JP6756484B2 - 電圧非直線抵抗体 - Google Patents
電圧非直線抵抗体 Download PDFInfo
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Description
Nis/Nd≧0.57×10−5 …式(1)
Nis 2/Nd≧1.65×107 …式(2)
(式(1)および式(2)中、「Nis」は前記酸化亜鉛の粒界部の界面準位密度を示し、「Nd」は前記酸化亜鉛の粒界部のドナー密度を示す。)
図1は本発明に係る電圧非直線抵抗体(以下、「ZnO素子」と称する。)の一例を示す模式図である。図1は電圧非直線抵抗体を正面から見た図である。本発明に係るZnO素子100は、焼結体110と、この焼結体110の上下面に形成された電極120と、焼結体110の両側面に形成された絶縁層130と、を含む構成を有する。焼結体110は円柱状のものであってもよいし、内部に空洞を有する中空円柱状のものであってもよい。このZnO素子100が避雷器やサージアブソーバなどの過電圧保護装置に使用される。
(2.1)焼結体の組織
ZnO素子を構成する焼結体110は、主成分であるZnO粒子から構成されるZnO粒子相のほか、スピネル粒子相やBi2O3相などにより構成されている。
上述したように、焼結体110はZnOを主成分とするZnO系セラミックス材料である。このセラミックス材料に含まれる副成分(添加物)の含有量は、酸化物換算で、酸化ビスマス(Bi2O3)が1.5〜2.5mol%、酸化アンチモン(Sb2O3)が1.0〜2mol%および酸化ホウ素(Bi2O3)が0.3mol%以下とする。
次に、ZnO素子の作製方法について説明する。まず、主成分であるZnO粉末と上述した添加物を所定の量を秤量後、水などの溶媒や分散剤を添加して、湿式粉砕混合装置を用いて混合物を作製する。ここで、湿式粉砕混合装置として、ジルコニアなどのセラミックのボールやビーズを粉砕メデイアとして用いたボールミル、循環式粉砕装置などを用いることができる。
次に、作製したZnO素子の評価方法を説明する。
ZnO素子に1mAの電流を流したときの電圧(V1mA)を測定して、動作開始電圧(バリスタ電圧)とした。ここで、ZnO素子の単位厚さあたりのバリスタ電圧が大きいほど、避雷器に用いる電圧非直線抵抗体の数を減らすことができ、避雷器を小型化することができる。
30℃および115℃でのバリスタ電圧を測定し、これらの温度でのバリスタ電圧の比(V1mA,115℃/V1mA,30℃)を算出して、温度特性とした。この温度特性が小さいほど、熱的安定性に優れていることを示している。
図2は図1の焼結体を構成するZnO粒子界面のエネルギー準位図である。ZnO素子はn型半導体であり、ZnO粒子間の粒界に図2に示すようなダブルショットキーバリア200を形成することで、非直線抵抗性を示すモデルが以下の参考文献1に提案されている。
参考文献1:G. Blatter and F. Greuter, Phys. Rev., B33, 3952 (1986)
C‐V法は、この粒界での電子構造を評価する方法である。まずZnO素子に電圧を順次印加して、その間の容量(測定周波数100kHz)を測定する。その後、走査型電子顕微鏡(Scanning Electron Microscope;SEM)などを用いて、ZnO粒子の平均粒径を測定して上述した容量を粒界1層あたりの値に換算する。ここで、ZnO粒子の平均粒径の測定には以下の参考文献2に記載のコード法を用いた。
参考文献2:セラミックスのキャラクタリゼーション技術、p7、窯業協会(1987)
ドナー210の密度(Nd)とバリア高さ(φ)230は、下記式(1)の傾きと切片から算出し、界面準位220密度(Nis)は下記式(2)から、空乏層240幅(Ld)は下記式(3)から算出した。これらの算出方法は、以下の参考文献3および4に詳述されている。
参考文献3:セラミックスの評価法、P238〜P247、技報堂(1993)
参考文献4:向江和郎:東京工業大学学位論文、p55(2001)
Claims (2)
- 主成分として酸化亜鉛を含み、かつ、副成分として、ビスマス、アンチモン、クロム、マグネシウム、ホウ素、マンガン、コバルト、シリコン、ニッケル、銀、アルミニウムおよびイットリウムを含む焼結体を備え、
前記副成分の含有量は、次の酸化物換算で、
Bi 2 O 3 :1.5〜2.5mol%、
Sb 2 O 3 :1〜2mol%、
Cr 2 O 3 :0.1〜1.5mol%、
MgO:0.01〜0.1mol%、
B 2 O 3 :0.3mol%以下、
MnCO 3 およびCo 3 O 4 :0.1〜1.5mol%、
NiO:0.1〜2mol%、
Al(NO 3 ) 3 :0.005〜0.5mol%、
Ag 2 O:0.001〜0.01mol%、
SiO 2 :1.0〜2.5mol%、および
Y 2 O 3 :2.5mol%以下であり、
下記式(1)および(2)を満たすことを特徴とする電圧非直線抵抗体。
Nis/Nd≧0.57×10−5 …式(1)
Nis 2/Nd≧1.65×107 …式(2)
(式(1)および式(2)中、「Nis」は前記酸化亜鉛の粒界部の界面準位密度を示し、「Nd」は前記酸化亜鉛の粒界部のドナー密度を示す。) - 前記電圧非直線抵抗体に1mAの電流を流したときの電圧をV1mAとし、前記電圧非直線抵抗体に10kAのインパルス電流を流したときのピーク電圧をV10kAとしたとき、制限電圧比V10kA/V1mAが1.6未満であり、115℃において前記電圧非直線抵抗体に1mAの電流を流したときの電圧をV1mA,115℃とし、30℃において前記電圧非直線抵抗体に1mAの電流を流したときの電圧をV1mA,30℃としたとき、温度特性V1mA,115℃/V1mA,30℃が0.95以上であることを特徴とする請求項1記載の電圧非直線抵抗体。
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