JP7446668B2 - Processing waste liquid treatment equipment - Google Patents

Description

The present invention relates to a processing waste liquid treatment device that processes processing waste liquid discharged from processing equipment.

In the device chip manufacturing process, devices such as ICs (Integrated Circuits) and LSIs (Large Scale Integrations) are formed on the surface side of multiple regions divided by multiple dividing lines (street) arranged in a grid pattern. wafers are used. By dividing this wafer along the planned dividing line, a plurality of device chips each having a device are obtained. A cutting device or the like that cuts the wafer with an annular cutting blade is used to divide the wafer.

Furthermore, in recent years, as electronic devices have become smaller and thinner, device chips have also been required to be thinner. Therefore, before dividing the wafer, a step of thinning the wafer is performed by grinding the back side of the wafer. A grinding device or the like that grinds the wafer with a grinding wheel to which a plurality of grinding wheels are fixed is used for grinding the wafer.

When a wafer is processed by a processing device such as the above-mentioned cutting device or grinding device, a processing fluid is supplied to the wafer. This processing fluid cools the wafer and processing tools (cutting blades, grinding wheels, etc.), and washes away debris generated during processing. Further, after processing the wafer, a cleaning step is performed in which a cleaning liquid is supplied to the wafer to clean the wafer. Pure water is mainly used as the processing liquid and cleaning liquid. The pure water used in the processing equipment is then discharged to the outside of the processing equipment as processing waste liquid and disposed of.

A large amount of pure water is used when processing and cleaning wafers with processing equipment. Therefore, if all the pure water used in the processing equipment is disposed of as processing waste liquid, the cost will increase. Therefore, a method has been proposed in which processing waste liquid discharged from processing equipment is reused. For example, Patent Document 1 discloses a processing waste liquid treatment device that generates pure water by refining processing waste liquid discharged from a processing device using an ion exchange resin.

Japanese Patent Application Publication No. 2009-190128

As a method for producing pure water by ion exchange, a mixed bed column method and a multi-bed column method are known. In the mixed bed column system, a processing waste liquid treatment device is used that includes an ion exchange column (cylinder) filled with a mixture of a cation exchange resin and an anion exchange resin. On the other hand, the multi-bed column system uses a processing waste liquid treatment device in which an ion exchange column filled with a cation exchange resin and an ion exchange column filled with an anion exchange resin are connected in series.

If the processing waste liquid treatment device is continued to be used, the ion exchange ability of the ion exchange resin gradually decreases, and the purity of the produced pure water decreases. Therefore, after the processing waste liquid treatment device has been used for a certain period of time, a process is performed to regenerate the ion exchange resin and restore the ion exchange ability of the ion exchange resin. The regeneration treatment of the ion exchange resin is performed by removing the used ion exchange tower from the processing waste liquid treatment equipment and supplying a chemical solution to the ion exchange tower.

During the ion exchange resin regeneration process, a standby ion exchange column is used to produce pure water. Therefore, after the used ion exchange tower is removed from the processing waste liquid treatment apparatus, a spare ion exchange tower is attached to the processing waste liquid treatment apparatus. However, during the replacement work of the ion exchange tower, pure water is not generated by the processing waste liquid treatment device, and the supply of pure water to the processing device is also stopped. Therefore, when regenerating the ion exchange resin, it is necessary to temporarily stop the operation of the processing equipment and interrupt the processing, which reduces processing efficiency. The reduction in processing efficiency due to the stoppage of the production of pure water becomes more pronounced as the frequency of the regeneration treatment of the ion exchange resin increases.

Furthermore, when the ion exchange resin is subjected to regeneration treatment, the volume of the ion exchange resin decreases. Therefore, when regenerating the ion exchange resin, new ion exchange resin is replenished as necessary, and the amount of ion exchange resin is maintained so that the processing waste liquid is appropriately purified. However, if the frequency of regeneration treatment of the ion exchange resin is high, the volume of the ion exchange resin decreases greatly, and the amount of replenishment of the ion exchange resin also increases. This increases the cost of producing pure water.

The present invention has been made in view of such problems, and an object of the present invention is to provide a processing waste liquid treatment device that can reduce the frequency of regeneration treatment of ion exchange resin.

According to one aspect of the present invention, there is provided a processing waste liquid treatment device that is connected to a processing device that processes a workpiece and that processes processing waste liquid discharged from the processing device, the waste liquid storage tank storing the processing waste liquid. , a waste liquid filtration means for filtering the processing waste liquid supplied from the waste liquid storage tank, a first flow path for supplying the processing waste liquid filtered by the waste liquid filtration means to the processing apparatus, and the waste liquid filtration. an ion exchange means for removing ions from the processing waste liquid filtered by the means to generate pure water; a second flow path for supplying the pure water produced by the ion exchange means to the processing apparatus; , the first flow path and the second flow path are different flow paths, the processing device is a cutting device or a grinding device, and the processing waste liquid filtered by the waste liquid filtration means is A processing waste liquid treatment device is provided in which the pure water generated by the ion exchange means is supplied to the processing device through one flow path and the pure water produced by the ion exchange means is supplied to the processing device through the second flow path . According to another aspect of the present invention, there is provided a processing waste liquid treatment device connected to a processing device for processing a workpiece, for processing processing waste liquid discharged from the processing device, the processing waste liquid being stored. a waste liquid storage tank, a waste liquid filtration means for filtering the processing waste liquid supplied from the waste liquid storage tank, a first flow path for supplying the processing waste liquid filtered by the waste liquid filtration means to the processing apparatus; , an ion exchange means for removing ions from the processing waste liquid filtered by the waste liquid filtration means to produce pure water, and a second for supplying the pure water produced by the ion exchange means to the processing apparatus. a flow path, the processing device is a cutting device or a grinding device, and the processing waste liquid filtered by the waste liquid filtration means is used as the processing liquid used for processing the workpiece in the first stream. The pure water produced by the ion exchange means is supplied to the processing device via the second channel as a cleaning liquid used for cleaning the workpiece. A processing waste liquid treatment device is provided.

Preferably , the ion exchange means removes ions from the processing waste liquid using an ion exchange resin to generate the pure water, and also regenerates the ion exchange resin by electrodialysis. Preferably, the processing waste liquid treatment apparatus further includes a temperature control means connected to the waste liquid storage tank and adjusting the temperature of the processing waste liquid supplied from the waste liquid storage tank.

A processing waste liquid treatment device according to one aspect of the present invention includes a first flow path for supplying the processing waste liquid filtered by the waste liquid filtration means to the processing device, and a first flow path for removing ions from the processing waste liquid filtered by the waste liquid filtration means. and a second flow path for supplying the purified water generated by the ion exchange means to the processing device.

In the processing waste liquid treatment apparatus described above, a part of the processing waste liquid filtered by the waste liquid filtration means can be supplied to the processing apparatus without being purified by the ion exchange means. This reduces the amount of processing waste liquid purified by the ion exchange means. As a result, a decrease in the ion exchange ability of the ion exchange resin is suppressed, and the frequency of regeneration treatment of the ion exchange resin is reduced.

FIG. 2 is a schematic diagram showing a processing waste liquid treatment device. It is a sectional view showing a modification of the ion exchange means.

Hereinafter, embodiments according to one aspect of the present invention will be described with reference to the accompanying drawings. First, a configuration example of a processing waste liquid treatment apparatus according to the present embodiment will be described. FIG. 1 is a schematic diagram showing a processing waste liquid treatment device 2. As shown in FIG. The processing waste liquid treatment device 2 is connected to a processing device (not shown) that processes a workpiece using pure water. Then, the processing waste liquid treatment device 2 purifies the waste liquid discharged from the processing equipment to generate pure water, and supplies the purified water to the processing equipment.

There are no restrictions on the type of processing equipment to which the processing waste liquid treatment device 2 is connected. Examples of processing devices include a cutting device equipped with a processing unit (cutting unit) that cuts a workpiece with an annular cutting blade, and a processing unit (grinding unit) that grinds a workpiece with a grinding wheel to which multiple grinding wheels are fixed. Examples include a grinding device equipped with a polishing unit), a polishing device equipped with a processing unit (polishing unit) that polishes a workpiece with a polishing pad, and the like.

For example, a silicon wafer has devices such as ICs (Integrated Circuits) and LSIs (Large Scale Integrations) formed on the surface side of multiple regions divided by multiple dividing lines (street) arranged in a grid. , processed by processing equipment. After the silicon wafer is thinned using a grinding device and a polishing device, it is divided along dividing lines using a cutting device, thereby manufacturing a plurality of device chips each including a device.

Note that there are no restrictions on the material, shape, structure, size, etc. of the workpiece. For example, the workpiece may be a wafer made of a material other than silicon, such as a semiconductor (GaAs, InP, GaN, SiC, etc.), ceramics, resin, metal, or the like. Furthermore, there are no restrictions on the type, quantity, shape, structure, size, arrangement, etc. of devices formed on the workpiece, and the workpiece does not need to have any devices formed thereon. Further, the workpiece may be a package substrate such as a CSP (Chip Size Package) substrate or a QFN (Quad Flat Non-leaded package) substrate.

Processing apparatuses use a processing liquid that is supplied to the processing unit and the workpiece when processing the workpiece, and a cleaning liquid that is used to clean the workpiece after processing. Pure water or the like is used as the processing liquid or cleaning liquid. The used machining fluid and cleaning fluid are then discharged from the processing equipment as machining waste fluid.

The processing waste liquid treatment device 2 includes a waste liquid storage tank 4 that stores processing waste liquid discharged from the processing equipment. The waste liquid storage tank 4 is connected to the processing equipment via a flow path such as piping or tubes, and the processing waste liquid discharged from the processing equipment is supplied to the waste liquid storage tank 4 through this flow path and is stored therein. . Note that the processing waste liquid supplied from the processing device to the waste liquid storage tank 4 contains foreign substances such as waste (processing waste) generated when the workpiece is processed by the processing device, and impurity ions.

The waste liquid storage tank 4 is connected to a temperature control means (temperature control unit) 8 via a waste liquid supply pump 6. The waste liquid supply pump 6 is a pump that supplies the processing waste liquid stored in the waste liquid storage tank 4 to the temperature control means 8 . This waste liquid supply pump 6 controls the amount of processing waste liquid supplied from the waste liquid storage tank 4 to the temperature control means 8 .

The temperature adjustment means 8 is constituted by a temperature controller or the like, and adjusts the temperature of the processing waste liquid supplied from the waste liquid storage tank 4. The processing waste liquid whose temperature has been adjusted by the temperature adjustment means 8 is supplied to a waste liquid filtration means (waste liquid filtration unit) 10 connected to the temperature adjustment means 8.

The waste liquid filtration means 10 filters and purifies the processing waste liquid supplied from the waste liquid storage tank 4 via the temperature control means 8. Specifically, the waste liquid filtration means 10 is constituted by a filter equipped with a filter for filtering processing waste liquid. As the filter of the waste liquid filtration means 10, for example, a reverse osmosis membrane (RO membrane) is used. When the processing waste liquid passes through this filter, foreign substances contained in the processing waste liquid are captured by the filter. As a result, processing waste liquid (clean water) 20 that has been filtered and purified by the waste liquid filtration means 10 is obtained.

The waste liquid filtration means 10 is connected to an ion exchange means (ion exchange unit) 12 that purifies the processing waste liquid 20 filtered by the waste liquid filtration means 10 to generate pure water. The ion exchange means 12 includes an ion exchange resin, and removes ions from the processing waste liquid 20 by ion exchange. Specifically, the ion exchange means 12 can be constituted by an ion exchange column (cylinder) containing an ion exchange resin.

For example, as the ion exchange means 12, a mixed bed ion exchange means (mixed bed ion exchange unit) may be used, which is constituted by an ion exchange tower filled with a mixture of a cation exchange resin and an anion exchange resin. Can be done. In addition, as the ion exchange means 12, a multi-bed ion exchange means (multi-bed ion exchange means) in which an ion exchange column filled with a cation exchange resin and an ion exchange column filled with an anion exchange resin are connected in series. unit) can also be used.

When the processing waste liquid 20 is supplied from the waste liquid filtering means 10 to the ion exchange means 12, the processing waste liquid 20 passes through the gap between the ion exchange resin filled in the ion exchange tower provided in the ion exchange means 12. At this time, ions contained in the processing waste liquid 20 are removed by the ion exchange resin. As a result, the processing waste liquid 20 is purified and pure water 22 is generated. This pure water 22 has higher purity than the processing waste liquid 20 filtered by the waste liquid filtering means 10.

Note that when the ion exchange means 12 continues to purify the processing waste liquid 20, the ion exchange ability of the ion exchange resin included in the ion exchange means 12 gradually decreases, and the purity of the pure water 22 produced by the ion exchange means 12 decreases. do. Therefore, after the ion exchange means 12 has been used for a certain period of time, it is replaced with a spare ion exchange means. While the ion exchange means 12 is being replaced, the production of pure water 22 by the processing waste liquid treatment device 2 is temporarily stopped.

Then, the used ion exchange resin included in the ion exchange means 12 removed from the processing waste liquid treatment device 2 is subjected to a regeneration process. Specifically, a chemical solution is injected into an ion exchange tower containing an ion exchange resin, and the ion exchange resin is regenerated. For example, when regenerating a cation exchange resin, hydrochloric acid or the like is used as a chemical solution, and when regenerating an anion exchange resin, an aqueous solution of sodium hydroxide or the like is used as a chemical solution.

Further, the waste liquid filtration means 10 is connected to a flow path (flow channel) 14 through which the processing waste liquid 20 filtered by the waste liquid filtration means 10 is supplied. One end side of the flow path 14 is connected to the waste liquid filtering means 10, and the other end side of the flow path 14 is connected to the processing device that discharged the processing waste liquid. Further, the ion exchange means 12 is connected to a flow path (flow channel) 16 through which pure water 22 generated by the ion exchange means 12 is supplied. One end of the flow path 16 is connected to the ion exchange means 12, and the other end of the flow path 16 is connected to the processing device that discharged the processing waste liquid.

A processing waste liquid 20 filtered by a waste liquid filtration means 10 is supplied from the processing waste liquid treatment device 2 to the processing apparatus through a flow path 14, and pure water 22 generated by an ion exchange means 12 is supplied through a flow path 16. Supplied via Note that each of the flow paths 14 and 16 is constituted by, for example, a metal pipe or a resin tube. However, there are no restrictions on the structure or material of the channels 14 and 16.

Here, the various treatments performed on the workpiece by the processing apparatus include a process in which liquid is supplied to the workpiece and the like. Processes to which this liquid is supplied include processes in which the use of pure water is preferable, and processes in which there is no problem even if a liquid with a purity lower than pure water is used.

For example, in a cleaning step of cleaning a workpiece after processing, a cleaning liquid is supplied to the workpiece. If this cleaning liquid contains impurity ions, the impurity ions remain attached to the workpiece after cleaning. After that, when the workpiece is subjected to a drying process, impurity ions firmly adhere to the workpiece and create a watermark that is difficult to remove, resulting in a decrease in the quality of the workpiece and formation on the workpiece. Inconveniences such as malfunction of the device may occur. Therefore, it is preferable to use pure water from which ions have been removed as the cleaning liquid.

On the other hand, for example, during machining of a workpiece, machining fluid is supplied to the workpiece and the machining unit. By supplying the machining fluid, the wafer and the machining unit are cooled, and debris (machining debris) generated during the machining is washed away.

This machining liquid is continuously supplied during machining of the workpiece, and the workpiece is maintained in a wet state. Therefore, even if the machining liquid contains impurity ions and these impurity ions adhere to the workpiece, no watermark remains. Further, even if impurity ions are attached to the workpiece after processing, the impurity ions are washed away with pure water in the above-mentioned cleaning step that is performed afterwards. Therefore, a liquid with lower purity than pure water (liquid containing many impurity ions) can be used as the processing liquid.

Therefore, the processing waste liquid treatment device 2 generates two types of liquids having different purity, that is, filtered processing waste liquid (clean water) 20 and pure water 22, and supplies them to the processing device. In the processing equipment, the pure water 22 is used for processing that requires a liquid with high purity, and the filtered processing waste liquid 20 is used for processing that can be performed with a liquid of lower purity than the pure water 22. For example, the filtered processing waste liquid 20 is supplied to the processing device via the flow path 14 as a processing liquid used for processing the workpiece. Further, the pure water 22 is supplied to the processing device via the flow path 16 as a cleaning liquid used for cleaning the workpiece.

When the processing waste liquid 20 and pure water 22 are supplied from the processing waste liquid treatment device 2 to the processing equipment, only a part of the processing waste liquid stored in the waste liquid storage tank 4 is purified by the ion exchange means 12. Therefore, compared to the case where all of the processing waste liquid stored in the waste liquid storage tank 4 is purified by the ion exchange means 12, the amount of processing waste liquid 20 from which ions are removed by the ion exchange resin included in the ion exchange means 12 is reduced. Reduced. This suppresses a decrease in the ion exchange ability of the ion exchange resin.

When the decline in the ion exchange ability of the ion exchange resin is suppressed, the frequency of regenerating the ion exchange resin is reduced. As a result, the frequency of replacing the ion exchange means 12 is reduced, and the period during which the generation of pure water 22 is stopped due to the replacement work is shortened. Further, the reduction in volume of the ion exchange resin due to regeneration treatment is suppressed, and the cost of replenishing the ion exchange resin is reduced.

In addition, above, the example in which the ion exchange means 12 is comprised by the ion exchange column (cylinder) which accommodated the ion exchange resin was demonstrated. However, the configuration of the ion exchange means 12 is not limited as long as the processing waste liquid 20 can be purified by ion exchange. For example, as the ion exchange means 12, an electric regeneration type ion exchange means (electric regeneration type ion exchange unit) that removes ions from the ion exchange resin and regenerates the ion exchange resin by electrical action, specifically, electrodialysis. It may be.

FIG. 2 is a sectional view showing a modification of the ion exchange means 12. The ion exchange means 12 shown in FIG. 2 includes a plate-shaped anode 30 and a cathode 32 to which a predetermined voltage is applied. A plurality of demineralization chambers (purification chambers) 34 are provided between the anode 30 and the cathode 32 in which ion exchange resin 36 is accommodated. This demineralization chamber 34 is defined by a cation film 38 provided on the cathode 32 side and an anion film 40 provided on the anode 30 side. That is, the demineralization chamber 34 corresponds to a region sandwiched between the cation film 38 and the anion film 40. The cation membrane 38 is an ion exchange membrane that allows cations to pass through and prevents anions from passing through, and the anion membrane 40 is an ion exchange membrane that allows anions to pass through and blocks cations from passing through.

The desalination chamber 34 is filled with a mixture of an ion exchange resin 36 (cation exchange resin) for exchanging cations and an ion exchange resin 36 (anion exchange resin) for exchanging anions. A cell 42 is constituted by a demineralization chamber 34 filled with an ion exchange resin 36, a cation membrane 38, and an anion membrane 40. Although FIG. 2 shows a configuration example in which two sets of cells 42 are provided, there is no limit to the number of cells 42.

A cation film 44 is provided between the anode 30 and a cell 42 adjacent to the anode 30. Further, an anion film 46 is provided between the cathode 32 and the cell 42 adjacent to the cathode 32. The cation membrane 44 is an ion exchange membrane that allows cations to pass through and prevents anions from passing through, and the anion membrane 46 is an ion exchange membrane that allows anions to pass through and prevents cations from passing through.

A concentration chamber 48 is formed between the cation membranes 38, 44 and the anion membranes 40, 46, which are adjacent to each other. This concentration chamber 48 corresponds to a region sandwiched between the cation membranes 38 and 44 and the anion membranes 40 and 46. Further, electrode chambers 50 are formed between the anode 30 and the cation film 44 and between the cathode 32 and the anion film 46, respectively.

The processing waste liquid 20 filtered by the waste liquid filtration means 10 is supplied to one end side (the upper side in FIG. 2) of the demineralization chamber 34 . The processing waste liquid 20 flows from one end of the demineralization chamber 34 toward the other end (lower side in FIG. 2) while passing through the gaps between the ion exchange resins 36. At this time, ions contained in the processing waste liquid 20 are removed by the ion exchange resin 36.

Specifically, cations 52 contained in the processing waste liquid 20 are captured by the cation exchange resin, and anions 54 contained in the processing waste liquid 20 are captured by the anion exchange resin. As a result, the processing waste liquid 20 is purified and pure water 22 is generated. The generated pure water 22 flows out from the other end of the desalination chamber 34. This pure water 22 is supplied to the flow path 16 shown in FIG.

Note that if the processing waste liquid treatment device 2 is continued to be used, the ion exchange ability of the ion exchange resin 36 gradually decreases, and the purity of the pure water 22 produced by the ion exchange means 12 decreases. Therefore, by performing a process to regenerate the ion exchange resin 36, the ion exchange ability of the ion exchange resin 36 is maintained. In the processing waste liquid treatment device 2, the ion exchange resin 36 is regenerated by electrical action, specifically, by electrodialysis.

When regenerating the ion exchange resin 36, as shown in FIG. 2, a part of the processing waste liquid 20 filtered by the waste liquid filtering means 10 is supplied to one end side (the upper side in FIG. 2) of the concentration chamber 48. The processing waste liquid 20 flows from one end of the concentration chamber 48 toward the other end (lower side in FIG. 2). Further, a part of the processing waste liquid 20 filtered by the waste liquid filtering means 10 is supplied to one end side (the upper side in FIG. 2) of the electrode chamber 50. The processing waste liquid 20 flows from one end of the electrode chamber 50 toward the other end (downward in FIG. 2).

In this state, predetermined voltages are applied to the anode 30 and the cathode 32, respectively, to generate a potential difference between the anode 30 and the cathode 32. As a result, the cations 52 captured by the ion exchange resin 36 pass through the cation membrane 38 and move to the cathode 32 side. This cation 52 does not pass through the anion membranes 40 and 46 and is accumulated in the concentration chamber 48. Similarly, the anions 54 captured by the ion exchange resin 36 pass through the anion membrane 40 and move to the anode 30 side, and are accumulated in the concentration chamber 48 . As a result, the ions captured by the ion exchange resin 36 are released, and the ion exchange resin 36 is regenerated.

As described above, in the ion exchange means 12 shown in FIG. 2, by applying a voltage to the anode 30 and the cathode 32, the ion exchange resin 36 is regenerated without removing the ion exchange means 12 from the processing waste liquid treatment device 2. can. Therefore, during the regeneration process of the ion exchange resin 36, the generation of the pure water 22 is not interrupted by the replacement work of the ion exchange means 12, and the supply of the pure water 22 to the processing equipment can be continued.

Further, the ion exchange means 12 shown in FIG. 2 can regenerate the ion exchange resin 36 even during purification of the processing waste liquid 20. That is, by using the ion exchange means 12, the generation of pure water 22 and the regeneration of the ion exchange resin 36 can be performed simultaneously. Note that the regeneration period of the ion exchange resin 36 can be freely set. For example, the ion exchange resin 36 may be regenerated constantly while the pure water 22 is being generated, or may be regenerated intermittently at predetermined intervals.

When the ion exchange resin 36 is regenerated, ions extracted from the processing waste liquid 20 flowing through the demineralization chamber 34 (ions captured by the ion exchange resin 36) are released into the concentration chamber 48, and the ions are Concentrated water 24 is produced. Further, within the electrode chamber 50, the processing waste liquid 20 flowing through the electrode chamber 50 is electrolyzed, and electrolyzed water 26 is generated. The concentrated water 24 and the electrolyzed water 26 are discharged to the outside of the processing waste liquid treatment apparatus 2, for example, via a discharge path provided in the processing waste liquid treatment apparatus 2.

As described above, the processing waste liquid treatment apparatus 2 according to the present embodiment includes a flow path 14 for supplying the processing waste liquid 20 filtered by the waste liquid filtration means 10 to the processing apparatus, and a processing waste liquid filtered by the waste liquid filtration means 10. The apparatus includes an ion exchange means 12 for removing ions from the ion exchange means 20 to generate pure water 22, and a flow path 16 for supplying the pure water 22 generated by the ion exchange means 12 to the processing device.

In the processing waste liquid treatment apparatus 2 described above, a part of the processing waste liquid 20 filtered by the waste liquid filtration means 10 can be supplied to the processing apparatus without being purified by the ion exchange means 12. Thereby, the amount of processing waste liquid 20 purified by the ion exchange means 12 is reduced. As a result, a decrease in the ion exchange ability of the ion exchange resin is suppressed, and the frequency of regeneration treatment of the ion exchange resin is reduced.

In addition, the structure, method, etc. according to the above embodiments can be modified and implemented as appropriate without departing from the scope of the objective of the present invention.

2 Processing waste liquid treatment device 4 Waste liquid storage tank 6 Waste liquid supply pump 8 Temperature control means (temperature control unit)
10 Waste liquid filtration means (waste liquid filtration unit)
12 Ion exchange means (ion exchange unit)
14, 16 Flow path (flow channel)
20 Processing waste liquid (clean water)
22 Pure water 24 Concentrated water 26 Electrolyzed water 30 Anode 32 Cathode 34 Desalination room (purification room)
36 Ion exchange resin 38 Cation membrane 40 Anion membrane 42 Cell 44 Cation membrane 46 Anion membrane 48 Concentration chamber 50 Electrode chamber 52 Cation 54 Anion

Claims (4)

A processing waste liquid treatment device connected to a processing device that processes a workpiece, and processing processing waste liquid discharged from the processing device,
a waste liquid storage tank that stores the processing waste liquid;
waste liquid filtration means for filtering the processing waste liquid supplied from the waste liquid storage tank;
a first flow path for supplying the processing waste liquid filtered by the waste liquid filtration means to the processing device;
ion exchange means for removing ions from the processing waste liquid filtered by the waste liquid filtration means to produce pure water;
a second flow path for supplying the pure water generated by the ion exchange means to the processing device,
The first flow path and the second flow path are different flow paths,
The processing device is a cutting device or a grinding device,
The processing waste liquid filtered by the waste liquid filtration means is supplied to the processing apparatus through the first flow path, and the pure water generated by the ion exchange means is supplied to the processing apparatus through the second flow path. A processing waste liquid treatment device characterized in that the processing waste liquid is supplied to the device . A processing waste liquid treatment device connected to a processing device that processes a workpiece, and processing processing waste liquid discharged from the processing device,
a waste liquid storage tank that stores the processing waste liquid;
waste liquid filtration means for filtering the processing waste liquid supplied from the waste liquid storage tank;
a first flow path for supplying the processing waste liquid filtered by the waste liquid filtration means to the processing device;
ion exchange means for removing ions from the processing waste liquid filtered by the waste liquid filtration means to produce pure water;
a second flow path for supplying the pure water generated by the ion exchange means to the processing device,
The processing device is a cutting device or a grinding device,
The processing waste liquid filtered by the waste liquid filtration means is supplied to the processing device via the first flow path as a processing liquid used for processing the workpiece,
Processing waste liquid treatment characterized in that the pure water generated by the ion exchange means is supplied to the processing device via the second flow path as a cleaning liquid used for cleaning the workpiece. Device. The processing according to claim 1 or 2, wherein the ion exchange means generates the pure water by removing ions from the processing waste liquid using an ion exchange resin, and also regenerates the ion exchange resin by electrodialysis. Waste liquid treatment equipment. The processing waste liquid treatment apparatus according to any one of claims 1 to 3, further comprising a temperature control means connected to the waste liquid storage tank and adjusting the temperature of the processing waste liquid supplied from the waste liquid storage tank. .

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