JPH0156072B2 - - Google Patents
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- Publication number
- JPH0156072B2 JPH0156072B2 JP55040404A JP4040480A JPH0156072B2 JP H0156072 B2 JPH0156072 B2 JP H0156072B2 JP 55040404 A JP55040404 A JP 55040404A JP 4040480 A JP4040480 A JP 4040480A JP H0156072 B2 JPH0156072 B2 JP H0156072B2
- Authority
- JP
- Japan
- Prior art keywords
- formula
- reaction
- group
- water
- cefamycin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Landscapes
- Cephalosporin Compounds (AREA)
Description
【発明の詳細な説明】
本発明は、3―メチレンセフアマイシン誘導体
の新規な製造法に関し、さらに詳しくは、PH7〜
9の反応溶媒中でラネーニツケルを用いる3―メ
チレンセフアマイシン誘導体の製造法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a novel method for producing 3-methylene cefamycin derivatives, more specifically,
This invention relates to a method for producing 3-methylene cefamycin derivatives using Raney nickel in the reaction solvent of No. 9.
従来、セフアロスポリン系化合物の3位の置換
メルカプトメチル基を還元し、3―エキソメチレ
ン誘導体に変換する方法に関しては、例えば特開
昭47−20188号に開示されている。 Conventionally, a method for reducing a substituted mercaptomethyl group at the 3-position of a cephalosporin compound to convert it into a 3-exomethylene derivative is disclosed, for example, in JP-A-47-20188.
しかしながら、7―メトキシセフアロスポリン
であるセフアマイシン系化合物に関する例は見あ
たらない。記載されている唯一の例として特開昭
49−41394号があるが、ここでは被還元基である
3位の置換基がアセトキシ及びカルバモイルオキ
シ基であり、また使用する還元剤も化学還元試薬
にに限定されている。 However, no example has been found regarding a cefamycin compound, which is 7-methoxycephalosporin. The only example listed is JP-A-Sho.
No. 49-41394, in which the substituent at the 3-position, which is the group to be reduced, is an acetoxy or carbamoyloxy group, and the reducing agent used is also limited to chemical reducing reagents.
一般に7位にメトキシ基を有するセフアマイシ
ン系化合物の3位の置換メチル基の反応性は、非
メトキシ体であるセフアロスポリン系化合物の場
合に比べて著しく劣るので、セフアロスポリン系
化合物で進行する反応がそのままセフアマイシン
系化合物に適用し得るか否かを類推することは容
易ではない。 In general, the reactivity of the substituted methyl group at the 3-position of cefamycin-based compounds that have a methoxy group at the 7-position is significantly inferior to that of non-methoxy cephalosporin-based compounds, so the reaction that proceeds with cephalosporin-based compounds is directly followed by cefamycin. It is not easy to infer whether or not it can be applied to other types of compounds.
本発明は、既に本発明者等が特公昭53−41233
号で開示した放線菌ストレプトミセス・チヤート
リウシスSF―1623株の培養液から単離された3
位にスルホチオメチル基を有する新規セフアマイ
シン抗生物質である次式(1):
式中、Rは水素又はアミノ基の保護基を表わ
す。 The present invention has already been developed by the inventors in Japanese Patent Publication No. 53-41233.
3 isolated from the culture solution of the actinomycete Streptomyces chayatriusis SF-1623 disclosed in the issue.
A new cefamycin antibiotic having a sulfothiomethyl group at the following formula (1): In the formula, R represents hydrogen or a protecting group for an amino group.
で示されるSF―1623物質又はそのN―保護体を
出発原料とし、これをPH7〜9の溶媒中で、ラネ
ーニツケルを用いて還元し、次式(2):
式中、Rは式(1)と同一の意味を有する。The SF-1623 substance shown by or its N-protected form is used as a starting material, and this is reduced using Raney nickel in a solvent with a pH of 7 to 9 to obtain the following formula (2): In the formula, R has the same meaning as in formula (1).
で示される3―メチレンセフアマイシン誘導体の
新規な製造法を提供することを目的とする。The purpose of the present invention is to provide a novel method for producing a 3-methylene cefamycin derivative represented by the following formula.
3―エキソメチレン化合物は種々の有用な3位
置換メチル∧
∨誘導体の重要な合成中間体でありい
くつかの製造法が知られているが、そのうち本発
明に適用する方法でもある置換メルカプトメチル
基の還元によるエキソメチレン体の合成に於ては
3―メチル体の副成を随伴し、これが本法の欠点
となつている(R.R.Chauvette等、J.org.chem.
vol.38,pp2994,1973年)。 3-Exomethylene compounds are important synthetic intermediates for various useful 3-substituted methyl ∧ ∨ derivatives, and several production methods are known. In the synthesis of the exomethylene form by reduction of , a 3-methyl form is produced as a by-product, which is a drawback of this method (RRChauvette et al., J.org.chem.
vol.38, pp2994, 1973).
本発明者等はこれらの点をも考慮し、SF―
1623物質及びそのN―保護体に関し、3位―エキ
ソメチレン体を得ることを目的として、ラネーニ
ツケルを用いる還元反応を種々検討した結果、好
収量で目的化合物を得ることに成功し本発明を完
成するに到つた。 The inventors took these points into consideration and developed SF-
Regarding the 1623 substance and its N-protected form, we investigated various reduction reactions using Raney nickel for the purpose of obtaining the 3-exomethylene form, and as a result, we succeeded in obtaining the target compound in good yield and completed the present invention. I reached it.
本発明に於ては、式(1)の化合物を出発原料とす
るが、式(1)の化合物のN―保護基としては還元反
応に耐えられるものであることが必要で、例えば
ベンゾイル基、p―ニトロベンゾイル基、t―ブ
トキシカルボニル基あるいはアセチル基などがあ
げられる。 In the present invention, the compound of formula (1) is used as a starting material, but the N-protecting group of the compound of formula (1) must be resistant to reduction reactions, such as benzoyl group, Examples include p-nitrobenzoyl group, t-butoxycarbonyl group, and acetyl group.
これらの保護基は、本発明の還元反応を行う上
で必須のものではなく、反応後得られる3―エキ
ソメチレン体の精製を容易ならしめるために導入
される。 These protecting groups are not essential for carrying out the reduction reaction of the present invention, but are introduced to facilitate the purification of the 3-exomethylene compound obtained after the reaction.
また、得られるN―保護基―3―エキソメチレ
ン体は有機溶媒に転溶することができるため、未
反応物及びその他の不純物との分離が容易である
という利点を有する。 Furthermore, since the obtained N-protecting group-3-exomethylene compound can be dissolved in an organic solvent, it has the advantage that it can be easily separated from unreacted substances and other impurities.
式(1)の化合物の3位―スルホチオメチル基は、
亜鉛等の化学還元剤で処理するとチオラクトンを
生成する。本発明における還元反応は水素雰囲気
中、ラネーニツケルの存在下で行なわれる。 The 3-sulfothiomethyl group of the compound of formula (1) is
When treated with chemical reducing agents such as zinc, it produces thiolactone. The reduction reaction in the present invention is carried out in a hydrogen atmosphere in the presence of Raney nickel.
反応溶媒としては水又はメタノール、エタノー
ル、ジオキサン、テトラヒドロフラン、N,N―
ジメチルホルムアミド等の有機溶媒又はこれらの
混合溶媒あるいはこれらの含水溶媒が用いられ
る。 As a reaction solvent, water or methanol, ethanol, dioxane, tetrahydrofuran, N,N-
An organic solvent such as dimethylformamide, a mixed solvent thereof, or a water-containing solvent thereof is used.
本発明の反応において水素圧は1〜5気圧、反
応温度は10〜60℃、反応時間は反応温度によつて
異なるが、一般に2〜10時間である。 In the reaction of the present invention, the hydrogen pressure is 1 to 5 atm, the reaction temperature is 10 to 60°C, and the reaction time is generally 2 to 10 hours, although it varies depending on the reaction temperature.
本発明において、反応溶液のPHは7〜9の範囲
内に設定される。上記条件下、PH9.5以上の反応
溶液中で還元反応を行なうと、目的化合物である
式(2)のエキソメチレン体のほかに3―メチル体の
副成が無視し得ず、その生成比が30%を越える場
合がある。酸性側では、ラネーニツケルは有効に
作用しない。PH7〜9の範囲にある反応溶液中に
あつては、3―メチル体の副成は最小限に抑制さ
れ、その生成比も5%以下となる。 In the present invention, the pH of the reaction solution is set within the range of 7 to 9. When the reduction reaction is carried out in a reaction solution with a pH of 9.5 or higher under the above conditions, in addition to the target compound, the exomethylene form of formula (2), the by-product of the 3-methyl form cannot be ignored, and the production ratio is may exceed 30%. Raneynickel does not work effectively on the acidic side. When the reaction solution has a pH in the range of 7 to 9, the by-formation of the 3-methyl compound is suppressed to a minimum, and its production ratio is 5% or less.
従つて、ラネーニツケルを使用するにあたつて
は、水洗を充分に行ない過剰のアルカリを除去し
てから使用することが肝要である。 Therefore, when using Raney nickel, it is important to thoroughly wash it with water to remove excess alkali before use.
反応生成物の精製は、合成吸着レジン、ダイア
イオンHP―20、セフアデツクスLH―20等のカ
ラムクロマトグラフイー又は酢酸エチル等による
有機溶媒抽出法により容易に行なうことができ
る。 The reaction product can be easily purified by synthetic adsorption resin, column chromatography using Diaion HP-20, Cephadex LH-20, or the like, or organic solvent extraction using ethyl acetate or the like.
以下に、実施例に基づいて本発明をさらに詳し
く説明する。 The present invention will be explained in more detail below based on examples.
〔実施例 1〕
7β―(D―5―アミノ―5―カルボキシバレ
ルアミド)―7α―メトキシ―3―スルホチオメ
チル―3―セフエム―4―カルボン酸(SF―
1623物質)のナトリウム塩14gを水100ml及びジ
オキサン50mlの混合溶媒に溶解し、苛性ソーダに
てPH8.5とし、温度10〜20℃で撹拌しながらt―
ブトキシカルボン酸無水物11gのジオキサン溶液
50mlを2時間にわたり滴下した。この間、反応液
のPHは8〜9に維持した。さらに4時間室温にて
撹拌後、反応液のPHを6.5とし、約80mlまで濃縮
した。得られた濃縮液を酢酸エチル100mlを用い
て洗浄し、水層をさらに50mlまで減圧下で濃縮し
た後、ダイアイオンHP―20のカラム(IL)にか
け水で展開して、15mlずつのフラクシヨン(画
分)を分取した。フラクシヨンNo.80〜125を集め
減圧下で濃縮し、次いで凍結乾燥して、7β―
(D―5―t―ブトキシカルボニルアミノ―5―
カルボキシバレルアミド)―7α―メトキシ―3
―スルホチオメチル―3―セフエム―4―カルボ
ン酸のナトリウム塩12.5gを得た。次いでこの
2.0gを50%エタノール水溶液100mlに溶解し、こ
れに蒸溜水で充分水洗したラネーニツケル10gを
添加した。反応液はPH8.7であつた。[Example 1] 7β-(D-5-amino-5-carboxyvaleramide)-7α-methoxy-3-sulfothiomethyl-3-cephem-4-carboxylic acid (SF-
14g of sodium salt of 1623 substance) was dissolved in a mixed solvent of 100ml of water and 50ml of dioxane, adjusted to pH 8.5 with caustic soda, and stirred at a temperature of 10 to 20°C.
Dioxane solution of 11g of butoxycarboxylic anhydride
50ml was added dropwise over 2 hours. During this time, the pH of the reaction solution was maintained at 8 to 9. After further stirring at room temperature for 4 hours, the pH of the reaction solution was adjusted to 6.5 and concentrated to about 80 ml. The resulting concentrated solution was washed with 100 ml of ethyl acetate, and the aqueous layer was further concentrated to 50 ml under reduced pressure, then applied to a Diaion HP-20 column (IL), developed with water, and fractionated in 15 ml portions ( fraction) was collected. Fractions No. 80 to 125 were collected and concentrated under reduced pressure, then freeze-dried to obtain 7β-
(D-5-t-butoxycarbonylamino-5-
carboxyvaleramide)-7α-methoxy-3
12.5 g of sodium salt of -sulfothiomethyl-3-cephem-4-carboxylic acid was obtained. Then this
2.0 g was dissolved in 100 ml of 50% ethanol aqueous solution, and 10 g of Raney nickel thoroughly washed with distilled water was added thereto. The reaction solution had a pH of 8.7.
水素ガス雰囲気中、室温にて5時間水添した
後、得られた反応液を過し、触媒は水100mlで
洗浄した。液及び触媒の洗液を合わせ、これに
1N塩酸を加えて全体をPH6とした後、エタノー
ルを留去した。次いで1N塩酸でPH2とした後、
酢酸エチル200mlで抽出した。 After hydrogenation for 5 hours at room temperature in a hydrogen gas atmosphere, the resulting reaction solution was filtered and the catalyst was washed with 100 ml of water. Combine the liquid and catalyst washing liquid and add
After adjusting the pH of the whole to 6 by adding 1N hydrochloric acid, ethanol was distilled off. Then, after adjusting the pH to 2 with 1N hydrochloric acid,
Extracted with 200ml of ethyl acetate.
抽出液を無水硫酸マグネシウムで乾燥した後、
濃縮乾固したところ淡黄色粉末1.3gが得られた。
このものを酢酸エチル5mlに溶解し、セフアデツ
クスLH―20 500mlを充填したカラムにかけ、酢
酸エチル―メタノール(25:3)の混合溶媒にて
展開し15mlずつのフラクシヨンを分取した。フラ
クシヨンNo.32〜44を集め、これを濃縮乾固して
7β―(D―5―t―ブトキシカルボニルアミノ
―5―カルボキシバレルアミド)―7α―メトキ
シ―3―メチレン―3―セフエム―4―カルボン
酸の白色粉末1.1gを得た。 After drying the extract with anhydrous magnesium sulfate,
When concentrated to dryness, 1.3 g of pale yellow powder was obtained.
This product was dissolved in 5 ml of ethyl acetate, applied to a column packed with 500 ml of Sephadex LH-20, developed with a mixed solvent of ethyl acetate and methanol (25:3), and fractions of 15 ml each were collected. Collect fractions No. 32 to 44 and concentrate to dryness.
1.1 g of white powder of 7β-(D-5-t-butoxycarbonylamino-5-carboxyvaleramide)-7α-methoxy-3-methylene-3-cephem-4-carboxylic acid was obtained.
シルカゲル薄層クロマトグラフイー(n―ブタ
ノール:酢酸:水:酢酸ブチル=2:1:1:
1):Rf=0.60
〔実施例 2〕
7β―(D―5―ベンゾイルアミノ―5―カル
ボキシバレルアミド)―7α―メトキシ―3―ス
ルホチオメチル―3―セフエム―4―カルボン酸
ナトリウム塩1.0gを水70mlに溶解し、、充分水洗
したラネーニツケル6gを添加し、2気圧の水素
ガス雰囲気中、室温にて4時間水素添加した。 Silica gel thin layer chromatography (n-butanol:acetic acid:water:butyl acetate=2:1:1:
1): Rf=0.60 [Example 2] 7β-(D-5-benzoylamino-5-carboxyvaleramide)-7α-methoxy-3-sulfothiomethyl-3-cephem-4-carboxylic acid sodium salt 1.0 g was dissolved in 70 ml of water, 6 g of Raney nickel thoroughly washed with water was added, and hydrogenation was carried out at room temperature in a hydrogen gas atmosphere of 2 atm for 4 hours.
反応液を過し、水50mlで洗浄した後、実施例
1と同様に液及び洗液を合わせ、1N塩酸でPH
2とし酢酸エチル150mlで抽出した。抽出液を無
水硫酸マグネシウムで脱水後濃縮乾固したとこ
ろ、淡黄色粉末0.6gが得られた。このものをメ
タノール2mlに溶解し、セフアデツクスLH―20
200mlのカラムにかけメタノールで展開し7mlず
つのフラクシヨンを分取した。フラクシヨンNo.28
〜37を集め濃縮乾固して、7β―(D―5―ベン
ゾイルアミノ―5―カルボキシバレルアミド)―
7α―メトキシ―3―メチレン―3―セフエム―
4―カルボン酸の白色粉末0.45gを得た。 After filtering the reaction solution and washing with 50 ml of water, the solution and washing solution were combined in the same manner as in Example 1, and the pH was adjusted with 1N hydrochloric acid.
2 and extracted with 150 ml of ethyl acetate. The extract was dehydrated with anhydrous magnesium sulfate and then concentrated to dryness to obtain 0.6 g of pale yellow powder. Dissolve this in 2 ml of methanol and use Sephadex LH-20.
The mixture was applied to a 200 ml column and developed with methanol, and 7 ml fractions were collected. Fraction No.28
~37 was collected and concentrated to dryness to obtain 7β-(D-5-benzoylamino-5-carboxyvaleramide)-
7α-methoxy-3-methylene-3-cephem-
0.45 g of white powder of 4-carboxylic acid was obtained.
シリカゲル薄層クロマトグラフイー(n―ブタ
ノール:酢酸:水=2:1:1):Rf=0.65。 Silica gel thin layer chromatography (n-butanol:acetic acid:water=2:1:1): Rf=0.65.
Claims (1)
PH7〜9の反応溶媒中でラネーニツケルを用いて
還元することを特徴とする 式: 式中、Rは前記と同一の意味を有する。 で示される3―メチレンセフアマイシン誘導体の
製造法。[Claims] 1 Formula: In the formula, R represents hydrogen or a protecting group for an amino group. SF-1623 substance shown in or its N-protected form
Characterized by reduction using Raney nickel in a reaction solvent with a pH of 7 to 9. Formula: In the formula, R has the same meaning as above. A method for producing a 3-methylene cefamycin derivative shown in
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4040480A JPS56156286A (en) | 1980-03-31 | 1980-03-31 | Production of desulfurized product of sf-1623 substance |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4040480A JPS56156286A (en) | 1980-03-31 | 1980-03-31 | Production of desulfurized product of sf-1623 substance |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56156286A JPS56156286A (en) | 1981-12-02 |
JPH0156072B2 true JPH0156072B2 (en) | 1989-11-28 |
Family
ID=12579720
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4040480A Granted JPS56156286A (en) | 1980-03-31 | 1980-03-31 | Production of desulfurized product of sf-1623 substance |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56156286A (en) |
-
1980
- 1980-03-31 JP JP4040480A patent/JPS56156286A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS56156286A (en) | 1981-12-02 |
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