JPH01127237U - - Google Patents
Info
- Publication number
- JPH01127237U JPH01127237U JP2445388U JP2445388U JPH01127237U JP H01127237 U JPH01127237 U JP H01127237U JP 2445388 U JP2445388 U JP 2445388U JP 2445388 U JP2445388 U JP 2445388U JP H01127237 U JPH01127237 U JP H01127237U
- Authority
- JP
- Japan
- Prior art keywords
- disc
- conductive
- electrode
- wires
- electrode plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims 2
Landscapes
- Electrodes Of Semiconductors (AREA)
- Chemical Vapour Deposition (AREA)
Description
第1図a,bはそれぞれ本考案電極の一実施例
の構成を示す簡略斜視図及びその簡略断面図、第
2図a,bはそれぞれ従来電極の一例の構成を示
す簡略斜視図及びその横断面図、第3図a,bは
それぞれ従来電極の他例の構成を示す斜視図及び
その平面図である。
1,1a,1b……円板型電極板、2……保持
治具、3a,3b……電極線、4a,4b……導
電クリツプ、5a,5b……導線、6a,6b…
…絶縁管。
Figures 1a and b are a simplified perspective view and a simplified sectional view showing the configuration of an embodiment of the electrode of the present invention, respectively, and Figures 2a and b are a simplified perspective view and a cross-sectional view of the configuration of an example of a conventional electrode, respectively. The top view and FIGS. 3a and 3b are a perspective view and a plan view, respectively, showing the structure of another example of the conventional electrode. 1, 1a, 1b... Disk-type electrode plate, 2... Holding jig, 3a, 3b... Electrode wire, 4a, 4b... Conductive clip, 5a, 5b... Conductive wire, 6a, 6b...
...Insulated tube.
Claims (1)
板1を平行に保持し、これらの円板型電極板1を
交互に電極線3a,3bで接続してなる縦型プラ
ズマCVD用電極。 (2) 電極線3a,3bは複数枚の円板型電極板
1のうち、一方の1枚おきの円板型電極板1a及
び他方の1枚おきの円板型電極板1bにそれぞれ
接する導電クリツプ4a,4bと、一方の導電ク
リツプ4a間及び他方の導電クリツプ4b間をそ
れぞれ接続する導線5a,5bと、一方の導線5
aに施され当該導線5aと他方の電極板1bとの
接触及び他方の電極板1bとの間のプラズマ放電
を防止する絶縁管6aと、他方の導線5bに施さ
れ当該導線5bと一方の電極板1aとの接触及び
一方の電極板1aとの間のプラズマ放電を防止す
る絶縁管6bとより構成された実用新案登録請求
の範囲第1項記載の縦型プラズマCVD用電極。[Claims for Utility Model Registration] (1) A plurality of disc-shaped electrode plates 1 are held in parallel inside the holding jig 2, and these disc-shaped electrode plates 1 are alternately connected to electrode wires 3a and 3b. Vertical plasma CVD electrodes connected by . (2) The electrode wires 3a and 3b are conductive wires that are in contact with every other disc-shaped electrode plate 1a and every other disc-shaped electrode plate 1b of the plurality of disc-shaped electrode plates 1, respectively. Clips 4a and 4b, conductive wires 5a and 5b that respectively connect one conductive clip 4a and the other conductive clip 4b, and one conductive wire 5.
an insulating tube 6a applied to the conductive wire 5a to prevent contact between the conductive wire 5a and the other electrode plate 1b and plasma discharge between the conductive wire 5b and the other electrode plate 1b; The vertical plasma CVD electrode according to claim 1, which is comprised of an insulating tube 6b that prevents contact with the plate 1a and plasma discharge between the electrode plate 1a and one of the electrode plates 1a.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2445388U JPH01127237U (en) | 1988-02-24 | 1988-02-24 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2445388U JPH01127237U (en) | 1988-02-24 | 1988-02-24 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01127237U true JPH01127237U (en) | 1989-08-31 |
Family
ID=31244313
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2445388U Pending JPH01127237U (en) | 1988-02-24 | 1988-02-24 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01127237U (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02108335U (en) * | 1989-02-17 | 1990-08-29 | ||
JP2006278652A (en) * | 2005-03-29 | 2006-10-12 | Hitachi Kokusai Electric Inc | Board processor |
JP2007251014A (en) * | 2006-03-17 | 2007-09-27 | Hitachi Kokusai Electric Inc | Substrate processing equipment |
WO2009131048A1 (en) * | 2008-04-24 | 2009-10-29 | シャープ株式会社 | Plasma processing apparatus and plasma processing method using the same |
-
1988
- 1988-02-24 JP JP2445388U patent/JPH01127237U/ja active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02108335U (en) * | 1989-02-17 | 1990-08-29 | ||
JP2006278652A (en) * | 2005-03-29 | 2006-10-12 | Hitachi Kokusai Electric Inc | Board processor |
JP2007251014A (en) * | 2006-03-17 | 2007-09-27 | Hitachi Kokusai Electric Inc | Substrate processing equipment |
WO2009131048A1 (en) * | 2008-04-24 | 2009-10-29 | シャープ株式会社 | Plasma processing apparatus and plasma processing method using the same |
JP2009267048A (en) * | 2008-04-24 | 2009-11-12 | Sharp Corp | Plasma processing apparatus and plasma processing method using same |
JP4547443B2 (en) * | 2008-04-24 | 2010-09-22 | シャープ株式会社 | Plasma processing apparatus and plasma processing method using the same |
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