JPH01172300A - Annealing method for lithium tantalate single crystal - Google Patents
Annealing method for lithium tantalate single crystalInfo
- Publication number
- JPH01172300A JPH01172300A JP62333136A JP33313687A JPH01172300A JP H01172300 A JPH01172300 A JP H01172300A JP 62333136 A JP62333136 A JP 62333136A JP 33313687 A JP33313687 A JP 33313687A JP H01172300 A JPH01172300 A JP H01172300A
- Authority
- JP
- Japan
- Prior art keywords
- single crystal
- annealing
- lithium tantalate
- melt
- furnace
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
【発明の詳細な説明】
〔概要〕
クンクル酸リチウムの単結晶を育成しアニールする方法
の改良に関し、
所要時間の短縮を目的とし、
外側に加熱用ヒータを設けた炉心管内で、タンタル酸リ
チウムの単結晶育成用メルトに浸漬して育成したタンタ
ル酸リチウムの単結晶を、該メルト(7)の入った坩堝
(4)を降下させることで該タルl− (7)から離し
たのち、該ヒータを制御して該単結晶のアニール温度ま
で徐冷し、該アニール温度で所要時間だけ保持してから
徐冷し、該炉心管から取り出す構成とする。[Detailed Description of the Invention] [Summary] Regarding the improvement of the method of growing and annealing a single crystal of lithium tantalate, the aim of the method was to reduce the required time by growing lithium tantalate in a furnace tube equipped with a heater on the outside. The single crystal of lithium tantalate grown by immersing it in the melt for single crystal growth is separated from the crucible (4) containing the melt (7) by lowering it, and then the heater The single crystal is slowly cooled down to the annealing temperature of the single crystal, held at the annealing temperature for a required period of time, and then slowly cooled and taken out from the reactor core tube.
本発明はタンタル酸リチウム(LiTaOi)の単結晶
、特に圧電振動子や弾性表面波フィルタ等の素子基板を
採取するLiTa0.単結晶のアニールを効率化するた
めの改良に関する。The present invention is directed to LiTaOi single crystals, particularly LiTa0. This article relates to improvements for increasing the efficiency of single crystal annealing.
LiTaO3の単結晶は、約1700℃に加熱し溶融さ
れたLiTaO3単結晶育成用メルトに種結晶を浸漬し
、該種結晶を徐々に引き上げながら育成されるが、育成
時にできた内部ひずみを除去するアニールが必要になる
。A single crystal of LiTaO3 is grown by immersing a seed crystal in a LiTaO3 single crystal growth melt that has been heated and melted at approximately 1700°C, and gradually pulling up the seed crystal, but the internal strain created during growth is removed. Annealing will be required.
従来、種結晶に育成された単結晶は単結晶育成炉中で室
温度近くまで徐冷してから取り出し、しかるのちアニー
ル用の炉に入れ、アニール温度まで徐々に加熱し所要時
間だけ保持せしめたのち、徐冷し取り出しているが、単
結晶育成炉およびアニール炉から単結晶を取り出す際、
長時間(200時間程)かけて炉内温度を室温まで低下
させたのち、単結晶の内部温度が充分低下するのにさら
に長時間(8時間程度)を要する。Conventionally, a single crystal grown as a seed crystal is slowly cooled to near room temperature in a single crystal growth furnace, then taken out, and then placed in an annealing furnace where it is gradually heated to the annealing temperature and held for the required time. Afterwards, it is slowly cooled and taken out, but when taking out the single crystal from the single crystal growth furnace and annealing furnace,
After reducing the temperature in the furnace to room temperature over a long period of time (about 200 hours), it takes an even longer time (about 8 hours) for the internal temperature of the single crystal to drop sufficiently.
第3図は従来方法の一例におけるLiTaO3単結晶育
成のためのタイムチャート(イ)と該単結晶をアニール
するためのタイムチャート(II)であり、縦軸は温度
(℃)、横軸は所要時間(h)である。Figure 3 shows a time chart (A) for growing a LiTaO3 single crystal and a time chart (II) for annealing the single crystal in an example of the conventional method, where the vertical axis is temperature (°C) and the horizontal axis is the required time. time (h).
第3図(イ)において、単結晶の育成温度は1700℃
程度であり、約4時間かけて1700℃に加熱したのち
、約10時間かけて単結晶を育成し終わると、約20時
間かけて該単結晶を徐冷し、さらに該単結晶の内部を室
温まで低下させるため約8時間そのまま放置してから、
単結晶を単結晶育成装置の炉心管より取り出す。In Figure 3 (a), the single crystal growth temperature is 1700°C.
After heating to 1700°C for about 4 hours and growing a single crystal for about 10 hours, the single crystal is slowly cooled for about 20 hours, and then the inside of the single crystal is brought to room temperature. After leaving it as it is for about 8 hours to lower it to
The single crystal is taken out from the furnace tube of the single crystal growth device.
育成された単結晶のアニールは育成単結晶をアニール用
の炉に入れ第3図(IT)に示すように、約8時間かけ
てアニール温度(約1400℃)まで上昇させたのち、
所要時間例えば20時間だけ該アニール温度に保持せし
め、次いで約20時間かけて室温まで徐冷し、さらに該
単結晶の内部を室温まで低下させるため約8時間そのま
ま放置してから、単結晶をアニール炉より取り出す。For annealing the grown single crystal, the grown single crystal is placed in an annealing furnace and raised to an annealing temperature (approximately 1400°C) over about 8 hours, as shown in Figure 3 (IT).
The annealing temperature is maintained for the required time, for example, 20 hours, then slowly cooled to room temperature over about 20 hours, and then left as it is for about 8 hours to cool the inside of the single crystal to room temperature, and then the single crystal is annealed. Remove from the furnace.
従って、単結晶の育成に約42時間を要し、そのアニー
ルに約56時間を要し、単結晶の育成からアニールまで
の実所要時間は98時間を要することになる。Therefore, it takes about 42 hours to grow a single crystal, about 56 hours to anneal it, and the actual time required from growing the single crystal to annealing is 98 hours.
以上説明したように、LiTa0.単結晶のインゴット
は、その育成およびアニールに際し、育成炉およびアニ
ール炉から取り出すための炉内温度冷却時間および単結
晶が内部まで均一化するまでの時間に、それぞれ20時
間、8時間を要しそれらの合計が56時間になり、さら
に−度室温まで冷却したのちアニール温度まで加熱する
のに8時間程度を要すると共に、単結晶育成装置および
アニール装置の双方が必要であった。As explained above, LiTa0. When growing and annealing a single crystal ingot, it takes 20 hours and 8 hours, respectively, to cool down the temperature in the furnace to take it out from the growth furnace and annealing furnace, and to homogenize the single crystal to the inside. The total time was 56 hours, and it took about 8 hours to further cool down to -degree room temperature and then heat up to the annealing temperature, and required both a single crystal growth device and an annealing device.
上記問題点の除去を目的とした本発明は、本発明方法の
一実施例に係わる単結晶育成装置の主要構成を示す第1
図によれば、外側に加熱用ヒータ3を設けた炉心管2内
で、タンタル酸リチウムの単結晶育成用メルト7に浸漬
して育成したタンタル酸リチウムの単結晶15を、メル
ト7の入った坩堝4を降下させることでメルト7から離
したのち、メルト7から引き上げたのち、ヒータ3を制
御して単結晶15のアニール温度まで徐冷し、該アニー
ル温度で所定時間だけ保持してから徐冷し、炉心管2か
ら取り出すことを特徴とし、
さらには、ヒータ3を制御して、メルト7から引き上げ
た育成済みの単結晶15を炉心管2の中で単結晶15の
アニール温度より約200℃だけ低い温度まで徐冷した
のち、該アニール温度まで上昇させ前記アニールするこ
とを特徴とするタンタル酸リチウム単結晶のアニール方
法である。The present invention aims to eliminate the above-mentioned problems.
According to the figure, a lithium tantalate single crystal 15 grown by immersing it in a melt 7 for growing a lithium tantalate single crystal is grown in a furnace tube 2 equipped with a heater 3 on the outside. After the crucible 4 is lowered to separate it from the melt 7 and then lifted from the melt 7, the heater 3 is controlled to slowly cool it to the annealing temperature of the single crystal 15, and after holding the crucible 4 at the annealing temperature for a predetermined time, the crucible 4 is slowly cooled. Furthermore, by controlling the heater 3, the grown single crystal 15 pulled from the melt 7 is cooled in the furnace core tube 2 at a temperature of approximately 200° above the annealing temperature of the single crystal 15. This is a method for annealing a lithium tantalate single crystal, characterized in that the temperature is slowly cooled to a temperature lower by .degree. C., and then the temperature is increased to the annealing temperature.
上記手段によれば、単結晶の育成に引き続き該単結晶の
アニールを行うことで、育成直後の単結晶を室温まで冷
却する必要がなくなり、その分アニールに要する時間が
短縮される。According to the above means, by annealing the single crystal subsequent to growth of the single crystal, there is no need to cool the single crystal immediately after growth to room temperature, and the time required for annealing is shortened accordingly.
〔実施例〕
以下に、本発明方法に係わる装置の概略構成図を用いて
、本発明方法を説明する。[Example] The method of the present invention will be described below with reference to a schematic diagram of an apparatus related to the method of the present invention.
第1図は本発明方法の一実施例に係わる装置の主要構成
とその操作を示す側断面図、第2図は該装置を使用して
単結晶を育成しアニールするタイムチャートの一例であ
る。FIG. 1 is a sectional side view showing the main structure and operation of an apparatus according to an embodiment of the method of the present invention, and FIG. 2 is an example of a time chart for growing and annealing a single crystal using the apparatus.
第1図において、(イ)は単結晶の育成状態の装置を示
す図、(rl)は育成した単結晶のアニール状態の装置
を示す図′であり、L i TaOs単結晶の育成およ
び育成単結晶のアニールを行う装置1は、高周波誘導加
熱コイル3を外側に配設した炉心管2に、イリジウム(
I r)にてなる坩堝4等を収容してなる。上下動可能
な軸5にアルミナ坩堝6を搭載し、単結晶育成用メルト
7を入れたIr坩堝4とアルミナ坩堝6との間には、保
温材(ジルコニアバブル)8が充填されている。In Fig. 1, (a) is a diagram showing the apparatus in a state of growing a single crystal, and (rl) is a diagram showing the apparatus in an annealing state of the grown single crystal. An apparatus 1 for annealing crystals includes a furnace tube 2 with a high-frequency induction heating coil 3 disposed outside, and an iridium (
It houses a crucible 4 made of Ir). An alumina crucible 6 is mounted on a vertically movable shaft 5, and a heat insulating material (zirconia bubble) 8 is filled between the Ir crucible 4 containing a melt 7 for single crystal growth and the alumina crucible 6.
白金<pt>−ロジウム(Rh)にてなる筒9は、炉内
の単結晶育成温度およびアニール温度を均一化するため
のものであり、アルミナ坩堝6の外側に設けられ、上下
動可能な中空軸10に支持されている0種結晶11を支
持し単結晶の育成と共に引き上げられる軸12は、炉心
管2の蓋体13および蓋体13に内張すされた熱反射板
14を貫通し、上下動可能である。なお、軸5が貫通す
る中空軸16は上下動可能であり、筒9を支持する。The tube 9 made of platinum <pt>-rhodium (Rh) is for equalizing the single crystal growth temperature and annealing temperature in the furnace, and is provided outside the alumina crucible 6 and is a hollow tube that can move up and down. The shaft 12 that supports the zero seed crystal 11 supported by the shaft 10 and is pulled up as the single crystal grows passes through the lid 13 of the reactor core tube 2 and the heat reflecting plate 14 lined in the lid 13. It can be moved up and down. Note that a hollow shaft 16 through which the shaft 5 passes is movable up and down and supports the cylinder 9.
第1図(イ)および第2図において、ヒータ3に所定を
高周波電流を流し、約4時間かけて単結晶育成温度であ
る1700℃に加熱し該温度を維持する炉心管2内で、
種結晶11には単結晶が育成され約10時間後に所定の
単結晶15の育成が完了すると、第1図(ml)に示す
ように坩堝4を降下せしめたのち、約6時間かけて単結
晶15を約1200℃まで徐冷する0次いで、約3時間
かけてアニール温度である1400℃まで加熱し該温度
を約20時間維持せしめて、単結晶15の内部ひずみを
除去(アニール)したのち、約20時間かけて炉心管2
内を室温まで徐冷し、そのまま約8時間放置したのち、
単結晶15を炉心管2から取り出して、単結晶15の育
成およびアニールが完了する。In FIGS. 1(A) and 2, a predetermined high-frequency current is passed through the heater 3 to heat it to 1700° C., which is the single crystal growth temperature, for about 4 hours, and maintain the temperature within the furnace tube 2.
A single crystal is grown in the seed crystal 11, and when the growth of a predetermined single crystal 15 is completed after about 10 hours, the crucible 4 is lowered as shown in FIG. 15 is slowly cooled to about 1200°C. Then, the internal strain of the single crystal 15 is removed (annealed) by heating to the annealing temperature of 1400°C over about 3 hours and maintaining this temperature for about 20 hours. It took about 20 hours to complete the furnace core tube 2.
After slowly cooling the inside to room temperature and leaving it for about 8 hours,
The single crystal 15 is taken out from the furnace tube 2, and the growth and annealing of the single crystal 15 is completed.
従って、従来は第2図のタイムチャートに従って育成お
よびアニールに98時間を要した単結晶は、本発明方法
によれば71時間で済むことになる。Therefore, the single crystal that conventionally required 98 hours to grow and anneal according to the time chart of FIG. 2 can be grown and annealed in 71 hours according to the method of the present invention.
以上説明した如く本発明方法によれば、LiTaO3単
結晶の育成が完了した時点からアニール開始時点までの
時間が、著しく短縮できるようになると共に、アニール
のための炉が不要となる効果を有する。As explained above, according to the method of the present invention, the time from the time when the growth of the LiTaO3 single crystal is completed to the time when annealing is started can be significantly shortened, and a furnace for annealing is not required.
第1図は本発明方法の一実施例に係わる装置の主要構成
とその操作方法を示す側断面図、第2図は第1図の装置
を使用して単結晶を育成しアニールするタイムチャート
の一例、第3図は従来方法による単結晶の育成およびア
ニールのタイムチャート、
である。
図中において、
1はLiTa0.単結晶の育成、アニール装・置、2は
炉心管、
3はヒータ、
4は坩堝、
7は単結晶育成用メルト、
15はLiTaO3の単結晶、
を示す。
ろ
(イ) (Q
)阜 1 幻FIG. 1 is a side sectional view showing the main structure and operating method of an apparatus according to an embodiment of the method of the present invention, and FIG. 2 is a time chart for growing and annealing a single crystal using the apparatus shown in FIG. As an example, FIG. 3 is a time chart of single crystal growth and annealing using a conventional method. In the figure, 1 is LiTa0. Single crystal growth, annealing equipment and equipment, 2 is a furnace tube, 3 is a heater, 4 is a crucible, 7 is a melt for single crystal growth, 15 is a single crystal of LiTaO3. ro (i) (Q
)fu 1 illusion
Claims (2)
内で、タンタル酸リチウムの単結晶育成用メルト(7)
に浸漬して育成したタンタル酸リチウムの単結晶(15
)を、該メルト(7)の入った坩堝(4)を降下させる
ことで該メルト(7)から離したのち、該ヒータ(3)
を制御して該単結晶(15)のアニール温度まで徐冷し
、該アニール温度で所定時間だけ保持してから徐冷し、
該炉心管(2)から取り出すことを特徴とするタンタル
酸リチウム単結晶のアニール方法。(1) Furnace tube (2) with heater (3) installed on the outside
Inside, melt for single crystal growth of lithium tantalate (7)
Lithium tantalate single crystal (15
) is separated from the melt (7) by lowering the crucible (4) containing the melt (7), and then the heater (3)
is slowly cooled to the annealing temperature of the single crystal (15), held at the annealing temperature for a predetermined time, and then slowly cooled,
A method for annealing a lithium tantalate single crystal, the method comprising removing the lithium tantalate single crystal from the furnace core tube (2).
から引き上げた育成済みの前記単結晶(15)を前記炉
心管(2)の中で該単結晶(15)のアニール温度より
約200℃だけ低い温度まで徐冷したのち、該アニール
温度まで上昇させ前記アニールすることを特徴とする前
記特許請求の範囲第1項記載のタンタル酸リチウム単結
晶のアニール方法。(2) Controlling the heater (3) to melt the melt (7)
The grown single crystal (15) pulled from the furnace tube (2) is slowly cooled to a temperature approximately 200°C lower than the annealing temperature of the single crystal (15), and then raised to the annealing temperature. The method of annealing a lithium tantalate single crystal according to claim 1, characterized in that the annealing is performed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62333136A JPH01172300A (en) | 1987-12-25 | 1987-12-25 | Annealing method for lithium tantalate single crystal |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62333136A JPH01172300A (en) | 1987-12-25 | 1987-12-25 | Annealing method for lithium tantalate single crystal |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01172300A true JPH01172300A (en) | 1989-07-07 |
Family
ID=18262695
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62333136A Pending JPH01172300A (en) | 1987-12-25 | 1987-12-25 | Annealing method for lithium tantalate single crystal |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01172300A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009249200A (en) * | 2008-04-02 | 2009-10-29 | Fujikura Ltd | Method for producing aluminum nitride single crystal |
JP2014508704A (en) * | 2011-02-17 | 2014-04-10 | クライツール スポル.エス アール.オー. | Method for preparing a garnet-type doped single crystal having a diameter of up to 500 mm |
-
1987
- 1987-12-25 JP JP62333136A patent/JPH01172300A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009249200A (en) * | 2008-04-02 | 2009-10-29 | Fujikura Ltd | Method for producing aluminum nitride single crystal |
JP2014508704A (en) * | 2011-02-17 | 2014-04-10 | クライツール スポル.エス アール.オー. | Method for preparing a garnet-type doped single crystal having a diameter of up to 500 mm |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6969502B2 (en) | Method and device for growing large-volume oriented monocrystals | |
JP2009505935A (en) | Apparatus and method for crystal growth | |
WO2006054610A1 (en) | Apparatus for crystal production | |
US4752451A (en) | Apparatus for producing a strain-free monocrystal of a crystalline ferroelectric compound | |
CN103343387A (en) | Polycrystalline silicon ingotting furnace and ingotting method thereof | |
CN111074346A (en) | Device and method for preparing high-purity monocrystalline germanium by pulling method | |
JP2004035394A (en) | Method for growing calcium fluoride single crystal | |
JPH01172300A (en) | Annealing method for lithium tantalate single crystal | |
JP7115252B2 (en) | Oxide single crystal production method and crystal growth apparatus | |
US6736893B2 (en) | Process for growing calcium fluoride monocrystals | |
CN110820043A (en) | Crystal growth apparatus and growth method | |
JP3307438B2 (en) | Method for producing cerium-activated gadolinium silicate single crystal | |
JP7310339B2 (en) | Method for growing lithium niobate single crystal | |
JP2021155280A (en) | Annealing method and method for manufacturing single crystal | |
CN103266346B (en) | The growth apparatus of a kind of crystal Pulling YVO4 crystal and growing method based on this growth apparatus | |
JPH0367994B2 (en) | ||
JPS598692A (en) | Single crystal growth equipment | |
JPH06293599A (en) | Production of bismuth germanate single crystal and its apparatus for production | |
JPS5912632B2 (en) | Tanketshuyounohikiagesouchi | |
JP3900827B2 (en) | Quartz crucible for single crystal pulling, single crystal pulling apparatus and single crystal pulling method | |
JPH02296787A (en) | Growing device for single crystal | |
JP2638687B2 (en) | Single crystal manufacturing equipment | |
JPH11292681A (en) | Bridgman-type single crystal growing apparatus | |
JPH08319195A (en) | Method for producing lithium borate single crystal | |
JP2005225714A (en) | Crystal growth apparatus and method for growing single crystal |