JPH01155509A - Magnetic head - Google Patents
Magnetic headInfo
- Publication number
- JPH01155509A JPH01155509A JP31551287A JP31551287A JPH01155509A JP H01155509 A JPH01155509 A JP H01155509A JP 31551287 A JP31551287 A JP 31551287A JP 31551287 A JP31551287 A JP 31551287A JP H01155509 A JPH01155509 A JP H01155509A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic material
- oxide
- alloy
- layer
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000696 magnetic material Substances 0.000 claims abstract description 33
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 28
- 239000000956 alloy Substances 0.000 claims abstract description 28
- 229910052751 metal Inorganic materials 0.000 claims abstract description 10
- 239000002184 metal Substances 0.000 claims description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 14
- 239000001301 oxygen Substances 0.000 abstract description 14
- 229910052760 oxygen Inorganic materials 0.000 abstract description 14
- 238000009792 diffusion process Methods 0.000 abstract description 9
- 229910000702 sendust Inorganic materials 0.000 abstract description 9
- 230000015572 biosynthetic process Effects 0.000 abstract description 8
- 239000011521 glass Substances 0.000 abstract description 6
- 230000006866 deterioration Effects 0.000 abstract description 4
- 229910044991 metal oxide Inorganic materials 0.000 abstract description 2
- 150000004706 metal oxides Chemical class 0.000 abstract description 2
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 39
- 239000010936 titanium Substances 0.000 description 9
- 239000011162 core material Substances 0.000 description 8
- 238000000137 annealing Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 229910000859 α-Fe Inorganic materials 0.000 description 7
- 239000011651 chromium Substances 0.000 description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 229910001004 magnetic alloy Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 238000000682 scanning probe acoustic microscopy Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
この発明は、ビデオテープデツキ、磁気記録装置などに
用いられる磁気ヘッドに関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a magnetic head used in video tape decks, magnetic recording devices, and the like.
[従来の技術]
上記のような磁気ヘッドにおいては、磁気的性質(飽和
磁束密度Bsが高いこと、透磁率が高いことなど)の他
に、機械的性質(耐摩耗性が高いこと、成形性が良いこ
と)が良好であることが要求される。そのような特性を
得るために、ヘッドのコアの基部に、透磁率が高く、比
抵抗が大きい酸化物磁性体のMn−Znフェライトを用
い、そのギャップ形成面にスパッタリングを行って合金
磁性体であるセンダス1などの被膜を形成するようにし
た複合型ヘッドが用いられている。このような場合、酸
化物磁性体の表面に直接合金磁性体をスパッタリングし
ても、両者の付着強度が充分でないために、機械加工な
どにおいて両者の間(こ微小な剥離が生じ、歩留りを低
下させることになる。そこで、両者の付着強度を上げる
ために、間にクロムからなる中間膜層を形成することが
行なわれていた。[Prior Art] In the magnetic head as described above, in addition to magnetic properties (high saturation magnetic flux density Bs, high magnetic permeability, etc.), mechanical properties (high wear resistance, formability, etc.) are required. (good) is required. In order to obtain such characteristics, Mn-Zn ferrite, an oxide magnetic material with high magnetic permeability and high resistivity, is used at the base of the head core, and the gap-forming surface is sputtered with an alloy magnetic material. A composite head that forms a coating such as Sendas 1 is used. In such cases, even if the alloy magnetic material is sputtered directly onto the surface of the oxide magnetic material, the adhesion strength between the two is not sufficient, so microscopic peeling occurs between the two during machining, etc., which reduces the yield. Therefore, in order to increase the adhesion strength between the two, an intermediate film layer made of chromium has been formed between them.
[発明が解決しようとする問題点]
しかしながら、上記のような従来の技術においては、ク
ロム層が酸化物磁性体層と合金磁性体層との付着強度を
上げて微小剥離の生成を防ぐが、ヘッド製造の際のガラ
スボンディング時における昇温により、クロムが合金磁
性体層に拡散してその磁気特性を変化させるほか、酸化
物磁性体中の酸素が中間層を通して合金磁性体中に拡散
し、酸素の減少部分が本来のフェライトの結晶構造を維
持できなくなって磁気特性が低下し、合金磁性体初期形
成層及び酸化物磁性体の酸素欠乏層、あるいはクロムか
らなる中間膜層が擬似ギャップを生成するという不具合
があった。[Problems to be Solved by the Invention] However, in the conventional techniques as described above, the chromium layer increases the adhesion strength between the oxide magnetic layer and the alloy magnetic layer and prevents the generation of micro-peeling; Due to the temperature increase during glass bonding during head manufacturing, chromium diffuses into the alloy magnetic layer and changes its magnetic properties, and oxygen in the oxide magnetic material diffuses into the alloy magnetic material through the intermediate layer. The oxygen-depleted area is no longer able to maintain the original ferrite crystal structure, and the magnetic properties deteriorate, and the initial formation layer of the alloy magnetic material, the oxygen-deficient layer of the oxide magnetic material, or the intermediate film layer made of chromium generates a pseudo gap. There was a problem with that.
この発明は、合金磁性体と酸化物磁性体の付着強度を保
ちつつ、これらの各部の間の元素の拡散による上記合金
磁性体初期形成層及び酸化物磁性体の酸素欠乏層の生成
を防いで、磁気ギャップと合金磁気体膜形成面とが平行
な構造を持つ、いわゆる単純MIGヘッドによる擬似ギ
ャップの形成を抑制することを目的とするものである。This invention prevents the formation of the initial formation layer of the alloy magnetic material and the oxygen-deficient layer of the oxide magnetic material due to the diffusion of elements between these parts while maintaining the adhesion strength between the alloy magnetic material and the oxide magnetic material. The purpose of this invention is to suppress the formation of a pseudo gap in a so-called simple MIG head, which has a structure in which the magnetic gap and the surface on which the alloy magnetic film is formed are parallel.
[問題点を解決するための手段]
上記のような問題点を解決するために、この発明は、酸
化物磁性体と合金磁性体層との間に、rVa属もしくは
Va属の金属元素、例えばT i、 Z r。[Means for Solving the Problems] In order to solve the above-mentioned problems, the present invention includes a metal element of the rVa group or the Va group, for example, between the oxide magnetic material and the alloy magnetic layer. T i, Z r.
1−If、V 、Nb、Ta、またはこれらの金属元素
の酸化物からなる中間膜層を形成したものである。1-If, V, Nb, Ta, or an intermediate film layer made of oxides of these metal elements is formed.
[作用]
このような磁気ヘッドにおいては、■a、 Vati?
iの金属元素またはこれらの金属酸化物は、センダスト
などの合金磁性体に拡散しにくいので、ガラスボンディ
ング時において、合金磁性体にこれらの元素が拡散して
磁気特性を劣化させることがない。また、この中間膜層
は酸素の拡散を妨げるので、ガラスボンディング時に、
酸化物磁性体中の酸素が中間層を通って合金磁性体層に
拡散せず、酸化物磁性体の磁気特性の劣化を防ぐ。[Function] In such a magnetic head, ■a, Vati?
Since the metal elements i or their metal oxides are difficult to diffuse into the magnetic alloy such as sendust, these elements do not diffuse into the magnetic alloy and deteriorate the magnetic properties during glass bonding. In addition, this intermediate film layer prevents oxygen diffusion, so during glass bonding,
Oxygen in the oxide magnetic material does not diffuse into the alloy magnetic material layer through the intermediate layer, thereby preventing deterioration of the magnetic properties of the oxide magnetic material.
[実施例] 以下、図面を参照してこの発明の詳細な説明する。[Example] Hereinafter, the present invention will be described in detail with reference to the drawings.
第1図及び第2図はこの発明を用いた磁気ヘッドを示す
もので、Mn−Znフェライトからなるlコア亀及びC
コア2を突き合わけて構成されている。これらのコア1
.2のギャップ部は、第1図に示すように、コア素材で
あるMn−Znフェライトの上にTiからなる中間膜層
3が形成され、さらにその上にセンダスト合金磁性体層
4が形成され、このセンダスト合金磁性体層4が5iO
yのギャップスペーサ層5を介して接合された構造にな
っており、ギャップ部の側部の溝をガラス6により充填
してボンディングされている。FIGS. 1 and 2 show a magnetic head using the present invention, in which an L core made of Mn-Zn ferrite and a C
It is composed of cores 2 that are butted against each other. These cores 1
.. 2, as shown in FIG. 1, an intermediate film layer 3 made of Ti is formed on Mn-Zn ferrite, which is a core material, and a sendust alloy magnetic layer 4 is further formed on it. This Sendust alloy magnetic layer 4 is 5iO
They have a structure in which they are bonded via a gap spacer layer 5 of y, and the grooves on the sides of the gap portion are filled with glass 6 for bonding.
以下、この磁気ヘッドの製造方法について記すと、第3
図に示すものはMn−Znフェライトのコアブロック7
であり、−面に複数の溝8が平行に長さ方向に形成され
、このd−18の間の平面がギャップ面9になる。溝8
を有する側のブロック上面に、スパッタリングにより、
以下の条件でTiの被膜(中間膜層3)を形成した。Below, the method for manufacturing this magnetic head will be described.
What is shown in the figure is Mn-Zn ferrite core block 7.
A plurality of grooves 8 are formed parallel to each other in the length direction on the - face, and the plane between this d-18 becomes the gap face 9. Groove 8
By sputtering, on the top surface of the block on the side with
A Ti coating (intermediate film layer 3) was formed under the following conditions.
スパッタリング:マグネトロンスパッタリングターゲッ
ト:99.99wt%チタン
電源:高周波電源、2 KW
雰囲気: I mT orrA r
温度:100℃
この上にさらにセンダスト合金磁性体層4をスパッタリ
ングにより形成し、ブロック上面に溝に直交する巻線溝
10及び補強溝11を形成し、−方のブロックの上面に
S i Oを等のギャップスペーサ層5を形成し、互い
に突き合わせた状態で、溶融したガラス6を1r48に
充填して固化させる。そして、第3図に矢印で示すよう
に、>I# 8に沿ってコアブロック7を切断し、所定
の機械加工を行って、第2図に示すような磁気ヘッドと
する。Sputtering: Magnetron sputtering Target: 99.99 wt% titanium Power source: High frequency power source, 2 KW Atmosphere: I mT orrA r Temperature: 100°C On top of this, a sendust alloy magnetic layer 4 was further formed by sputtering, and the magnetic layer 4 was formed on the top surface of the block perpendicular to the groove. A winding groove 10 and a reinforcing groove 11 are formed, and a gap spacer layer 5 made of SiO or the like is formed on the upper surface of the − side of the block, and with the blocks butted against each other, 1r48 is filled with molten glass 6. Let solidify. Then, as shown by the arrow in FIG. 3, the core block 7 is cut along >I#8, and predetermined machining is performed to form a magnetic head as shown in FIG.
このように製造された磁気ヘッドの作用を確認するため
に、ギャップ面9にTiからなる中間膜層3及びセンダ
スト合金層4を形成した試料を作り、これを、ガラスボ
ンディングを想゛定した所定の温度(570℃)におい
て非酸化性雰囲気(N、ガス)中で所定の時間(20w
in)焼鈍を行い、焼鈍の前後におけるギャップ面9の
近傍における各元素の分布の変化をオージェ電子分光(
AES)により調べた(第4図及び第5図参照)。また
、比較例として、Tiの替わりにCrを用いたものを同
様に分析した(第6図及び第7図参照)。In order to confirm the effect of the magnetic head manufactured in this way, a sample was prepared in which an intermediate film layer 3 made of Ti and a sendust alloy layer 4 were formed on the gap surface 9, and this was bonded to a predetermined position assuming glass bonding. temperature (570℃) in a non-oxidizing atmosphere (N, gas) for a predetermined time (20w
in) Perform annealing, and observe changes in the distribution of each element near the gap surface 9 before and after annealing using Auger electron spectroscopy (
AES) (see Figures 4 and 5). Furthermore, as a comparative example, a sample using Cr instead of Ti was similarly analyzed (see FIGS. 6 and 7).
これらの結果に見られるように、本実施例においては、
焼鈍の後においてもTiのセンダスト合金層4への拡散
がほとんど見られないのに対し、従来例においては、C
「のセンダスト合金層への拡散が見られる。As seen in these results, in this example,
Even after annealing, almost no Ti diffusion into the sendust alloy layer 4 is observed, whereas in the conventional example, C
``Diffusion into the sendust alloy layer can be seen.
酸素の分布については、第4図において焼鈍の前にすで
にTi層中にかなりの酸素が含まれているのが見られる
が、これは、センダスト合金をスバッタリング形成(3
50℃)するときにTiが酸化されるものである。本実
施例においては、酸素分布は焼鈍の前後で特に変わりが
なく、フェライト層の中間膜層近傍における磁気特性の
変化が少ないことが推定されるが、従来例においては、
当該部分の酸素量が大きく減少しており、フェライト本
来の結晶構造から解離しているものと推定される。これ
は、TiあるいはIVa、Va属の金属は、そのゲッタ
ー効果(酸素を捕らえて不動態化する効果)により酸化
物となり、酸素の拡散に対してバリヤーとして作用する
(バリヤー効果)からであると思われる。Regarding the oxygen distribution, it can be seen in Fig. 4 that there is already a considerable amount of oxygen in the Ti layer before annealing, which is due to the sputtering formation (3) of the sendust alloy.
50°C), Ti is oxidized. In this example, there is no particular difference in the oxygen distribution before and after annealing, and it is presumed that there is little change in the magnetic properties near the intermediate film layer of the ferrite layer, but in the conventional example,
The amount of oxygen in this area has decreased significantly, and it is presumed that the ferrite has dissociated from its original crystal structure. This is because Ti, IVa, and Va group metals become oxides due to their getter effect (effect of trapping oxygen and making it passivate), and act as a barrier against oxygen diffusion (barrier effect). Seem.
本実施例と比較例の効果をさらに具体的に比較するため
に、それぞれのヘッドに高周波電流を流してギャップの
磁気出力を測定した(第7図及び第8図)。これによれ
ば、従来の中間膜層3としてCrを用いたものは一定の
周波数毎に出力の低下が見られる。これは、擬似ギャッ
プにおける出力損失があるためと考えられる。一方、実
施例においては、全周波数域においてmらかな出力が得
られており、擬似ギャップの発生がほとんどないことが
確認できる。In order to more specifically compare the effects of this example and the comparative example, a high frequency current was applied to each head and the magnetic output of the gap was measured (FIGS. 7 and 8). According to this, in the conventional case where Cr is used as the interlayer film layer 3, a decrease in output is observed at every fixed frequency. This is considered to be due to the output loss in the pseudo gap. On the other hand, in the example, a smooth output is obtained in all frequency ranges, and it can be confirmed that there is almost no occurrence of pseudo gaps.
なお、上記の実施例においては、中間膜層3の素材とし
て′riを用いたが、IVa属もしくは■ariAに属
する金属元素またはこれらの酸化物であれば上記と同様
の作用効果を有ずろものであり、適宜選択が可能である
。In the above embodiment, 'ri' was used as the material for the intermediate film layer 3, but any metal element belonging to the IVa group or ■ariA group, or any oxide thereof, may have the same effect as the above. , and can be selected as appropriate.
[発明の効果]
以上詳述したように、この発明は、酸化物磁性体と合金
磁性体層との間に、IVa属またはVa属の金属元素ま
たはその酸化物からなる中間膜層を形成したものであり
、酸化物磁性体と合金磁性体の併行強度を保持しつつ、
製造時の昇温によるギャップ部における各層の間の元素
の拡散を妨げ、各層の磁気特性の劣化を防止し、擬似ギ
ャップの発生を防止することができる。そして、これに
より、酸化物磁性体と合金磁性体の磁気的機械的特徴を
生かしたρ;性能の磁気ヘッドを提供することができる
ものである。[Effects of the Invention] As detailed above, the present invention provides an intermediate film layer made of a metal element of the IVa group or Va group or an oxide thereof between the oxide magnetic material and the alloy magnetic material layer. While maintaining the parallel strength of oxide magnetic material and alloy magnetic material,
It is possible to prevent the diffusion of elements between each layer in the gap portion due to temperature rise during manufacturing, prevent deterioration of the magnetic properties of each layer, and prevent the generation of pseudo gaps. As a result, it is possible to provide a magnetic head with a performance of ρ that takes advantage of the magnetic and mechanical characteristics of the oxide magnetic material and the alloy magnetic material.
第1図はこの発明の一実施例の要部を示す平面図、第2
図は同じく斜視図、第3図はその製造方法を示す斜視図
、第4図は実施例のギャップ部の被膜形成直後の組成を
オージェ電子分光装置で調べた結果を示すグラフ、第5
図はその焼鈍後の結果のグラフ、第6図は従来例の被膜
形成直後の組成を調べた結果のグラフ、第7図はその焼
鈍後の結果のグラフ、第8図は実施例の磁気ヘッドの特
性を示すグラフ、第9図は従来例の磁気ヘッドの特性を
示すグラフである。
1.2・・・・・・コア(酸化物磁性体)、3・・・・
・・中間膜層、4・・・・・・合金磁性体層。FIG. 1 is a plan view showing the main parts of an embodiment of the present invention, and FIG.
3 is a perspective view showing the method of manufacturing the same, FIG. 4 is a graph showing the results of examining the composition of the gap portion of the example immediately after film formation using an Auger electron spectrometer, and FIG.
Figure 6 is a graph of the results after annealing, Figure 6 is a graph of the composition of the conventional example immediately after coating formation, Figure 7 is a graph of the results after annealing, and Figure 8 is the magnetic head of the example. FIG. 9 is a graph showing the characteristics of a conventional magnetic head. 1.2...Core (oxide magnetic material), 3...
... Intermediate film layer, 4... Alloy magnetic layer.
Claims (1)
属もしくはVa属に属する金属元素またはその酸化物か
らなる中間膜層を介して合金磁性体層が形成されている
ことを特徴とする磁気ヘッド。IVa is placed on the gap surface of a pair of cores made of oxide magnetic material.
1. A magnetic head characterized in that an alloy magnetic layer is formed through an intermediate film layer made of a metal element belonging to the group Va or the group Va, or an oxide thereof.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31551287A JPH01155509A (en) | 1987-12-14 | 1987-12-14 | Magnetic head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31551287A JPH01155509A (en) | 1987-12-14 | 1987-12-14 | Magnetic head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01155509A true JPH01155509A (en) | 1989-06-19 |
Family
ID=18066242
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP31551287A Pending JPH01155509A (en) | 1987-12-14 | 1987-12-14 | Magnetic head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01155509A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01303613A (en) * | 1988-05-31 | 1989-12-07 | Nec Kansai Ltd | Magnetic head |
JPH0485713A (en) * | 1990-07-27 | 1992-03-18 | Nec Kansai Ltd | Magnetic head |
JPH04313803A (en) * | 1991-04-12 | 1992-11-05 | Sanyo Electric Co Ltd | Magnetic head |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS613311A (en) * | 1984-06-18 | 1986-01-09 | Sony Corp | Magnetic head |
JPS62145510A (en) * | 1985-12-18 | 1987-06-29 | Sony Corp | Magnetic head |
-
1987
- 1987-12-14 JP JP31551287A patent/JPH01155509A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS613311A (en) * | 1984-06-18 | 1986-01-09 | Sony Corp | Magnetic head |
JPS62145510A (en) * | 1985-12-18 | 1987-06-29 | Sony Corp | Magnetic head |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01303613A (en) * | 1988-05-31 | 1989-12-07 | Nec Kansai Ltd | Magnetic head |
JPH0485713A (en) * | 1990-07-27 | 1992-03-18 | Nec Kansai Ltd | Magnetic head |
JPH04313803A (en) * | 1991-04-12 | 1992-11-05 | Sanyo Electric Co Ltd | Magnetic head |
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