JPH01132631A - Siloxane-modified polysulfone-imide and its production - Google Patents
Siloxane-modified polysulfone-imide and its productionInfo
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- JPH01132631A JPH01132631A JP29071087A JP29071087A JPH01132631A JP H01132631 A JPH01132631 A JP H01132631A JP 29071087 A JP29071087 A JP 29071087A JP 29071087 A JP29071087 A JP 29071087A JP H01132631 A JPH01132631 A JP H01132631A
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- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 239000000126 substance Substances 0.000 claims abstract description 34
- 150000001875 compounds Chemical class 0.000 claims abstract description 16
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical compound C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 claims abstract description 15
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims abstract description 14
- 239000002904 solvent Substances 0.000 claims abstract description 13
- 125000003118 aryl group Chemical group 0.000 claims abstract description 8
- 239000007795 chemical reaction product Substances 0.000 claims abstract description 4
- 125000006158 tetracarboxylic acid group Chemical group 0.000 claims description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 2
- 125000004430 oxygen atom Chemical group O* 0.000 claims 2
- 229910052717 sulfur Inorganic materials 0.000 claims 2
- 125000004434 sulfur atom Chemical group 0.000 claims 2
- 239000011521 glass Substances 0.000 abstract description 13
- 229920001721 polyimide Polymers 0.000 abstract description 13
- 238000006243 chemical reaction Methods 0.000 abstract description 5
- 239000004642 Polyimide Substances 0.000 abstract description 4
- 238000010438 heat treatment Methods 0.000 abstract description 4
- 150000000000 tetracarboxylic acids Chemical class 0.000 abstract 2
- 238000006798 ring closing metathesis reaction Methods 0.000 abstract 1
- 239000004952 Polyamide Substances 0.000 description 19
- 229920002647 polyamide Polymers 0.000 description 19
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 16
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 12
- 239000000047 product Substances 0.000 description 11
- -1 Furthermore Chemical class 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 6
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 230000000704 physical effect Effects 0.000 description 5
- ZHBXLZQQVCDGPA-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)sulfonyl]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(S(=O)(=O)C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 ZHBXLZQQVCDGPA-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 239000004205 dimethyl polysiloxane Substances 0.000 description 3
- 229910010272 inorganic material Inorganic materials 0.000 description 3
- 239000011147 inorganic material Substances 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 3
- 239000009719 polyimide resin Substances 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- 150000004985 diamines Chemical class 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 150000003949 imides Chemical class 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- RLYCRLGLCUXUPO-UHFFFAOYSA-N 2,6-diaminotoluene Chemical compound CC1=C(N)C=CC=C1N RLYCRLGLCUXUPO-UHFFFAOYSA-N 0.000 description 1
- ICNFHJVPAJKPHW-UHFFFAOYSA-N 4,4'-Thiodianiline Chemical compound C1=CC(N)=CC=C1SC1=CC=C(N)C=C1 ICNFHJVPAJKPHW-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- JVERADGGGBYHNP-UHFFFAOYSA-N 5-phenylbenzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=2C=CC=CC=2)=C1C(O)=O JVERADGGGBYHNP-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical group C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- QABCGOSYZHCPGN-UHFFFAOYSA-N chloro(dimethyl)silicon Chemical compound C[Si](C)Cl QABCGOSYZHCPGN-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 239000012024 dehydrating agents Substances 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- SIAPCJWMELPYOE-UHFFFAOYSA-N lithium hydride Chemical compound [LiH] SIAPCJWMELPYOE-UHFFFAOYSA-N 0.000 description 1
- 229910000103 lithium hydride Inorganic materials 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- NXFQHRVNIOXGAQ-YCRREMRBSA-N nitrofurantoin Chemical compound O1C([N+](=O)[O-])=CC=C1\C=N\N1C(=O)NC(=O)C1 NXFQHRVNIOXGAQ-YCRREMRBSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920005575 poly(amic acid) Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はシロキサン変性ポリスルホンイミドおよびその
製造方法に関し2耐熱性や機械的物性などにおいて優れ
電気絶縁材料などの広い用途で使用されているポリイミ
ドの特にガラスなどの無機物に対するその接着性を改良
する技術に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to siloxane-modified polysulfonimide and its manufacturing method. In particular, it relates to techniques for improving its adhesion to inorganic materials such as glass.
ポリイミド樹脂は耐熱性や機械的物性などに優れ、高機
能樹脂として知られている。Polyimide resin has excellent heat resistance and mechanical properties, and is known as a high-performance resin.
しかし、その一方で、加工性に劣るなどの改良すべき点
もある。However, on the other hand, there are some points that should be improved, such as poor workability.
ポリイミド樹脂は一般に芳香族酸二無水物とジアミンと
を反応させポリアミド酸とし、次いで加熱環化してポリ
イミドとする。Polyimide resins are generally produced by reacting an aromatic acid dianhydride with a diamine to form a polyamic acid, which is then thermally cyclized to form a polyimide.
上記芳香族酸二無水物としては、一般に、ピロメリット
酸二無水物、ベンゾフェノンテトラカルポン酸二無水物
、ビフェニルテトラカルボン酸二無水物が使用されてい
るが、スルホン基を導入したジフェニルスルホンテトラ
カルボン酸二無水物(D S D A)の使用により、
ポリイミドの加工性を向上し得ることが知られている。As the aromatic acid dianhydride, pyromellitic dianhydride, benzophenonetetracarboxylic dianhydride, and biphenyltetracarboxylic dianhydride are generally used. By using carboxylic dianhydride (DSD A),
It is known that the processability of polyimide can be improved.
すなわち、当該DSDAの使用により、耐熱性うことが
できる。That is, heat resistance can be achieved by using the DSDA.
従って、当該DSDAとジアミンとよりなるポリイミド
は電気・電子部品、自動車、産業機械゛部品、#熱性接
着剤、コーティング剤、電線被覆剤などの用途への拡大
が期待されるが、無機物(シリコンウェハ、金属など)
との接着性が悪いという欠点がある。Therefore, polyimide made of DSDA and diamine is expected to be used in electrical/electronic parts, automobiles, industrial machinery parts, #thermal adhesives, coating agents, wire coatings, etc.; , metal, etc.)
It has the disadvantage of poor adhesion.
本発明は当該DSDAを用いたポリイミド樹脂について
の当該優れた性能を損うことなく、無機物との接着性を
改良することができる技術を提供することを目的とする
。An object of the present invention is to provide a technique that can improve the adhesion to inorganic materials without impairing the excellent performance of polyimide resins using DSDA.
本発明ではDSDAと芳香族ジアミノ化合物との系に、
さらに、両末端にジアミノ基を宥するジメチルシロキサ
ンをジアミノ化合物として用い、これらによる共重合を
行ったもので、
−船式
で示されるジフェニルスルホンテトラカルボン酸二無水
物と
[式中nは少なくとも1の整数]
で示されるジアミノ化合物と
一般式
%式%(3)
で示される芳香族ジアミノ化合物とを、溶媒中で反応さ
せ、反応生成物を加熱して環化させることを特徴とする
一分子中に
で示される繰り返し単位(A)と
[式中、Arは一般式(3)に同じ]
で示される繰り返し単位(B)とを有するシロキサン変
性ポリスルホンイミドの製造方法並びに当該シロキサン
で変性した共重合体に係わる。In the present invention, in the system of DSDA and aromatic diamino compound,
Furthermore, dimethylsiloxane containing diamino groups at both ends is used as a diamino compound, and copolymerization is performed with these, - diphenylsulfone tetracarboxylic dianhydride represented by the boat formula [in the formula, n is at least 1 An integer of %] and an aromatic diamino compound represented by the general formula % (3) are reacted in a solvent, and the reaction product is heated to cyclize the molecule. A method for producing a siloxane-modified polysulfonimide having a repeating unit (A) shown in the formula (A) and a repeating unit (B) shown in Related to polymers.
次に、本発明の構成について補足する。Next, the configuration of the present invention will be supplemented.
−3,3’、4.4’−テトラカルボン酸二無水物(D
S D A)は市販されているものを使用することが
できる。-3,3',4,4'-tetracarboxylic dianhydride (D
As SDA), commercially available ones can be used.
−2ジアミノ
一般式(2)中のnは少なくともlであるが、1〜10
0であることが好ましい。-2diamino n in general formula (2) is at least l, but 1 to 10
Preferably, it is 0.
この一般式(2)において、n=1の1,3−ビス−ガ
ンマ−7ミノプロピルテトラメチルジシロキサンは、例
えば、アクリロニトリルとジメチルクロロシランとを反
応させ、反応生成物を加水分解し、水素還元することに
より得ることができる。In this general formula (2), 1,3-bis-gamma-7minopropyltetramethyldisiloxane with n=1 is produced by, for example, reacting acrylonitrile with dimethylchlorosilane, hydrolyzing the reaction product, and reducing hydrogen. It can be obtained by
また、n=30のジアミノ化合物は、例えば、で示され
る末端塩素ポリジメチルシロキサンを水素化リチウムと
反応させて対応する末端水素ポリジメチルシロキサンと
し、これを7クリロニトリルと反応させ、次いで、当該
反応生成物を水素還元することにより得ることができる
。In addition, the diamino compound with n=30 can be obtained by, for example, reacting a chlorine-terminated polydimethylsiloxane represented by with lithium hydride to obtain a corresponding hydrogen-terminated polydimethylsiloxane, which is then reacted with 7-acrylonitrile, and then reacting with 7-acrylonitrile. It can be obtained by reducing the product with hydrogen.
この、ジアミノ化合物(以下単にシロキサンということ
もある)は、次に述べる一般式(3)で示される芳香族
ジアミノ化合物との合計量に対して0.1モル〜20モ
ル%好ましくは0.1モル−ではガラスなどの無機物と
の接着性が改善されず、20モル%を越えるときにはガ
ラスなどの無機物との接着性は良くても、引張り強度や
軟化点が低下する。This diamino compound (hereinafter sometimes simply referred to as siloxane) is 0.1 to 20 mol%, preferably 0.1 mol% based on the total amount of the aromatic diamino compound represented by the following general formula (3). If the amount exceeds 20 mol %, the adhesion to inorganic materials such as glass is good, but the tensile strength and softening point decrease.
−3ジアミノ
当該化合物の具体例としては、m−フェニレンジアミン
、P−フェニレンジアミン、2.4−ジアミノトルエン
、2,6−ジアミノトルエン、4.4′−ジアミノジフ
ェニルメタン、4.4′−ジアミノジフェニルエーテル
、4,4′−ジアミノジフェニルスルホン、4.4′−
ジアミノジフェニルスルフィド、2.2’−ビス−(p
−7ミノフエニル)プロパン、4.4’−ジアミノベン
ゾフェノン、3.3’−ジアミノベンゾフェノン、4.
4′−ジアミノビフェニル、1.4−ビス(4−アミノ
フェノキシ)ベンゼン、l、3−ビス(4−7ミノフエ
ノキシ)ベンゼン、ビス4−(4−7ミノフエノ1キシ
)ツエルニ】インプロピリデン、l、4−ビス(4−7
ミノフエノキシ)ジフェニルスルホン、4.4’−ビス
(4−7ミノフエノキシ)ビフェニル、4.4’−ビス
(3−7ミノフエノキシ)ジフェニルスルホン、2.6
−ビス(4−アミノフェノキシ)ナフタリン、3.3′
−ジアミノジフェニルスルホン等が挙げられる。-3 Diamino Specific examples of the compound include m-phenylenediamine, P-phenylenediamine, 2,4-diaminotoluene, 2,6-diaminotoluene, 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenyl ether , 4,4'-diaminodiphenylsulfone, 4,4'-
Diaminodiphenylsulfide, 2,2'-bis-(p
-7minophenyl)propane, 4.4'-diaminobenzophenone, 3.3'-diaminobenzophenone, 4.
4'-diaminobiphenyl, 1,4-bis(4-aminophenoxy)benzene, l, 3-bis(4-7minophenoxy)benzene, bis4-(4-7minophenoxy)zerni]impropylidene, l , 4-bis(4-7
Minophenoxy) diphenyl sulfone, 4.4'-bis(4-7 minophenoxy) biphenyl, 4.4'-bis(3-7 minophenoxy) diphenyl sulfone, 2.6
-bis(4-aminophenoxy)naphthalene, 3.3'
-diaminodiphenylsulfone and the like.
ポ1スルホン ミドI び本発明のシロキ
サン変性ポリスルホンイミドは、一般には、一般式(1
)で示されるDSDAと一般式(2)で示されるシロキ
サンと一般式(3)で示される芳香族ジアミノ化合物と
を溶媒の存在下1例えば50℃以下の温度好ましくは室
温下で好ましくは10分間〜20時間反応させてポリア
ミドカルボン酸とした後、該ポリ7ミドカルボン酸を脱
水、イミド環化させることにより合成される。Polysulfonamide I and the siloxane-modified polysulfonimide of the present invention generally have the general formula (1
), a siloxane represented by the general formula (2), and an aromatic diamino compound represented by the general formula (3) in the presence of a solvent at a temperature of, for example, 50°C or lower, preferably at room temperature, for preferably 10 minutes. It is synthesized by reacting for ~20 hours to obtain polyamide carboxylic acid, followed by dehydration and imide cyclization of the polyamide carboxylic acid.
ポリアミドカルボン酸は、下記邊り返し単位(A)′と
繰り返し単位(B)′とからなる。The polyamide carboxylic acid consists of the following repeating unit (A)' and repeating unit (B)'.
・・−(B) ’
当該ポリアミドカルボン酸の固有粘度 (30”0ジメ
チル7七ドアミド溶媒)は0.1〜5.fldl/gで
ある。...-(B)' The intrinsic viscosity of the polyamide carboxylic acid (30"0 dimethyl 77-doamide solvent) is 0.1 to 5. fldl/g.
ポリ7ミドカルボン酸とする際に用いられる溶媒として
は、ジメチル7セト7ミド(DMA(:)。The solvent used when preparing poly-7midecarboxylic acid is dimethyl-7cet-7mide (DMA(:).
テトラヒドロフラン(THF)、ジメチルスルホキシド
(DMSO)、スルホラン、ジメチルホルムアミド(D
MF)、N−メチルピロリドン(NMP)等の非プロト
ン系極性溶媒が挙げられ、THFと上記THF以外の極
性溶媒との混合溶媒を用いることが好ましく、特に、D
MAc /THF混合溶媒が推奨される。Tetrahydrofuran (THF), dimethyl sulfoxide (DMSO), sulfolane, dimethylformamide (D
MF), N-methylpyrrolidone (NMP), etc., and it is preferable to use a mixed solvent of THF and a polar solvent other than THF.
MAc/THF mixed solvent is recommended.
上記反応に際し、分子量調節剤として、フタル酸無水物
又はアニリン、エチルアミン、プロピルアミン、ブチル
アミン等のモノアミン化合物を添加することも可能であ
る。During the above reaction, it is also possible to add phthalic anhydride or a monoamine compound such as aniline, ethylamine, propylamine, butylamine, etc. as a molecular weight regulator.
甥
ポリアミドカルボン酸を脱水、菖化する方法は、ポリア
ミドカルボン酸の溶液又は固体を好ましくは約150〜
300℃の温度で適宜時間熱処理することにより達成さ
れる。The method for dehydrating and converting polyamide carboxylic acid into a polyamide carboxylic acid is to prepare a polyamide carboxylic acid solution or solid at a concentration of preferably about 150 to
This is achieved by heat treatment at a temperature of 300° C. for an appropriate time.
なお、ポリアミドカルボン酸の固体は、ポリアミドカル
ボン酸溶液を、メタノール、エタノール、水等の貧溶媒
に加えることにより、ポリャーを析出させ、次いで50
℃以下の温度で乾燥させることにより得ることができる
。In addition, solid polyamide carboxylic acid is obtained by adding polyamide carboxylic acid solution to a poor solvent such as methanol, ethanol, water, etc. to precipitate polyamide, and then
It can be obtained by drying at a temperature below °C.
又、場合により、ポリアミドカルボン酸の溶液又は固体
に、無水酢酸等の脱水剤を加えて、100〜200℃に
加熱する方法、トルエン、キシレン、クロルベンゼン等
の溶媒中で加熱し、共沸により脱水する方法等によりポ
リアミドカルボ五!
ン酸を脱水、イミドl化することもできる。これらの場
合には、トリエチルアミン、トリブチルアミン等の第三
級アミン化合物やピリジンを触媒として、任意の割合で
加えることもできる更に、本発明のポリスルホンイミド
は、−船式(1)で示されるDSDAと一般式(2)で
示されるシロキサンと一般式(3)で示される芳香族ジ
アミノ化合物を溶媒に加え、第1段階で5℃以下の温度
で10分間〜20時間反応させポリアミドカルボン酸と
した後、100〜250℃の温度で反応水を除去しなが
ら、反応させることによっても製造することができる。In addition, in some cases, a method of adding a dehydrating agent such as acetic anhydride to a solution or solid of polyamide carboxylic acid and heating it to 100 to 200°C, or heating it in a solvent such as toluene, xylene, chlorobenzene, etc., and azeotropically Polyamide carbo five depending on the method of dehydration! It is also possible to dehydrate and imide acid. In these cases, a tertiary amine compound such as triethylamine or tributylamine or pyridine may be added as a catalyst in an arbitrary proportion. A siloxane represented by general formula (2) and an aromatic diamino compound represented by general formula (3) were added to a solvent, and in the first step, they were reacted at a temperature of 5°C or less for 10 minutes to 20 hours to obtain a polyamide carboxylic acid. After that, it can also be produced by reacting at a temperature of 100 to 250° C. while removing reaction water.
この際用い得る溶媒としては、フェノール、0−lm−
及びP−クレゾール等、或いはこれらの混合物が望まし
い0反応水は、トルエン、キシレン、クロルベンゼン等
の溶媒を加°え、共沸により除去することできる。Solvents that can be used at this time include phenol, 0-lm-
and P-cresol, or a mixture thereof.The reaction water can be removed azeotropically by adding a solvent such as toluene, xylene, or chlorobenzene.
上記のようにして、本発明に係るポリスルホンイミドを
製造することができ、従来法に従い、ポリアミドカルボ
ン酸溶液をガラス板などの基材上にフィルムキャストし
、脱溶媒、脱水イミド化してポリスルホンイミドとする
ことができる。The polysulfonimide according to the present invention can be produced as described above, and a polyamide carboxylic acid solution is film cast onto a base material such as a glass plate, and the solvent is removed and the polysulfonimide is dehydrated and imidized. can do.
本発明のポリスルホンイミドは、下記繰り返し単位より
なる。The polysulfonimide of the present invention consists of the following repeating units.
ただし、nは少なくとも1の整数好ましくは1〜20/
99.9〜80、望ましくは0.3〜10/99.7〜
90である。However, n is an integer of at least 1, preferably 1 to 20/
99.9~80, preferably 0.3~10/99.7~
It is 90.
次に1本発明の実施例を示す。 Next, an example of the present invention will be shown.
実施例1゜
4.4′−ジアミノジフェニルエーテル1.003゜(
5,91m @ole、) オJ:び分子量100(l
[−船式(2)中、n= 11]の両末端アミノプ
ロピル基を有するポリジメチルシロキサン0.15g(
0,15■■ole、)をジメチルアセトアミド/テト
ラヒドロフラン (50150voQ、X)の混合溶媒
20dに溶解し、これにジフェニルスルホンテトラカル
ボン酸二無水物1.1347g(5,27+* tso
le、)を加えた0反応混合物を室温下24時間攪拌し
た後、一部反応液を取り出し、イソプロピルアルコール
に再沈精製した。Example 1゜4.4'-diaminodiphenyl ether 1.003゜(
5,91m @ole,) OJ: and molecular weight 100 (l
0.15 g of polydimethylsiloxane having aminopropyl groups at both ends of [-in ship formula (2), n = 11] (
0,15■■ole,) was dissolved in 20d of a mixed solvent of dimethylacetamide/tetrahydrofuran (50150voQ,
After stirring the reaction mixture to which 10% of the reaction mixture had been added, a portion of the reaction mixture was taken out and purified by reprecipitation in isopropyl alcohol.
この生成物の固有粘度は0.59dl /g (30℃
。The intrinsic viscosity of this product is 0.59 dl/g (30°C
.
ジメチルアセトアミド溶媒以下同じ)であった。dimethylacetamide solvent (the same applies hereinafter).
生成物のIRスペクトルは下記の通りであった。The IR spectrum of the product was as follows.
−COOH、3700〜2400”。s−’及(/ 1
7LOcm −’−CON H−; 1840cm−
’ベンゼン環 ; 1480c■−1
−S O2−; 1310cm−’
−O−; 1000cm−五
CHコ
一5i−0−;800Cm’
■
CHコ
以上の結果から、上記で得られれた生成物は、下記の繰
り返し単位(A)′と繰り返し単位(B)′とからなり
、 (A”)’ /(B) ’ Cモル比)−3/
97であるシロキサン鎖を有するポリアミドカルボン酸
である。-COOH, 3700~2400".s-' and (/1
7LOcm-'-CON H-; 1840cm-
'Benzene ring; 1480c■-1 -S O2-; 1310cm-'-O-; 1000cm-5CH 5i-0-; 800Cm' ■ CH From the above results, the product obtained above is It consists of the following repeating unit (A)' and repeating unit (B)', (A'')' / (B) ' C molar ratio) -3/
It is a polyamide carboxylic acid having a siloxane chain of 97.
・・−・・(A)゛ ・・−・・(B)。・・・-・・・(A)゛ ・・・-・・・(B).
次に、残りの反応溶液をガラス板上にキャスティングし
、70℃で30分乾燥後、ガラス板からフィルム状生成
物をはがし、ピンテンターフレームに優り、さらに、2
00℃で30分、300℃で2時間乾燥させた。Next, the remaining reaction solution was cast on a glass plate, and after drying at 70°C for 30 minutes, the film-like product was peeled off from the glass plate, and the film-like product was peeled off from the glass plate.
It was dried at 00°C for 30 minutes and at 300°C for 2 hours.
数色透明のフィルム状生成物が得られた。A several-colored transparent film-like product was obtained.
IR分析した結果、前記生成物の3700〜24’00
cm−五の一〇〇〇Hの吸収及び1840cm−’の一
〇〇NH−の吸収が消失し、新たに、 1770.1?
lOc■−五にイサンである。As a result of IR analysis, the product was 3700-24'00
The absorption of 1000H at cm-5 and the absorption of 100NH- at 1840cm-' disappear, and a new 1770.1?
lOc■-5 is Isan.
り
・・・・・−・・・・・(A)
・(B)
得られたフィルムの物性値を第1表に示すが、耐熱性お
よび機械的物性ともに良好な値を示し、ガラスとの接着
性も良好な結果であった。The physical properties of the obtained film are shown in Table 1, and it shows good values for both heat resistance and mechanical properties, and is compatible with glass. Adhesive properties also showed good results.
実施例2゜
実施例1で4.4′−ジアミノジフェニルエーテルを0
.830g(4,θ4閣mole、) 1両末端アミノ
プロジフェニルスルホンテトラカルボン酸二無水物1.
7?Og (4,,94g+ mole、)を用いた以
外は、実施例1と同様な製法により、フィルム状生成物
を得た。Example 2゜In Example 1, 4,4'-diaminodiphenyl ether was added to 0.
.. 830g (4, θ4 mole,) 1 both terminal aminoprodiphenyl sulfone tetracarboxylic dianhydride 1.
7? A film-like product was obtained by the same manufacturing method as in Example 1 except that Og (4,94 g+ mole) was used.
ポリアミドカルボン@[実施例1と同じ繰り返し単位、
ただしくA) ’ /(B) ’ = 8/94]
の固有粘度は0.52dM /gであり、得られたポリ
イミドフィルム〔実施例1と同じ繰り返し単位、ただし
くA)/(B) = 8/94 ]の物性値を第1表
に示す、耐熱性および機械的物性は実施例1の場合より
、若干低下したものの、ガラスとの接着性は極めて良好
であった・
実施例3゜
実施例1で4,4′−ジアミノジフェニルエーテルを
1.044g(5,21m moJe、) 、両末端ア
ミノプロピル基を有するシロキサン(分子量248−船
式(2)中、n=1)を0.040g(0,18鳳■o
1e、)、ジフェニルスルホンテトラカルボン酸二無水
物1.922g(5,37m mole、)を用いた以
外は、実施例1と同様な製法により、フィルム状生成物
を得た。Polyamide carbon @ [same repeating unit as Example 1,
However, A) ' / (B) ' = 8/94]
The intrinsic viscosity of the polyimide film was 0.52 dM/g, and the physical properties of the obtained polyimide film [same repeating unit as in Example 1, where A)/(B) = 8/94] are shown in Table 1. Although the mechanical properties were slightly lower than those in Example 1, the adhesion to glass was extremely good.Example 3
1.044g (5,21m moJe,), 0.040g (0,18mm o
A film-like product was obtained in the same manner as in Example 1, except that 1.922 g (5.37 mmole, ) of diphenylsulfone tetracarboxylic dianhydride was used.
ポリアミドカルボン酸[繰り返し単位(A)′H3
S
H3
実施例1に同じ]の固有粘度はO/73dl / gで
あり、得られたポリイミドフィルム[繰り返し単位H3
H3
る他は、実施例1に同じ]の物性値を第1表に示す、耐
熱性および機械的物性とも良好な結果であり、ガラスと
の接着性も良好であった。The intrinsic viscosity of the polyamide carboxylic acid [repeating unit (A)'H3 S H3 same as Example 1] is O/73 dl/g, and the obtained polyimide film [same as Example 1 except that repeating unit H3 H3 ] The physical property values are shown in Table 1, and the heat resistance and mechanical properties were both good, and the adhesion to glass was also good.
実施例4゜
実施例1で4.4′−ジアミノジフェニルエーテルを
0.92E1g (4,84m mo(le、)、両末
端アミノプロピル基を有するシロキサン(分子量250
〇−船式(2)中、n=31)を0.359g (0,
14m mole、)、ジフェニルスルホンテトラカル
ボン酸二無水物1.712g (4,78腸霧oJe、
)を用いた以外は、実施例1と同様な製法により、フィ
ルム状生成物を得た。Example 4゜In Example 1, 4,4'-diaminodiphenyl ether
0.92E1g (4,84m mo(le,), siloxane having aminopropyl groups at both ends (molecular weight 250
〇-In ship formula (2), n=31) is 0.359g (0,
14m mole, ), diphenylsulfone tetracarboxylic dianhydride 1.712g (4,78 oJe,
) A film-like product was obtained by the same manufacturing method as in Example 1, except that the following was used.
ポリアミドカルボン酸[繰り返し単位(A)′H3
あり、得られたポリイミドフィルム[繰り返し単H3
H3
である他は、実施例1に同じ]の物性値を第1表に示す
、耐熱性および機械的物性とも良好な結果であり、ガラ
スとの接着性も良好であった。The physical properties of the polyamide carboxylic acid [having the repeating unit (A)'H3 and the obtained polyimide film [same as Example 1 except that it is a repeating unit H3 H3] are shown in Table 1, heat resistance and mechanical properties. Both results were good, and the adhesion to glass was also good.
比較例1゜
実施(M 1で4.4′−ジアミノジフェニルエース九
ホン
チルを 1.078g (5,37■層ole、) 、
ジフェミ丁ダ1ラカルポン酸二無水物 1.924g
(5,37m mole、)をな製法によった。ポリア
ミドカルボン酸の固有粘”度は0.95+HL /gで
あり、得られたポリイミドフィルムの物性を第1表に示
す、シロキサンを用いずに得られたポリイミドフィルム
のガラスとの接着性は極めて悪かった。Comparative Example 1゜Execution (1.078 g of 4,4'-diaminodiphenyl ace 9-hontyl (5,37 layer ole,) in M1,
Difemitoda 1 lacarponic dianhydride 1.924g
(5.37m mole) was manufactured using a similar manufacturing method. The intrinsic viscosity of the polyamide carboxylic acid is 0.95+HL/g, and the physical properties of the polyimide film obtained are shown in Table 1. The adhesion to glass of the polyimide film obtained without using siloxane was extremely poor. Ta.
(発明の効果)
本発明によれば、ジフェニルスルホンテトラカルボン酸
二無水物を酸成分として用いたポリスルホンイミド樹脂
についての当該価れた性能である機械的物性や耐熱性や
加工性等を保持しつつ、さらに、ガラス等の無機物との
接着性を改良することができた。(Effects of the Invention) According to the present invention, the mechanical properties, heat resistance, processability, etc., which are the valuable performances of the polysulfonimide resin using diphenylsulfonetetracarboxylic dianhydride as the acid component, can be maintained. At the same time, it was also possible to improve the adhesion to inorganic substances such as glass.
特許出願人 東燃石油化学株式会社 新日本理化株式会社Patent applicant: Tonen Petrochemical Co., Ltd. New Japan Chemical Co., Ltd.
Claims (1)
式、化学式、表等があります▼ ▲数式、化学式、表等があります▼、▲数式、化学式、
表等があります▼ ▲数式、化学式、表等があります▼若しくは ▲数式、化学式、表等があります▼を示し、Rは水素原 子若しくはCH_3基、 Xは結合、酸素原子、硫黄原子、SO_2、CH_2若
しくは▲数式、化学式、表等があります▼、Ar′は▲
数式、化学式、表等があります▼、▲数式、化学式、表
等があります▼、▲数式、化学式、表等があります▼ ▲数式、化学式、表等があります▼、▲数式、化学式、
表等があります▼ 若しくは▲数式、化学式、表等があります▼をそれぞれ
示す。] で示される繰り返し単位(B)とを有するシロキサン変
性ポリスルホンイミド。 2、一般式 ▲数式、化学式、表等があります▼………………(1) で示されるジフェニルスルホンテトラカルボン酸二無水
物と 一般式 ▲数式、化学式、表等があります▼・・・(2) [式中nは少なくとも1の整数] で示されるジアミノ化合物と 一般式 H_2N−Ar−NH_2…………………………(3)
[式中Arは▲数式、化学式、表等があります▼、▲数
式、化学式、表等があります▼ ▲数式、化学式、表等があります▼、▲数式、化学式、
表等があります▼ ▲数式、化学式、表等があります▼若しくは ▲数式、化学式、表等があります▼を示し、Rは水素原 子若しくはCH_3基、 Xは結合、酸素原子、硫黄原子、SO_2、CH_2若
しくは▲数式、化学式、表等があります▼、Ar′は▲
数式、化学式、表等があります▼、▲数式、化学式、表
等があります▼、▲数式、化学式、表等があります▼、 ▲数式、化学式、表等があります▼、▲数式、化学式、
表等があります▼ 若しくは▲数式、化学式、表等があります▼をそれぞれ
示す。] で示される芳香族ジアミノ化合物とを、溶媒中で反応さ
せ、反応生成物を加熱して環化させることを特徴とする 一分子中に ▲数式、化学式、表等があります▼ [式中、nは一般式(2)に同じ] で示される繰り返し単位(A)と ▲数式、化学式、表等があります▼ [式中、Arは一般式(3)に同じ] で示される繰り返し単位(B)とを有するシロキサン変
性ポリスルホンイミドの製造方法。[Claims] 1. One molecule contains a repeating unit (A) represented by ▲ a mathematical formula, a chemical formula, a table, etc. [in the formula, n is an integer of at least 1] and a ▲ a mathematical formula, a chemical formula, a table, etc. ▼ [In the formula, Ar is ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, ▲ Mathematical formulas, chemical formulas,
There are tables, etc. ▼ ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ or ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ where R is a hydrogen atom or CH_3 group, X is a bond, oxygen atom, sulfur atom, SO_2, CH_2 Or ▲There are mathematical formulas, chemical formulas, tables, etc.▼, Ar' is▲
There are mathematical formulas, chemical formulas, tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, ▲ Mathematical formulas, chemical formulas,
There are tables, etc.▼ or ▲There are mathematical formulas, chemical formulas, tables, etc.▼, respectively. ] A siloxane-modified polysulfonimide having a repeating unit (B) represented by the following. 2. General formula▲There are mathematical formulas, chemical formulas, tables, etc.▼………………(1) Diphenylsulfone tetracarboxylic dianhydride and general formula▲There are mathematical formulas, chemical formulas, tables, etc.▼・・・(2) [In the formula, n is an integer of at least 1] A diamino compound represented by the following and the general formula H_2N-Ar-NH_2………………………………(3)
[Ar in the formula is ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, ▲ Mathematical formulas, chemical formulas,
There are tables, etc. ▼ ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ or ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ where R is a hydrogen atom or CH_3 group, X is a bond, oxygen atom, sulfur atom, SO_2, CH_2 Or ▲There are mathematical formulas, chemical formulas, tables, etc.▼, Ar' is▲
There are mathematical formulas, chemical formulas, tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, ▲ Mathematical formulas, chemical formulas,
There are tables, etc.▼ or ▲There are mathematical formulas, chemical formulas, tables, etc.▼, respectively. ] The aromatic diamino compound shown by is reacted in a solvent, and the reaction product is heated to cyclize.There are ▲mathematical formulas, chemical formulas, tables, etc. in one molecule▼ [In the formula, n is the same as the general formula (2)] The repeating unit (A) represented by ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ [In the formula, Ar is the same as the general formula (3)] The repeating unit (B) ) A method for producing a siloxane-modified polysulfonimide.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29071087A JPH01132631A (en) | 1987-11-19 | 1987-11-19 | Siloxane-modified polysulfone-imide and its production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29071087A JPH01132631A (en) | 1987-11-19 | 1987-11-19 | Siloxane-modified polysulfone-imide and its production |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01132631A true JPH01132631A (en) | 1989-05-25 |
Family
ID=17759517
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP29071087A Pending JPH01132631A (en) | 1987-11-19 | 1987-11-19 | Siloxane-modified polysulfone-imide and its production |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01132631A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0967559A (en) * | 1995-08-31 | 1997-03-11 | Tomoegawa Paper Co Ltd | Adhesive tape for electronic parts and liquid adhesive |
KR19990053253A (en) * | 1997-12-24 | 1999-07-15 | 유현식 | Soluble polyimide resin composition |
CN110922599A (en) * | 2019-12-12 | 2020-03-27 | 哈尔滨工业大学 | Bisphenol S hybrid silicon resin and synthetic method thereof |
-
1987
- 1987-11-19 JP JP29071087A patent/JPH01132631A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0967559A (en) * | 1995-08-31 | 1997-03-11 | Tomoegawa Paper Co Ltd | Adhesive tape for electronic parts and liquid adhesive |
KR19990053253A (en) * | 1997-12-24 | 1999-07-15 | 유현식 | Soluble polyimide resin composition |
CN110922599A (en) * | 2019-12-12 | 2020-03-27 | 哈尔滨工业大学 | Bisphenol S hybrid silicon resin and synthetic method thereof |
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