JPH01138638A - Production of information recording medium - Google Patents
Production of information recording mediumInfo
- Publication number
- JPH01138638A JPH01138638A JP62296827A JP29682787A JPH01138638A JP H01138638 A JPH01138638 A JP H01138638A JP 62296827 A JP62296827 A JP 62296827A JP 29682787 A JP29682787 A JP 29682787A JP H01138638 A JPH01138638 A JP H01138638A
- Authority
- JP
- Japan
- Prior art keywords
- film
- gaseous
- gas
- recording
- sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000007789 gas Substances 0.000 claims abstract description 31
- 238000002425 crystallisation Methods 0.000 claims abstract description 23
- 230000008025 crystallization Effects 0.000 claims abstract description 23
- 239000004215 Carbon black (E152) Substances 0.000 claims abstract description 13
- 229930195733 hydrocarbon Natural products 0.000 claims abstract description 13
- 150000002430 hydrocarbons Chemical class 0.000 claims abstract description 13
- 238000004544 sputter deposition Methods 0.000 claims abstract description 13
- 239000011261 inert gas Substances 0.000 claims abstract description 9
- 238000000034 method Methods 0.000 claims description 12
- 230000015572 biosynthetic process Effects 0.000 claims description 9
- 229910052799 carbon Inorganic materials 0.000 claims description 7
- 229910052739 hydrogen Inorganic materials 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 239000004065 semiconductor Substances 0.000 claims description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims description 3
- 150000001335 aliphatic alkanes Chemical class 0.000 claims description 2
- 150000001336 alkenes Chemical class 0.000 claims description 2
- 150000001345 alkine derivatives Chemical class 0.000 claims description 2
- 229910045601 alloy Inorganic materials 0.000 claims description 2
- 239000000956 alloy Substances 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 2
- 229910052745 lead Inorganic materials 0.000 claims description 2
- 239000013081 microcrystal Substances 0.000 claims description 2
- 229910052711 selenium Inorganic materials 0.000 claims description 2
- -1 semimetals Substances 0.000 claims description 2
- 229910052714 tellurium Inorganic materials 0.000 claims description 2
- 229910052787 antimony Inorganic materials 0.000 claims 1
- 229910052785 arsenic Inorganic materials 0.000 claims 1
- 229910052797 bismuth Inorganic materials 0.000 claims 1
- 229910052738 indium Inorganic materials 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 230000035945 sensitivity Effects 0.000 abstract description 10
- 239000000758 substrate Substances 0.000 abstract description 7
- 230000003287 optical effect Effects 0.000 abstract description 6
- 230000015556 catabolic process Effects 0.000 abstract 1
- 238000006731 degradation reaction Methods 0.000 abstract 1
- 238000000151 deposition Methods 0.000 description 9
- 230000008021 deposition Effects 0.000 description 9
- 230000003647 oxidation Effects 0.000 description 8
- 238000007254 oxidation reaction Methods 0.000 description 8
- 230000007423 decrease Effects 0.000 description 5
- 238000004220 aggregation Methods 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Landscapes
- Thermal Transfer Or Thermal Recording In General (AREA)
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は、情報記録媒体の製造方法に関する。[Detailed description of the invention] [Purpose of the invention] (Industrial application field) The present invention relates to a method for manufacturing an information recording medium.
(従来の技術)
炭化水素ガス(例えばCH4ガス)と不活性ガス(例え
ばArガス)の雰囲気中でTeをターゲットとしてスパ
ッタ放電すると、基板上には、Te、C及びHを含む膜
が得られる(以下rTe−C膜」と呼ぶ、)。Te−C
膜はレーザ光を吸収して発熱と、融解してビット(穴)
が形成される(M、 Mashlta and N、
Yasuda 。(Prior art) When sputter discharge is performed using Te as a target in an atmosphere of hydrocarbon gas (e.g., CH4 gas) and inert gas (e.g., Ar gas), a film containing Te, C, and H is obtained on the substrate. (hereinafter referred to as "rTe-C film"). Te-C
The film absorbs laser light and generates heat, melting and forming bits (holes).
is formed (M, Mashlta and N,
Yasuda.
Proceedings of’ SP IE、 42
0.(1982))。Proceedings of' SP IE, 42
0. (1982)).
従ってディジタル情報をピットの有無で記録することが
できる。他方記録膜の情報の読み出しは、レーザ光の反
射を使うのが一般的であるが、もちろん透過光でもよい
。いずれにしても連続発振させたレーザ光を記録膜に照
射したとき、ピットの冑無によって光が変調されればよ
い。Therefore, digital information can be recorded with or without pits. On the other hand, to read information from the recording film, it is common to use reflection of laser light, but of course transmitted light may also be used. In any case, when the recording film is irradiated with continuously oscillated laser light, the light may be modulated by the depth of the pits.
さて上記の方法で得られるTe−C膜は炭化水素ガスと
不活性ガスの流量比を変えることによって、アモルファ
ス、結晶、又は一部分微結晶を含むが全体としてはアモ
ルファス状態のいずれかを維持することができる。即ち
炭化水素ガスの流量をX1不活性ガスの流量をYとし、
Q−fX/(X+Y)l X100%とすれば、形成さ
れる膜の状態はQ値に強く依存する。Now, by changing the flow rate ratio of hydrocarbon gas and inert gas, the Te-C film obtained by the above method can be either amorphous, crystalline, or partially containing microcrystals, but maintaining an amorphous state as a whole. Can be done. That is, the flow rate of hydrocarbon gas is X1, the flow rate of inert gas is Y,
Q-fX/(X+Y)l If X100%, the state of the formed film strongly depends on the Q value.
Qを適当に調節すると、X線回折で調べたとき、特定の
角度からの回折強度のないアモルファス膜を得ることが
できる。このときTe−C膜においては、Teのクラス
タがC及びH成分と混合し、Teのクラスタ同士の間に
絶縁性のC及びH成分が混入している。Te−C膜は、
細かいTeクラスタが凝集しなければ、アモルファス状
態を維持できるわけである。その凝集を妨げているのが
、C及びH成分である。By appropriately adjusting Q, it is possible to obtain an amorphous film with no diffraction intensity from a specific angle when examined by X-ray diffraction. At this time, in the Te-C film, Te clusters are mixed with C and H components, and insulating C and H components are mixed between the Te clusters. The Te-C film is
If the fine Te clusters do not aggregate, the amorphous state can be maintained. It is the C and H components that prevent the aggregation.
このような構造をもつ場合、Te−C膜は単体のTe膜
と比べて、高温高湿(65℃−90%)下においても酸
化されにくい。何故ならTe膜では膜中にTeの酸化に
対してバリアになるものがないのに、Te−C膜はC及
びHがバリアとなってTeの酸化を阻止するように働く
ためである。When having such a structure, the Te-C film is less likely to be oxidized than a single Te film even under high temperature and high humidity (65° C.-90%). This is because the Te film has no barrier against Te oxidation, whereas the Te--C film has C and H acting as a barrier to prevent Te oxidation.
酸化によって記録膜の反射率が低下すると、S/N比が
悪化する。また完全に酸化されなければ、酸化物は赤外
や近赤外域の波長のレーザ光に対しては透明であるため
、反射率のない膜となり、情報の読み出しが全くできな
くなる。When the reflectance of the recording film decreases due to oxidation, the S/N ratio deteriorates. Furthermore, unless it is completely oxidized, the oxide is transparent to laser beams with wavelengths in the infrared and near-infrared regions, so the film becomes a film with no reflectance, making it impossible to read information at all.
これは情報の書込みについても同様である。酸化されれ
ば吸収率が減少するため、書込みに難点が生じる。従っ
て酸化は、情報の書込み及び読み出しの双方にとって好
ましくない。The same applies to writing information. If it is oxidized, the absorption rate will decrease, causing difficulties in writing. Oxidation is therefore unfavorable for both writing and reading information.
しかし、Te−C膜もTeが凝集してしまえば、酸化さ
れる速度はTe膜のそれと同じ程度となってしまう。従
ってTe−C膜のアモルファス状態をできるだけ長く維
持することが、光記録膜としての情報保持時間を保つこ
とになる。従って使用中に記録膜の温度が上昇してもア
モルファス状態から結晶状態に変化しないように、Te
−C膜の結晶化温度をできるだけ高温にする成膜方法が
望まれていた。However, if Te is aggregated in the Te--C film, the oxidation rate will be about the same as that of the Te film. Therefore, maintaining the amorphous state of the Te--C film for as long as possible will maintain the information retention time as an optical recording film. Therefore, even if the temperature of the recording film increases during use, Te
There has been a desire for a film formation method in which the crystallization temperature of the -C film is made as high as possible.
(発明が解決しようとする問題点)
従来は、同一の成膜速度下においては、Q値と結晶化温
度の間に第2図のような関係があるため、記録膜の結晶
化温度を高くし、またTeの耐酸化性を向上させるため
、Q値(炭化水素ガスの相対ff1)を高くしていた。(Problems to be Solved by the Invention) Conventionally, under the same film formation rate, there is a relationship between the Q value and the crystallization temperature as shown in Figure 2, so the crystallization temperature of the recording film is raised. Furthermore, in order to improve the oxidation resistance of Te, the Q value (relative ff1 of hydrocarbon gas) was increased.
しかしそうすると、光記録感度は逆に低下するため、記
録膜の結晶化阻止と記録感度の維持とを同時に満足する
ことはできなかった。またQ値が高くなる、即ち炭化水
素ガスの流量が不活性ガスのそれに比べて高くなると、
炭素がスパッタターゲットに堆積して、第6図に示すよ
うにターゲットのスパッタ効率を阻害するという欠点も
ある。図中、成膜速度は第1回目のスパッタ後における
膜厚を1として規格化しである。However, in this case, the optical recording sensitivity decreases, so it has not been possible to simultaneously prevent the crystallization of the recording film and maintain the recording sensitivity. Also, when the Q value becomes high, that is, when the flow rate of hydrocarbon gas becomes higher than that of inert gas,
Another drawback is that carbon can be deposited on the sputter target, impairing its sputtering efficiency, as shown in FIG. In the figure, the film formation rate is normalized by setting the film thickness after the first sputtering to 1.
[発明の構成]
(問題点を解決するための手段)
本発明は上記問題点を解決するために、炭素、水素及び
金属、半金属又は半導体のいずれか1種又はそれらの合
金を含む情報記録膜を炭化水素ガスと不活性ガスの雰囲
気中でスパッタ法によって形成する情報記録媒体の製造
方法において、炭化水素ガスの流量をX、不活性ガスの
流量をYとしたとき、Q−(X/ (X+Y)l xl
OO%の同一下でスパッタ成膜速度を700人/min
以下とすることを特徴とする情報記録媒体の製造方法を
提供する。[Structure of the Invention] (Means for Solving the Problems) In order to solve the above problems, the present invention provides an information record containing carbon, hydrogen, and any one of metals, semimetals, or semiconductors, or alloys thereof. In a method for manufacturing an information recording medium in which a film is formed by sputtering in an atmosphere of hydrocarbon gas and inert gas, where the flow rate of hydrocarbon gas is X and the flow rate of inert gas is Y, Q-(X/ (X+Y)l xl
The sputtering film formation rate was 700 people/min under the same OO%.
A method for manufacturing an information recording medium is provided, which is characterized by the following features.
(作用)
本発明においては、Q値と結晶化温度の関係遅くするこ
とによって結晶化温度を高くすることができる。即ちQ
値が増加した場合の記録感度及びスパッタ効率の低下と
いう欠点を回避しながら、結晶化温度を上げ、記録膜の
寿命を長くすることができる。(Function) In the present invention, the crystallization temperature can be increased by slowing down the relationship between the Q value and the crystallization temperature. That is, Q
It is possible to increase the crystallization temperature and extend the life of the recording film while avoiding the drawbacks of decreased recording sensitivity and sputtering efficiency when the value increases.
(実施例) 以下添附図面を参照して、本発明の詳細な説明する。(Example) The present invention will be described in detail below with reference to the accompanying drawings.
第1図に示す真空成膜装置において、低真空用バルブ2
を開いて油回転ポンプ3を用い、真空チェンバ1内を大
気圧から0.2Torrまで粗引きする。次いでバルブ
2を閉じた後、高真空用メインバルブ12を開き、クラ
イオポンプ4を用いてチェンバ1内を5 X 10’
Torrまで排気する。In the vacuum film forming apparatus shown in Fig. 1, the low vacuum valve 2
The vacuum chamber 1 was opened and the oil rotary pump 3 was used to roughly pump the inside of the vacuum chamber 1 from atmospheric pressure to 0.2 Torr. Next, after closing the valve 2, the high vacuum main valve 12 is opened, and the inside of the chamber 1 is pumped 5 x 10' using the cryopump 4.
Exhaust to Torr.
次いでArガス導入ライン10及びcH4ガス導入ライ
ン11からそれぞれのマスフローコントローラ20及び
21を通して、ArガスとcH4ガスをIOSCCMづ
つチェンバ1内に導入する。Next, IOSCCM of Ar gas and cH4 gas are introduced into the chamber 1 from the Ar gas introduction line 10 and the cH4 gas introduction line 11 through the respective mass flow controllers 20 and 21.
このときメインバルブ12を制御して、全ガス圧が5
X 10’ Torrとなるようにする。チェンバ1内
は、少なくとも1分間、この圧力に保たれているかをイ
オンゲージ(図示せず)でモニターする。圧力が安定し
たら、パワーサプライ5から100Wの電力をTeター
ゲット6に供給する。At this time, the main valve 12 is controlled so that the total gas pressure is 5
X 10' Torr. An ion gauge (not shown) is used to monitor whether the pressure inside the chamber 1 is maintained at this pressure for at least one minute. Once the pressure is stabilized, power of 100 W is supplied from the power supply 5 to the Te target 6.
ターゲット6上のシャッター13を閉じたまま30秒間
放電させ、放電状態の安定(パワーサプライ5に付属し
ている電圧、電流値の針のフラッキがないこと)が確認
されたら、シャッター13を開ける。予め洗浄したポリ
カーボネート(P C)基板8を取り付けた回転子(ロ
ーテータ)7を20 rptsで回転させて、基板上に
光記録膜9を形成する。Discharge is performed for 30 seconds with the shutter 13 on the target 6 closed, and when it is confirmed that the discharge state is stable (no flaking of the voltage and current value needles attached to the power supply 5), the shutter 13 is opened. A rotator 7 to which a previously cleaned polycarbonate (PC) substrate 8 is attached is rotated at 20 rpts to form an optical recording film 9 on the substrate.
基板は、光記録時に用いるレーザの波長において吸収の
ない透明な材質のものであれば、ポリメチルメタクリレ
ート(PMMA) 、ポリオレフィン(PO) 、ガラ
スでもよい。光ディスクとして用いる場合は、予め案内
溝(プリグループ)を形成した基板を用いることもある
。The substrate may be polymethyl methacrylate (PMMA), polyolefin (PO), or glass as long as it is made of a transparent material that does not absorb at the wavelength of the laser used for optical recording. When used as an optical disc, a substrate on which guide grooves (pre-groups) are formed in advance may be used.
さてスパッタで形成する膜厚は200〜300人とし、
成膜速度は250,500,700及び1000人/a
+1nで実施した。所望の膜厚となったら、再びシャッ
ター13を閉じる。次いでパワーサプライ5からの電力
の供給を停止し、がっ回転子7を停止した後、ガス導入
ライン10及び11のバルブを閉じる。次いで、メイン
バルブ12を全開にして5 X 10’ Torrまで
排気する。Now, the thickness of the film formed by sputtering is 200 to 300,
Film deposition rate is 250, 500, 700 and 1000 people/a
+1n. When the desired film thickness is reached, the shutter 13 is closed again. Next, the supply of electric power from the power supply 5 is stopped, the gas rotor 7 is stopped, and then the valves of the gas introduction lines 10 and 11 are closed. Next, the main valve 12 is fully opened to exhaust the air to 5 x 10' Torr.
次いでリークライン14のバルブ24を開けて、フィル
ター(図示せず)を通過させたN2ガスをチェンバ1内
に導入する。こうして大気圧に戻してから完成した情報
記録媒体30を取出す。Next, the valve 24 of the leak line 14 is opened, and N2 gas that has passed through a filter (not shown) is introduced into the chamber 1. After the pressure is returned to atmospheric pressure, the completed information recording medium 30 is taken out.
第2図にQ値とTe−C膜の結晶化温度の関係を示した
。Q−20%では、成膜速度500人/ff1inの記
録膜の結晶化温度は111℃であるが、成膜速度を25
0人/akinと遅くすると、結晶化温度は126℃に
上昇している。FIG. 2 shows the relationship between the Q value and the crystallization temperature of the Te--C film. At Q-20%, the crystallization temperature of the recording film at a deposition rate of 500 people/ff1in is 111°C, but when the deposition rate is reduced to 25%
When slowing down to 0 person/akin, the crystallization temperature rises to 126°C.
一方向じ結晶化温度の場合で考察すると、Q−20%、
成膜速度250人/minにおける結晶化温度126°
Cは、Q−35%、成膜速度500人/mlnの成膜速
度におけるそれと同等であることが分る。これはCH4
流量を約15%減少させて同じ結晶化温度を得たことに
相当する。Considering the case of unidirectional crystallization temperature, Q-20%,
Crystallization temperature 126° at a deposition rate of 250 people/min
It can be seen that C is equivalent to that at a deposition rate of Q-35% and a deposition rate of 500 people/mln. This is CH4
This corresponds to reducing the flow rate by about 15% to obtain the same crystallization temperature.
ところで1000人/minの成膜速度では、Q−20
%において結晶化温度が100℃以下になる。ところが
通常用いる有機基板の耐熱温度は80℃前後であるため
、記録膜自身の結晶化温度はそれよりもできるだけ高い
ことが必要である。By the way, at a deposition rate of 1000 people/min, Q-20
%, the crystallization temperature is 100°C or less. However, since the heat resistant temperature of the organic substrate normally used is around 80° C., the crystallization temperature of the recording film itself needs to be as high as possible.
目安としては100℃以上が望ましいため、700人/
mln以下の成膜速度が効果的である。As a guideline, a temperature of 100℃ or higher is desirable, so 700 people/
A film formation rate of mln or less is effective.
第3図には−20,50及び100%の条件下で成膜し
た記録膜の書込み特性を示す。書込みは、波長830
nmの半導体レーザによって、パルス幅を60 n5e
cとして行った。また案内溝付き1.2U厚のpc基板
を185 Orpmで回転させて、書込み及び読み出し
を行った。FIG. 3 shows the write characteristics of recording films formed under conditions of -20, 50 and 100%. Writing is at wavelength 830
The pulse width is 60n5e by a nm semiconductor laser.
I went as c. Further, writing and reading were performed by rotating a 1.2U thick PC board with a guide groove at 185 rpm.
これをみると、Q−20%が最も記録感度が高く、Q値
が大きくなるにつれて、書込み閾値における感度が低下
してくる。Looking at this, Q-20% has the highest recording sensitivity, and as the Q value increases, the sensitivity at the writing threshold decreases.
この図で変調度とは、第4図に例示した再生波形におけ
るB/A値で与えられる。In this figure, the degree of modulation is given by the B/A value in the reproduced waveform illustrated in FIG.
第5図は高温高温(65℃−90%)下における寿命の
加速テストの結果である。変化測定項目として情報ビッ
トの誤り率(BER,BitE rror Rata
)を選び、BERの経時的な変化を調べた。FIG. 5 shows the results of an accelerated life test under high temperature conditions (65° C.-90%). Information bit error rate (BER, BitE error rate) is used as a change measurement item.
) was selected and the change in BER over time was investigated.
局所的にせよ酸化が進んだ場合には、ピットの周囲又は
記録膜が透明になる。すると再生波形の歪みが生じたり
、本来ピットでない箇所がピットとして検知され、BE
Rに変化をもたらす。従ってBERの変化は記録膜の酸
化、Te−C膜の場合は前述のようにTeクラスタの凝
集、結晶化の進行と考えられる。When oxidation progresses, even locally, the area around the pits or the recording film becomes transparent. This may cause distortion of the reproduced waveform, or areas that are not originally pits may be detected as pits, causing BE
Bring about a change in R. Therefore, the change in BER is considered to be due to oxidation of the recording film, and in the case of a Te--C film, the aggregation of Te clusters and progress of crystallization as described above.
これをみると、前述の最も記録感度のよかったQ−20
%で、成膜速度1000.700.500及び250人
/winの記録膜を比べると、250Å/minの記録
膜が最もBERの変化が小さい。即ち成膜速度の遅い方
が寿命が長くなることが分る。Looking at this, the Q-20 mentioned above had the best recording sensitivity.
%, when comparing recording films with a film formation rate of 1000.700.500 and 250 people/win, the recording film with a film formation rate of 250 Å/min has the smallest change in BER. In other words, it can be seen that the slower the film formation rate, the longer the life.
なお本発明は、上記実施例に限られるものではない。記
録膜中の金属等として、Te以外にSe。Note that the present invention is not limited to the above embodiments. In addition to Te, Se is used as a metal in the recording film.
B15Ges Sb、Sns In、、S% AS%
Pb又はAgを用いることができる。これらの金属等か
らなる記録膜は、出力の小さい半導体レーザでも十分な
書込み感度があるため、本発明のような民生用の情報記
録媒体に適しているからである。B15Ges Sb, Sns In,, S% AS%
Pb or Ag can be used. This is because a recording film made of these metals has sufficient writing sensitivity even with a semiconductor laser of low output, and is therefore suitable for a consumer information recording medium such as the present invention.
また上記実施例では、炭化水素ガスとしてCH4ガスを
用いたが、C2H6、C3HB等の他のアルカンガスや
、C2H4等のアルケンガス、及びC2H2等のアルキ
ンガスを用いて、同様にTe−C膜を形成することがで
きる。Further, in the above embodiment, CH4 gas was used as the hydrocarbon gas, but other alkane gases such as C2H6 and C3HB, alkene gases such as C2H4, and alkyne gases such as C2H2 may be used to form a Te-C film in the same way. can be formed.
[発明の効果]
以上説明したように本発明によれば、記録感度及びスパ
ッタ効率の低下を防ぎながら、結晶化温度を上げ、記録
膜の寿命を長くすることができる。[Effects of the Invention] As described above, according to the present invention, it is possible to increase the crystallization temperature and extend the life of the recording film while preventing a decrease in recording sensitivity and sputtering efficiency.
第1図は本発明の一実施例に係る真空成膜装置の模式図
、第2図はQ値と結晶化温度の関係を示すグラフ図、第
3図はQ値毎の記録感度を示すグラフ図、第4図は再生
波形のグラフ図、第5図は成膜速度毎の加速寿命を示す
グラフ図、及び第6図はQ値毎のスパッタ成膜速度の変
化を示すグラフ図である。
1・・・・・・真空チェンバ、8・・・・・・pcu板
、9・・・・・・Te−C膜、10・・・・・・Arガ
ス導入ライン、11・・・・・・CH4ガス導入ライン
。
出願人代理人 弁理士 鈴江武彦
第1図
0 20 40 60 80
100 (’10)Q 4
10ト
蓄えみレーザ’teワー
第3図Fig. 1 is a schematic diagram of a vacuum film forming apparatus according to an embodiment of the present invention, Fig. 2 is a graph showing the relationship between Q value and crystallization temperature, and Fig. 3 is a graph showing recording sensitivity for each Q value. 4 is a graph of the reproduced waveform, FIG. 5 is a graph showing the accelerated lifetime for each film deposition rate, and FIG. 6 is a graph showing the change in the sputtering film deposition rate for each Q value. 1... Vacuum chamber, 8... PCU board, 9... Te-C film, 10... Ar gas introduction line, 11...・CH4 gas introduction line. Applicant's agent Patent attorney Takehiko Suzue Figure 1 0 20 40 60 80
Figure 3
Claims (6)
か1種又はそれらの合金を含む情報記録膜を炭化水素ガ
スと不活性ガスの雰囲気中でスパッタ法によって形成す
る情報記録媒体の製造方法において、炭化水素ガスの流
量をX、不活性ガスの流量をYとしたとき、Q={X/
(X+Y)}×100%の同一下でスパッタ成膜速度を
700Å/min以下とすることを特徴とする情報記録
媒体の製造方法。(1) A method for manufacturing an information recording medium in which an information recording film containing carbon, hydrogen, and any one of metals, semimetals, or semiconductors, or alloys thereof is formed by sputtering in an atmosphere of hydrocarbon gas and inert gas. In, when the flow rate of hydrocarbon gas is X and the flow rate of inert gas is Y, Q={X/
A method for manufacturing an information recording medium, characterized in that the sputtering film formation rate is 700 Å/min or less under the same condition of (X+Y)}×100%.
e、Bi、Sb、In、Ag、S、As又はPbである
特許請求の範囲第1項記載の方法。(2) The metal, semimetal or semiconductor is Te, Se, G
The method according to claim 1, wherein the material is e, Bi, Sb, In, Ag, S, As or Pb.
又はアルキンガスである特許請求の範囲第1項記載の方
法。(3) The method according to claim 1, wherein the hydrocarbon gas is an alkane gas, an alkene gas, or an alkyne gas.
ァス膜又は一部に微結晶を含むアモルファス膜である特
許請求の範囲第1項記載の方法。(4) The method according to claim 1, wherein the information recording film is an amorphous film having a crystallization temperature or an amorphous film partially containing microcrystals.
特許請求の範囲第4項記載の方法。(5) The method according to claim 4, wherein the crystallization temperature is 50°C or more and 400°C or less.
記載の方法。(6) The method according to claim 1, wherein the Q is 10% or more.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62296827A JPH01138638A (en) | 1987-11-25 | 1987-11-25 | Production of information recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62296827A JPH01138638A (en) | 1987-11-25 | 1987-11-25 | Production of information recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01138638A true JPH01138638A (en) | 1989-05-31 |
Family
ID=17838672
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62296827A Pending JPH01138638A (en) | 1987-11-25 | 1987-11-25 | Production of information recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01138638A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03142731A (en) * | 1989-10-27 | 1991-06-18 | Dowa Mining Co Ltd | Production of optical disk |
EP0605891A3 (en) * | 1993-01-08 | 1996-08-07 | Eastman Kodak Co | Recordable optical element using low absorption materials. |
-
1987
- 1987-11-25 JP JP62296827A patent/JPH01138638A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03142731A (en) * | 1989-10-27 | 1991-06-18 | Dowa Mining Co Ltd | Production of optical disk |
EP0605891A3 (en) * | 1993-01-08 | 1996-08-07 | Eastman Kodak Co | Recordable optical element using low absorption materials. |
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