JPH02117613A - External application for skin - Google Patents
External application for skinInfo
- Publication number
- JPH02117613A JPH02117613A JP1174800A JP17480089A JPH02117613A JP H02117613 A JPH02117613 A JP H02117613A JP 1174800 A JP1174800 A JP 1174800A JP 17480089 A JP17480089 A JP 17480089A JP H02117613 A JPH02117613 A JP H02117613A
- Authority
- JP
- Japan
- Prior art keywords
- silicone
- cinnamic acid
- acid derivative
- synthesis example
- oil
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 70
- 150000001851 cinnamic acid derivatives Chemical class 0.000 claims abstract description 38
- -1 trimethylsiloxy Chemical group 0.000 claims abstract description 28
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 8
- 125000000217 alkyl group Chemical group 0.000 claims abstract 4
- 125000003545 alkoxy group Chemical group 0.000 claims abstract 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 2
- 238000002360 preparation method Methods 0.000 claims description 21
- 239000000126 substance Substances 0.000 claims description 14
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 13
- 125000004432 carbon atom Chemical group C* 0.000 claims description 5
- 125000005842 heteroatom Chemical group 0.000 claims description 2
- 239000000203 mixture Substances 0.000 abstract description 35
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 32
- 230000000475 sunscreen effect Effects 0.000 abstract description 14
- 238000002156 mixing Methods 0.000 abstract description 6
- 238000009472 formulation Methods 0.000 abstract description 5
- 229920002545 silicone oil Polymers 0.000 abstract description 4
- 238000007796 conventional method Methods 0.000 abstract description 2
- 230000001588 bifunctional effect Effects 0.000 abstract 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 90
- 230000015572 biosynthetic process Effects 0.000 description 37
- 238000003786 synthesis reaction Methods 0.000 description 35
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 30
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 28
- 239000002904 solvent Substances 0.000 description 25
- 239000003921 oil Substances 0.000 description 22
- 239000012071 phase Substances 0.000 description 21
- 230000000694 effects Effects 0.000 description 17
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 15
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 15
- 150000002148 esters Chemical class 0.000 description 15
- 239000006096 absorbing agent Substances 0.000 description 14
- 238000006459 hydrosilylation reaction Methods 0.000 description 14
- 239000002537 cosmetic Substances 0.000 description 13
- 239000000516 sunscreening agent Substances 0.000 description 13
- 238000010992 reflux Methods 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 11
- 239000000243 solution Substances 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 10
- 239000004205 dimethyl polysiloxane Substances 0.000 description 10
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 10
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 10
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 10
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 10
- 230000006750 UV protection Effects 0.000 description 9
- 239000003205 fragrance Substances 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 9
- 238000002211 ultraviolet spectrum Methods 0.000 description 9
- 238000010521 absorption reaction Methods 0.000 description 8
- 238000010898 silica gel chromatography Methods 0.000 description 8
- 238000003756 stirring Methods 0.000 description 8
- 239000003755 preservative agent Substances 0.000 description 7
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 6
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 230000002335 preservative effect Effects 0.000 description 6
- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical compound OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 5
- 239000003963 antioxidant agent Substances 0.000 description 5
- 235000006708 antioxidants Nutrition 0.000 description 5
- 239000008346 aqueous phase Substances 0.000 description 5
- 238000001914 filtration Methods 0.000 description 5
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- 238000005481 NMR spectroscopy Methods 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 230000003078 antioxidant effect Effects 0.000 description 4
- MKUWVMRNQOOSAT-UHFFFAOYSA-N but-3-en-2-ol Chemical compound CC(O)C=C MKUWVMRNQOOSAT-UHFFFAOYSA-N 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 229940057995 liquid paraffin Drugs 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 239000008213 purified water Substances 0.000 description 4
- 210000004243 sweat Anatomy 0.000 description 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerol Natural products OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000007983 Tris buffer Substances 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000004587 chromatography analysis Methods 0.000 description 3
- 239000006071 cream Substances 0.000 description 3
- 239000002552 dosage form Substances 0.000 description 3
- 229940079593 drug Drugs 0.000 description 3
- 239000003814 drug Substances 0.000 description 3
- 150000002430 hydrocarbons Chemical group 0.000 description 3
- 230000005923 long-lasting effect Effects 0.000 description 3
- 239000010445 mica Substances 0.000 description 3
- 229910052618 mica group Inorganic materials 0.000 description 3
- 239000012188 paraffin wax Substances 0.000 description 3
- 239000000741 silica gel Substances 0.000 description 3
- 229910002027 silica gel Inorganic materials 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000006467 substitution reaction Methods 0.000 description 3
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- GVJHHUAWPYXKBD-UHFFFAOYSA-N (±)-α-Tocopherol Chemical compound OC1=C(C)C(C)=C2OC(CCCC(C)CCCC(C)CCCC(C)C)(C)CCC2=C1C GVJHHUAWPYXKBD-UHFFFAOYSA-N 0.000 description 2
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 2
- JNAYPSWVMNJOPQ-UHFFFAOYSA-N 2,3-bis(16-methylheptadecanoyloxy)propyl 16-methylheptadecanoate Chemical compound CC(C)CCCCCCCCCCCCCCC(=O)OCC(OC(=O)CCCCCCCCCCCCCCC(C)C)COC(=O)CCCCCCCCCCCCCCC(C)C JNAYPSWVMNJOPQ-UHFFFAOYSA-N 0.000 description 2
- ASKIVFGGGGIGKH-UHFFFAOYSA-N 2,3-dihydroxypropyl 16-methylheptadecanoate Chemical compound CC(C)CCCCCCCCCCCCCCC(=O)OCC(O)CO ASKIVFGGGGIGKH-UHFFFAOYSA-N 0.000 description 2
- GVNVAWHJIKLAGL-UHFFFAOYSA-N 2-(cyclohexen-1-yl)cyclohexan-1-one Chemical compound O=C1CCCCC1C1=CCCCC1 GVNVAWHJIKLAGL-UHFFFAOYSA-N 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 2
- 101150065749 Churc1 gene Proteins 0.000 description 2
- XMSXQFUHVRWGNA-UHFFFAOYSA-N Decamethylcyclopentasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 XMSXQFUHVRWGNA-UHFFFAOYSA-N 0.000 description 2
- XUMBMVFBXHLACL-UHFFFAOYSA-N Melanin Chemical compound O=C1C(=O)C(C2=CNC3=C(C(C(=O)C4=C32)=O)C)=C2C4=CNC2=C1C XUMBMVFBXHLACL-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- 102100038239 Protein Churchill Human genes 0.000 description 2
- 235000021355 Stearic acid Nutrition 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000007810 chemical reaction solvent Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 125000001891 dimethoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000004945 emulsification Methods 0.000 description 2
- 239000003995 emulsifying agent Substances 0.000 description 2
- 230000001804 emulsifying effect Effects 0.000 description 2
- 239000000839 emulsion Substances 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000005038 ethylene vinyl acetate Substances 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- WTFXARWRTYJXII-UHFFFAOYSA-N iron(2+);iron(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[Fe+2].[Fe+3].[Fe+3] WTFXARWRTYJXII-UHFFFAOYSA-N 0.000 description 2
- SZVJSHCCFOBDDC-UHFFFAOYSA-N iron(II,III) oxide Inorganic materials O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 239000006210 lotion Substances 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 2
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 2
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- PRAKJMSDJKAYCZ-UHFFFAOYSA-N squalane Chemical compound CC(C)CCCC(C)CCCC(C)CCCCC(C)CCCC(C)CCCC(C)C PRAKJMSDJKAYCZ-UHFFFAOYSA-N 0.000 description 2
- 239000008117 stearic acid Substances 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- KIUKXJAPPMFGSW-DNGZLQJQSA-N (2S,3S,4S,5R,6R)-6-[(2S,3R,4R,5S,6R)-3-Acetamido-2-[(2S,3S,4R,5R,6R)-6-[(2R,3R,4R,5S,6R)-3-acetamido-2,5-dihydroxy-6-(hydroxymethyl)oxan-4-yl]oxy-2-carboxy-4,5-dihydroxyoxan-3-yl]oxy-5-hydroxy-6-(hydroxymethyl)oxan-4-yl]oxy-3,4,5-trihydroxyoxane-2-carboxylic acid Chemical compound CC(=O)N[C@H]1[C@H](O)O[C@H](CO)[C@@H](O)[C@@H]1O[C@H]1[C@H](O)[C@@H](O)[C@H](O[C@H]2[C@@H]([C@@H](O[C@H]3[C@@H]([C@@H](O)[C@H](O)[C@H](O3)C(O)=O)O)[C@H](O)[C@@H](CO)O2)NC(C)=O)[C@@H](C(O)=O)O1 KIUKXJAPPMFGSW-DNGZLQJQSA-N 0.000 description 1
- DSEKYWAQQVUQTP-XEWMWGOFSA-N (2r,4r,4as,6as,6as,6br,8ar,12ar,14as,14bs)-2-hydroxy-4,4a,6a,6b,8a,11,11,14a-octamethyl-2,4,5,6,6a,7,8,9,10,12,12a,13,14,14b-tetradecahydro-1h-picen-3-one Chemical compound C([C@H]1[C@]2(C)CC[C@@]34C)C(C)(C)CC[C@]1(C)CC[C@]2(C)[C@H]4CC[C@@]1(C)[C@H]3C[C@@H](O)C(=O)[C@@H]1C DSEKYWAQQVUQTP-XEWMWGOFSA-N 0.000 description 1
- DSSYKIVIOFKYAU-XCBNKYQSSA-N (R)-camphor Chemical class C1C[C@@]2(C)C(=O)C[C@@H]1C2(C)C DSSYKIVIOFKYAU-XCBNKYQSSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- ZYDQSPYFLQSONW-UHFFFAOYSA-N 2,3-dimethoxy-3-(2-methoxyphenyl)prop-2-enoic acid Chemical compound COC(C(O)=O)=C(OC)C1=CC=CC=C1OC ZYDQSPYFLQSONW-UHFFFAOYSA-N 0.000 description 1
- OBETXYAYXDNJHR-UHFFFAOYSA-N 2-Ethylhexanoic acid Chemical compound CCCCC(CC)C(O)=O OBETXYAYXDNJHR-UHFFFAOYSA-N 0.000 description 1
- 239000004808 2-ethylhexylester Substances 0.000 description 1
- GCYHRYNSUGLLMA-UHFFFAOYSA-N 2-prop-2-enoxyethanol Chemical compound OCCOCC=C GCYHRYNSUGLLMA-UHFFFAOYSA-N 0.000 description 1
- ZSPTYLOMNJNZNG-UHFFFAOYSA-N 3-Buten-1-ol Chemical compound OCCC=C ZSPTYLOMNJNZNG-UHFFFAOYSA-N 0.000 description 1
- ALYNCZNDIQEVRV-UHFFFAOYSA-N 4-aminobenzoic acid Chemical class NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 description 1
- HIQIXEFWDLTDED-UHFFFAOYSA-N 4-hydroxy-1-piperidin-4-ylpyrrolidin-2-one Chemical compound O=C1CC(O)CN1C1CCNCC1 HIQIXEFWDLTDED-UHFFFAOYSA-N 0.000 description 1
- 101150041968 CDC13 gene Proteins 0.000 description 1
- HJBWJAPEBGSQPR-UHFFFAOYSA-N DMCA Natural products COC1=CC=C(C=CC(O)=O)C=C1OC HJBWJAPEBGSQPR-UHFFFAOYSA-N 0.000 description 1
- 206010014970 Ephelides Diseases 0.000 description 1
- 206010015150 Erythema Diseases 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- OAZWDJGLIYNYMU-UHFFFAOYSA-N Leucocrystal Violet Chemical compound C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 OAZWDJGLIYNYMU-UHFFFAOYSA-N 0.000 description 1
- 208000003351 Melanosis Diseases 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 101100327795 Penaeus monodon CHH3 gene Proteins 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 208000012641 Pigmentation disease Diseases 0.000 description 1
- 206010070834 Sensitisation Diseases 0.000 description 1
- 206010042496 Sunburn Diseases 0.000 description 1
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 1
- 229930003427 Vitamin E Natural products 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000002635 aromatic organic solvent Substances 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 238000003287 bathing Methods 0.000 description 1
- SHZIWNPUGXLXDT-UHFFFAOYSA-N caproic acid ethyl ester Natural products CCCCCC(=O)OCC SHZIWNPUGXLXDT-UHFFFAOYSA-N 0.000 description 1
- 239000004359 castor oil Substances 0.000 description 1
- 235000019438 castor oil Nutrition 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 229940114081 cinnamate Drugs 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000004956 cyclohexylene group Chemical group 0.000 description 1
- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 description 1
- PXEDJBXQKAGXNJ-QTNFYWBSSA-L disodium L-glutamate Chemical compound [Na+].[Na+].[O-]C(=O)[C@@H](N)CCC([O-])=O PXEDJBXQKAGXNJ-QTNFYWBSSA-L 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
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- 238000002265 electronic spectrum Methods 0.000 description 1
- 231100000321 erythema Toxicity 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- WIGCFUFOHFEKBI-UHFFFAOYSA-N gamma-tocopherol Natural products CC(C)CCCC(C)CCCC(C)CCCC1CCC2C(C)C(O)C(C)C(C)C2O1 WIGCFUFOHFEKBI-UHFFFAOYSA-N 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- ZEMPKEQAKRGZGQ-XOQCFJPHSA-N glycerol triricinoleate Natural products CCCCCC[C@@H](O)CC=CCCCCCCCC(=O)OC[C@@H](COC(=O)CCCCCCCC=CC[C@@H](O)CCCCCC)OC(=O)CCCCCCCC=CC[C@H](O)CCCCCC ZEMPKEQAKRGZGQ-XOQCFJPHSA-N 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 229920002674 hyaluronan Polymers 0.000 description 1
- 229960003160 hyaluronic acid Drugs 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- SNVLJLYUUXKWOJ-UHFFFAOYSA-N methylidenecarbene Chemical compound C=[C] SNVLJLYUUXKWOJ-UHFFFAOYSA-N 0.000 description 1
- 239000004200 microcrystalline wax Substances 0.000 description 1
- 235000019808 microcrystalline wax Nutrition 0.000 description 1
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 1
- 229910052901 montmorillonite Inorganic materials 0.000 description 1
- 230000007886 mutagenicity Effects 0.000 description 1
- 231100000299 mutagenicity Toxicity 0.000 description 1
- JXTPJDDICSTXJX-UHFFFAOYSA-N n-Triacontane Natural products CCCCCCCCCCCCCCCCCCCCCCCCCCCCCC JXTPJDDICSTXJX-UHFFFAOYSA-N 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 1
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 1
- 239000006072 paste Substances 0.000 description 1
- 238000007699 photoisomerization reaction Methods 0.000 description 1
- 208000007578 phototoxic dermatitis Diseases 0.000 description 1
- 231100000018 phototoxicity Toxicity 0.000 description 1
- 230000019612 pigmentation Effects 0.000 description 1
- 150000003057 platinum Chemical class 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 150000003283 rhodium Chemical class 0.000 description 1
- 150000003303 ruthenium Chemical class 0.000 description 1
- 229940058287 salicylic acid derivative anticestodals Drugs 0.000 description 1
- 150000003872 salicylic acid derivatives Chemical class 0.000 description 1
- 210000002374 sebum Anatomy 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 230000009759 skin aging Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229940032094 squalane Drugs 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 229940098465 tincture Drugs 0.000 description 1
- LOIYMIARKYCTBW-OWOJBTEDSA-N trans-urocanic acid Chemical class OC(=O)\C=C\C1=CNC=N1 LOIYMIARKYCTBW-OWOJBTEDSA-N 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 229940099259 vaseline Drugs 0.000 description 1
- 235000019165 vitamin E Nutrition 0.000 description 1
- 229940046009 vitamin E Drugs 0.000 description 1
- 239000011709 vitamin E Substances 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
Landscapes
- Cosmetics (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、シリコーン油に熔解し、耐水および耐油性に
優れ、かつUV−B領域の波長の紫外線吸収特性を有す
るシリコーン系桂皮酸誘導体を配合することを特徴とし
、日焼は止め効果、優れた使用性、化粧持ちを高める効
果を有する新規な皮膚外用剤に関する。Detailed Description of the Invention [Industrial Application Field] The present invention provides a silicone-based cinnamic acid derivative that is soluble in silicone oil, has excellent water and oil resistance, and has ultraviolet absorption characteristics at wavelengths in the UV-B region. The present invention relates to a novel skin preparation for external use, which is characterized by its ability to prevent sunburn, has excellent usability, and has the effect of increasing the longevity of makeup.
[従来の技術]
紫外線はさまざまな変化を皮膚にもたらすことが知られ
ている。[Prior Art] It is known that ultraviolet rays cause various changes in the skin.
紫外線を皮膚科学的な分類すると、400〜320nm
のUV−Aと呼ばれる長波長紫外線、320〜290n
mのUV−Bと呼ばれる中波長紫外線、290nm以下
のUV−Cと呼ばれる短波長紫外線とに分けられる。The dermatological classification of ultraviolet rays is 400 to 320 nm.
Long wavelength ultraviolet rays called UV-A, 320-290n
Ultraviolet rays are divided into medium wavelength ultraviolet rays called UV-B, which has a wavelength of 290 nm or less, and short-wavelength ultraviolet rays, which have a wavelength of 290 nm or less, called UV-C.
通常、人間が暴露される紫外線の大部分は太陽光線であ
るが、地上に届く紫外線はUV−AおよびUV−Bで、
UV−Cはオゾン層において吸収されて地上には殆ど達
しない。地上にまで達する紫外線のなかで、UV−Bは
、ある一定量以上の光量が皮膚に照射されると紅斑や水
泡を形成し、またメラニン形成が先進され、色素沈着を
生ずる等の変化をもたらす。Normally, most of the ultraviolet rays that humans are exposed to are from sunlight, but the ultraviolet rays that reach the ground are UV-A and UV-B.
UV-C is absorbed in the ozone layer and almost never reaches the ground. Among the ultraviolet rays that reach the ground, UV-B causes changes such as the formation of erythema and blisters when the skin is irradiated with more than a certain amount of light, as well as melanin formation and pigmentation. .
従って、UV−Bから皮膚を保護することは、皮膚の老
化促進を予防し、シミ、ソバカスの発生や増悪を防ぐ意
味において極めて重要であり、これまでに、種々のUV
−B吸収剤が開発されてきた。Therefore, protecting the skin from UV-B is extremely important in terms of preventing the acceleration of skin aging and preventing the occurrence and aggravation of age spots and freckles.
-B absorbers have been developed.
ここで、既存のUV−B吸収剤としては、PABA誘導
体、桂皮酸誘導体、サリチル酸誘導体、カンファー誘導
体、ウロカニン酸誘導体、ペンヅフェノン誘導体及び複
素環誘導体が知られている。Here, as existing UV-B absorbers, PABA derivatives, cinnamic acid derivatives, salicylic acid derivatives, camphor derivatives, urocanic acid derivatives, penduphenone derivatives, and heterocyclic derivatives are known.
これらのUV−B吸収剤は、専ら化粧料、医薬部外品等
の外用剤に配合され利用される。These UV-B absorbers are used exclusively by being incorporated into external preparations such as cosmetics and quasi-drugs.
一方、紫外線吸収剤の配合されるサンケア化粧品は暑い
夏に使用されるために、汗や皮脂によって流れ落ちしや
すく、また、海浜やプールで使用される製品の場合、水
浴によって簡単に流れ落ちしてしまうのでは問題がある
。そのため、化粧品の化粧持ちを高めることへのニーズ
が高まってきており、近年では、外用剤基剤として低分
子量のジメチルシロキンなどのシリコーン系基剤が広く
使用されている。これはシリコーン系基剤のもつ伸びの
良さ、さっばり惑、べとつかない等の使用性、更に耐水
性、耐油性に優れ、汗や水に流れにくいなどの機能性に
よるところが大きい。On the other hand, since sun care cosmetics that contain UV absorbers are used in the hot summer, they are easily washed off by sweat and sebum, and products used at the beach or pool are easily washed off by bathing. So there is a problem. Therefore, there is a growing need for cosmetics to last longer, and in recent years, low-molecular-weight silicone bases such as dimethylsiloquine have been widely used as bases for external preparations. This is largely due to the silicone base's ease of use, such as good spreadability, lightness and non-stick properties, and functionality, such as excellent water and oil resistance, and resistance to sweat and water.
[発明が解決しようとする課題]
−′の。ツ占
しかしながら、既存のUV−B吸収剤は、シリコーン系
基剤に対する相溶性が著しく低い。[Problem to be solved by the invention] −′. However, existing UV-B absorbers have extremely low compatibility with silicone bases.
従って、シリコーン系基剤を外用剤に配合するには、油
性基剤をさらに添加しなければならず、前述のシリコー
ン系基剤の有用性が十分に発揮できないという欠点があ
った。Therefore, in order to incorporate a silicone base into an external preparation, it is necessary to further add an oily base, which has the drawback that the above-mentioned usefulness of the silicone base cannot be fully demonstrated.
更に、UV−B吸収剤は耐水性及び耐油性にも劣るとい
う欠点があった。Furthermore, UV-B absorbers have the disadvantage of being inferior in water resistance and oil resistance.
一方、紫外線吸収能をもつシリコーンの特許として、特
公昭44−29866 、特開昭60−58991およ
び特開昭60−108431がみられる。On the other hand, patents for silicone having ultraviolet absorbing ability include Japanese Patent Publication No. 44-29866, Japanese Patent Application Publication No. 60-58991, and Japanese Patent Application Publication No. 60-108431.
しかしながら、これらの化学構造は無置換の桂皮酸を基
本骨格とするものであり、シリコーン油中ではUV−C
側に吸収極大波長を持ち、U VB吸収剤としては不十
分なものであった。(図3に3−ヒス(トリメチルシロ
キシ)メチルシリル−2−メチルプロピ)トシンナメー
トの UV吸収スペクトルを示す。UV−B吸収剤とし
ては、適切な波長領域を存していないことがわかる。)
免肚q且狗
かかる事情から、シリコーン油に溶解し、耐水および耐
油性に優れ、かつU V −B iJf域の波長を十分
に防御するUV−B吸収剤の開発が強く望まれていた。However, these chemical structures have a basic skeleton of unsubstituted cinnamic acid, and in silicone oil, UV-C
It had a maximum absorption wavelength on the side, and was insufficient as a UVB absorber. (Figure 3 shows the UV absorption spectrum of 3-his(trimethylsiloxy)methylsilyl-2-methylpropy)tocinnamate. It can be seen that there is no suitable wavelength range as a UV-B absorber. )
Under these circumstances, there has been a strong desire to develop a UV-B absorber that dissolves in silicone oil, has excellent water and oil resistance, and sufficiently protects against wavelengths in the UV-B iJf region.
そして、本発明に用いるシリコーン系桂皮酸誘導体が上
述の性質を満足する化合物であることを見出し、本発明
を完成するに至った。なお本発明の目的は、UV−B吸
収効果が優れ、また、UV−B吸収剤を安定に配合しう
る皮膚外用剤を提供することにあり、さらには、外用剤
基剤にシリコーン系基剤を用いることにより、使用性に
優、れ、かつ任意のUV−B吸収効果を発揮しうる皮膚
外用剤を提供することにある。The inventors have also discovered that the silicone-based cinnamic acid derivative used in the present invention is a compound that satisfies the above-mentioned properties, and have completed the present invention. An object of the present invention is to provide an external preparation for skin that has an excellent UV-B absorption effect and can stably incorporate a UV-B absorber, and furthermore, a silicone base is used as the external preparation base. An object of the present invention is to provide a skin preparation for external use that is excellent in usability and can exhibit arbitrary UV-B absorption effects.
[課題を解決するための手段]
即ち、本発明は下記
一般式
で表わされる単位を少なくとも1個もつシロキサン類で
あって、前記シロキサン類中に存在しうる他の単位が、
一般弐0.4〜m1zzsiR3,で表されるごとを特
徴とするシリコーン系桂皮酸誘導体を配合することを特
徴とする皮膚外用剤。[Means for Solving the Problems] That is, the present invention provides siloxanes having at least one unit represented by the following general formula, in which other units that may be present in the siloxanes are:
1. A skin external preparation characterized by containing a silicone-based cinnamic acid derivative characterized by the following: general 20.4 to m1zzsiR3.
式中に定義したR1の例としては、メチル、エチル、プ
ロピル、イソプロピル、ブチル、イソブチル、t−7’
チル、フェニル基、トリメチルシロキシ基等があげられ
るが、原料の入手しやすさ等の理由からメチル基または
その一部がフェニル基であること、又はトリメチルシロ
キシ基であることが好ましい。nは、R1の置換数を表
す。R2の例としては、例えば、
(2)外用剤基剤としてシリコーン系基剤を使用するこ
とを特徴とする請求項1記載の皮膚外用剤である。Examples of R1 defined in the formula include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, t-7'
Examples include methyl, phenyl group, trimethylsiloxy group, etc., but it is preferable that the methyl group or a part thereof is a phenyl group or a trimethylsiloxy group for reasons such as availability of raw materials. n represents the number of substitutions of R1. Examples of R2 include: (2) The skin external preparation according to claim 1, characterized in that a silicone base is used as the external preparation base.
以下、本発明の詳細な説明する。The present invention will be explained in detail below.
本発明のシリコーン系桂皮酸誘導体は、一般式(1)で
表される単位と、一般式014−s)/2 S iR3
、で表される単位から構成されるものであり、CHz
(CH3)Z
−C)I2CH2CH
C1(3
CHzCHzCLCHz−−CH2CH20CH2CI
(2ヘキシレン、ンクロヘキシレン、デシレン基等があ
げられるが、炭素数2〜4のアルキレン基が好ましく、
さらにヒドロシリル化反応の副反応が比較的少ないこと
等から特に −Cl2CH,CHH3
が好ましい。The silicone-based cinnamic acid derivative of the present invention has a unit represented by general formula (1) and a general formula 014-s)/2 SiR3
It is composed of units expressed as , CHZ
(CH3)Z -C)I2CH2CH C1(3 HzCHzCLCHz--CH2CH20CH2CI
(2-hexylene, cyclohexylene, decylene groups, etc. are mentioned, but alkylene groups having 2 to 4 carbon atoms are preferable,
Further, -Cl2CH and CHH3 are particularly preferred because they cause relatively few side reactions in the hydrosilylation reaction.
Xの例としては、例えばメトキシ基、エトキシ基、イソ
プロポキシ基等があげられる。いずれも、シリコーン系
基剤に対する溶解性かつUV−B吸収波長に顕著な差は
ないが、試薬の入手し易さ等から特にメトキシ基が好ま
しい。aは、Xの置換数を表す。Examples of X include methoxy, ethoxy, isopropoxy, and the like. Although there is no significant difference in solubility in silicone bases and UV-B absorption wavelengths, methoxy groups are particularly preferred from the viewpoint of easy availability of reagents. a represents the number of substitutions of X.
一般弐〇 +4−□7□3iR’□で表されることを特
徴とするシロキサン単位においてR3は、メチル、エチ
ル、プロピル、イソプロピル、ブチル、イソブチル、t
−ブチル、フェニル基、トリメチルシロキシ基等があげ
られるが、原料の入手しやすさ等の理由からメチル基ま
たはその一部がフェニル基であること、又はトリメチル
シロキシ基であることが好ましい。mは、R3の置換数
である。General 2〇 In the siloxane unit characterized by being represented by +4-□7□3iR'□, R3 is methyl, ethyl, propyl, isopropyl, butyl, isobutyl, t
Examples thereof include -butyl, phenyl group, trimethylsiloxy group, etc., but it is preferable that the methyl group or a part thereof is a phenyl group or a trimethylsiloxy group for reasons such as availability of raw materials. m is the number of substitutions of R3.
なお、本発明のシリコーン系桂皮酸誘導体は、一般式
]
%式%
(4−ml/2単位を有するシロキサンとを、有機溶媒
中で、触媒の存在下に反応させることによって合成する
ことができる。The silicone-based cinnamic acid derivative of the present invention can be synthesized by reacting a siloxane having the general formula] % formula % (4-ml/2 units) in an organic solvent in the presence of a catalyst. .
一般式(2)のエステルは、対応する置換桂皮酸誘導体
を常法により酸クロリドとした後、アミン存在下、オレ
フィン性不飽和結合を有する一価のアルコールと反応さ
せることによって得られるものである。反応溶媒として
は通常の有機溶媒が使用できるが、なかでもトルエン、
ベンゼンおよびキシレンなどの芳香族系を機溶媒が好ま
しく、反応温度は高温でおこなうが、なかでも還流温度
が良い。The ester of general formula (2) can be obtained by converting the corresponding substituted cinnamic acid derivative into an acid chloride by a conventional method, and then reacting it with a monohydric alcohol having an olefinically unsaturated bond in the presence of an amine. . Usual organic solvents can be used as reaction solvents, among which toluene,
Aromatic solvents such as benzene and xylene are preferably used as organic solvents, and the reaction temperature is preferably high, with reflux temperature being particularly preferred.
反応に用いるアルコールによって、一般式(2)中のY
は異なるが、少なくとも2個の炭素原子を有し、かつオ
レフィン性不飽和結合を有する一価の炭化水素基(複素
原子0を有するものを含む)である。例えば、直鎖の炭
化水素基として、CH,=CM−、CH2=C)ICl
3−、CIl□=CHCH2CH2、CH2”CHCH
zCHzCHzCH□:CHCH20CH2CH2−等
、分枝の炭化水素基としてCH2=CH−CH(Me)
−、CHz=CH−C(Me) z−。Depending on the alcohol used in the reaction, Y in general formula (2)
Although different, it is a monovalent hydrocarbon group having at least two carbon atoms and an olefinically unsaturated bond (including those having zero heteroatoms). For example, as a straight chain hydrocarbon group, CH,=CM-, CH2=C)ICl
3-, CIl□=CHCH2CH2, CH2''CHCH
CH2=CH-CH(Me) as a branched hydrocarbon group such as zCHzCHzCH□: CHCH20CH2CH2-
-, CHz=CH-C(Me)z-.
CHz=CH−CH(Et)−、CH2=CHC(Et
)zCHz=CHCHzCH(Me) +、 CH2=
CHCH(Me)−CHz−+CHz=C(Me)CL
−等の末端に二重結合を有するものがある。CHz=CH-CH(Et)-, CH2=CHC(Et
)zCHz=CHCHzCH(Me) +, CH2=
CHCH(Me)-CHz-+CHz=C(Me)CL
Some have a double bond at the end, such as -.
また、MeCH=CH−、MeCH=CHCHz−、(
Me) zC=CH−。Also, MeCH=CH-, MeCH=CHCHz-, (
Me) zC=CH-.
(Me) zc=cHcHz−、MeCH=CHCH2
−、MeCHzCH=CH−等の内部に二重結合を有す
るもの及びCH2・CH−CH=CHz−1CH,=C
(Me) CH=CHz−、MeCH=CH−CH=C
Hz−等の二重結合を2個有するものも挙げられるが、
エステル化反応とヒドロシリル化反応の反応の優位性及
びこれらのエステルより誘導されるシリコーン系桂皮酸
誘導体の安定性(光安定性を含む)等から末端に二重結
合を1個有するエステルが望ましい。(Me) zc=cHcHz-, MeCH=CHCH2
-, those with a double bond inside such as MeCHzCH=CH-, and CH2・CH-CH=CHz-1CH,=C
(Me) CH=CHz-, MeCH=CH-CH=C
Examples include those having two double bonds such as Hz-,
Esters having one double bond at the end are desirable because of the superiority of the esterification and hydrosilylation reactions and the stability (including photostability) of silicone-based cinnamic acid derivatives derived from these esters.
このようにして得られる一般式(2)のエステルをシロ
キサンとヒドロシリル化反応させることによって、本発
明のシリコーン系桂皮酸誘導体が得られるが、用いるシ
ロキサンは少なくとも1個の5i−Hを有する有機珪素
化合物であり、R’nS i O(3−n)/2単位お
よびR”、Si0.4−、.1)72単位を有するシロ
キサンとして表されるものである。例えば、(CIEt
O) 3SiH,(Me3SiO)JeS iH(Me
iS to) ss iH、(MeJS i )MeP
hS iH、(Me、 O5i)EtMeS iH、(
MezO5i)EtPhSiH、H(Me) 、S 1
O5i (Me) 、05 i (Me)2H等が挙げ
られるが、ヒドロシリル化反応の優位性、シラン、シロ
キサンの入手のしやすさ及びシリコーン系基剤に対する
溶解性などから1,1゜1.3,5,5.5−へブタメ
チルトリシロキサンが好ましい。しかし、本発明のシリ
コーン系桂皮酸誘導体が製造出来ればこれに限定される
ものではない。The silicone-based cinnamic acid derivative of the present invention can be obtained by subjecting the ester of general formula (2) thus obtained to a hydrosilylation reaction with a siloxane. is a compound expressed as a siloxane having R'nS i O(3-n)/2 units and R", Si0.4-,.1) 72 units. For example, (CIEt
O) 3SiH, (Me3SiO) JeS iH(Me
iS to) ss iH, (MeJS i)MeP
hS iH, (Me, O5i)EtMeS iH, (
MezO5i)EtPhSiH, H(Me), S 1
Examples include O5i (Me), 05i (Me)2H, etc., but 1.1° 1.3 ,5,5.5-hebutamethyltrisiloxane is preferred. However, the method is not limited to this as long as the silicone-based cinnamic acid derivative of the present invention can be produced.
反応溶媒としては通常の有機溶媒が使用できるが、なか
でもトルエン、ベンゼンおよびキシレンなどの芳香族系
有機溶媒が好ましく反応温度は高温でおこなうが、なか
でも還流温度が良い。As the reaction solvent, ordinary organic solvents can be used, but aromatic organic solvents such as toluene, benzene and xylene are particularly preferred, and the reaction temperature is preferably high, with reflux temperature being preferred.
ヒドロシリル化の触媒としては、通常良く知られるロジ
ウム錯体(Wilkinson complex)、ル
テニウム錯体、白金錯体、塩化白金酸等を用いることが
出来るが、触媒の入手のしやすさ及び合成反応の操作上
の簡便性から塩化白金酸触媒が好ましい。As a catalyst for hydrosilylation, commonly known rhodium complexes (Wilkinson complex), ruthenium complexes, platinum complexes, chloroplatinic acid, etc. can be used, but these may be used depending on the ease of obtaining the catalyst and the operational simplicity of the synthetic reaction. A chloroplatinic acid catalyst is preferred from the viewpoint of properties.
本発明に用いるシリコーン系桂皮酸誘導体は、目的に応
して、一般式(2)のエステル及び上記のシロキサン類
を種々選択することにより、低分子量のものから、高分
子量のものまで製造でき、性状は、室温において液状の
ものから樹脂状の固体のものまで含まれる。The silicone-based cinnamic acid derivatives used in the present invention can be manufactured from low molecular weight ones to high molecular weight ones by selecting various esters of general formula (2) and the above-mentioned siloxanes depending on the purpose. The properties range from liquid to resin-like solid at room temperature.
本発明に用いる基剤はシリコーン系桂皮酸誘導体が溶解
するものであれば、何れでもよいが、ここで特に、シリ
コーン系基剤を用いると、伸びの良さ、さっばり怒、べ
とつかない等の使用感や優れた耐水性、耐油性、さらに
汗や水に流れにくいなどの機能が得られる。The base used in the present invention may be any base as long as it dissolves the silicone-based cinnamic acid derivative, but in particular, the use of a silicone-based base provides good spreadability, light texture, non-stickiness, etc. It provides features such as excellent water resistance, oil resistance, and resistance to sweat and water.
本発明に用いるシリコーン系基剤には特に限定はないが
、例えばジメチルポリシロキサン、メチルポリシロキサ
ン、メチルハイドロジエンポリシロキサン等の鎖状ポリ
シロキサン、デカメチルポリシロキサン、ドデカメチル
ポリシロキサン、テトラメチルテトラハイドロジエンポ
リシロキサンなどの環状ポリシロキサン、ポリエーテル
、脂肪酸変性ポリシロキサン、高級アルコール変性ポリ
シロキサン、アミノ変性ポリシロキサンが用いられる。The silicone base used in the present invention is not particularly limited, but examples include chain polysiloxanes such as dimethylpolysiloxane, methylpolysiloxane, and methylhydrodienepolysiloxane, decamethylpolysiloxane, dodecamethylpolysiloxane, and tetramethyltetra Cyclic polysiloxanes such as hydrogen polysiloxane, polyethers, fatty acid-modified polysiloxanes, higher alcohol-modified polysiloxanes, and amino-modified polysiloxanes are used.
なお本発明の皮膚外用剤には、通常化粧品や医薬部外品
等の皮膚外用剤に用いられる他の成分、例えば油分、潤
滑剤、本発明以外の紫外線吸収剤、酸化防止剤、界面活
性剤、防腐剤、香料、水アルコール、増粘剤等を必要に
応じて適宜配合することができる。The external skin preparation of the present invention may contain other ingredients normally used in external skin preparations such as cosmetics and quasi-drugs, such as oils, lubricants, ultraviolet absorbers other than those of the present invention, antioxidants, and surfactants. , preservatives, fragrances, hydroalcohols, thickeners, etc. may be appropriately blended as required.
本発明の皮膚外用剤は、特にその適用分野を限定するも
のではなく、本発明に用いるシリコーン系桂皮酸誘導体
の特性と目的に応じ、化粧料、医薬部外品等に利用され
うるものである。The skin external preparation of the present invention is not particularly limited in its field of application, and can be used in cosmetics, quasi-drugs, etc., depending on the characteristics and purpose of the silicone-based cinnamic acid derivative used in the present invention. .
ここで、本発明の皮膚外用剤の剤形は任意でありパウダ
ー状、クリーム状、ペースト状、スチンク状、液状、ス
プレー状、ファンデーション等何れの剤型でもかまわず
、また、乳化剤を用いてW2O型及び0/W型に乳化し
ても良い。Here, the dosage form of the skin external preparation of the present invention is arbitrary and may be any dosage form such as powder, cream, paste, tincture, liquid, spray, foundation, etc. It may be emulsified into type and 0/W type.
また、その配合量は上記の剤形によっても異なるが、一
般には0.1〜20%、好ましくは0.5〜10%であ
る。Further, the blending amount varies depending on the above-mentioned dosage form, but is generally 0.1 to 20%, preferably 0.5 to 10%.
[実施例コ 以下、実施例を示し、本発明の詳細な説明する。[Example code] EXAMPLES Hereinafter, the present invention will be described in detail with reference to Examples.
1戊朋
以下、本発明の新規なシリコーン系桂皮酸誘導体の合成
例およびその物理化学的性質をあげて本発明をさらに詳
細に説明する。1. In the following, the present invention will be explained in more detail by giving examples of the synthesis of the novel silicone-based cinnamic acid derivative of the present invention and its physicochemical properties.
合成例1
3.4.5−トリメトキシ桂皮酸11.94 g 、塩
化チオニル11m1をベンゼン80m1中で3時間還流
温度で攪拌し、酸クロリドとしたのち、脱溶媒後、7.
20gの1−ブテン−3−オールを含むトルエン80m
1を加え、反応系を水浴中で冷却し5.25gのトリエ
チルアミンを含むトルエン40m1をゆっくり添加し1
時間攪拌した。さらに、室温下で1日撹拌した。濾過し
、トルエン層を水で洗浄し水を除去後、トルエンをン容
媒としシリカゲルカラムクロマトグラフィーにより3,
4.5−)リメトキシ桂皮酸エステル10.93g(7
4,6%)を得た。Synthesis Example 1 11.94 g of 3.4.5-trimethoxycinnamic acid and 11 ml of thionyl chloride were stirred in 80 ml of benzene at reflux temperature for 3 hours to form an acid chloride, and after removing the solvent, 7.
80 m of toluene containing 20 g of 1-buten-3-ol
1 was added, the reaction system was cooled in a water bath, and 40 ml of toluene containing 5.25 g of triethylamine was slowly added.
Stir for hours. Further, the mixture was stirred at room temperature for 1 day. After filtering and washing the toluene layer with water to remove water, 3,
4.5-) Rimethoxycinnamic acid ester 10.93g (7
4.6%).
GC−MS M”292
NMR(CDCl2)7.60 (LH,d (J=1
5.77Hz)) 、 6 、36 (li(、d (
J16、14t(z)) 、 6.74 (2H,s)
、5.92 (111,m) 、 5.49 (IH
,m) 。GC-MS M”292 NMR (CDCl2) 7.60 (LH, d (J=1
5.77Hz)) , 6, 36 (li(,d(
J16, 14t(z)), 6.74 (2H,s)
, 5.92 (111, m) , 5.49 (IH
, m).
5.29(IH,d (J=17.60Hz) ) 、
5.15(LH,d (J=10.64Hz) )
。5.29 (IH, d (J=17.60Hz)),
5.15 (LH, d (J=10.64Hz))
.
3.85(9H,s)、1.38(31(、d(J=6
.60Hz))。3.85 (9H, s), 1.38 (31(, d(J=6
.. 60Hz)).
合成例2
合成例1で得られたエステル2.9319gとシロキサ
ン(1,1,1,3,5,5,5−Hepjameth
yltrisiloxane、以下MHMと略す) 2
.2270gをトルエン50m lに注ぎ、さらに0.
1Mの塩化白金酸イソプロピルアルコール溶液を2.3
滴添加し還流温度で5時間攪拌しヒドロシリル化反応を
おこなった。トルエンを溶媒とし、シリカゲルカラムク
ロマトグラフィーにより生成物を単離し、オイル状の本
発明のシリコーン系桂皮酸誘導体を、3.0880 g
(59,8%)得た。Synthesis Example 2 2.9319 g of ester obtained in Synthesis Example 1 and siloxane (1,1,1,3,5,5,5-Hepjameth
yltrisiloxane (hereinafter abbreviated as MHM) 2
.. Pour 2270g into 50ml of toluene and add 0.
2.3 1M chloroplatinic acid isopropyl alcohol solution
The mixture was added dropwise and stirred at reflux temperature for 5 hours to carry out a hydrosilylation reaction. The product was isolated by silica gel column chromatography using toluene as a solvent, and 3.0880 g of the oily silicone-based cinnamic acid derivative of the present invention was obtained.
(59.8%) was obtained.
このものは下記の分析値によって同定した。This substance was identified by the following analytical values.
物質名。Name of substance.
[3−ビス(トリメチルシロキシ)メチルシリル−1−
メチj1プロピル ] −]3.4.5−トリメトキ
ンシンナメー
トe
GC−MS
阿゛ 514
NMR(CDC13)7.59(LH,d(J=16.
13Hz))、6.35(IHd(J15、77Hz)
) 、 6.75 (2H,s) 、 4.95 (I
H,q) 、3.86 (911,s) 。[3-bis(trimethylsiloxy)methylsilyl-1-
Methij1propyl] -]3.4.5-Trimethquine cinnamate e GC-MS 514 NMR (CDC13) 7.59 (LH, d (J = 16.
13Hz)), 6.35 (IHd (J15, 77Hz)
), 6.75 (2H,s), 4.95 (I
H,q), 3.86 (911,s).
1.65(2H,m) 、 1.29(3H,d (J
=6.23Hz)) 、 0.54 (2H、m) 。1.65 (2H, m), 1.29 (3H, d (J
=6.23Hz)), 0.54 (2H, m).
0.11(18H,s)、0.09(3Hs)。0.11 (18H, s), 0.09 (3Hs).
図1に10p p mの濃度(溶媒、エタノール)にお
けるUVスペクトルを示した。FIG. 1 shows the UV spectrum at a concentration of 10 ppm (solvent, ethanol).
これより、本発明の新規化合物であるシリコーン系桂皮
酸誘導体はUv−B波長領域に適切な吸収波長を有して
いることがGTI L’lされた。From this, it was determined that the silicone-based cinnamic acid derivative, which is a novel compound of the present invention, has an absorption wavelength appropriate for the Uv-B wavelength region.
合成例3
ベンゼンを溶媒とした他は、合成例2に準じてヒドロシ
リル化反応を行った。同様に精製し、生成物を3.15
70g (61,1%)を得た。Synthesis Example 3 A hydrosilylation reaction was carried out according to Synthesis Example 2 except that benzene was used as a solvent. Similarly purified, the product was 3.15
70 g (61.1%) were obtained.
合成例4
キシレンを溶媒とした他は、合成例2に準してヒドロシ
リル化反応をおこなった。同様に精製し生成物を3.5
240g (68,2%)得た。Synthesis Example 4 A hydrosilylation reaction was carried out according to Synthesis Example 2 except that xylene was used as a solvent. Similarly purified, the product was 3.5
240 g (68.2%) were obtained.
合成例5
3.4−ジメトキシ桂皮酸10.48g 、塩化チオニ
ル11m1をベンゼン200m1中で2時間還流温度で
攪拌し、酸クロリドとしたのち、脱溶媒後、3.63g
の1−ブテン−3−オールを含むトルエン80m l
ヲ加え、反応系を水溶中で冷却し5.10gのトリエチ
ルアミンを含むトルエン40m1をゆっくり添加し1時
間攪拌した。さらに、室温で1日攪拌した。Synthesis Example 5 10.48 g of 3.4-dimethoxycinnamic acid and 11 ml of thionyl chloride were stirred in 200 ml of benzene at reflux temperature for 2 hours to form acid chloride, and after removing the solvent, 3.63 g
80 ml of toluene containing 1-buten-3-ol
The reaction system was cooled in an aqueous solution, and 40 ml of toluene containing 5.10 g of triethylamine was slowly added and stirred for 1 hour. Further, the mixture was stirred at room temperature for 1 day.
濾過し、トルエン層を水で洗浄し水を除去後、トルエン
を溶媒としてシリカゲルカラムクロマトグラフィーによ
り3,4−ジメトキシ桂皮酸エステル6.886 g
(52,2%)を得た。After filtering and washing the toluene layer with water to remove water, 6.886 g of 3,4-dimethoxycinnamic acid ester was obtained by silica gel column chromatography using toluene as a solvent.
(52.2%) was obtained.
GC−MS M’ 262
HMR(CDCIs )7.63 (LH,d (J=
15.62)1z)) 、 6.32 (LH,d (
J=15.62Hz)) 、6.85(LH,d(J=
8.3011z) 、7.05(LH,s) 。GC-MS M' 262 HMR (CDCIs) 7.63 (LH, d (J=
15.62)1z)) , 6.32 (LH,d (
J=15.62Hz)), 6.85(LH,d(J=
8.3011z), 7.05(LH,s).
7.10(LH,d(J=8.30Hz))、5.92
(IH,m)、 5.50(LH,m)。7.10 (LH, d (J=8.30Hz)), 5.92
(IH, m), 5.50 (LH, m).
5.30(IH,d (J=17.09Hz) )、
5.16(IH,d (J=10.75Hz) )。5.30 (IH, d (J=17.09Hz)),
5.16 (IH, d (J=10.75Hz)).
3.90(6H,s) 、 1.29(3H,d(J=
6.83Hz)) 。3.90(6H,s), 1.29(3H,d(J=
6.83Hz)).
合成例6
合成例5で得たエステル2.6231gとシロキサン(
M HM ) 2.2291 gをトルエン50m1に
注ぎ、さらに0.1 Mの塩化白金酸イソプロピルアル
コール溶液を2.3滴添加し還流温度で5時間攪拌しヒ
ドロシリル化反応を行った。トルエンを溶媒として、シ
リカゲルカラムクロマトグラフィーにより生成物を単離
し、オイル状の2.9157g (60,1%)のシリ
コーン系桂皮酸誘導体を得た。このものは下記の分析値
によって同定した。Synthesis Example 6 2.6231 g of ester obtained in Synthesis Example 5 and siloxane (
M HM ) 2.2291 g was poured into 50 ml of toluene, and 2.3 drops of 0.1 M chloroplatinic acid isopropyl alcohol solution was added, followed by stirring at reflux temperature for 5 hours to perform a hydrosilylation reaction. The product was isolated by silica gel column chromatography using toluene as a solvent to obtain 2.9157 g (60.1%) of a silicone-based cinnamic acid derivative in the form of an oil. This substance was identified by the following analytical values.
物質名。Name of substance.
[3−ビス(トリメチルシロキシ)メチルシリル−1−
メチルプロピル ] −]3.4−ジメトキシシンナ
メー
トe
GC−MS N ” 484HMR
(CDCI:+)7.63(IH,d(J=15.62
Hz))、6.32(1,H,d(15,62Hz))
6.85(IH,d(J=8.30Hz))、7.05
(LH,s)。[3-bis(trimethylsiloxy)methylsilyl-1-
Methylpropyl] -]3,4-dimethoxycinnamate e GC-MS N'' 484HMR
(CDCI:+)7.63(IH,d(J=15.62
Hz)), 6.32 (1, H, d(15,62Hz))
6.85 (IH, d (J=8.30Hz)), 7.05
(LH,s).
7.10(1)1.d(J=8.30Hz))、4.9
5(IH,q)、 3.90(6t(、s)。7.10(1)1. d(J=8.30Hz)), 4.9
5(IH,q), 3.90(6t(,s).
1.65(2H,m) 、 1.29(3H,d (J
=6.83Hz)) 、 0.54 (2H,m)0.
11(18H,s)、0.09(3H,s)図2に10
ppmの濃度(溶媒、エタノール)におけるUVスペク
トルを示した。1.65 (2H, m), 1.29 (3H, d (J
=6.83Hz)), 0.54 (2H, m)0.
11 (18H, s), 0.09 (3H, s) 10 in Figure 2
The UV spectrum at a concentration of ppm (solvent, ethanol) is shown.
これより、本発明の新規化合物であるシリコーン系桂皮
酸誘導体はUV−B波長領域に適切な吸収波長を有して
いることが確認された。From this, it was confirmed that the silicone-based cinnamic acid derivative, which is a new compound of the present invention, has an appropriate absorption wavelength in the UV-B wavelength region.
合成例7
3.4.訃トリメトキシ桂皮酸24.1550 g、塩
化チオニル22m1をベンゼン160m1中で4時間還
流温度で攪拌し、酸クロリドとした後、脱溶媒後、5.
8550gのアリルアルコールを含むトルエン160m
1を加え、反応系を水浴中で冷却し、10.111gの
トリエチルアミンを含むトルエン80m1をゆっくり添
加し12時間攪拌した。′6.過し、トルエン層を水で
洗浄し、水を除去後、トルエンを溶媒としシリカゲルク
ロマトグラフィーにより3,4.5−1−ジメトキシ桂
皮酸エステル20.3039g (72,0%)を得た
。融点67.0−68.2°Cの白色結晶であり、MS
(M”278)であった。Synthesis Example 7 3.4. 24.1550 g of trimethoxycinnamic acid and 22 ml of thionyl chloride were stirred in 160 ml of benzene at reflux temperature for 4 hours to form an acid chloride, and after removing the solvent, 5.
160m of toluene containing 8550g of allyl alcohol
1 was added, the reaction system was cooled in a water bath, 80 ml of toluene containing 10.111 g of triethylamine was slowly added, and the mixture was stirred for 12 hours. '6. After filtering and washing the toluene layer with water to remove water, 20.3039 g (72.0%) of 3,4.5-1-dimethoxycinnamic acid ester was obtained by chromatography on silica gel using toluene as a solvent. It is a white crystal with a melting point of 67.0-68.2°C, and MS
(M”278).
合成例8
合成例7で得られたエステル5.6054gとシロキサ
7 (MHM) 、4.4713gをヘンゼア100m
1ニ注ぎ、さらにHzP LCI bイソプロピルアル
コール溶液を数滴添加し還流温度で4時間攪拌し、ヒド
ロシリル化反応を行なった。トルエンを溶媒とし、シリ
カゲルカラムクロマトグラフィーにより生成物を単離し
、オイル状の本発明のシリコーン誘導体を2゜7846
g(27,6Z)得た。このものは下記の分析値によっ
て同定した。Synthesis Example 8 5.6054 g of the ester obtained in Synthesis Example 7 and 4.4713 g of Siloxa 7 (MHM) were added to Henzea 100 m
A few drops of HzP LCI b isopropyl alcohol solution was added thereto, and the mixture was stirred at reflux temperature for 4 hours to carry out a hydrosilylation reaction. The product was isolated by silica gel column chromatography using toluene as a solvent, and the silicone derivative of the present invention in the form of an oil was isolated at 2°7846°C.
g(27,6Z) was obtained. This substance was identified by the following analytical values.
[3−ビス(トリメチルシロキシ)メチルシリルプロピ
ル l −3,4,5,−)リメトキンンンナシメー
ト
GC−MS N” 500
HNMR(CDCI++)7.55(IH,d(J=1
6.12Hz))、6.31(LH,d(J=15.6
3t(z))、6.70(2H,s)、4.11(2H
,t)、 3.82(9H。[3-bis(trimethylsiloxy)methylsilylpropyl l-3,4,5,-)rimethquininnascimate GC-MS N” 500 HNMR (CDCI++) 7.55 (IH, d (J=1
6.12Hz)), 6.31(LH,d(J=15.6
3t(z)), 6.70(2H,s), 4.11(2H
, t), 3.82 (9H.
sL 1.69(2)1.m)、0.51(2t(、t
)、0.06 (18H、S ) 。sL 1.69 (2) 1. m), 0.51(2t(,t
), 0.06 (18H, S ).
本物質の10ppmの濃度(エタノール溶媒)における
UVスペクトルは合成例2で得られた化合物のそれ(図
1)と殆ど変わらなかった。The UV spectrum of this substance at a concentration of 10 ppm (ethanol solvent) was almost the same as that of the compound obtained in Synthesis Example 2 (FIG. 1).
合成例9
合成例7で得られたエステル5.000gとシロキサン
H5i(O5iMe+)s5.500 gをベンゼン1
00m1に注ぎ、さらにH,PtC1、イソプロピルア
ルコール溶液を数滴添加し還流温度で4時間攪拌し、ヒ
ドロシリル化反応を行なった。トルエンを溶媒とし、シ
リカゲルカラムクロマトグラフィーにより生成物を単離
し、オイル状の本発明のシリコーン誘導体を2.077
g (20,1%)得た。このものは下記の分析値に
よって同定した。Synthesis Example 9 5.000 g of the ester obtained in Synthesis Example 7 and 5.500 g of siloxane H5i (O5iMe+) were mixed with benzene 1
A few drops of H, PtCl, and isopropyl alcohol solution were added thereto, and the mixture was stirred at reflux temperature for 4 hours to carry out a hydrosilylation reaction. The product was isolated by silica gel column chromatography using toluene as a solvent, and the oily silicone derivative of the present invention was obtained at 2.077%
g (20.1%) was obtained. This substance was identified by the following analytical values.
[3−トリス(トリメチルシロキシ)シリルブUビル
] −3,4,5−)リメトキシシンナメート
GC−MS 、単一成分 M” 574H−NMR(
CDC1,)7.61 (IH、d (J=15.87
)1z) ) 、 6.36 (LH、d(J=15.
87Hz))、6.77(2H,s)、4.17(2H
,t)、 3.90(9Hs)、1.74(2H,m
)、0.53(2H,t)、0.13(18)1.S)
。[3-Tris(trimethylsiloxy)silylbubyl]
]-3,4,5-)rimethoxycinnamate GC-MS, single component M”574H-NMR(
CDC1,)7.61 (IH,d (J=15.87
)1z) ) , 6.36 (LH, d(J=15.
87Hz)), 6.77(2H,s), 4.17(2H
,t), 3.90(9Hs), 1.74(2H,m
), 0.53 (2H, t), 0.13 (18) 1. S)
.
但し、化学シフトはCICl3の水素(7,27ppm
)を標準とした。この誘導体のUVスペクトル(エタノ
ールloppm 濃度)合成例2で得られた化合物のそ
れ(図1)と殆ど変わらなかった。However, the chemical shift is hydrogen of CICl3 (7.27 ppm
) was set as the standard. The UV spectrum (ethanol loppm concentration) of this derivative was almost the same as that of the compound obtained in Synthesis Example 2 (FIG. 1).
合成例10
3.4.5−トリメトキシ桂皮酸11..960g、塩
化チオニル]、1mlをベンゼン80m1中で3時間還
流温度で攪拌し、酸クロリドとした後、脱溶媒後、3.
640 gの1−ブテン−4−オールを含むトルエン8
0m lを加え、反応系を水溶中で冷却し、5.340
gのトリエチルアミンを含むトルエン40m1をゆっ
くり添加し24時間撹拌した。濾過し、トルエン層を水
で洗浄し、水を除去後、トルエンを溶媒としシリカゲル
クロマトグラフィーにより3.4.5−)リメトキシ桂
皮酸エステル10.0342g (68,4%)を得た
。融点61.8−63.8°Cの白色結晶であり、qs
(M゛292)であった。Synthesis Example 10 3.4.5-Trimethoxycinnamic acid 11. .. 960 g, thionyl chloride], 1 ml was stirred in 80 ml of benzene at reflux temperature for 3 hours to form acid chloride, and after removing the solvent, 3.
Toluene 8 containing 640 g of 1-buten-4-ol
0 ml was added, the reaction system was cooled in aqueous solution, and 5.340
40 ml of toluene containing 1 g of triethylamine was slowly added and stirred for 24 hours. After filtering, washing the toluene layer with water and removing the water, 10.0342 g (68.4%) of 3.4.5-)rimethoxycinnamate was obtained by chromatography on silica gel using toluene as a solvent. It is a white crystal with a melting point of 61.8-63.8°C, qs
(M゛292).
合成例11
合成例10で得られたエステル2.9303 gとシロ
キサン(M HM ) 2.2289 gをベンゼン1
00m1に注ぎ、さらにH2PtCI 6イソプロビル
アルコール溶液を数滴添加し還流温度で2時間攪拌し、
ヒドロシリル化反応を行なった。トルエンを溶媒とし、
シリカゲルカラムクロマトグラフィーにより生成物を単
離し、オイル状の本発明のシリコーン誘導体を3.14
88g (61,0%)得た。このものは下記の分析値
によって同定した。Synthesis Example 11 2.9303 g of the ester obtained in Synthesis Example 10 and 2.2289 g of siloxane (MHM) were mixed with 1 part of benzene.
00ml, and then added several drops of H2PtCI 6 isopropyl alcohol solution and stirred at reflux temperature for 2 hours.
A hydrosilylation reaction was performed. Using toluene as a solvent,
The product was isolated by silica gel column chromatography, and the silicone derivative of the present invention in the form of an oil was obtained by
88 g (61.0%) were obtained. This substance was identified by the following analytical values.
[3−ビス(トリメチルシロキシ)メチ191月ジブチ
ル] −3,4,5,−)リメトキシシンナメート
H,S)、0.01(3H,s)。[3-bis(trimethylsiloxy)methydibutyl] -3,4,5,-)rimethoxycinnamate H,S), 0.01 (3H,s).
この誘導体のUVスペクトル(エタノール10ppm濃
度)は合成例2で得られた化合物のそれ(図1)と殆ど
変わらなかった。The UV spectrum of this derivative (ethanol concentration: 10 ppm) was almost the same as that of the compound obtained in Synthesis Example 2 (FIG. 1).
合成例12
合成例11に準じ、シロキサンH5i(O5iMea)
3を用い、ヒドロシリル化反応を行なった。シリカゲル
カラムクロマトグラフィーによりオイル状の本発明のシ
リコーンF5i 4体を得た。このものは下記の分析値
によって同定した。Synthesis Example 12 According to Synthesis Example 11, siloxane H5i (O5iMea)
A hydrosilylation reaction was carried out using 3. Four oil-like silicone F5i of the present invention were obtained by silica gel column chromatography. This substance was identified by the following analytical values.
[3−トリス(トリメチルシロキシ)ンリルブチル]
−3,4,5−)リメトキソシンナメート
GC−MS N”514
H−NMR(CDCI 3 )7.59 (LH、d
(J= 15.62t(z))、 6.35 (IH、
d(J=16.11Hz))、6.74(2H,s)、
4.21(2H,t)、 3.87(9H。[3-tris(trimethylsiloxy)ylbutyl]
-3,4,5-) Rimethoxocinnamate GC-MS N"514H-NMR (CDCI3) 7.59 (LH, d
(J = 15.62t(z)), 6.35 (IH,
d(J=16.11Hz)), 6.74(2H,s),
4.21 (2H, t), 3.87 (9H.
s) 、 1.75(2H,m)、 1.47(2H,
m)、0.51(211,m) 、0.10(18GC
−MS M’ 588
’HNMR(CDCI3)7.59(LH,d(J=1
5.62Hz))、6.35(II、d(J=16.1
1Hz))、6.74(28,s)、4.21(2H,
t)、 3.87(9H。s), 1.75 (2H, m), 1.47 (2H,
m), 0.51 (211, m), 0.10 (18GC
-MS M'588'HNMR (CDCI3) 7.59 (LH, d (J=1
5.62Hz)), 6.35(II, d(J=16.1
1Hz)), 6.74 (28, s), 4.21 (2H,
t), 3.87 (9H.
s)、1.75(2H,m)、1.47(2H,m)、
0.51(2H,m) 、0.10(27H,S)。s), 1.75 (2H, m), 1.47 (2H, m),
0.51 (2H, m), 0.10 (27H, S).
この誘導体のUVスペクトル(エタノール10ppm濃
度)合成例2で得られた化合物のそれ(図1)と殆ど変
わらなかった。The UV spectrum of this derivative (ethanol concentration at 10 ppm) was almost the same as that of the compound obtained in Synthesis Example 2 (FIG. 1).
(以下余白)
合成例13
合成例6に準じ、同一のエステルでシロキサンH5i
(O5iMez)zを用いヒドロシリル化反応を行なっ
た。シリカゲルカラムクロマトグラフィーによりオイル
状の本発明のシリコーン誘導体を得た。このものは下記
の分析値によって同定した。(Left below) Synthesis Example 13 According to Synthesis Example 6, siloxane H5i was prepared using the same ester.
A hydrosilylation reaction was performed using (O5iMez)z. An oily silicone derivative of the present invention was obtained by silica gel column chromatography. This substance was identified by the following analytical values.
[3−トリス(トリメチルシロキシ)シリル−1−メチ
ルブ■ビル ] −]3.4−ジメトキシシンナメー
ト
GC−MS N”558
’ H−NMR(CDCI i)7.63 (LH,d
(J= 15.62Hz) ) 、 6.32 (I
H、d(J=15.62Hz))、6.85(IH,d
(J=8.30 Hz))、 7.05(IH。[3-Tris(trimethylsiloxy)silyl-1-methylbuvir] -]3.4-dimethoxycinnamate GC-MS N"558' H-NMR (CDCI i) 7.63 (LH, d
(J = 15.62Hz) ), 6.32 (I
H, d (J = 15.62 Hz)), 6.85 (IH, d
(J=8.30 Hz)), 7.05 (IH.
s)、7.10(LH,d(J=8.30 Hz))、
4.95((IH,q)、3.90(6H,s) 、
1.65(2H,m) 、 1.29(3H,d (J
=6.83 Hz) )。s), 7.10 (LH, d (J=8.30 Hz)),
4.95 ((IH, q), 3.90 (6H, s),
1.65 (2H, m), 1.29 (3H, d (J
=6.83 Hz)).
0.54(2H,m)、0.10(27H,s)。0.54 (2H, m), 0.10 (27H, s).
この誘導体のUVスペクトル(エタノール10ppm濃
度)は合成例6で得られた化合物のそれ(図2)と殆ど
変わらなかった。The UV spectrum of this derivative (ethanol concentration: 10 ppm) was almost the same as that of the compound obtained in Synthesis Example 6 (FIG. 2).
合成例14
3.4.5−トリメトキシ桂皮酸23.912g、塩化
チオニル22m1をベンゼン700m I中で2時間還
流温度で撹拌し、酸クロリドとした後、脱溶媒後、10
.332gのエチレングリコールモノアリルエーテル(
CL=Ct(CHzOCIIzCHzOH)を含むトル
エン160m1を加え、反応系を水浴中で冷却し、lO
,233gのトリエチルアミンを含むトルエン80m1
をゆっくり添加し24時間攪拌した。濾過し、トルエン
層を水で洗浄し、水を除去後、トルエンを溶媒としシリ
カゲルクロマトグラフィーにより3,4.5−)リメト
キシ桂皮酸エステル23.189g (71,7%)を
得た。Synthesis Example 14 23.912 g of 3.4.5-trimethoxycinnamic acid and 22 ml of thionyl chloride were stirred in 700 mI of benzene at reflux temperature for 2 hours to form acid chloride, and after removing the solvent, 10
.. 332 g of ethylene glycol monoallyl ether (
160 ml of toluene containing CL=Ct(CHzOCIIzCHzOH) was added, the reaction system was cooled in a water bath, and 1O
, 80 ml of toluene containing 233 g of triethylamine
was added slowly and stirred for 24 hours. After filtering, washing the toluene layer with water and removing water, 23.189 g (71.7%) of 3,4.5-)rimethoxycinnamate was obtained by chromatography on silica gel using toluene as a solvent.
このエステルはオイル状である。This ester is in the form of an oil.
GC−MS 阿゛322
’HNMR(CDCI:+)7.62(IH,d(J”
15.63Hz))、6.39(LH,d(J=16.
12Hz) ) 、 6.76(2H,s) 、5.9
2(E 、m) 、5.31 (LH,d(J=17.
09 Hz))、5.21(LH,d(J=10.74
Hz))、4.37(2H,t)。GC-MS A322'HNMR (CDCI:+)7.62 (IH, d(J")
15.63Hz)), 6.39(LH,d(J=16.
12Hz) ), 6.76(2H,s), 5.9
2(E,m), 5.31 (LH,d(J=17.
09 Hz)), 5.21(LH,d(J=10.74
Hz)), 4.37(2H,t).
4.06(2H,d(J=5.37 Hz))、3.8
8(9t(、s)、3.72(2H,t)。4.06 (2H, d (J=5.37 Hz)), 3.8
8(9t(,s), 3.72(2H,t).
合成例15
合成例14で得たエステル(3,2329g )を用い
シロキサンMHM(2,2896g )でトルエン?容
媒中(50ml) 2時間還流しヒドロシリル化反応を
行なった。Synthesis Example 15 Using the ester (3,2329g) obtained in Synthesis Example 14, toluene was added to siloxane MHM (2,2896g). The mixture was refluxed in the medium (50 ml) for 2 hours to carry out a hydrosilylation reaction.
シリカゲルカラムクロマトグラフィーによりオイル状の
本発明のシリコーンHM 導体を3.9251 g(7
1,8%)得た。このものは下記の分析値によって同定
した。The silicone HM conductor of the present invention in oil form was collected in an amount of 3.9251 g (7
1.8%) was obtained. This substance was identified by the following analytical values.
GC−MS M”544
この誘導体のUVスペクトル(エタノール110PP濃
度)合成例2で得られた化合物のそれ(図1)と殆ど変
わらなかった。GC-MS M''544 UV spectrum of this derivative (ethanol 110PP concentration) was almost the same as that of the compound obtained in Synthesis Example 2 (FIG. 1).
合成例2. 3. 4. 6. 8. 9.11.12
.13.15で得られたシリコーン系桂皮酸誘導体(ジ
メトキシ、トリメトキシ置換体)のシリコーン基剤に対
する溶解性については、25゛Cにおいて、ジメチルポ
リシロキサン、メチルフェニルポリシロキサンに対する
溶解性試験を行なった。いずれにおいても、10重量%
以上溶解し、優れた溶解性を示した。Synthesis example 2. 3. 4. 6. 8. 9.11.12
.. Regarding the solubility of the silicone-based cinnamic acid derivative (dimethoxy, trimethoxy substituted product) obtained in 13.15 in a silicone base, a solubility test in dimethylpolysiloxane and methylphenylpolysiloxane was conducted at 25°C. In either case, 10% by weight
It showed excellent solubility.
なお、前駆体であるエステルは殆ど熔解性を示さなかっ
た。Note that the ester as a precursor showed almost no solubility.
また、耐水性、耐油性については、水、50%エタノー
ル、流動パラフィン等の油に、本発明のシリコーン系桂
皮酸誘導体(ジメトキシ、トリメトキシ置換体)を攪拌
混合し、50″Cに60日間放置し、加水分解等が起こ
らないことから耐水性、耐油性が優れていることを確認
した。Regarding water resistance and oil resistance, the silicone-based cinnamic acid derivative (dimethoxy, trimethoxy substituted product) of the present invention is stirred and mixed with water, 50% ethanol, oil such as liquid paraffin, and left at 50"C for 60 days. However, it was confirmed that it has excellent water resistance and oil resistance because hydrolysis does not occur.
紫外線吸収剤は配合する基剤(あるいは溶媒)によって
その電子スペクトルが10〜20nm程シフトすること
がある。例えばN、N−ジメチル2−エチルへキシルシ
ンナメートはエタノール中とジメチルポリシロキサン中
では10nmシフトする。紫外線吸収剤は溶媒依存性が
少ないことが要求されている。The electronic spectrum of the ultraviolet absorber may shift by about 10 to 20 nm depending on the base (or solvent) in which it is blended. For example, N,N-dimethyl 2-ethylhexylcinnamate shifts by 10 nm in ethanol and dimethylpolysiloxane. Ultraviolet absorbers are required to have little solvent dependence.
本発明のシリコーン系桂皮酸誘導体は溶媒依存性が少な
い。The silicone-based cinnamic acid derivative of the present invention has little solvent dependence.
さらには、紫外線吸収剤としての安全性、熱及び光に対
する安定性が要求される。Furthermore, safety as an ultraviolet absorber and stability against heat and light are required.
本発明のシリコーン系桂皮酸誘導体は、感作性、変異原
性、光惑作性及び光毒性等の安全性では全く問題がなく
、熱(加水分解を含む)対する安定性も良好である。光
に対する安定性では通常の太陽光線照射では全く安定で
あり、超高圧水銀灯照射で初めて光異性化(トランス−
シス)反応を起こすが、U V −B pJf域には吸
収が認められており、優れた紫外線吸収剤といえる。The silicone-based cinnamic acid derivative of the present invention has no safety problems such as sensitization, mutagenicity, photoconductivity, and phototoxicity, and has good stability against heat (including hydrolysis). In terms of stability against light, it is completely stable under normal sunlight irradiation, and photoisomerization (trans-
cis) reaction, but absorption is observed in the UV-B pJf region, making it an excellent ultraviolet absorber.
実施例1 日焼は止め化粧料(油状タイプ)■デカメチ
ルシクロペンタシロキサン 48.0%■ジメチルポ
リシロキサン(l0cs/25°C)20.0■メチル
フエニルポリシロキサン
(20C5/25°C) 20.0■シリコーン
樹脂 10.0■シリコ一ン系
桂皮酸誘導体11 2.01) Me
(製法)■〜■を混合し、十分に溶解した後濾過して製
品とする
比較例1
実施例1の処方中、■を除く以外は実施例1同様の方法
で製品を得た。Example 1 Sunscreen cosmetic (oil type) ■Decamethylcyclopentasiloxane 48.0%■Dimethylpolysiloxane (l0cs/25°C) 20.0■Methylphenylpolysiloxane (20C5/25°C) 20.0■Silicone resin 10.0■Silicone-based cinnamic acid derivative 11 2.01) Me (Production method) Mix ■~■, sufficiently dissolve, and then filter to obtain a product Comparative example 1 Example 1 A product was obtained in the same manner as in Example 1 except for omitting ■ in the formulation.
” Me
実施例2 日焼は止め化粧料(W10クリーム)■オク
タメチルシクロテトラシロキサン 28.0%■ジメチ
ルポリシロキサン 5.0(100C5
/25°C)
■ジメチルポリシロキサン
(2,500,0OOC5/25°C) 3.0■
流動パラフイン 5・0■シリコ
一ン系桂皮酸誘導体2) 1.5■ポリエ
ーテル変性シリコーン 6.0(400C5
/25°C)
(ポリオキシエチレン基含量 20重量%)■精製水
43.1■L−グルタミ
ン酸ナトリウム 3.0■1.3−ブチレン
グリコール 5.0[相]防腐剤
0.20香料
0.2(製法)■〜■、■を混合し
、加熱溶解して70″Cに保ち油相部とする。別に■〜
■を加熱溶解して70°Cに保ち水相部とする。この油
田部に水相部を添加して乳化機により十分に乳化する。"Me Example 2 Sunscreen cosmetic (W10 cream) ■Octamethylcyclotetrasiloxane 28.0% ■Dimethylpolysiloxane 5.0 (100C5
/25°C) ■Dimethylpolysiloxane (2,500,0OOC5/25°C) 3.0■
Liquid paraffin 5.0■ Silicone-based cinnamic acid derivative 2) 1.5■ Polyether-modified silicone 6.0 (400C5
/25°C) (Polyoxyethylene group content 20% by weight) ■Purified water
43.1 ■ Sodium L-glutamate 3.0 ■ 1.3-Butylene glycol 5.0 [Phase] Preservative
0.20 fragrance
0.2 (manufacturing method) Mix ■~■ and ■, heat and melt and maintain at 70''C to form an oil phase. Separately ■~
Heat and dissolve (2) and maintain at 70°C to form an aqueous phase. The aqueous phase is added to this oil field and thoroughly emulsified using an emulsifier.
乳化後、かきまぜながら冷却し、35°C以下になった
ら容器に流し込み放冷して固める。After emulsifying, cool while stirring, and when the temperature drops below 35°C, pour into a container and leave to cool to solidify.
比較例2
実施例2の処方中■を除(以外は実施例2と同様にして
製品を得た。Comparative Example 2 A product was obtained in the same manner as in Example 2 except for omitting ■ in the formulation of Example 2.
実施例3 日焼は止め化粧料(0/Wクリーム)■デカ
メチルシクロペンタシロキサン 9.0%■流動パ
ラフィン 3.0■イソプロピ
ルミリステート 2.0■ワセリン
5.0■セタノール
5.0■ステアリン酸
3.0■グリセリルモノイソ
ステアレート
■シリコーン系桂皮酸誘導体3)
■防腐剤
[相]香料
■グリセリン
@プロピレングリコール
■ヒアルロン酸
■水酸化カリウム
■精製水
3.0
1.0
0.2
0.2
10.0
5.0
0.01
0.2
53.39
(以下余白)
阿e
(製法)■〜■を70°Cで加熱撹拌して油相部とする
。0〜[相]を70°Cに加熱し完全溶解した後水相部
とする。油相部を水相部に添加し乳化機にて乳化する。Example 3 Sunscreen cosmetic (0/W cream) ■Decamethylcyclopentasiloxane 9.0%■Liquid paraffin 3.0■Isopropyl myristate 2.0■Vaseline
5.0 ■ Setanol
5.0 ■ Stearic acid
3.0 ■ Glyceryl monoisostearate ■ Silicone-based cinnamic acid derivative 3) ■ Preservative [phase] Fragrance ■ Glycerin @ propylene glycol ■ Hyaluronic acid ■ Potassium hydroxide ■ Purified water 3.0 1.0 0.2 0. 2 10.0 5.0 0.01 0.2 53.39 (Left below) Ae (Manufacturing method) Heat and stir ■ to ■ to form an oil phase at 70°C. After heating 0 to [phases] to 70°C and completely dissolving them, the aqueous phase is obtained. The oil phase is added to the water phase and emulsified using an emulsifier.
乳化物を熱交換器にて30°Cまで冷却した後充填して
製品を得る。The emulsion is cooled to 30°C in a heat exchanger and then filled to obtain a product.
比較例3
実施例3の処方中、■を除く以外は実施例3と同様にし
て製品を得た。Comparative Example 3 A product was obtained in the same manner as in Example 3 except for excluding ■ in the formulation of Example 3.
実施例4 日焼は止めローション
■ジメチルポリシロキサン(5C5/25°C) 1
0.0%■メチルフェニルポリシロキサン
(20C5/25°C) 7.0
■ステアリン酸 1.0■
シリコ一ン系桂皮酸誘導体4ゝ 1o、0■防
腐剤
■香料
■グリセリン
■モンモリロナイト
■水酸化カリウム
[相]端製氷
” Me
0.2
0.2
5.0
0.5
0.2
65.9
(製法)■〜■を70°Cで加熱攪拌して油相部とする
。■〜[相]を70°Cに加熱溶解し水相部とする。油
相部を水相部中に添加し、乳化機にて乳化する。Example 4 Sunscreen lotion ■Dimethylpolysiloxane (5C5/25°C) 1
0.0% ■Methylphenylpolysiloxane (20C5/25°C) 7.0 ■Stearic acid 1.0■
Silicone-based cinnamic acid derivative 4ゝ 1o, 0 ■Preservative ■Fragrance ■Glycerin ■Montmorillonite ■Potassium hydroxide [phase] Edge ice making" Me 0.2 0.2 5.0 0.5 0.2 65.9 (Production method) Heat and stir ■ to ■ at 70°C to obtain an oil phase. Heat and dissolve ■ to [phase] to 70°C to obtain an aqueous phase. Add the oil phase to the aqueous phase. Then, emulsify using an emulsifying machine.
乳化物を熱交換器にて30°Cまで冷却した後充填し日
焼は止めローションを得る。The emulsion was cooled to 30°C in a heat exchanger and then filled to obtain a sunscreen lotion.
比較例4
実施例4の処方中、■を除く以外は実施例4と同様にし
て製品を得た。Comparative Example 4 A product was obtained in the same manner as in Example 4 except for excluding ■ in the formulation of Example 4.
以上のごとくして得られた実施例1〜4および比較例1
〜4について紫外線防止効果の測定を行った。Examples 1 to 4 and Comparative Example 1 obtained as above
-4 were measured for their ultraviolet protection effects.
紫外線防止効果の測定は次に示す紫外線感受性組成物を
用いて行った。The ultraviolet ray prevention effect was measured using the following ultraviolet sensitive composition.
紫外線防止効果の測定は、特開昭62−112020号
報に記載0紫外線感受性組成物を用いて行った。以下に
紫外線感受性組成物の製法を述べる。The UV protection effect was measured using a UV sensitive composition described in JP-A-62-112020. The method for producing the ultraviolet-sensitive composition will be described below.
ロイコクリスタルバイオレット1.0g、テトラブロモ
ジメチルスルフォン0.1g、エチレン−酢酸ビニル共
重合体10g、トルエン 100m1からなる液を調製
しI液とする。これとは別に、N、 Nジメチルバラ
アミノ安息香酸−2−エチルへキシルエステル7g1エ
チレン−酢酸ビニル共重合体Log、 )ルエン 1
00m1からなる液を調整し、■液とする。A solution consisting of 1.0 g of leuco crystal violet, 0.1 g of tetrabromodimethylsulfone, 10 g of ethylene-vinyl acetate copolymer, and 100 ml of toluene is prepared and used as Solution I. Separately, N, N dimethylvaraminobenzoic acid-2-ethylhexyl ester 7g 1 ethylene-vinyl acetate copolymer Log, ) Luene 1
A solution consisting of 00ml was prepared and used as a solution (■).
写真用原紙上に先ずI液を固形分で1 g / yrに
なるように塗布し乾燥後、其の上に■液を固形分で5g
/rdのなるように塗布して紫外線感受性組成物を得る
。First, apply Liquid I to a solid content of 1 g/yr on photographic base paper, and after drying, apply Liquid ■ on top of it to a solid content of 5 g.
/rd to obtain an ultraviolet sensitive composition.
この紫外線感受性組成物は紫外線を照射することによっ
てその紫外線照射線量の増加に従って白色→淡紫色→紫
色→濃紫色へと呈色する紙である。This ultraviolet-sensitive composition is a paper whose color changes from white to pale purple to purple to deep purple when irradiated with ultraviolet rays as the amount of ultraviolet irradiation increases.
測定するサンプル40mgをヒマシ油12g中に混合し
、ローラー処理を行ない均一に分散する。直径5cmの
円形の上記紫外線感受性組成物の上に透明PETフィル
ムを乗せ其の上にこれの 1.5 gを均一の厚さにな
るように塗布し、紫外線ランプを8分間照射しPETフ
ィルムをサンプルごと除去し呈色した紫外線感受性組成
物を、日立607分光光度計を用い、紫外線照射量が零
の時の紫外線感受性組成物の色を基準にしてLAB座標
系で色差を計算した。40 mg of the sample to be measured is mixed in 12 g of castor oil and uniformly dispersed by roller treatment. A transparent PET film was placed on top of the above ultraviolet sensitive composition in a circular shape with a diameter of 5 cm, and 1.5 g of the film was applied on top of it to a uniform thickness, and the PET film was irradiated with an ultraviolet lamp for 8 minutes. Using a Hitachi 607 spectrophotometer, the color difference of the colored UV-sensitive composition that was removed along with the sample was calculated using the LAB coordinate system based on the color of the UV-sensitive composition when the amount of UV irradiation was zero.
結果は表1に示した。The results are shown in Table 1.
(以下余白)
表1
(以下余白)
表1かられかるように実施例の色素は、それに対応する
比較例の色差よりも小さく紫外線防止効果が高くなって
いることがわかる。すなわち、本発明のシリコーン系桂
皮酸誘導体を配合することにより優れた紫外線防止効果
が得られることがわかる。(Hereafter the margin) Table 1 (Hereafter the margin) As can be seen from Table 1, it can be seen that the dyes of the examples have a smaller color difference than the corresponding comparative examples and have a higher ultraviolet protection effect. That is, it can be seen that by blending the silicone-based cinnamic acid derivative of the present invention, an excellent ultraviolet protection effect can be obtained.
実施例5 日焼は止め両用ファンデーション■シリコー
ン処理酸化チタン 9.5%■シリコーン処
理マイカ 40,0■シリコーン処理タ
ルク 20.45■シリコーン処理酸化
鉄 7.5■球状ナイロンパウダー
10.0■トリメチロールプロパン
5.0トリイソステアレート
■スクワラン 3・0■ピー
スワツクス 2.0■シリコ一
ン系桂皮酸誘導体5) 0.5■ソルビタン
トリオレート 1.0■防腐剤
0.50ビタミンE
O,05■香料
e
0.5
(製法)■〜■をヘンシェルミキサーで混合し、これに
■〜@を加熱溶解混合したものを添加混合した後粉砕し
、これを中皿に成型し日焼は止め両用ファンデーション
を得た。Example 5 Dual-use sunscreen foundation ■Silicone-treated titanium oxide 9.5%■Silicone-treated mica 40.0■Silicone-treated talc 20.45■Silicone-treated iron oxide 7.5■Spheroidal nylon powder
10.0 ■ Trimethylolpropane
5.0 Triisostearate ■ Squalane 3.0 ■ Peace wax 2.0 ■ Silicone cinnamic acid derivative 5) 0.5 ■ Sorbitan triolate 1.0 ■ Preservative
0.50 vitamin E
O, 05 ■Fragrance e 0.5 (Production method) Mix ~■ with a Henschel mixer, add and mix ■~@ by heating, mix, and then crush, mold this into a medium plate, and bake in the sun. I got a double-use foundation.
実施例5はのびが軽く、自然な仕上りとなり、化粧持ち
が良く、紫外線防止効果が持続するものであった。Example 5 applied easily, gave a natural finish, had good makeup retention, and had a long-lasting UV protection effect.
実施例6 日焼は止めスチック化粧料
■酸化チタン 10.0%
■酸化亜鉛 7.0■マイ
カ 16.。Example 6 Sunscreen stick cosmetic ■Titanium oxide 10.0%
■Zinc oxide 7.0■Mica 16. .
■赤色酸化鉄 1.5■黄
色酸化鉄 1.5■黒色酸
化鉄 1.0■ジメチルポ
リシロキサ7 (20C5/25°C)29.4■トリ
メチロールプロパン
トリー2−エチルヘキサノエート
■流動パラフィン
[相]マイクロウリスタリンワンクス
■セレシン
@固形パラフィン
■シリコーン系桂皮酸誘導体6)
■香料
■酸化防止剤
■ソルビタンセスキオレート
6) Me
10.0
■0.0
2.0
1.0
6.0
3.0
0.5
0.1
1.0
(?!法)■〜■をヘンシェルミキサーで混合し、■〜
■■■[相]を加熱攪拌溶解したものに加え、混合する
。次に[相]〜@0を溶融したものを上記混合物に添加
し、十分混合した後、スチツク状に成型し、日焼は止め
スチソク化粧料を得た。■Red iron oxide 1.5■Yellow iron oxide 1.5■Black iron oxide 1.0■Dimethylpolysiloxa 7 (20C5/25°C) 29.4■Trimethylolpropanetri-2-ethylhexanoate■Fluidity Paraffin [phase] Microuristarine Wanx ■ Ceresin @ solid paraffin ■ Silicone-based cinnamic acid derivative 6) ■ Fragrance ■ Antioxidant ■ Sorbitan sesquiolate 6) Me 10.0 ■0.0 2.0 1.0 6. 0 3.0 0.5 0.1 1.0 (?! Method) Mix ■~■ with a Henschel mixer, and mix ■~
■■■Add [phase] to the dissolved solution by heating and stirring, and mix. Next, a melt of [Phase]~@0 was added to the above mixture, and after thorough mixing, it was molded into a stick to obtain a sunscreen cosmetic.
実施例6は高い紫外線防止効果を有し、且つ、化粧持ち
に優れるものであった。Example 6 had a high effect of preventing ultraviolet rays and had excellent makeup durability.
実施例7 日焼は止め化粧下地
■ジメチルポリシロキサン 2C5/25°C■グリセ
リルトリイソステアレート
■アイソパー(登録商標)G
■ソルビタンセスキオレート
■ポリオキシエチレン変性
オルガノポリシロキサン
■精製水
■1.3−ブチレングリコール
■微粒子酸化チタン
■シリコーン系桂皮酸誘導体7)
[相]防腐剤
■酸化防止剤
■香料
” Me
19.0%
10.0
5.0
1゜0
3.0
45.0
5.0
10.0
2.0
適量
適量
適量
(製法)■〜■■0@を70°Cで撹拌溶解し、これに
あらかじめ70°Cに加熱した■〜■[相]を添加し、
乳化分散後冷却して目的の日焼は止め化粧下地を得た。Example 7 Sunscreen makeup base ■ Dimethylpolysiloxane 2C5/25°C ■ Glyceryl triisostearate ■ Isopar (registered trademark) G ■ Sorbitan sesquiolate ■ Polyoxyethylene modified organopolysiloxane ■ Purified water ■ 1.3 -Butylene glycol ■ Fine particle titanium oxide ■ Silicone-based cinnamic acid derivative 7) [Phase] Preservative ■ Antioxidant ■ Fragrance Me 19.0% 10.0 5.0 1゜0 3.0 45.0 5.0 10.0 2.0 Appropriate amount Appropriate amount Appropriate amount (manufacturing method) ■~■■0@ is stirred and dissolved at 70°C, and to this is added ■~■ [phase] heated to 70°C in advance,
After emulsification and dispersion, the mixture was cooled to obtain the desired sunscreen makeup base.
実施例7は高い紫外線防止効果を存し、且つ化粧持ち乙
こ優れるものであった。Example 7 had a high UV protection effect and had excellent makeup longevity.
実施例8 日焼は止めスチック化粧料
■酸化チタン IO30%
■酸化亜鉛 7.0■マ
イカ 16,0■赤
色酸化鉄 1.5■黄色酸
化鉄 1.5■黒色酸化鉄
1.0■ジメチルポリシ
ロキサン(20C5/25 ”C) 29.4■トリ
メチロールプロパン 10.0トリー2
−エチルヘキサノエート
■流動パラフィン 10.0[
相]マイクロクリスタリンワックス 2.00
セレシン 1.0@固形
パラフイン 6.0@シリコ一
ン系桂皮酸誘導体!l) 3.Q■香料
■酸化防止剤
[相]ソルビタンセスキオレート
” O5+Me、。Example 8 Anti-tanning stick cosmetic ■Titanium oxide IO30%
■Zinc oxide 7.0■Mica 16.0■Red iron oxide 1.5■Yellow iron oxide 1.5■Black iron oxide 1.0■Dimethylpolysiloxane (20C5/25 ”C) 29.4■Trimethylolpropane 10.0 Tory 2
-Ethylhexanoate ■Liquid paraffin 10.0 [
Phase] Microcrystalline wax 2.00
Ceresin 1.0@Solid paraffin 6.0@Silicone-based cinnamic acid derivative! l) 3. Q■Fragrance ■Antioxidant [Phase] Sorbitan Sesquiolate" O5+Me.
0.5
0.1
1.0
(製法)■〜■をヘンシェルミキサーで混合し、■〜■
■0■を加熱攪拌溶解したものに加え、混合する。次に
[相]〜@0を溶融したものを上記混合物に添加し、十
分混合した後、スチソク状に成型し、日焼は止めスチッ
ク化粧料を得た。0.5 0.1 1.0 (Production method) Mix ■~■ with a Henschel mixer, and mix ■~■
(1) Add 0■ to the dissolved solution while heating and stirring, and mix. Next, a melt of [Phase]~@0 was added to the above mixture, and after thorough mixing, it was molded into a stick shape to obtain a sunscreen stick cosmetic.
実施例8は実施例6と同様高い紫外線防止効果を有し、
且つ、化粧持ちに優れるものであった。Example 8 has a high UV protection effect similar to Example 6,
Moreover, the makeup had excellent long-lasting properties.
実施例9 日焼は止め化粧下地
■ジメチルポリシロキサン 2C5/25°C19,0
%■グリセリルトリイソステアレート 10.0■
アイソパー(登録商標) G 5.0■
ソルビタンセスキオレート 1.0■ポリ
オキシエチレン変性 3.0オルガノポ
リシロキサン
■精製水
■1.3−ブチレングリコール
■微粒子酸化チタン
■シリコーン系桂皮酸誘導体9)
[相]防腐剤
■酸化防止剤
■香料
” O5iMe。Example 9 Sunscreen makeup base ■Dimethylpolysiloxane 2C5/25°C19,0
%■Glyceryl triisostearate 10.0■
Isopar (registered trademark) G 5.0■
Sorbitan sesquiolate 1.0 ■ Polyoxyethylene modified 3.0 organopolysiloxane ■ Purified water ■ 1.3-butylene glycol ■ Fine particle titanium oxide ■ Silicone-based cinnamic acid derivative 9) [Phase] Preservative ■ Antioxidant ■ Fragrance ” O5iMe.
45.0
5.0
10.0
2.0
適量
適量
適量
(製法)■〜■■■@を70’Cで攪拌溶解し、これに
あらかじめ70’Cに加熱した■〜■[相]を添加し、
乳化分散後冷却して目的の日焼は止め化粧下地を得た。45.0 5.0 10.0 2.0 Appropriate amount Appropriate amount Appropriate amount (manufacturing method) Stir and dissolve ■~■■■@ at 70'C, and add ■~■ [phase] heated to 70'C in advance. death,
After emulsification and dispersion, the mixture was cooled to obtain the desired sunscreen makeup base.
実施例9は実施例7と同様高い紫外線防止効果を有し、
且つ化粧持ちに優れるものであった。Example 9 has a high UV protection effect similar to Example 7,
Moreover, the makeup had excellent long-lasting properties.
[発明の効果コ
請求項1記載の皮膚外用剤はUV−B領域の波長を十分
に防御するものである。また本発明に用いるUV−B吸
収剤は、耐水性および耐油性にも優れているので、基剤
や他の配合成分を自由に選べる皮膚外用剤を提供するこ
とができると同時に、日焼上化粧料などとして炎天下な
どの過酷な条件下に放置した場合においても安定性に優
れているという利点を有する。請求項2記載の皮膚外用
剤はシリコーン系基剤を用いているので上記効果の他に
、伸びが良(、さっばり感があり、べとつかない等の極
めて優れた使用性、且つ汗や水に流れにくいという利点
(化粧持ちの良さ)をもち、さらにUV−B吸収剤を任
意量配合できるので自由に意図する紫外線防止効果を有
する皮膚外用剤を提供すると言う効果を有する。[Effects of the Invention] The external preparation for skin according to claim 1 sufficiently protects against wavelengths in the UV-B region. In addition, the UV-B absorber used in the present invention has excellent water resistance and oil resistance, so it is possible to provide a skin preparation for external use in which the base and other ingredients can be freely selected. It has the advantage of being excellent in stability even when left as a cosmetic under harsh conditions such as under the scorching sun. Since the skin external preparation according to claim 2 uses a silicone base, in addition to the above-mentioned effects, it has excellent usability such as good spreadability (light feeling, non-stickiness), and is resistant to sweat and water. It has the advantage that it does not run easily (good makeup retention), and since it can contain any amount of UV-B absorber, it has the effect of providing a skin preparation that has the desired UV protection effect.
図1は、合成例2より得られたシリコーン系桂皮酸誘導
体の10ppmの濃度(溶媒、エタノール)におけるU
Vスペクトルを示す。
図2は、合成例6より得られたシリコーン系桂皮酸誘導
体の10ppmの濃度(溶媒、エタノール)におけるU
Vスペクトルを示す。
図3は既知化合物である無置換のシリコーンのlop
p mの濃度(溶媒、エタノール)におけるUVスペク
トルを示す。
特許出願人 株式会社 資 生 堂
WAVELENGTH(nm)
WAVELENGTH(nm)
WAVELENGTH(nm)Figure 1 shows the U of the silicone-based cinnamic acid derivative obtained in Synthesis Example 2 at a concentration of 10 ppm (solvent, ethanol).
The V spectrum is shown. Figure 2 shows the U of the silicone-based cinnamic acid derivative obtained in Synthesis Example 6 at a concentration of 10 ppm (solvent, ethanol).
The V spectrum is shown. Figure 3 shows a lop of unsubstituted silicone, a known compound.
The UV spectrum at a concentration of p m (solvent, ethanol) is shown. Patent applicant Shiseido Co., Ltd. WAVELENGTH (nm) WAVELENGTH (nm) WAVELENGTH (nm)
Claims (2)
あって、前記シロキサン類中に存在しうる他の単位が、
一般式O_(_4_−_m_)_/_2SiR^3mで
表されることを特徴とするシリコーン系桂皮酸誘導体を
配合することを特徴とする皮膚外用剤。 [前記一般式においてR^1は炭素数1〜4のアルキル
基又はフェニル基又はトリメチルシロキシ基、R^2は
少なくとも2個の炭素原子を有する二価の炭化水素基(
複素原子Oを有するものを含む)、Xはアルコキシ基、
nは0〜3の整数、aは2または3の整数、R^3は炭
素数1〜4のアルキル基またはフェニル基又はトリメチ
ルシロキシ基、mは0〜3の整数を表す。](1) Siloxanes having at least one unit represented by the general formula ▲ Numerical formula, chemical formula, table, etc. ▼ (I), in which other units that may exist in the siloxane are
A skin external preparation characterized by containing a silicone-based cinnamic acid derivative represented by the general formula O_(_4_-_m_)_/_2SiR^3m. [In the above general formula, R^1 is an alkyl group having 1 to 4 carbon atoms, a phenyl group, or a trimethylsiloxy group, and R^2 is a divalent hydrocarbon group having at least 2 carbon atoms (
(including those having a hetero atom O), X is an alkoxy group,
n is an integer of 0 to 3, a is an integer of 2 or 3, R^3 is an alkyl group having 1 to 4 carbon atoms, a phenyl group, or a trimethylsiloxy group, and m is an integer of 0 to 3. ]
とを特徴とする請求項1記載の皮膚外用剤。(2) The skin external preparation according to claim 1, characterized in that a silicone base is used as the external preparation base.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63-181500 | 1988-07-22 | ||
JP18150088 | 1988-07-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02117613A true JPH02117613A (en) | 1990-05-02 |
JP2860305B2 JP2860305B2 (en) | 1999-02-24 |
Family
ID=16101846
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17480089A Expired - Lifetime JP2860305B2 (en) | 1988-07-22 | 1989-07-06 | External preparation for skin |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2860305B2 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05202071A (en) * | 1991-05-16 | 1993-08-10 | Wacker Chemie Gmbh | Organosilicon compound containing (meth)acryloxy group, its production, photocrosslinkable composition, and method for coating |
US6080880A (en) * | 1997-11-28 | 2000-06-27 | Societe L'oreal S.A. | Silicone-substituted cinnamamide/malonamide/malonate compounds and photoprotective compositions comprised thereof |
JP2006225358A (en) * | 2005-02-21 | 2006-08-31 | Shiseido Co Ltd | Siloxane ester compound, oil component for skin care preparation or hair cosmetic, and skin care preparation or hair cosmetic prepared by compounding the oil component |
KR100684367B1 (en) * | 2005-03-23 | 2007-02-20 | 주식회사 사임당화장품 | Cosmetic composition containing sunscreen polysilsesquioxane spherical particles |
WO2025069235A1 (en) * | 2023-09-27 | 2025-04-03 | 株式会社ニコン | Compound, photosensitive surface treatment agent, laminate production method, and transistor production method |
-
1989
- 1989-07-06 JP JP17480089A patent/JP2860305B2/en not_active Expired - Lifetime
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05202071A (en) * | 1991-05-16 | 1993-08-10 | Wacker Chemie Gmbh | Organosilicon compound containing (meth)acryloxy group, its production, photocrosslinkable composition, and method for coating |
US6080880A (en) * | 1997-11-28 | 2000-06-27 | Societe L'oreal S.A. | Silicone-substituted cinnamamide/malonamide/malonate compounds and photoprotective compositions comprised thereof |
JP2006225358A (en) * | 2005-02-21 | 2006-08-31 | Shiseido Co Ltd | Siloxane ester compound, oil component for skin care preparation or hair cosmetic, and skin care preparation or hair cosmetic prepared by compounding the oil component |
KR100684367B1 (en) * | 2005-03-23 | 2007-02-20 | 주식회사 사임당화장품 | Cosmetic composition containing sunscreen polysilsesquioxane spherical particles |
WO2025069235A1 (en) * | 2023-09-27 | 2025-04-03 | 株式会社ニコン | Compound, photosensitive surface treatment agent, laminate production method, and transistor production method |
Also Published As
Publication number | Publication date |
---|---|
JP2860305B2 (en) | 1999-02-24 |
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