JPH02116007A - thin film magnetic head - Google Patents
thin film magnetic headInfo
- Publication number
- JPH02116007A JPH02116007A JP26850588A JP26850588A JPH02116007A JP H02116007 A JPH02116007 A JP H02116007A JP 26850588 A JP26850588 A JP 26850588A JP 26850588 A JP26850588 A JP 26850588A JP H02116007 A JPH02116007 A JP H02116007A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- magnetic
- magnetic head
- substrate
- head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title claims description 21
- 239000000758 substrate Substances 0.000 claims description 21
- 239000010408 film Substances 0.000 description 9
- 230000004907 flux Effects 0.000 description 8
- 238000007747 plating Methods 0.000 description 6
- 239000010410 layer Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 3
- 238000003486 chemical etching Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3103—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3176—Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps
- G11B5/3179—Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps the films being mainly disposed in parallel planes
- G11B5/3183—Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps the films being mainly disposed in parallel planes intersecting the gap plane, e.g. "horizontal head structure"
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は、磁気記録用の薄膜磁気ヘッドの製造方法に関
する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing a thin film magnetic head for magnetic recording.
〔従来の技術］
従来の技術としては、第２図に示すような平面形状の薄
膜ヘッドが知られていた。[Prior Art] As a conventional technology, a planar thin film head as shown in FIG. 2 has been known.
第２図は、従来の平面形状の薄膜ヘッドの縦断面を示す
図であり、第２図におしλて非磁性基板１上に下磁極２
を形成し、次に下絶縁層５を形成する。その後コイル４
をスパッタ、メツキ等により形成し、その上に上絶縁層
３を形成してゆき、次いで上磁極６を形成した後、保護
層７により全面をカバーしたものであり、ギャップ８よ
り非磁性基板ｌ側へ磁束９を漏らし磁気記録媒体へ書き
込みする構造となっている。FIG. 2 is a diagram showing a longitudinal section of a conventional planar thin film head. In FIG.
, and then a lower insulating layer 5 is formed. Then coil 4
is formed by sputtering, plating, etc., an upper insulating layer 3 is formed thereon, an upper magnetic pole 6 is formed, and the entire surface is covered with a protective layer 7. It has a structure in which magnetic flux 9 leaks to the side and writes onto the magnetic recording medium.
［発明が解決しようとする課題］
しかし、かかる従来の技術の薄膜ヘッドは、非磁性基板
１を介して磁束９を漏らすために非磁性基板１の厚み分
、磁束９がロスしてしまい、コイル４のターン数を多く
したり、流す電流値を大きくする必要がある。しかし、
限られたサイズに収めるには限度があり、発熱等の問題
も発生する。[Problems to be Solved by the Invention] However, in the conventional thin film head, since the magnetic flux 9 leaks through the non-magnetic substrate 1, the magnetic flux 9 is lost by the thickness of the non-magnetic substrate 1, and the coil It is necessary to increase the number of turns of 4 or to increase the value of current flowing. but,
There is a limit to how much it can fit within a limited size, and problems such as heat generation also occur.
又、非磁性基板１の厚みを薄くして磁束９を有効に活用
しても良ｌが逆に各素子の薄膜形成が困難になるという
問題点を有していた。Further, even if the thickness of the non-magnetic substrate 1 is reduced to make effective use of the magnetic flux 9, there is a problem in that it becomes difficult to form thin films for each element.
そこで、本発明は従来のこのような問題点を解決するた
め、ギャップより漏れた磁束をロスすることなく効率よ
く利用できる薄膜磁気ヘッドを提供することを目的とし
ている。SUMMARY OF THE INVENTION In order to solve these conventional problems, it is an object of the present invention to provide a thin film magnetic head that can efficiently utilize the magnetic flux leaking from the gap without loss.
［牌題を解決するための手段］
上記課題を解決するため、本発明の薄膜ヘッドは非磁性
基板上に形成される平面形状の薄膜ヘッドにおいて、前
記非磁性基板のギャップ部周辺箇所を孔明し、磁極のギ
ャップ部を前記孔明部に形成したことを特徴とする。[Means for Solving the Problem] In order to solve the above problem, the thin film head of the present invention is a planar thin film head formed on a non-magnetic substrate, in which holes are formed around the gap portion of the non-magnetic substrate. , characterized in that a gap portion of the magnetic pole is formed in the perforated portion.
［実施例］
以下に本発明の実施例を図面にもとづいて説明する。第
１図（ｂ）において、厚み２５μｍのポリイミドから成
る非磁性基板１の、ギャップ部に位置する部分に、エキ
シマレーザ−１１により孔明する。この時エキシマレー
ザ−１１を非磁性基板１へ孔明部を中心に左右へビーム
１２を振りながら巾２０μｍと下部が狭く上部が中４０
μｍと広いテーパー状の孔明１０を形成する。[Examples] Examples of the present invention will be described below based on the drawings. In FIG. 1(b), an excimer laser 11 is used to make a hole in a portion of a nonmagnetic substrate 1 made of polyimide having a thickness of 25 μm, located at a gap portion. At this time, the excimer laser 11 is applied to the non-magnetic substrate 1 while swinging the beam 12 to the left and right around the perforated part.
A tapered pore 10 as wide as μm is formed.
その後、第１図（Ｃ）のごとく、非磁性基板１の表面へ
Ｃｕスパッタにより厚み０．２μｍの導電化膜の形成を
行ない、フォトレジスト方法を用いて所定の形状にパタ
ーニングし、メツキにより厚み５μｍの磁性材料からな
る下磁極２の形成を孔明１０の部分より行なう、不要と
なった部分のＣｕスパッタにより形成された導電化膜を
Ｃｕのエツチング液（例えば過硫酸アンモニウム溶液）
により除去する。以下、同様の薄膜形成の方法により順
次、各素子の形成を行なっていく、第１図（ｄ）に示す
ように、フォトレジストにより、厚み３μｍの下絶縁層
５を形成し、次いで、第１図（ｅ）のように、Ｃｕメツ
キによる厚み５μｍのコイル４、第１図（ｆ）に示すよ
うに、フォトレジストによる厚み３μｍの上絶縁層３、
最後に、第１図（ａ）に示すように、磁性材のメツキに
よる厚み５μｍの上磁極６を孔明１０の部分より形成す
ると、本発明の、薄膜磁気ヘッドが得られるこの時、ギ
ャップ８が非磁性基板１の底面と同一面に形成されてい
るために、磁束９が非磁性基板１の厚みに影響されるこ
となく１００％有効に活用することができる。Thereafter, as shown in FIG. 1(C), a conductive film with a thickness of 0.2 μm is formed on the surface of the nonmagnetic substrate 1 by Cu sputtering, patterned into a predetermined shape using a photoresist method, and thickened by plating. The lower magnetic pole 2 made of a magnetic material with a thickness of 5 μm is formed from the hole 10. The conductive film formed by Cu sputtering on the unnecessary part is etched with a Cu etching solution (for example, ammonium persulfate solution).
Remove by. Thereafter, each element is sequentially formed using the same thin film forming method. As shown in FIG. As shown in FIG. 1(e), a coil 4 with a thickness of 5 μm made of Cu plating, as shown in FIG. 1(f), an upper insulating layer 3 with a thickness of 3 μm made of photoresist,
Finally, as shown in FIG. 1(a), an upper magnetic pole 6 having a thickness of 5 μm is formed by plating a magnetic material from the hole 10, thereby obtaining the thin film magnetic head of the present invention. Since it is formed on the same surface as the bottom surface of the non-magnetic substrate 1, the magnetic flux 9 can be used 100% effectively without being affected by the thickness of the non-magnetic substrate 1.
第３図は、非磁性基板１へ化学エツチングにより孔明１
０を形成する場合の実施例であり、第３図（ｂ）におい
て、ポリイミドから成る非磁性基板１のギャップ部に位
置する部分にフォトレジストにより絶縁膜３１を形成し
、ｌ０Ｎ−Ｎａ’ＯＨ溶液にて第３図（Ｃ）のように非
磁性基板１の半分の厚みまでエツチングを行ない、巾４
０μｍの孔明３０を形成する、次に絶縁膜３１を除去し
てから、第３図（ｄ）に示すように孔明３０の部分にフ
ォトレジストにより絶縁膜３２を形成する。FIG. 3 shows holes 1 made by chemical etching on a non-magnetic substrate 1.
3(b), an insulating film 31 is formed by photoresist on a portion of the non-magnetic substrate 1 made of polyimide located at the gap, and a 10N-Na'OH solution is formed. As shown in FIG. 3(C), etching is performed to half the thickness of the non-magnetic substrate 1, and the width is 4.
A hole 30 of 0 μm is formed, then the insulating film 31 is removed, and an insulating film 32 is formed on the hole 30 using photoresist, as shown in FIG. 3(d).
その後、第３図（ｅ）のように、ｌ０Ｎ−Ｎａｐ。After that, as shown in FIG. 3(e), 10N-Nap.
Ｈ溶液にて非磁性基板１の残りの半分をエツチングし、
中２０μｍの孔明４０を形成する。絶縁膜３２を除去す
ると、第３図（ｆ）のごとく段差形状に孔明３０・４０
が形成された非磁性基板１が得られる。この後、前記、
第１図と同様に各素子を順番に形成してゆくと、第３図
（ａ）に示すような薄膜ヘッドが得られる。このように
化学エツチングにより非磁性基板１へ孔明しても第１図
の薄膜磁気ヘッドと同様な効果が得られる。又、化学エ
ツチングによる形成方法は、高価なレーザー装置を使用
しなくて良いメリットもある。Etching the remaining half of the nonmagnetic substrate 1 with H solution,
A hole 40 with a medium diameter of 20 μm is formed. When the insulating film 32 is removed, holes 30 and 40 are formed in a stepped shape as shown in FIG. 3(f).
A nonmagnetic substrate 1 on which is formed is obtained. After this, the above,
By sequentially forming each element in the same manner as in FIG. 1, a thin film head as shown in FIG. 3(a) is obtained. Even if the nonmagnetic substrate 1 is made by chemical etching in this manner, the same effect as the thin film magnetic head shown in FIG. 1 can be obtained. Furthermore, the formation method using chemical etching has the advantage of not requiring the use of expensive laser equipment.
第４図は、本発明の他の実施例を示すものであり、第４
図（ｂ）においてポリイミドから成る非磁性基板１のギ
ャップ部に位置する部分にプレス加工により巾２０μｍ
の孔明５０を形成し、次いで、以下前記第１図と同様に
各素子を順次形成していくと第４図（ａ）に示すような
薄膜ヘッドが得られる０本実施例においても第１図の薄
膜磁気ヘッドと同様な効果が得られる。FIG. 4 shows another embodiment of the present invention.
In Figure (b), the part located in the gap of the non-magnetic substrate 1 made of polyimide is pressed to a width of 20 μm.
4(a) is obtained by forming the perforations 50 and then sequentially forming each element in the same manner as in FIG. 1. The same effect as the thin film magnetic head can be obtained.
又、下磁極、コイル、及び上磁極をメツキ等で形成する
ための導電化膜を施す時、スパッタや蒸着の他にスルホ
ールメツキ等の無電解メツキにより形成しても何ら問題
はない。Furthermore, when applying a conductive film for forming the lower magnetic pole, coil, and upper magnetic pole by plating or the like, there is no problem in forming it by electroless plating such as through-hole plating in addition to sputtering or vapor deposition.
［発明の効果］
本発明の薄膜磁気ヘッドは、以上説明したように非磁性
基板のギャップ部周辺箇所を孔明し、磁極のギャップ部
を前記孔明部に形成するという簡単な構造により磁極の
ギャップより漏れる磁束を１００％効率よく磁気記録媒
体への書き込みに利用することが可能となる。[Effects of the Invention] As explained above, the thin film magnetic head of the present invention has a simple structure in which holes are formed around the gap portion of the nonmagnetic substrate, and the gap portion of the magnetic pole is formed in the hole portion. It becomes possible to use the leaking magnetic flux for writing to a magnetic recording medium with 100% efficiency.
又、磁気記録媒体への書き込み効率が向上することによ
りコイルへ渣す電流値も小さくすることが可能となりコ
イルの抵抗による発熱を押さえる効果がある。Furthermore, by improving the writing efficiency on the magnetic recording medium, it is possible to reduce the current value flowing to the coil, which has the effect of suppressing heat generation due to the resistance of the coil.
第１図は、本発明の薄膜磁気ヘッドの縦断面図第１図（
ａ）〜（ｆ）は、本発明の、薄膜磁気ヘッドの製造工程
を示す縦断面図。
第２図は、従来の薄膜磁気ヘッドの縦断面図。
第３図及び第４図は、本発明の薄膜磁気ヘッドの、他の
実施例を示す縦断面図。
第３図（ａ） 〜（ｆ）及び第４図（ａ）、（ｂ）をよ
、本発明の薄膜磁気ヘッドの、他の実施例の製造工程を
示す縦断面図。
・・磁束
・・孔明
・孔明
・絶縁膜
・・絶縁膜
・・孔明
・孔明
以上
出願人 セイコーエプソン株式会社
代理人 弁理士 鈴木 喜三部（他１名）・非磁性基板
・下磁極
・上絶縁層
・コイル
・下絶縁層
・上磁極
・ギャップ
第１図（ａ）
第１図（ｂ）
第２図
第３図（ｆ）
第４図（ｂ）FIG. 1 is a longitudinal cross-sectional view of the thin film magnetic head of the present invention.
a) to (f) are longitudinal cross-sectional views showing the manufacturing process of the thin film magnetic head of the present invention. FIG. 2 is a longitudinal sectional view of a conventional thin film magnetic head. 3 and 4 are longitudinal sectional views showing other embodiments of the thin film magnetic head of the present invention. FIGS. 3(a) to 3(f) and FIGS. 4(a) and 4(b) are longitudinal sectional views showing the manufacturing process of another embodiment of the thin film magnetic head of the present invention. ... Magnetic flux ... Komei Komei Insulating film ... Insulating film Komei Komei and above Applicant Seiko Epson Corporation Representative Patent attorney Kizobe Suzuki (1 other person) Non-magnetic substrate Lower magnetic pole Top insulation Layer, coil, lower insulating layer, upper magnetic pole, gap Figure 1 (a) Figure 1 (b) Figure 2 Figure 3 (f) Figure 4 (b)
Claims (1)
て、前記非磁性基板のギャップ部周辺箇所を孔明し、磁
極のギャップ部を前記孔明部に形成したことを特徴とす
る薄膜磁気ヘッド。1. A planar thin film head formed on a non-magnetic substrate, characterized in that the non-magnetic substrate has a hole in the vicinity of the gap, and a gap portion of a magnetic pole is formed in the hole.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26850588A JPH02116007A (en) | 1988-10-25 | 1988-10-25 | thin film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26850588A JPH02116007A (en) | 1988-10-25 | 1988-10-25 | thin film magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02116007A true JPH02116007A (en) | 1990-04-27 |
Family
ID=17459435
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26850588A Pending JPH02116007A (en) | 1988-10-25 | 1988-10-25 | thin film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02116007A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1143419A2 (en) * | 2000-03-30 | 2001-10-10 | Kabushiki Kaisha Toshiba | Magnetic head, method for producing same, and magnetic recording and/or reproducing system |
-
1988
- 1988-10-25 JP JP26850588A patent/JPH02116007A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1143419A2 (en) * | 2000-03-30 | 2001-10-10 | Kabushiki Kaisha Toshiba | Magnetic head, method for producing same, and magnetic recording and/or reproducing system |
| EP1143419A3 (en) * | 2000-03-30 | 2004-05-06 | Kabushiki Kaisha Toshiba | Magnetic head, method for producing same, and magnetic recording and/or reproducing system |
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