JP7167434B2 - Fluidic device, reservoir supply system and channel supply system - Google Patents

Description

TECHNICAL FIELD The present invention relates to a fluidic device, a reservoir supply system and a flow path supply system.

In recent years, the development of μ-TAS (Micro-Total Analysis Systems) aimed at increasing the speed, efficiency, and integration of tests in the field of in-vitro diagnostics, and the miniaturization of examination equipment has attracted attention. Active research is underway worldwide.

μ-TAS is superior to conventional inspection instruments in that it can measure and analyze a small amount of sample, is portable, and is disposable at low cost.
Furthermore, it is attracting attention as a highly useful method when using expensive reagents or when testing a large number of samples in small quantities.

A device comprising a channel and a pump arranged on the channel has been reported as a component of μ-TAS (Non-Patent Document 1). In such a device, multiple solutions are injected into the channel and the pump is operated to mix the multiple solutions within the channel.

Further, Patent Document 1 discloses a structure in which a septum is provided at a supply port of a tank of a microdevice for fluid control. However, in this structure, since the solution can move freely within the tank in which the septum is provided, there is a possibility that the fluid may leak from the septum.

WO 93/020351

Jong Wook Hong, Vincent Studer, Giao Hang, W French Anderson and Stephen R Quake, Nature Biotechnology 22, 435 - 439 (2004)

According to a first embodiment, a fluidic device capable of accommodating a liquid therein includes a septum into which a hollow needle for injecting the liquid is pierced, and a first through hole that accommodates the septum. a substrate, a second substrate laminated with the first substrate to form a flow path on the contact surface, and a reservoir capable of containing the liquid formed on the contact surface by being laminated with the second substrate. a third substrate, wherein the second substrate has a second through hole that connects the first through hole and one end of the reservoir in the stacking direction and allows the hollow needle to be arranged therein; a supply hole connecting the other end of the reservoir and one end of the flow path in the stacking direction and capable of introducing the liquid into the flow path is formed ; The septum is provided with a concave portion into which the convex portion is fitted, and the convex portion has a first stepped surface facing one side in the stacking direction and a second stepped surface facing the other side in the stacking direction. The septum has a first opposing surface facing the other side in the stacking direction and a second opposing surface facing the one side in the stacking direction as the inner side surfaces of the recess. The first opposing surface is opposed to and in contact with the stacking direction, the second stepped surface and the second opposed surface are opposed to and in contact with each other in the stacking direction, and the septum and the first substrate are: A fluidic device is provided that is an integrally molded compact .

According to a second embodiment, a reservoir delivery system comprising the fluidic device of the first embodiment and a syringe for injecting said solution into said reservoir, said syringe having a hollow needle penetrating said septum. is provided.

According to a third embodiment, the fluidic device of the first embodiment, a hollow needle that penetrates the septum and releases the reservoir to atmospheric pressure, and a negative pressure applying device that creates a negative pressure in the flow path. and moving the solution prefilled in the reservoir from the reservoir to the flow path.

According to a fourth embodiment, it comprises the fluidic device of the first embodiment, a hollow needle that penetrates the septum, and a positive pressure applying device that applies positive pressure to the reservoir via the hollow needle. A channel supply system is provided for moving said solution pre-filled in said reservoir from said reservoir to said channel.

FIG. 1 is a front view of a fluidic device according to one embodiment. FIG. 2 is a plan view schematically showing the fluidic device of one embodiment. FIG. 3 is a cross-sectional view taken along line III--III in FIG. 4 is a cross-sectional view taken along line IV-IV in FIG. 2. FIG. FIG. 5A is a partial cross-sectional view of a fluidic device with a septum of Modification 1 that can be employed in the embodiment; FIG. 5B is a partial cross-sectional view of a fluidic device with a septum of Modification 2 that can be employed in the embodiment; FIG. 6 is a cross-sectional schematic diagram of a reservoir supply system of one embodiment. FIG. 7 is a schematic cross-sectional view of a flow channel supply system according to one embodiment. FIG. 8 is a schematic cross-sectional view of a channel supply system of a modification.

Embodiments of a fluidic device, a reservoir supply system, and a channel supply system will be described below with reference to the drawings. In addition, in the drawings used in the following explanation, in order to make the features easier to understand, the characteristic parts may be enlarged for convenience, and the dimensional ratio of each component may not necessarily be the same as the actual one. can't

(Fluid device)
FIG. 1 is a front view of a fluidic device 1 of one embodiment. FIG. 2 is a plan view schematically showing the fluidic device 1. FIG. In FIG. 2, the transparent upper plate 6 is illustrated in a state in which each part arranged on the lower side is transparent.

The fluidic device 1 of this embodiment includes a device that detects a sample substance, which is a detection target contained in a specimen sample, by an immune reaction, an enzymatic reaction, or the like. Sample substances are, for example, biomolecules such as nucleic acids, DNA, RNA, peptides, proteins and extracellular endoplasmic reticulum.

As shown in FIG. 2, the fluidic device 1 includes a substrate 5, a septum (elastic plug member) 3, and a plurality of valves V, Vi, and Vo.

As shown in FIG. 1 , the base material 5 has an upper plate (first substrate) 6 , a lower plate (third substrate) 8 and a substrate (second substrate) 9 . The upper plate 6, the lower plate 8 and the substrate 9 of this embodiment are made of a resin material. Examples of the resin material forming the upper plate 6, the lower plate 8, and the substrate 9 include polypropylene, polycarbonate, and the like. Also, in this embodiment, the upper plate 6 and the lower plate 8 are made of a transparent material. In addition, the materials forming the upper plate 6, the lower plate 8 and the substrate 9 are not limited.

In the following description, an upper plate (e.g., lid, top or bottom of channel, top or bottom of channel) 6, bottom plate (e.g., lid, top or bottom of channel, top or bottom of channel) It is assumed that the bottom surface 8 and the substrate 9 are arranged along a horizontal plane, the upper plate 6 is arranged above the substrate 9 and the lower plate 8 is arranged below the substrate 9 . However, this defines the horizontal direction and the vertical direction only for convenience of explanation, and does not limit the orientation of the fluidic device 1 according to the present embodiment when it is used.

The upper plate 6, the substrate 9 and the lower plate 8 are plate members extending in the horizontal direction. The upper plate 6, the substrate 9 and the lower plate 8 are laminated in this order along the vertical direction. The substrate 9 is laminated to the upper plate 6 on the lower side of the upper plate 6 . In addition, the lower plate 8 is laminated on the substrate 9 on the surface opposite to the upper plate 6 (lower surface 9a). The base material 5 is manufactured by joining and integrating the upper plate 6, the lower plate 8 and the substrate 9 by joining means such as adhesion.
In the following description, the direction in which the upper plate 6, the substrate 9 and the lower plate 8 are laminated is simply referred to as the lamination direction. In this embodiment, the stacking direction is the vertical direction.

As shown in FIG. 1 , the top plate 6 is provided with a plurality of first through holes (through holes) 37 , air holes 35 , and a plurality of valve holding holes 34 . The first through hole 37, the air hole 35 and the valve holding hole 34 penetrate the upper plate 6 in the plate thickness direction.

The first through-hole 37 is located directly above the second through-hole 38 of the substrate 9 and is connected to the second through-hole 38, as will be described later. That is, the first through-holes 37 and the second through-holes 38 overlap each other when viewed from the stacking direction. The first through hole 37 and the second through hole 38 constitute the injection hole 32 . The first through hole 37 constitutes the opening of the injection hole 32 . That is, the upper plate 6 has an opening of the injection hole 32 .

The air hole 35 is positioned directly above the waste liquid tank 7 in the upper plate 6 . The air hole 35 connects the waste liquid tank 7 to the outside. A suction device (negative pressure applying device) 56 can be connected to the air hole 35 as will be described later.

The valve holding holes 34 hold the valves V, Vi and Vo. The valves V, Vi, and Vo are configured to be able to close the channel 11 provided between the upper plate 6 and the substrate 9 .

FIG. 3 is a cross-sectional view of the fluidic device 1 along line III-III in FIG.
As shown in FIG. 3, the substrate 9 has an upper surface 9b and a lower surface 9a. The upper plate 6 is positioned on the upper surface 9 b side of the substrate 9 . The lower plate 8 is positioned on the lower surface 9a side of the substrate 9 .

The substrate 9 includes a reservoir layer 19A on the lower surface 9a side. A plurality of reservoirs 29 are provided in the reservoir layer 19A. The substrate 9 also includes a reaction layer 19B on the upper surface 9b side. A channel 11 and a waste liquid tank 7 are provided in the reaction layer 19B.

As shown in FIG. 2, at least part of the channel 11 and at least part of the reservoir 29 are arranged so as to overlap each other when viewed from the stacking direction. According to this embodiment, by arranging the channel 11 and the reservoir 29 respectively on the upper surface 9b side and the lower surface 9a side of the substrate 9, the channel 11 and the reservoir 29 can be arranged to overlap each other when viewed from the stacking direction. . Thereby, the fluidic device 1 can be miniaturized.

The substrate 9 is provided with a supply hole 39 and a second through hole 38 penetrating vertically.
The supply hole 39 connects the reservoir 29 and the channel 11 . A solution stored in the reservoir 29 is supplied to the channel 11 through the supply hole 39 .

FIG. 4 is a cross-sectional view of fluidic device 1 taken along line IV-IV in FIG.
The second through hole 38 is connected to the first through hole 37 of the top plate 6 to form the injection hole 32 . The injection hole 32 connects the reservoir 29 to the outside. The solution fills reservoir 29 through injection hole 32 .

The septum 3 is fixed in the first through hole 37 . The septum 3 blocks the opening of the injection hole 32 . The septum 3 is constructed from an elastic material. Examples of elastic materials that can be used for the septum 3 include rubber and elastomer resin. The base material 5 and the septum 3 are made of different materials and integrally formed. Also, the upper plate 6 and the septum 3 are a molded body integrally molded by two-color molding, injection molding, insert molding, or the like.
As described above, the upper plate 6 is integrally provided with the valves V, Vi, and Vo in addition to the septum 3 . The septum 3 and the valves V, Vi and Vo may be made of the same material. In this case, the upper plate 6, the septum 3 and the valves V, Vi and Vo can be integrally molded by two-color molding using two kinds of resin materials.

The septum 3 can be called an elastic plug member. The inner peripheral surface of the hole of the septum 3 formed by penetrating the hollow needle is airtightly attached to the outer peripheral surface of the hollow needle due to the elastic deformation of the septum 3 . Thereby, the solution can be injected into the reservoir 29 through the hollow portion of the hollow needle. Further, the septum 3 hermetically closes the hole through which the hollow needle is inserted by removing the hollow needle. Therefore, even if the fluidic device 1 is turned upside down after injecting the solution into the reservoir 29 , the solution will not leak from the opening of the injection hole 32 . In particular, the reservoir 29 of this embodiment is channel-shaped. Therefore, by interposing air bubbles between the septum 3 and the solution, the solution does not reach the septum 3 side, and the solution can be held in the reservoir 29 more stably.

According to this embodiment, the hole of the septum 3 is closed by removing the hollow needle after introducing the solution into the reservoir 29, so that the reservoir 29 can be sealed. Since the reservoir 29 holds the solution has a channel shape, the solution does not move within the reservoir 29 by sealing the reservoir 29 . Therefore, leakage of the solution from the reservoir 29 can be effectively suppressed. Such an effect is an effect that can be exhibited when the reservoir 29 has a channel shape.

According to this embodiment, a hole is provided by inserting a hollow needle through the septum 3 . The pressure resistance of the septum 3 provided with a hole can be appropriately set by a combination of the diameter and thickness of the septum 3 and the outer diameter of the hollow needle that penetrates the septum 3 to form the hole in the septum 3 . Therefore, the septum 3 can function as a pressure valve that opens and closes due to the pressure difference between the inside and outside of the fluidic device 1 . For example, the septum 3 can also function as a leak valve when it is desired to keep the pressure in the reservoir 29 at a constant negative pressure or positive pressure using a negative pressure applying device or a positive pressure applying device.
Moreover, the pressure resistance of the plurality of septa 3 provided in the fluidic device 1 may be different from each other. Each septum 3 covers the opening of an injection hole 32 leading to a different reservoir 29 . When the pressure resistance of a plurality of septums 3 is made different, the following configuration can be realized in the channel supply system described later. That is, in a state in which a plurality of reservoirs 29 are filled with the solution, the pressure in the reservoirs 29 is gradually lowered from the channel 11 side, so that air flows into the reservoirs 29 from different holes of the septum 3. You can have different timings. As a result, the solutions can be sequentially introduced from the plurality of reservoirs 29 into the channel 11 without opening and closing valves.

The septum 3 is circular when viewed from the stacking direction. The outline of the septum 3 matches the first through hole 37 . That is, the first through-holes 37 are circular when viewed from the stacking direction.
The diameter d of the septum 3 is preferably 1.5 mm or more. By setting the diameter d of the septum 3 to 1.5 mm or more, the two-color molding of the septum 3 for the first through hole 37 can be facilitated.

The dimension (thickness) t of the septum 3 in the stacking direction is set according to the pressure resistance required for the septum 3 and the diameter of the hollow needle that penetrates the septum 3 and forms a hole in the septum 3 . The diameter d of each septum 3 having a different dimension t in the stacking direction, which will be described below, is 1.5 mm or more.
When the dimension t of the septum 3 in the stacking direction is 1.0 mm or more, a pressure resistance of 100 kPa or more can be ensured when the outer diameter of the hollow needle is 0.46 mm (26 G (gauge)) or less. is 0.41 mm (27 G (gauge)) or less, a pressure resistance of 200 kPa or more can be ensured.
Further, when the dimension t of the septum 3 in the stacking direction is 1.5 mm or more, a pressure resistance of 200 kPa or more can be ensured when the outer diameter of the hollow needle is 0.46 mm (26 G (gauge)) or less.
It should be noted that these withstand voltage designs are derived from evaluation experiments conducted by the inventors of the present invention.

FIG. 5A is a partial cross-sectional view of a fluidic device 101 having a septum 103 of Modification 1 that can be employed in this embodiment. In addition, the same code|symbol is attached|subjected about the component of the same aspect as the above-mentioned embodiment, and the description is abbreviate|omitted.

A fluidic device 101 of this modification includes a substrate 105 and a septum 103 . The substrate 105 has an upper plate 106, a substrate 9 and a lower plate 8 (omitted in FIG. 5A). The upper plate 106 is provided with a first through hole (through hole) 137 that holds the septum 103 . The first through hole 137 is connected to the second through hole 38 provided in the substrate 9 . The first through hole 137 and the second through hole 38 constitute the injection hole 132 . Also, the first through hole 137 constitutes the opening of the injection hole 132 . The injection hole 132 connects the reservoir 29 (not shown in FIG. 5A) to the outside.

The first through hole 137 has a circular shape when viewed from the stacking direction. The inner peripheral surface of the first through-hole 137 is provided with a convex portion 137 a protruding toward the inside of the first through-hole 137 . The upper end of the projection 137 a is arranged below the upper end of the first through hole 137 . Also, the lower end of the projection 137 a coincides with the lower end of the first through hole 137 . The convex portion 137 a is provided along the entire circumference of the inner peripheral surface of the first through hole 137 . The protrusion height of the protrusion 137a is uniform along the circumferential direction. Therefore, the shape of the first through hole 137 inside the protrusion 137a is circular when viewed from the stacking direction.

The septum 103 is fixed to the inner peripheral surface of the first through hole 137 . The septum 103 is provided with a concave portion 103a into which the convex portion 137a is fitted. As in the above-described embodiments, the septum 103 and the upper plate 106 are a molded body integrally molded by two-color molding, injection molding, or insert molding. As an example, by molding the septum 103 in the first through-hole 137 of the upper plate 106 after molding the upper plate 106 , the septum 103 is formed with the concave portion 103 a that fits the convex portion of the convex portion 137 a.

The convex portion 137a of the first through hole 137 has a step surface 137b facing upward. On the other hand, the septum 103 has a facing surface 103b that forms a recess 103a and faces downward. The step surface 137b and the opposing surface 103b are opposed to each other in the stacking direction and are in contact with each other. Therefore, the step surface 137b can prevent the septum 103 from moving downward. That is, according to this modification, the protrusion 137a fits into the recess 103a, so that the stepped surface 137b restricts the downward movement of the septum 103 and functions as a retainer for the septum 103. FIG.

FIG. 5B is a partial cross-sectional view of a fluidic device 201 having a septum 203 of Modification 2, which can be employed in this embodiment. In addition, the same code|symbol is attached|subjected about the component of the same aspect as the above-mentioned embodiment, and the description is abbreviate|omitted.

A fluidic device 201 of this modification includes a substrate 205 and a septum 203 . The substrate 205 has a top plate 206, a substrate 9 and a bottom plate 8 (omitted in FIG. 5B). The upper plate 206 is provided with a first through hole (through hole) 237 that holds the septum 203 . The first through hole 237 is connected to the second through hole 38 provided in the substrate 9 . The first through hole 237 and the second through hole 38 constitute the injection hole 232 . Also, the first through hole 237 constitutes the opening of the injection hole 232 . The injection hole 232 connects the reservoir 29 (omitted in FIG. 5B) to the outside.

The inner peripheral surface of the first through-hole 237 is provided with a convex portion 237 a that protrudes toward the inside of the first through-hole 237 . The upper end of the projection 237 a is arranged below the upper end of the first through hole 237 . Also, the lower end of the projection 237 a is arranged above the lower end of the first through hole 237 . Further, the septum 203 is provided with a concave portion 203a into which the convex portion 237a is fitted.

The convex portion 237a of the first through hole 237 has a first step surface 237b facing upward and a second step surface 237c facing downward. On the other hand, the septum 203 has a first facing surface 203b facing downward and a second facing surface 203c facing upward. The first step surface 237b and the first opposing surface 203b face each other in the stacking direction and are in contact with each other. Similarly, the second step surface 237c and the second opposing surface 203c face each other in the stacking direction and are in contact with each other. Therefore, the first stepped surface 237b and the second stepped surface 237c restrict the septum 203 from moving in the vertical direction. That is, according to this modification, the convex portion 237a fits into the concave portion 203a, so that the first step surface 237b and the second step surface 237c restrict the movement of the septum 203 in the vertical direction, thereby preventing the septum 203 from coming off. Function.

Returning to the description of the fluidic device 1 of the present embodiment.
As shown in FIG. 3, the bottom surface 9a of the substrate 9 is provided with a plurality of grooves 21. As shown in FIG. The groove portion 21 can also be expressed as a linear depression. The bottom surfaces of the plurality of grooves 21 are located on substantially the same plane. That is, the depths of the plurality of grooves 21 are substantially the same. The width of the groove 21 in the longitudinal direction is substantially uniform. Moreover, the widths of the plurality of grooves 21 are substantially the same.

The opening of the groove 21 facing downward is covered with the lower plate 8 . A reservoir 29 is formed in a space surrounded by the groove portion 21 and the lower plate 8 . The reservoir 29 is thus located between the substrate 9 and the bottom plate 8 .

The reservoir 29 is a tubular or cylindrical space surrounded by the inner wall surface of the groove 21 provided on the lower surface 9 a of the substrate 9 and the lower plate 8 . A plurality of (more specifically, three) reservoirs 29 are provided in the base material 5 of the present embodiment.
In this embodiment, the case where the groove 21 is provided in the substrate 9 and the opening of the groove 21 is covered with the lower plate 8 to configure the reservoir 29 has been described. However, the reservoir 29 may be configured by covering the opening of the groove provided in the lower plate 8 with the substrate 9 .

A plurality of reservoirs 29 contain solutions independently of each other. The reservoir 29 supplies the contained solution to the channel 11 . The reservoir 29 is a channel type reservoir. Therefore, the length of the reservoir 29 in the direction in which the solution flows toward the channel 11 is greater than the width perpendicular to the length. In addition, it is preferable that the length of the reservoir 29 in the direction in which the solution flows toward the channel 11 is greater than the depth perpendicular to the length and width. Furthermore, the width of the reservoir 29 is preferably such that bubbles do not move past the solution.

In this embodiment, the widths of the plurality of reservoirs 29 are substantially the same, eg, 1.5 mm. Also, the depths of the plurality of reservoirs 29 are substantially the same, for example, 1.5 mm. The cross-sectional shape of the plurality of reservoirs 29 is, for example, a rectangular shape. The volume of each reservoir 29 is set according to the capacity of the solution to be accommodated. For example, the length of each reservoir 29 is set according to the capacity of the solution to be accommodated.

The width and depth of the reservoir 29 are examples, and are preferably 0.01 mm to 10 mm or less, and more preferably 0.1 mm to 5 mm or less. In order to prevent the liquid injected through the septum from moving freely within the reservoir 29, considering the relationship between capillary force and surface tension, the liquid may be arbitrarily selected according to the size of the fluidic device (such as a microfluidic device) 1. Can be set.
Moreover, in the present embodiment, the configuration in which the plurality of reservoirs 29 have the same width and the same depth was exemplified, but the configuration is not limited to this. The width and depth of the plurality of reservoirs may be set to different values depending on, for example, the flow characteristics of the solution they contain. For example, when a solution is introduced into a channel by collective negative pressure suction from multiple reservoirs, the flow characteristics (flow resistance, etc.) of the solution must be adjusted for each reservoir so that different types of solutions are introduced into the channel at the same timing. The width and depth may be set according to the

As shown in FIG. 2, the reservoir 29 is formed in a meandering shape in which linear depressions extend in a predetermined direction while being folded left and right. The reservoir 29 includes a plurality of (five in FIG. 4) first linear portions 29a arranged in parallel in a predetermined direction (horizontal direction in FIG. 4) and connection points between the ends of the adjacent first linear portions 29a. are alternately connected to one end side and the other end side of the first straight line portion 29a. Note that the reservoir 29 is not limited to a meandering shape, and may be, for example, a linear flow path.

As shown in FIG. 3, the upper surface 9b of the substrate 9 is provided with a plurality of grooves 14. As shown in FIG. The groove portion 14 can also be expressed as a linear depression. The upper plate 6 covers the opening of the groove 14 facing upward. A space surrounded by the groove portion 14 and the upper plate 6 forms the channel 11 . Channel 11 is thus located between substrate 9 and top plate 6 .
In this embodiment, the channel 11 is formed by providing the groove 14 in the substrate 9 and covering the opening of the groove 14 with the upper plate 6 . However, the channel 11 may be configured by covering the opening of the groove provided in the upper plate 6 with the substrate 9 .

As shown in FIG. 2, the flow path 11 includes a circulation flow path 10, a plurality of (three in the example of FIG. 2) introduction flow paths 12, and a plurality of (three in the example of FIG. 2) discharge flow paths 13. and including. A solution is introduced into the channel 11 from a reservoir 29 .

The circulation flow path 10 is configured in a loop shape when viewed from the stacking direction. A plurality of (three in the example of FIG. 2) metering valves V are provided in the circulation channel 10 . A plurality of metering valves V partition the circulation channel 10 into a plurality of metering sections 18 . A plurality of metering valves V are arranged so that each of the sections separated by the metering valves has a predetermined volume.

The introduction channel 12 is a channel for introducing the solution into the quantitative section 18 of the circulation channel 10 . The introduction channel 12 is provided for each quantitative section 18 of the circulation channel 10 . The introduction channel 12 is connected to the supply hole 39 on one end side. Also, the introduction channel 12 is connected to the circulation channel 10 on the other end side. The introduction channel 12 is connected to the circulation channel 10 in the vicinity of the metering valve V of the metering section 18 .

The introduction channel 12 and the reservoir 29 partially overlap each other when viewed in the stacking direction, and are connected via a supply hole 39 arranged in the overlapped portion. That is, the supply hole 39 is located at the portion where the flow path 11 and the reservoir 29 overlap when viewed from the stacking direction, and extends in the stacking direction. Thereby, the channel 11 and the reservoir 29 arranged on different surfaces of the substrate 9 can be connected with the shortest distance. As a result, the pressure loss when the solution is introduced from the reservoir 29 to the channel 11 is reduced, and the solution can be efficiently and quickly introduced from the reservoir 29 to the channel 11 .

The discharge channel 13 is a channel for discharging the solution in the quantitative section 18 of the circulation channel 10 to the waste liquid tank 7 . A discharge channel 13 is provided for each quantitative section 18 of the circulation channel 10 . The discharge channel 13 is connected to the waste liquid tank 7 at one end side. Also, the discharge channel 13 is connected to the circulation channel 10 on the other end side. The discharge channel 13 is connected to the circulation channel 10 in the vicinity of the metering valve V of the metering section 18 . The quantitative section 18 is connected to the introduction channel 12 at one end in the length direction, and is connected to the discharge channel 13 at the other end.

An introduction valve Vi is arranged in the path of the introduction channel 12 . Similarly, a waste liquid valve Vo is arranged in the path of the discharge channel 13 . Here, the structures of the introduction valve Vi, the waste liquid valve Vo and the metering valve V will be described with reference to FIG. Here, the introduction valve Vi will be described as a representative of other valves, but the other valves (waste liquid valve Vo and metering valve V) also have the same structure.

The introduction valve Vi is fixed in the valve holding hole 34 of the upper plate 6 . The introduction valve Vi is constructed from an elastic material. Examples of elastic materials that can be used for the introduction valve Vi include rubber and elastomer resin. The upper plate 6 and the introduction valve Vi are integrally formed of different materials. Also, the upper plate 6 and the introduction valve Vi are molded bodies integrally molded by two-color molding, insert molding, injection molding, or the like.

A hemispherical depression 40 is provided in the channel 11 immediately below the introduction valve Vi. The introduction valve Vi closes the flow path 11 by elastically deforming downward and coming into contact with the recess 40 . Also, the introduction valve Vi opens the channel 11 by separating from the recess 40 .

A waste liquid tank 7 is provided for discarding the solution in the channel 11 . As shown in FIG. 2 , the waste liquid tank 7 is arranged inside the circulation channel 10 . As a result, the size of the fluidic device 1 can be reduced. Further, as shown in FIG. 3, the waste liquid tank 7 is configured in a space surrounded by the inner wall surface of the recess 7a provided on the upper surface 9b side of the substrate 9 and the upper plate 6 covering the upward opening of the recess 7a. be done. The waste liquid tank 7 is opened to the outside through an air hole 35 provided in the upper plate 6 .

(reservoir supply system)
Next, the reservoir supply system 2 for filling the reservoir 29 of the fluidic device 1 with the solution S from the syringe 50 will be described with reference to FIG.
FIG. 6 is a schematic cross-sectional view of the reservoir supply system 2. As shown in FIG. In FIG. 6, the supply hole 39, reservoir 29, channel 11 and waste liquid tank 7 of the fluidic device 1 are shown in series.

The reservoir supply system 2 includes the fluidic device 1 described above and a syringe 50 for injecting the solution S into the reservoir 29 of the fluidic device 1 .

The syringe 50 has a syringe body 51 and a first hollow needle (hollow needle) 52 attached to the syringe body 51 . A solution S is stored inside the syringe main body 51 . The first hollow needle 52 is a so-called injection needle. Inside the first hollow needle 52, a hollow portion is provided that extends in the length direction and is open at both ends.

The syringe 50 pierces the septum 3 with the first hollow needle 52 , penetrates the septum 3 , and positions the tip of the first hollow needle 52 in the reservoir 29 . As a result, the septum 3 is formed with a hole 3h through which the first hollow needle 52 passes. The inner peripheral surface of the hole 3h is in airtight contact with the outer peripheral surface of the first hollow needle 52 due to the elastic deformation of the septum 3. As shown in FIG. In this state, the solution S in the syringe body 51 is delivered to the reservoir 29 . At this time, the valves V, Vi and Vo in the flow path 11 are opened (not shown in FIG. 6). Also, the air hole 35 opening to the waste liquid tank 7 is open to the outside. Thereby, the reservoir 29 communicates with the outside through the supply hole 39 , the flow path 11 , the waste liquid tank 7 and the air hole 35 . By delivering the solution S from the syringe 50 to the reservoir 29 , the air in the reservoir 29 is pushed out to the supply hole 39 side, and the reservoir 29 is filled with the solution S.

Next, the first hollow needle 52 is pulled out from the septum 3 . The hole 3 h provided in the septum 3 is airtightly closed due to the elasticity of the septum 3 . Therefore, leakage of the solution S in the reservoir 29 from the septum 3 can be suppressed. In addition, since the reservoir 29 has a channel shape, the septum 3 closes the injection hole 32, and when the solution S in the reservoir 29 tries to flow toward the supply hole 39, the region between the reservoir 29 and the septum 3 becomes negative pressure. Therefore, the solution S is suppressed from flowing to the supply hole 39 side.

The first hollow needle 52 may be removed from the septum 3 and the air hole 35 may be closed with the film 33 . That is, the fluidic device 1 may have a film 33, as illustrated by a phantom line (two-dot chain line) in FIG. In this case, the supply hole 39, the flow path 11, the waste liquid tank 7, and the air hole 35 are sealed, and the flow of the solution S from the reservoir 29 to the supply hole 39 side can be suppressed more effectively.
Further, when closing the air hole 35 with the film 33 , the air pressure in the flow path 11 and the waste liquid tank 7 may be increased, and the first hollow needle 52 may be pierced again into the septum 3 to feed air into the injection hole 32 . As a result, when the air pressure between the solution S in the reservoir 29 and the septum 3 is increased, and the film 33 is peeled off, the solution S automatically flows to the channel 11 side.

According to the fluidic device 1 of this embodiment, the solution S can be stably held in the plurality of reservoirs 29 . Therefore, with the reservoir 29 filled with the solution S, the fluidic device 1 can be distributed to a place where the solution S is mixed and reacted (for example, an inspection institution, a hospital, a home, a vehicle, etc.). .

According to the fluidic device 1 and the reservoir supply system 2 of the present embodiment, the reservoir 29 can be easily filled with the solution S and sealed by inserting the first hollow needle 52 into and out of the septum 3 . In addition, the septum 3 can insert and remove the first hollow needle 52 multiple times. Therefore, it is also possible to additionally inject the solution S into the reservoir 29 .

In this embodiment, the channel 11 is positioned between the upper plate 6 and the substrate 9 and the reservoir 29 is positioned between the substrate 9 and the lower plate 8 . However, at least one of channel 11 and reservoir 29 may be positioned between top plate 6 and substrate 9 . Moreover, at least one of the flow path 11 and the reservoir 29 may be positioned between the substrate 9 and the lower plate 8 .

According to this embodiment, the first through-hole 37 in which the septum 3 is arranged is formed in the upper plate 6, and the flow path 11 and the reservoir 29 are located on the joint surfaces of different plate members, respectively, thereby forming a fluidic device. can be reduced in size on the plane. In addition, since the septum 3, the channel 11, and the reservoir 29 are on different layers, the solution contained in the reservoir 29 flows back and reaches the septum 3, causing the solution to leak out of the fluidic device. It is possible to prevent unexpected movement of the solution to the channel 11 . For example, when the entire fluidic device 1 is sealed, the solution may move under the influence of compressed air accompanying sealing, but this configuration can reduce the risk of liquid leakage. In particular, when the reservoir 29 is positioned between the substrate 9 and the lower plate 8 , a second through hole having a length corresponding to the thickness of the substrate 9 extends from the septum 3 positioned on the upper plate 6 to the reservoir 29 . Because of the presence of 38, the solution contained within reservoir 29 is less likely to flow backwards to reach septum 3 and cause solution leakage out of the fluidic device.
In addition, since the reservoir 29 is located between the substrate 9 and the lower plate 8, the first hollow needle 52 can be inserted all the way when injecting the solution. It becomes possible to inject the

(Flow path supply system)
Next, the channel supply system 4 for supplying the solution S from the reservoir 29 to the channel 11 in the fluidic device 1 will be described with reference to FIG.
FIG. 7 is a schematic cross-sectional view of the channel supply system 4. As shown in FIG. In FIG. 7, the supply hole 39, the reservoir 29, the channel 11 and the waste liquid tank 7 of the fluidic device 1 are shown in series.

The flow path supply system 4 includes the fluidic device 1 , a second hollow needle (hollow needle) 55 and a suction device (negative pressure applying device) 56 .

As shown in FIG. 7, the suction device 56 is connected to the air holes 35 of the fluidic device 1 . The suction device 56 creates a negative pressure in the flow path 11 through the air hole 35 .

Inside the second hollow needle 55 , similarly to the first hollow needle 52 , hollow portions extending in the longitudinal direction and opening at both ends are provided. A second hollow needle 55 is pierced through the septum 3 . A second hollow needle 55 penetrates the septum 3 and opens the reservoir 29 to atmospheric pressure.

The channel supply system 4 moves the solution S prefilled in the reservoir 29 from the reservoir 29 to the channel 11 . More specifically, the channel supply system 4 sequentially introduces the solution S from the reservoir 29 into each quantitative section 18 of the circulation channel 10 . Here, the procedure for introducing the solution S into one quantification section 18 will be described, but the solution S is also introduced into the other quantification sections 18 by performing the same procedure.

The opening and closing of the valves V, Vi, and Vo when introducing the solution S into the quantification section 18 will be described with reference to FIG. First, a pair of metering valves V positioned on both sides in the length direction of the metering section 18 into which the solution S is introduced is closed. Further, the waste liquid valve Vo of the discharge channel 13 connected to the corresponding quantitative section 18 is opened, and the waste liquid valve Vo of the other discharge channel 13 is closed. Also, the introduction valve Vi of the introduction channel 12 connected to the corresponding quantitative section 18 is opened.

Next, the suction device 56 is used to suction the inside of the waste liquid tank 7 through the air hole 35 under negative pressure. As a result, the solution S in the reservoir 29 moves to the channel 11 side through the supply hole 39 . Also, the air that has passed through the second hollow needle 55 is introduced to the rear of the solution S in the reservoir 29 . As a result, the channel supply system 4 introduces the solution S contained in the reservoir 29 into the quantitative section 18 of the circulation channel 10 via the supply hole 39 and the introduction channel 12 .

(Modified example of channel supply system)
Next, a modification of the channel supply system 104 will be described with reference to FIG. In addition, the same code|symbol is attached|subjected about the component of the same aspect as the above-mentioned embodiment, and the description is abbreviate|omitted.
FIG. 8 is a schematic cross-sectional view of the channel supply system 104 of this modification. In FIG. 8, the supply hole 39, the reservoir 29, the channel 11 and the waste liquid tank 7 of the fluidic device 1 are shown in series.

Similar to the above-described embodiments, the channel supply system 104 moves the solution S prefilled in the reservoir 29 from the reservoir 29 to the channel 11 . More specifically, the channel supply system 104 sequentially introduces the solution S from the reservoir 29 into each metering section 18 of the circulation channel 10 .

The flow path supply system 104 includes the fluidic device 1 , the second hollow needle 55 and the positive pressure applying device 156 .

A second hollow needle 55 is pierced through the septum 3 . That is, the second hollow needle 55 penetrates the septum 3 . A positive pressure applicator 156 is connected to the second hollow needle 55 . A positive pressure applying device 156 applies positive pressure to the reservoir 29 via the second hollow needle 55 . Further, in the channel supply system 104 of this modified example, the air hole 35 opening to the waste liquid tank 7 is open to the outside.

As in the above-described embodiment, first, a pair of metering valves V positioned on both sides in the length direction of the metering section 18 into which the solution S is introduced is closed. Further, the waste liquid valve Vo of the discharge channel 13 connected to the corresponding quantitative section 18 is opened, and the waste liquid valve Vo of the other discharge channel 13 is closed. Also, the introduction valve Vi of the introduction channel 12 connected to the corresponding quantitative section 18 is opened.

A positive pressure applying device 156 applies positive pressure to the reservoir 29 via the second hollow needle 55 . As a result, the solution S in the reservoir 29 moves to the channel 11 side through the supply hole 39 . Also, the air in the flow path 11 and the waste liquid tank 7 is exhausted to the outside through the air hole 35 . As a result, the channel supply system 104 introduces the solution S contained in the reservoir 29 into the quantitative section 18 of the circulation channel 10 via the supply hole 39 and the introduction channel 12 .

(solution mixing system)
Next, a solution mixing system that mixes the solutions supplied to the channels of the fluidic device 1 will be described with reference to FIG. The solution mixing system has a fluidic device 1 and a controller (not shown) that controls a pump (not shown) that circulates the solution in the channel 11 of the fluidic device 1 .

First, the waste liquid valve Vo and the introduction valve Vi are closed and the metering valve V is opened while the solution is introduced into each metering section 18 of the circulation channel 10 as described above. Further, a pump (not shown) is used to feed and circulate the solution in the circulation channel 10 . The solution circulating in the circulation channel 10 has a low flow velocity around the wall surface and a high flow velocity at the center of the flow channel due to the interaction (friction) between the flow channel wall surface and the solution in the flow channel. As a result, the flow rate of the solution is distributed, thereby promoting the mixing and reaction of the solution.

Various embodiments of the present invention have been described above, but each configuration and combination thereof in each embodiment are examples, and addition, omission, replacement, and Other changes are possible. Moreover, the present invention is not limited by the embodiments.

Reference Signs List 1, 101, 201 Fluid device 2 Reservoir supply system 3, 103, 203 Septum 4, 104 Flow path supply system 5, 105, 205 Substrate 6 Top plate (first substrate ), 103a, 203a... concave part, 8... lower plate (third substrate), 9... substrate (second substrate), 11... channel, 29... reservoir, 32, 132, 232... injection hole, 37, 137 , 237... First through hole (through hole), 38... Second through hole, 39... Supply hole, 50... Syringe, 52... First hollow needle (hollow needle), 55... Second hollow needle ( Hollow needle), 56... Suction device (negative pressure applying device), 137a, 237a... Convex portion, 156... Positive pressure applying device, S... Solution

Claims (8)

A fluidic device capable of containing liquid therein,
a septum into which the hollow needle for injecting the liquid is pierced;
a first substrate having a first through hole that accommodates the septum;
a second substrate laminated with the first substrate to form a flow path on the contact surface;
a third substrate laminated with the second substrate to form a reservoir capable of containing the liquid on a contact surface;
The second substrate has
a second through hole that connects the first through hole and one end of the reservoir in the stacking direction and allows the hollow needle to be arranged therein;
a supply hole connecting the other end of the reservoir and one end of the channel in the stacking direction and capable of introducing the liquid into the channel ;
The inner peripheral surface of the first through hole is provided with a convex portion protruding inward,
The septum is provided with a concave portion in which the convex portion fits,
The convex portion has a first stepped surface facing one side in the stacking direction and a second stepped surface facing the other side in the stacking direction,
The septum has a first opposing surface facing the other side in the stacking direction and a second opposing surface facing the one side in the stacking direction as inner surfaces of the recess,
the first stepped surface and the first opposing surface face each other in the stacking direction and are in contact with each other;
the second step surface and the second opposing surface face each other in the stacking direction and are in contact with each other;
wherein the septum and the first substrate are integrally molded bodies;
fluidic device. 2. The fluidic device according to claim 1 , wherein one end of said channel and the other end of said reservoir overlap when viewed from the lamination direction of said first substrate, said second substrate and said third substrate. the reservoir is serpentine-shaped;
3. The fluidic device according to claim 1 or 2 . The size of the width of the reservoir is such that air bubbles do not move past the liquid.
A fluidic device according to any one of claims 1 to 3 . The fluidic device according to any one of claims 1 to 4 , wherein the septum and the first substrate are made of different materials and integrally constructed. a fluidic device according to any one of claims 1 to 5 ;
a syringe for injecting the liquid into the reservoir;
A reservoir delivery system, wherein the syringe has a hollow needle penetrating the septum. a fluidic device according to any one of claims 1 to 5 ;
a hollow needle penetrating the septum to open the reservoir to atmospheric pressure;
a negative pressure applying device that creates a negative pressure in the flow path,
moving the liquid prefilled in the reservoir from the reservoir to the channel;
Fluid supply system. a fluidic device according to any one of claims 1 to 5 ;
a hollow needle penetrating the septum;
a positive pressure applying device that applies positive pressure to the reservoir via the hollow needle;
moving the liquid prefilled in the reservoir from the reservoir to the channel;
Fluid supply system.

Images