JPH01268778A - Hot-melt adhesive, polyimide film with said adhesive layer and printed circuit board therefrom - Google Patents
Hot-melt adhesive, polyimide film with said adhesive layer and printed circuit board therefromInfo
- Publication number
- JPH01268778A JPH01268778A JP9780288A JP9780288A JPH01268778A JP H01268778 A JPH01268778 A JP H01268778A JP 9780288 A JP9780288 A JP 9780288A JP 9780288 A JP9780288 A JP 9780288A JP H01268778 A JPH01268778 A JP H01268778A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- tables
- formulas
- mathematical
- chemical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004831 Hot glue Substances 0.000 title claims description 27
- 229920001721 polyimide Polymers 0.000 title claims description 22
- 239000012790 adhesive layer Substances 0.000 title description 6
- 125000003118 aryl group Chemical group 0.000 claims abstract description 26
- 229920000642 polymer Polymers 0.000 claims abstract description 21
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 13
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 13
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 9
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 9
- 150000002367 halogens Chemical class 0.000 claims abstract description 9
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 claims abstract description 7
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims abstract description 6
- 229910052751 metal Inorganic materials 0.000 claims description 27
- 239000002184 metal Substances 0.000 claims description 27
- 239000011888 foil Substances 0.000 claims description 16
- 239000001257 hydrogen Substances 0.000 claims description 12
- 229910052739 hydrogen Inorganic materials 0.000 claims description 12
- 239000010410 layer Substances 0.000 claims description 12
- 239000000126 substance Substances 0.000 claims 41
- 150000002431 hydrogen Chemical class 0.000 claims 8
- 239000000853 adhesive Substances 0.000 abstract description 26
- 230000001070 adhesive effect Effects 0.000 abstract description 26
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 abstract description 3
- 239000012943 hotmelt Substances 0.000 abstract description 3
- 230000006866 deterioration Effects 0.000 abstract description 2
- -1 aromatic tricarboxylic acid Chemical class 0.000 description 16
- 229910000831 Steel Inorganic materials 0.000 description 15
- 239000010959 steel Substances 0.000 description 15
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 10
- 239000002253 acid Substances 0.000 description 8
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- 239000004962 Polyamide-imide Substances 0.000 description 5
- 150000004985 diamines Chemical class 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 229920002312 polyamide-imide Polymers 0.000 description 5
- 239000001294 propane Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- NJMOHBDCGXJLNJ-UHFFFAOYSA-N trimellitic anhydride chloride Chemical compound ClC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 NJMOHBDCGXJLNJ-UHFFFAOYSA-N 0.000 description 5
- 239000011521 glass Substances 0.000 description 4
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- KKEYFWRCBNTPAC-UHFFFAOYSA-N terephthalic acid group Chemical group C(C1=CC=C(C(=O)O)C=C1)(=O)O KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 4
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- 150000004984 aromatic diamines Chemical class 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 238000000748 compression moulding Methods 0.000 description 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 3
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 125000003282 alkyl amino group Chemical group 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 125000005336 allyloxy group Chemical group 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 239000011256 inorganic filler Substances 0.000 description 2
- 229910003475 inorganic filler Inorganic materials 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 229920005575 poly(amic acid) Polymers 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 150000003457 sulfones Chemical class 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 2
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- CVIUJSXIENVAGJ-UHFFFAOYSA-N 1-methyl-2H-pyrrol-2-ide Chemical compound CN1C=CC=[C-]1 CVIUJSXIENVAGJ-UHFFFAOYSA-N 0.000 description 1
- WCXGOVYROJJXHA-UHFFFAOYSA-N 3-[4-[4-(3-aminophenoxy)phenyl]sulfonylphenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=CC(=CC=2)S(=O)(=O)C=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)=C1 WCXGOVYROJJXHA-UHFFFAOYSA-N 0.000 description 1
- GPXCORHXFPYJEH-UHFFFAOYSA-N 3-[[3-aminopropyl(dimethyl)silyl]oxy-dimethylsilyl]propan-1-amine Chemical compound NCCC[Si](C)(C)O[Si](C)(C)CCCN GPXCORHXFPYJEH-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 description 1
- QGMGHALXLXKCBD-UHFFFAOYSA-N 4-amino-n-(2-aminophenyl)benzamide Chemical compound C1=CC(N)=CC=C1C(=O)NC1=CC=CC=C1N QGMGHALXLXKCBD-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 241000270708 Testudinidae Species 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- QEZIKGQWAWNWIR-UHFFFAOYSA-N antimony(3+) antimony(5+) oxygen(2-) Chemical compound [O--].[O--].[O--].[O--].[Sb+3].[Sb+5] QEZIKGQWAWNWIR-UHFFFAOYSA-N 0.000 description 1
- XBJJRSFLZVLCSE-UHFFFAOYSA-N barium(2+);diborate Chemical compound [Ba+2].[Ba+2].[Ba+2].[O-]B([O-])[O-].[O-]B([O-])[O-] XBJJRSFLZVLCSE-UHFFFAOYSA-N 0.000 description 1
- FDQSRULYDNDXQB-UHFFFAOYSA-N benzene-1,3-dicarbonyl chloride Chemical compound ClC(=O)C1=CC=CC(C(Cl)=O)=C1 FDQSRULYDNDXQB-UHFFFAOYSA-N 0.000 description 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 238000004807 desolvation Methods 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical class C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- PWSKHLMYTZNYKO-UHFFFAOYSA-N heptane-1,7-diamine Chemical compound NCCCCCCCN PWSKHLMYTZNYKO-UHFFFAOYSA-N 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- YNBADRVTZLEFNH-UHFFFAOYSA-N methyl nicotinate Chemical compound COC(=O)C1=CC=CN=C1 YNBADRVTZLEFNH-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- KYTZHLUVELPASH-UHFFFAOYSA-N naphthalene-1,2-dicarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 KYTZHLUVELPASH-UHFFFAOYSA-N 0.000 description 1
- DDHQTWZKAJOZQL-UHFFFAOYSA-N naphthalene-1,4,5-tricarboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=C(C(O)=O)C2=C1C(O)=O DDHQTWZKAJOZQL-UHFFFAOYSA-N 0.000 description 1
- RMHJJUOPOWPRBP-UHFFFAOYSA-N naphthalene-1-carboxamide Chemical compound C1=CC=C2C(C(=O)N)=CC=CC2=C1 RMHJJUOPOWPRBP-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 150000003628 tricarboxylic acids Chemical class 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/386—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
Landscapes
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Reinforced Plastic Materials (AREA)
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明はホットメルト接着剤、シート状の核ホットメル
ト接着剤、該ホットメルト接着剤層を設けてなるホット
メルト接着剤層付ポリイミドフィルム、ポリイミドフィ
ルムと金属箔とを該ホットメルト接着剤層を介して接着
させてなるフレキシブル印刷回路用基板及び金属板と金
属箔とを該ホットメルト接着剤層を介して接着させてな
る金属ベース印刷回路用基板に関する。Detailed Description of the Invention (Industrial Application Field) The present invention relates to a hot melt adhesive, a sheet-like core hot melt adhesive, a polyimide film with a hot melt adhesive layer provided with the hot melt adhesive layer, A flexible printed circuit board formed by adhering a polyimide film and a metal foil through the hot melt adhesive layer; and a metal-based printed circuit formed by adhering a metal plate and metal foil through the hot melt adhesive layer. related to the board for use.
(従来の技術)
現在、フレキシブル印刷回路用基板はポリイミドフィル
ムと金属箔とを絶縁性の接着剤層を介して接着させて製
造されている。又放熱特性にすぐれる金属ベースの印刷
回路用基板においては、アルミ板、鋼板等の金属板と金
属箔とを絶縁性の接着剤層を介して接着させて製造して
いる。これらエレクトロニクスの分野においては高温特
性1作業性にすぐれた材料が求められている。(Prior Art) Currently, flexible printed circuit boards are manufactured by bonding a polyimide film and a metal foil through an insulating adhesive layer. Metal-based printed circuit boards with excellent heat dissipation properties are manufactured by bonding a metal plate, such as an aluminum plate or a steel plate, to a metal foil via an insulating adhesive layer. In these fields of electronics, materials with excellent high-temperature properties and workability are required.
上記した絶縁性の接着剤層においても、耐熱性。The insulating adhesive layer mentioned above is also heat resistant.
接着力にすぐれ短時間で接着できる材料が求められてい
る。There is a need for materials that have excellent adhesive strength and can be bonded in a short time.
従来、これら接着剤として用いられているエポキシ系、
変性エポキシ系、フェノール系、アクリル系等の樹脂は
、耐熱性に劣るという欠点がある。Epoxy-based adhesives have traditionally been used as adhesives,
Modified epoxy resins, phenolic resins, acrylic resins, and the like have a drawback of poor heat resistance.
一方、耐熱性にすぐれる樹脂として、ポリイミド系樹脂
が知られている。しかしながらポリイミド樹脂は、不溶
・不融であり、接着剤として用いるには不適当であり、
むしろその前駆体であるポリアミド酸を特定の溶媒に溶
解させた溶液の状態で用いついで脱溶媒、イミド化しな
ければならない。しかし、この場合は脱溶媒、イミド化
時の縮合水等でボイドを発生しやすく、又イミド化に高
温・長時間を要するため、使用にあたっては制限が多い
という問題があつ九。On the other hand, polyimide resins are known as resins with excellent heat resistance. However, polyimide resin is insoluble and unfusible, making it unsuitable for use as an adhesive.
Rather, the precursor, polyamic acid, must be used in the form of a solution in a specific solvent, and then the solvent must be removed and imidized. However, in this case, voids are likely to be generated due to condensed water during desolvation and imidization, and imidization requires high temperatures and long periods of time, so there are many restrictions on its use.
(発明が解決しようとする課題〉
本発明の目的は、耐熱性・接着力にすぐれ、かつ、溶融
接着(ホットメルト接着)ができるホットメルト接着材
を提供することにある。本発明の別の目的は、該ホット
メルト接着剤を、ポリイミドフィルム及び金属と金属箔
とを接着するのに用いて耐熱性にすぐれた印刷回路用基
板を提供することにある。(Problems to be Solved by the Invention) An object of the present invention is to provide a hot melt adhesive material that has excellent heat resistance and adhesive strength and is capable of melt bonding (hot melt bonding). An object of the present invention is to provide a printed circuit board with excellent heat resistance by using the hot melt adhesive to bond a polyimide film and a metal to a metal foil.
(課題を解決するための手段)
本発明は下記−数式(11で表わされる繰υ返し単位を
有する重合体を含有してなるホットメルト接着剤に関す
る。(Means for Solving the Problems) The present invention relates to a hot melt adhesive comprising a polymer having a repeating unit represented by the following formula (11).
〔式中、R1,R4、Rs及びR4はそれぞれ独立に水
素、低級アルキル基、低級アルコキシ基又はハロゲンを
示し、Xは結合、−〇−、−S−、−C−。[In the formula, R1, R4, Rs, and R4 each independently represent hydrogen, a lower alkyl group, a lower alkoxy group, or a halogen, and X is a bond, -〇-, -S-, -C-.
R4
(ここで&及びR4は各々独立して水素、低級アルキル
基、トリフルオロメチル基、トリクロロメチル基又はフ
ェニル基を示す)Xは繰り返し単位は芳香族の二価の基
を、 Ar’は芳香族の三価の基を示す)Yは繰り返し
単位毎に相違してもよい。〕このような本発明における
重合体は芳香族ジカルボン酸若しくはその反応性誘導体
および/又は芳香族トリカルボン酸若しくはその反応性
誘導体と一般式(ff)
(式中e R1* R1e R4及びR4はそれぞれ
独立に水素、低級アルキル基、低級アルコキシ基又はハ
ロゲンを示し、Xは結合、 −o−、−s +、 −C
−tム
&及び−は各々独立して水素、低級アルキル基。R4 (where & and R4 each independently represent hydrogen, a lower alkyl group, a trifluoromethyl group, a trichloromethyl group, or a phenyl group) X is a repeating unit that is an aromatic divalent group, and Ar' is an aromatic group. Y (representing a trivalent group of the same group) may be different for each repeating unit. [Such a polymer in the present invention is an aromatic dicarboxylic acid or its reactive derivative and/or an aromatic tricarboxylic acid or its reactive derivative and the general formula (ff) (in the formula, e R1 * R1e R4 and R4 are each independently represents hydrogen, a lower alkyl group, a lower alkoxy group, or a halogen, and X is a bond, -o-, -s +, -C
-tm & and - each independently represent hydrogen or a lower alkyl group.
トリ2ルオロメチル基、トリクロロメチル基又はフェニ
ル基を示す)。(represents a tri2-fluoromethyl group, trichloromethyl group or phenyl group).
で表わされる芳香族ジアミンを重縮合させて得られる。It is obtained by polycondensing aromatic diamines represented by:
本発明における芳香族ジカルボン酸は、芳香核に2つの
カルボキシル基が結合しているものである。もちろん、
この芳香環はへテロ環の導入されたものでもよく、また
芳香fR同士がアルキレン。The aromatic dicarboxylic acid in the present invention has two carboxyl groups bonded to an aromatic nucleus. of course,
This aromatic ring may have a hetero ring introduced therein, and the aromatic fRs are alkylene.
酸素、カルボニル基などと結合されていてもよい。It may be bonded with oxygen, carbonyl group, etc.
さらに芳香環に、たとえばアルコキシ、アリルオキシ、
アルキルアミノ、ハロゲンなどの縮合反応に関与しない
置換基が導入されていてもよい。上記芳香族ジカルボン
酸としては、テレフタル酸。Furthermore, in the aromatic ring, for example, alkoxy, allyloxy,
Substituents that do not participate in the condensation reaction, such as alkylamino and halogen, may be introduced. The aromatic dicarboxylic acid mentioned above is terephthalic acid.
イソフタル酸、ジフェニルエーテルジカルボン酸−44
’、ジフェニルスルホンジカルボン酸4.4’。Isophthalic acid, diphenyl ether dicarboxylic acid-44
', diphenylsulfonedicarboxylic acid 4.4'.
ジフェニルジカルボン酸−4,4′、及びナフタレンジ
カルボン酸−1,5等を挙げることができるが。Examples include diphenyldicarboxylic acid-4,4' and naphthalenedicarboxylic acid-1,5.
テレフタル酸及びイソフタル酸が入手容易であシ好まし
い。また上記、芳香族ジカルボン酸の反応性誘導体とは
、前記芳香族ジカルボン酸のジクロライド、ジクロライ
ド及びジエステル等をあげることができる。Terephthalic acid and isophthalic acid are preferred because they are easily available. Further, the above-mentioned reactive derivatives of aromatic dicarboxylic acids include dichlorides, dichlorides, diesters, etc. of the aromatic dicarboxylic acids.
本発明における芳香族トリカルボン酸は芳香族に3つの
カルボキシル基が結合され、かつ、3つのカルボキシル
基の内2つは隣接炭素に結合しているものである。もち
ろん、この芳香環はへテロ環の導入されたものでもよく
、ま九芳香環同士がアルキレン、酸素、カルボニル基な
どと結合されていてもよい。さらに芳香環にたとえばア
ルコキシ、アリルオキシ、アルキルアミノ、ハロゲンな
どの縮合反応に関与しない置換基が導入されていてもよ
い。芳香族トリカルボン酸としては例えば。The aromatic tricarboxylic acid in the present invention has three carboxyl groups bonded to the aromatic group, and two of the three carboxyl groups are bonded to adjacent carbon atoms. Of course, this aromatic ring may have a hetero ring introduced therein, or each of the nine aromatic rings may be bonded to an alkylene, oxygen, carbonyl group, or the like. Furthermore, a substituent that does not participate in the condensation reaction, such as alkoxy, allyloxy, alkylamino, or halogen, may be introduced into the aromatic ring. Examples of aromatic tricarboxylic acids include:
トリメリット酸、3.3.4’−ベンゾフェノントリカ
ルボン酸、2.&4’−ジフェニルトリカルボン酸。trimellitic acid, 3.3.4'-benzophenonetricarboxylic acid, 2. &4'-diphenyltricarboxylic acid.
2.3.5−ヒリジントリカルボン酸、3,4.4’−
ペンツアニリドトリカルボン酸、1,4.5−ナフタリ
ントリカルボン酸、2′−メトキシ−3,4,4’−ジ
フェニルエーテルトリカルボン酸、τ−クロロベンツア
ニリドー3.44’−)ジカルボン酸などをあげること
ができる。また上記芳香族トリカルボン酸の反応性誘導
体とは、前記芳香族トリカルボン酸の酸無水物、ハライ
ド、エステル、アミド、アンモニウム塩等を意味する。2.3.5-hyridinetricarboxylic acid, 3,4.4'-
Penzanilide tricarboxylic acid, 1,4,5-naphthalenetricarboxylic acid, 2'-methoxy-3,4,4'-diphenyl ethertricarboxylic acid, τ-chlorobenzanilide 3,44'-)dicarboxylic acid, etc. can. Further, the reactive derivative of the aromatic tricarboxylic acid means an acid anhydride, halide, ester, amide, ammonium salt, etc. of the aromatic tricarboxylic acid.
これらの例としては、トリメリット酸無水物、トリメリ
ット酸無水物モノクロライド、1.4−ジカルボキシ−
3−N、N−ジメチルカルバモイルベンゼン、1.4−
ジカルボメトキシー3−カルボキシベンゼン、1.4−
ジカルボキシ−3−カルボフェノキシベンゼン、46−
ジカルポキシー3−カルボメトキシピリジン。Examples of these include trimellitic anhydride, trimellitic anhydride monochloride, 1,4-dicarboxy-
3-N,N-dimethylcarbamoylbenzene, 1.4-
Dicarbomethoxy 3-carboxybenzene, 1.4-
Dicarboxy-3-carbophenoxybenzene, 46-
Dicarpoxy 3-carbomethoxypyridine.
1.6−ジカルポキシー5−カルバモイルナフタリン、
上記芳香族トリカルボン酸類とアンモニア。1.6-dicarpoxy 5-carbamoylnaphthalene,
The above aromatic tricarboxylic acids and ammonia.
ジメチルアミン、トリエチルアミン、などからなるアン
モニウム塩類などがあげられる。これらのうちでは、ト
リメリット酸無水物、トリメリット酸無水物モノクロラ
イドが好ましい。Examples include ammonium salts consisting of dimethylamine, triethylamine, etc. Among these, trimellitic anhydride and trimellitic anhydride monochloride are preferred.
前記−数式(II)で表される芳香族ジアミンとしてハ
、ス2−ビス(4−(4−アミノフェノキシ)フェニル
〕フロパン、λ2−ビス〔3−メチル−4−(4−アミ
ノフェノキシ)フェニル〕プロパン、2.2−ビス(4
−(4−アミノフェノキシ)フェニルコブタン、 2
.2−ビス〔3−メチル−4−(4−アミノフェノキシ
)フェニルコブタン。As the aromatic diamine represented by formula (II) above, 2-bis(4-(4-aminophenoxy)phenyl)furopane, λ2-bis[3-methyl-4-(4-aminophenoxy)phenyl ] Propane, 2.2-bis(4
-(4-aminophenoxy)phenylcobutane, 2
.. 2-bis[3-methyl-4-(4-aminophenoxy)phenylcobutane.
2.2−ビス〔3,5−ジメチル−4−(4−アミノフ
ェノキシ)フェニルコブタン、λ2−ビス〔亀5−ジブ
ロモ−4−(4−アミノフェノキシ)フェニルコブタン
、 1,1,1,3,3.3−へキサフルオロ−2,
2−ビス〔3−メチル−4−(4−アミノフェノキシ)
フェニル〕フロパン、1.1−ビス〔4−(4−アミノ
フェノキシ)フェニルコシクロヘキサン、1.1−ビス
(4−(4−アミノフェノキシ)フェニルコシクロペン
クン、ビス(4−(4−アミノフェノキシ)フェニル〕
スルホン、ビス(4−(4−アミノフェノキシ)フェニ
ルコニ−チル、ビス(4−(3−アミノフェノキシ)フ
ェニル〕スルホン、4.4’−カルボニルビス(p−フ
ェニレンオキシ)ジアニリン、4.4’−ビス(4−ア
ミノフェノキシ)ビフェニル等がある。これらのうちで
は、ス2−ビス(:4−(4−7ミノフエノキシ)フェ
ニル〕プロパンが好ましい。必要ならば上記のジアミン
の混合物を用いることができる。2.2-bis[3,5-dimethyl-4-(4-aminophenoxy)phenylcobutane, λ2-bis[tortoise 5-dibromo-4-(4-aminophenoxy)phenylcobutane, 1,1,1 ,3,3.3-hexafluoro-2,
2-bis[3-methyl-4-(4-aminophenoxy)
phenyl]furopane, 1.1-bis[4-(4-aminophenoxy)phenylcocyclohexane, 1.1-bis(4-(4-aminophenoxy)phenylcocyclopenkune, bis(4-(4-aminophenoxy)phenyl) Phenoxy) phenyl]
Sulfone, bis(4-(4-aminophenoxy)phenylconythyl, bis(4-(3-aminophenoxy)phenyl)sulfone, 4.4'-carbonylbis(p-phenyleneoxy)dianiline, 4.4'- Bis(4-aminophenoxy)biphenyl, etc. Among these, bis(2-bis(:4-(4-7minophenoxy)phenyl)propane is preferred. Mixtures of the above diamines may be used if necessary. .
更に本発明においては、既知のジアミノ例えば4、4’
−ジアミノジフェニルエーテル、4.4’−ジアミノ
ンフェニルメタン、44′−ジアミノジフェニルスルホ
ン、メタフェニレンジアミン、ヒヘラジン、ヘキサメチ
レンジアミン、ヘプタメチレンジアミン、テトラメチレ
ンジアミン、p−キシリレンジアミン、m−キシリレン
ジアミン、3−メチルへブタメチレンジアミン、1.3
−ビス(3−アミノプロピル)テトラメチルジシロキサ
ン等を併用することができる。これらのシアミン類のジ
アミン類全体に対する割合としては30モルチ以下であ
ることが好ましい。この割合が30モルチを越えると熱
安定性あるいは熱溶融性が悪くなる傾向がある。Furthermore, in the present invention, known diamino acids such as 4,4'
-Diaminodiphenyl ether, 4,4'-diaminonephenylmethane, 44'-diaminodiphenylsulfone, metaphenylenediamine, hyherazine, hexamethylenediamine, heptamethylenediamine, tetramethylenediamine, p-xylylenediamine, m-xylylenediamine , 3-methylhebutamethylenediamine, 1.3
-bis(3-aminopropyl)tetramethyldisiloxane, etc. can be used in combination. The ratio of these cyamines to the total diamines is preferably 30 molti or less. If this ratio exceeds 30 molt, thermal stability or thermal meltability tends to deteriorate.
本発明において、芳香族ジカルボン酸又はその反応性誘
導体および/又は芳香族トリカルボン酸又はその反応性
誘導体等の酸成分はジアミンの総量に対して80〜12
0モルチ使用するのが好ましく1%に95〜105モル
チが好ましい。これらを等モル使用したときにもつとも
高分子量のものが得られる。ジアミンに対して上記酸成
分が多すぎても少なすぎても分子量が低下して機械的強
度、耐熱性等が低下する傾向がある。In the present invention, the acid component such as aromatic dicarboxylic acid or its reactive derivative and/or aromatic tricarboxylic acid or its reactive derivative is 80 to 12% of the total amount of diamine.
It is preferable to use 0 mole, and preferably 95 to 105 mole per 1%. When equimolar amounts of these are used, a product with a high molecular weight can be obtained. If the amount of the acid component is too large or too small relative to the diamine, the molecular weight tends to decrease and mechanical strength, heat resistance, etc. tend to decrease.
本発明において1反応に際しては、既に公知のアミンと
酸との反応に用いられている方法をその壕ま採用するこ
とができ、諸条件などについても。In one reaction in the present invention, the method already used for the reaction between an amine and an acid can be employed, and various conditions can also be adopted.
特に限定されるものではない。It is not particularly limited.
芳香族ジカルボン酸若しくはその反応性誘導体および/
又は芳香族トリカルボン酸着しくはその反応性誘導体と
ジアミンとの重縮合反応については、公知の方法が利用
できる。aromatic dicarboxylic acid or its reactive derivative and/or
Alternatively, known methods can be used for the polycondensation reaction between aromatic tricarboxylic acid attachment or its reactive derivative and diamine.
2橿以上の芳香族ジアミンを使用すること。Use two or more aromatic diamines.
あるいは2種以上の芳香族ジカルボン酸若しくはその反
応性誘導体、2種以上の芳香族トリカルボン酸若しくは
その反応性誘導体を使用することによシ前記一般式+1
1で表わされる繰シ返し単位が相違する重合体を得るこ
とができる。Alternatively, by using two or more aromatic dicarboxylic acids or reactive derivatives thereof, or two or more aromatic tricarboxylic acids or reactive derivatives thereof, the general formula +1
Polymers having different repeating units represented by 1 can be obtained.
また、芳香族ジカルボン酸若しくはその反応性誘導体と
芳香族トリカルボン酸若しくはその反応性誘導体とを併
用することにより前記一般弐(1)で表わされる繰り返
し単位が相違する重合体を得ることができる。Further, by using an aromatic dicarboxylic acid or a reactive derivative thereof in combination with an aromatic tricarboxylic acid or a reactive derivative thereof, a polymer having different repeating units represented by the above-mentioned general 2 (1) can be obtained.
重合体は、ジメチルホルムアミド0.2重量%溶液にお
ける30℃での還元粘度が0.2〜0.2dJ/9であ
るのが好ましい。この還元粘度が小さすぎると、耐熱性
9機械的強度が低下し、太きすぎると熱溶融性が低下す
る傾向にある。The polymer preferably has a reduced viscosity of 0.2 to 0.2 dJ/9 at 30°C in a 0.2% by weight dimethylformamide solution. If the reduced viscosity is too small, the heat resistance 9 mechanical strength tends to decrease, and if it is too thick, the heat meltability tends to decrease.
本発明の接着剤はあらかじめシート状に成型しておきシ
ート状接着剤として用いることが有効である。また9本
発明の接着剤はガラス繊維等の耐熱性にすぐれた繊維の
薄布マットに、溶剤に溶かしたいわゆるフェスとして含
浸させ、乾燥して得る繊維強化凰のフィルム状接着剤と
して用いることもできる。本発明の接着剤の粉末を圧着
して用いることもできる。It is effective to form the adhesive of the present invention into a sheet in advance and use it as a sheet adhesive. 9 The adhesive of the present invention can also be used as a film-like adhesive for fiber-reinforced glass obtained by impregnating a thin cloth mat made of fibers with excellent heat resistance, such as glass fiber, in the form of a so-called festival dissolved in a solvent and drying it. can. The powder of the adhesive of the present invention can also be used by pressure bonding.
本発明の接着剤のフェスをそのtま被着物に塗布、乾燥
し、他の被着物と加熱溶融圧着することができる。The face of the adhesive of the present invention can be applied to an adherend, dried, and heat-melted and pressed to another adherend.
本発明のホットメルト接着剤のフェスをポリイミドフィ
ルムの片面tiは両面に塗工し乾燥させたホットメルト
接着剤層付ポリイミドフィルムはこれと金属箔とを加熱
溶融圧着してフレキシブル印刷回路用基板等を製造する
のに特に有効である。The hot-melt adhesive face of the present invention is coated on one side of a polyimide film and then dried on both sides.The hot-melt adhesive layer-coated polyimide film is then heat-melted and pressure-bonded with metal foil to produce flexible printed circuit boards, etc. It is particularly effective for manufacturing.
加熱溶融圧着は50〜400℃の温度で1〜1000
kg/cm”の圧力で1秒〜30分加圧することが好ま
しい。200〜350℃の温度で10〜500 ka/
cx?の圧力で10秒〜10分加圧することがより好ま
しい。250〜330℃の温度で50〜200 kg/
am”の圧力で30秒〜1分加圧することが特に好まし
い。Heat melt compression bonding is performed at a temperature of 50 to 400℃ and a temperature of 1 to 1000℃.
It is preferable to pressurize for 1 second to 30 minutes at a pressure of 10 to 500 ka/cm at a temperature of 200 to 350°C.
cx? It is more preferable to pressurize at a pressure of 10 seconds to 10 minutes. 50-200 kg/at a temperature of 250-330℃
It is particularly preferable to apply pressure at a pressure of 30 seconds to 1 minute.
更に1本発明の接着剤には、二酸化アンチモン。Furthermore, the adhesive of the present invention includes antimony dioxide.
水酸化アルミニウム、ホウ酸バリウム等の離燃性無機化
合物、シリカ、アルミナ、マイカ、酸化チタン、ジルコ
ニア、珪酸カルシウム、水酸化マグネシウム、酸化マグ
ネシウム、酸化鉄、炭酸カルシウム、炭化ケイ素、窒化
ホウ素、銀粉、金粉。Flammable inorganic compounds such as aluminum hydroxide and barium borate, silica, alumina, mica, titanium oxide, zirconia, calcium silicate, magnesium hydroxide, magnesium oxide, iron oxide, calcium carbonate, silicon carbide, boron nitride, silver powder, Gold powder.
銅粉、ニッケル粉等の無機フィラーを接着剤総量に対し
て70重量パーセント以下の割合で含有させてもよい。An inorganic filler such as copper powder or nickel powder may be contained in an amount of 70% by weight or less based on the total amount of the adhesive.
これら無機フィラーが70重量パーセントを越えると、
接着剤フローが小さくなり接着強度が低下する傾向にあ
る。さらに、これら以外の充てん剤、安定剤、界面活性
剤、溶剤などを目的に応じて含んでいてもよい。When these inorganic fillers exceed 70% by weight,
Adhesive flow tends to decrease and adhesive strength decreases. Furthermore, fillers, stabilizers, surfactants, solvents, etc. other than these may be included depending on the purpose.
本発明における金属箔としては鋼箔、アルミ箔等があげ
られる。Examples of the metal foil in the present invention include steel foil and aluminum foil.
本発明における金属板としてはアルミ板、スチール板、
チタン板等があげられる。Metal plates in the present invention include aluminum plates, steel plates,
Examples include titanium plates.
ポリイミドフィルムと金属箔とを本発明のホットメルト
接着剤からなるホットメルト接着剤層を介して接着させ
てなるフレキシブル印刷回路用基板は有用である。A flexible printed circuit board formed by bonding a polyimide film and a metal foil through a hot melt adhesive layer made of the hot melt adhesive of the present invention is useful.
また金属板と金属箔とを本発明のホットメルト接着剤か
らなるホントメルト接着剤層を介して接着させてなる金
属ペース印刷回路用基板を有用でちる。Also useful is a metal paste printed circuit board formed by bonding a metal plate and a metal foil through a real melt adhesive layer made of the hot melt adhesive of the present invention.
(実施例)
次に9本発明を実施例により説明するが2本発明はこれ
らKよりなんら制限されるものではない。(Example) Next, the present invention will be explained with reference to Examples, but the present invention is not limited in any way by these Examples.
実施例1
温度計、攪拌機、窒素導入管9分留頭をとりつけた4つ
ロフラスコに窒素下、2.2−ビス〔4−(4−アミノ
フェノキシ)フェニル〕プロパン2059(0,5モル
)を入れ、N−メチル−2−ピロリドン705gに溶解
した。この溶液を一10℃に冷却し、この温度でトリメ
リット酸無水物モノクロライド105.39 (0,5
モル)を温度が一5℃を越え危いように添加した。トリ
メリット酸無水物モノクロライドが溶解し九ら、トリエ
チルアミン769を温度が5℃を超えないように添加し
。Example 1 2.2-bis[4-(4-aminophenoxy)phenyl]propane 2059 (0.5 mol) was added to a four-loaf flask equipped with a thermometer, a stirrer, and a nitrogen inlet tube with a 9-fraction head under nitrogen. and dissolved in 705 g of N-methyl-2-pyrrolidone. This solution was cooled to -10°C, and at this temperature trimellitic anhydride monochloride 105.39 (0.5
mol) was added so that the temperature dangerously exceeded 15°C. Once the trimellitic anhydride monochloride was dissolved, triethylamine 769 was added so that the temperature did not exceed 5°C.
N−メチル−2−ピロリドン503gを追加した。503 g of N-methyl-2-pyrrolidone was added.
室温で1時間攪拌後、190℃で9時間反応させて、イ
ミド化を完結させ九。After stirring at room temperature for 1 hour, the reaction was carried out at 190°C for 9 hours to complete imidization.
得られた反応液をメタノール中に投入して9重合体を単
離させた。これを乾燥した後再びN、N−ジメチルホル
ムアミドに溶解し、これをメタノール中に投入してポリ
アミドイミド重合体を精製し、減圧乾燥した。The resulting reaction solution was poured into methanol to isolate polymer 9. After drying this, it was again dissolved in N,N-dimethylformamide, poured into methanol to purify the polyamideimide polymer, and dried under reduced pressure.
この重合体の還元粘度(ηsp/c)(N、N−ジメチ
ルホルムアミド0.2重量%溶液、30℃で測定。Reduced viscosity (ηsp/c) of this polymer (measured in a 0.2% by weight solution of N,N-dimethylformamide at 30°C.
以下は同様)は0.89 di/ gであつ九。The same applies below) is 0.89 di/g.
得られた重合体粉末をN、N−ジメチルホルムアミドに
溶解し25チ溶液とし、ガラス板上にI Q Oμmの
厚さ1cI5!延し、100℃−t’ 1 時ISJ’
l乾燥後、乾燥後板ガラス板はがし、鉄わくに固定し。The obtained polymer powder was dissolved in N,N-dimethylformamide to make a 25% solution and placed on a glass plate at a thickness of 1cI5 with an IQ of Oμm. 100℃-t' 1 hour ISJ'
After drying, remove the glass plate and fix it on an iron frame.
250℃で1時間乾燥し、厚さ25μmのシートを得た
。It was dried at 250° C. for 1 hour to obtain a sheet with a thickness of 25 μm.
得られたシートを、厚さ2■のアルミ板と厚さ35μm
の鋼箔の間にはさみ、加熱圧縮成形機で。The obtained sheet was placed between a 2cm thick aluminum plate and a 35μm thick aluminum plate.
sandwiched between steel foils and heated in a compression molding machine.
300℃の温度で20kg/cm”の圧力で1分間加圧
して圧着し、金属ベース鋼張板を得た。Pressure was applied for 1 minute at a temperature of 300° C. and a pressure of 20 kg/cm” to obtain a metal base steel clad plate.
特性を表1に示した。The characteristics are shown in Table 1.
実施例2
温度計、攪拌機、窒素導入管、冷却管をとりつけた4つ
ロフラスコに窒素下、ス2−ビス〔4−(4−アミノフ
ェノキシ)フェニル〕プロパン147.69(0,36
モル)と1,3−ビス(アミノプロピル)テトラメチル
ジシロキサン9.929(0,04モル)、プロピレン
オキサイド34.89(0,6モル)を入れ、N、N−
ジメチルアセトアミド564gに溶解した。この溶液を
0℃に冷却し、この温度でトリメリット酸無水物モノク
ロライド84.29(0,4モル)を温度が5℃を超え
ないように添加した。室温で3時間攪拌後、無水酢酸2
009. ピリジン509を加え60℃で1昼夜攪拌
を続けた。得られた反応液を実施例1と同様に単離、精
製した。このポリアミドイミド重合体の還元粘度は0.
73 di/nであった。Example 2 147.69 (0,36
), 9.929 (0.04 mol) of 1,3-bis(aminopropyl)tetramethyldisiloxane, and 34.89 (0.6 mol) of propylene oxide were added, and N,N-
Dissolved in 564 g of dimethylacetamide. The solution was cooled to 0°C and at this temperature 84.29 (0.4 mol) of trimellitic anhydride monochloride was added such that the temperature did not exceed 5°C. After stirring at room temperature for 3 hours, acetic anhydride 2
009. Pyridine 509 was added and stirring was continued at 60°C for one day and night. The obtained reaction solution was isolated and purified in the same manner as in Example 1. The reduced viscosity of this polyamideimide polymer is 0.
It was 73 di/n.
実施例1と同様にシートを作製し、このシートを耐熱性
接着剤として、実施例1と同様に金属ベース鋼張板を得
た。A sheet was produced in the same manner as in Example 1, and a metal base steel clad plate was obtained in the same manner as in Example 1 using this sheet as a heat-resistant adhesive.
特性を表1に示した。The characteristics are shown in Table 1.
実施例3
温度計、攪拌機、窒素導入管、冷却管をとシつけた4つ
ロフラスコに窒素下、ス2−ビス〔4−(4−7ミノフ
エノキシ)フェニル〕プロパンzosg(o、sモル)
、プロピレンオキサイド69.8 s (1,2モル)
を入れN−メチル−2−ピロリドンtzoogに溶解し
た。この溶液を一5℃に冷却し、この温度でイソフタル
酸ジクロライド101.59 (0,5モル)を温度が
20℃を超えないように添加した。室温で3時間攪拌を
続けた。Example 3 2-bis[4-(4-7minophenoxy)phenyl]propane zosg (o, s mol) was added to a four-bottle flask equipped with a thermometer, stirrer, nitrogen inlet tube, and condenser under nitrogen.
, propylene oxide 69.8 s (1,2 mol)
and dissolved in N-methyl-2-pyrrolidone tzoog. The solution was cooled to -5°C and at this temperature 101.59 (0.5 mol) of isophthalic dichloride was added such that the temperature did not exceed 20°C. Stirring was continued for 3 hours at room temperature.
得られた反応液を実施例1と同様にして単離。The obtained reaction solution was isolated in the same manner as in Example 1.
精製した。このポリアミド重合体の還元粘度は1、Od
//sであつ九。Purified. The reduced viscosity of this polyamide polymer is 1, Od
//s and nine.
実施例1と同様にシートを作製し、このシートを耐熱性
接着剤として、実施例1と同様に、金属ベース鋼張板を
得た。A sheet was produced in the same manner as in Example 1, and a metal base steel clad plate was obtained in the same manner as in Example 1 using this sheet as a heat-resistant adhesive.
特性を表1に示した。The characteristics are shown in Table 1.
実施例4
実施例1において、2.2−ビス(4−(4−アミノフ
ェノキシ)フェニル〕プロパン205g(0,5モル)
ヲヒス[4−(4−アミノフエノキシ)フェニル〕スル
ホン2169(0,5モル)ニする以外は実施例1と同
様にしてポリアミドイミド重合体を得た。得られたポリ
アミドイミド重合体の還元粘度は0.66 di/gで
ろつ九。Example 4 In Example 1, 205 g (0.5 mol) of 2,2-bis(4-(4-aminophenoxy)phenyl)propane
A polyamide-imide polymer was obtained in the same manner as in Example 1 except that 2169 (0.5 mol) of 2169 (0.5 mol) of sulfone was added. The resulting polyamide-imide polymer had a reduced viscosity of 0.66 di/g.
実施例1と同様にシートを作製した。A sheet was produced in the same manner as in Example 1.
このシートを、厚さ2awのアルミ板と厚さ35μmの
鋼箔の間にはさみ、加熱圧縮成形機で320℃の温度で
20kg/am”の圧力で1分間加圧して圧着し、金属
ペース鋼張板を得た。This sheet was sandwiched between an aluminum plate with a thickness of 2 aw and a steel foil with a thickness of 35 μm, and was pressed with a heating compression molding machine at a temperature of 320°C and a pressure of 20 kg/am for 1 minute to bond the sheet to the metal paste sheet. I got the veneer.
特性を表1に示した。The characteristics are shown in Table 1.
実施例5
実施例1で得九ポリアミドイミド重合体粉末をジエチレ
ングリコールジメチルエーテルに溶解し。Example 5 The nine polyamideimide polymer powders obtained in Example 1 were dissolved in diethylene glycol dimethyl ether.
25%溶液とし、厚さ50μmのポリイミドフィルム(
Dupont社製カプトン)に乾燥後の厚み25μmに
なるように塗布し、100℃で30分。A 25% solution and a 50 μm thick polyimide film (
After drying, the solution was applied to Kapton (manufactured by DuPont) to a thickness of 25 μm and heated at 100°C for 30 minutes.
250℃で1時間乾燥しホットメルト接着剤層付ポリイ
ミドフィルムを得た。次に35μmの鋼箔をホットメル
ト接着剤層付ポリイミドフィルムの接着剤層を設けた面
にのせ、加熱圧縮成形機にて。It was dried at 250° C. for 1 hour to obtain a polyimide film with a hot melt adhesive layer. Next, a 35 μm steel foil was placed on the surface of the hot-melt adhesive-layered polyimide film on which the adhesive layer was provided, and a hot-compression molding machine was used.
300℃の温度で10kg/am”の圧力で1分間加圧
して圧着し、フレキシブル鋼張板を得た。Pressure was applied for 1 minute at a temperature of 300° C. and a pressure of 10 kg/am” to obtain a flexible steel clad plate.
特性を表1に示した。The characteristics are shown in Table 1.
実施例6
実施例1で得た接着剤のシートを厚を50μmのポリイ
ミドフィルム(Dupont社製カプトン)と厚さ35
μmの銅箔の間にはさんで、加熱圧縮成形機にて、30
0℃の温度で10kg/cm”の圧力で1分間加圧して
圧着しフレキシブル鋼張板を得た。Example 6 The adhesive sheet obtained in Example 1 was coated with a 50 μm thick polyimide film (Kapton, manufactured by DuPont) and a 35 μm thick polyimide film (Kapton, manufactured by Dupont).
Sandwiched between μm copper foil, heated and compression molded for 30 min.
A flexible steel clad plate was obtained by pressurizing and bonding at a temperature of 0° C. and a pressure of 10 kg/cm” for 1 minute.
特性を表1に示す。The characteristics are shown in Table 1.
比較例1
本発明に係る接着フィルムのかわHCバイララックス(
Dupont社製アクリル系シート状接着剤)を用い実
施例6と同様にして180℃、301gf/cm”、
60分の条件で積層し、フレキシブル鋼張板を得た。Comparative Example 1 Adhesive film glue HC Vyralux (
DuPont's acrylic sheet adhesive) was used in the same manner as in Example 6 at 180°C and 301gf/cm''.
Lamination was carried out for 60 minutes to obtain a flexible steel clad plate.
特性を表1に示す。The characteristics are shown in Table 1.
比較例2
温度計、攪拌機、窒素導入管、冷却管をとりつff7’
j4つロフラスコに窒素下、2.2−ビス〔4−(4−
アミノフェノキ7ンフエニル〕プロパン2059(0,
5モル)を入れN−メチル−2−ピロリド7705gに
溶解した。この溶液に室温でピロメリット酸二無水物1
109(0,5モル)を加え、20時間攪拌を続けた。Comparative example 2 ff7' with thermometer, stirrer, nitrogen introduction tube, and cooling tube
2.2-bis[4-(4-
Aminophenoxyphenyl]propane 2059 (0,
5 mol) and dissolved in 7705 g of N-methyl-2-pyrrolide. Add 1 pyromellitic dianhydride to this solution at room temperature.
109 (0.5 mol) was added and stirring continued for 20 hours.
このようにして得られたポリアミド酸フェスをガラス板
上に乾燥後の厚みが25μmになるように流延し、10
0℃で1時間乾燥し、はがして鉄わくに固定し250℃
で2時間、300℃で2時間イミド化を行ないポリイミ
ドのシートを得た。The polyamic acid face obtained in this way was cast onto a glass plate so that the thickness after drying was 25 μm.
Dry at 0℃ for 1 hour, peel off and fix on a steel frame at 250℃.
Imidization was carried out at 300° C. for 2 hours and at 300° C. for 2 hours to obtain a polyimide sheet.
このポリイミドのシートを接着剤として実施例5と同様
の構成で350℃、 50kg/cm”、 1分の条
件で加熱圧着しフレキシブル鋼張板を得た。Using this polyimide sheet as an adhesive, a flexible steel clad plate was obtained by heat-pressing the same composition as in Example 5 at 350° C. and 50 kg/cm” for 1 minute.
特性を表1に示す。The characteristics are shown in Table 1.
表1 各種鋼張板の特性
簀これらの試験はJIS C6481r印刷回路用鋼張
積層板試験方法」に準じて行った。Table 1 Characteristics of various steel clad plates These tests were conducted in accordance with JIS C6481r Test Method for Steel Clad Laminates for Printed Circuits.
(発明の効果)
本発明のホットメルト接着剤は、耐熱性と溶融性にすぐ
れる重合体からなっているため、短時間で加熱溶融接着
でき、高温まですぐれた接着力を有し、高温放置後での
劣化も少ない。(Effects of the invention) Since the hot melt adhesive of the present invention is made of a polymer with excellent heat resistance and meltability, it can be heated and melted in a short time, has excellent adhesive strength even at high temperatures, and can be left unattended at high temperatures. There is also less deterioration later.
本発明のホットメルト接着剤は、あらかじめシート状と
して使用することもできる。また、溶剤にも可溶である
ので、あらかじめ、ポリイミドフィルム等の基材に塗布
乾燥し、他の被着体と加熱溶融接着することもできる。The hot melt adhesive of the present invention can also be used in advance in the form of a sheet. Furthermore, since it is soluble in solvents, it can be coated and dried on a base material such as a polyimide film in advance, and then heat-melted and bonded to another adherend.
そして9本発明のホシトメルト接着剤を用いた印刷回路
用基板は耐熱性、接着力にすぐれ、高温にさらされても
すぐれた性能を発揮する。9 Printed circuit boards using the Hositomelt adhesive of the present invention have excellent heat resistance and adhesive strength, and exhibit excellent performance even when exposed to high temperatures.
Claims (1)
する重合体を含有してなるホットメルト接着剤。 ▲数式、化学式、表等があります▼( I ) 〔式中、R_1、R_2、R_3及びR_4はそれぞれ
独立に水素、低級アルキル基、低級アルコキシ基又はハ
ロゲンを示し、Xは結合、−O−、−S−、▲数式、化
学式、表等があります▼、−SO_2−、▲数式、化学
式、表等があります▼、▲数式、化学式、表等がありま
す▼、▲数式、化学式、表等があります▼又は▲数式、
化学式、表等があります▼を示し(ここでR_5及びR
_6は各々独立して水素、低級アルキル基、トリフルオ
ロメチル基、トリクロロメチル基又はフェニル基を示す
)Xは繰り返し単位毎に相違してもよく、Yは▲数式、
化学式、表等があります▼ 又は▲数式、化学式、表等があります▼を示し(ここで
、Ar は芳香族の二価の基を、Ar′は芳香族の三価の基を示
す)Yは繰り返し単位毎に相違してもよい。〕2、一般
式( I )で表わされる繰り返し単位が▲数式、化学式
、表等があります▼ である請求項1記載のホットメルト接着剤。 3、一般式( I )で表わされる繰り返し単位が▲数式
、化学式、表等があります▼ である請求項1記載のホットメルト接着剤。 4 シート状である請求項1、2又は3記載のホットメ
ルト接着剤。 5、ポリイミドフィルムの片面又は両面に下記一般式(
I )で表わされる繰り返し単位を有する重合体を含有
してなるホットメルト接着剤層を設けてなるホットメル
ト接着剤層付ポリイミドフィルム。 ▲数式、化学式、表等があります▼( I ) 〔式中、R_1、R_2、R_3及びR_4はそれぞれ
独立に水素、低級アルキル基、低級アルコキシ基又はハ
ロゲンを示し、Xは結合、−O−、−S−、▲数式、化
学式、表等があります▼、−SO_2−、▲数式、化学
式、表等があります▼、▲数式、化学式、表等がありま
す▼、▲数式、化学式、表等があります▼又は▲数式、
化学式、表等があります▼を示し(ここでR_5及びR
_6は各々独立して水素、低級アルキル基、トリフルオ
ロメチル基、トリクロロメチル基又はフェニル基を示す
)Xは繰り返し単位毎に相違してもよく、Yは▲数式、
化学式、表等があります▼ 又は▲数式、化学式、表等があります▼を示し(ここで
、Ar は芳香族の二価の基を、Ar′は芳香族の三価の基を示
す)Yは繰り返し単位毎に相違してもよい。〕6、一般
式( I )で表わされる繰り返し単位が▲数式、化学式
、表等があります▼ である請求項5記載のホットメルト接着剤層付ポリイミ
ドフィルム。 7、一般式( I )で表わされる繰り返し単位が▲数式
、化学式、表等があります▼ である請求項5記載のホットメルト接着剤層付ポリイミ
ドフィルム。 8、ポリイミドフィルムと金属箔とを下記一般式( I
)で表わされる繰り返し単位を有する重合体を含有して
なるホットメルト接着剤層を介して接着させてなるフレ
キシブル印刷回路用基板。 ▲数式、化学式、表等があります▼ 〔式中、R_1、R_2、R_3及びR_4はそれぞれ
独立に水素、低級アルキル基、低級アルコキシ基又はハ
ロゲンを示し、Xは結合、−O−、−S−、▲数式、化
学式、表等があります▼、−SO_2−、▲数式、化学
式、表等があります▼、▲数式、化学式、表等がありま
す▼、▲数式、化学式、表等があります▼又は▲数式、
化学式、表等があります▼を示し(ここでR_5及びR
_6は各々独立して水素、低級アルキル基、トリフルオ
ロメチル基、トリクロロメチル基又はフェニル基を示す
)Xは繰り返し単位毎に相違してもよく、Yは▲数式、
化学式、表等があります▼ 又は▲数式、化学式、表等があります▼を示し(ここで
、Ar は芳香族の二価の基を、Ar′は芳香族の三価の基を示
す)Yは繰り返し単位毎に相違してもよい。〕9、一般
式( I )で表わされる繰り返し単位が、▲数式、化学
式、表等があります▼ ▲数式、化学式、表等があります▼ である請求項8記載のフレキシブル印刷回路用基板。 10、一般式( I )で表わされる繰り返し単位が▲数
式、化学式、表等があります▼ である請求項8記載のフレキシブル印刷回路用基板。 11、金属板と金属箔とを下記一般式( I )で表わさ
れる繰り返し単位を有する重合体を含有してなるホット
メルト接着剤層を介して接着させてなる金属ベース印刷
回路用基板。 ▲数式、化学式、表等があります▼( I ) 〔式中、R_1、R_2、R_3及びR_4はそれぞれ
独立に水素、低級アルキル基、低級アルコキシ基又はハ
ロゲンを示し、Xは結合、−O−、−S−、▲数式、化
学式、表等があります▼、−SO_2−、▲数式、化学
式、表等があります▼、▲数式、化学式、表等がありま
す▼、▲数式、化学式、表等があります▼又は▲数式、
化学式、表等があります▼を示し(ここでR_5及びR
_6は各々独立して水素、低級アルキル基、トリフルオ
ロメチル基、トリクロロメチル基又はフェニル基を示す
)Xは繰り返し単位毎に相違してもよく、Yは▲数式、
化学式、表等があります▼ 又は▲数式、化学式、表等があります▼を示し(ここで
、Ar は芳香族の二価の基を、Ar′は芳香族の三価の基を示
す)Yは繰り返し単位毎に相違してもよい。〕12、一
般式( I )で表わされる繰り返し単位が▲数式、化学
式、表等があります▼ である請求項11記載の金属ベース印刷回路用基板。 13、一般式( I )で表わされる繰り返し単位が▲数
式、化学式、表等があります▼ である請求項11記載の金属ベース印刷回路用基板。[Claims] 1. A hot melt adhesive comprising a polymer having a repeating unit represented by the following general formula (I). ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (I) [In the formula, R_1, R_2, R_3, and R_4 each independently represent hydrogen, a lower alkyl group, a lower alkoxy group, or a halogen, and X is a bond, -O-, -S-, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, -SO_2-, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ or ▲ formula,
There are chemical formulas, tables, etc. ▼ (Here, R_5 and R
_6 each independently represents hydrogen, a lower alkyl group, a trifluoromethyl group, a trichloromethyl group, or a phenyl group) X may be different for each repeating unit, and Y is ▲ formula,
There are chemical formulas, tables, etc. ▼ or ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (Here, Ar represents an aromatic divalent group, Ar' represents an aromatic trivalent group) It may be different for each repeating unit. 2. The hot melt adhesive according to claim 1, wherein the repeating unit represented by the general formula (I) is ▲a mathematical formula, a chemical formula, a table, etc.▼. 3. The hot melt adhesive according to claim 1, wherein the repeating unit represented by the general formula (I) is ▲a mathematical formula, a chemical formula, a table, etc.▼. 4. The hot melt adhesive according to claim 1, 2 or 3, which is in the form of a sheet. 5. The following general formula (
A polyimide film with a hot melt adhesive layer comprising a polymer having a repeating unit represented by I). ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (I) [In the formula, R_1, R_2, R_3, and R_4 each independently represent hydrogen, a lower alkyl group, a lower alkoxy group, or a halogen, and X is a bond, -O-, -S-, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, -SO_2-, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ or ▲ formula,
There are chemical formulas, tables, etc. ▼ (Here, R_5 and R
_6 each independently represents hydrogen, a lower alkyl group, a trifluoromethyl group, a trichloromethyl group, or a phenyl group) X may be different for each repeating unit, and Y is ▲ formula,
There are chemical formulas, tables, etc. ▼ or ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (Here, Ar represents an aromatic divalent group, Ar' represents an aromatic trivalent group) It may be different for each repeating unit. [6] The polyimide film with a hot-melt adhesive layer according to claim 5, wherein the repeating unit represented by the general formula (I) is ▲a mathematical formula, a chemical formula, a table, etc.▼. 7. The polyimide film with a hot melt adhesive layer according to claim 5, wherein the repeating unit represented by the general formula (I) is ▲a mathematical formula, a chemical formula, a table, etc.▼. 8. Polyimide film and metal foil are combined using the following general formula (I
) A flexible printed circuit board adhered via a hot melt adhesive layer containing a polymer having repeating units represented by: ▲There are mathematical formulas, chemical formulas, tables, etc.▼ [In the formula, R_1, R_2, R_3, and R_4 each independently represent hydrogen, a lower alkyl group, a lower alkoxy group, or a halogen, and X is a bond, -O-, -S- , ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, -SO_2-, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ or ▲ formula,
There are chemical formulas, tables, etc. ▼ (Here, R_5 and R
_6 each independently represents hydrogen, a lower alkyl group, a trifluoromethyl group, a trichloromethyl group, or a phenyl group) X may be different for each repeating unit, and Y is ▲ formula,
There are chemical formulas, tables, etc. ▼ or ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (Here, Ar represents an aromatic divalent group, Ar' represents an aromatic trivalent group) It may be different for each repeating unit. [9] The flexible printed circuit board according to claim 8, wherein the repeating unit represented by the general formula (I) is ▲A mathematical formula, a chemical formula, a table, etc.▼ ▲A mathematical formula, a chemical formula, a table, etc.▼ 10. The flexible printed circuit board according to claim 8, wherein the repeating unit represented by the general formula (I) is ▲a mathematical formula, a chemical formula, a table, etc.▼. 11. A metal-based printed circuit board formed by adhering a metal plate and a metal foil through a hot-melt adhesive layer containing a polymer having a repeating unit represented by the following general formula (I). ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (I) [In the formula, R_1, R_2, R_3, and R_4 each independently represent hydrogen, a lower alkyl group, a lower alkoxy group, or a halogen, and X is a bond, -O-, -S-, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, -SO_2-, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ or ▲ formula,
There are chemical formulas, tables, etc. ▼ (Here, R_5 and R
_6 each independently represents hydrogen, a lower alkyl group, a trifluoromethyl group, a trichloromethyl group, or a phenyl group) X may be different for each repeating unit, and Y is ▲ formula,
There are chemical formulas, tables, etc. ▼ or ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (Here, Ar represents an aromatic divalent group, Ar' represents an aromatic trivalent group) It may be different for each repeating unit. 12. The metal-based printed circuit board according to claim 11, wherein the repeating unit represented by the general formula (I) is ▲a mathematical formula, a chemical formula, a table, etc.▼. 13. The metal-based printed circuit board according to claim 11, wherein the repeating unit represented by the general formula (I) is ▲a mathematical formula, a chemical formula, a table, etc.▼.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63097802A JP2866654B2 (en) | 1988-04-20 | 1988-04-20 | Hot melt adhesive, polyimide film with hot melt adhesive layer, and printed circuit board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63097802A JP2866654B2 (en) | 1988-04-20 | 1988-04-20 | Hot melt adhesive, polyimide film with hot melt adhesive layer, and printed circuit board |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01268778A true JPH01268778A (en) | 1989-10-26 |
JP2866654B2 JP2866654B2 (en) | 1999-03-08 |
Family
ID=14201914
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63097802A Expired - Lifetime JP2866654B2 (en) | 1988-04-20 | 1988-04-20 | Hot melt adhesive, polyimide film with hot melt adhesive layer, and printed circuit board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2866654B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05105850A (en) * | 1991-10-16 | 1993-04-27 | Sumitomo Bakelite Co Ltd | Adhesive tape for electronics |
WO2005007756A1 (en) * | 2003-05-21 | 2005-01-27 | Hitachi Chemical Co., Ltd. | Primer, conductor foil with resin, laminate and process for producing the laminate |
JP2012255119A (en) * | 2011-06-10 | 2012-12-27 | Hitachi Chemical Co Ltd | Polyamideimide resin, insulating coating material and insulating wire using the same |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5515826A (en) * | 1978-07-21 | 1980-02-04 | Asahi Chemical Ind | Polyimide film provided with heattproof adhesive layer |
JPS58157190A (en) * | 1982-03-12 | 1983-09-19 | 日立化成工業株式会社 | Method of producing substrate for flexible printed circuit |
JPS6051722A (en) * | 1983-08-30 | 1985-03-23 | Hitachi Chem Co Ltd | Production of particulate polymer |
JPS6243420A (en) * | 1985-08-20 | 1987-02-25 | Hitachi Chem Co Ltd | Production of polyamide-imide resin |
JPS62235382A (en) * | 1986-04-03 | 1987-10-15 | Hitachi Chem Co Ltd | Thermosetting adhesive film |
JPS62270625A (en) * | 1985-12-18 | 1987-11-25 | Hitachi Chem Co Ltd | Polyether-amide-imide polymer composition |
JPH01240525A (en) * | 1988-03-20 | 1989-09-26 | New Japan Chem Co Ltd | Aromatic polyamide and resin composition thereof |
JPH01502914A (en) * | 1987-03-31 | 1989-10-05 | アモコ・コーポレーション | Polyamideimide composition |
-
1988
- 1988-04-20 JP JP63097802A patent/JP2866654B2/en not_active Expired - Lifetime
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5515826A (en) * | 1978-07-21 | 1980-02-04 | Asahi Chemical Ind | Polyimide film provided with heattproof adhesive layer |
JPS58157190A (en) * | 1982-03-12 | 1983-09-19 | 日立化成工業株式会社 | Method of producing substrate for flexible printed circuit |
JPS6051722A (en) * | 1983-08-30 | 1985-03-23 | Hitachi Chem Co Ltd | Production of particulate polymer |
JPS6243420A (en) * | 1985-08-20 | 1987-02-25 | Hitachi Chem Co Ltd | Production of polyamide-imide resin |
JPS62270625A (en) * | 1985-12-18 | 1987-11-25 | Hitachi Chem Co Ltd | Polyether-amide-imide polymer composition |
JPS62235382A (en) * | 1986-04-03 | 1987-10-15 | Hitachi Chem Co Ltd | Thermosetting adhesive film |
JPH01502914A (en) * | 1987-03-31 | 1989-10-05 | アモコ・コーポレーション | Polyamideimide composition |
JPH01240525A (en) * | 1988-03-20 | 1989-09-26 | New Japan Chem Co Ltd | Aromatic polyamide and resin composition thereof |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05105850A (en) * | 1991-10-16 | 1993-04-27 | Sumitomo Bakelite Co Ltd | Adhesive tape for electronics |
WO2005007756A1 (en) * | 2003-05-21 | 2005-01-27 | Hitachi Chemical Co., Ltd. | Primer, conductor foil with resin, laminate and process for producing the laminate |
US7648770B2 (en) | 2003-05-21 | 2010-01-19 | Hitachi Chemical Company, Ltd. | Primer, conductor foil with resin, laminated sheet and method of manufacturing laminated sheet |
US8507100B2 (en) | 2003-05-21 | 2013-08-13 | Hitachi Chemical Company, Ltd. | Primer, conductor foil with resin, laminated sheet and method of manufacturing laminated sheet |
JP2012255119A (en) * | 2011-06-10 | 2012-12-27 | Hitachi Chemical Co Ltd | Polyamideimide resin, insulating coating material and insulating wire using the same |
Also Published As
Publication number | Publication date |
---|---|
JP2866654B2 (en) | 1999-03-08 |
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