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JPH01222089A - Amorphous alloy electroplated steel sheet and production thereof - Google Patents

Amorphous alloy electroplated steel sheet and production thereof

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Publication number
JPH01222089A
JPH01222089A JP4934588A JP4934588A JPH01222089A JP H01222089 A JPH01222089 A JP H01222089A JP 4934588 A JP4934588 A JP 4934588A JP 4934588 A JP4934588 A JP 4934588A JP H01222089 A JPH01222089 A JP H01222089A
Authority
JP
Japan
Prior art keywords
steel sheet
amorphous alloy
tungsten
electroplated steel
iron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4934588A
Other languages
Japanese (ja)
Inventor
Hidekuni Yoshida
英邦 吉田
Toshimasa Hino
日野 敏正
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KIYUUTOKU KK
MIKADO SANGYO KK
Original Assignee
KIYUUTOKU KK
MIKADO SANGYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KIYUUTOKU KK, MIKADO SANGYO KK filed Critical KIYUUTOKU KK
Priority to JP4934588A priority Critical patent/JPH01222089A/en
Publication of JPH01222089A publication Critical patent/JPH01222089A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To improve the corrosion resistance of a steel sheet by forming an amorphous alloy film on the steel sheet by plating with a plating bath contg. an iron family metal, an active metal, a metalloid salt, an org. acid and a neutral salt for adjusting pH at a prescribed relative flow rate. CONSTITUTION:A plating bath contg. an iron family metal (Fe, Co or Ni), an active metal (Cr, Mo or W), a salt of a metalloid (P, S, C, Si or B), an org. acid (citric acid or tartaric acid) and a neutral salt (NH4Cl) is prepd. A steel sheet is plated with the plating bath at 0.3-1.5m/sec relative flow rate to obtain an electroplated steel sheet having an amorphous alloy film of >=0.5mum thickness consisting of the iron family metal, the active metal and the metalloid.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、非晶質合金めっきを施した耐食性に優れた鋼
板とその製造法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a steel plate coated with an amorphous alloy and having excellent corrosion resistance, and a method for manufacturing the same.

〔従来の技術〕[Conventional technology]

非晶質構造金属は結晶金属のような粒界がなく、格子欠
陥や偏析等の結晶構造上の不均一性がなく均質であるた
めに耐食性の優れていることに着目し、鋼板の耐食性を
向上するために非晶質合金皮膜を施す試みが種々行われ
ている。
Focusing on the fact that amorphous metals have excellent corrosion resistance because they are homogeneous and do not have grain boundaries like crystalline metals and have no crystal structure inhomogeneities such as lattice defects or segregation, we have developed a method for improving the corrosion resistance of steel sheets. Various attempts have been made to apply amorphous alloy coatings to improve the performance.

鋼板に非晶質合金皮膜を施すに当たっては、施すべき非
晶質合金の性質上、真空蒸着法、スパッタリング法のよ
うな物理的な付着による皮膜形成が適しているが、その
形成法自体が大面積品や大量生産に適していないこと、
高価である等の欠点を有する。
When applying an amorphous alloy film to a steel plate, physical adhesion methods such as vacuum evaporation and sputtering are suitable due to the nature of the amorphous alloy to be applied, but the formation method itself is very important. Not suitable for area products or mass production;
It has drawbacks such as being expensive.

そのため、従来、鋼板の大規模な耐食性皮膜の形成に利
用されている電気めっき法を適用する試みも、例えば、
特公昭61−54879号公報、特公昭61−1798
90号公報、特許出願公表 昭61−502263号公
報、特開昭61−37994号公報等に開示されている
For this reason, attempts have been made to apply electroplating methods, which have conventionally been used to form large-scale corrosion-resistant films on steel sheets, for example.
Special Publication No. Sho 61-54879, Special Publication No. Sho 61-1798
It is disclosed in Publication No. 90, Patent Application Publication No. Sho 61-502263, Japanese Unexamined Patent Publication No. Sho 61-37994, etc.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

ところが、非晶質合金皮膜鋼板は、専ら真空蒸着法、ス
パッタリング法等により製造されており、大面債品、大
量生産に適していないこと、高価であること、また広幅
の製作が困難であるために用途が限定されること、操作
条件に精密さを必要とするために品質のばらつきを避は
得ないこと等の欠点が指摘されている。
However, amorphous alloy coated steel sheets are manufactured exclusively by vacuum evaporation methods, sputtering methods, etc., and are not suitable for large-sized products or mass production, are expensive, and are difficult to manufacture in wide widths. Disadvantages have been pointed out, such as the limited use of the method, and the unavoidable variation in quality due to the need for precision in operating conditions.

そのため、非晶質合金皮膜鋼板の製造に当たって、安価
で、大量生産でき、幅広鋼板への適用に適した電気めっ
き法を用いることが考えられる。
Therefore, in manufacturing an amorphous alloy coated steel sheet, it may be possible to use an electroplating method that is inexpensive, can be mass-produced, and is suitable for application to wide steel sheets.

しかしながら、非晶質合金皮膜を電気めっき法により形
成する場合には、非晶質を形成するために皮膜中のタン
グステンと燐の濃度を上げ、また、皮膜形成後相当の管
理条件の下での後処理が必要となり、ここに電気めっき
法によって非晶質のめっき皮膜を形成することを困難に
する原因があった。
However, when forming an amorphous alloy film by electroplating, the concentration of tungsten and phosphorus in the film is increased to form an amorphous state, and after the film is formed, the film must be under suitable control conditions. Post-treatment is required, which makes it difficult to form an amorphous plating film by electroplating.

本発明の目的は、従来の亜鉛めっき並みに、簡単に非晶
質めっきを施した鋼板とその製造法を提供することにあ
る。
An object of the present invention is to provide a steel sheet that can be easily coated with amorphous plating similar to conventional zinc plating, and a method for manufacturing the same.

〔課題を解決するための手段〕[Means to solve the problem]

本発明は、鉄、ニッケル、コバルト等の鉄族金属と、ク
ロム、モリブデン、タングステン等の活性金属と、燐、
硫黄、炭素、珪素、硼素等の半金属とからなる非晶質合
金皮膜を有する電気めっき鋼板に係るものであって、上
記鉄族金属と、活性金属と、半金属の塩と、くえん酸、
酒石酸等の有機酸と、塩化アンモニウム等のpH調整の
ための中性塩とを含有するめっき浴に0.3〜1.釦/
sec、の相対流動速度を与えて電気めっき処理を行う
ことによって製造する。
The present invention combines iron group metals such as iron, nickel, and cobalt, active metals such as chromium, molybdenum, and tungsten, and phosphorus,
It relates to an electroplated steel sheet having an amorphous alloy film consisting of a metalloid such as sulfur, carbon, silicon, boron, etc., the iron group metal, an active metal, a salt of the metalloid, citric acid,
0.3-1. Button/
It is manufactured by performing an electroplating process by giving a relative flow rate of .sec.

また、上記の非晶質合金めっきは、従来の結晶質皮膜の
上に同様の条件で形成することができる。
Furthermore, the amorphous alloy plating described above can be formed on a conventional crystalline film under similar conditions.

本発明に係る鋼板の非晶質合金めっき層の厚みは、0.
5μm厚程度あれば充分である。
The thickness of the amorphous alloy plating layer of the steel sheet according to the present invention is 0.
A thickness of about 5 μm is sufficient.

第1図は、本発明の非晶質合金めっき鋼板の連続製造装
置を概念的に示すもので、1はデフレクタ−ロール2と
通電ロール3の間に形成された陽極4中を上方にv2 
の速度で走行する帯状めっき鋼板を示す。5はめっき浴
の循環液貯槽を示し、循環用ポンプ6からのめっき液は
噴出ノズル7から走行する鋼板1にV、の速度で吹付け
られる。
FIG. 1 conceptually shows an apparatus for continuous production of amorphous alloy coated steel sheets according to the present invention.
This figure shows a strip-shaped plated steel plate traveling at a speed of . Reference numeral 5 indicates a circulating liquid storage tank of the plating bath, and the plating liquid from the circulation pump 6 is sprayed from a jet nozzle 7 onto the traveling steel plate 1 at a speed of V.

めっき液の相対流動速度は、vl+v2となり、上記非
晶質合金めっき皮膜を得るための0.3〜1.5m/s
ec、の速度は、これらの帯状めっき鋼板の走行の向き
とめっき液の吹付は向きを対向せしめることによって簡
単に得ることができる。また、鋼板の走行速度を遅くし
、吹付は速度を速くすることによっても、その相対流動
速度を得ることができる。
The relative flow velocity of the plating solution is vl+v2, which is 0.3 to 1.5 m/s to obtain the above amorphous alloy plating film.
The speed of ec can be easily obtained by making the running direction of these strip-shaped plated steel plates and the spraying direction of the plating solution opposite to each other. The relative flow velocity can also be obtained by slowing down the traveling speed of the steel plate and increasing the spraying speed.

さらに、吹付は後のめっき液は循環路8から循環液貯槽
5に循環し、再使用が可能なように構成されている。9
はめっき浴の調整装置を示す。
Furthermore, the plating solution after spraying is circulated from the circulation path 8 to the circulation liquid storage tank 5, so that it can be reused. 9
shows the plating bath adjustment device.

添付の第2図〜第8図は、本発明における鉄族金属とし
てニッケル、活性金属としてタングステン、半金属とし
て燐、有機酸としてくえん酸、pH調整のための中性塩
として塩化アンモニウムを使用し、非晶質電気めっき法
によって非晶質皮膜を形成するに際しての各要因の影響
を示す。
The attached FIGS. 2 to 8 show the use of nickel as the iron group metal, tungsten as the active metal, phosphorus as the semimetal, citric acid as the organic acid, and ammonium chloride as the neutral salt for pH adjustment in the present invention. , shows the influence of each factor on forming an amorphous film by amorphous electroplating.

(1)流速と電流密度 第2図および第3図は、皮膜中のタングステンの濃度が
25 wt%の非晶質皮膜を形成するに際してのめっき
浴の相対流動速度の影響、とくにめっき浴の流動速度と
限界電流値との関係を示す図である。
(1) Flow rate and current density Figures 2 and 3 show the influence of the relative flow rate of the plating bath when forming an amorphous film with a tungsten concentration of 25 wt%, especially the flow of the plating bath. FIG. 3 is a diagram showing the relationship between speed and limit current value.

(えん酸    0.5  モル/β タングステン  0,3  モル/1 ニツケル    0.2  モル/β 燐        0.3  モル/lアンモニウム塩
 0.7  モル/! pHa、 0 温度      70℃ の電解液を流動させたときの電流密度の上昇と陰極電位
を測定した。その結果、第2図に示すように、相対流動
速度Vを高くすることにより、電流密度を多くすること
が可能であることが判る。
(Citric acid 0.5 mol/β Tungsten 0.3 mol/1 Nickel 0.2 mol/β Phosphorus 0.3 mol/l Ammonium salt 0.7 mol/! pHa, 0 Temperature 70℃ electrolyte solution was made to flow. The increase in current density and the cathode potential were measured when the current density was increased.As a result, as shown in FIG. 2, it was found that by increasing the relative flow velocity V, it was possible to increase the current density.

静止浴の場合の常用電流密度は5〜15 amp/dm
’であるが、相対流動速度を0.3〜1.5 m/se
c、とすることによって3Qamp/dm2まで高める
ことが可能である。さらに、めっき浴の流動による限界
電流値を示す第3図を参照することによって、流速を1
、5m/sec、とすると50〜60amp/dm”の
使用が可能であるが、それ以上の流速では電流の増加は
殆どないことが判る。
Typical current density for static bath is 5-15 amp/dm
', but the relative flow velocity is 0.3 to 1.5 m/se
c, it is possible to increase it to 3Qamp/dm2. Furthermore, by referring to Figure 3, which shows the limiting current value due to the flow of the plating bath, the flow rate can be increased to 1.
, 5 m/sec, it is possible to use 50 to 60 amp/dm'', but it can be seen that there is almost no increase in current at a flow rate higher than that.

(2)電解浴中のタングステン濃度 第4図は第2図に示す基本組成を有するめっき浴におい
て、皮膜中のタングステン含有率に及ぼす浴中タングス
テン濃度と電流密度の影響を示すグラフである。pH8
,0、温度60℃で、図示の電流密度の下での非晶質を
生成するためのタングステンの浴中濃度を示すもので、
非晶質の皮膜を形成するためのタングステン含有量は2
5wt、%必要であり、そのためには、電流密度と共に
浴中のタングステン濃度を増大する必要がある。
(2) Tungsten concentration in electrolytic bath FIG. 4 is a graph showing the influence of tungsten concentration in the bath and current density on the tungsten content in the film in a plating bath having the basic composition shown in FIG. pH8
, 0, which shows the concentration of tungsten in the bath to produce an amorphous material at a temperature of 60° C. and under the current density shown.
The tungsten content to form an amorphous film is 2
5 wt.%, which requires increasing the tungsten concentration in the bath along with the current density.

(3〕  浴温 第5図は第2図に示す基本組成を有するめっき浴におい
て、皮膜中のタングステン含有率に及ぼす浴中のタング
ステン濃度と温度の影響について、pHが8.0、電流
密度が20amp/dm2の条件下で調べたものである
。ニッケル濃度に比してタングステン濃度が高い場合に
は、浴温は50℃以上が必要であり、また、タングステ
ン濃度が低い場合には55℃が必要である。しかしなが
ら、温度の上限は操業コストから75℃以下が適当であ
る。
(3) Bath temperature Figure 5 shows the effect of tungsten concentration in the bath and temperature on the tungsten content in the film in a plating bath having the basic composition shown in Figure 2, when the pH is 8.0 and the current density is It was investigated under the condition of 20 amp/dm2.When the tungsten concentration is high compared to the nickel concentration, the bath temperature needs to be 50℃ or higher, and when the tungsten concentration is low, the bath temperature is 55℃. However, the upper limit of the temperature is preferably 75° C. or lower in view of operating costs.

(4)浴のくえん酸濃度 第6図は、タングステン0.15モル/11ニッケル0
.15モル/β、pHが6.0、浴温が60℃の条件下
でのめっき皮膜中のタングステンの含有率に与える有機
酸(くえん酸の濃度)の影響を示す図である。同図を参
照して、皮膜中のタングステン含有率(よくえん酸の濃
度が0.3モル/β以下では電流密度の変化にあまり影
響されない。また、0.3モル/lを超えるとタングス
テンの析出量が多くなり、非晶質の生成が可能となるが
、電流密度の差により、タングステン等の含有量も大き
(変化する。0.8モル/1以上では何れの電流密度で
も非晶質の生成が困難となる。従って、0.3〜0.8
モル/βの範囲内にあることが好ましい。
(4) The citric acid concentration in the bath in Figure 6 is 0.15 mol of tungsten/11 mol of nickel.
.. 15 is a diagram showing the influence of organic acid (concentration of citric acid) on the content of tungsten in the plating film under the conditions of 15 mol/β, pH 6.0, and bath temperature 60°C. Referring to the figure, the tungsten content in the film (well, if the concentration of citric acid is 0.3 mol/β or less, it is not affected much by changes in current density. If it exceeds 0.3 mol/l, tungsten The amount of precipitation increases, making it possible to form an amorphous substance, but the content of tungsten etc. also increases (varies) due to the difference in current density.At 0.8 mol/1 or more, an amorphous substance is formed at any current density. Therefore, it becomes difficult to generate 0.3 to 0.8
It is preferably within the range of mol/β.

(5)  めっき浴のpH 第7図は、タングステン/ニッケルのモル比が3.0、
浴温か60℃の下でのめっき皮膜中のタングステン含有
率に与えるpHと電流密度との関係を示す。同図から、
皮膜中のタングステンの含有量はめっき浴のpHに大き
く影響されることが判る。
(5) pH of the plating bath Figure 7 shows that the tungsten/nickel molar ratio is 3.0,
The relationship between pH and current density given to the tungsten content in the plating film at a bath temperature of 60°C is shown. From the same figure,
It can be seen that the tungsten content in the film is greatly influenced by the pH of the plating bath.

5〜10 amp/dm”の低電流密度の場合ニハ、p
H1−!4〜6に保ち、30〜40 amp/dm2の
高電流密度の場合にはpHも6〜8と高くする必要があ
る。
For low current densities of 5 to 10 amp/dm, niha, p
H1-! In the case of high current density of 30 to 40 amp/dm2, the pH must also be increased to 6 to 8.

したがって、前記本発明の高電流密度の下での操業では
pHも6〜8に高く維持しておく必要がある。
Therefore, in the operation under high current density according to the present invention, the pH must also be maintained at a high level of 6 to 8.

また、pHの変動が予測される場合には、電流密度を2
0 amp/dm’程度にすると非晶質皮膜が得られ易
い。
In addition, if pH fluctuations are expected, the current density should be increased by 2.
When it is about 0 amp/dm', an amorphous film is easily obtained.

さらに、皮膜中の燐は非晶質皮膜を形成するのに重要な
要素であり、ニッケルータングステン−燐の三元合金に
よる非晶質皮膜を形成するためには、10重量%以上含
有する必要がある。めっき浴中の燐の含有量はこの皮膜
中の燐含有量に直接影響される。第8図はタングステン
の含有量が0.15% ル/ jl 、ニッケルの含有
量が0.15モル/1、くえん酸0.5モル/1、pH
が6.0、浴温が60℃の場合の皮膜中の燐含有量とめ
っき浴中の燐量との関係を示すグラフである。皮膜中の
燐は電流密度の大小に殆ど影響されず、浴中の燐の量に
依存することが判る。したがって、浴中の燐の濃度を0
.3モル/1以上に保つことが、非晶質皮膜を形成する
のに重要な条件となる。
Furthermore, phosphorus in the film is an important element for forming an amorphous film, and in order to form an amorphous film using a ternary alloy of nickel-tungsten-phosphorus, it must be contained at 10% by weight or more. There is. The phosphorus content in the plating bath is directly influenced by the phosphorus content in the coating. Figure 8 shows tungsten content of 0.15% l/jl, nickel content of 0.15 mol/1, citric acid 0.5 mol/1, and pH
6.0 and a bath temperature of 60° C. is a graph showing the relationship between the phosphorus content in the film and the phosphorus amount in the plating bath. It can be seen that the phosphorus in the film is hardly affected by the magnitude of the current density and depends on the amount of phosphorus in the bath. Therefore, the concentration of phosphorus in the bath is reduced to 0.
.. Maintaining the ratio of 3 mol/1 or more is an important condition for forming an amorphous film.

〔実施例〕〔Example〕

以下の表に本発明の実施例を示す。 The table below shows examples of the invention.

〔発明の効果〕〔Effect of the invention〕

本発明による効果を挙げると以下のとおりである。 The effects of the present invention are as follows.

イ、基本的には、従来の電気めっき法に基づいて比較的
簡単にしかも安価で大量に非晶質皮膜を有する鋼板を得
ることができる。
B. Basically, steel sheets having an amorphous coating can be obtained in large quantities relatively easily and inexpensively based on conventional electroplating methods.

口、従来よりも薄い皮膜であるにもかかわらず、充分な
耐食性をもつ皮膜が得られる。
Despite being thinner than conventional coatings, it is possible to obtain coatings with sufficient corrosion resistance.

ハ、めっき浴に相対流動速度を与えることにより、高電
流操業が可能になり、設備コストの低減が図られる。
C. By providing a relative flow velocity to the plating bath, high current operation becomes possible and equipment costs are reduced.

【図面の簡単な説明】[Brief explanation of the drawing]

添付の第1図は本発明の方法を実施するための装置の例
を示し、第2図〜第8図は、電気めっきによって非晶質
皮膜を形成するに際しての各要因の影響を示す図である
。 1:めっき鋼板  2:デフレクタ−ロール3:通電ロ
ール  4:陽極 5:循環液貯槽  6:循環用ポンプ 7:噴射ノズル  8:循環路 9:調整装置 特許出願人   帝産業 株式会社(ほか1名)代 理
 人   小 鼎  益(ほか2名)第1図 1¥2図 陰極電位(VvsSCE) 第3図 ;′Jti!V(m/sec l 第4図 WE5図 浴温(”C) 4     第6図 第7図 電滝密度(A/d♂) 第8図 を濃密度(A/dlT2)
The attached FIG. 1 shows an example of an apparatus for carrying out the method of the present invention, and FIGS. 2 to 8 are diagrams showing the influence of each factor when forming an amorphous film by electroplating. be. 1: Plated steel plate 2: Deflector roll 3: Current roll 4: Anode 5: Circulating fluid storage tank 6: Circulation pump 7: Injection nozzle 8: Circulation path 9: Adjustment device patent applicant Tei Sangyo Co., Ltd. (and one other person) Agent Xiao Ding Yi (and 2 others) Figure 1 Figure 1¥2 Cathode potential (V vs SCE) Figure 3;'Jti! V (m/sec l Figure 4: WE5: Bath temperature ("C) 4: Figure 6: Figure 7: Electric waterfall density (A/d♂) Figure 8: Density (A/dlT2)

Claims (1)

【特許請求の範囲】 1、鉄、ニッケル、コバルト等の鉄族金属と、クロム、
モリブデン、タングステン等の活性金属と、燐、硫黄、
炭素、珪素、硼素等の半金属とからなる少なくとも0.
5μm厚の非晶質合金皮膜を有する電気めっき鋼板。 2、結晶質めっき層を有する鋼板上に鉄、ニッケル、コ
バルト等の鉄族金属と、クロム、モリブデン、タングス
テン等の活性金属と、燐、珪素等の半金属とからなる非
晶質合金皮膜を形成してなる電気めっき鋼板。 3、活性金属が25重量%以上と半金属が10重量%以
上の含有量であることを特徴とする特許請求の範囲第1
項または第2項に記載の非晶質合金皮膜を有する電気め
っき鋼板。4、鉄、ニッケル、コバルト等の鉄族金属と
、クロム、モリブデン、タングステン等の活性金属と、
燐、硫黄、炭素、珪素、硼素等の半金属の塩と、くえん
酸、酒石酸等の有機酸と、塩化アンモニウム等の中性塩
とを含有するめっき浴に0.3〜1.5m/sec.の
相対流動速度を与えて電気めっき処理を行うことを特徴
とする非晶質合金皮膜を有する電気めっき鋼板の製造法
。 5、めっき浴温度を50℃以上に維持することを特徴と
する特許請求の範囲第4項に記載の非晶質合金皮膜を有
する電気めっき鋼板の製造法。
[Claims] 1. Iron group metals such as iron, nickel, and cobalt, and chromium,
Active metals such as molybdenum and tungsten, phosphorus, sulfur,
At least 0.0% consisting of a metalloid such as carbon, silicon, or boron.
Electroplated steel sheet with a 5μm thick amorphous alloy coating. 2. An amorphous alloy film consisting of iron group metals such as iron, nickel, and cobalt, active metals such as chromium, molybdenum, and tungsten, and semimetals such as phosphorus and silicon is applied to a steel plate having a crystalline plating layer. Electroplated steel sheet formed by forming. 3. Claim 1 characterized in that the active metal content is 25% by weight or more and the semimetal content is 10% by weight or more.
An electroplated steel sheet having an amorphous alloy film according to item 1 or 2. 4. Iron group metals such as iron, nickel, and cobalt, and active metals such as chromium, molybdenum, and tungsten,
0.3 to 1.5 m/sec in a plating bath containing metalloid salts such as phosphorus, sulfur, carbon, silicon, and boron, organic acids such as citric acid and tartaric acid, and neutral salts such as ammonium chloride. .. 1. A method for producing an electroplated steel sheet having an amorphous alloy film, characterized in that electroplating is performed while giving a relative flow velocity of . 5. A method for producing an electroplated steel sheet having an amorphous alloy film according to claim 4, characterized in that the plating bath temperature is maintained at 50° C. or higher.
JP4934588A 1988-03-01 1988-03-01 Amorphous alloy electroplated steel sheet and production thereof Pending JPH01222089A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4934588A JPH01222089A (en) 1988-03-01 1988-03-01 Amorphous alloy electroplated steel sheet and production thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4934588A JPH01222089A (en) 1988-03-01 1988-03-01 Amorphous alloy electroplated steel sheet and production thereof

Publications (1)

Publication Number Publication Date
JPH01222089A true JPH01222089A (en) 1989-09-05

Family

ID=12828418

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4934588A Pending JPH01222089A (en) 1988-03-01 1988-03-01 Amorphous alloy electroplated steel sheet and production thereof

Country Status (1)

Country Link
JP (1) JPH01222089A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002241985A (en) * 2001-02-14 2002-08-28 Satosen Co Ltd Nickel - tungsten - phosphorous alloy film and plating solution therefor
WO2015005931A1 (en) * 2013-07-12 2015-01-15 Hewlett-Packard Development Company, L.P. Amorphous thin metal film
US10177310B2 (en) 2014-07-30 2019-01-08 Hewlett Packard Enterprise Development Lp Amorphous metal alloy electrodes in non-volatile device applications

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002241985A (en) * 2001-02-14 2002-08-28 Satosen Co Ltd Nickel - tungsten - phosphorous alloy film and plating solution therefor
JP4618907B2 (en) * 2001-02-14 2011-01-26 株式会社サトーセン Nickel-tungsten-phosphorus alloy film and plating solution thereof
WO2015005931A1 (en) * 2013-07-12 2015-01-15 Hewlett-Packard Development Company, L.P. Amorphous thin metal film
US10177310B2 (en) 2014-07-30 2019-01-08 Hewlett Packard Enterprise Development Lp Amorphous metal alloy electrodes in non-volatile device applications

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