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JPH01295702A - Ceramics-coated cutting tool - Google Patents

Ceramics-coated cutting tool

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Publication number
JPH01295702A
JPH01295702A JP12197788A JP12197788A JPH01295702A JP H01295702 A JPH01295702 A JP H01295702A JP 12197788 A JP12197788 A JP 12197788A JP 12197788 A JP12197788 A JP 12197788A JP H01295702 A JPH01295702 A JP H01295702A
Authority
JP
Japan
Prior art keywords
layers
layer
tool
amorphous
coated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12197788A
Other languages
Japanese (ja)
Inventor
Saburo Otani
大谷 三郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Nippon Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Corp filed Critical Nippon Steel Corp
Priority to JP12197788A priority Critical patent/JPH01295702A/en
Publication of JPH01295702A publication Critical patent/JPH01295702A/en
Pending legal-status Critical Current

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  • Chemical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔産業上の利用分野] 本発明は、結晶層とアモルファス層を交互に合Mf”層
以上からなる。セラミックス層を含む皮膜を被覆した耐
摩耗性および強度の優わた切削工具に関するものである
[Detailed Description of the Invention] [Industrial Application Field] The present invention consists of Mf'' layers or more made by alternately combining crystalline layers and amorphous layers. This relates to cutting tools.

[従来の技術] 超硬、サーメットおよびセラミックス母材からなる切削
工具に、硬質セラミックス膜を被覆することによって耐
摩耗性を改善することが一射に行われている。中でも化
学的に安定で高温硬さの高いアルミナや窒化珪素膜か母
材C直接あるいはチタンの窒化物や炭化物皮膜の上に被
覆されて使用されることが多い。これらの皮膜は母材と
の密着性および被覆能率の点から多くの場合、900℃
以上で被覆処理され、熱CVO法(化学蒸着法)により
被覆される。
[Prior Art] Cutting tools made of carbide, cermet, and ceramic base materials are coated with hard ceramic films to improve their wear resistance. Among these, alumina or silicon nitride films, which are chemically stable and have high high-temperature hardness, are often used directly on the base material C or coated on titanium nitride or carbide films. These films are often heated to 900°C from the viewpoint of adhesion to the base material and coating efficiency.
The coating treatment is performed as described above, and coating is performed by a thermal CVO method (chemical vapor deposition method).

CVD被覆されたアルミナ、窒化珪素あるいはこれらの
複合組成の結晶膜は、硬さが高く耐摩耗性に優わている
反面、柱状結晶になりやすい。この柱状結晶は母材面に
垂直に近い角度で結晶粒が成長したもので、切削中に引
張り応力が生じる場合には、粒界にそって容易に亀裂が
進展し、その亀裂が応力集中源となり、比較的イルい応
力で工Itが欠損するに至る。即ち、耐摩耗性を得るた
めに−1−記組成のセラミックス膜を被覆することによ
って工具自身の強度が低下する。
A CVD-coated crystal film of alumina, silicon nitride, or a composite composition thereof has high hardness and excellent wear resistance, but tends to form columnar crystals. These columnar crystals are crystal grains that grow at an angle close to perpendicular to the base material surface, and when tensile stress is generated during cutting, cracks easily grow along the grain boundaries, and the cracks become a source of stress concentration. As a result, a relatively high stress leads to the loss of the force. That is, by coating the tool with a ceramic film having the composition -1- in order to obtain wear resistance, the strength of the tool itself is reduced.

この傾向はこの皮膜層の厚さが厚くなるほど急速に増大
する。このため、CvD被覆工具は皮膜の厚さを数μm
以下とし、かつ繰り返し衝撃荷重を受けない連続切削用
に使用が制限されている。
This tendency increases rapidly as the thickness of this coating layer increases. For this reason, CvD coated tools have a coating thickness of several μm.
The use is limited to the following and for continuous cutting that is not subjected to repeated impact loads.

この柱状結晶化を避けるには処理温度を下げることが有
効であるが、処理温度を下げるとアモルファス状の皮膜
となりやすく、皮膜硬さが低下し耐摩耗性が低下する。
Lowering the treatment temperature is effective in avoiding this columnar crystallization, but lowering the treatment temperature tends to result in an amorphous film, resulting in a decrease in film hardness and wear resistance.

また、柱状結晶化を避ける別の方法は、異なる組成の膜
を交互に設け、多層膜化することである。例えば、特公
昭61−54114号公報には、Tf、Zr、Hf等の
酸炭窒化物とAn酸化物の層を交互に備えている多層膜
が報告されている。
Another method for avoiding columnar crystallization is to alternately provide films with different compositions to form a multilayer film. For example, Japanese Patent Publication No. 61-54114 reports a multilayer film comprising alternating layers of oxycarbonitrides such as Tf, Zr, and Hf and An oxides.

しかし異なる組成の膜を交互に付けるためには、原料ガ
ス系を切換える必要があり、操作が煩雑になるほか、層
間の密着強度が低下し、フライス加工等の断続切削や小
部品の多数切削加工の場合のように、繰り返し衝撃荷重
のほかに切削時の発熱と非切削時の冷却に伴なう繰り返
し熱応力を受ける用途においては、居間において皮膜の
小剥離が生じやすくなる。
However, in order to apply films with different compositions alternately, it is necessary to switch the raw material gas system, which not only complicates the operation, but also reduces the adhesion strength between layers, requiring interrupted cutting such as milling, and cutting of multiple small parts. As in the case of , small peeling of the coating is likely to occur in the living room in applications where the material is subject to repeated impact loads as well as repeated thermal stress due to heat generation during cutting and cooling during non-cutting.

[発明が解決しようとする課題] 本発明は硬さが高く化学的にも安定な反面、柱状結晶化
しやすいAn、 Siの酸化物、窒化物および酸窒化物
のCVD膜において、これら組成の結晶膜に比べて大幅
な硬さの低下がなく同時に著しい柱状結晶化を示さない
、耐摩耗性および強度の優れた、従って断続切削におい
ても工具寿命の優れた切削工具を提供することを目的と
するものである。
[Problems to be Solved by the Invention] The present invention provides a CVD film of oxides, nitrides, and oxynitrides of An and Si, which are highly hard and chemically stable, but tend to form columnar crystals. The purpose of the present invention is to provide a cutting tool with excellent wear resistance and strength, which does not have a significant decrease in hardness compared to a film, does not exhibit significant columnar crystallization, and therefore has an excellent tool life even in interrupted cutting. It is something.

[X1題を解決するための手段] CVD法によりAn、 Sjの酸化物、窒化物および酸
窒化物の一種又は二種以上を含む結晶を成膜させようと
すると柱状晶となる。膜厚が厚くなる程著しい柱状結晶
となり、工具の強度が低下する。これに対し本発明はこ
れら組成の結晶を成膜する途中で、これら組成の薄いア
モルファス層を挿入させ、結晶とアモルファスの交互層
とすることによって、前述の課題を解決できることを提
案するものである。
[Means for Solving Problem X1] If an attempt is made to form a crystal containing one or more of An, Sj oxides, nitrides, and oxynitrides by the CVD method, columnar crystals will be formed. As the film thickness increases, the columnar crystals become more pronounced and the strength of the tool decreases. In contrast, the present invention proposes that the above-mentioned problems can be solved by inserting thin amorphous layers with these compositions during the formation of crystals with these compositions to form alternating layers of crystal and amorphous. .

すなわち、本発明の切削工具は、超硬、サーメットおよ
びセラミックス母材に、^l、 Sjの酸化物、窒化物
および酸窒化物の一種又は二種以上を含む皮膜を被覆し
た工具において、該皮膜が厚さが1.0JJI11以下
のアモルファス層と厚さが2.0u騰以下の結晶層の少
なくとも合せて4層以上の、好ましくは厚さが6JJI
l+以上の交互層からなることを特徴とする。
That is, the cutting tool of the present invention is a tool in which a carbide, cermet, or ceramic base material is coated with a film containing one or more of oxides, nitrides, and oxynitrides of ^l, Sj. is an amorphous layer with a thickness of 1.0JJI11 or less and a crystalline layer with a thickness of 2.0U or less, a total of at least 4 layers, preferably a thickness of 6JJI
It is characterized by consisting of l+ or more alternating layers.

[作用] アモルファス層の挿入は、CvDの温度を一時的に結晶
化温度より低い温度にすることによって行うことができ
る。このアモルファス層を挿入することによって結晶の
成長が中断される。次にアモルファス層の上に結晶を再
度成長させると、アモルファス上に多くの結晶核生成が
行われて微細な結晶が成長を始める。この結晶層の厚さ
を十分小さく制御してやることにより、顕著な柱状組織
ではなく層状の微細結晶からなる組織となる。この皮膜
は引張り応力が負荷されても従来の顕著な柱状結晶にく
らべて亀裂が生じ難く、亀裂を生じる場合でもアモルフ
ァス層によって亀裂の進展が抑制されるため、被覆によ
る工具の強度低下を小さいものにすることができる。又
アモルファス層は同組成の結晶層に比べて硬さが低いが
、この層を十分小さくしてやることによって、皮膜全体
の硬さを結晶層だけの皮膜の硬さに近い値にすることが
できる。
[Operation] The amorphous layer can be inserted by temporarily lowering the CvD temperature to a temperature lower than the crystallization temperature. By inserting this amorphous layer, crystal growth is interrupted. Next, when crystals are grown again on the amorphous layer, many crystal nuclei are generated on the amorphous layer, and fine crystals begin to grow. By controlling the thickness of this crystal layer to be sufficiently small, a structure consisting of layered fine crystals instead of a prominent columnar structure can be obtained. This coating is less prone to cracking than conventional columnar crystals, even when tensile stress is applied, and even if cracks do occur, the amorphous layer suppresses the propagation of the cracks, minimizing the reduction in tool strength caused by the coating. It can be done. Although the amorphous layer has a lower hardness than a crystalline layer of the same composition, by making this layer sufficiently small, the hardness of the entire film can be made close to that of the crystalline layer alone.

このようにして本発明の被覆工具は優れた耐摩耗性と強
度を併せ持ち、連続切削のほかに繰り返し衝撃荷重のか
かる断続切削や小部品の多数切削用途にも適用すること
が可能である。又結晶層とアモルファス層は同成分であ
ることから密着性も良く、異なる成分系の多層皮膜の場
合に生じやすい層間の剥離も少ない。
In this way, the coated tool of the present invention has both excellent wear resistance and strength, and can be applied not only to continuous cutting but also to interrupted cutting where repeated impact loads are applied, and to cutting a large number of small parts. Furthermore, since the crystalline layer and the amorphous layer have the same components, their adhesion is good, and there is little peeling between the layers, which tends to occur in the case of multilayer coatings with different component systems.

[発明の詳細] 次に本発明の限定理由について述べる。[Details of the invention] Next, the reasons for the limitations of the present invention will be described.

アモルファス層の厚さは1μmを超える場合には皮膜に
占めるアモルファス層の割合が大きくなり、皮膜硬さが
低下する。又確実に結晶の成長を中断させるためには0
.1μm以上であることが望ましい。
When the thickness of the amorphous layer exceeds 1 μm, the proportion of the amorphous layer in the film increases, and the hardness of the film decreases. In addition, in order to reliably interrupt crystal growth, the
.. It is desirable that the thickness is 1 μm or more.

結晶層の厚さは2.0μmを超える場合には顕著な柱状
組織を呈し、工具の強度が低下する。結晶層の厚さは薄
い程5強度の点からは好ましいが、所定の厚さにするた
めには非常に多数の層とする必要が生じるため0.2μ
m以上であることが望ましい。
When the thickness of the crystal layer exceeds 2.0 μm, a remarkable columnar structure is exhibited and the strength of the tool is reduced. The thinner the crystal layer is, the better it is from the point of view of strength, but it is necessary to use a very large number of layers in order to achieve the desired thickness, so the thickness of 0.2μ is preferable.
It is desirable that it is more than m.

本発明の皮膜は2°つの結晶層と2つのアモルファス層
からなる4層構造が最小の層数となるが、結晶層の結晶
粒を小さくして強度の向上を図るには、8層以−トの多
層構造とすることが望ましい。
The minimum number of layers for the coating of the present invention is a four-layer structure consisting of two crystalline layers and two amorphous layers. It is desirable to have a multi-layered structure.

又、Al、 Siの酸化物、窒化物および酸窒化物の一
層又は二種以上の結晶層とアモルファス層の多層膜を超
硬、サーメットおよびセラミックス母材に直接被覆する
こともできるが、母材との密着強度を高くするには、こ
わら多層膜の下にTiの炭化物、窒化物又は炭窒化物の
一種又は二種以上の層を被覆しておくことが望ましい。
Furthermore, it is also possible to directly coat carbide, cermet, and ceramic base materials with a multilayer film consisting of one or more crystalline layers of Al, Si oxides, nitrides, and oxynitrides, and an amorphous layer. In order to increase the adhesion strength with Ti, it is desirable to coat the bottom of the stiff multilayer film with a layer of one or more Ti carbides, nitrides, or carbonitrides.

この結晶層とアモルファス層の交互層の全体の厚さは6
層m未満であっても本発明のねらいとする効果を十分発
揮するが、この交互層を多数積み重ねて6AJ11以上
のJg、l151とすることによって耐摩耗性が一層向
上し、優れた工具寿命を示すに至る。厚さは大きくても
工具寿命面からは差しつがえないが、製造コスト面から
Ion utn以下とすることが好ましい。
The total thickness of this alternating layer of crystalline and amorphous layers is 6
Even if the number of layers is less than m, the desired effect of the present invention can be fully exhibited, but by stacking a large number of these alternating layers to obtain a Jg of 6AJ11 or more and l151, wear resistance is further improved and excellent tool life is achieved. This leads to the following. Even if the thickness is large, it does not interfere with the tool life, but from the viewpoint of manufacturing cost, it is preferable to make it less than Ion utn.

[実施例] (実施例1) ff[ffi!Ii テロt Co、 5tTiC−5
%(TaC+I’1bc)、 84’t VCからなる
超硬合金を母材とし、CVD反応炉内にセットした。こ
のCVD反応炉内に最初体積比3零丁:CQ4.9* 
C114、残部H2からなるガスを導入し、1000℃
、 150Torrの条件で30分間処理した。次に上
記のC;14に替えてNH,9!I;  (体積比)を
導入し′C20分間処理した。以上の処理は以下に述べ
るアルミナの結晶層とアモルファス層の交互層のアンダ
ーコートとしてTiCおよびTiNをコーティングする
ための処理である。
[Example] (Example 1) ff[ffi! Ii Terot Co, 5tTiC-5
% (TaC+I'1bc), 84't VC was used as a base material, and it was set in a CVD reactor. In this CVD reactor, the initial volume ratio was 3: CQ4.9*
A gas consisting of C114 and the remainder H2 was introduced and heated to 1000°C.
, and treated for 30 minutes at 150 Torr. Next, replace C;14 with NH,9! I; (volume ratio) was introduced and treated for 20 minutes. The above process is a process for coating TiC and TiN as an undercoat of alternating layers of crystalline and amorphous layers of alumina, which will be described below.

次に5体積比テAQci35’Ji 、 (:059G
、残H2がうなるガスをCVD反応炉内に導入して10
00℃。
Next, 5 volume ratio TeAQci35'Ji, (:059G
, a gas with residual H2 was introduced into the CVD reactor, and 10
00℃.

150Torrの条件で12分間処理後、同ガス組成、
ガス圧で750℃、8分間処理した。この1000℃、
12分間→750℃、8分間を6回繰り返した。100
0℃と750℃の繰り返しはCVD反応炉内に1000
℃と750℃に保持したゾーンを設け、このゾーン間を
母材を乗せたホルダーを移動させることによって行った
。このようにしてCVD処理された被覆層は第1図に示
す構造をしている。
After processing for 12 minutes at 150 Torr, the same gas composition,
It was treated under gas pressure at 750°C for 8 minutes. This 1000℃,
The procedure of 12 minutes at 750°C for 8 minutes was repeated six times. 100
Repeating 0℃ and 750℃ is 1000 times inside the CVD reactor.
The test was carried out by providing zones maintained at 750°C and 750°C, and moving a holder carrying the base material between the zones. The coating layer treated by CVD in this manner has the structure shown in FIG.

この被覆工具は第2図に示す比較の結晶アルミナ層から
なる被覆工具にくらべて抗折力が優れている。又第3図
に示すアモルファスアルミナ層からなる被覆工具にくら
べてアルミナ層の硬さが高い。又下記の条件で行った切
削試験の結果、比較の両工具より優れた工具寿命を示し
た。これらの結果を表1に示す。
This coated tool has superior transverse rupture strength compared to the comparative coated tool made of a crystalline alumina layer shown in FIG. Furthermore, the hardness of the alumina layer is higher than that of the coated tool made of an amorphous alumina layer shown in FIG. In addition, the results of cutting tests conducted under the following conditions showed that the tool life was superior to both comparison tools. These results are shown in Table 1.

く切削試験条件〉 被削材:545C 切込み+2mm 送  リ : (1,18ff1m/rev。Cutting test conditions> Work material: 545C Depth of cut +2mm Transmission: (1,18ff1m/rev.

−〇 速 度+ 180 m/+++i口 1個当りの切削時間: 0.8 win寿命基準: v
a= 500 um又は工具の欠損表  1 (実施例2) 重量tで、7 !ti Alz03を焼結助剤として含
むSi3N4焼結材を母材とし、CVD反応炉内で下記
の被覆処理を行った。最初に体積比15’)−5iCQ
4. 5!li Nil、 、残H2からなるガスを反
応炉内に導入し、50Torr、 1100℃で12分
間処理後、同ガス組成比、ガス圧のまま1350℃で1
0分間処理した。この1100℃と1350℃の処理を
5回縁り返した。その結果第4図に示すアモルファス窒
化珪素層に結晶Si、N4層の10層、合計2.8 u
mからなる多層膜工具を得た。
-〇Speed + 180 m/+++ Cutting time per one opening: 0.8 Win life standard: v
a = 500 um or tool loss Table 1 (Example 2) At weight t, 7! A Si3N4 sintered material containing tiAlz03 as a sintering aid was used as a base material, and the following coating treatment was performed in a CVD reactor. Initially the volume ratio 15')-5iCQ
4. 5! A gas consisting of li Nil, , and residual H2 was introduced into the reactor, and after being treated at 50 Torr and 1100°C for 12 minutes, it was heated to 1350°C with the same gas composition ratio and gas pressure.
Processed for 0 minutes. This treatment at 1100°C and 1350°C was repeated 5 times. As a result, the amorphous silicon nitride layer, crystalline Si, and 10 N4 layers, totaling 2.8 u, are shown in Figure 4.
A multilayer film tool consisting of m was obtained.

又同条件で1100℃と1350℃の処理を18回繰り
返して第5図に示すアモルファス窒化珪素層と結晶Si
、N、層の36層合計11.2μlからなる多層膜工具
を得た。
Furthermore, by repeating the treatment at 1100°C and 1350°C 18 times under the same conditions, the amorphous silicon nitride layer and crystalline Si shown in
, N, a multilayer film tool consisting of 36 layers with a total volume of 11.2 μl was obtained.

これら本発明による多層膜被覆工具と比較の結晶Si、
N4およびアモルファス窒化珪素の各単層膜被覆工具と
の硬さ、抗折力および工具寿命比較を表2に示す。本発
明工具は結晶単層膜にくらべて強度が高く、アモルファ
ス単層膜にくらべて硬さが高い。又比較の画工具より工
具寿命が優れている。特に被膜厚さを厚くした本発明3
の工具は最も優れている。この時の切削試験は下記の条
件で行った。
These multilayer coated tools according to the present invention and comparative crystalline Si,
Table 2 shows a comparison of hardness, transverse rupture strength, and tool life with N4 and amorphous silicon nitride single-layer coated tools. The tool of the present invention has higher strength than a crystalline single layer film, and higher hardness than an amorphous single layer film. Also, the tool life is better than that of comparative drawing tools. Invention 3 with particularly thick coating
's tools are the best. The cutting test at this time was conducted under the following conditions.

く切削試験条件〉 被削材:Fe12 切込み:1.5am 送  リ : 0.12  arm/rev。Cutting test conditions> Work material: Fe12 Depth of cut: 1.5am Transmission: 0.12 arm/rev.

速度: 300 m/l1in 1個当りの切削時間: 0.5 win寿命基準: V
B= 500μI又は工具の欠損表  2 (実施例3) 重量tでTiC75!k 、 Ni 1.5); 、 
Co5龜を含むサーメットを母材とし、CvO反応炉内
で下記の被覆処理を行った。最初に体積比Al(:R3
5!に、Go  5%、NH321残H2からなるガス
をCVD反応炉に導入して、 1020℃、 100T
orrの条件で10分間処理後、同ガス組成および同ガ
ス圧のまま700″clO分間処理した。この1020
℃10分→700″’CIO分を3回繰り返した後NH
,の導入を止め、体積比AQ13596、 Co5!!
 、残H2からなるガス組成で1020℃lO分→70
0℃10分処理を2回繰り返した。本実施例で用いたC
VD炉は前2例とは異なり、母材の保持台を高周波加熱
する方式で、いわゆるコールドウオール方式の装置で処
理温度を短時間で変えることができる。
Speed: 300 m/l1in Cutting time per piece: 0.5 win life standard: V
B = 500 μI or tool loss table 2 (Example 3) TiC75 at weight t! k, Ni 1.5);
A cermet containing Co5 was used as a base material, and the following coating treatment was performed in a CvO reactor. First, the volume ratio Al (:R3
5! Then, a gas consisting of 5% Go, NH321 and residual H2 was introduced into the CVD reactor at 1020°C and 100T.
After processing for 10 minutes under the conditions of
After repeating ℃ 10 minutes → 700'' CIO minutes 3 times, NH
, the volume ratio AQ13596, Co5! !
, gas composition consisting of residual H2 at 1020°C 1O min → 70
The treatment at 0°C for 10 minutes was repeated twice. C used in this example
The VD furnace differs from the previous two examples in that it heats the base material holding table using high-frequency waves, and is a so-called cold wall type device that allows the processing temperature to be changed in a short period of time.

この結果、第6図に示すようにAM20.とAiNの結
晶層とアモルファス層およびAt20.の結晶層とアモ
ルファス層の多層膜が得られた。結晶層厚は0.3〜0
.41Jmでアモルファス層厚は0.1〜0.151J
a+〜0.2μmで合計厚さは2.7μlである。
As a result, as shown in FIG. 6, AM20. and AiN crystal layer and amorphous layer and At20. A multilayer film consisting of a crystalline layer and an amorphous layer was obtained. Crystal layer thickness is 0.3~0
.. 41Jm, amorphous layer thickness is 0.1~0.151J
The total thickness is 2.7 μl at a+~0.2 μm.

この工具の皮膜硬さ、抗折力および工具寿命は表3に示
す通りである。切削試験は表1と同条件で行ったもので
あり、表1に示す比較の工具にくらべて工具寿命が優れ
ている。
The film hardness, transverse rupture strength, and tool life of this tool are shown in Table 3. The cutting test was conducted under the same conditions as in Table 1, and the tool life was superior to that of the comparative tools shown in Table 1.

表  3 [発明の効果] 上述したように本発明は超硬、サーメットあるいはセラ
ミックス母材に結晶層とアモルファス層を交互に被覆す
ることによって、強度を低下させることなく高硬度の皮
膜を被覆するもので、小部分の多数切削や断続切削にお
いても優れた工具寿命を示す。
Table 3 [Effects of the Invention] As mentioned above, the present invention coats a carbide, cermet, or ceramic base material with a high hardness film by alternately coating crystal layers and amorphous layers without reducing strength. It shows excellent tool life even in multiple cuts of small parts and interrupted cuts.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は超硬母材にTiC,TiN層を被覆した後結晶
AQaO:+とアモルファスアルミナを交互に12層被
覆した本発明の被覆工具の被覆層の断面模式図。 第2図は超硬母材にTiC,TiN層を被覆した後結晶
^QzOsを被覆した比較の被覆工具の被覆層の断面模
式図。 第3図は超硬母材にTi(:、TiN層を被覆した後ア
モルファスアルミナを被覆した比較の被覆工具の被覆層
の断面模式図。 第4図は焼結Si、N4に結晶Si3N4とアモルファ
ス窒化珪素を交互に10層被覆した本発明の被覆工具の
被覆層の断面模式図。 第5図は同じく焼結Si3N4に結晶Si、N4とアモ
ルファス窒化珪素を交互に36層被覆した本発明の被覆
工具の被覆層の断面模式図。 第6図はサーメットIす材に結晶^2□03  ・AQ
Nと″j゛モルファスAQ−0−Nを交互に6層被覆し
、さらにその−Fに結晶AQzO,vとアモルフ・−ス
アルミナを交互に4層、合計10層被覆した工具の被覆
層のt@而面式図。
FIG. 1 is a schematic cross-sectional view of the coating layer of a coated tool of the present invention, in which a carbide base material is coated with TiC and TiN layers, and then 12 layers of crystalline AQaO:+ and amorphous alumina are alternately coated. FIG. 2 is a schematic cross-sectional view of the coating layer of a comparative coated tool in which a carbide base material is coated with TiC and TiN layers and then coated with crystal ^QzOs. Figure 3 is a schematic cross-sectional view of the coating layer of a comparative coated tool in which a carbide base material is coated with a Ti (:, TiN layer) and then amorphous alumina. Figure 4 is a sintered Si, crystalline Si3N4 and amorphous A schematic cross-sectional view of the coating layer of a coated tool of the present invention in which 10 layers of silicon nitride are alternately coated. Figure 5 shows a coating of the present invention in which sintered Si3N4 is alternately coated with 36 layers of crystalline Si, N4, and amorphous silicon nitride. Schematic cross-sectional diagram of the coating layer of the tool. Figure 6 shows crystals on the cermet I material.
t of the coating layer of a tool in which 6 layers of N and "j゛morphous AQ-0-N are alternately coated, and -F is coated with 4 layers of crystalline AQzO,v and amorphous alumina alternately, for a total of 10 layers. @Metamenshiki diagram.

Claims (1)

【特許請求の範囲】 1、超硬、サーメットおよびセラミックス母材に、Al
、Siの酸化物、窒化物および酸窒化物の一種又は二種
以上を含む皮膜を被覆した工具において、該皮膜が厚さ
が1.0μm以下のアモルファス層と厚さが2.0μm
以下の結晶層の少なくとも合せて4層以上の交互層から
なることを特徴とするセラミックス被覆切削工具。 2、Al、Siの酸化物、窒化物および酸窒化物の一種
又は二種以上の組成からなるアモルファス層と結晶層の
交互層の厚さが6μm以上であることを特徴とする請求
項1記載の切削工具。
[Claims] 1. Al in the carbide, cermet, and ceramic base material
, a tool coated with a film containing one or more of Si oxides, nitrides, and oxynitrides, in which the film has an amorphous layer with a thickness of 1.0 μm or less and an amorphous layer with a thickness of 2.0 μm.
A ceramic-coated cutting tool comprising at least four or more alternating layers of the following crystal layers. 2. The thickness of the alternating layers of amorphous layers and crystal layers made of one or more of oxides, nitrides, and oxynitrides of Al and Si is 6 μm or more, according to claim 1. cutting tools.
JP12197788A 1988-05-20 1988-05-20 Ceramics-coated cutting tool Pending JPH01295702A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12197788A JPH01295702A (en) 1988-05-20 1988-05-20 Ceramics-coated cutting tool

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12197788A JPH01295702A (en) 1988-05-20 1988-05-20 Ceramics-coated cutting tool

Publications (1)

Publication Number Publication Date
JPH01295702A true JPH01295702A (en) 1989-11-29

Family

ID=14824532

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12197788A Pending JPH01295702A (en) 1988-05-20 1988-05-20 Ceramics-coated cutting tool

Country Status (1)

Country Link
JP (1) JPH01295702A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1266980A2 (en) * 2001-06-11 2002-12-18 Mitsubishi Materials Corporation Surface-coated carbide alloy tool
JP2003159653A (en) * 2001-11-20 2003-06-03 Dipsol Chem Co Ltd Abrasive material having amorphous surface layer and manufacturing method thereof
JPWO2008041402A1 (en) * 2006-10-02 2010-02-04 住友電気工業株式会社 Surface coated cutting tool
JP2011194518A (en) * 2010-03-19 2011-10-06 Tokyo Institute Of Technology Surface-coated cutting tool for milling work superior in wear resistance and method of manufacturing the same
JP2011194519A (en) * 2010-03-19 2011-10-06 Tokyo Institute Of Technology Surface-coated cutting tool for turning work superior in wear resistance and method of manufacturing the same

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1266980A2 (en) * 2001-06-11 2002-12-18 Mitsubishi Materials Corporation Surface-coated carbide alloy tool
EP1266980A3 (en) * 2001-06-11 2003-03-12 Mitsubishi Materials Corporation Surface-coated carbide alloy tool
US6855405B2 (en) 2001-06-11 2005-02-15 Mitsubishi Materials Corporation Surface-coated carbide alloy tool
CN100425391C (en) * 2001-06-11 2008-10-15 三菱综合材料株式会社 Tools coated with cemented carbides
JP2003159653A (en) * 2001-11-20 2003-06-03 Dipsol Chem Co Ltd Abrasive material having amorphous surface layer and manufacturing method thereof
JPWO2008041402A1 (en) * 2006-10-02 2010-02-04 住友電気工業株式会社 Surface coated cutting tool
JP5172687B2 (en) * 2006-10-02 2013-03-27 住友電気工業株式会社 Surface coated cutting tool
JP2011194518A (en) * 2010-03-19 2011-10-06 Tokyo Institute Of Technology Surface-coated cutting tool for milling work superior in wear resistance and method of manufacturing the same
JP2011194519A (en) * 2010-03-19 2011-10-06 Tokyo Institute Of Technology Surface-coated cutting tool for turning work superior in wear resistance and method of manufacturing the same

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