JP7423161B2 - チャックテーブル - Google Patents
チャックテーブル Download PDFInfo
- Publication number
- JP7423161B2 JP7423161B2 JP2020112340A JP2020112340A JP7423161B2 JP 7423161 B2 JP7423161 B2 JP 7423161B2 JP 2020112340 A JP2020112340 A JP 2020112340A JP 2020112340 A JP2020112340 A JP 2020112340A JP 7423161 B2 JP7423161 B2 JP 7423161B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- workpiece
- rubber
- chuck table
- cutting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
- B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
- B28D5/023—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels with a cutting blade mounted on a carriage
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25B—TOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
- B25B11/00—Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
- B25B11/005—Vacuum work holders
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
- B28D5/0094—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work the supporting or holding device being of the vacuum type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D7/00—Accessories specially adapted for use with machines or devices of the preceding groups
- B28D7/04—Accessories specially adapted for use with machines or devices of the preceding groups for supporting or holding work or conveying or discharging work
- B28D7/046—Accessories specially adapted for use with machines or devices of the preceding groups for supporting or holding work or conveying or discharging work the supporting or holding device being of the vacuum type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68757—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a coating or a hardness or a material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by supporting substrates others than wafers, e.g. chips
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68354—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to support diced chips prior to mounting
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Dicing (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Jigs For Machine Tools (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
4 :基台
4a :開口部
6 :テーブル移動機構
8 :テーブルカバー
10 :蛇腹状カバー
12 :テーブルベース
12a :上面
12b :流路
12c :ねじ穴
14 :チャックテーブル
16 :支持構造
18 :切削ユニット移動機構
20 :Y軸ガイドレール
22 :Y軸移動プレート
24 :ねじ軸
26 :Y軸パルスモーター
28 :Z軸ガイドレール
30 :Z軸移動プレート
32 :ねじ軸
34 :Z軸パルスモーター
36 :切削ユニット
38 :切削ブレード
40 :カメラ(撮像ユニット)
42 :枠体
42a :第1面(上面)
42b :第2面(下面)
42c :凹部
42d :吸引穴
42e :貫通穴
44 :第1層
44a :第1面(上面)
44b :第2面(下面)
44c :吸引穴
46 :第2層
46a :第1面(上面、保持面)
46b :第2面(下面)
46c :逃げ溝
46d :吸引穴
48 :ねじ
50 :バルブ
52 :吸引源
112 :テーブルベース
112a :上面
112b :流路
112c :ねじ穴
114 :チャックテーブル
142 :支持体
142a :第1面(上面)
142b :第2面(下面)
144 :第1層
144a :第1面(上面)
144b :第2面(下面)
144c :吸引穴
146 :第2層
146a :第1面(上面、保持面)
146b :第2面(下面)
146c :逃げ溝
146d :吸引穴
148 :固定枠
148a :開口部
148b :貫通穴
150 :ねじ
152 :バルブ
154 :吸引源
1 :チップ(パッケージデバイスチップ)
11 :被加工物
13 :基板
13a :第1面(表面)
13b :第2面(裏面)
15 :デバイス領域
17 :余剰領域
19 :分割予定ライン(ストリート)
21 :ステージ
23 :樹脂層
25 :電極
Claims (4)
- 被加工物を切削ブレードで切削する切削装置のテーブルベースに装着され、該被加工物を分割予定ラインで切削して複数のチップへと分割する際に該被加工物を保持するチャックテーブルであって、
動的粘弾性率が0.16以上0.8以下のゴムで構成された第1層と、
該被加工物に対する静止摩擦係数が1以上のゴムで構成され、該第1層に支持された第2層と、を含み、
該第2層は、
該被加工物を保持する際に該被加工物と接触する上部の保持面と、
該被加工物の該分割予定ラインに対応させて該保持面を区画するように設けられた逃げ溝の開口部と、
該保持面の該開口部で区画された領域に設けられた吸引穴と、を有することを特徴とするチャックテーブル。 - 該第1層の上面には、該第2層の下面が接触していることを特徴とする請求項1に記載のチャックテーブル。
- 該第1層を構成するゴムは、ウレタンゴム、ニトリルゴム、エチレンゴム、ブチルゴム、フッ素ゴム、シリコンゴム、イソプレンゴム、ブタジエンゴム、アクリルゴム、及び多硫化ゴムのいずれかであることを特徴とする請求項1又は請求項2に記載のチャックテーブル。
- 該第2層を構成するゴムは、クロロプレンゴムであることを特徴とする請求項1から請求項3のいずれかに記載のチャックテーブル。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020112340A JP7423161B2 (ja) | 2020-06-30 | 2020-06-30 | チャックテーブル |
KR1020210062818A KR20220002089A (ko) | 2020-06-30 | 2021-05-14 | 척 테이블 |
CN202110709939.5A CN113858457A (zh) | 2020-06-30 | 2021-06-25 | 卡盘工作台 |
TW110123491A TW202202295A (zh) | 2020-06-30 | 2021-06-28 | 吸盤 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020112340A JP7423161B2 (ja) | 2020-06-30 | 2020-06-30 | チャックテーブル |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2022011305A JP2022011305A (ja) | 2022-01-17 |
JP7423161B2 true JP7423161B2 (ja) | 2024-01-29 |
Family
ID=78989970
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020112340A Active JP7423161B2 (ja) | 2020-06-30 | 2020-06-30 | チャックテーブル |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP7423161B2 (ja) |
KR (1) | KR20220002089A (ja) |
CN (1) | CN113858457A (ja) |
TW (1) | TW202202295A (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN116000354B (zh) * | 2023-02-27 | 2023-06-16 | 江苏永铭汇门窗科技有限公司 | 一种铝型材门窗加工用铣床结构 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009142992A (ja) | 2007-12-11 | 2009-07-02 | Disco Abrasive Syst Ltd | パッケージ基板の保持治具 |
JP2013198944A (ja) | 2012-03-23 | 2013-10-03 | Toshiba Corp | ダイシング装置及びダイシング方法 |
JP2016054256A (ja) | 2014-09-04 | 2016-04-14 | Towa株式会社 | 切断装置並びに吸着機構及びこれを用いる装置 |
JP2016143861A (ja) | 2015-02-05 | 2016-08-08 | Towa株式会社 | 切断装置及び切断方法 |
JP2018078253A (ja) | 2016-11-11 | 2018-05-17 | 株式会社ディスコ | パッケージ基板切断用治具テーブル |
-
2020
- 2020-06-30 JP JP2020112340A patent/JP7423161B2/ja active Active
-
2021
- 2021-05-14 KR KR1020210062818A patent/KR20220002089A/ko active Pending
- 2021-06-25 CN CN202110709939.5A patent/CN113858457A/zh active Pending
- 2021-06-28 TW TW110123491A patent/TW202202295A/zh unknown
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009142992A (ja) | 2007-12-11 | 2009-07-02 | Disco Abrasive Syst Ltd | パッケージ基板の保持治具 |
JP2013198944A (ja) | 2012-03-23 | 2013-10-03 | Toshiba Corp | ダイシング装置及びダイシング方法 |
JP2016054256A (ja) | 2014-09-04 | 2016-04-14 | Towa株式会社 | 切断装置並びに吸着機構及びこれを用いる装置 |
JP2016143861A (ja) | 2015-02-05 | 2016-08-08 | Towa株式会社 | 切断装置及び切断方法 |
JP2018078253A (ja) | 2016-11-11 | 2018-05-17 | 株式会社ディスコ | パッケージ基板切断用治具テーブル |
Also Published As
Publication number | Publication date |
---|---|
TW202202295A (zh) | 2022-01-16 |
JP2022011305A (ja) | 2022-01-17 |
CN113858457A (zh) | 2021-12-31 |
KR20220002089A (ko) | 2022-01-06 |
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