JPH01124851A - Method for development processing of silver halide photographic sensitive material - Google Patents
Method for development processing of silver halide photographic sensitive materialInfo
- Publication number
- JPH01124851A JPH01124851A JP28387187A JP28387187A JPH01124851A JP H01124851 A JPH01124851 A JP H01124851A JP 28387187 A JP28387187 A JP 28387187A JP 28387187 A JP28387187 A JP 28387187A JP H01124851 A JPH01124851 A JP H01124851A
- Authority
- JP
- Japan
- Prior art keywords
- group
- developer
- hydrogen atom
- silver halide
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 silver halide Chemical class 0.000 title claims abstract description 58
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 29
- 239000004332 silver Substances 0.000 title claims abstract description 29
- 239000000463 material Substances 0.000 title claims abstract description 28
- 238000000034 method Methods 0.000 title claims description 40
- 238000011161 development Methods 0.000 title description 22
- 238000012545 processing Methods 0.000 title description 16
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 16
- 125000003118 aryl group Chemical group 0.000 claims abstract description 13
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 12
- 150000005208 1,4-dihydroxybenzenes Chemical class 0.000 claims abstract description 9
- 150000001875 compounds Chemical class 0.000 claims description 27
- 125000003277 amino group Chemical group 0.000 claims description 9
- 125000000623 heterocyclic group Chemical group 0.000 claims description 8
- 229910052757 nitrogen Inorganic materials 0.000 claims description 8
- 125000003545 alkoxy group Chemical group 0.000 claims description 6
- 125000004104 aryloxy group Chemical group 0.000 claims description 6
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 claims description 5
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 claims description 5
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 5
- 238000006460 hydrolysis reaction Methods 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- 125000002252 acyl group Chemical group 0.000 claims description 2
- 125000003342 alkenyl group Chemical group 0.000 claims description 2
- 125000002349 hydroxyamino group Chemical group [H]ON([H])[*] 0.000 claims description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 2
- 230000007062 hydrolysis Effects 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 abstract description 21
- 125000001424 substituent group Chemical group 0.000 abstract description 11
- 230000003647 oxidation Effects 0.000 abstract description 7
- 238000007254 oxidation reaction Methods 0.000 abstract description 7
- 208000002109 Argyria Diseases 0.000 abstract description 3
- 125000004432 carbon atom Chemical group C* 0.000 abstract description 3
- 125000005843 halogen group Chemical group 0.000 abstract description 3
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 28
- 239000000243 solution Substances 0.000 description 17
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 16
- 238000005406 washing Methods 0.000 description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 16
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 14
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 12
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical class OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 12
- 239000007788 liquid Substances 0.000 description 12
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 12
- 239000002253 acid Substances 0.000 description 10
- 239000000839 emulsion Substances 0.000 description 10
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 10
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 9
- 238000001035 drying Methods 0.000 description 8
- 235000010265 sodium sulphite Nutrition 0.000 description 8
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical class NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 7
- 239000002738 chelating agent Substances 0.000 description 7
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 230000000087 stabilizing effect Effects 0.000 description 6
- 229960000583 acetic acid Drugs 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 229910001961 silver nitrate Inorganic materials 0.000 description 5
- 108010010803 Gelatin Proteins 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 239000013522 chelant Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 239000008273 gelatin Substances 0.000 description 4
- 229920000159 gelatin Polymers 0.000 description 4
- 235000019322 gelatine Nutrition 0.000 description 4
- 235000011852 gelatine desserts Nutrition 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- QPCDCPDFJACHGM-UHFFFAOYSA-N N,N-bis{2-[bis(carboxymethyl)amino]ethyl}glycine Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC(O)=O QPCDCPDFJACHGM-UHFFFAOYSA-N 0.000 description 3
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 3
- 206010070834 Sensitisation Diseases 0.000 description 3
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 125000003368 amide group Chemical group 0.000 description 3
- 239000003242 anti bacterial agent Substances 0.000 description 3
- 230000000844 anti-bacterial effect Effects 0.000 description 3
- 229940121375 antifungal agent Drugs 0.000 description 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 3
- 239000004327 boric acid Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000012141 concentrate Substances 0.000 description 3
- 125000004093 cyano group Chemical group *C#N 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000012362 glacial acetic acid Substances 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 3
- 229960003330 pentetic acid Drugs 0.000 description 3
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical class N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 3
- 239000004848 polyfunctional curative Substances 0.000 description 3
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 3
- 235000019252 potassium sulphite Nutrition 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- NDGRWYRVNANFNB-UHFFFAOYSA-N pyrazolidin-3-one Chemical class O=C1CCNN1 NDGRWYRVNANFNB-UHFFFAOYSA-N 0.000 description 3
- 230000008313 sensitization Effects 0.000 description 3
- 239000010802 sludge Substances 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 3
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 3
- AYNPIRVEWMUJDE-UHFFFAOYSA-N 2,5-dichlorohydroquinone Chemical compound OC1=CC(Cl)=C(O)C=C1Cl AYNPIRVEWMUJDE-UHFFFAOYSA-N 0.000 description 2
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- GUUULVAMQJLDSY-UHFFFAOYSA-N 4,5-dihydro-1,2-thiazole Chemical class C1CC=NS1 GUUULVAMQJLDSY-UHFFFAOYSA-N 0.000 description 2
- DSVIHYOAKPVFEH-UHFFFAOYSA-N 4-(hydroxymethyl)-4-methyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(CO)CN1C1=CC=CC=C1 DSVIHYOAKPVFEH-UHFFFAOYSA-N 0.000 description 2
- ZFIQGRISGKSVAG-UHFFFAOYSA-N 4-methylaminophenol Chemical compound CNC1=CC=C(O)C=C1 ZFIQGRISGKSVAG-UHFFFAOYSA-N 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- 229910021612 Silver iodide Inorganic materials 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 235000010724 Wisteria floribunda Nutrition 0.000 description 2
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 2
- 125000004414 alkyl thio group Chemical group 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- XYXNTHIYBIDHGM-UHFFFAOYSA-N ammonium thiosulfate Chemical compound [NH4+].[NH4+].[O-]S([O-])(=O)=S XYXNTHIYBIDHGM-UHFFFAOYSA-N 0.000 description 2
- 230000000843 anti-fungal effect Effects 0.000 description 2
- 125000005161 aryl oxy carbonyl group Chemical group 0.000 description 2
- 125000005110 aryl thio group Chemical group 0.000 description 2
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000000084 colloidal system Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 229910001447 ferric ion Inorganic materials 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 125000004573 morpholin-4-yl group Chemical group N1(CCOCC1)* 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 125000005936 piperidyl group Chemical group 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- RWPGFSMJFRPDDP-UHFFFAOYSA-L potassium metabisulfite Chemical compound [K+].[K+].[O-]S(=O)S([O-])(=O)=O RWPGFSMJFRPDDP-UHFFFAOYSA-L 0.000 description 2
- 229940043349 potassium metabisulfite Drugs 0.000 description 2
- 235000010263 potassium metabisulphite Nutrition 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- 125000004076 pyridyl group Chemical group 0.000 description 2
- 230000005070 ripening Effects 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 229940045105 silver iodide Drugs 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 2
- 125000000565 sulfonamide group Chemical group 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- OHBQPCCCRFSCAX-UHFFFAOYSA-N 1,4-Dimethoxybenzene Chemical compound COC1=CC=C(OC)C=C1 OHBQPCCCRFSCAX-UHFFFAOYSA-N 0.000 description 1
- IWPGKPWCKGMJMG-UHFFFAOYSA-N 1-(4-aminophenyl)-4,4-dimethylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(C)CN1C1=CC=C(N)C=C1 IWPGKPWCKGMJMG-UHFFFAOYSA-N 0.000 description 1
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical compound SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 description 1
- HIGSPBFIOSHWQG-UHFFFAOYSA-N 2-Isopropyl-1,4-benzenediol Chemical compound CC(C)C1=CC(O)=CC=C1O HIGSPBFIOSHWQG-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- URDCARMUOSMFFI-UHFFFAOYSA-N 2-[2-[bis(carboxymethyl)amino]ethyl-(2-hydroxyethyl)amino]acetic acid Chemical compound OCCN(CC(O)=O)CCN(CC(O)=O)CC(O)=O URDCARMUOSMFFI-UHFFFAOYSA-N 0.000 description 1
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical class NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 1
- REFDOIWRJDGBHY-UHFFFAOYSA-N 2-bromobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Br)=C1 REFDOIWRJDGBHY-UHFFFAOYSA-N 0.000 description 1
- CYEJMVLDXAUOPN-UHFFFAOYSA-N 2-dodecylphenol Chemical compound CCCCCCCCCCCCC1=CC=CC=C1O CYEJMVLDXAUOPN-UHFFFAOYSA-N 0.000 description 1
- SJSJAWHHGDPBOC-UHFFFAOYSA-N 4,4-dimethyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(C)CN1C1=CC=CC=C1 SJSJAWHHGDPBOC-UHFFFAOYSA-N 0.000 description 1
- FJWJYHHBUMICTP-UHFFFAOYSA-N 4,4-dimethylpyrazolidin-3-one Chemical compound CC1(C)CNNC1=O FJWJYHHBUMICTP-UHFFFAOYSA-N 0.000 description 1
- SOVXTYUYJRFSOG-UHFFFAOYSA-N 4-(2-hydroxyethylamino)phenol Chemical compound OCCNC1=CC=C(O)C=C1 SOVXTYUYJRFSOG-UHFFFAOYSA-N 0.000 description 1
- SRYYOKKLTBRLHT-UHFFFAOYSA-N 4-(benzylamino)phenol Chemical compound C1=CC(O)=CC=C1NCC1=CC=CC=C1 SRYYOKKLTBRLHT-UHFFFAOYSA-N 0.000 description 1
- HDGMAACKJSBLMW-UHFFFAOYSA-N 4-amino-2-methylphenol Chemical compound CC1=CC(N)=CC=C1O HDGMAACKJSBLMW-UHFFFAOYSA-N 0.000 description 1
- FIARATPVIIDWJT-UHFFFAOYSA-N 5-methyl-1-phenylpyrazolidin-3-one Chemical compound CC1CC(=O)NN1C1=CC=CC=C1 FIARATPVIIDWJT-UHFFFAOYSA-N 0.000 description 1
- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 1
- YCPXWRQRBFJBPZ-UHFFFAOYSA-N 5-sulfosalicylic acid Chemical compound OC(=O)C1=CC(S(O)(=O)=O)=CC=C1O YCPXWRQRBFJBPZ-UHFFFAOYSA-N 0.000 description 1
- XPAZGLFMMUODDK-UHFFFAOYSA-N 6-nitro-1h-benzimidazole Chemical compound [O-][N+](=O)C1=CC=C2N=CNC2=C1 XPAZGLFMMUODDK-UHFFFAOYSA-N 0.000 description 1
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical group CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 1
- KXDAEFPNCMNJSK-UHFFFAOYSA-N Benzamide Chemical group NC(=O)C1=CC=CC=C1 KXDAEFPNCMNJSK-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical class OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 101100394073 Caenorhabditis elegans hil-1 gene Proteins 0.000 description 1
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 description 1
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- ZNZYKNKBJPZETN-WELNAUFTSA-N Dialdehyde 11678 Chemical compound N1C2=CC=CC=C2C2=C1[C@H](C[C@H](/C(=C/O)C(=O)OC)[C@@H](C=C)C=O)NCC2 ZNZYKNKBJPZETN-WELNAUFTSA-N 0.000 description 1
- PQUCIEFHOVEZAU-UHFFFAOYSA-N Diammonium sulfite Chemical compound [NH4+].[NH4+].[O-]S([O-])=O PQUCIEFHOVEZAU-UHFFFAOYSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 description 1
- KDXKERNSBIXSRK-YFKPBYRVSA-N L-lysine Chemical compound NCCCC[C@H](N)C(O)=O KDXKERNSBIXSRK-YFKPBYRVSA-N 0.000 description 1
- 239000004472 Lysine Substances 0.000 description 1
- KDXKERNSBIXSRK-UHFFFAOYSA-N Lysine Natural products NCCCCC(N)C(O)=O KDXKERNSBIXSRK-UHFFFAOYSA-N 0.000 description 1
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical group C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 1
- FSVCELGFZIQNCK-UHFFFAOYSA-N N,N-bis(2-hydroxyethyl)glycine Chemical compound OCCN(CCO)CC(O)=O FSVCELGFZIQNCK-UHFFFAOYSA-N 0.000 description 1
- JYXGIOKAKDAARW-UHFFFAOYSA-N N-(2-hydroxyethyl)iminodiacetic acid Chemical compound OCCN(CC(O)=O)CC(O)=O JYXGIOKAKDAARW-UHFFFAOYSA-N 0.000 description 1
- WRUZLCLJULHLEY-UHFFFAOYSA-N N-(p-hydroxyphenyl)glycine Chemical compound OC(=O)CNC1=CC=C(O)C=C1 WRUZLCLJULHLEY-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 1
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 description 1
- 229930006000 Sucrose Natural products 0.000 description 1
- YSMRWXYRXBRSND-UHFFFAOYSA-N TOTP Chemical compound CC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C YSMRWXYRXBRSND-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 1
- XCFIVNQHHFZRNR-UHFFFAOYSA-N [Ag].Cl[IH]Br Chemical compound [Ag].Cl[IH]Br XCFIVNQHHFZRNR-UHFFFAOYSA-N 0.000 description 1
- MKBUQYWFFBCMFG-UHFFFAOYSA-N acetic acid propane-1,1-diamine Chemical compound CC(O)=O.CC(O)=O.CC(O)=O.CC(O)=O.CCC(N)N MKBUQYWFFBCMFG-UHFFFAOYSA-N 0.000 description 1
- PXAJQJMDEXJWFB-UHFFFAOYSA-N acetone oxime Chemical compound CC(C)=NO PXAJQJMDEXJWFB-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 125000004466 alkoxycarbonylamino group Chemical group 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 235000011126 aluminium potassium sulphate Nutrition 0.000 description 1
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000003429 antifungal agent Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- CJPQIRJHIZUAQP-MRXNPFEDSA-N benalaxyl-M Chemical compound CC=1C=CC=C(C)C=1N([C@H](C)C(=O)OC)C(=O)CC1=CC=CC=C1 CJPQIRJHIZUAQP-MRXNPFEDSA-N 0.000 description 1
- KHBQMWCZKVMBLN-IDEBNGHGSA-N benzenesulfonamide Chemical group NS(=O)(=O)[13C]1=[13CH][13CH]=[13CH][13CH]=[13CH]1 KHBQMWCZKVMBLN-IDEBNGHGSA-N 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000000872 buffer Substances 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- AJPXTSMULZANCB-UHFFFAOYSA-N chlorohydroquinone Chemical compound OC1=CC=C(O)C(Cl)=C1 AJPXTSMULZANCB-UHFFFAOYSA-N 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- PYRZPBDTPRQYKG-UHFFFAOYSA-N cyclopentene-1-carboxylic acid Chemical compound OC(=O)C1=CCCC1 PYRZPBDTPRQYKG-UHFFFAOYSA-N 0.000 description 1
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- BBLSYMNDKUHQAG-UHFFFAOYSA-L dilithium;sulfite Chemical compound [Li+].[Li+].[O-]S([O-])=O BBLSYMNDKUHQAG-UHFFFAOYSA-L 0.000 description 1
- BXJGUBZTZWCMEX-UHFFFAOYSA-N dimethylhydroquinone Natural products CC1=C(C)C(O)=CC=C1O BXJGUBZTZWCMEX-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- DEFVIWRASFVYLL-UHFFFAOYSA-N ethylene glycol bis(2-aminoethyl)tetraacetic acid Chemical compound OC(=O)CN(CC(O)=O)CCOCCOCCN(CC(O)=O)CC(O)=O DEFVIWRASFVYLL-UHFFFAOYSA-N 0.000 description 1
- IFQUWYZCAGRUJN-UHFFFAOYSA-N ethylenediaminediacetic acid Chemical compound OC(=O)CNCCNCC(O)=O IFQUWYZCAGRUJN-UHFFFAOYSA-N 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 239000000174 gluconic acid Substances 0.000 description 1
- 235000012208 gluconic acid Nutrition 0.000 description 1
- 230000012010 growth Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 229940051250 hexylene glycol Drugs 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N hydroquinone methyl ether Natural products COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- NBZBKCUXIYYUSX-UHFFFAOYSA-N iminodiacetic acid Chemical compound OC(=O)CNCC(O)=O NBZBKCUXIYYUSX-UHFFFAOYSA-N 0.000 description 1
- 125000003387 indolinyl group Chemical group N1(CCC2=CC=CC=C12)* 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 1
- HNQIVZYLYMDVSB-UHFFFAOYSA-N methanesulfonimidic acid Chemical group CS(N)(=O)=O HNQIVZYLYMDVSB-UHFFFAOYSA-N 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- 125000006626 methoxycarbonylamino group Chemical group 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 description 1
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 1
- 230000002906 microbiologic effect Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000012452 mother liquor Substances 0.000 description 1
- 239000010413 mother solution Substances 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- SQDFHQJTAWCFIB-UHFFFAOYSA-N n-methylidenehydroxylamine Chemical compound ON=C SQDFHQJTAWCFIB-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
- 239000006174 pH buffer Substances 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- ATGAWOHQWWULNK-UHFFFAOYSA-I pentapotassium;[oxido(phosphonatooxy)phosphoryl] phosphate Chemical compound [K+].[K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])(=O)OP([O-])([O-])=O ATGAWOHQWWULNK-UHFFFAOYSA-I 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 125000006678 phenoxycarbonyl group Chemical group 0.000 description 1
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 239000011970 polystyrene sulfonate Substances 0.000 description 1
- 229960002796 polystyrene sulfonate Drugs 0.000 description 1
- 229940050271 potassium alum Drugs 0.000 description 1
- GRLPQNLYRHEGIJ-UHFFFAOYSA-J potassium aluminium sulfate Chemical compound [Al+3].[K+].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRLPQNLYRHEGIJ-UHFFFAOYSA-J 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000008237 rinsing water Substances 0.000 description 1
- 229930182490 saponin Natural products 0.000 description 1
- 150000007949 saponins Chemical class 0.000 description 1
- 229920006298 saran Polymers 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 1
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- GCLGEJMYGQKIIW-UHFFFAOYSA-H sodium hexametaphosphate Chemical compound [Na]OP1(=O)OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])O1 GCLGEJMYGQKIIW-UHFFFAOYSA-H 0.000 description 1
- 235000019982 sodium hexametaphosphate Nutrition 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- AMZPPWFHMNMIEI-UHFFFAOYSA-M sodium;2-sulfanylidene-1,3-dihydrobenzimidazole-5-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=C2NC(=S)NC2=C1 AMZPPWFHMNMIEI-UHFFFAOYSA-M 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- PXQLVRUNWNTZOS-UHFFFAOYSA-N sulfanyl Chemical class [SH] PXQLVRUNWNTZOS-UHFFFAOYSA-N 0.000 description 1
- DHCDFWKWKRSZHF-UHFFFAOYSA-N sulfurothioic S-acid Chemical compound OS(O)(=O)=S DHCDFWKWKRSZHF-UHFFFAOYSA-N 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 1
- 230000008733 trauma Effects 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 1
- 235000019801 trisodium phosphate Nutrition 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000012224 working solution Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
- G03C5/26—Processes using silver-salt-containing photosensitive materials or agents therefor
- G03C5/29—Development processes or agents therefor
- G03C5/305—Additives other than developers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明はハロゲン化銀写真感光材料の現像処理方法に関
し、特に安定性が改良されたハイドロキノン類を含有す
る現像液に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for developing silver halide photographic materials, and particularly to a developer containing hydroquinones with improved stability.
(従来技術)
ハロゲン化銀写真感光材料は露光後、一般に現像、定着
、水洗という工程で処理される。中でも黒白現像液は、
ハイドロキノン類を現像主薬としてアミノフェノール類
または3−ピラゾリドン類を補助現像主薬とし、亜硫酸
塩を包含するアルカリ性溶液であるのが一般的である。(Prior Art) After exposure, silver halide photographic materials are generally processed through the steps of development, fixing, and washing. Among them, black and white developer is
It is generally an alkaline solution containing hydroquinones as a developing agent, aminophenols or 3-pyrazolidones as an auxiliary developing agent, and containing sulfites.
この亜硫酸塩はアルカリ金属の亜硫酸塩又は重亜硫酸塩
の形で使用されるが、ハイドロキノンの現像反応活性を
維持するためにも、現像液の空気酸化抑制のためにも必
須の成分である。また亜硫酸塩はハロゲン化銀を適度に
溶解する作用があり、現像反応過程中でいわゆる溶解物
理現像作用を積極的に利用して粒状性を良くする方法に
使われることもある。This sulfite is used in the form of an alkali metal sulfite or bisulfite, and is an essential component both for maintaining the development reaction activity of hydroquinone and for suppressing air oxidation of the developer. In addition, sulfite has the ability to dissolve silver halide appropriately, and is sometimes used in a method of improving graininess by actively utilizing so-called dissolution physical development action during the development reaction process.
一方、現像液はより高い安定性が望まれる。現像液が長
期間空気酸化に対して安定であれば、現像液の維持、管
理に手を煩わすことなく、一定の写真性能が得られる。On the other hand, higher stability of the developer is desired. If the developer is stable against air oxidation for a long period of time, a certain level of photographic performance can be obtained without the hassle of maintaining and managing the developer.
特に自動現像機(以後、自現機という)で一定の補充液
量を補充しながら液組成を維持、管理する場合、補充液
量の低減は廃液量の減少、すなわち公害負荷の減少の面
からも、ランニングコストの低減の面からも重要なこと
である。この補充液量を低減するには現像液の安定性が
より高くな(ではならない、補充液量の低下は、自現機
中及び補充液タンク中での現像液の滞留時間を一層長く
し、現像液の空気酸化の度合を大きくするからである。In particular, when maintaining and managing the liquid composition while replenishing a certain amount of replenisher in an automatic processor (hereinafter referred to as an automatic processor), reducing the amount of replenisher reduces the amount of waste liquid, that is, reduces the pollution load. This is also important from the perspective of reducing running costs. In order to reduce the amount of replenisher, the stability of the developer must be higher.A decrease in the amount of replenisher will further lengthen the residence time of the developer in the automatic processor and replenisher tank. This is because it increases the degree of air oxidation of the developer.
現像液の空気酸化は現像液中の亜硫酸塩濃度を高めるこ
とによって防止できるが、亜硫酸塩濃度を高めるにも限
界がある。その理由の一つは次の通りである。すなわち
、通常現像液は何倍かに濃縮した濃縮液を調製し、実際
に現像処理するときに希釈して使用するが、この濃縮液
の濃縮度を律する最も大きな因子の一つが亜硫酸塩であ
る。現像液の安定性をあげるために、亜硫酸塩を多く含
ませると、濃縮度が下がってしまい、極端な場合は現像
液を最初に調製した時点から自現機で現場で使用する時
点まで同じ濃縮度すなわち同じ容量の現像液を使うこと
になり輸送上も、スペース上も大変不利である。もう一
つの理由は亜硫酸塩を多く含有する現像液はハロゲン化
銀感光材料からハロゲン化銀の溶解溶出を多くし、結果
として現像液中の銀汚れを多くし、現像ラックやローラ
ーの汚れを助長することになるからである。Air oxidation of the developer can be prevented by increasing the sulfite concentration in the developer, but there is a limit to increasing the sulfite concentration. One of the reasons is as follows. In other words, normally, a developer is prepared as a concentrated solution several times and diluted for use during actual development processing, but one of the biggest factors that controls the degree of concentration of this concentrated solution is sulfite. . If a large amount of sulfite is added to improve the stability of the developer, the concentration will decrease, and in extreme cases, the concentration will remain the same from the time the developer is first prepared to the time it is used in the field using an automatic processing machine. In other words, the same volume of developer is used each time, which is very disadvantageous in terms of transportation and space. Another reason is that a developer containing a large amount of sulfite causes more silver halide to dissolve and elute from the silver halide photosensitive material, resulting in more silver stains in the developer and promoting stains on the developing rack and rollers. This is because you will have to do so.
これらの理由で、現像液の安定性向上に効果のある亜硫
酸塩をより多く、現像液に含有させた(でも、限界があ
ってできないし、上記のように更に安定性の向上が望ま
れている事情は近年益々高まっている。For these reasons, we added more sulfite to the developer, which is effective in improving the stability of the developer. The situation has been increasing in recent years.
(発明の目的)
従って本発明の第一の目的は、ハイドロキノン類を現像
主薬として含有する現像液の空気酸化安定性を向上させ
ることである。(Object of the Invention) Therefore, the first object of the present invention is to improve the air oxidation stability of a developer containing hydroquinones as a developing agent.
第二の目的は現像液濃縮液の:a縮度を維持しながら現
像液の安定性を高めることである。The second purpose is to increase the stability of the developer while maintaining the :a degree of condensation of the developer concentrate.
第三の目的は銀汚れを助長しないで現像液の安定性を高
めることである。The third objective is to increase the stability of the developer without promoting silver staining.
第四の目的は現像液の安定性を高めることによって現像
液の補充液量を低減し、公害負荷を軽減し、現像処理の
経済性を高めることである。The fourth objective is to improve the stability of the developer, thereby reducing the amount of developer replenisher, reducing the pollution load, and increasing the economic efficiency of the development process.
(発明の構成)
本発明の上記のような目的はハイドロキノン類、を現像
主薬として含むアルカリ性現像液に下記−般式(I)ま
たは(II)で表わされる化合物の少なくとも1種を含
有することを特徴とする現像液でハロゲン化銀感光材料
を処理することにより達成された。(Structure of the Invention) The above object of the present invention is to provide an alkaline developer containing hydroquinones as a developing agent containing at least one compound represented by the following general formula (I) or (II). This was achieved by processing a silver halide photosensitive material with a special developer.
一般式(I)
R’ −N−R”
H
式中R1、Rtは水素原子、アルキル基(置換基を有す
るものを含む、メチル基、エチル基、n−ブチル基、t
−ブチル基、n−オクチル基、シクロヘキシル基など)
、アルケニル基(置換基を有するものを含む、プロピレ
ン基、シクロヘキセン基など)、アリール基(置換基を
有するものを含む、フェニル基、ナフチル基など)、ま
たは、ヘテロ環基(置換基を有するものを含む、イミダ
ゾール、トリアゾール、テトラゾール、とリジン、ピリ
ミジン、トリアジンなど)を表わし、又、R’とRtは
連結して窒素原子と一緒にヘテロ′f!J(モルホリン
環など)を形成してもよい。General formula (I) R'-N-R''H In the formula, R1 and Rt are hydrogen atoms, alkyl groups (including those with substituents, methyl group, ethyl group, n-butyl group, t
-butyl group, n-octyl group, cyclohexyl group, etc.)
, alkenyl groups (including those with substituents, propylene group, cyclohexene group, etc.), aryl groups (including those with substituents, phenyl group, naphthyl group, etc.), or heterocyclic groups (including those with substituents) (including imidazole, triazole, tetrazole, lysine, pyrimidine, triazine, etc.), and R' and Rt are connected together with a nitrogen atom to form a hetero'f! J (morpholine ring, etc.) may be formed.
置換基としてはハロゲン原子(フッ素原子、塩素原子、
臭素原子など)、アリール基(フェニル基、p−クロロ
フェニル基など)、アルコキシ基(メトキシ基、エトキ
シ基、メトキシエトキシ基など)、アリールオキシ基(
フェノキシ基など)、スルホニル基(メタンスルホニル
基、p−)ルエンスルホニル基など)、スルホンアミド
基(メタンスルホンアミド基、ベンゼンスルホンアミド
基など)、スルファモイル基(ジエチルスルファモイル
基、無置換スルファモイル基など)、カルバモイル基(
無置換カルバモイル基、ジエチルカルバモイル基など)
、アミド基(アセトアミド基、ベンズアミド基なと)、
ウレイド基(メチルウレイド基、フェニルウレイド基な
ど)、アルコキシカルボニルアミノ基(メトキシカルボ
ニルアミノ基なと)、アリロキシカルボニルアミノ基(
フェノキシカルボニルアミノ基など)、アルコキシカル
ボニル基(メトキシカルボニル基なと)、アリールオキ
シカルボニル基(フェノキシカルボニル基など)、シア
ノ基、ヒドロキシ基、カルボキシ基、スルホ基、ニトロ
基、アミノ基、(無置換アミノ基、ジエチルアミノ基)
、アルキルチオ基(メチルチオ基など)、アリールチオ
基(フェニルチオ基など)、及びヘテロ環基(モルホリ
ノ基、ピリジル基など)を挙げることが出来る。ここで
R1とR1は同じでも異なってもよく、さらにR1、R
8の置換基も同じでも異なってもよい。Substituents include halogen atoms (fluorine atoms, chlorine atoms,
bromine atom, etc.), aryl groups (phenyl group, p-chlorophenyl group, etc.), alkoxy groups (methoxy group, ethoxy group, methoxyethoxy group, etc.), aryloxy group (
phenoxy group, etc.), sulfonyl group (methanesulfonyl group, p-)luenesulfonyl group, etc.), sulfonamide group (methanesulfonamide group, benzenesulfonamide group, etc.), sulfamoyl group (diethylsulfamoyl group, unsubstituted sulfamoyl group) ), carbamoyl group (
unsubstituted carbamoyl group, diethylcarbamoyl group, etc.)
, amide group (acetamide group, benzamide group, etc.),
Ureido group (methylureido group, phenylureido group, etc.), alkoxycarbonylamino group (methoxycarbonylamino group), allyloxycarbonylamino group (
phenoxycarbonylamino group, etc.), alkoxycarbonyl group (methoxycarbonyl group), aryloxycarbonyl group (phenoxycarbonyl group, etc.), cyano group, hydroxy group, carboxy group, sulfo group, nitro group, amino group, (unsubstituted) amino group, diethylamino group)
, an alkylthio group (such as a methylthio group), an arylthio group (such as a phenylthio group), and a heterocyclic group (such as a morpholino group and a pyridyl group). Here, R1 and R1 may be the same or different, and R1 and R1 may be the same or different.
The substituents of 8 may also be the same or different.
又、R1とRzの炭素数は1〜10が好ましく、特に1
〜5が好ましい R1とHgが連結して形成される含窒
素へテロ環としては、ピペリジル基、ピペリジル基、N
−アルキルピペラジル基、モルホリル基、インドリニル
基、ベンズトリアゾリル基などが挙げ・られる。Further, the number of carbon atoms in R1 and Rz is preferably 1 to 10, particularly 1
~5 is preferred. The nitrogen-containing heterocycle formed by linking R1 and Hg includes a piperidyl group, a piperidyl group, a N
Examples include -alkylpiperazyl group, morpholyl group, indolinyl group, benztriazolyl group, and the like.
R1とR8の好ましい置換基は、ヒドロキシ基、アルコ
キシ基、スルホニル基、アミド基、カルボキシ基、シア
ノ基、スルー基、ニトロ基及びアミノ基である。Preferred substituents for R1 and R8 are a hydroxy group, an alkoxy group, a sulfonyl group, an amide group, a carboxy group, a cyano group, a through group, a nitro group, and an amino group.
以下に本発明に用いられる一般式(I)で表ねされる化
合物の具体例を示すが本発明はこの化合物に限定される
ものではない。Specific examples of the compound represented by the general formula (I) used in the present invention are shown below, but the present invention is not limited to these compounds.
H
CJs N−C11IaOCHs
H
CH3−N CtHaOC*Hs
OH
CHsOCtH4N−CxHaOCHsOf(
CxHsOC*Ha N CJ40CtHsOH
CtHsOC!)14 N CJs\−一−ノ
OH
量
CxHsSOxCzHa N C!HaSOtC
Js−Ol
\−−−ノ
1−G:D OHHoo−CH
l N CHl COOHl−01001(
HOCHl CHt N−CHt CHt O
Hl−051
OH
CH3CHz NCHt CHs
−0O
NH,O)1
1−(至)
OH
OH
OHOH
Rコ
式中、Aは水素原子、アルキル基、アリール基、アミノ
基、ヘテロ環基、アルコキシ基、アリールオキシ基、カ
ルバモイル基、スルファモイル基、アシル基、カルボキ
シ基、ヒドロキシアミノ基またはヒドロキシアミノカル
ボニル基を表わす、これらの基は置換されているものを
含み、置換基としてハロゲン原子、アリール基、アルキ
ル基、アルコキシ基、アリールオキシ基、ヒドロキシ基
、スルホニル基、スルホンアミド基、スルファモイル基
、スルホ基、アミド基、ウレイド基、シアノ基、ヒドロ
キシ基アミノカルボニル基、カルボキシ基、ニトロ基、
アミノ基、アルコキシカルボニル基、アリールオキシカ
ルボニル基、アルキルチオ基、アリールチオ基、ヘテロ
環基(ピリジル基、モルホリノ基など)などがあげられ
る。H CJs N-C11IaOCHs H CH3-N CtHaOC*Hs OH CHsOCtH4N-CxHaOCHsOf( CxHsOC*Ha N CJ40CtHsOH CtHsOC!)14 N CJs\-1-noOH Quantity CxHsSOxC zHa N C! HaSOtC
Js-Ol \---ノ1-G:D OHHoo-CH
l N CHl COOHl-01001( HOCHl CHt N-CHt CHt O
Hl-051 OH CH3CHz NCHt CHs -0O NH,O)1 1-(to) OH OH OHOH R In the formula, A is a hydrogen atom, an alkyl group, an aryl group, an amino group, a heterocyclic group, an alkoxy group, an aryloxy group, carbamoyl group, sulfamoyl group, acyl group, carboxy group, hydroxyamino group, or hydroxyaminocarbonyl group. group, aryloxy group, hydroxy group, sulfonyl group, sulfonamide group, sulfamoyl group, sulfo group, amide group, ureido group, cyano group, hydroxy group, aminocarbonyl group, carboxy group, nitro group,
Examples include amino groups, alkoxycarbonyl groups, aryloxycarbonyl groups, alkylthio groups, arylthio groups, and heterocyclic groups (pyridyl groups, morpholino groups, etc.).
好ましくはAは置換もしくは無置換のアルキル基、アリ
ール基、アミノ基、アルコキシ基、アリールオキシ基で
ある。特に好ましい例として置換もしくは無置換のアミ
ノ基、アルコキシ基、アリールオキシ基である。炭素数
は1〜10であることが好ましい。Preferably, A is a substituted or unsubstituted alkyl group, aryl group, amino group, alkoxy group, or aryloxy group. Particularly preferred examples include substituted or unsubstituted amino groups, alkoxy groups, and aryloxy groups. The number of carbon atoms is preferably 1 to 10.
S −3O−を表わす、好ましくはXは−C−である。S Representing -3O-, preferably X is -C-.
R3は水素原子、アルキル基またはアリール基を表わす
、このとき、AとRsが連結して環構造を形成してもよ
い、これらは置換されているものを含み、置換基として
はAであげた置換基と同様である。特に、好ましくはR
sは水素原子である。R3 represents a hydrogen atom, an alkyl group, or an aryl group. In this case, A and Rs may be linked to form a ring structure. These include those that are substituted, and the substituent is listed in A. Same as substituent. In particular, preferably R
s is a hydrogen atom.
Yは、水素原子又は、加水分解反応により水素原子にな
りうる基を表わす。Y represents a hydrogen atom or a group that can become a hydrogen atom through a hydrolysis reaction.
Yが加水分解反応により水素原子になりうる基を表わす
場合の具体的例としては、以下のものを挙げることがで
きる。Specific examples where Y represents a group that can become a hydrogen atom through a hydrolysis reaction include the following.
1)エステル結合又はウレタン結合で保護する方法、即
ちYは−C−R4を表わす、ここで、R4として、アル
キル基、アリール基、アミノ基が一つの例としてあげら
れる。1) A method of protection with an ester bond or a urethane bond, that is, Y represents -C-R4; examples of R4 include an alkyl group, an aryl group, and an amino group.
2)特開昭57−158638号に記載のイミドメチル
封鎖基により保護する方法、即ちYは、員環又は6員環
を有する複素環を完全にするのに必要な複数個の原子を
表わす。2) Method of protection with imidomethyl blocking group described in JP-A-57-158638, ie, Y represents a plurality of atoms necessary to complete a heterocycle having a membered ring or a 6-membered ring.
以下に一般式(If)で表わされる化合物の具体例を示
すが本発明はこれらに限定されるものではない。Specific examples of the compound represented by the general formula (If) are shown below, but the present invention is not limited thereto.
(II) −(2) CHs −C−NH−Of(′ (n) −(3) Ca He OC−NHOH CH。(II) - (2) CHs -C-NH-Of(' (n) - (3) Ca He OC-NHOH CH.
CH,−C−N−OH (II ) −(6) Ht N−C−NH−OR (n)−(7) Hs ■ CHs C−N OH (II)−(8) H−C−NHOH (II) −(9) (II)−0I HII CHs N CNHOH O3S (II)−0り (If) −03i 。CH, -C-N-OH (II) - (6) Ht NC-NH-OR (n)-(7) Hs ■ CHs C-N OH (II)-(8) H-C-NHOH (II) - (9) (II)-0I HII CHs N CNHOH O3S (II)-0ri (If) -03i.
tC,Hq 0CNHOH
HONI(CNHO)I
(II) −〇6)
(If) −01
(It) −0!ll
CHs S O* N HOH
(II)−@0
CHs CNH0CCHs
(If) −(23)
〇
一般式(夏)で表わされる化合物の他の具体例及び一般
式(■)の化合物の合成は以下に示す公知の方法により
合成することが出来る。米国特許第3,661.996
号、同3,362,961号、同3,293.034号
、特公昭42−2゜794号、米国特許第3,491.
151号、同3.655.764号、同3,467.7
11号、同3,455.961号、同3,287.12
5号、同3,287.124号、J、Am、Chew、
Soc、+73、2981. J、 Org、 27.
4054.特公昭49−10.692号、更に一般式(
II)で表わされる化合物の合成は以下に示す公知の方
法により合成することができる。tC, Hq 0CNHOH HONI(CNHO)I (II) -〇6) (If) -01 (It) -0! ll CHs SO* N HOH (II) -@0 CHs CNH0CCHs (If) - (23) Other specific examples of the compound represented by the general formula (summer) and the synthesis of the compound of the general formula (■) are as follows. It can be synthesized by the known method shown below. U.S. Patent No. 3,661.996
No. 3,362,961, No. 3,293.034, Japanese Patent Publication No. 42-2゜794, U.S. Patent No. 3,491.
No. 151, No. 3.655.764, No. 3,467.7
No. 11, No. 3,455.961, No. 3,287.12
No. 5, No. 3,287.124, J, Am, Chew,
Soc, +73, 2981. J, Org, 27.
4054. Special Publication No. 49-10.692, and the general formula (
The compound represented by II) can be synthesized by the known method shown below.
Organic Fanctlonal Group
Preparations Tl5p、406 〜43
2(^cademic Press) 、 Sy
ntheticOrganic Chemistry
、 p、419,565,569.576.577(J
ohn Wlley & 5ons、 Inc、) 。Organic Fanctlonal Group
Preparations Tl5p, 406-43
2 (^ academic Press), Sy
ntheticOrganic Chemistry
, p, 419,565,569.576.577 (J
ohn Wllley & 5ons, Inc.).
これらの化合物は、塩酸、硫酸、硝酸、リン酸、シェラ
酸、酢酸等の各種の酸と塩を形成していても良い。These compounds may form salts with various acids such as hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, Shellic acid, and acetic acid.
上記一般式の化合物の添加量ハ、現像液1j!当り、好
ましくは0. 1〜50g、より好ましくは本発明の現
像液に用いる現像主薬にはハイドロキノン類を主体とす
るのが良好な性能を得やすい点で、ハイドロキノン類と
1−フェニル−3−ピラゾリドン類の組合せ、またはハ
イドロキノン類とp−アミノフェノール類との組合せが
よい。The amount of the compound of the above general formula added is 1j of the developer! hit, preferably 0. 1 to 50 g, more preferably the developing agent used in the developer of the present invention is a combination of hydroquinones and 1-phenyl-3-pyrazolidones, or A combination of hydroquinones and p-aminophenols is good.
本発明に用いるハイドロキノン系現像主薬としてはハイ
ドロキノン、クロロハイドロキノン、ブロムハイドロキ
ノン、イソプロピルハイドロキノン、メチルハイドロキ
ノン、2.3−ジクロロハイドロキノン、2.5−ジク
ロロハイドロキノン、2.3−ジブロムハイドロキノン
、2.5−ジメチルハイドロキノンなどがあるが特にハ
イドロキノンが好ましい。Hydroquinone-based developing agents used in the present invention include hydroquinone, chlorohydroquinone, bromohydroquinone, isopropylhydroquinone, methylhydroquinone, 2.3-dichlorohydroquinone, 2.5-dichlorohydroquinone, 2.3-dibromohydroquinone, and 2.5-dichlorohydroquinone. Examples include dimethylhydroquinone, and hydroquinone is particularly preferred.
本発明に用いるp−アミノフェノール系現像主薬として
は、N−メチル−p−アミノフェノール、p−アミノフ
ェノール、N−(β−ヒドロキシエチル)−p−アミノ
フェノール、N−(4−ヒドロキシフェニル)グリシン
、2−メチル−p−アミノフェノール、p−ベンジルア
ミノフェノール等があるが、なかでもN−メチル−p−
アミノフエノールが好ましい。The p-aminophenol developing agent used in the present invention includes N-methyl-p-aminophenol, p-aminophenol, N-(β-hydroxyethyl)-p-aminophenol, N-(4-hydroxyphenyl) Glycine, 2-methyl-p-aminophenol, p-benzylaminophenol, etc., among which N-methyl-p-
Aminophenols are preferred.
本発明に用いる3−ピラゾリドン系現像主薬としては1
−フェニル−3−ピラゾリドン、1−フェニル−4,4
−ジメチル−3−ピラゾリドン、1−フェニル−4−メ
チル−4−ヒドロキシメチル−3−ピラゾリドン、l−
フェニル−4,4−ジヒドロキシメチル−3−ピラゾリ
ドン、1−フェニル−5−メチル−3−ピラゾリドン、
1−p−アミノフェニル−4,4−ジメチル−3−ピラ
ゾリドン、1−p−)ジル−4,4−ジメチルー3−ピ
ラゾリドン、1−p−)リルー4−メチルー4−ヒドロ
キシメチル−3−ピラゾリドン、などがある。The 3-pyrazolidone developing agent used in the present invention is 1
-Phenyl-3-pyrazolidone, 1-phenyl-4,4
-dimethyl-3-pyrazolidone, 1-phenyl-4-methyl-4-hydroxymethyl-3-pyrazolidone, l-
Phenyl-4,4-dihydroxymethyl-3-pyrazolidone, 1-phenyl-5-methyl-3-pyrazolidone,
1-p-aminophenyl-4,4-dimethyl-3-pyrazolidone, 1-p-)yl-4,4-dimethyl-3-pyrazolidone, 1-p-)lylu-4-methyl-4-hydroxymethyl-3-pyrazolidone ,and so on.
ハイドロキノン系現像主薬は通常0.01モル/2〜1
.5モル/Il、好ましくは0.05モル/l〜1.2
モル/j!の量で用いられる。Hydroquinone developing agents are usually 0.01 mol/2 to 1
.. 5 mol/Il, preferably 0.05 mol/l to 1.2
Mol/j! used in amounts of
これに加えて、p−アミノフェノール系現像主薬または
3−ピラゾリドン系現像主薬は通常0゜0005モル/
i〜0.2モル/Il、好ましくは0.001モル/l
〜0.1モル/lの量で用いられる。In addition to this, p-aminophenol type developing agent or 3-pyrazolidone type developing agent is usually 0°0005 mol/
i~0.2 mol/Il, preferably 0.001 mol/l
It is used in an amount of ~0.1 mol/l.
本発明の現像液に用いる亜硫酸塩としては亜硫酸ナトリ
ウム、亜硫酸カリウム、亜硫酸リチウム、亜硫酸アンモ
ニウム、重亜硫酸ナトリウム、メタ重亜硫酸カリウム、
などがある、亜硫酸塩は0゜2モル/j!以上特に0.
3モルフ2以上が好ましい、また、上限は現像液濃縮液
で2.5モル/lまでとするのが好ましい。Sulfites used in the developer of the present invention include sodium sulfite, potassium sulfite, lithium sulfite, ammonium sulfite, sodium bisulfite, potassium metabisulfite,
etc., sulfite is 0°2 mol/j! The above is especially 0.
It is preferable to have 3 morphs of 2 or more, and the upper limit is preferably up to 2.5 mol/l in the developer concentrate.
本発明の現像処理に用いる現像液のPHは9から13ま
での範囲のものが好ましい、更に好ましくはpH10か
ら12までの範囲である。The pH of the developer used in the development process of the present invention is preferably in the range of 9 to 13, more preferably in the range of 10 to 12.
pHの設定のために用いるアルカリ剤には水酸化ナトリ
ウム、水酸化カリウム、炭酸ナトリウム、炭酸カリウム
、第三リン酸ナトリウム、第三リン酸カリウムの如きp
H調節剤を含む。Alkaline agents used to set pH include sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, trisodium phosphate, and potassium triphosphate.
Contains H regulator.
特開昭62−186259号(ホウ酸塩)、特開昭60
−93433号(例えば、サッカロース、アセトオキシ
ム、5−スルホサルチル酸)、リン酸塩、炭酸塩などの
緩衝剤を用いてもよい。JP-A-62-186259 (Borate), JP-A-60
Buffers such as No.-93433 (eg, sucrose, acetoxime, 5-sulfosalicylic acid), phosphates, carbonates, etc. may be used.
本発明においては現像液は鉄イオンに対するキレート安
定度定数が8以上であるキレート剤を含有することが好
ましい。In the present invention, the developer preferably contains a chelating agent having a chelate stability constant of 8 or more with respect to iron ions.
ここにキレート安定度定数とは、L、G。Here, the chelate stability constants are L and G.
5illdn −A、 E、 Marte11著、H″
5tabill 1tyConstants of M
etal−ion Complexes ” 、 T
heChemical 5ociety 、 Lond
on (I964)、S。5illdn-A, E, Marte11, H''
5tabil 1tyConstants of M
etal-ion Complexes”, T
heChemical 5ociety, Lond
on (I964), S.
Chaberek 廖A、 E、Marte11著、
”OrgantcSequestering Age
nts ’ 、 Wiley (I959) m等に
より一般に知られた定数を意味する。Written by Chaberek Liao A, E, Marte11,
”OrgantcSequesteringAge
nts' means a constant generally known by Wiley (I959) m, etc.
本発明において鉄イオンに対するキレート安定度定数が
8以上であるキレート剤としては、有機カルボン酸キレ
ート剤、有機リン酸キレート剤、無機リン酸キレート剤
、ポリヒドロキシ化合物等が挙げられる。なお、上記鉄
イオンとは、第2鉄イオン(Fe”°)を意味する。In the present invention, examples of the chelating agent having a chelate stability constant of 8 or more for iron ions include organic carboxylic acid chelating agents, organic phosphoric acid chelating agents, inorganic phosphoric acid chelating agents, and polyhydroxy compounds. Note that the above-mentioned iron ion means ferric ion (Fe''°).
本発明において第2鉄イオンとのキレート安定度定数が
8以上であるキレート剤の具体的化合物例としては、下
記化合物が挙げられるが、これらに限定されるものでは
ない。即ちエチレンジアミンジオルトヒドロキシフェニ
ル酢酸、トリエチレンテトラミン六酢酸、ジアミノプロ
パン四酢酸、ニトリロ三酢酸、ヒドロキシエチルエチレ
ンジアミン三酢酸、ジヒドロキシエチルグリシン、エチ
レンジアミンニ酢酸、エチレンジアミンニプロピオン酸
、イミノニ酢酸、ジエチレントリアミン五酢酸、ヒドロ
キシエチルイミノニ酢酸、1.3−ジアミノ−2−プロ
パツール四酢酸、トランスシクロヘキサンジアミン四酢
酸、エチレンジアミン四酢酸、グリコールエーテルジア
ミン四酢酸、エチレンジアミン−N、N、N’ 、N’
テトラキスメチレンホスホン酸、ニトリロ−N、N、N
−1リメチレンホスホン酸、1−ヒドロキシエチリデン
−1,1−ジホスホン酸、1.1−ジホスホンエタン−
2−カルボン酸、2−ホスホノブタン−1,2,4−ト
リカルボン酸、l−ヒドロ革シー1−ホスホノプロパン
−1,2,3−)リカルボン酸、カテコール−3,5−
ジスルホン酸、ビロリン酸ナトリウム、テトラポリリン
酸ナトリウム、ヘキサメタリン酸ナトリウムが挙げられ
る。In the present invention, specific examples of compounds of chelating agents having a chelate stability constant of 8 or more with ferric ions include the following compounds, but are not limited thereto. Namely, ethylenediamine diorthohydroxyphenylacetic acid, triethylenetetraminehexaacetic acid, diaminopropanetetraacetic acid, nitrilotriacetic acid, hydroxyethylethylenediaminetriacetic acid, dihydroxyethylglycine, ethylenediaminediacetic acid, ethylenediaminenipropionic acid, iminodiacetic acid, diethylenetriaminepentaacetic acid, hydroxy Ethyliminodiacetic acid, 1,3-diamino-2-propatoltetraacetic acid, transcyclohexanediaminetetraacetic acid, ethylenediaminetetraacetic acid, glycol etherdiaminetetraacetic acid, ethylenediamine-N, N, N', N'
Tetrakis methylene phosphonic acid, nitrilo-N, N, N
-1rimethylenephosphonic acid, 1-hydroxyethylidene-1,1-diphosphonic acid, 1,1-diphosphonethane-
2-carboxylic acid, 2-phosphonobutane-1,2,4-tricarboxylic acid, 1-phosphonopropane-1,2,3-)licarboxylic acid, catechol-3,5-
Examples include disulfonic acid, sodium birophosphate, sodium tetrapolyphosphate, and sodium hexametaphosphate.
また上記現像液にはジアルデヒド系硬膜剤またはその重
亜硫酸塩付加物が用いられるが、その具体例を挙げれば
ゲルタールアルデヒド、又はこの重亜硫酸塩付加物など
がある。Further, dialdehyde-based hardeners or bisulfite adducts thereof are used in the developer, and specific examples thereof include gel tar aldehyde and bisulfite adducts thereof.
上記成分以外に用いられる添加剤としては、臭化ナトリ
ウム、臭化カリウム、沃化カリウムの如き現像抑制剤:
エチレングリコール、ジエチレングリコール、トリエチ
レングリコール、ジメチルホルムアミド、メチルセロソ
ルブ、ヘキシレングリコール、エタノール、メタノール
の如き有機溶剤=1−フェニルー5−メルカプトテトラ
ゾール、2−メルカプトベンツイミダゾール−5−スル
ホン酸ナトリウム塩等のメルカプト系化合物、5−二ト
ロインダゾール等のインダゾール系化合物、5−メチル
ベンツトリアゾール等のベンツトリアゾール系化合物な
どのカブリ防止剤を含んでもよく、 R@aaarc
b Disclosure 第176−1、NII
L17643、第XXI項(I2月号、1978年)に
記載された現像促進剤や更に必要に応じて色調剤、界面
活性剤、消泡剤、硬水軟化剤、特開昭56−10624
4号記載のアミノ化合物などを含んでもよい、
−
本発明の現像処理においては現像液に銀汚れ防止剤、例
えば特開昭56−24347号に記載の化合物を用いる
ことができる。Additives used in addition to the above components include development inhibitors such as sodium bromide, potassium bromide, and potassium iodide:
Organic solvents such as ethylene glycol, diethylene glycol, triethylene glycol, dimethylformamide, methyl cellosolve, hexylene glycol, ethanol, methanol = mercapto such as 1-phenyl-5-mercaptotetrazole, 2-mercaptobenzimidazole-5-sulfonic acid sodium salt, etc. R@aaarc
b Disclosure No. 176-1, NII
Development accelerators described in L17643, Section XXI (February issue, 1978) and, if necessary, toning agents, surfactants, antifoaming agents, water softeners, JP-A-56-10624
May contain the amino compound described in No. 4, etc.
- In the development process of the present invention, a silver stain preventive agent, such as the compound described in JP-A-56-24347, can be used in the developer.
本発明の現像液には、ヨーロッパ特許公開136582
号、英国特許第958678号、米国特許第32327
61号、特開昭56−106244号に記載のアルカノ
ールアミンなどのアミノ化合物を現像促進、コントラス
ト上昇その他の目的で用いることができる。The developer of the present invention includes European Patent Publication No. 136582
No. 958,678, U.S. Pat. No. 32,327
Amino compounds such as alkanolamines described in No. 61 and JP-A-56-106244 can be used for the purpose of accelerating development, increasing contrast, and other purposes.
この他り、F、Aメイソン著「フォトグラフィック・プ
ロセシング・ケミストリー」、フォーカル・プレス刊(
I966年)の226〜229頁、米国特許第2,19
3.015号、同2,592゜364号、特開昭48−
64933号などに記載のものを用いてもよい。In addition, "Photographic Processing Chemistry" by F. and A. Mason, published by Focal Press (
I966), pages 226-229, U.S. Patent No. 2,19
No. 3.015, No. 2,592゜364, Japanese Unexamined Patent Publication No. 1973-
64933 and the like may be used.
定着液はチオ硫酸塩を含む水溶液であり、pH3,8以
上、好ましくは4.2〜7.0を有する。The fixer is an aqueous solution containing thiosulfate and has a pH of 3.8 or higher, preferably 4.2 to 7.0.
定着剤としてはチオ硫酸ナトリウム、チオ硫酸アンモニ
ウムなどがあるが、定着速度の点からチロ硫酸アンモニ
ウムが特に好ましい、定着剤の使用量は適宜変えること
ができ、一般には約0. 1〜約6モル/lである。Examples of the fixing agent include sodium thiosulfate and ammonium thiosulfate, but ammonium thiosulfate is particularly preferred from the viewpoint of fixing speed.The amount of the fixing agent used can be changed as appropriate, and is generally about 0. 1 to about 6 mol/l.
定着液には硬膜剤として作用する水溶性アルミニウム塩
を含んでもよく、それらには、例えば塩化アルミニウム
、硫酸アルミニウム、カリ明ばんなどがある。The fixer may also contain water-soluble aluminum salts that act as hardeners, such as aluminum chloride, aluminum sulfate, potassium alum, and the like.
定着液には、酒石酸、クエン酸、グルコン酸あるいはそ
れらの誘導体を単独で、あるいは2種以上、併用するこ
とができる。これらの化合物は定着液lj!につき0.
005モル以上含むものが有効で、特に0.O1モル/
It〜0.03モル/lが特に有効である。In the fixing solution, tartaric acid, citric acid, gluconic acid, or their derivatives can be used alone or in combination of two or more. These compounds are the fixer lj! per 0.
Those containing 0.005 mol or more are effective, especially those containing 0.005 mol or more. O1 mol/
It~0.03 mol/l is particularly effective.
定着液には所望により保恒剤(例えば、亜硫酸塩、重亜
硫酸塩)、pH緩衝剤(例えば、酢酸、硼酸)、pH調
整剤(例えば、硫酸)、硬水軟化能のあるキレート剤や
特開昭62−78551号記載の化合物を含むことがで
きる。The fixing solution may optionally contain preservatives (e.g., sulfites, bisulfites), pH buffers (e.g., acetic acid, boric acid), pH adjusters (e.g., sulfuric acid), chelating agents with water softening ability, and The compound described in No. 62-78551 can be included.
上記本発明の現像処理方法では、現像、定着工程の後、
ハロゲン化銀感光材料1M当り、31以下の補充量(0
も含む、すなわちため水水洗)の水洗水又は安定化液で
処理することもできる。すなわち、節水処理が可能とな
るのみならず、自現機設置の配管が不要とすることがで
きる。In the development processing method of the present invention, after the development and fixing steps,
Replenishment amount of 31 or less (0
It can also be treated with rinsing water or a stabilizing solution (including sump water rinsing). In other words, not only can water be saved, but also piping for installing an automatic processor can be eliminated.
補充量を少なくする方法として、古くより多段向流方式
(例えば2段、3段など)が知られている。この多段向
流方式を本発明に適用すれば定着後の感光材料はだんだ
んと清浄な方向、つまり定着液で汚れていない処理液の
方に順次接触して処理されて行(ので、更に効率の良い
水洗がなされる。As a method of reducing the amount of replenishment, a multistage countercurrent system (for example, two stages, three stages, etc.) has been known for a long time. If this multi-stage countercurrent method is applied to the present invention, the photosensitive material after fixing will be processed in a progressively cleaner direction, that is, in the direction of the processing solution that is not contaminated with the fixer. Good washing is done.
上記の節水処理又は無配管処理には、水洗水又は安定化
液に防黴手段を施すことが好ましい。For the above-mentioned water-saving treatment or piping-free treatment, it is preferable to apply anti-mold means to the washing water or the stabilizing liquid.
防黴手段としては、特開昭60−263939号に記さ
れた紫外線照射法、同60−263940号に記された
磁場を用いる方法、同61−131632号に記された
イオン交換樹脂を用いて純水にする方法、特開昭62−
115154号、同62−153952号、特願昭61
−63030号、同61−51396号に記載の防菌剤
を用いる方法を用いることができる。Anti-mildew methods include the ultraviolet irradiation method described in JP-A No. 60-263939, the method using a magnetic field described in JP-A No. 60-263940, and the use of ion exchange resin described in JP-A No. 61-131632. How to make pure water, JP-A-62-
No. 115154, No. 62-153952, Patent Application No. 1983
The method using the antibacterial agent described in No. 63030 and No. 61-51396 can be used.
更には、L、 E、 Glest、 ”Water
QualityCri teria ″ Pho
to 、Sci 、& I!ng、Vol、 9
N[L6(I965) 、 M、W、 Beach 、
MicrobiologicalGrowths
in Motion−Picture Process
ing”SMPTI! Journal Vol、
85. (I976) 、R。Furthermore, L, E, Glest, ``Water
QualityCriteria ″ Pho
to, Sci, & I! ng, Vol. 9
N [L6 (I965), M, W, Beach,
Microbiological Growths
in Motion-Picture Process
ing"SMPTI! Journal Vol.
85. (I976), R.
0、 Deegan 、 Photo Proces
sing flash l1aterBiocides
J、1maging Tech 1 G、 Na
6 (I984)及び特開昭57−8542号、同57
−58143号、同58−105145号、同57−1
32146号、同5B−18631号、同57−975
30号、同57−157244号などに記載されている
防菌剤、防黴剤、界面活性剤などを併用することもでき
る。0, Deegan, Photo Processes
sing flash l1aterBiocides
J, 1maging Tech 1 G, Na
6 (I984) and Japanese Unexamined Patent Publication No. 57-8542, 57
-58143, 58-105145, 57-1
No. 32146, No. 5B-18631, No. 57-975
Antibacterial agents, antifungal agents, surfactants, etc. described in No. 30, No. 57-157244, etc. can also be used in combination.
更に、水洗浴又は安定化浴には、R,T。Furthermore, R, T in the water washing bath or stabilizing bath.
Kreiman 著、 J、 Image、
Tech 1 0. (6)2 4 2頁(I98
4)に記載されたイソチアゾリン系化合物、Re5ea
rch I)isclosure第205巻、麹205
26 (I981年、5月号)に記載されたイソチアゾ
リン系化合物、同第228巻、Na22845 (I9
83年、4月号)に記載されたイソチアゾリン系化合物
、特願昭61−51396号に記載された化合物などを
防菌剤(?l1crobioclde)として併用する
こともできる。Kreiman, J. Image,
Tech 1 0. (6) 2 4 2 pages (I98
The isothiazoline compound described in 4), Re5ea
rch I) isclosure volume 205, koji 205
26 (I981, May issue), isothiazoline compounds described in Volume 228, Na22845 (I9
Isothiazoline compounds described in 1983, April issue), compounds described in Japanese Patent Application No. 61-51396, etc. can also be used in combination as antibacterial agents (?l1crobioclde).
その他、「防菌防黴の化学」堀口博著、三共出版(昭5
7)、「防菌防黴技術ハンドブック」日本防菌防黴学会
・博報堂(昭和61)に記載されているような化合物を
含んでもよい。In addition, "Chemistry of anti-bacterial and anti-mildew" by Hiroshi Horiguchi, Sankyo Publishing (Showa 5)
7), "Handbook of Antibacterial and Antifungal Technology", Japanese Society of Antibacterial and Antifungal Research, Hakuhodo (1988) may also be included.
本発明の方法において少量の水洗水で水洗するときには
特願昭61−163217号に記載のスクイズローラー
洗浄槽を設けることがより好ましい、また、特願昭61
−290619号のような水洗工程の構成をとることも
好ましい。When washing with a small amount of washing water in the method of the present invention, it is more preferable to provide a squeeze roller washing tank as described in Japanese Patent Application No. 163217/1982.
It is also preferable to adopt a water washing step configuration as in No. 290619.
更に、本発明の方法で水洗又は安定化浴に防黴手段を施
した水を処理に応じて補充することによって生ずる水洗
又は安定化浴からのオーバーフロー液の一部又は全部は
特開昭60−235133号に記載されているようにそ
の前の処理工程である定着能を有する処理液に利用する
こともできる。Furthermore, part or all of the overflow liquid from the washing or stabilizing bath, which is generated by replenishing the washing or stabilizing bath with anti-mold water according to the treatment according to the method of the present invention, is used in Japanese Patent Application Laid-Open No. 1986-1999. As described in Japanese Patent Application No. 235133, it can also be used in a processing liquid having a fixing ability, which is a processing step before that.
本発明において「現像工程時間」又は「現像時間」とは
、処理する感光材料の先端が自現機の現像タンク液に浸
漬してから次の定着液に浸漬するまでの時間、r定着時
間」とは定着タンク液に浸漬してから次の水洗タンク液
(安定液)に浸漬するまでの時間「水洗時間」とは、水
洗タンク液に浸漬している時間をいう。In the present invention, "developing process time" or "developing time" refers to the time from when the leading edge of the photosensitive material to be processed is immersed in the developing tank solution of the automatic processing machine until it is immersed in the next fixing solution, ``r fixing time.'' The period from immersion in the fixing tank liquid until immersion in the next washing tank liquid (stabilizing liquid) ``Washing time'' refers to the time during which the film is immersed in the washing tank liquid.
また「乾燥時間」とは、通常自現機には、35℃〜10
0℃好ましくは40℃〜80℃の熱風が吹きつけられる
乾燥ゾーンが設置されており、その乾燥ゾーンに入って
いる時間をいう。In addition, "drying time" is usually 35℃ to 10℃ for automatic processors.
A drying zone is installed in which hot air of 0°C, preferably 40°C to 80°C is blown, and refers to the time spent in the drying zone.
本発明の現像処理では、現像時間が5秒〜3分、好まし
くは10秒〜2分、その現像温度は25℃〜50℃が好
ましく、25’C’〜40℃がより好ましい。In the development process of the present invention, the development time is 5 seconds to 3 minutes, preferably 10 seconds to 2 minutes, and the development temperature is preferably 25C to 50C, more preferably 25'C' to 40C.
定着温度及び時間は約り0℃〜約50℃で5秒〜3分が
好ましく、25℃〜40℃で10秒〜2分がより好まし
い。The fixing temperature and time are preferably about 0° C. to about 50° C. and 5 seconds to 3 minutes, and more preferably 25° C. to 40° C. and 10 seconds to 2 minutes.
水洗または安定浴温度及び時間は0〜50℃で5秒〜3
分が好ましく、15℃〜40℃で10秒から2分がより
好ましい。Water washing or stabilization bath temperature and time are 0 to 50℃ for 5 seconds to 3
minutes is preferred, and 10 seconds to 2 minutes at 15°C to 40°C is more preferred.
本発明の方法によれば、現像、定着及び水洗(又は、安
定化)された写真材料は水洗水をしぼり切る、すなわち
スクイズローラーを経て乾燥される。乾燥は約り0℃〜
約100℃で行なわれ、乾燥時間は周囲の状態によって
適宜変えられるが、通常は約5秒〜2分でよく、特によ
り好ましくは40℃〜80℃で約5秒〜1分である。According to the method of the invention, the developed, fixed and washed (or stabilized) photographic material is dried by squeezing out the washing water, ie passing through a squeeze roller. Drying is approximately 0℃~
The drying time is carried out at about 100°C, and although the drying time can be appropriately changed depending on the surrounding conditions, it is usually about 5 seconds to 2 minutes, and particularly preferably about 5 seconds to 1 minute at 40°C to 80°C.
本発明の感光材料の現像処理方法には、写真感光材料と
して、特に限定はなく、一般の黒白感光材料が主として
用いられる他に反転処理されるカラー感光材料、例えば
カラー反転フィルムまたはペーパーの黒白現像液にも用
いることができる。The photographic material used in the developing method of the photosensitive material of the present invention is not particularly limited, and general black and white photosensitive materials are mainly used, as well as color photosensitive materials that undergo reversal processing, such as black and white development of color reversal film or paper. It can also be used in liquids.
特に医療画像のレーザープリンター用写真感光材料や印
刷用スキャナー感材並びに、医療用直接撮影X−レイ感
材、医療用間接盪影X−レイ感材、CR7画像記録用感
材、マイクロ用感材、一般黒白ネガフイルム、黒白印画
紙などに用いることが好ましい。In particular, photographic materials for laser printers for medical images, scanner materials for printing, medical direct photography X-ray materials, medical indirect trauma X-ray materials, CR7 image recording materials, and microphotosensitive materials. , general black and white negative film, black and white photographic paper, etc.
本発明の処理方法が適用できるハロゲン化銀写真感光材
料は支持体とその上に塗布された少なくとも一つのハロ
ゲン化銀乳剤からなる。また、ハロゲン化銀乳剤層は支
持体の片面だけでなく両面に塗布されることもできる。A silver halide photographic material to which the processing method of the present invention can be applied comprises a support and at least one silver halide emulsion coated thereon. Further, the silver halide emulsion layer can be coated not only on one side of the support but also on both sides.
もちろん、必要によりバック層、アンチハレーション層
、中間層、最上層(例えば、保護層)などを有すること
ができる。ハロゲン化銀乳剤は塩化銀、沃化銀、臭化銀
、塩臭化銀、沃臭化銀、塩沃臭化銀の如きハロゲン化銀
を親水性コロイドに分散したものである。ハロゲン化銀
乳剤は、通常当業界でよく知られた方法(例えば、シン
グルジェット法、ダブルジェット法、コントロールジェ
ット法など)によって水溶性銀塩(例えば、硝酸銀)と
水溶性ハロゲン塩とを水及び親水性コロイドの存在下で
混合し、物理熟成及び金増感及び/又は硫黄増感などの
化学熟成を経て製造される。このようにして得られた乳
剤には、立方体、8面体、球状の他
Re5earch Disclosure 22534
(January 1983)に記載された高アス
ペクト比の平板状のハロゲン化銀粒子を用いることがで
きるし、また特公昭41−2068号に記載された内部
潜像型ハロゲン化銀粒子と表面潜像型ハロゲン化銀粒子
と組合せて用いることもできる。Of course, a back layer, an antihalation layer, an intermediate layer, a top layer (for example, a protective layer), etc. can be included if necessary. A silver halide emulsion is one in which silver halides such as silver chloride, silver iodide, silver bromide, silver chlorobromide, silver iodobromide, and silver chloroiodobromide are dispersed in a hydrophilic colloid. Silver halide emulsions are usually prepared by combining a water-soluble silver salt (for example, silver nitrate) and a water-soluble halide salt by a method well known in the art (for example, a single jet method, a double jet method, a controlled jet method, etc.). It is produced by mixing in the presence of a hydrophilic colloid, followed by physical ripening and chemical ripening such as gold sensitization and/or sulfur sensitization. The emulsion thus obtained has cubic, octahedral, spherical, and other shapes.
(January 1983), high aspect ratio tabular silver halide grains can be used, and internal latent image type silver halide grains and surface latent image type silver halide grains described in Japanese Patent Publication No. 41-2068 can be used. It can also be used in combination with silver halide grains.
ハロゲン化銀乳剤は、その製造工程中又は塗布直前で、
分光増感剤(例えば、シアニン色素、メロシアニン色素
又はその混合物)、安定剤(例えば、4−ヒドロキシ−
6−メチル−1,3,3a。During the manufacturing process or just before coating, the silver halide emulsion is
Spectral sensitizers (e.g. cyanine dyes, merocyanine dyes or mixtures thereof), stabilizers (e.g. 4-hydroxy-
6-methyl-1,3,3a.
7−チトラザインデン)、増感剤(例えば、米国特許第
3,619.198号明細書に記載の化合物)、カプリ
防止剤(例えば、ベンゾトリアゾール、5−ニトロベン
ツイミダゾール、ポリエチレンオキサイド、硬膜剤、塗
布助剤(例えば、サポニン、ソジウムラウリルアルフエ
ート、ドデシルフェノールポリエチレンオキサイドエー
テル、ヘキサデシルトリメチルアンモニウムブロマイド
)などを添加することができる。7-titrazaindene), sensitizers (e.g., compounds described in U.S. Pat. No. 3,619.198), anti-capri agents (e.g., benzotriazole, 5-nitrobenzimidazole, polyethylene oxide, hardeners, Coating aids (eg, saponin, sodium lauryl alphaate, dodecylphenol polyethylene oxide ether, hexadecyltrimethylammonium bromide), etc. can be added.
この様にして製造されたハロゲン化銀乳剤はセルロース
アセテートフィルム、ポリエチレンテレフタレートフィ
ルムなどの支持体にデイツプ法、エアーナイフ法、ビー
ド法、エクストルージョンドクター法、両面塗布法など
によって塗布乾燥される。The silver halide emulsion thus produced is coated and dried on a support such as a cellulose acetate film or a polyethylene terephthalate film by a dip method, an air knife method, a bead method, an extrusion doctor method, a double-sided coating method, or the like.
次に本発明の方法を実施例で説明するが、本発明はこれ
に限定されるものではない。Next, the method of the present invention will be explained with examples, but the present invention is not limited thereto.
実施例1
1.1遁坐里l
水lIl中にゼラチン30g1臭化カリ6gを加え60
℃に保った容器中に撹拌しながら硝酸銀水溶液(硝酸銀
として5g)と沃化カリ0.15gを含む臭化カリ水溶
液を1分間かけてダブルジェット法で添加した。さらに
硝酸銀水溶液(硝酸銀として145g)と沃化カリ4.
2gを含む臭化カリ水溶液をダブルジェット法で添加し
た。この時の添加流速は、添加終了時の流速が、添加開
始時の5倍となるように流量加速をおこなった。添加終
了後、沈降法により35℃にて再審性塩類を除去したの
ち40℃に昇温してゼラチン75gを連添し、pHを6
.7に調整した。得られた乳剤は投影面積直径が0.9
8gm、平均厚み0.138pmの平板状粒子で、沃化
銀含量は3モル%であった。この乳剤に、金、イオウ増
感を併用して化学増感をほどこした。Example 1 1.1 Tonzari 30 g of gelatin 1 6 g of potassium bromide was added to 60 g of water
A silver nitrate aqueous solution (5 g as silver nitrate) and a potassium bromide aqueous solution containing 0.15 g of potassium iodide were added by a double jet method over a period of 1 minute into a container maintained at .degree. C. with stirring. Furthermore, silver nitrate aqueous solution (145 g as silver nitrate) and potassium iodide 4.
An aqueous solution of potassium bromide containing 2 g was added by double jet method. At this time, the addition flow rate was accelerated so that the flow rate at the end of addition was five times that at the start of addition. After the addition was completed, the reconsideration salts were removed at 35°C by the sedimentation method, the temperature was raised to 40°C, 75 g of gelatin was continuously added, and the pH was adjusted to 6.
.. Adjusted to 7. The resulting emulsion has a projected area diameter of 0.9
The tabular grains were 8 gm, average thickness 0.138 pm, and the silver iodide content was 3 mole %. This emulsion was chemically sensitized using gold and sulfur sensitization.
亙m(社)1製
表面保護層として、ゼラチンの他に平均分子量8000
のポリアクリルアミド、ポリスチレンスルホン酸ソーダ
、ポリメチルメタクリレート微粒子(平均粒子サイズ3
.0gm)、ポリエチレンオキサイド、および硬膜剤な
どを含有したゼラチン水溶液を用いた。In addition to gelatin, as a surface protective layer made by Yom Co., Ltd., an average molecular weight of 8000 is used.
Polyacrylamide, polystyrene sulfonate soda, polymethyl methacrylate fine particles (average particle size 3)
.. An aqueous gelatin solution containing 0 gm), polyethylene oxide, and a hardening agent was used.
上記乳剤に増感色素としてアンヒドロ−5,5′−ジク
ロロ−9−エチル−3,31−ジ(3−スルフオプロピ
ル)オキサカルボシアニンハイドロオキサイドナトリウ
ム塩を500■/1モルAgの割合で、沃化カリを20
0■/1モルAgの割合で添加した。さらに安定剤とし
て4−ヒドロキシ−6−メチル−1,3,3a、?−テ
トラザインデンと2.6ビス(ヒドロキシアミノ)−4
−ジエチルアミノ−1,3,5−トリアジンおよびニト
ロン、乾燥カブリ防止剤としてトリメチロールプロパン
、塗布助剤、硬膜剤を添加して塗布液とし、ポリエチレ
ンテレフタレート支持体の両側に各々表面保護層と同時
に塗布乾燥することによリ、写真材料を作成した。この
写真材料の塗布銀量は片面あたり2 g/nfである。Anhydro-5,5'-dichloro-9-ethyl-3,31-di(3-sulfopropyl)oxacarbocyanine hydroxide sodium salt was added to the above emulsion as a sensitizing dye at a ratio of 500 μ/1 mol Ag; 20 potassium iodide
It was added at a ratio of 0/1 mole Ag. Furthermore, as a stabilizer, 4-hydroxy-6-methyl-1,3,3a,? -Tetrazaindene and 2.6bis(hydroxyamino)-4
- Diethylamino-1,3,5-triazine and nitrone, trimethylolpropane as a drying antifoggant, a coating aid, and a hardening agent are added to form a coating solution, and a surface protective layer is simultaneously applied to both sides of the polyethylene terephthalate support. A photographic material was created by coating and drying. The amount of silver coated on this photographic material is 2 g/nf per side.
この感材をセンシトメーターを用いて光学ウェッジで段
階的な露光を与え、以下に示す現像液、定着液及び水洗
液処方で現像処理した。This photosensitive material was subjected to stepwise exposure with an optical wedge using a sensitometer, and developed using the following formulations of developer, fixer, and washing solution.
2、男l辰東慮盟
水酸化カリウム 17g亜硫酸ナ
トリウム 31g亜硫酸カリウム
39gジエチレントリアミン五
酢酸 1gホウ酸
9g八ベイドロキノン
25g4−ヒドロキシメチル−4−メ
チル−1−フェニル−3−ピ
ラゾリドン 1.7gジエチレ
ングリコール 10g5−メチルベンゾ
トリアゾール 0.65gKBr
3g水で1j!とする( P H1
0,35に調整する)上記の現像液に、本発明の例示化
合物1−0!J。2. Potassium hydroxide 17g Sodium sulfite 31g Potassium sulfite 39g Diethylenetriaminepentaacetic acid 1g Boric acid
9g 8 Baydroquinone
25g 4-hydroxymethyl-4-methyl-1-phenyl-3-pyrazolidone 1.7g diethylene glycol 10g 5-methylbenzotriazole 0.65g KBr
3g of water equals 1j! (P H1
Exemplary compound 1-0 of the present invention is added to the above developer (adjusted to 0.35). J.
1−07)、I −(26)、II−(2)、II−Q
L If −(22)を現像液i当り、それぞれ3g添
加した。その後pHを10.35に調整した。なお比較
例として現像液11当り、亜硫酸ナトリウム20gを添
加したサンプルを調液した(pHを10.35に調整す
る)。1-07), I-(26), II-(2), II-Q
3 g of L If -(22) was added per developer i. The pH was then adjusted to 10.35. As a comparative example, a sample was prepared in which 20 g of sodium sulfite was added per 11 developing solutions (pH was adjusted to 10.35).
上記の現像液をそれぞれ500mj!を500m1のビ
ーカーに入れ、サランラップでビーカーにカバーをし、
カバーに直径0.5cmの穴を開けて30℃で12日間
放置して、その後、ハイドロキノンの残存量を分析定量
した。500mj of each of the above developers! Put it in a 500m1 beaker, cover the beaker with Saran wrap,
A hole with a diameter of 0.5 cm was made in the cover and left at 30°C for 12 days, and then the remaining amount of hydroquinone was analyzed and quantified.
一方、30℃で12日日間時した現像液に各々スタータ
ーとして、臭化カリウム3 g/j!、氷酢酸4 m
j! / It添加したものを使って、ローラー搬送型
自動現像機で、次のような現像処理を行なった。On the other hand, 3 g/j of potassium bromide was added as a starter to each developer solution that had been aged at 30°C for 12 days. , glacial acetic acid 4 m
j! / It-added material was used to perform the following development process using a roller conveyance type automatic developing machine.
処理工程 温度 時間
現像 35℃ 25秒定着
35℃ 20秒水洗 20℃
25秒なお、定着には富士F(富士写真フィルム社製
)を用いた。Processing process Temperature Time Development 35℃ 25 seconds fixing
35℃ 20 seconds water washing 20℃
25 seconds.Fuji F (manufactured by Fuji Photo Film Co., Ltd.) was used for fixing.
表1に、本発明の例示化合物を添加した使用液の30℃
12日間経時後のハイドロキノン残存量および写真性の
結果を示す。Table 1 shows the temperature of the working solution added with the exemplary compound of the present invention at 30°C.
The results of the residual amount of hydroquinone and photographic properties after 12 days are shown.
なお゛写真性のなかでカブリは未露光部の光学濃度から
ベース濃度を差し引いた値を表わす、Gは、カプリ値(
ベース濃度を含む)に0.25加えた濃度と特性曲線の
交点からその濃度にさらに1゜75加えた濃度と特性曲
線の交点から求めた。In addition, in photography, fog represents the value obtained by subtracting the base density from the optical density of the unexposed area, and G is the capri value (
It was determined from the intersection of the characteristic curve and the concentration obtained by adding 0.25 to the base concentration (including the base concentration), and the intersection of the characteristic curve and the concentration obtained by adding 1.75 to that concentration.
相対感度は、カブリ値(ベース濃度を含む)+1゜0を
基準点として求めて、新液現像液で現像処理したときの
感度を100として相対値で表わした。The relative sensitivity was determined using the fog value (including base density) + 1°0 as a reference point, and was expressed as a relative value, with the sensitivity when developing with a new developer being 100.
Dmは最大濃度を表わす。Dm represents the maximum concentration.
表 1 表1の結果から次のことが明らかである。Table 1 The following is clear from the results in Table 1.
本発明の化合物を用いない現像液Ha−1においては、
ハイドロキノンの劣化が大きく、かつ写真性の低下が大
きいことを示している。亜硫酸ナトリウム20 g/j
!追添し連添像液隘−2においては、ハイドロキノンの
残存率は、N[L−1と比較してかなり高くなっている
が写真性はいまだ不充分である。In the developer Ha-1 that does not use the compound of the present invention,
This shows that the deterioration of hydroquinone is large and the photographic properties are greatly reduced. Sodium sulfite 20 g/j
! Although the residual rate of hydroquinone in the continuous addition image solution 2-2 is considerably higher than that in N[L-1, the photographic properties are still insufficient.
一方、本発明の例示化合物を用いた現像液随一3〜fh
−8は、添加量が3 g/Itと少ないにもかかわらず
、ハイドロキノンの残存率はHa−2より高(かつ新液
に近い写真性能を示していることがわかる。On the other hand, the developer using the exemplified compound of the present invention is
It can be seen that although the amount of addition of Ha-8 is as small as 3 g/It, the residual rate of hydroquinone is higher than that of Ha-2 (and the photographic performance is close to that of the new solution).
このように本発明の化合物を用いることにより、現像液
の経時安定性を飛躍的に向上させることができる。By using the compound of the present invention in this way, the stability over time of the developer can be dramatically improved.
実施例2 下記のような現像補充液Aを調製した。Example 2 A developer replenisher A as shown below was prepared.
現像補充液A
水酸化カリウム 29g亜硫酸カリ
ウム 44.2 gメタ重亜硫酸カリ
ウム 12.6gジエチレントリアミン五酢
酸 1gホウ酸
3gジエチレングリコール 20m15
−メチルベンゾトリアゾール 0.06 g5−ニト
ロインダゾール 0.2gハイドロキノン
30g1−フェニル−3−ピラゾ
リドン 1.5g氷酢酸
7.5g水を加えて 1f
fipH10,30に調整する
現像補充液Alff1当り、本発明の例示化合物!−(
26)とII −(22)を各々3g添加した。比較例
として、現像補充液Aと、現像補充液Alff1当り、
亜硫酸ナトリウム30g添加した。各々の現像液の構成
を表2に示す各々の現像補充液はp)110゜30に調
整し、スターターとして臭化カリウム3g/l、氷酢酸
4 m j! / l添加し、これを現像液(母液)と
した、現像液の構成を表2に示す。Developer replenisher A Potassium hydroxide 29g Potassium sulfite 44.2 g Potassium metabisulfite 12.6g Diethylenetriaminepentaacetic acid 1g Boric acid
3g diethylene glycol 20m15
-Methylbenzotriazole 0.06 g5-Nitroindazole 0.2g Hydroquinone
30g 1-phenyl-3-pyrazolidone 1.5g glacial acetic acid
Add 7.5g water and 1f
Exemplary compound of the present invention per developer replenisher Alff adjusted to fipH 10,30! −(
26) and II-(22) were added in an amount of 3 g each. As a comparative example, per developer replenisher A and developer replenisher Alff,
30g of sodium sulfite was added. The composition of each developer is shown in Table 2. Each developer replenisher was adjusted to p) 110°30, and as a starter, potassium bromide 3g/l and glacial acetic acid 4mj! Table 2 shows the composition of the developer solution (mother solution).
前記の現像液(母液)をローラー搬送型自現機に入れて
、実施例1で用いたX−線用写真感光材料を露光した後
火のような処理を行なった。The above-mentioned developer (mother liquor) was put into a roller conveyance type automatic processor, and the X-ray photographic material used in Example 1 was exposed and then subjected to a heat treatment.
現像 35℃ 24秒 61タンク定着
35℃ 25秒 6j!タンク現像液の補充は
、前記の現像補充液を4切サイズ1枚当り50mj!の
量を補充した。定着液は、実施例1で用いた富士Fを4
切サイズ1枚当り60m1補充した。Development 35℃ 24 seconds 61 tank fixing
35℃ 25 seconds 6j! To replenish the tank developer, use the developer replenisher mentioned above at 50 mj per 4-cut size sheet! The amount was replenished. The fixer was 44% of the Fuji F used in Example 1.
60ml was replenished per cut size sheet.
また、自現機は、週に6日間稼動させ、稼動日には10
時間スタンバイの状態とし、また1日当りハーフ露光し
た4切サイズ(I0インチ×12インチ)15枚を処理
した。In addition, the automatic processing machine is operated 6 days a week, and 10
The apparatus was kept on standby for hours, and 15 half-exposed 4-cut sheets (10 inches x 12 inches) were processed per day.
上記のようなランニング実験を計42日間行なつた。こ
の間の写真特性の変化、現像タンク中のハイドロキノン
の残存量、銀スラツジの状態を表3に示す。The running experiment as described above was conducted for a total of 42 days. Table 3 shows changes in photographic properties during this period, the amount of hydroquinone remaining in the developing tank, and the condition of the silver sludge.
表 2
表3の結果より次のことがいえる0本発明の化合物を用
いない現像液に−1は、経時と共に写真性がスタート時
に比べて下がり始めて、24日後には、実用的には、不
充分なレベルになってしまう、同時にヒドロキノンの劣
化も大きくなる。Table 2 From the results in Table 3, the following can be said. 0 The photographic properties of developer-1, which did not use the compound of the present invention, began to decline over time compared to the starting point, and after 24 days, it became practically useless. At the same time, the deterioration of hydroquinone increases.
従って、経時液HIl−1については、今回のような処
理条件下では1ケ月間経たないうちに、現像タンクの液
交換が必要になり、取扱い性上、非常に不利である。Therefore, under the present processing conditions, the aged liquid HIl-1 requires liquid replacement in the developing tank after less than one month has passed, which is very disadvantageous in terms of handling.
一方、亜硫酸ナトリウムを多量に用いた現像液阻−2と
本発明の化合物を用いた現像液N11L3、阻4は、4
2日後の写真性は、新液に近いレベルを維持している。On the other hand, developer No. 2 using a large amount of sodium sulfite and developer No. 11L3 and No. 4 using the compound of the present invention were
The photographic properties after 2 days remained at a level close to that of the new solution.
同時にハイドロキノンの残存率も高い値を示している。At the same time, the residual rate of hydroquinone also shows a high value.
ただし、現像液NCL−2は、亜硫酸ナトリウムとして
の使用量が多いために、フィルム中のハロゲン化銀をよ
り多く溶解させて、銀スラツジが多量に発生して、現像
ラックやローラー、などを汚染する。従って自現機のメ
ンテナンスの点で非常に不利になる。However, since developer NCL-2 uses a large amount of sodium sulfite, it dissolves more silver halide in the film, producing a large amount of silver sludge that contaminates the developing rack, rollers, etc. do. Therefore, it is very disadvantageous in terms of maintenance of the automatic processing machine.
(発明の効果)
本発明によれば、本発明の化合物を用いることにより、
現像液の安定性を格段に向上させることができる。また
、亜硫酸ナトリウムを増量するのと比較して、濃縮率の
低下や銀スラツジの発生などの欠点がないより安定な現
像濃縮液を提供することができる。(Effect of the invention) According to the present invention, by using the compound of the present invention,
The stability of the developer can be significantly improved. Furthermore, compared to increasing the amount of sodium sulfite, it is possible to provide a more stable developer concentrate without drawbacks such as a decrease in concentration rate and the generation of silver sludge.
従って現像液の補充量の低減、公害負荷の低減、現像処
理の経済性を高め、自現機のメンテナンスを楽にするな
どの効果が達成される。Therefore, effects such as a reduction in the amount of developer replenishment, a reduction in the pollution load, an increase in the economic efficiency of the development process, and ease of maintenance of the automatic processing machine can be achieved.
特許出願人 富士写真フィルム株式会社手続補正書Patent Applicant: Fuji Photo Film Co., Ltd. Procedural Amendment
Claims (1)
像液を用いて現像処理する方法において、該現像液が下
記一般式( I )または(II)で表わされる化合物を少
なくとも一種含有することを特徴とするハロゲン化銀写
真感光材料の現像処理方法。 一般式( I ) ▲数式、化学式、表等があります▼ 式中、R^1、R^2は水素原子、アルキル基、アルケ
ニル基、アリール基、またはヘテロ環基を表わし、R^
1とR^2は連結して窒素原子と一緒にヘテロ環を形成
してもよい。 一般式(II) ▲数式、化学式、表等があります▼ 式中、Aは水素原子、アルキル基、アリール基、アミノ
基、ヘテロ環基、アルコキシ基、アリールオキシ基、カ
ルバモイル基、スルファモイル基、アシル基、カルボキ
シ基、ヒドロキシアミノ基またはヒドロキシアミノカル
バボニル基を表わし、Xは−C−、−C−、−SO_2
−または−SO−を表わし、R^3は水素原子、アルキ
ル基またはアリール基を表わし、Yは水素原子または加
水分解により水素原子になりうる基を表わす。[Scope of Claim] A method of developing a silver halide photographic light-sensitive material using a developer containing hydroquinones, wherein the developer contains at least one compound represented by the following general formula (I) or (II). A method for developing a silver halide photographic material, characterized by: General formula (I) ▲There are mathematical formulas, chemical formulas, tables, etc.▼ In the formula, R^1 and R^2 represent a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, or a heterocyclic group, and R^
1 and R^2 may be linked together with a nitrogen atom to form a heterocycle. General formula (II) ▲There are mathematical formulas, chemical formulas, tables, etc.▼ In the formula, A is a hydrogen atom, an alkyl group, an aryl group, an amino group, a heterocyclic group, an alkoxy group, an aryloxy group, a carbamoyl group, a sulfamoyl group, or an acyl group. group, carboxy group, hydroxyamino group or hydroxyaminocarbabonyl group, and X is -C-, -C-, -SO_2
- or -SO-, R^3 represents a hydrogen atom, an alkyl group or an aryl group, and Y represents a hydrogen atom or a group that can become a hydrogen atom by hydrolysis.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28387187A JPH01124851A (en) | 1987-11-10 | 1987-11-10 | Method for development processing of silver halide photographic sensitive material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28387187A JPH01124851A (en) | 1987-11-10 | 1987-11-10 | Method for development processing of silver halide photographic sensitive material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01124851A true JPH01124851A (en) | 1989-05-17 |
Family
ID=17671254
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP28387187A Pending JPH01124851A (en) | 1987-11-10 | 1987-11-10 | Method for development processing of silver halide photographic sensitive material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01124851A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0710876A1 (en) | 1994-11-02 | 1996-05-08 | Minnesota Mining And Manufacturing Company | Black and white photographic elements |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4841803A (en) * | 1971-09-29 | 1973-06-19 | ||
JPS5227638A (en) * | 1975-08-27 | 1977-03-02 | Fuji Photo Film Co Ltd | Method for stabilization of color developer |
JPS5458439A (en) * | 1977-10-01 | 1979-05-11 | Agfa Gevaert Ag | Method of reversing photograph without secondary exposure |
-
1987
- 1987-11-10 JP JP28387187A patent/JPH01124851A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4841803A (en) * | 1971-09-29 | 1973-06-19 | ||
JPS5227638A (en) * | 1975-08-27 | 1977-03-02 | Fuji Photo Film Co Ltd | Method for stabilization of color developer |
JPS5458439A (en) * | 1977-10-01 | 1979-05-11 | Agfa Gevaert Ag | Method of reversing photograph without secondary exposure |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0710876A1 (en) | 1994-11-02 | 1996-05-08 | Minnesota Mining And Manufacturing Company | Black and white photographic elements |
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