JP6753129B2 - Imprint mold and its manufacturing method, and manufacturing method of structure using this imprint mold - Google Patents

Description

The present invention utilizes optical components such as semiconductor devices, optical waveguides and diffraction gratings, bio- and chemical-related analysis chips, recording media such as hard disks and DVDs, antireflection effect by moth-eye and water-repellent effect by lotus leaf shape. In the manufacturing process of various products such as functional materials, the imprint mold and its manufacturing method used when forming a pattern by the imprint technology, and the manufacturing method and structure of the structure using this imprint mold. Regarding.

Until now, lithography technology has been used for nano-level microfabrication of electronic circuit patterns and the like. Various equipment such as drawing, etching, and cleaning required in the lithography process is very expensive, so when developing products that actually require microfabrication, it is enormous due to the introduction of manufacturing equipment and the development of peripheral technology. Cost is required, and it is difficult to proceed with development quickly.

Under such circumstances, imprinting technology that can easily perform nano-level microfabrication in the manner of stamping is drawing attention. Since imprint technology can be processed into resin, it has a wide range of applications such as electronics, biotechnology, and photonics. For example, in the manufacture of semiconductor devices and recording media, Stephan Y. Chow et al. Have proposed a method of forming a resin layer on which a fine uneven pattern is transferred on the surface of a base material (Non-Patent Document 1). In this imprint method, the uneven shape of the mold is transferred to the resin layer by pressing the nanometer-sized uneven portion formed on the original plate (mold) against the resin layer on the surface of the base material.

Examples of the main imprint method include a thermal imprint method, an optical imprint method, a room temperature imprint method, and the like due to differences in processing processes and materials. In particular, the optical imprint method of forming a pattern with an ultraviolet curable resin is often developed in a mass production process together with a roll-to-roll method capable of continuous transfer.

In the roll-to-roll method, a roll-shaped mold is used. If the desired pattern size is several tens of μm or more, the pattern can be directly processed on the roll surface by cutting or laser processing, but in the case of a fine pattern of 1 μm or less, processing by electron beam lithography is required. It becomes. Therefore, a replica mold, which is a duplicate plate, is produced from a master mold made of quartz or silicon produced by electron beam lithography using an imprint method, a Ni electroforming method, etc., and is wound around a roll for transfer. A method of using it as a mold has been reported (Patent Document 1).

In recent years, as an application of imprint technology, functional members combining biomimetics have been introduced. As examples, an antireflection body called moth eye that imitates the compound eye structure of a moth, a water repellent body that imitates the leaf structure of a lotus, and a structural color-developing body that imitates the wing structure of a morpho butterfly are known. As shown in FIG. 7, the leaf structure of moss eye or lotus can be imitated by a one-stage structure in which a fine pattern 12 is formed on a flat base material 11, and has certain functions such as antireflection and water repellency. Can be expressed. Since these have a one-stage structure, it is relatively easy to fabricate a master mold using lithography.

Regarding the wing structure of the morpho butterfly, the phosphorus powder has a very complicated shape and it is difficult to completely imitate it. However, in Patent Document 2, a submicron size scattering pattern is formed by electron beam lithography, and the scattering pattern is formed on the wing structure. It has been reported that a blue color-developing body like a morpho butterfly was obtained by laminating a multilayer film.

When light is incident on a color-developing body produced by such a method by changing the angle using a variable angle photometer or the like, only the specular reflection component of the reflected light protrudes and is strongly detected, and the angle of the reflected light expands. Can be seen to tend to be small. The wing structure of the actual Morpho butterfly is a characteristic beautiful blue color that reflects light in various directions due to the presence of phosphorus powder with a submicron-sized fine structure on the millimeter-sized uneven structure such as the wing vein and the wing chamber. Is presumed to develop color.

If a two-stage scattering pattern having a submicron-sized fine structure is formed on a millimeter-sized base structure and a multilayer film is laminated on the scattering pattern, the angle spread of the reflected light becomes large and a more beautiful color-developing body is formed. Is thought to be possible. Further, if such a two-stage structure can be easily produced, it may lead to improvement of the characteristics (antireflection, water repellency, hydrophilic function, etc.) expressed in the one-stage structure.

However, in the case of a two-stage structure, it is difficult to manufacture a master mold. When producing a master mold in which a submicron-sized fine structure is formed on a base structure having a millimeter-sized uneven structure, a two-step process is required. Electron beam lithography is used to form a submicron-sized fine structure with high accuracy, but when trying to form a submicron-sized fine pattern on the uneven structure of the underlying structure, a uniform resist coat or electron beam is used. This is because the drawing by the above cannot be performed accurately and the desired two-stage structure cannot be obtained.

It is possible to obtain a two-stage structure by performing continuous two-step transfer in which the uneven structure of the underlying structure is first transferred and then the fine structure is transferred. However, for example, the roll-to-roll method is used. If this is attempted, not only transfer but also steps such as resin coating on the base material are increased, which is costly. In addition, there is a problem that the resin coated on the uneven structure of the base structure becomes non-uniform, or there is a problem that the fine structure cannot be accurately transferred to a desired position of the base structure due to the deflection of the base material or the like. Occurs.

International Publication No. 2014/080857 Japanese Patent No. 4228058

Stephen Y. Chou, "Imprint of sub 25 nm vias and traines in polymers", Applied Physics Letters, 67 (21), (1995), 3114-6

The following methods are proposed to solve such problems.

First, a base structure in which a millimeter-sized pattern is formed and a microstructure in which a submicron-sized pattern is formed on a thermoplastic substrate are individually prepared. After stacking them so that the submicron size pattern of the microstructure is on the outermost surface, a protective material is placed on the microstructure so that the submicron pattern is not damaged. In this state, it is pressed while heating, and the base material of the microstructure softened by heating is deformed so as to follow the millimeter-sized pattern of the underlying structure. Finally, by peeling off the protective material on the surface, an imprint mold having a two-stage structure can be obtained.

An object of the present invention is to provide an imprint mold capable of forming a two-stage structure having a submicron size fine pattern on a millimeter size pattern by a single transfer, and a method for producing the same. .. Another object of the present invention is to provide a method for manufacturing a structure and a structure using this imprint mold.

The present invention includes a base structure provided with the first unevenness pattern and a base material laminated on the base structure, and a second unevenness is formed on the surface of the base material opposite to the base structure. It is an imprint mold characterized in that a fine structure composed of a pattern is formed, and the height of the first uneven pattern is higher than the height of the second uneven pattern.

Further, the base material may be formed of a resin having thermoplasticity.

Further, it is preferable that the deflection temperature under load of the base structure is higher than the deflection temperature under load of the base material.

Further, the present invention includes a step of dropping the transfer resin onto the above-mentioned imprint mold, a step of laminating a transfer base material on the transfer resin and pressing the transfer resin to perform transfer, and a step of curing the transfer resin. , A method for manufacturing a structure, which comprises a step of peeling a cured transfer resin from an imprint mold.

Further, the present invention includes a step of forming a first uneven pattern on the surface of the underlying structure, a step of forming a second uneven pattern on the surface of the microstructure, and a step of forming the first uneven pattern on the surface of the underlying structure. The step of laminating the surface of the microstructure and the surface of the microstructure on the side where the second concavo-convex pattern is not formed to face each other, the step of laminating the protective material on the second concavo-convex pattern, and the microstructure. The height of the first uneven pattern is higher than the height of the second uneven pattern, which includes a step of pressing on the underlying structure, a step of curing the protective material, and a step of peeling the protective material from the microstructure. This is a method for manufacturing an imprint mold, which is characterized in that.

Further, the present invention includes a cured resin layer having the first uneven pattern, and a second uneven pattern having a height smaller than the height of the first uneven pattern is provided in at least a part of the region of the first uneven pattern. Is provided, and the structure is characterized in that the corners of the first uneven pattern are curved in the cross section.

Further, it is preferable that the height of the first uneven pattern is 0.1 mm or more and 10 mm or less, and the height of the second uneven pattern is 10 nm or more and 100 μm or less.

According to the present invention, it is possible to realize an imprint mold capable of forming a two-stage structure having a submicron size fine pattern on a millimeter size pattern by a single transfer and a method for manufacturing the same. In addition, a method for manufacturing a structure and a structure using this imprint mold can be realized. As a result, it is possible to provide a member having a high function expressed by a complicated microstructure at a low cost.

It is a schematic block diagram which shows the manufacturing method of the imprint mold which concerns on embodiment of this invention. It is a schematic block diagram which shows the transfer method which concerns on embodiment of this invention. It is a schematic block diagram which shows the transfer method which concerns on embodiment of this invention. It is an enlarged view of the structure which concerns on embodiment of this invention. It is the schematic which drew only the outline of the cross section of the structure obtained by the imprinting mold which concerns on embodiment of this invention. It is a schematic block diagram which shows the transfer | transfer | transfer of the one-step structure in which the fine pattern was formed on the base material. It is a schematic block diagram which shows the one-step structure in which a fine pattern is formed on a base material.

Hereinafter, an example of the embodiment of the imprint mold of the present invention will be described with reference to FIG.

FIG. 1 is a schematic configuration diagram showing a method for producing an imprint mold according to an embodiment of the present invention. The imprint mold 100 according to the embodiment of the present invention is manufactured in the flow as shown in FIG. First, the base structure 200 in which the millimeter-sized uneven pattern 201 is formed and the microstructure 300 in which the submicron-sized fine pattern 302 is formed on the base material 301 are arranged so that the fine pattern 302 is the outermost surface. And fix it with a jig, adhesive, tape, etc. (Fig. 1 (a)).

The base structure 200 is composed of at least a material having a higher deflection temperature under load than the base material 301. The uneven pattern 201 formed on the base structure 200 may be a pattern directly processed on the base material, such as a master mold made of quartz or silicon, or a pattern duplicated from the master mold. The shape of the base structure 200 is a flat plate shape in FIG. 1, but it may be a roll shape. The processing method of the uneven pattern 201 is not particularly limited. Examples include a lithography method, an imprint method, an embossing method, a cutting method and the like.

The size of the uneven pattern 201 of the base structure 200 may be at least larger than the size of the fine pattern 302 of the fine structure 300, and is preferably 0.1 mm or more and 10 mm or less. The aspect ratio (height / width) of the pattern height is set so that the fine pattern 302 is not damaged during the heat pressing and the fine structure 300 easily follows the uneven pattern 201 of the base structure 200. ) Is set to 1 or less. Further, for the same reason as described above, the uneven pattern 201 of the base structure 200 preferably has a tapered shape, and the hole shape is inappropriate.

The microstructure 300 is composed of a base material 301 and a fine pattern 302. The base material 301 uses a thermoplastic resin so as to be deformed by following the uneven pattern 201 of the base structure 200 by heating and pressing. Examples include polyethylene terephthalate (PET), acrylic nitrile-butadiene-styrene copolymer (ABS resin), polymethyl methacrylate (PMMA), polyethylene (PE), polypropylene (PP), polycarbonate (PC) and the like. The thickness of the base material 301 should be as thin as possible so that it can easily follow the base structure 200 when heat-pressed, and is, for example, about 10 to 100 μm.

The size of the fine pattern 302 can be 10 nm or more and 100 μm or less. The pattern height may be any aspect ratio that does not collapse the pattern at the time of mold release and can retain the shape, but the aspect ratio (height / width) is preferably 5 or less.

In order to produce the microstructure 300, it is first necessary to prepare a master mold made of quartz or silicon on which the inverted pattern of the fine pattern 302 is formed. Electron beam lithography is used to fabricate the master mold. A fine pattern 302 is formed on the base material 301 from the master mold by using an optical imprint method or the like. In order to improve the releasability, it is preferable to use a resin containing a fluorine-based component, a silicon component, or the like as the resin forming the fine pattern 302. Alternatively, the surface of the fine pattern 302 may be coated with a release agent to provide a release layer.

Subsequently, in order to protect the fine pattern 302, the protective material 400 is placed on the fine structure 300 (FIG. 1 (b)).

The protective material 400 is composed of a base material 402 and a resin 401. Resin 401 is a material having at least ultraviolet curability. Further, it is preferable that the material also has thermoplasticity so that the pressing pressure can be easily transmitted to the microstructure 300 during the heating press. As the protective material 400, a resin 401 may be coated on the base material 402 in advance to form a film. Alternatively, after the resin 401 is coated on the microstructure 300, the base material 402 may be placed from above to serve as the protective material 400.

The base material 402 is not particularly limited as long as it is a material that transmits at least ultraviolet rays and adheres to the resin 401. An easy-adhesion layer may be formed on the surface in close contact with the resin 401. The thickness of the base material 402 may be as strong as 10 μm or more and 100 μm or less so as not to be damaged when peeled from the microstructure 300 together with the resin 401 after heat pressing.

Next, the microstructure 300 is pressed from the protective material 400 side to the base structure 200 side while heating (FIG. 1 (c)). The pressing method is not particularly limited, but a roll pressing method that easily suppresses the inclusion of air bubbles is preferable.

The press pressure may be strong enough not to damage the fine pattern 302. As an example, it is 0.1 to 10 MPa. The heating temperature is determined by the deflection temperature under load of the base material 301, but is 80 to 180 ° C. It is preferable that the press roll 700 and the base structure 200 itself to be used are also heated by a heater or the like so that heat can be efficiently transferred.

Subsequently, ultraviolet light is irradiated from the protective material 400 side to cure the resin 401 (FIG. 1 (d)), and the protective material 400 is peeled off to obtain an imprint mold 100 having a two-stage structure ((FIG. 1 (d)). FIG. 1 (e).

The following are examples of the transfer method using the imprint mold 100 in the case of the roll-to-plate method (a method of transferring while pressing with a roll using a flat plate mold) and the roll-to-roll method (a roll-shaped mold). The case of using and performing transfer while pressurizing with a roll) is shown.

<Roll to plate method>
The roll-to-plate method will be described with reference to FIG.

First, as a preparation before transfer, the imprint mold 100 is fixed at a predetermined position of the roll-to-plate device using a jig, an adhesive, a tape, or the like. Next, the ultraviolet curable transfer resin 501 is dropped onto the end or the entire surface of the mold by an inkjet method, a spray method, or the like (FIG. 2A). A base material 502 capable of transmitting ultraviolet rays is placed on the dropped resin, the press roll 700 is scanned from above, and the transfer resin 501 is stretched while being pressed against the imprint mold 100 to perform transfer (FIG. 2 (FIG. 2). b)). At this time, the thickness of the resin layer is 0.5 μm or more and 50 μm or less. Subsequently, ultraviolet light is irradiated from the base material 502 side (FIG. 2 (c)). Then, the base material 502 and the cured transfer resin 601 can be peeled off from the imprint mold 100 to obtain a structure 600 having a two-stage structure (FIG. 2D).

<Roll to roll method>
The roll-to-roll method will be described with reference to FIG.

First, when the imprint mold 100 has a flexible shape such as a film, it is fixed to the roll position of the roll-to-roll device by using a jig, an adhesive, a tape, or the like. When the base structure 200 of the imprint mold 100 is a roll-shaped base material directly processed by a cutting method or the like, it is installed in the apparatus as it is. Next, a film capable of transmitting ultraviolet rays is used as a base material 502, and a transfer resin 501 of an ultraviolet curable resin is coated on the surface thereof by using a die coating method, an inkjet method, a spray method, a microgravure method or the like. The thickness of the resin layer is 0.5 to 50 μm. Then, the transfer resin 501 on the base material 502 is pressed against the imprint mold 100 with the press roll 700. Subsequently, ultraviolet light is irradiated from the base material 502 side to cure the transfer resin 501, whereby the structure 600 having a two-stage structure can be obtained.

FIG. 4 is an enlarged view of the structure 600 according to the embodiment of the present invention. The size of the uneven pattern 201 of the base structure 200 described above refers to the maximum height difference H1 of the unevenness shown in FIG. 4, and the size of the fine pattern 302 of the fine structure 300 is the maximum height of the unevenness shown in FIG. Refers to the difference H2.

FIG. 5 is a schematic view showing only the outline of the cross section of the structure obtained by the imprint mold according to the embodiment of the present invention. That is, the structure 600 includes an inverted structure of a millimeter-order base structure 200 and a submicron-order microstructure 300, and FIG. 5 shows the shape of the contour 600a of the cross section of the inverted structure of the base structure 200. ing. As shown in FIG. 5, the structure 600 to which the above transfer has been performed using the imprint mold 100 of the present invention does not have an acute angle (almost nonexistent) at the corners of the inverted structure of the base structure 200. It can be curved or curved. In other words, the structure 600 has a submicron-order uneven pattern formed on a base having a substantially curved shape.

The structure of moths, lotus leaves, and morpho butterflies that exist in nature is not a simple rectangular shape as shown in FIG. 7, but a curved shape with some undulations. Therefore, like the structure 600 of the present invention, the contour 600a of the cross section of the inverted structure of the base structure 200 has a curved shape, so that the shape is closer to a natural object, and more accurate biomimetics are possible.

Examples of the method for manufacturing the imprint mold of the present invention and the method for manufacturing the structure using the imprint mold are shown below. However, the present invention is not limited to the examples.

(Example 1)
First, a base structure 200 having a pattern processed on a stainless steel flat plate by a cutting method was prepared. The size of the base pattern was 1000 μm in width, 3000 μm in pitch, and 300 μm in depth. In addition, an alignment mark was formed in the peripheral portion that does not affect the transfer.

Next, a quartz master mold in which a fine pattern having a width of 0.3 to 1 μm was formed at a depth of 0.1 μm was produced by electron beam lithography. In addition to the fine pattern, alignment marks were formed in the peripheral portion that did not affect the transfer. Using this quartz master mold, a fine structure 300 was obtained by an optical imprint method. A thermoplastic PET film (Cosmo Shine (manufactured by Toyobo)) (thickness 38 μm) is used as the base material 301, and a resin obtained by mixing an acrylic ultraviolet curable resin with a fluorine-based mold release component is used as the fine pattern 302. Formed.

The fine structure 300 was placed on the base structure 200 with the fine pattern 302 facing up so as to align with the alignment mark, and the end portion of the film was fixed with heat-resistant tape (FIG. 1A).

Next, in order to protect the fine pattern 302, an ultraviolet curable resin (PAK02 (manufactured by Toyobo)) as a resin 401 is coated on the fine structure 300 with a thickness of 1 μm, and a thermoplastic PET as a base material 402 on the fine structure 300. A film (Cosmo Shine (manufactured by Toyobo)) was placed on the microstructure 300 as a protective material 400 (FIG. 1 (b)).

Subsequently, the microstructure 300 was pressed against the base structure 200 from the protective material 400 side using a press roll 700 made of silicon rubber heated to 95 ° C. (FIG. 1 (c)). At this time, the base structure 200 was heated by a heater so as to reach 120 ° C. The press pressure was 1 MPa and the roll feed rate was 0.5 m / min.

Subsequently, a high-pressure mercury lamp was used as the ultraviolet light source 800 and irradiated with ultraviolet light having a main wavelength of 365 nm to cure the resin 402 (FIG. 1 (d)). Next, the protective material 400 was peeled off to obtain an imprint mold 100 having a two-stage structure (FIG. 1 (e)).

Next, an example of a method for manufacturing the structure 600 using the obtained imprint mold 100 will be shown.

The imprint mold 100 was installed at a predetermined position of the roll-to-plate device. By the inkjet method, an ultraviolet curable resin (PAK02 (manufactured by Toyo Synthetic)) was added dropwise to the end of the transfer surface as the transfer resin 501. Next, an ultraviolet-transmissive PET film (Cosmo Shine (manufactured by Toyobo)) was used as a base material 502 and placed on the upper side of the transfer resin 501. Next, the press roller 700 was scanned over the entire transfer region from above the base material 502. The press pressure was 0.2 MPa, and the roller feed rate was 1 m / min. Subsequently, a high-pressure mercury lamp is used as an ultraviolet light source 800 to irradiate ultraviolet light having a main wavelength of 365 nm to cure the transfer resin 501 and peel it off from the imprint mold 100 to form a structure having a two-stage structure. I got 600.

As a result of measuring the surface structure of the obtained structure 600 with a scanning probe microscope, it was confirmed that a desired submicron size fine pattern was formed. Further, on the structure 600, a multilayer film in which seven layers of titanium oxide (thickness 80 nm) and seven layers of silicon oxide (thickness 150 nm) are alternately laminated is formed by using a vacuum vapor deposition method. , A blue colored body was prepared. When the optical characteristics of the produced blue color-developing body were measured with a variable-angle photometer, the angle dependence of the reflected light became smaller than that of the transfer product in which the fine pattern as shown in FIG. 6 was formed in a one-stage structure. We were able to develop a more attractive blue color.

(Example 2)
First, a base structure 200 having a pattern processed on a stainless steel roll by a cutting method was prepared. The size of the base pattern was 1000 μm in width, 3000 μm in pitch, and 300 μm in depth. Further, in the base structure 200, an alignment mark is formed at a peripheral portion that does not affect the transfer.

Next, a quartz master mold in which a fine pattern having a width of 0.3 to 1 μm was formed at a depth of 0.1 μm was produced by electron beam lithography. In addition to the fine pattern, alignment marks were also formed in the peripheral portion that did not affect the transfer. Using this quartz master mold, a fine structure 300 was obtained by an optical imprint method. A thermoplastic PET film (Cosmo Shine (manufactured by Toyobo)) (thickness 38 μm) is used as the base material 301, and a resin obtained by mixing an acrylic ultraviolet curable resin with a fluorine-based mold release component is used as the fine pattern 302. Formed.

The fine structure 300 was wound around the base structure 200 with the fine pattern 302 facing up so as to align with the alignment mark, and the edges of the film were fixed with heat-resistant tape.

Next, in order to protect the fine pattern 301, a UV-transparent PET film base material 402 coated with a UV-curable acrylic resin 401 in advance with a thickness of 2 to 3 μm is used as a protective material 400 on the fine structure 300. Stacked.

Subsequently, in a state where the roll-shaped base structure 200 is heated to 120 ° C., a silicon rubber press roll 700 heated to 95 ° C. is placed on the microstructure 300 and the base material from the protective material 400 side. It was pressed against the structure 200. At this time, the press pressure was 1 MPa, and the roll feed rate was 0.5 m / min.

Subsequently, a high-pressure mercury lamp is used as an ultraviolet light source 800 to irradiate ultraviolet light having a main wavelength of 365 nm to cure the resin 402, and then the protective material 400 is peeled off for roll-shaped imprint having a two-stage structure. Mold 100 was obtained.

Next, an example of a method for manufacturing the structure 600 using the obtained imprint mold 100 will be shown.

The imprint mold 100 was installed at a predetermined position of the roll-to-roll device. An ultraviolet curable resin (PAK02 (manufactured by Toyobo)) 501 was coated on an ultraviolet transmissive PET film (Cosmo Shine (manufactured by Toyobo)) base material 502 by a die coating method. The base material 502 flowed in the feeding direction with the transfer resin 501 coated, and was pressed against the imprint mold from above the base material 502 by the press roller 700. At this time, the press pressure was 0.2 MPa, and the roller feed rate was 1 m / min. Subsequently, a high-pressure mercury lamp is used as an ultraviolet light source 800 to irradiate ultraviolet light having a main wavelength of 365 nm to cure the transfer resin 501 and peel it off from the imprint mold 100 to form a two-stage structure. I got 600.

As a result of measuring the surface structure of the obtained structure 600 with a scanning probe microscope, it was confirmed that a desired submicron size fine pattern was formed. Further, on the obtained structure 600, seven layers of titanium oxide (thickness 80 nm) and seven layers of silicon oxide (thickness 150 nm) were alternately laminated by a vacuum vapor deposition method. Was formed to prepare a blue-colored body. When the optical characteristics of the blue color-developing body were measured with a variable-angle photometer, the angle dependence of the reflected light became smaller and more attractive compared to the transfer product in which the fine pattern was formed in a one-stage structure as shown in FIG. I was able to develop a typical blue color.

The present invention utilizes optical components such as semiconductor devices, optical waveguides and diffraction gratings, bio- and chemical-related analysis chips, recording media such as hard disks and DVDs, antireflection effect by moth-eye and water-repellent effect by hasha leaf shape. It can be suitably used as an imprint mold and a structure used when pattern formation is performed by an imprint technique in the manufacturing process of various products such as functional materials.

10 …… One-stage structure 11 …… Base material 12 …… Fine pattern 20 …… One-stage structure 21 …… Base material 22 …… Fine pattern 100 …… Imprint mold 200 …… Base structure 201 …… Concavo-convex pattern 300 …… Microstructure 301 …… Base material 302 …… Fine pattern 400 …… Protective material 401 …… Resin 402 …… Base material 501 …… Transfer resin (before UV curing)
502 …… Base material 600 …… Structure 600a …… Structure contour 601 …… Transfer resin (after UV curing)
700 …… Press roll 800 …… Light source for UV curing

Claims (5)

The base structure provided with the first uneven pattern and
A base material laminated on the base structure is provided.
A microstructure composed of a second uneven pattern is formed on the surface of the base material opposite to the base structure.
An imprint mold characterized in that the height of the first uneven pattern is higher than the height of the second uneven pattern. Imprinting mold according to claim 1 before Kimotozai is characterized in that it is formed of a thermoplastic resin. The imprint mold according to claim 1 or 2, wherein the deflection temperature under load of the base structure is higher than the deflection temperature under load of the base material. The step of dropping the transfer resin onto the imprint mold according to any one of claims 1 to 3.
A step of laminating a transfer base material on the transfer resin and pressing it to perform transfer.
The step of curing the transfer resin and
A method for producing a structure, which comprises a step of peeling the cured transfer resin from the imprint mold. The process of forming the first uneven pattern on the surface of the underlying structure,
The process of forming a second uneven pattern on the surface of the microstructure,
A step of laminating the surface of the base structure on the side of the first concavo-convex pattern and the surface of the microstructure on the side where the second concavo-convex pattern is not formed so as to face each other.
The process of laminating the protective material on the second uneven pattern and
The step of pressing the microstructure onto the base structure and
The process of curing the protective material and
Including the step of peeling the protective material from the microstructure.
A method for manufacturing an imprint mold, characterized in that the height of the first uneven pattern is higher than the height of the second uneven pattern.