JPH02144132U - - Google Patents
Info
- Publication number
- JPH02144132U JPH02144132U JP5046789U JP5046789U JPH02144132U JP H02144132 U JPH02144132 U JP H02144132U JP 5046789 U JP5046789 U JP 5046789U JP 5046789 U JP5046789 U JP 5046789U JP H02144132 U JPH02144132 U JP H02144132U
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor laser
- noise
- laser
- optical disk
- half mirror
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims description 21
- 238000001514 detection method Methods 0.000 claims description 7
- 230000003287 optical effect Effects 0.000 claims 11
- 238000010586 diagram Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Landscapes
- Optical Head (AREA)
Description
第1図は本考案による半導体レーザのノイズ測
定装置の一実施例を示す構成図、第2図は半導体
レーザの位置調整用に設けられた受光素子上のス
ポツト形状を示す説明図、第3図は半導体レーザ
からの射出光量と戻り光量との比に対する相対光
強度ノイズ特性を示す特性曲線図、第4図は従来
装置を示す構成図である。
20……レーザ取付部材、21……半導体レー
ザ、22……ハーフミラー、25……透過率可変
フイルタ、26……対物レンズ、27……ミラー
、28……ミラーアクチユエータ、31……フオ
ーカシングエラー検出用受光素子、32……測定
制御回路、38……ホログラム素子、39……ノ
イズ測定用受光素子、40……半導体レーザ位置
検出用受光素子、41……電圧計、42……スペ
クトルアナライザ。
Fig. 1 is a configuration diagram showing an embodiment of a semiconductor laser noise measuring device according to the present invention, Fig. 2 is an explanatory diagram showing the shape of a spot on a light receiving element provided for position adjustment of the semiconductor laser, and Fig. 3 4 is a characteristic curve diagram showing relative light intensity noise characteristics with respect to the ratio of the amount of light emitted from the semiconductor laser to the amount of returned light, and FIG. 4 is a configuration diagram showing a conventional device. 20...Laser mounting member, 21...Semiconductor laser, 22...Half mirror, 25...Transmittance variable filter, 26...Objective lens, 27...Mirror, 28...Mirror actuator, 31...Front Light receiving element for cumming error detection, 32... Measurement control circuit, 38... Hologram element, 39... Light receiving element for noise measurement, 40... Light receiving element for semiconductor laser position detection, 41... Voltmeter, 42... spectrum analyzer.
Claims (1)
光を、2分して異なる光路に射出するハーフミラ
ーと、 レーザ光を反射する光デイスク相当部材と、 この光デイスク相当部材をフオーカシング方向
に動揺させる光デイスク相当部材アクチユエータ
と、 少なくとも対物レンズを備え、上記ハーフミラ
ーを介した一方のレーザ光を、上記デイスク相当
部材に照射させる光学系と、 上記光デイスク相当部材によつて反射され、上
記光学系及び上記ハーフミラーを介した戻り光に
基づいて、上記対物レンズを駆動して上記光デイ
スク相当部材に対するフオーカシング制御を行な
うフオーカシングサーボ系と、 上記被検査半導体レーザから射出されたレーザ
光のうち、上記ハーフミラーによつて上記光デイ
スク相当部材に向かわないレーザ光に基づいて、
上記半導体レーザから射出されたレーザ光のノイ
ズ特性を検出するノイズ検出手段と、 上記被検査半導体レーザから射出されたレーザ
光のうち、上記ハーフミラーによつて上記光デイ
スク相当部材に向かわないレーザ光に基づいて、
上記半導体レーザの取付け位置を検出する半導体
レーザ位置検出手段とを備えたことを特徴とする
半導体レーザのノイズ測定装置。 (2) 上記半導体レーザ位置検出手段によつて検
出された取付位置に基づいて、上記半導体レーザ
の取付位置を所定の位置に位置させる取付位置可
変手段を設け、上記ノイズ測定手段は上記半導体
レーザが所定位置に位置決めされた後にノイズ特
性を検出することを特徴とする請求項第1項に記
載の半導体レーザのノイズ測定装置。 (3) 上記ノイズ検出手段が、ノイズ特性として
相対光強度ノイズを検出することを特徴とする請
求項第1項又は第2項に記載の半導体レーザのノ
イズ測定装置。 (4) 上記光学系に、上記半導体レーザから射出
されたレーザ光の光量と上記光デイスク相当部材
からの戻り光の光量との比を可変する光量可変手
段を設け、上記ノイズ検出手段が、所定の光量比
における相対光強度ノイズを所定の閾値と比較し
て上記半導体レーザの良否を決定することを特徴
とする請求項第3項に記載の半導体レーザのノイ
ズ測定装置。[Scope of Claim for Utility Model Registration] (1) A half mirror that divides the laser beam emitted from the semiconductor laser to be inspected into two and emits it to different optical paths, a member equivalent to an optical disk that reflects the laser beam, and this optical disk. an optical disk-equivalent member actuator that moves the corresponding member in a focusing direction; an optical system that includes at least an objective lens and that irradiates the disk-equivalent member with one laser beam via the half mirror; a focusing servo system that drives the objective lens based on the reflected light and returns through the optical system and the half mirror to perform focusing control on the member corresponding to the optical disk; and the semiconductor laser to be inspected. Based on the laser beam emitted from the laser beam that is not directed to the optical disk equivalent member by the half mirror,
noise detection means for detecting noise characteristics of laser light emitted from the semiconductor laser; and a laser light that is not directed toward the optical disk equivalent member by the half mirror among the laser light emitted from the semiconductor laser to be inspected. On the basis of the,
A semiconductor laser noise measuring device comprising: semiconductor laser position detection means for detecting the mounting position of the semiconductor laser. (2) Mounting position variable means is provided for positioning the mounting position of the semiconductor laser at a predetermined position based on the mounting position detected by the semiconductor laser position detection means, and the noise measuring means is configured to adjust the mounting position of the semiconductor laser to a prescribed position. 2. The semiconductor laser noise measuring device according to claim 1, wherein the noise characteristic is detected after the semiconductor laser is positioned at a predetermined position. (3) The semiconductor laser noise measuring device according to claim 1 or 2, wherein the noise detection means detects relative light intensity noise as the noise characteristic. (4) The optical system is provided with a light amount variable means for varying the ratio between the amount of laser light emitted from the semiconductor laser and the amount of return light from the member equivalent to the optical disk, and the noise detection means 4. The semiconductor laser noise measuring device according to claim 3, wherein the relative light intensity noise at a light amount ratio of is compared with a predetermined threshold value to determine the quality of the semiconductor laser.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5046789U JPH02144132U (en) | 1989-04-29 | 1989-04-29 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5046789U JPH02144132U (en) | 1989-04-29 | 1989-04-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02144132U true JPH02144132U (en) | 1990-12-06 |
Family
ID=31569038
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5046789U Pending JPH02144132U (en) | 1989-04-29 | 1989-04-29 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02144132U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7387723B2 (en) | 2004-04-22 | 2008-06-17 | Siemens Water Technologies Corp. | Filtration apparatus comprising a membrane bioreactor and a treatment vessel for digesting organic materials |
| US7455765B2 (en) | 2006-01-25 | 2008-11-25 | Siemens Water Technologies Corp. | Wastewater treatment system and method |
| US7563363B2 (en) | 2005-10-05 | 2009-07-21 | Siemens Water Technologies Corp. | System for treating wastewater |
| US7632439B2 (en) | 2002-02-12 | 2009-12-15 | Siemens Water Technologies Corp. | Poly(ethylene chlorotrifluoroethylene) membranes |
| US8858796B2 (en) | 2005-08-22 | 2014-10-14 | Evoqua Water Technologies Llc | Assembly for water filtration using a tube manifold to minimise backwash |
-
1989
- 1989-04-29 JP JP5046789U patent/JPH02144132U/ja active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7632439B2 (en) | 2002-02-12 | 2009-12-15 | Siemens Water Technologies Corp. | Poly(ethylene chlorotrifluoroethylene) membranes |
| US7387723B2 (en) | 2004-04-22 | 2008-06-17 | Siemens Water Technologies Corp. | Filtration apparatus comprising a membrane bioreactor and a treatment vessel for digesting organic materials |
| US8858796B2 (en) | 2005-08-22 | 2014-10-14 | Evoqua Water Technologies Llc | Assembly for water filtration using a tube manifold to minimise backwash |
| US7563363B2 (en) | 2005-10-05 | 2009-07-21 | Siemens Water Technologies Corp. | System for treating wastewater |
| US7455765B2 (en) | 2006-01-25 | 2008-11-25 | Siemens Water Technologies Corp. | Wastewater treatment system and method |
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