JPH01121163A - Composition for polishing of aluminum magnetic disk - Google Patents
Composition for polishing of aluminum magnetic diskInfo
- Publication number
- JPH01121163A JPH01121163A JP62275645A JP27564587A JPH01121163A JP H01121163 A JPH01121163 A JP H01121163A JP 62275645 A JP62275645 A JP 62275645A JP 27564587 A JP27564587 A JP 27564587A JP H01121163 A JPH01121163 A JP H01121163A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- triethanolamine
- composition
- weight
- aluminum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はアルミニウム(以下アルミと略する)磁気ディ
スクを迅速且つ高精度鏡面に研磨するアルミ磁気ディス
クの研磨用組成物に関する。更に詳述すると、アルミサ
ブストレート及びアルミサブストレートの上にニッケル
リンを無電解等によりメツキしたニッケルサブストレー
ト、アルミサブストレートを陽極酸化したアルマイトサ
ブストレート等、の研磨用組成物に係り、特にアルミサ
ブストレートの研磨に好適な弱アリカリ性の研磨用組成
物に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a polishing composition for aluminum magnetic disks, which can rapidly polish aluminum magnetic disks to a high-precision mirror surface. More specifically, it relates to polishing compositions for aluminum substrates, nickel substrates that are electrolessly plated with nickel phosphorus on aluminum substrates, alumite substrates that are anodized aluminum substrates, etc. The present invention relates to a slightly alkaline polishing composition suitable for polishing substrates.
アルミ磁気ディスクに対し、従来使用されている研磨用
組成物は主にアルミナと酸性の研磨用促進剤を水に懸濁
又は溶解した水性スラリーである。The polishing composition conventionally used for aluminum magnetic disks is mainly an aqueous slurry in which alumina and an acidic polishing accelerator are suspended or dissolved in water.
特開昭81−278587にはアルミナと硫酸ニッケル
と水からなる弱酸性の研磨用組成物が開示されている。JP-A-81-278587 discloses a weakly acidic polishing composition comprising alumina, nickel sulfate, and water.
また、特開昭62−25187にはアルミナと硝酸アル
ミ等と水からなる強酸性の研磨用組成物が開示されてい
る。Further, JP-A No. 62-25187 discloses a strongly acidic polishing composition comprising alumina, aluminum nitrate, etc., and water.
しかし、これら弱酸性又は強酸性の研磨用組成物はニッ
ケルサブストレートやアルマイトサブストレードの研磨
においては性能を発揮するもののアルミサブストレート
の研磨においては、オレンジピールが発生して曇りが生
じ鏡面に仕上らず品質上使用することができない。アル
ミサブストレートに要求される品質は基本的にはニッケ
ルサブストレート等と同様であるが、材質や硬度が異な
るためにオレンジピール、そして金属間化合物の研磨さ
れた突起や逆の脱落によるピットが発生し易く、又うね
りも大きくなり易い。However, although these weakly acidic or strongly acidic polishing compositions exhibit good performance when polishing nickel substrates and alumite substrates, when polishing aluminum substrates, orange peel occurs, cloudiness occurs, and the finish is mirror-like. It cannot be used due to its quality. The quality required for aluminum substrates is basically the same as nickel substrates, etc., but due to the difference in material and hardness, orange peel and pits due to polished protrusions and falling off of intermetallic compounds occur. It is easy to do this, and the undulation also tends to become large.
本発明はこれらの問題点を解決するオレンジピールがな
く、突起、ピットの少ない、そしてうねりの小さい高精
度な鏡面が得られ、且つ研磨能率の高い研磨用組成物を
提供することが目的である。本発明による研磨用組成物
はアルミサブストレートの研磨に好適であるが、ニッケ
ルサブストレートやアルマイトサブストレートの研磨に
使用しても一向に差支えない。The object of the present invention is to solve these problems by providing a polishing composition that does not require orange peel, has few protrusions and pits, can provide a highly accurate mirror surface with small waviness, and has high polishing efficiency. . Although the polishing composition according to the present invention is suitable for polishing aluminum substrates, there is no problem in using it for polishing nickel substrates or alumite substrates.
本発明者らはアルミサブストレートの研磨において、従
来の酸性研磨促進剤では、アルミサブストレートと酸性
化合物との反応によりオレンジピールや酸化被膜が生ず
るために鏡面が得られないことに鑑み、アルカリ性の研
磨促進剤に着目した。しかし、水酸化ナトリウムの如き
アルカリ金属の水酸化物では反応が強すぎるため、アル
ミナに各種アミン系化合物を加えてアルミサブストレー
トの研磨を行なった所、トリエタノールアミンカルボン
酸塩とトリエタノールアミン塩酸塩の組み合せが研磨促
進効果が高く、高精度の研磨面が得られることを見出し
、本発明を完成させた。The present inventors used alkaline polishing accelerators in polishing aluminum substrates, in view of the fact that conventional acidic polishing accelerators do not produce mirror surfaces because orange peel and oxide films are formed due to the reaction between aluminum substrates and acidic compounds. We focused on polishing accelerators. However, since the reaction is too strong with alkali metal hydroxides such as sodium hydroxide, when various amine compounds were added to alumina and aluminum substrates were polished, triethanolamine carboxylate and triethanolamine hydrochloride were used. The present invention was completed based on the discovery that a combination of salts has a high polishing accelerating effect and that a highly precisely polished surface can be obtained.
即ち、本発明はアルミナ研磨材粉末とトリエタノールア
ミンカルボン酸塩とトリエタノールアミン塩酸塩と水か
らなるアルミ磁気ディスク研磨用組成物である。That is, the present invention is an aluminum magnetic disk polishing composition comprising alumina abrasive powder, triethanolamine carboxylate, triethanolamine hydrochloride, and water.
以下、本発明を詳しく述べる。The present invention will be described in detail below.
アルミナ研磨材粉末はα−Aρ203等で平均粒子径が
0.5〜IOμmのものが好ましい。トリエタノールア
ミンカルボン酸塩はHN(CH2CH20H)3・RC
OO−(Rは炭化水素基)で表わされ、トリエタノール
アミン塩酸塩はHN(CH2CH20H)3・c、l?
−で表わされるものである。トリエタノールカルボン酸
塩とトリエタノール塩酸塩の割合は任意であるが、研磨
速度を高め、突起やピットの発生を押えるためにはトリ
エタノールアミンカルボン酸塩の割合が50重量%〜9
0重量%が好ましい。The alumina abrasive powder is preferably α-Aρ203 or the like and has an average particle diameter of 0.5 to IO μm. Triethanolamine carboxylate is HN(CH2CH20H)3・RC
Represented by OO- (R is a hydrocarbon group), triethanolamine hydrochloride is HN(CH2CH20H)3.c, l?
It is represented by -. The ratio of triethanol carboxylate to triethanol hydrochloride is arbitrary, but in order to increase the polishing speed and suppress the generation of protrusions and pits, the ratio of triethanolamine carboxylate should be 50% by weight to 9% by weight.
0% by weight is preferred.
本発明の研磨用組成物はトリエタノールアミンカルボン
酸塩とトリエタノールアミン塩酸塩の水溶液にアルミナ
研磨材粉末を懸濁したもので、好ましい組成としてはア
ルミナ研磨材粉末1〜25重量%、トリエタノールアミ
ンカルボン酸塩とトリエタノールアミン塩酸塩の合計が
0.1〜5重量%の弱アルカリ性スラリーである。又、
これに炭酸ソーダ等を加えてpHを調整することも可能
である。The polishing composition of the present invention is a suspension of alumina abrasive powder in an aqueous solution of triethanolamine carboxylate and triethanolamine hydrochloride, and the preferred composition is 1 to 25% by weight of alumina abrasive powder, triethanolamine It is a weakly alkaline slurry containing 0.1 to 5% by weight of amine carboxylate and triethanolamine hydrochloride in total. or,
It is also possible to adjust the pH by adding soda carbonate or the like.
好ましいpHは9.0〜10.0である。特に炭酸ソー
ダは研磨速度を高め、突起やピットの発生を押える効果
があり、非常に有用である。その好ましい添加量は0.
01〜0.05重量%である。The preferred pH is 9.0 to 10.0. In particular, soda carbonate is very useful as it has the effect of increasing the polishing speed and suppressing the formation of protrusions and pits. The preferable addition amount is 0.
01 to 0.05% by weight.
又、実際の研磨では、この研磨用組成物を原液で使用す
ることは勿論、2〜6倍程度に任意に希釈して使用する
ことも可能である。研磨促進剤の濃度は研磨能率を上げ
、且つ突起やピットの発生を少なくするため0.1重量
%以上が好ましい。又5重量%を超えても逆に研磨速度
は低下し、且つピットが発生し易くなるので5重量%以
下が好ましい。実際の使用に当っては0.1〜1重量%
が最も好ましい。Furthermore, in actual polishing, this polishing composition can be used not only in its original form, but also optionally diluted to about 2 to 6 times. The concentration of the polishing accelerator is preferably 0.1% by weight or more in order to increase polishing efficiency and reduce the occurrence of protrusions and pits. Moreover, if it exceeds 5% by weight, the polishing rate will decrease and pits will be more likely to occur, so it is preferably 5% by weight or less. In actual use, it is 0.1 to 1% by weight.
is most preferred.
アルミナ研磨材粉末は1重量%を下廻ると研磨能率の低
下とスクラッチの発生があり、又25重量%を超えても
研磨能率の向上は認められず且つ粘度が増大して作業性
が悪くなるので1〜25重量%が好ましい。アルミナ研
磨材粉末の平均粒度は0.5μmを下廻ると研磨能率が
低くなり、又10μmを超えると表面粗さが粗くなるの
で0.5〜10μmが好ましい。When the amount of alumina abrasive powder is less than 1% by weight, polishing efficiency decreases and scratches occur, and even when it exceeds 25% by weight, no improvement in polishing efficiency is observed and the viscosity increases, resulting in poor workability. Therefore, the content is preferably 1 to 25% by weight. If the average particle size of the alumina abrasive powder is less than 0.5 μm, the polishing efficiency will be low, and if it exceeds 10 μm, the surface roughness will become rough, so it is preferably 0.5 to 10 μm.
本発明において、トリエタノールアミンカルボン酸塩と
トリエタノールアミン塩酸塩は研磨促進と研磨面を高精
度にする働きがあり、オレンジビールの発生が全くなく
、突起やピットの少ない、うねりの小さい高精度な研磨
面を迅速に得ることを可能とした。更に機械の腐蝕性、
人体に対する有害性も低いという特徴を有している。In the present invention, triethanolamine carboxylate and triethanolamine hydrochloride have the function of accelerating polishing and making the polished surface highly precise.There is no occurrence of orange beer, there are few protrusions and pits, and there is high precision with small waviness. This makes it possible to quickly obtain a polished surface. Furthermore, the corrosivity of the machine,
It is also characterized by low toxicity to the human body.
次に、実施例により、本発明を更に詳しく説明する。以
下の実施例における研磨特性は、次の様な研磨試験で評
価した。研磨は4ウ工イ式の両面ポリシングマシン(定
盤径φ840 mm)を使用し、定盤にはスェードタイ
プのパッド(昭和ポリシングシステム■製S P D
No、4235)を貼り付け、3.5インチのアルミニ
ウムサブストレート10枚を6分間研磨する。研磨条件
は下定盤回転数: 70rpm 。Next, the present invention will be explained in more detail with reference to Examples. The polishing properties in the following examples were evaluated by the following polishing test. For polishing, a 4-way type double-sided polishing machine (surface plate diameter φ840 mm) was used, and the surface plate was equipped with a suede type pad (S P D manufactured by Showa Polishing System).
No. 4235) and polished ten 3.5-inch aluminum substrates for 6 minutes. The polishing conditions were lower surface plate rotation speed: 70 rpm.
加工圧カニ 100g/at スラリー供給量: 10
0 ml/n+in、である。研磨後アルミニウムサブ
ストレートを秤量し、重量減から研磨速度を求める。又
、表面は微分干渉顕微鏡及び10万ルクススポツトライ
トで観察し、突起、ピット、スクラッチなどの度合を判
定する。又。表面粗さはランクテーラーホブソン社製の
タリステップとタリデータ2000で測定する。Processing pressure crab 100g/at Slurry supply amount: 10
0 ml/n+in. After polishing, the aluminum substrate is weighed and the polishing speed is determined from the weight loss. In addition, the surface is observed using a differential interference microscope and a 100,000 lux spot light to determine the degree of protrusions, pits, scratches, etc. or. The surface roughness is measured using Talystep and Talydata 2000 manufactured by Rank Taylor Hobson.
実施例 1〜5
平均粒子径1.9μmのアルミナ粉末を22重量%含有
するスラリーに、トリエタノールアミン酢酸塩とトリエ
タノールアミン塩酸塩を前者の比率を82重量%になる
様に保って、この両者の合計の組成物中に占める割合が
0.425. 1.275. 2.125゜3.400
、及び4.250重量%になる様に溶解した後、炭酸
ソーダを0,15〜0.30重量%添加してpHを9.
8に調整し、本発明の研磨用組成物を得た。この研磨用
組成物を容量比で4倍に水で希釈してアルミニウムサブ
ストレートの研磨試験を実施した。試験の結果を第1表
に示す。Examples 1 to 5 Triethanolamine acetate and triethanolamine hydrochloride were added to a slurry containing 22% by weight of alumina powder with an average particle size of 1.9 μm, keeping the ratio of the former at 82% by weight. The total proportion of both in the composition is 0.425. 1.275. 2.125°3.400
, and 4.250% by weight, and then add 0.15 to 0.30% by weight of soda carbonate to adjust the pH to 9.
8 to obtain a polishing composition of the present invention. This polishing composition was diluted with water to a volume ratio of 4 times, and an aluminum substrate polishing test was conducted. The test results are shown in Table 1.
(以下余白)
第 1
表
通常アルミニウムサブストレートに必要とされる品質は
、表面粗さ(Rt+n)で2.000Å以下、うねり(
vt)で700Å以下であるが、第1表によれば本発明
の研磨用組成物による研磨面は全てに大幅にこの値を下
廻っている。勿論オレンジピールの発生は全く認められ
なかった。(Left below) Table 1 The qualities normally required for aluminum substrates are surface roughness (Rt+n) of 2.000 Å or less, waviness (
vt) is 700 Å or less, but according to Table 1, all surfaces polished by the polishing composition of the present invention are significantly below this value. Of course, no orange peel was observed at all.
又、真直度は5μm/25+nm長以下、外周面ダレは
0.5μm / 4 mm長以下が必要とされるが、こ
のためには研磨速度は0,8μm/min、以上が好ま
しい。本発明の研磨用組成物による研磨速度はこの値を
上廻っており、真直度0.12μm725mm長、外周
面ダレは0.13μm / 4 mn長で非常に優れた
研磨面であった。但し、研磨促進剤の濃度が0.1重量
%以下と1.0重量%以上になるとややピットの発生が
認められたので、研磨促進剤の最適濃度は0.1〜1,
0重量%である。Further, the straightness is required to be 5 μm/25+nm in length or less, and the outer peripheral surface sag is required to be 0.5 μm/4 mm in length or less, and for this purpose, the polishing rate is preferably 0.8 μm/min or more. The polishing speed with the polishing composition of the present invention exceeded this value, and the polished surface was very excellent, with straightness of 0.12 μm and length of 725 mm, and outer peripheral surface sagging of 0.13 μm/4 mm in length. However, when the concentration of the polishing accelerator was 0.1% by weight or less and 1.0% by weight or more, some pitting was observed, so the optimum concentration of the polishing accelerator is 0.1 to 1% by weight.
It is 0% by weight.
本発明によるトリエタノールアミンカルボン酸塩とトリ
エタノール塩酸塩を組み合せた研磨促進剤を使用した研
磨用組成物は、特にアルミニウムサブストレートの研磨
に有効であり、
1)高い研磨能率がある
2)オレンジピールが発生しない
3)突起やピットの発生が少ない
4)表面粗さが小さい
5)真直度、外周面ダレの小さい優れた面が得られるな
どの効果があり、
6)機械に対する腐蝕性が少ない
7)人体に対する有害性が少ない
という点でも効果的である。The polishing composition using a polishing accelerator combining triethanolamine carboxylate and triethanol hydrochloride according to the present invention is particularly effective for polishing aluminum substrates, and has the following features: 1) High polishing efficiency 2) Orange No peeling 3) Few protrusions and pits 4) Low surface roughness 5) Excellent surface straightness and minimal sagging on the outer periphery 6) Less corrosive to machinery 7) It is also effective in that it is less harmful to the human body.
Claims (3)
ンカルボン酸塩とトリエタノールアミン塩酸塩の研磨促
進剤からなる弱アルカリ性のアルミニウム磁気ディスク
研磨用組成物。(1) A weakly alkaline aluminum magnetic disk polishing composition comprising water, alumina abrasive powder, and polishing accelerators of triethanolamine carboxylate and triethanolamine hydrochloride.
重量%である特許請求の範囲第1項記載のアルミニウム
磁気ディスク研磨用組成物。(2) The proportion of the polishing accelerator in the composition is 0.1 to 5.
% by weight of the aluminum magnetic disk polishing composition according to claim 1.
〜25重量%であり、平均粒子径が0.5〜10μmで
ある特許請求の範囲第1項又は第2項記載のアルミニウ
ム磁気ディスク研磨用組成物。(3) The proportion of alumina abrasive powder in the composition is 1
25% by weight and an average particle size of 0.5 to 10 μm.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62275645A JPH01121163A (en) | 1987-11-02 | 1987-11-02 | Composition for polishing of aluminum magnetic disk |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62275645A JPH01121163A (en) | 1987-11-02 | 1987-11-02 | Composition for polishing of aluminum magnetic disk |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01121163A true JPH01121163A (en) | 1989-05-12 |
Family
ID=17558351
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62275645A Pending JPH01121163A (en) | 1987-11-02 | 1987-11-02 | Composition for polishing of aluminum magnetic disk |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01121163A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04201069A (en) * | 1990-11-29 | 1992-07-22 | C Uyemura & Co Ltd | Polishing method |
JPH06267068A (en) * | 1993-03-16 | 1994-09-22 | Sky Alum Co Ltd | Magnetic disk base and manufacture thereof |
DE4410787A1 (en) * | 1993-03-26 | 1994-09-29 | Toshiba Kawasaki Kk | Polishing method and polishing device |
US5607718A (en) * | 1993-03-26 | 1997-03-04 | Kabushiki Kaisha Toshiba | Polishing method and polishing apparatus |
EP0842997A1 (en) * | 1996-11-14 | 1998-05-20 | Nissan Chemical Industries Ltd. | Polishing composition for aluminium disk and polishing process therewith |
GB2397580A (en) * | 2002-12-26 | 2004-07-28 | Kao Corp | Microwaviness reducing agent and polishing composition |
-
1987
- 1987-11-02 JP JP62275645A patent/JPH01121163A/en active Pending
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04201069A (en) * | 1990-11-29 | 1992-07-22 | C Uyemura & Co Ltd | Polishing method |
JPH0825137B2 (en) * | 1990-11-29 | 1996-03-13 | 上村工業株式会社 | Polishing method |
JPH06267068A (en) * | 1993-03-16 | 1994-09-22 | Sky Alum Co Ltd | Magnetic disk base and manufacture thereof |
JPH087862B2 (en) * | 1993-03-16 | 1996-01-29 | スカイアルミニウム株式会社 | Magnetic disk substrate and manufacturing method thereof |
DE4410787A1 (en) * | 1993-03-26 | 1994-09-29 | Toshiba Kawasaki Kk | Polishing method and polishing device |
US5607718A (en) * | 1993-03-26 | 1997-03-04 | Kabushiki Kaisha Toshiba | Polishing method and polishing apparatus |
EP0842997A1 (en) * | 1996-11-14 | 1998-05-20 | Nissan Chemical Industries Ltd. | Polishing composition for aluminium disk and polishing process therewith |
US6007592A (en) * | 1996-11-14 | 1999-12-28 | Nissan Chemical Industries, Ltd. | Polishing composition for aluminum disk and polishing process therewith |
GB2397580A (en) * | 2002-12-26 | 2004-07-28 | Kao Corp | Microwaviness reducing agent and polishing composition |
GB2397580B (en) * | 2002-12-26 | 2006-11-08 | Kao Corp | Polishing composition |
US7553345B2 (en) | 2002-12-26 | 2009-06-30 | Kao Corporation | Polishing composition |
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