JPH01192006A - Production of thin film magnetic head - Google Patents
Production of thin film magnetic headInfo
- Publication number
- JPH01192006A JPH01192006A JP1623888A JP1623888A JPH01192006A JP H01192006 A JPH01192006 A JP H01192006A JP 1623888 A JP1623888 A JP 1623888A JP 1623888 A JP1623888 A JP 1623888A JP H01192006 A JPH01192006 A JP H01192006A
- Authority
- JP
- Japan
- Prior art keywords
- insulating layer
- layer
- thin film
- magnetic head
- sol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title claims description 18
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 238000003980 solgel method Methods 0.000 claims abstract description 11
- 239000004020 conductor Substances 0.000 claims abstract description 9
- 238000010438 heat treatment Methods 0.000 claims abstract description 7
- 229910010272 inorganic material Inorganic materials 0.000 claims description 6
- 239000011147 inorganic material Substances 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 abstract description 6
- 230000008961 swelling Effects 0.000 abstract description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 230000007423 decrease Effects 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 230000006866 deterioration Effects 0.000 description 4
- 238000001723 curing Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 241001474791 Proboscis Species 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、磁気記録装置に使用される薄膜磁気ヘッド
の製造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing a thin film magnetic head used in a magnetic recording device.
図面は従来の薄膜磁気ヘッドの製造方法を説明する断面
図であ99図において、(1)は下部磁性ノー。The drawing is a cross-sectional view illustrating a method of manufacturing a conventional thin-film magnetic head. In FIG. 99, (1) is a lower magnetic node.
(2)はギャップ層、(3)は絶縁層、(4)は導体コ
イル。(2) is a gap layer, (3) is an insulating layer, and (4) is a conductor coil.
(5)は上部磁性層である。(5) is the upper magnetic layer.
薄膜磁気ヘッドの一般的な製造方法は、まず。First, the general manufacturing method for thin film magnetic heads is as follows.
Al2O3−TiC系基板にめっきしたパーマロイ膜を
数μ島形成し、 フレームめっき法により下部磁性層(
1)を設ける。次に、 a12o5膜をドライエツチ
ング法で成模し、化学エツチングで不要部を除去しギャ
ップ層(2)を設ける。次に、感光レジストを写真製版
でパターンニング後、加熱硬化により絶縁層(3)を設
ける。次に下部磁性層(りを形成したと同様の方法で鋼
を用いて導体コイル(4)を設ける。このようKして、
絶縁層(3)、上部磁性層(5)を順次設けていく。A permalloy film plated on an Al2O3-TiC substrate is formed into islands of several micrometers, and the lower magnetic layer (
1) will be provided. Next, the a12o5 film is patterned by dry etching, and unnecessary parts are removed by chemical etching to form a gap layer (2). Next, after patterning the photosensitive resist by photolithography, an insulating layer (3) is provided by heat curing. Next, a conductor coil (4) is provided using steel in the same manner as in forming the lower magnetic layer.
An insulating layer (3) and an upper magnetic layer (5) are sequentially provided.
従来の薄膜磁気ヘッドは上記のように構成され。A conventional thin film magnetic head is constructed as described above.
導体コイル(4)に電流を流したシ、′4流を誘導させ
たシすることで磁気ディスクとの情報の書き込み・読み
出しを行なう。導体コイル(4)はレジスト等の有機物
より成る絶縁層(3)に上り磁性層(1) 、 (51
および隣接の導体コイル(4)から絶縁されている。By passing a current through the conductor coil (4) and inducing a current '4', information is written to and read from the magnetic disk. The conductor coil (4) goes up to the insulating layer (3) made of organic material such as resist, and the magnetic layer (1), (51
and is insulated from the adjacent conductor coil (4).
従来の薄膜磁気ヘッドは以上のように構成されており、
絶縁層(3)は有機物であるフォトレジストをスピンコ
ードし、その後ベーキングして硬化させて形成される。The conventional thin film magnetic head is constructed as described above.
The insulating layer (3) is formed by spin-coding an organic photoresist and then baking and hardening it.
このため薄膜磁気ヘッドを高湿度中に4すと絶縁層(3
)は膨潤してしまい、ヘッドギャップ部(2a)にクラ
ックが発生したり、磁性層(5)が変形してヘッドの磁
気的特性が劣化する可能性があった。また温度変化によ
る絶縁層(3)の体積変化が大きいため、同様の効果を
もたらす可能性があった。Therefore, if a thin film magnetic head is placed in high humidity, the insulating layer (3
) may swell, causing cracks to occur in the head gap portion (2a) or deformation of the magnetic layer (5), leading to deterioration of the magnetic properties of the head. Further, since the volume of the insulating layer (3) changes greatly due to temperature changes, there is a possibility that a similar effect may be brought about.
この発明は上記のような謹聴を解消するためになされた
もので、絶縁層(3)の膨潤を防止し、la磁気的特性
劣化しにくい薄膜磁気ヘッドを得ることを目的とする。The present invention has been made to solve the above-mentioned problems, and aims to prevent the swelling of the insulating layer (3) and to obtain a thin film magnetic head in which the la magnetic characteristics are less likely to deteriorate.
この発明に係る薄膜磁気ヘッドの製造方法は。 A method of manufacturing a thin film magnetic head according to the present invention is as follows.
絶、嫌ノーをゾルゲル法によりコーティングした無機物
を加熱硬化させて形成するものである。It is formed by heating and curing an inorganic material coated with a sol-gel method.
〔作用〕
この発明においては、絶縁層がゾルゲル法によりコーテ
ィングされ、fA処理によシ硬化された焦礪吻で形成さ
れている。無機物は一般的に有機物に比べて湿度によシ
膨潤しに<<、また!度変化による体積変化も小さいた
め、薄膜磁気ヘッドを高湿度中に曝しても絶縁層が膨潤
することがなく。[Function] In this invention, the insulating layer is formed of a scorched proboscis coated by a sol-gel method and hardened by an fA treatment. Inorganic materials generally swell with humidity more than organic materials. Volume changes due to temperature changes are also small, so the insulating layer will not swell even if the thin-film magnetic head is exposed to high humidity.
また温度変化による絶縁層の体積変化が小さい。Further, the volume change of the insulating layer due to temperature change is small.
このためヘッドギャップ部のクラック発生および磁性層
の変形によるヘッドの特注劣化を防ぐことができる。ま
た絶縁層はゾルゲル法によりコーティングされるため、
平坦化が容易である。Therefore, it is possible to prevent deterioration of the custom-made head due to the occurrence of cracks in the head gap portion and deformation of the magnetic layer. In addition, since the insulating layer is coated using the sol-gel method,
Easy to flatten.
この発明の一実施例に係る薄膜磁気ヘッドは。 A thin film magnetic head according to an embodiment of the present invention.
絶縁層(3)の材料および形成方法を除いて図面に示さ
れる従来のものと全く同一である。すなわち。It is completely the same as the conventional one shown in the drawings except for the material and formation method of the insulating layer (3). Namely.
絶縁層(3)はゾルゲル法によりコーティングした無機
物を加熱硬化させて形成される。The insulating layer (3) is formed by heating and curing an inorganic material coated by a sol-gel method.
絶縁ノd (31の具体的な形成方法の一例を以下に示
す。例えば無機物として8102 t−用いた場合、ま
ず、 5to2のテトラ−エトキシ−シランを有機溶
媒で希釈し、水を加えて加水分解してゾルの状態にする
。このゾル状の8102をギャップ層(2)または導体
コイル(4)の上に塗布した後、約250℃の温度で熱
硬化させてゲル化することで8102の絶縁層(3)を
形成する。An example of a specific method for forming insulation No. 31 is shown below. For example, when using 8102 t- as an inorganic substance, first dilute 5to2 tetra-ethoxy-silane with an organic solvent, and add water to hydrolyze it. This sol-like 8102 is applied onto the gap layer (2) or the conductor coil (4), and then heat-cured at a temperature of about 250°C to form a gel. Form layer (3).
上記のように構成された薄膜磁気ヘッドにおいては、絶
縁層(3)がゾルゲル法によりコーティングされた無機
物で形成されており、ゾルゲル法では比較的低温の加熱
で、純度の高い8102等の無機物の平坦な層が容易に
形成される。またこの方法は安価な設備で単純な作業の
繰り返しでできることを特徴とする。このためゾルゲル
法で無機物ノ絶縁rd (3)を形成すると、a模磁気
ヘッドを高湿度中に曝しても膨潤することなく、また温
度変化による絶縁層(3)の体積変化を抑えることがで
きるので、ヘッドギャップ部(2a)のクラック発生お
よび磁性層(5)の変形によるヘッドの特性劣化を防ぐ
ことができる。In the thin-film magnetic head configured as described above, the insulating layer (3) is formed of an inorganic material coated by the sol-gel method. A flat layer is easily formed. Furthermore, this method is characterized by being able to be performed using inexpensive equipment and by repeating simple operations. Therefore, if the inorganic insulating layer (3) is formed using the sol-gel method, it will not swell even if the a-molecular magnetic head is exposed to high humidity, and the volume change of the insulating layer (3) due to temperature changes can be suppressed. Therefore, it is possible to prevent deterioration of the characteristics of the head due to occurrence of cracks in the head gap portion (2a) and deformation of the magnetic layer (5).
なお、上記実施例ではS鍋物が5to2である場合につ
いて示したが、これに限るものではなく。In addition, although the said Example showed the case where S hotpot was 5to2, it is not limited to this.
例えば’rto2. 51o2−’rto2.ム103
、5t4N4 。For example 'rto2. 51o2-'rto2. Mu103
, 5t4N4.
BaTiO3、0r205などであってもよい。It may also be BaTiO3, Or205, etc.
〔発明の効果〕 ゛
以上のように、この発明によれば、薄膜磁気ヘッドの絶
縁層をゾルゲル法によりコーティングした無機物を加熱
硬化させて形成するので、薄膜磁気ヘッドを高湿度中に
曝しても絶縁層が膨潤することがなく、また温度変化に
よる絶縁層の体積変化が小さいので、ヘッドギャップ部
のクラック発生および磁性層の変形によるヘッドの特性
劣化を防ぐことができる効果がある。[Effects of the Invention] As described above, according to the present invention, the insulating layer of the thin film magnetic head is formed by heating and curing the inorganic material coated by the sol-gel method, so even if the thin film magnetic head is exposed to high humidity. Since the insulating layer does not swell and the change in volume of the insulating layer due to temperature changes is small, it is possible to prevent deterioration of head characteristics due to cracks in the head gap and deformation of the magnetic layer.
図面はこの発明の一実施例および従来の薄膜磁気ヘッド
の製造方法を説明するl!?面図である。
図に2いて、(1)は下部磁性層、(2)はギャップ+
4゜(3)は絶縁層、(4)は導体コイル、(5)は上
部磁性層である。The drawings illustrate an embodiment of the present invention and a conventional method of manufacturing a thin film magnetic head. ? It is a front view. 2 in the figure, (1) is the lower magnetic layer, (2) is the gap +
4° (3) is an insulating layer, (4) is a conductor coil, and (5) is an upper magnetic layer.
Claims (1)
、絶縁層、および上部磁性層を順に形成する薄膜磁気ヘ
ッドの製造方法において、上記絶縁層はゾルゲル法によ
りコーティングした無機物を加熱硬化させて形成するこ
とを特徴とする薄膜磁気ヘッドの製造方法。In a method for manufacturing a thin film magnetic head in which a lower magnetic layer, a gap layer, an insulating layer, a conductor coil, an insulating layer, and an upper magnetic layer are sequentially formed on a substrate, the insulating layer is formed by heating and curing an inorganic material coated by a sol-gel method. 1. A method of manufacturing a thin film magnetic head, characterized by forming a thin film magnetic head.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1623888A JPH01192006A (en) | 1988-01-27 | 1988-01-27 | Production of thin film magnetic head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1623888A JPH01192006A (en) | 1988-01-27 | 1988-01-27 | Production of thin film magnetic head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01192006A true JPH01192006A (en) | 1989-08-02 |
Family
ID=11910978
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1623888A Pending JPH01192006A (en) | 1988-01-27 | 1988-01-27 | Production of thin film magnetic head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01192006A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04195908A (en) * | 1990-11-28 | 1992-07-15 | Hitachi Ltd | Thin film magnetic head and its manufacturing method |
US5139820A (en) * | 1989-12-28 | 1992-08-18 | Sumitomo Electric Industries, Ltd. | Method of manufacturing ceramic insulated wire |
-
1988
- 1988-01-27 JP JP1623888A patent/JPH01192006A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5139820A (en) * | 1989-12-28 | 1992-08-18 | Sumitomo Electric Industries, Ltd. | Method of manufacturing ceramic insulated wire |
JPH04195908A (en) * | 1990-11-28 | 1992-07-15 | Hitachi Ltd | Thin film magnetic head and its manufacturing method |
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