JP7060244B2 - A light source for an exposure device, an exposure device using the light source, and an exposure method for a resist. - Google Patents

Description

The present invention relates to, for example, a light source for a multi-lamp type exposure apparatus used in an exposure apparatus such as a semiconductor substrate.

Conventionally, a light source using a plurality of discharge lamps has been used in an exposure apparatus (for example, Patent Document 1).

In the light source according to Patent Document 1, the amount of mercury enclosed is different in the plurality of discharge lamps used. As a result, the wavelength region of the light emitted from the light source can be changed.

Japanese Unexamined Patent Publication No. 2008-191252

Generally, as shown in FIG. 21, the wavelength of light emitted from a mercury lamp has a plurality of peak wavelengths and a minimum spectral intensity (hereinafter referred to as “baseline”) in a predetermined wavelength range. There is.

However, in order to perform accurate exposure, it is desirable to perform exposure with light having only a wavelength corresponding to the characteristics of the resist to be exposed, and a peak wavelength that does not contribute to the exposure of the target resist becomes unnecessary. For example, in a specific resist, the peaks on the long wavelength side (405 nm and 436 nm) in FIG. 21 are unnecessary because they have no resist sensitivity.

For the same reason, light below the baseline that extends over a predetermined wavelength range is also unnecessary.

As described above, the conventional light source for exposure using a discharge lamp irradiates light having a peak wavelength that does not contribute to the exposure of the resist and uses wasteful energy. In addition, the predetermined wavelength is used. Even though the light below the baseline that spreads over the range does not contribute much to the exposure, the energy itself given to the resist is large, so that the resist that received the large energy may be peeled off.

The present invention has been made in view of the above-mentioned problems, and an object thereof is to be able to pinpoint light of a required wavelength according to the characteristics of a resist, and to reduce the amount of light below the baseline. A light source for an exposure apparatus that can be kept to a minimum and can appropriately change the wavelength of the emitted light when exposing another resist having different characteristics, an exposure apparatus using the same, and an exposure apparatus. The purpose is to provide a method for controlling a light source.

According to one aspect of the invention
In a light source for an exposure apparatus including a plurality of light source units that irradiate single-wavelength light and a light source unit holder that holds the plurality of the light source units.
There are at least two types of single-wavelength light emitted from the plurality of light source units.
The light source unit that irradiates one type of the single wavelength light is arranged on the center side of the light source unit holder.
The light source unit that irradiates the other type of the single wavelength light is arranged on the outer peripheral side of the light source unit holder, which is opposite to the light source unit that irradiates the one type of the single wavelength light .
The irradiation intensity of the light to be irradiated changes between the first exposure time and the second exposure time in one continuous exposure period.
A light source for an exposure apparatus is provided.
Further, according to another aspect of the present invention.
In a light source for an exposure apparatus including a plurality of light source units that irradiate single-wavelength light and a light source unit holder that holds the plurality of the light source units.
There are at least two types of single-wavelength light emitted from the plurality of light source units.
The light source unit that irradiates one type of the single wavelength light is arranged on the center side of the light source unit holder.
The light source unit that irradiates the other type of the single wavelength light is arranged on the outer peripheral side of the light source unit holder, which is opposite to the light source unit that irradiates the one type of the single wavelength light.
The balance of the irradiation intensity of each single wavelength light changes depending on the first exposure time and the second exposure time in one continuous exposure period.
A light source for an exposure apparatus is provided.

Preferably, the irradiation intensity of the light to be irradiated changes between the first exposure time and the second exposure time in one continuous exposure period.

Preferably, the balance of the irradiation intensity of each single wavelength light changes depending on the first exposure time and the second exposure time in one continuous exposure period.

Preferably, one continuous exposure period is divided into at least a first exposure time, a second exposure time, and a third exposure time.

Preferably, the balance of the irradiation intensity of each single wavelength light is adjusted by adjusting at least one of the number of the light source units irradiating the single wavelength light and the irradiation intensity of the light from the light source units. It is being carried out.

Preferably, each of the light source units has a discrimination member for determining a genuine product.

Preferably, the discriminating member is an incandescent lamp.

Preferably, the irradiation intensity of the light emitted from the plurality of light source units is at least two kinds.

According to other aspects of the invention
An exposure apparatus including the exposure light source is provided.

According to another aspect of the invention
Equipped with multiple light source units that irradiate single wavelength light,
There are at least two types of single-wavelength light emitted from the plurality of light source units.
The low-sensitivity light source unit that irradiates the single-wavelength light while the light-receiving sensitivity of the resist to be exposed is low is arranged on the center side or the outer peripheral side of the light source unit holder that holds the plurality of the light source units.
The exposure device in which the high-sensitivity light source unit that irradiates the other single-wavelength light having high light-receiving sensitivity is arranged on the outer peripheral side or the center side of the light source unit holder, as opposed to the low-sensitivity light source unit. Using a light source for
The resist is exposed by changing the irradiation intensity of the light to be irradiated between the first exposure time and the second exposure time in one continuous exposure period.
A method of exposing the resist is provided.
Further, according to yet another aspect of the present invention,
Equipped with multiple light source units that irradiate single wavelength light,
There are at least two types of single-wavelength light emitted from the plurality of light source units.
The low-sensitivity light source unit that irradiates the single-wavelength light while the light-receiving sensitivity of the resist to be exposed is low is arranged on the center side or the outer peripheral side of the light source unit holder that holds the plurality of the light source units.
The exposure device in which the high-sensitivity light source unit that irradiates the other single-wavelength light having high light-receiving sensitivity is arranged on the outer peripheral side or the center side of the light source unit holder, as opposed to the low-sensitivity light source unit. Using a light source for
The resist is exposed by changing the balance of the irradiation intensity of each single wavelength light between the first exposure time and the second exposure time in one continuous exposure period.
A method of exposing the resist is provided.

According to the present invention, light of a required wavelength can be radiated pinpointly according to the characteristics of the resist, the amount of light below the baseline can be minimized, and the characteristics are different. It was possible to provide a light source for an exposure apparatus capable of appropriately changing the wavelength of the emitted light when exposing the resist, an exposure apparatus using the same, and a control method for a light source for the exposure apparatus.

It is a figure which shows the exposure apparatus 10 which concerns on embodiment. It is a lighting circuit diagram of the light source 100 for an exposure apparatus which concerns on embodiment. It is sectional drawing of the light source unit 102 which concerns on embodiment. It is a front view of the light source unit 102 which concerns on embodiment. It is a perspective view of the light source 112 which concerns on embodiment. It is sectional drawing of the light source 112 which concerns on embodiment. It is a figure which shows an example of a light emitting diode 126. It is a figure which shows an example of a light source unit holder 104. It is a figure which shows an example of the change of the irradiation intensity of light in the continuous exposure time. It is a figure which shows an example of the change of the irradiation intensity of light in the continuous exposure time. It is a figure which shows an example of the change of the irradiation intensity of light in the continuous exposure time. It is a figure which shows an example of the change of the irradiation intensity of light in the continuous exposure time. It is a figure which shows an example of the change of the irradiation intensity of light in the continuous exposure time. It is a figure which shows an example of the change of the balance of the irradiation intensity of each single wavelength light in the continuous exposure time. It is a figure which shows an example of the change of the balance of the irradiation intensity of each single wavelength light in the continuous exposure time. It is a front view which shows the light source unit 102 which concerns on modification 1. FIG. It is a perspective view which shows the light source unit 102 which concerns on modification 1. FIG. 16 is a cross-sectional view taken along the line AA in FIG. 16 is a cross-sectional view taken along the line BB in FIG. 16 is a cross-sectional view taken along the line CC in FIG. It is a figure which shows the spectroscopic characteristic of the light which generally irradiates from a mercury lamp, and the sensitivity characteristic of a specific resist.

(Structure of exposure apparatus 10)
Hereinafter, the present invention will be described with reference to the drawings. FIG. 1 is a diagram showing an outline of an exposure apparatus 10 in which a light source 100 for an exposure apparatus according to the present invention is incorporated. Here, the exposure apparatus 10 is for exposing an exposure object X (in this embodiment, a resist X formed on an insulating plate P which is a base of a printed wiring board will be described as an example thereof). There are a light source 100 for an exposure device, a support base 12 that supports an object X to be exposed, and an optical system 14 that guides the light emitted from the light source 100 for an exposure device to be emitted from directly above the support base 12 as parallel light. It is roughly composed of a lighting device 16 that controls lighting of the light source 100 for an exposure device.

Hereinafter, the members and the like other than the light source 100 for the exposure apparatus will be described first, and then the light source 100 for the exposure apparatus will be described in detail.

The support base 12 supports the exposure object X, and a previously known configuration can be appropriately adopted.

The optical system 14 is for guiding the light emitted from the exposure device light source 100 to be emitted from directly above the support base 12 as parallel light having uniform illuminance, and the light emitted from the exposure device light source 100. Integrator lens 20 that equalizes the illuminance of the lens 20 (As a specific example of the integrator lens 20, for example, a lens called a fly-eye lens or a rod lens is known, and in this embodiment, a fly-eye lens is adopted). An exposure that controls the opening and closing of the irradiation light path of the light (in the present embodiment, the light having a uniform illuminance after passing through the integrator lens 20) radiated from the light source 100 for an exposure device, which is arranged on the front side of the integrator lens 20. It is roughly composed of a control shutter 22 and an exposure reflector 24 that refracts the irradiation light path of uniform light that has passed through the exposure control shutter 22.

The configuration of the optical system 14 shown here is an example thereof, and is not limited to the configuration of the present embodiment. For example, the light emitted from the light source 100 for the exposure apparatus may be refracted by the exposure reflector 24 and then entered into the integrator lens 20, and the configuration may be appropriately adjusted according to the target optical path. It is possible to change.

The lighting device 16 is a device for selectively lighting the light source 100 for the exposure device according to the exposure conditions, and as shown in the lighting circuit diagram of FIG. 2, the electric power connected to each light source 100 for the exposure device. The supply line 30 is connected to the lighting device 16. The lighting device 16 is controlled to be turned on and off by the control device 40, whereby the light source 100 for each exposure device can be selectively turned on according to the exposure target X. The light source 100 for each exposure device and the lighting device 16 are connected via a connector (not shown), and the light source 100 for each exposure device and the lighting device 16 can be easily and electrically attached to and detached from the connector portion. It has become like.

(Structure of light source 100 for exposure apparatus)
Next, an example of the structure of the light source 100 for an exposure apparatus will be described. As shown in FIG. 1, the light source 100 for an exposure apparatus is roughly composed of a plurality of light source units 102 and a light source unit holder 104. The light source unit holder 104 is not an essential component in the present invention. Therefore, each light source unit 102 may be fixed at a predetermined position without providing the light source unit holder 104.

As shown in FIGS. 3 and 4, each light source unit 102 is roughly composed of a bowl-shaped reflector 110 and a light source 112.

The reflecting mirror 110 has a reflecting surface 114 formed inside the reflecting surface 114, an opening 116 that emits light reflected by the reflecting surface 114, and a substantially cylindrical shape provided in the center of the bottom of the reflecting surface 114 at a position facing the opening 116. It has a central mounting cylinder portion 118 in the shape of a shape. Further, a straight line passing through the center of the reflecting mirror 110 and orthogonal to the opening 116 is defined as the central axis C of the reflecting mirror 110 (and the reflecting surface 114).

As the material of the reflecting mirror 110, glass, aluminum, or the like is used. In the case of aluminum, metal vapor deposition is performed on the reflecting surface 114, and in the case of glass, in addition to metal vapor deposition, the reflecting surface 114 of the multilayer film is inside the bowl-shaped portion. It is formed on the surface (that is, the surface on which the reflective surface 114 is formed).

In particular, in the light source unit 102, since the heat from the light emitting diode 126 (described later) constituting the light source 112 is efficiently dissipated by the support column 124 (described later), a resin or the like that is more sensitive to heat than glass or aluminum may be used. It can be used as a material for the reflector 110.

In the present embodiment, the front cover 120 made of polycarbonate that covers the opening 116 of the reflector 110 is attached, but the front cover 120 is not an essential component of the light source unit 102. Further, if it is a transparent material, another material such as glass can be used as the material of the front cover 120.

The reflecting surface 114 is defined by a rotating surface centered on the central axis C described above, and a focal point F is set on the central axis C inside the reflecting mirror 110. The position of the focal point F is set to an optimum position based on factors such as the size and number of the light emitting diodes 126 in the light source 112 housed inside the reflector 110. For example, when the light emitting diode 126 is large or the number of light emitting diodes 126 is large, the position of the focal point F is set at a slight distance from the bottom of the reflecting surface 114, and conversely, the light emitting diode 126 is small or emits light. When the number of diodes 126 is small, the position of the focal point F is set closer to the bottom of the reflecting surface 114. When the rotating surface defining the reflecting surface 114 is a spheroidal surface or a rotating parabola, the focal point of the ellipse or parabola defining these is the focal point F of the reflecting surface 114.

The light source 112 is composed of four light emitters 122 and a support column 124 that holds them in a predetermined position with reference to FIG. 5 in addition to FIGS. 3 and 4. The number of light emitting bodies 122 is not limited to four, and the effect of the present invention can be achieved by using two or more light emitting bodies 122.

As shown in FIG. 6, the light emitting body 122 includes a light emitting diode 126, a lens 128, and a lens holding member 130. The four light emitters 122 used in the present embodiment rotate around the focal point F of the reflecting surface 114 at the tip of a substantially square columnar column 124 extending from the bottom of the reflecting surface 114 along the central axis C. They are arranged radially at equal intervals in the direction.

As shown in FIG. 7, the light emitting diode 126 is composed of a plurality of light emitting diode elements 132. In this embodiment, nine light emitting diode elements 132 are arranged in a grid pattern to form one light emitting diode 126. The number of light emitting diode elements 132 constituting the light emitting diode 126 is not limited to this, and one light emitting diode 126 may be configured by one or more light emitting diode elements 132.

The light emitting diode element 132 is an electronic component that emits light of a specific wavelength at a light emission angle of, for example, 120 ° (the light emission angle θ is of course not limited to this) by passing a predetermined current. In the present embodiment, the plurality of light emitting diode elements 132 constituting one light emitting diode 126 all emit light having the same wavelength. Further, the plurality of light emitting diodes 126 constituting one light source unit 102 are all adapted to emit light having the same wavelength. Further, there are at least two kinds of wavelengths of light emitted from each light source unit 102.

Of course, the wavelength is not limited to this, and the wavelengths of the light emitted from the plurality of light emitting diodes 126 constituting one light source unit 102 may be different from each other. Furthermore, the wavelengths of the light emitted from the plurality of light emitting diode elements 132 constituting one light emitting diode 126 may be different from each other.

Further, as for the wavelength of the light emitted from each light emitting diode 126, light of any wavelength such as ultraviolet light, visible light, or infrared light may be combined.

Returning to FIGS. 3 and 6, the lens 128 has a convex meniscus lens (substantially strip-shaped cross section) made of polycarbonate arranged so as to face the light emitting diode 126 between the light emitting diode 126 and the reflecting surface 114. This lens is a lens in which one surface is convex and the other surface is concave), and is an optical component that refracts the light emitted from the light emitting diode 126 toward the reflecting surface 114. Of course, the material of the lens 128 is not limited to polycarbonate, and a material such as glass can be used. Further, the lens 128 is not an essential component of the present invention, and the lens 128 may not be provided.

The lens holding member 130 is an annular body made of a metal, an opaque resin, a translucent resin, or the like, and has one end attached to the surface of the support column 124 so as to surround the light emitting diode 126. The lens 128 is fitted to the other end (or may be integrally formed with the lens 128). When the lens holding member 130 is made of metal or opaque resin, all the light emitted from the light emitting diode 126 is emitted through the lens 128. Further, when the lens holding member 130 is made of a translucent resin, most of it is radiated through the lens 128, but a part of it is radiated through the lens holding member 130 made of translucent resin.

The column 124 is a square prism made of aluminum (for example, another material such as copper may be used as long as it is a material having high thermal conductivity) extending from the bottom of the reflecting surface 114 along the central axis C (for example, light emitting). If the number of bodies 122 is three, it is preferable to use a triangular prism material, and if it is five, it is preferable to use a pentagonal prism material.) They are arranged radially at equal intervals in the circumferential direction with the focal point F as the center.

As described above, since the support column 124 is made of aluminum having high thermal conductivity, the heat generated at the same time as the light emitting diode 126 emits light can be quickly received from the light emitting diode 126. That is, the support column 124 not only holds the light emitting diode 126 and the lens 128, but also serves as a heat radiating material for the light emitting diode 126. Further, the other end portion of the support column 124 is inserted into the central mounting cylinder portion 118 of the reflector 110 and then adhered to the reflector 110 with a silicon-based adhesive or the like (FIG. 3).

A feeding member 134 for supplying power to the light emitting diode 126 is arranged on each of the four side surfaces of the support column 124 (FIG. 6), and power is supplied to the light emitting diode 126 through the feeding member 134. There is. In the present embodiment, since the support column 124 is made of aluminum, it is necessary to insulate between the support column 124 and the feeding member 134. The power supply to the power feeding member 134 is performed from an external power source (not shown) via a lead wire (not shown). Further, the lead wire may be used to directly supply power to the light emitting diode 126.

As shown in FIG. 8, the light source unit holder 104 is a substantially rectangular parallelepiped member in which a plurality of recesses 136 to which a plurality of light source units 102 are attached are formed.

(Exposure to the exposure object X by the exposure apparatus 10)
When the lighting device 16 is activated, the light source 100 for the exposure device emits light, and the light emitted from the light source 100 for the exposure device is emitted toward the front. The light emitted from the light source 100 for an exposure apparatus passes through the integrator lens 20 to become light having a uniform illuminance. The exposure control shutter 22 is opened when a predetermined time has elapsed from the activation of the lighting device 16 and it is estimated that the amount of emitted light has reached a predetermined value. Then, when this uniform light passes through the exposure control shutter 22, the optical path is bent toward the support base 12 by the exposure reflector 24, and the exposure object X placed on the support base 12 is exposed from directly above the optical path. Parallel light is emitted through the mask on which the circuit pattern is formed. When the exposure is completed, the exposure control shutter 22 is closed, and the exposed object X under the mask is replaced with the unprocessed object. Here, by controlling the opening / closing time of the exposure control shutter 22, the exposure time of the exposure object X is appropriately adjusted.

(Characteristics of the light source 100 for an exposure apparatus according to this embodiment)
As described above, in the light source 100 for the exposure apparatus according to the present embodiment, the light emitting diode 126 is used as the light source 112 of the light source unit 102. Further, among the plurality of light source units 102, some of the light source units 102 can be irradiated with one single wavelength light so that the light source 100 for the exposure device can be irradiated with at least two types of single wavelength light. A light emitting diode 126 is used, and a light emitting diode 126 capable of irradiating another single wavelength light is used for the light source unit 102 of another part.

The light emitting diode 126 can irradiate a single wavelength light specialized for a specific wavelength pinpointly as compared with a discharge lamp. As a result, according to the light source 100 for an exposure apparatus according to the present embodiment, it is possible to irradiate at least two kinds of wavelengths suitable for the sensitivity characteristics of the resist used for the exposure object X, and the discharge lamp. In this case, the amount of light below the baseline can be minimized, so that wasteful energy is not used for exposure, and the possibility that the resist that has received a large amount of energy is peeled off can be minimized.

(Modification 1 regarding exposure to the exposure object X by the exposure apparatus 10)
Generally, when the exposure object X is exposed, the irradiation intensity of the light emitted from the light source 100 for the exposure apparatus is kept constant during the exposure time. Instead, as shown in FIG. 9, the continuous exposure time is divided into, for example, two (“first exposure time” and “second exposure time”), and these first exposure time and second exposure time are used. The irradiation intensity of the light emitted from the light source 100 for the exposure apparatus may be changed.

For example, FIG. 9 shows an example in which the irradiation intensity is strong in the first exposure time and the irradiation intensity is weaker in the second exposure time. Of course, as shown in FIG. 10, the irradiation intensity may be weaker in the first exposure time and stronger than this in the second exposure time. Further, as shown in FIG. 11, the irradiation intensity may be gradually increased in the first exposure time, and the irradiation intensity may be constant in the second exposure time. Furthermore, the continuous exposure time may be divided into three or more. For example, as shown in FIG. 12, the irradiation intensity is gradually increased in the first exposure time, and the irradiation intensity is kept constant in the second exposure time. The irradiation intensity may be gradually reduced in the third exposure time. Further, as shown in FIG. 13, in the first exposure time, the irradiation intensity is rapidly increased, in the second exposure time, the irradiation intensity is first sharply dropped and then kept constant, and in the third exposure time, the irradiation intensity is first. It may be rapidly increased to and then gradually decreased in a quadratic function.

(Modification 2 regarding exposure to the exposure object X by the exposure apparatus 10)
Further, for example, the continuous exposure time is divided into two, and the balance of the irradiation intensity of each single wavelength light emitted from the light source 100 for the exposure apparatus is changed between the first exposure time and the second exposure time. May be good. For example, in FIG. 14, the balance of the irradiation intensities of four types of single wavelengths (302 nm, 313 nm, 334 nm, and 365 nm) emitted from the light source 100 for an exposure apparatus is “365 nm> 313 nm> 334 nm> 302 nm”. The first exposure time is shown. This is changed to "302 nm> 313 nm> 334 nm = 365 nm" in the second exposure time shown in FIG. Of course, also in the case of this modification 2, the continuous exposure time may be divided into three or more.

(Modification 3 regarding exposure to the exposure object X by the exposure apparatus 10)
Further, not only the single wavelength of the light emitted from each light source unit 102 may be selected according to the sensitivity characteristic of the resist, but also the spectral intensity of each single wavelength light emitted from the light source 100 for the exposure apparatus may be adjusted. .. The spectral intensity of each single-wavelength light may be adjusted by, for example, the number of light source units 102 that irradiate the single-wavelength light, or the irradiation intensity of light from each light source unit 102 may be adjusted. Of course, these adjustment methods may be combined, or the spectral intensity of each single wavelength light may be adjusted by using other means.

(Variation Example 4 Regarding Exposure to Exposure Object X by Exposure Device 10)
Further, paying attention to the relationship between each single wavelength light and the light receiving sensitivity of the exposed resist, for example, a low-sensitivity light source unit 102 that irradiates single-wavelength light having a low light receiving sensitivity of the resist is arranged on the center side of the light source unit holder 104. However, the high-sensitivity light source unit 102 that irradiates single-wavelength light having high light-receiving sensitivity may be arranged on the outer peripheral side of the light source unit holder 104, as opposed to the low-sensitivity light source unit 102.

On the contrary, a low-sensitivity light source unit 102 that irradiates a single-wavelength light having a low light-receiving sensitivity of the resist is arranged on the outer peripheral side of the light source unit holder 104, and a high-sensitivity light source that irradiates a single-wavelength light having a high light-receiving sensitivity. The unit 102 may be arranged on the center side of the light source unit holder 104.

Generally, the light emitted from the light source unit 102 arranged on the outer peripheral side of the light source unit holder 104 becomes stray light in which a part of the light deviates from the exposure object X and does not contribute to the exposure. By utilizing such a feature, the high-sensitivity light source unit 102 is arranged on the outer peripheral side of the light source unit 102, and conversely, the low-sensitivity light source unit 102 is arranged on the outer peripheral side of the light source unit 102. The exposure speed of the resist can be adjusted.

(Other variants 1)
In the light source unit 102 in the above-described embodiment, the case where the light source 112 is used in combination with the reflecting mirror 110 has been described, but instead of the reflecting mirror 110, another lens (second lens 140) is shown as shown in FIGS. 16 to 20. ) May be used.

The light source unit 102 according to the embodiment of the first modification generally includes a main body 142, a light emitting body 122 described above, a heat sink 144, and a second lens 140.

The main body 142 is a prismatic cylindrical body having an internal space 146 from the top end to the bottom end. The material of the main body 142 is not particularly limited, but an opaque material that does not undesirably transmit light from the light emitting body 122 and that can conduct heat from the light emitting body 122 is preferable. be.

The light emitting body 122 is arranged at the bottom end portion in the internal space 146 of the main body 142, and is composed of a light emitting diode 126, a lens 128, and a lens holding member 130, as in the above-described embodiment. For the explanations thereof, the explanations in the above-described embodiments are incorporated. In the embodiment of the first modification, a biconvex lens is used as the lens 128, which has a role of parallelizing the light from the light emitting diode 126. Of course, the lens 128 is not limited to the biconvex lens, and may be a plano-convex lens, a Fresnel lens, or the like as long as it plays a role of satisfying the optimization and parallelization of the utilization efficiency of the light from the light emitter 122. You may. Further, when the accuracy of parallelization is further obtained, an aspherical lens may be used.

A front lens 127 for narrowing the light distribution angle of the light radiated from the light emitting diode 126 is arranged in the vicinity of the light emitting surface side of the light emitting diode 126 in the first modification. It does not have to be.

The heat sink 144 is attached so as to abut on the bottom surface of the above-mentioned light emitter 122 (the surface opposite to the surface on which the light emitting diode 126 is attached) at the bottom end portion of the internal space 146 of the main body 142, and emits light. It has a role of dissipating (dissipating) heat when the diode 126 is turned on. Therefore, it is preferable that the heat sink 144 is made of a material having high thermal conductivity.

The second lens 140 is a plano-convex lens arranged at the top end of the internal space 146 of the main body 142 apart from the light emitting body 122, and the lens 128 alone optimizes the utilization efficiency of the light from the light emitting body 122. And parallelization cannot be satisfied, it is further used to satisfy the optimization and parallelization of the utilization efficiency of the light. The second lens 140 is not limited to the biconvex lens, and may be a biconvex lens, a Fresnel lens, or the like. Further, as with the lens 128, an aspherical lens may be used when further parallelization accuracy is required.

Furthermore, if the optimization and parallelization of the utilization efficiency of the light from the light emitter 122 cannot be satisfied even if the second lens 140 is inserted, a third and fourth lenses (not shown) are added. May be good.

(Other modified examples 2)
In the above-described embodiment, an example in which the light emitting diode 126 is used as the light source 112 has been described, but the light emitting diode 126 is not limited as long as it can basically emit single-wavelength light, and for example, a laser is used. You may.

(Other variants 3)
Further, a discriminating member for determining whether or not the light source unit 102 is a genuine product may be added to each light source unit 102. As the discriminating member, for example, an IC chip or RFID into which predetermined information is input can be considered. Further, this discriminating member may be embedded in the light source unit 102, or may be mounted in a state of being separated from the reflecting mirror 110 and the light source 112 in the light source unit 102.

Further, an incandescent lamp may be used as the discrimination member. When determining whether it is a genuine product, a predetermined electric power is supplied to the incandescent lamp to turn on the incandescent lamp. Then, by measuring the voltage of the incandescent lamp during lighting, it is determined whether or not the light source unit 102 is a genuine product.

Specifically, after a predetermined time of supplying a constant current to the incandescent lamp (for example, about 10 seconds after the start of supply), the voltage across the incandescent lamp is measured. This measured voltage is compared with the voltage distribution range of a plurality of incandescent lamps for determining genuine products that have been measured and registered in advance. Then, if the measured voltage is within the registered voltage range, it is determined that the light source unit 102 to which the incandescent lamp is attached is a genuine product. On the contrary, if the measured voltage is out of the registered voltage range, the light source unit 102 to which the incandescent lamp is attached is determined to be a non-genuine product.

A determination method different from the determination method described above may be used. For example, the voltage across the incandescent lamp is measured immediately after the constant current supply to the incandescent lamp is started. Then, after a predetermined time (for example, about 10 seconds) after the first voltage measurement, the voltage across the incandescent lamp is measured again (second time). After that, whether or not the difference between the first measurement voltage and the second measurement voltage is within the voltage difference range of the two measurement voltages in a plurality of incandescent lamps for determining genuine products that have been measured and registered in advance. Check if. If it is within the registered voltage difference range, it is determined that the light source unit 102 to which the incandescent lamp is attached is a genuine product. On the contrary, if it is out of the registered voltage difference range, the light source unit 102 to which the incandescent lamp is attached is determined to be a non-genuine product.

(Other variants 4)
The light source unit 102 was designed to irradiate single-wavelength light, but as described above, instead of this, the light emitted from the plurality of light-emitting diode elements 132 constituting one light-emitting diode 126 is used. The light source 100 for an exposure device may be configured by using only one light source unit 102 by setting the wavelengths to different wavelengths.

(Other variants 5)
In order to reduce the illuminance unevenness and the exposure unevenness in the exposed object X, the irradiation intensity of the light from each of the plurality of light source units 102 may be adjusted and changed. For example, when the illuminance or the exposure intensity of the central portion of the irradiated surface of the exposed object X is large, it is conceivable to reduce the irradiation intensity of the light from the light source units 102 arranged in the central portion of the plurality of light source units 102. ..

It should be considered that the embodiments disclosed this time are exemplary in all respects and not restrictive. The scope of the present invention is shown by the scope of claims, not the description described above, and is intended to include all modifications within the meaning and scope equivalent to the scope of claims.

10 ... exposure device, 12 ... support base, 14 ... optical system, 16 ... lighting device 20 ... integrator lens, 22 ... exposure control shutter, 24 ... exposure reflector, 30 ... power supply line, 40 ... control device 100 ... Light source for exposure device, 102 ... Light source unit, 104 ... Light source unit holder 110 ... Reflector, 112 ... Light source, 114 ... Reflective surface, 116 ... Opening, 118 ... Central mounting cylinder, 120 ... Front cover, 122 ... Luminous body, 124 ... Support, 126 ... Light emitting diode, 127 ... Front lens, 128 ... Lens, 130 ... Lens holding member, 132 ... Light emitting diode element, 134 ... Feeding member, 136 ... Recess, 140 ... Second lens, 142 ... Main body, 144 ... Heat sink, 146 ... Internal space X ... Exposed object (resist), C ... Central axis (of reflector 110), P ... Insulation plate

Claims (10)

In a light source for an exposure apparatus including a plurality of light source units that irradiate single-wavelength light and a light source unit holder that holds the plurality of the light source units.
There are at least two types of single-wavelength light emitted from the plurality of light source units.
The light source unit that irradiates one type of the single wavelength light is arranged on the center side of the light source unit holder.
The light source unit that irradiates the other type of the single wavelength light is arranged on the outer peripheral side of the light source unit holder, which is opposite to the light source unit that irradiates the one type of the single wavelength light .
The irradiation intensity of the light to be irradiated changes between the first exposure time and the second exposure time in one continuous exposure period.
Light source for exposure equipment. In a light source for an exposure apparatus including a plurality of light source units that irradiate single-wavelength light and a light source unit holder that holds the plurality of the light source units.
There are at least two types of single-wavelength light emitted from the plurality of light source units.
The light source unit that irradiates one type of the single wavelength light is arranged on the center side of the light source unit holder.
The light source unit that irradiates the other type of the single wavelength light is arranged on the outer peripheral side of the light source unit holder, which is opposite to the light source unit that irradiates the one type of the single wavelength light .
The balance of the irradiation intensity of each single wavelength light changes depending on the first exposure time and the second exposure time in one continuous exposure period.
Light source for exposure equipment. The light source for an exposure apparatus according to claim 1 or 2 , wherein one continuous exposure period is divided into at least a first exposure time, a second exposure time, and a third exposure time. The balance of the irradiation intensity of each single wavelength light is carried out by adjusting at least one of the number of the light source units irradiating the single wavelength light and the irradiation intensity of the light from each light source unit. The light source for an exposure apparatus according to claim 2 . The light source for an exposure apparatus according to any one of claims 1 to 4 , wherein each light source unit has a discrimination member for determining a genuine product. The light source for an exposure apparatus according to claim 5 , wherein the discrimination member is an incandescent lamp. The light source for an exposure apparatus according to any one of claims 1 to 6 , wherein the irradiation intensity of the light emitted from the plurality of light source units is at least two types. An exposure apparatus including the light source for the exposure apparatus according to any one of claims 1 to 7 . Equipped with multiple light source units that irradiate single wavelength light,
There are at least two types of single-wavelength light emitted from the plurality of light source units.
The low-sensitivity light source unit that irradiates the single-wavelength light while the light-receiving sensitivity of the resist to be exposed is low is arranged on the center side or the outer peripheral side of the light source unit holder that holds the plurality of the light source units.
The exposure device in which the high-sensitivity light source unit that irradiates the other single-wavelength light having high light-receiving sensitivity is arranged on the outer peripheral side or the center side of the light source unit holder, as opposed to the low-sensitivity light source unit. Using a light source for
The resist is exposed by changing the irradiation intensity of the light to be irradiated between the first exposure time and the second exposure time in one continuous exposure period.
Resist exposure method. Equipped with multiple light source units that irradiate single wavelength light,
There are at least two types of single-wavelength light emitted from the plurality of light source units.
The low-sensitivity light source unit that irradiates the single-wavelength light while the light-receiving sensitivity of the resist to be exposed is low is arranged on the center side or the outer peripheral side of the light source unit holder that holds the plurality of the light source units.
The exposure device in which the high-sensitivity light source unit that irradiates the other single-wavelength light having high light-receiving sensitivity is arranged on the outer peripheral side or the center side of the light source unit holder, as opposed to the low-sensitivity light source unit. Using a light source for
The resist is exposed by changing the balance of the irradiation intensity of each single wavelength light between the first exposure time and the second exposure time in one continuous exposure period.
Resist exposure method.

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