JP6797021B2 - 被覆ガラス物品及びそれから作製されるディスプレイアセンブリ - Google Patents
被覆ガラス物品及びそれから作製されるディスプレイアセンブリ Download PDFInfo
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- JP6797021B2 JP6797021B2 JP2016548259A JP2016548259A JP6797021B2 JP 6797021 B2 JP6797021 B2 JP 6797021B2 JP 2016548259 A JP2016548259 A JP 2016548259A JP 2016548259 A JP2016548259 A JP 2016548259A JP 6797021 B2 JP6797021 B2 JP 6797021B2
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- coated glass
- glass article
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- glass
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- 239000011521 glass Substances 0.000 title claims description 135
- 238000000429 assembly Methods 0.000 title description 2
- 230000000712 assembly Effects 0.000 title description 2
- 239000011247 coating layer Substances 0.000 claims description 42
- 239000010410 layer Substances 0.000 claims description 38
- 239000000758 substrate Substances 0.000 claims description 30
- 238000000576 coating method Methods 0.000 claims description 27
- 239000011248 coating agent Substances 0.000 claims description 26
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 20
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 16
- 239000010936 titanium Substances 0.000 claims description 10
- 239000010955 niobium Substances 0.000 claims description 9
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 7
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 7
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 7
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims description 6
- 229910000423 chromium oxide Inorganic materials 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 229910000484 niobium oxide Inorganic materials 0.000 claims description 6
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 6
- 229910001887 tin oxide Inorganic materials 0.000 claims description 6
- 238000005229 chemical vapour deposition Methods 0.000 claims description 4
- 239000010408 film Substances 0.000 description 23
- 229910004298 SiO 2 Inorganic materials 0.000 description 18
- 239000007789 gas Substances 0.000 description 18
- 238000000034 method Methods 0.000 description 13
- 229910006404 SnO 2 Inorganic materials 0.000 description 11
- 239000000463 material Substances 0.000 description 10
- 239000002243 precursor Substances 0.000 description 10
- 239000000203 mixture Substances 0.000 description 8
- -1 phosphorus compound Chemical class 0.000 description 8
- 238000002834 transmittance Methods 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 6
- 238000000137 annealing Methods 0.000 description 6
- 239000005329 float glass Substances 0.000 description 6
- 229910010413 TiO 2 Inorganic materials 0.000 description 5
- 238000001816 cooling Methods 0.000 description 5
- 239000011651 chromium Substances 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- 238000001505 atmospheric-pressure chemical vapour deposition Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000005094 computer simulation Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000006060 molten glass Substances 0.000 description 3
- 229910052758 niobium Inorganic materials 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 238000006124 Pilkington process Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- YMLFYGFCXGNERH-UHFFFAOYSA-K butyltin trichloride Chemical compound CCCC[Sn](Cl)(Cl)Cl YMLFYGFCXGNERH-UHFFFAOYSA-K 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- PKKGKUDPKRTKLJ-UHFFFAOYSA-L dichloro(dimethyl)stannane Chemical compound C[Sn](C)(Cl)Cl PKKGKUDPKRTKLJ-UHFFFAOYSA-L 0.000 description 2
- 238000009501 film coating Methods 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910019926 CrOCl2 Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910019804 NbCl5 Inorganic materials 0.000 description 1
- 229910003074 TiCl4 Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 150000001845 chromium compounds Chemical class 0.000 description 1
- UOUJSJZBMCDAEU-UHFFFAOYSA-N chromium(3+);oxygen(2-) Chemical class [O-2].[O-2].[O-2].[Cr+3].[Cr+3] UOUJSJZBMCDAEU-UHFFFAOYSA-N 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000012809 cooling fluid Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005816 glass manufacturing process Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002822 niobium compounds Chemical class 0.000 description 1
- YHBDIEWMOMLKOO-UHFFFAOYSA-I pentachloroniobium Chemical compound Cl[Nb](Cl)(Cl)(Cl)Cl YHBDIEWMOMLKOO-UHFFFAOYSA-I 0.000 description 1
- 230000008447 perception Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- XUIMIQQOPSSXEZ-RNFDNDRNSA-N silicon-32 atom Chemical compound [32Si] XUIMIQQOPSSXEZ-RNFDNDRNSA-N 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
- G02B5/0825—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
- G02B5/0833—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
- C03C17/2453—Coating containing SnO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
- C03C17/2456—Coating containing TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/211—SnO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/212—TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/218—V2O5, Nb2O5, Ta2O5
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
- C03C2218/1525—Deposition methods from the vapour phase by cvd by atmospheric CVD
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N5/00—Details of television systems
- H04N5/64—Constructional details of receivers, e.g. cabinets or dust covers
Landscapes
- Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Description
ガラス基板の主要表面上に成膜される、好ましくは10nm〜30nmの厚さを有するシリコン酸化物の任意の基層、
シリコン酸化物の基層上に成膜される、好ましくは30nm〜40nmの厚さを有するチタン、ニオブ、またはクロム酸化物の第1の被覆層、
チタン、ニオブ、またはクロム酸化物の層上に成膜される、好ましくは70nm〜100nmの厚さを有するシリコン酸化物の第2の被覆層、ならびに
第2の被覆層上に成膜される、好ましくは60nm〜90nmの厚さを有する、スズ酸化物の第3の層。
P1 ガラス/15nm SiO2/32nm TiO2/90nm SiO2/75nm SnO2
P2 ガラス/35nm TiO2/90nm SiO2/75nm SnO2
P3 ガラス/15nm SiO2/35nm TiO2/90nm SiO2/75nm SnO2
P4 ガラス/15nmSiO2/35nm Nb2O5/90nm SiO2/75nm SnO2
P5 ガラス/35nm Cr2O3/90nm SiO2/75nm SnO2
P6 ガラス/15nm SiO2/35nm Cr2O3/90nm SiO2/75nm SnO2
P7 ガラス/15nm SiO2/35nm Cr2O3/90nm SiO2/75nm SnO2
P8 ガラス/35nm Nb2O5/90nm SiO2/75nm SnO2
P9 ガラス/15nm SiO2/35nm Nb2O5/90nm SiO2/75nm SnO2
実施例1 ガラス/15nm SiO2/32nm TiO2/90nm SiO2/75nm SnO2
実施例2〜13 ガラス/15nm SiO2/35nm TiO2/90nm SiO2/75nm SnO2
Claims (13)
- ガラス基板と、前記ガラス基板上に形成される被覆とを備える、被覆ガラス物品であって、前記被覆は、
任意に、前記ガラス基板の主要表面上に成膜されるシリコン酸化物の基層と、
前記任意の基層上に成膜されるチタン、ニオブ、またはクロム酸化物の第1の被覆層と、
前記第1の被覆層上に成膜されるシリコン酸化物の第2の被覆層と、
前記第2の被覆層上に成膜されるスズ酸化物の第3の被覆層とを含み、
前記被覆ガラス物品は、40%〜55%のTvis及び40%以上60%未満のRfを示す、前記被覆ガラス物品。 - 10nm〜30nmの厚さで成膜されるシリコン酸化物の前記基層を含む、請求項1に記載の前記被覆ガラス物品。
- 前記基層は、10nm〜30nmの厚さで成膜される、請求項2に記載の前記被覆ガラス物品。
- 前記第1の被覆層は、30nm〜40nmの厚さで成膜される、請求項1に記載の前記被覆ガラス物品。
- 前記第2の被覆層は、70nm〜100nmの厚さで成膜される、請求項1に記載の前記被覆ガラス物品。
- 前記第3の被覆層は、60nm〜90nmの厚さで成膜される、請求項1に記載の前記被覆ガラス物品。
- 前記被覆ガラス物品は、44%〜56%のRgを示す、請求項1に記載の前記被覆ガラス物品。
- 前記被覆ガラス物品は、CIELAB色座標系に従って、a*=+5〜12及びb*=−5〜+5の範囲内の透過色、a*=−12〜−8及びb*=−6〜+10の範囲内の反射フィルム面の色を示す、請求項1に記載の前記被覆ガラス物品。
- 前記被覆が前記シリコン酸化物の基層を含み、
前記基層と前記ガラス基板との間に成膜される色抑制被覆をさらに含む、請求項1に記載の前記被覆ガラス物品。 - 前記第1の被覆層は、2.1以上の屈折率を有し、前記第2の被覆層は、1.6以下の屈折率を有し、前記第3の被覆層は、1.6を超える屈折率を有する、請求項1に記載の前記被覆ガラス物品。
- 化学蒸着によって前記被覆の前記層のそれぞれを順次に成膜することを含む、請求項1に記載の被覆ガラス物品を作製する方法。
- 請求項1に記載の被覆ガラス物品の周囲に載置される骨組部材からなる、ビデオディスプレイアセンブリ。
- 請求項1に記載の被覆ガラス物品の後方にビデオディスプレイを載置して、前記ビデオディスプレイが動作中に、それが前記被覆ガラス物品を通して見えるようにし、かつ前記ビデオディスプレイが動作していないときに、それが前記被覆ガラス物品によって隠されるようにすることを含む、ビデオディスプレイアセンブリを作製する方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201461938290P | 2014-02-11 | 2014-02-11 | |
US61/938,290 | 2014-02-11 | ||
PCT/GB2015/050361 WO2015121632A1 (en) | 2014-02-11 | 2015-02-10 | Coated glass article and display assembly made therewith |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017509572A JP2017509572A (ja) | 2017-04-06 |
JP6797021B2 true JP6797021B2 (ja) | 2020-12-09 |
Family
ID=52589696
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016548259A Active JP6797021B2 (ja) | 2014-02-11 | 2015-02-10 | 被覆ガラス物品及びそれから作製されるディスプレイアセンブリ |
Country Status (7)
Country | Link |
---|---|
US (1) | US10151861B2 (ja) |
EP (1) | EP3105193B1 (ja) |
JP (1) | JP6797021B2 (ja) |
CN (1) | CN105980324B (ja) |
ES (1) | ES2824428T3 (ja) |
PL (1) | PL3105193T3 (ja) |
WO (1) | WO2015121632A1 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016075435A1 (en) * | 2014-11-12 | 2016-05-19 | Pilkington Group Limited | Coated glass article, display assembly made therewith and method of making a display assembly |
WO2016132131A1 (en) | 2015-02-19 | 2016-08-25 | Pilkington Group Limited | A chemical vapour deposition process for depositing an iron doped tin oxide coating and a coated glass article formed thereby |
JP2017211465A (ja) * | 2016-05-25 | 2017-11-30 | 三菱電機株式会社 | 液晶表示装置 |
US10556823B2 (en) | 2017-06-20 | 2020-02-11 | Apple Inc. | Interior coatings for glass structures in electronic devices |
WO2019043399A1 (en) * | 2017-08-31 | 2019-03-07 | Pilkington Group Limited | CHEMICAL VAPOR DEPOSITION PROCESS FOR FORMING SILICON OXIDE COATING |
WO2019169293A1 (en) * | 2018-03-02 | 2019-09-06 | Corning Incorporated | Anti-reflective coatings and articles and methods of forming the same |
CN113574024A (zh) * | 2019-03-14 | 2021-10-29 | 皮尔金顿集团有限公司 | 具有抗反射涂层的玻璃制品 |
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2015
- 2015-02-10 JP JP2016548259A patent/JP6797021B2/ja active Active
- 2015-02-10 WO PCT/GB2015/050361 patent/WO2015121632A1/en active Application Filing
- 2015-02-10 PL PL15706506T patent/PL3105193T3/pl unknown
- 2015-02-10 ES ES15706506T patent/ES2824428T3/es active Active
- 2015-02-10 CN CN201580005671.XA patent/CN105980324B/zh active Active
- 2015-02-10 US US14/999,973 patent/US10151861B2/en active Active
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US10151861B2 (en) | 2018-12-11 |
JP2017509572A (ja) | 2017-04-06 |
WO2015121632A1 (en) | 2015-08-20 |
PL3105193T3 (pl) | 2020-12-14 |
EP3105193A1 (en) | 2016-12-21 |
CN105980324B (zh) | 2020-01-17 |
EP3105193B1 (en) | 2020-08-12 |
ES2824428T3 (es) | 2021-05-12 |
US20170010393A1 (en) | 2017-01-12 |
CN105980324A (zh) | 2016-09-28 |
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