JPH0212905A - Method for trimming thin-film resistance body - Google Patents
Method for trimming thin-film resistance bodyInfo
- Publication number
- JPH0212905A JPH0212905A JP16326388A JP16326388A JPH0212905A JP H0212905 A JPH0212905 A JP H0212905A JP 16326388 A JP16326388 A JP 16326388A JP 16326388 A JP16326388 A JP 16326388A JP H0212905 A JPH0212905 A JP H0212905A
- Authority
- JP
- Japan
- Prior art keywords
- trimming
- resistor
- resistance
- resistance body
- resistance value
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000009966 trimming Methods 0.000 title claims abstract description 53
- 239000010409 thin film Substances 0.000 title claims description 13
- 238000000034 method Methods 0.000 title claims description 10
- 230000000694 effects Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Apparatuses And Processes For Manufacturing Resistors (AREA)
Abstract
Description
【発明の詳細な説明】
「産業上の利用分野」
本発明は、セラミック基板等に真空蒸着等で薄膜抵抗体
を形成し、トリミングを行うことにより抵抗値を設定す
るトリミング方法に関する。DETAILED DESCRIPTION OF THE INVENTION "Field of Industrial Application" The present invention relates to a trimming method in which a thin film resistor is formed on a ceramic substrate or the like by vacuum evaporation or the like and a resistance value is set by trimming the resistor.
「従来の技術」
従来、窒化タンタル等の材料を着等の方法を用い、セラ
ミック基板上にglBの抵抗体を形成し、二の形成され
た抵抗体は、そのままでは、抵抗値に誤差を有している
から、レーザービーム等を照射し、薄膜抵抗体の一部を
レーザービームの熱エネルギーで蒸発させ、取り除くこ
とにより抵抗体の抵抗値を調整するレーザートリミング
がおこなわれている。これらのトリミングは第2図に示
すように、−抵抗体2に複数回、4,6.8の如くトリ
ミングを連続して行う、そのため、抵抗体が発熱し、抵
抗体の抵抗値を変化させる。一般に、トリミングにおい
ては、トリミングする前の抵抗値を計測しておき、その
計測値を基に、トリミング回数、トリミング時間を設定
し、かつ、トリミング中の抵抗値を計測しながらトリミ
ング時間を細かく制御する方法を用いている。従って、
抵抗体の発熱により抵抗体の抵抗値が変化すれば、その
抵抗値を基にトリミングすることから、トリミングした
後の最終抵抗値に大きな影響を与えることとなり、高精
度の抵抗トリミングを行う上で問題であった。``Prior art'' Conventionally, a glB resistor is formed on a ceramic substrate using a method such as depositing a material such as tantalum nitride. Therefore, laser trimming is performed in which the resistance value of the resistor is adjusted by irradiating it with a laser beam or the like, evaporating a part of the thin film resistor with the laser beam's thermal energy, and removing it. As shown in Fig. 2, these trimmings are performed multiple times on the resistor 2 in succession as shown in 4, 6.8.As a result, the resistor generates heat and changes the resistance value of the resistor. . Generally, when trimming, the resistance value before trimming is measured, and based on that measurement value, the number of trimming times and trimming time are set, and the trimming time is finely controlled while measuring the resistance value during trimming. The method is used. Therefore,
If the resistance value of the resistor changes due to heat generation in the resistor, trimming is performed based on that resistance value, which has a large effect on the final resistance value after trimming. That was a problem.
「発明が解決しようとする課題」
従来における、トリミングにて生ずる発熱等に起因して
発生する抵抗値の変化による悪影響を防止するもので、
最終のトリミングを保留し、抵抗体が熱的に安定した後
、保留した最終トリミングを実施することで高精度のト
リミングを行い得るようにしたトリミング方法を提供す
るものである。``Problem to be solved by the invention'' This invention prevents the negative effects of conventional changes in resistance value caused by heat generated during trimming, etc.
To provide a trimming method in which highly accurate trimming can be performed by suspending the final trimming and performing the suspended final trimming after the resistor has become thermally stable.
「課題を解決するための手段」
本発明は、上述の課題を解決するため、電極間に薄膜抵
抗体を形成した抵抗器を複数個設け、抵抗値を調整する
ためn回のトリミングを各抵抗体に行うようにしたもの
において、第1抵抗体に対しn−1回のトリミングを連
続して行った後、第2抵抗体に対しn−1回のトリミン
グを連続して行い、しかる後、第1抵抗体に対しn回目
のトリミングを行うことを特徴とした薄膜抵抗体のトリ
ミング方法を提供するものである。"Means for Solving the Problems" In order to solve the above-mentioned problems, the present invention provides a plurality of resistors in which thin film resistors are formed between electrodes, and trims each resistor n times to adjust the resistance value. In the case where the first resistor is trimmed n-1 times in a row, the second resistor is trimmed n-1 times in a row, and then, This invention provides a method for trimming a thin film resistor characterized by performing n-th trimming on a first resistor.
「実施例」
以下、図面に基づいて本発明の薄膜抵抗体のトリミング
方法を説明する。第1図は本発明による薄膜抵抗体の平
面図を示し、図において、lは電極で、電極1.1間に
真空蒸着等で形成された薄膜抵抗体2を有している。3
.5および7はトリミングを行う位置を示し、4.6お
よび8はトリミングを示している。"Example" Hereinafter, a method for trimming a thin film resistor of the present invention will be explained based on the drawings. FIG. 1 shows a plan view of a thin film resistor according to the present invention, in which l represents an electrode, and a thin film resistor 2 formed by vacuum deposition or the like is provided between electrodes 1.1. 3
.. 5 and 7 indicate positions for trimming, and 4.6 and 8 indicate trimming.
次に、本発明によるトリミングを説明すると、まず抵抗
体2に第1回目のトリミングが実施さ瓢さらに、抵抗体
2の抵抗値を電極1,1間で計測しながら、第2回目の
トリミング6が実施される。Next, to explain the trimming according to the present invention, the first trimming is first performed on the resistor 2, and then the second trimming 6 is carried out while measuring the resistance value of the resistor 2 between the electrodes 1 and 1. will be implemented.
もし、第3回めのトリミングが最終回であるならば、こ
の第3回めのトリミングを保留し、次の抵抗体10に対
し、抵抗体2に行ったと同様のトリミングを実施する。If the third trimming is the final trimming, the third trimming is held and the next resistor 10 is trimmed in the same manner as the resistor 2.
しかる後、抵抗値2が熱的に安定した後、前記保留した
第3回目のトリミングを実施する。以降、抵抗体10に
対しても、抵抗体2と同様に、他の抵抗体のトリミング
を行った後、所要時間後に、抵抗体10の最終回トリミ
ングを実施する。Thereafter, after the resistance value 2 becomes thermally stable, the suspended third trimming is performed. Thereafter, similarly to the resistor 2, the resistor 10 is trimmed a final time after the other resistors are trimmed and a required time elapses.
「発明の効果」
以上に説明したように、本発明による薄膜抵抗体のトリ
ミング方法は、一連のトリミングにおいて、最終回のト
リミングを一時保留し、レーザービームの照射等にてト
リミング中に発生する発熱にて生ずる抵抗値の変化を熱
的に安定させて、抵抗値の変化を低下させた後で最終回
のトリミングを行うようにし、高精度のトリミングを行
うようにしたものである。"Effects of the Invention" As explained above, the thin film resistor trimming method according to the present invention temporarily suspends the final trimming in a series of trimming operations, and removes heat generated during trimming by irradiating a laser beam or the like. The final trimming is performed after thermally stabilizing the change in resistance value that occurs in the process and reducing the change in resistance value, thereby achieving highly accurate trimming.
第1図は本発明による薄膜抵抗体の平面図、第2図は従
来における薄膜抵抗体の平面図である。
図中、■は電極、2.10は抵抗体、3,5.7はトリ
ミング位置、4,6.8はトリミングである。
特許出願人 株式会社富士通ゼネラル
第1図
第2図FIG. 1 is a plan view of a thin film resistor according to the present invention, and FIG. 2 is a plan view of a conventional thin film resistor. In the figure, ■ is an electrode, 2.10 is a resistor, 3, 5.7 are trimming positions, and 4, 6.8 are trimmings. Patent applicant: Fujitsu General Ltd. Figure 1 Figure 2
Claims (1)
抵抗値を調整するためn回のトリミングを各抵抗体に行
うようにしたものにおいて、第1抵抗体に対しn−1回
のトリミングを連続して行った後、第2抵抗体に対しn
−1回のトリミングを連続して行い、しかる後、第1抵
抗体に対しn回目のトリミングを行うことを特徴とした
薄膜抵抗体のトリミング方法。Multiple resistors with thin film resistors formed between electrodes are installed,
In a device in which each resistor is trimmed n times to adjust the resistance value, the first resistor is trimmed n-1 times, and then the second resistor is trimmed n times.
- A method for trimming a thin film resistor, characterized in that one trimming is performed in succession, and then the n-th trimming is performed on the first resistor.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16326388A JPH0212905A (en) | 1988-06-30 | 1988-06-30 | Method for trimming thin-film resistance body |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16326388A JPH0212905A (en) | 1988-06-30 | 1988-06-30 | Method for trimming thin-film resistance body |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0212905A true JPH0212905A (en) | 1990-01-17 |
Family
ID=15770482
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16326388A Pending JPH0212905A (en) | 1988-06-30 | 1988-06-30 | Method for trimming thin-film resistance body |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0212905A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8942410B2 (en) | 2012-12-31 | 2015-01-27 | Apple Inc. | Magnetically biased electromagnet for audio applications |
-
1988
- 1988-06-30 JP JP16326388A patent/JPH0212905A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8942410B2 (en) | 2012-12-31 | 2015-01-27 | Apple Inc. | Magnetically biased electromagnet for audio applications |
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