束型カラー受像管用のシヤドウマスク成形法
において、二枚のシヤドウマスク電極間に絶縁物
を介さない構造のマスク集束型カラー受像管用シ
ヤドウマスクの成形に際し、プレス成形時におけ
る二枚のシヤドウマスクのズレ及び伸びの不均一
による電子ビーム通過孔のゆがみが防止され目的
とする電子ビーム通過孔が得られ、マスク集束型
カラー受像管用シヤドウマスクの効果が充分発揮
でき良好な画像を再生できる特徴を有し効果大な
るものである。 As described above, according to the present invention, in the shadow mask forming method for a mask focusing type color picture tube, which improves the electron beam utilization rate by forming an electron lens in the electron beam passage hole and narrowing down the electron beam, two sheets are used. When molding a mask focusing type color picture tube shadow mask with a structure that does not require an insulator between the shadow mask electrodes, distortion of the electron beam passage hole due to misalignment and uneven elongation of the two shadow masks during press molding can be prevented. The electron beam passing hole is obtained, the effect of the mask focusing type color picture tube shadow mask can be fully exhibited, and a good image can be reproduced, which is very effective.
第1図はマスク集束型カラー受像管のシヤドウ
マスク乃至フエースガラスを示す部分拡大図、第
2図は本発明の実施例であるシヤドウマスク電極
位置合せ治具を示す概略図、第3図は同じく溶接
位置の一例を示す概略図、第4図は同じくシヤド
ウマスク成形工程を示す部分断面図である。
1……シヤドウマスク電極、2……シヤドウマ
スクレンズ電極、3……絶縁物、4……フエース
ガラス、5……三色螢光体層、6……メタルバツ
ク層、7……電子ビーム、8……電子ビーム通過
孔、9……位置合せ治具、10……ガイドピン、
11……マスク有効面、12……シーム溶接、1
3……スポツト溶接、14……位置合せガイド
孔。
Fig. 1 is a partially enlarged view showing the shadow mask or face glass of a mask focusing color picture tube, Fig. 2 is a schematic view showing a shadow mask electrode positioning jig according to an embodiment of the present invention, and Fig. 3 is a welding position as well. FIG. 4 is a schematic view showing an example, and FIG. 4 is a partial cross-sectional view similarly showing the shadow mask forming process. DESCRIPTION OF SYMBOLS 1...Shadow mask electrode, 2...Shadow mask lens electrode, 3...Insulator, 4...Face glass, 5...Tricolor phosphor layer, 6...Metal back layer, 7...Electron beam, 8 ...Electron beam passage hole, 9...Positioning jig, 10...Guide pin,
11... Mask effective surface, 12... Seam welding, 1
3...Spot welding, 14...Positioning guide hole.
Claims (1)
して固定し、この電極間に電位差を持たせる事に
より静電レンズを形成するマスク集束型カラー受
像管用のシヤドウマスク成形法において、前記二
枚のシヤドウマスク電極を重ね合せ前記マスクの
有効面外をシーム溶接又はスポツト溶接後所望の
曲率を持たせるよう成形し、且つ成形後溶接部を
含むマスク有効面外を切断する事を特徴とするマ
スク集束型カラー受像管用シヤドウマスク成形
法。 2 二枚のシヤドウマスク電極を重ね合せ前記マ
スクの有効面外をシーム溶接又はスポツト溶接後
電子ビーム通過孔を樹脂で埋め、所望の曲率を持
たせるよう成形した後電子ビーム通過孔内の樹脂
を除去し、ついで溶接部を含むマスク有効面外を
切断することを特徴とする特許請求の範囲第1項
記載のマスク集束型カラー受像管用シヤドウマス
ク成形法。[Claims] 1. In a shadow mask forming method for a mask focusing type color picture tube, in which an electrostatic lens is formed by fixing two shadow mask electrodes at a constant interval and creating a potential difference between the electrodes. , the above-mentioned two shadow mask electrodes are overlapped, the outside of the effective surface of the mask is seam welded or spot welded, and then formed to have a desired curvature, and the outside of the effective surface of the mask, including the welded portion, is cut after forming. A shadow mask molding method for mask focusing color picture tubes. 2 Overlap two shadow mask electrodes, seam weld or spot weld the outside of the effective surface of the mask, fill the electron beam passage hole with resin, shape it to have a desired curvature, and then remove the resin inside the electron beam passage hole. 2. The method of forming a shadow mask for a mask focusing type color picture tube according to claim 1, wherein the mask is then cut outside the effective mask surface including the welded portion.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2425881A JPS57138746A (en) | 1981-02-23 | 1981-02-23 | Shadow mask molding method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2425881A JPS57138746A (en) | 1981-02-23 | 1981-02-23 | Shadow mask molding method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57138746A JPS57138746A (en) | 1982-08-27 |
JPH0219575B2 true JPH0219575B2 (en) | 1990-05-02 |
Family
ID=12133208
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2425881A Granted JPS57138746A (en) | 1981-02-23 | 1981-02-23 | Shadow mask molding method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57138746A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3919332C2 (en) * | 1988-06-17 | 1994-06-23 | Mitsubishi Electric Corp | Hole mask for a color picture tube |
-
1981
- 1981-02-23 JP JP2425881A patent/JPS57138746A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS57138746A (en) | 1982-08-27 |
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