JPH02131245U - - Google Patents
Info
- Publication number
- JPH02131245U JPH02131245U JP4083789U JP4083789U JPH02131245U JP H02131245 U JPH02131245 U JP H02131245U JP 4083789 U JP4083789 U JP 4083789U JP 4083789 U JP4083789 U JP 4083789U JP H02131245 U JPH02131245 U JP H02131245U
- Authority
- JP
- Japan
- Prior art keywords
- gas introduction
- oven
- gas
- pdp
- exhaust device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Gas-Filled Discharge Tubes (AREA)
Description
第１図は本考案の実施例１を示す構成図、第２
図は本考案の実施例２を示す構成図である。
１……Ｎｅガスボンベ、３……減圧弁、３……
スローリークバルブ、４，５，８……配管、６…
…真空測定子、７……ヒータ、９……排気ヘツド
、１０……セラミツクヒータ、１１……ＰＤＰ、
１２……オーブン、１３，１４，１５，１８……
バルブ、１６……油拡散ポンプ、１７……ロータ
リーポンプ。
Fig. 1 is a configuration diagram showing the first embodiment of the present invention;
The figure is a configuration diagram showing a second embodiment of the present invention. 1... Ne gas cylinder, 3... Pressure reducing valve, 3...
Slow leak valve, 4, 5, 8...Piping, 6...
...Vacuum probe, 7...Heater, 9...Exhaust head, 10...Ceramic heater, 11...PDP,
12... Oven, 13, 14, 15, 18...
Valve, 16...Oil diffusion pump, 17...Rotary pump.
Claims (1)
オーブンと、該オーブン内を真空排気する真空排
気系と、ガスを導入するガス導入配管とを有する
ＰＤＰ用ガス導入排気装置において、前記ガス導
入配管の一部にオーブンへの導入ガスを加熱する
加熱装置を具備したことを特徴とするＰＤＰ用ガ
ス導入排気装置。 In a gas introduction/exhaust device for a PDP, which includes an oven for baking a plasma display, an evacuation system for evacuating the inside of the oven, and a gas introduction pipe for introducing gas, a part of the gas introduction pipe is connected to the oven. 1. A gas introduction/exhaust device for a PDP, comprising a heating device for heating introduced gas.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4083789U JPH02131245U (en) | 1989-04-06 | 1989-04-06 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4083789U JPH02131245U (en) | 1989-04-06 | 1989-04-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02131245U true JPH02131245U (en) | 1990-10-31 |
Family
ID=31550974
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4083789U Pending JPH02131245U (en) | 1989-04-06 | 1989-04-06 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02131245U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003031117A (en) * | 2001-07-10 | 2003-01-31 | Nec Corp | Manufacturing method and manufacturing device of dielectric layer |
-
1989
- 1989-04-06 JP JP4083789U patent/JPH02131245U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003031117A (en) * | 2001-07-10 | 2003-01-31 | Nec Corp | Manufacturing method and manufacturing device of dielectric layer |