JPH01130527U - - Google Patents
Info
- Publication number
- JPH01130527U JPH01130527U JP2779488U JP2779488U JPH01130527U JP H01130527 U JPH01130527 U JP H01130527U JP 2779488 U JP2779488 U JP 2779488U JP 2779488 U JP2779488 U JP 2779488U JP H01130527 U JPH01130527 U JP H01130527U
- Authority
- JP
- Japan
- Prior art keywords
- gas
- spray nozzle
- liquid
- liquid mixing
- pump
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 claims description 9
- 239000007921 spray Substances 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 239000004065 semiconductor Substances 0.000 claims description 5
- 238000004140 cleaning Methods 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Description
第１図は、本考案の実施例を示す配管図、第２
図は、従来の半導体製造装置用治工具洗浄装置の
概念図を表している。
１……収納室、２……半導体製造装置用治工具
、３……気液混合噴霧ノズル、４……エツチング
液、５……排液口、６……ポンプ、７……フイル
ター、８……気体配管、９……洗浄槽。
Fig. 1 is a piping diagram showing an embodiment of the present invention;
The figure represents a conceptual diagram of a conventional jig and tool cleaning device for semiconductor manufacturing equipment. DESCRIPTION OF SYMBOLS 1... Storage chamber, 2... Jig and tool for semiconductor manufacturing equipment, 3... Gas-liquid mixing spray nozzle, 4... Etching liquid, 5... Drain port, 6... Pump, 7... Filter, 8... ...Gas piping, 9...Cleaning tank.
Claims (1)
前記収納室内の前記半導体製造装置用治工具にエ
ツチング液を噴霧するべく設置させた気液混合噴
霧ノズルと、前記気液混合噴霧ノズルに気体を供
給するべく設置させた気体配管と、前記収納室底
部に少なくとも１つ設置させた排液口と、前記排
液口から前記気液混合噴霧ノズルに送液すべく設
置させたポンプ及び配管と、前記ポンプから前記
気液混合噴霧ノズルへ送液する際に、前記エツチ
ング液をろ過すべく設置させたフイルターとを具
備する事を特徴とする半導体製造装置用治工具洗
浄装置。 A storage room for storing jigs and tools for semiconductor manufacturing equipment;
A gas-liquid mixing spray nozzle installed to spray etching liquid onto the semiconductor manufacturing equipment tools in the storage chamber, a gas pipe installed to supply gas to the gas-liquid mixing spray nozzle, and the storage chamber. at least one drain port installed at the bottom; a pump and piping installed to send liquid from the drain port to the gas-liquid mixing spray nozzle; and a pump and piping installed to send liquid from the pump to the gas-liquid mixing spray nozzle. A jig and tool cleaning device for semiconductor manufacturing equipment, further comprising a filter installed to filter the etching solution.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2779488U JPH01130527U (en) | 1988-03-01 | 1988-03-01 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2779488U JPH01130527U (en) | 1988-03-01 | 1988-03-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01130527U true JPH01130527U (en) | 1989-09-05 |
Family
ID=31250600
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2779488U Pending JPH01130527U (en) | 1988-03-01 | 1988-03-01 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01130527U (en) |
-
1988
- 1988-03-01 JP JP2779488U patent/JPH01130527U/ja active Pending