JP6676380B2 - Method for producing metal carboxylate coating film using deprotection reaction - Google Patents
Method for producing metal carboxylate coating film using deprotection reaction Download PDFInfo
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- 238000000576 coating method Methods 0.000 title claims description 64
- 239000011248 coating agent Substances 0.000 title claims description 63
- 229910052751 metal Inorganic materials 0.000 title claims description 44
- 239000002184 metal Substances 0.000 title claims description 44
- 238000010511 deprotection reaction Methods 0.000 title claims description 39
- 238000004519 manufacturing process Methods 0.000 title claims description 27
- 150000007942 carboxylates Chemical class 0.000 title claims description 6
- 150000003839 salts Chemical class 0.000 claims description 28
- 239000002253 acid Substances 0.000 claims description 23
- 239000003054 catalyst Substances 0.000 claims description 20
- 150000002736 metal compounds Chemical class 0.000 claims description 19
- 229920000193 polymethacrylate Polymers 0.000 claims description 19
- 239000000463 material Substances 0.000 claims description 16
- -1 carboxylic acid compound Chemical class 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 13
- 150000001875 compounds Chemical class 0.000 claims description 12
- 238000010438 heat treatment Methods 0.000 claims description 12
- 239000002904 solvent Substances 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 12
- 238000007865 diluting Methods 0.000 claims description 9
- 239000000126 substance Substances 0.000 claims description 7
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims description 5
- 230000008569 process Effects 0.000 claims description 5
- 125000000542 sulfonic acid group Chemical group 0.000 claims description 5
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical group [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 4
- 150000001735 carboxylic acids Chemical class 0.000 claims description 4
- 239000011347 resin Substances 0.000 claims description 2
- 229920005989 resin Polymers 0.000 claims description 2
- 125000003700 epoxy group Chemical group 0.000 claims 1
- 239000010408 film Substances 0.000 description 47
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 15
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 14
- 239000007788 liquid Substances 0.000 description 14
- 238000006386 neutralization reaction Methods 0.000 description 14
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 11
- 239000000243 solution Substances 0.000 description 11
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 9
- 239000000178 monomer Substances 0.000 description 9
- 239000003505 polymerization initiator Substances 0.000 description 9
- 239000000203 mixture Substances 0.000 description 8
- 239000002985 plastic film Substances 0.000 description 8
- 229920006255 plastic film Polymers 0.000 description 8
- 239000011787 zinc oxide Substances 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 238000012719 thermal polymerization Methods 0.000 description 6
- 230000004888 barrier function Effects 0.000 description 5
- 239000010419 fine particle Substances 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 239000003999 initiator Substances 0.000 description 5
- 239000004033 plastic Substances 0.000 description 5
- 229920003023 plastic Polymers 0.000 description 5
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 125000006239 protecting group Chemical group 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000005865 ionizing radiation Effects 0.000 description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 229920013730 reactive polymer Polymers 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 238000010538 cationic polymerization reaction Methods 0.000 description 2
- 238000012790 confirmation Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000002270 dispersing agent Substances 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 239000002346 layers by function Substances 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 235000011121 sodium hydroxide Nutrition 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 1
- PFHOSZAOXCYAGJ-UHFFFAOYSA-N 2-[(2-cyano-4-methoxy-4-methylpentan-2-yl)diazenyl]-4-methoxy-2,4-dimethylpentanenitrile Chemical compound COC(C)(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)(C)OC PFHOSZAOXCYAGJ-UHFFFAOYSA-N 0.000 description 1
- 229920001661 Chitosan Polymers 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- WKFBZNUBXWCCHG-UHFFFAOYSA-N phosphorus trifluoride Chemical group FP(F)F WKFBZNUBXWCCHG-UHFFFAOYSA-N 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- ZDYVRSLAEXCVBX-UHFFFAOYSA-N pyridinium p-toluenesulfonate Chemical compound C1=CC=[NH+]C=C1.CC1=CC=C(S([O-])(=O)=O)C=C1 ZDYVRSLAEXCVBX-UHFFFAOYSA-N 0.000 description 1
- 239000002964 rayon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- NGOCMUBXJDDBLB-UHFFFAOYSA-N trifluoromethanesulfonic acid;zinc Chemical compound [Zn].OS(=O)(=O)C(F)(F)F NGOCMUBXJDDBLB-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
- ZMLPZCGHASSGEA-UHFFFAOYSA-M zinc trifluoromethanesulfonate Chemical compound [Zn+2].[O-]S(=O)(=O)C(F)(F)F ZMLPZCGHASSGEA-UHFFFAOYSA-M 0.000 description 1
- CITILBVTAYEWKR-UHFFFAOYSA-L zinc trifluoromethanesulfonate Substances [Zn+2].[O-]S(=O)(=O)C(F)(F)F.[O-]S(=O)(=O)C(F)(F)F CITILBVTAYEWKR-UHFFFAOYSA-L 0.000 description 1
- AGFGXVAAIXIOFZ-UHFFFAOYSA-L zinc;butanedioate Chemical compound [Zn+2].[O-]C(=O)CCC([O-])=O AGFGXVAAIXIOFZ-UHFFFAOYSA-L 0.000 description 1
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- Application Of Or Painting With Fluid Materials (AREA)
- Paints Or Removers (AREA)
Description
本発明は、カルボン酸金属塩塗膜の製造方法、好適にはポリ(メタ)アクリル酸金属塩塗膜の製造方法に関する。 The present invention relates to a method for producing a metal carboxylate coating film, preferably a method for producing a metal poly (meth) acrylate coating film.
今日、フィルムまたはシート状の基材にハードコート性や帯電防止性、ガスバリア性などの各種の機能層が形成された機能性フィルムまたはシートが利用されている。この機能層を形成する材料の一つにカルボン酸の金属塩、特に(メタ)アクリル酸の金属塩が挙げられる。(メタ)アクリル酸金属塩は、カルボン酸アニオン−金属カチオン間のイオン結合、および金属そのものに由来する特性を有する化合物であり、(メタ)アクリル酸のナトリウム塩やカリウム塩は分散性、吸水性を有することから、水系分散剤、洗剤や吸水性樹脂の原料として、また、亜鉛塩は高硬度、高弾性、ガスバリア性を有することからタイヤやゴルフボール等のゴム、ガスバリアフィルムの原料として、広く利用されている。他にも、マグネシウム、カルシウム、銅、アルミニウム等の(メタ)アクリル酸塩等が工業品としてあるいは試薬として入手可能である。 Today, functional films or sheets in which various functional layers such as a hard coat property, an antistatic property, and a gas barrier property are formed on a film or sheet-like base material are used. One of the materials forming the functional layer is a metal salt of carboxylic acid, particularly a metal salt of (meth) acrylic acid. The metal (meth) acrylate is a compound having an ionic bond between a carboxylate anion and a metal cation, and a property derived from the metal itself. Because it has a water-based dispersant, a raw material for detergents and water-absorbent resins, and because zinc salts have high hardness, high elasticity, and gas barrier properties, rubber for tires and golf balls, and as a raw material for gas barrier films, It's being used. In addition, (meth) acrylates such as magnesium, calcium, copper, and aluminum are available as industrial products or reagents.
(メタ)アクリル酸金属塩の重合体であるポリ(メタ)アクリル酸金属塩、特に金属種が多価であるポリ(メタ)アクリル酸多価金属塩は主にガスバリアフィルムとして用いられている。ポリ(メタ)アクリル酸金属塩を含有する塗膜の製造方法として、塗工液の状態でポリ(メタ)アクリル酸に金属化合物を加えて中和し、あらかじめポリ(メタ)アクリル酸金属塩の溶液を作製しておく方法がある。この方法は1価の金属化合物の場合には問題にならないが、多価金属化合物の場合は、中和度が高まるにつれてカルボキシラートと多価金属イオンとの疑似架橋形成が進行するため、溶媒には不溶のポリ(メタ)アクリル酸金属塩が析出してしまう。
上記の問題を避けるため、特許文献1では工程上での工夫がなされている。すなわち、基材フィルム上に1層目のポリアクリル酸膜を形成し、さらにその上に2層目の多価金属化合物膜を積層し、加湿下で金属イオンを拡散させることでポリアクリル酸塩の塗膜を作製している。この場合、塗工液は2液となり、工程が煩雑であるように思われる。
Metal poly (meth) acrylate, which is a polymer of metal (meth) acrylate, particularly poly (meth) acrylic polyvalent metal having a polyvalent metal species is mainly used as a gas barrier film. As a method for producing a coating film containing a metal salt of poly (meth) acrylate, a metal compound is added to poly (meth) acrylic acid in the state of a coating solution to neutralize the solution, and the metal salt of poly (meth) acrylate is prepared in advance. There is a method of preparing a solution. This method is not a problem in the case of a monovalent metal compound, but in the case of a polyvalent metal compound, pseudo-crosslinking between a carboxylate and a polyvalent metal ion proceeds as the degree of neutralization increases. Causes insoluble metal poly (meth) acrylate to precipitate.
In order to avoid the above-described problem, Patent Document 1 devises a process. That is, a first polyacrylic acid film is formed on a base film, and a second polyvalent metal compound film is further laminated thereon, and metal ions are diffused under humidification to form a polyacrylate. The coating film of is manufactured. In this case, two coating liquids are required, and the process seems to be complicated.
本発明はかかる事情に鑑みてなされたものであって、工程上ではなく塗工液側を工夫することで、カルボン酸の金属塩の中でも特にポリ(メタ)アクリル酸金属塩の塗膜を1液で製造する方法を課題とするものである。 The present invention has been made in view of such circumstances, and by devising a coating solution side instead of a process, a coating film of a metal salt of poly (meth) acrylate, particularly among metal salts of carboxylic acid, can be formed. It is an object of the present invention to provide a method of manufacturing with a liquid.
本発明の目的は、下記(1)〜(6)により達成される。
(1)カルボン酸の金属塩を含有する塗膜を製造する方法であって、前記塗膜を形成する塗膜形成材料として(A)酸部位が保護されたカルボン酸化合物、(B)金属化合物、(C)脱保護触媒、(D)希釈溶媒を含有する材料を用いることを特徴とする塗膜の製造方法。
The object of the present invention is achieved by the following (1) to (6).
(1) A method for producing a coating film containing a metal salt of a carboxylic acid, wherein (A) a carboxylic acid compound in which an acid site is protected, and (B) a metal compound as a coating film forming material for forming the coating film. , (C) a deprotection catalyst, and (D) a material containing a diluting solvent.
好ましくは、上記(C)脱保護触媒はpKa9以下の酸および/またはその塩、もしくは該酸および/またはその塩を発生しうる脱保護触媒である。 Preferably, the (C) deprotection catalyst is an acid having a pKa of 9 or less and / or a salt thereof, or a deprotection catalyst capable of generating the acid and / or a salt thereof.
好ましくは化学構造の一部にスルホン酸部位、パーフルオロアルキル部位、パーフルオロリン部位、アンチモン部位を含む構造を有する脱保護触媒である。
(2)前記塗膜形成材料を基材に塗布した後、形成された被膜を加熱することでカルボン酸の金属塩を生成することを特徴とする(1)に記載の塗膜の製造方法。
(3)前記塗膜の製造過程において、被膜を加熱した後に被膜を湿熱下にさらすことを特徴とする(1)又は(2)に記載の塗膜の製造方法。
(4)前記カルボン酸金属塩がポリ(メタ)アクリル酸金属塩であることを特徴とする(1)〜(3)の何れか1項に記載の塗膜の製造方法。
(5)前記(B)金属化合物が多価金属化合物であることを特徴とする(1)〜(4)の何れか1項に記載の塗膜の製造方法。
(6)前記(B)金属化合物の含有量が、(A)酸部位が保護されたカルボン酸化合物の脱保護反応が完結した際に生じるカルボン酸を10%以上中和するのに必要な量であることを特徴とする(1)〜(5)の何れか1項に記載の塗膜の製造方法。
A deprotection catalyst having a structure containing a sulfonic acid moiety, a perfluoroalkyl moiety, a perfluorophosphorous moiety and an antimony moiety in a part of its chemical structure is preferred.
(2) The method for producing a coating film according to (1), wherein, after the coating film forming material is applied to a substrate, the formed coating film is heated to generate a metal salt of a carboxylic acid.
(3) The method for producing a coating film according to (1) or (2), wherein, in the process of producing the coating film, the coating film is exposed to wet heat after heating the coating film.
(4) The method for producing a coating film according to any one of (1) to (3), wherein the metal carboxylate is a poly (meth) acrylate metal salt.
(5) The method for producing a coating film according to any one of (1) to (4), wherein the metal compound (B) is a polyvalent metal compound.
(6) The content of the metal compound (B) is an amount necessary for neutralizing the carboxylic acid generated when the deprotection reaction of the carboxylic acid compound having the protected acid site (A) is completed by 10% or more. The method for producing a coating film according to any one of (1) to (5), wherein
本発明の塗膜の製造方法によれば、複数の塗工液を使用せず、1液でポリ(メタ)アクリル酸金属塩の塗膜を作製することができるという優れた生産性向上効果が発現する。 ADVANTAGE OF THE INVENTION According to the manufacturing method of the coating film of this invention, the outstanding productivity improvement effect that the coating film of a poly (meth) acrylate metal salt can be produced with one liquid without using a plurality of coating liquids is obtained. Express.
本発明の塗膜の製造方法は、前記したように、塗膜形成材料として(A)酸部位が保護されたカルボン酸化合物、(B)金属化合物、(C)脱保護触媒、(D)希釈溶媒を含有する材料を用いることを特徴とする。
上記(A)酸部位が保護されたカルボン酸化合物としては、例えば、ポリt−ブチル(メタ)アクリレート、ポリメチルアダマンチル(メタ)アクリレート、イソプレンの無水マレイン酸付加物をt-ブチルアルコールでエステル化して得られたポリマーなどが挙げられるが、本発明はかかる例示のみに限定されるわけではない。それぞれ単独で用いてもよいし、二種以上を組み合わせて用いてもよいが、好ましくはポリt−ブチル(メタ)アクリレートである。保護基を有するポリ(メタ)アクリル酸エステルは対応するモノマーである(メタ)アクリル酸エステルを重合することで合成することができる。一種類の(メタ)アクリル酸エステルモノマーを単独で重合してもよいし、二種以上を併用して重合してもよいし、保護基を有さない(メタ)アクリル酸エステルモノマーを併用して重合してもよい。
As described above, the method for producing a coating film of the present invention comprises, as a coating film-forming material, (A) a carboxylic acid compound having an acid site protected, (B) a metal compound, (C) a deprotection catalyst, and (D) dilution. It is characterized by using a material containing a solvent.
Examples of the (A) carboxylic acid compound in which the acid site is protected include poly-t-butyl (meth) acrylate, polymethyladamantyl (meth) acrylate, and maleic anhydride adduct of isoprene, which are esterified with t-butyl alcohol. The present invention is not limited to only such examples. Each may be used alone, or two or more kinds may be used in combination. Preferably, poly-t-butyl (meth) acrylate is used. The poly (meth) acrylate having a protecting group can be synthesized by polymerizing the corresponding monomer (meth) acrylate. One type of (meth) acrylate monomer may be polymerized alone, two or more types may be used in combination, or a (meth) acrylate monomer having no protecting group may be used in combination. May be polymerized.
前記(B)金属化合物としては、例えば、苛性ソーダ、酸化亜鉛、酸化マグネシウム、酸化アルミニウムなどが挙げられるが、本発明はかかる例示に限られるものではない。一価の金属化合物である苛性ソーダよりは多価の金属化合物である酸化亜鉛、酸化マグネシウム、酸化アルミニウムが好ましく、特にこのましいのは酸化亜鉛である。その他の金属種としてカルシウム、バリウム、スズ、ニッケル、コバルト、ストロンチウムなども挙げられる。金属酸化物は一種類を単独で用いてもよいし、二種類以上を併用してもよい。金属化合物の添加量としては、(A)酸部位が保護されたカルボン酸化合物の脱保護反応が完結した際に生じるカルボン酸を10%以上中和するのに必要な量が好ましい。10%未満の場合は金属種由来の性能が発現しない可能性がある。 Examples of the metal compound (B) include caustic soda, zinc oxide, magnesium oxide, and aluminum oxide, but the present invention is not limited to these examples. Polyvalent metal compounds such as zinc oxide, magnesium oxide and aluminum oxide are preferable to caustic soda which is a monovalent metal compound, and zinc oxide is particularly preferable. Other metal species include calcium, barium, tin, nickel, cobalt, strontium, and the like. One type of metal oxide may be used alone, or two or more types may be used in combination. The amount of the metal compound to be added is preferably an amount necessary to neutralize the carboxylic acid generated at the completion of the deprotection reaction of the carboxylic acid compound (A) in which the acid site is protected by 10% or more. If it is less than 10%, the performance derived from the metal species may not be exhibited.
金属化合物は粒径が1μm以下の微粒子であることが好ましく、また、超音波ホモジナイザー等で塗工液中に均一に分散させ、サスペンジョンとして使用することが好ましい。 The metal compound is preferably fine particles having a particle diameter of 1 μm or less, and is preferably dispersed uniformly in a coating liquid using an ultrasonic homogenizer or the like and used as a suspension.
前記(C)脱保護触媒としては、酸部位が保護されたカルボン酸化合物の脱保護反応を触媒しうる化合物であれば特に限定されないが、好ましくは、pKa9以下の酸および/またはその塩、もしくは該酸および/またはその塩を発生しうる化合物である。または化学構造の一部にスルホン酸部位、パーフルオロアルキル部位、パーフルオロリン部位、アンチモン部位を含む構造を有する脱保護触媒である。なお、pKa9以下の酸および/またはその塩、もしくは該酸および/またはその塩を発生しうる化合物であり、且つ化学構造の一部にスルホン酸部位、パーフルオロアルキル部位、パーフルオロリン部位、アンチモン部位を含む構造を有する脱保護触媒であることが特に好ましい。
pKa9以下の酸および/またはその塩、もしくは該酸および/またはその塩を発生しうる化合物について詳述する。
pKa9以下の酸および/またはその塩としては、例えばp−トルエンスルホン酸、p−トルエンスルホン酸ピリジニウム、トリフルオロメタンスルホン酸、トリフルオロメタンスルホン酸亜鉛などが挙げられるが、本発明はかかる例示にのみ限定されるものではない。また、pKa9以下の酸および/またはその塩を発生しうる化合物としては、例えば、熱カチオン重合開始剤であるサンエイドSI−80L、SI−100L(三新化学社製)などが挙げられるが、本発明はかかる例示にのみ限定されるものではない。これらの脱保護触媒はそれぞれ単独で用いてもよく、二種類以上を併用してもよい。これらの脱保護触媒の中で、トリフルオロメタンスルホン酸、トリフルオロメタンスルホン酸亜鉛、サンエイドSI−80Lが好ましい。
脱保護触媒の添加量としては、(A)保護基を有するポリ(メタ)アクリル酸エステルに対して0.1〜5.0質量%が好ましく、0.1〜3.0質量%が特に好ましい。0.1質量%未満の場合は脱保護反応の触媒としては不十分であり、反対に5質量%より多い場合は、得られる塗膜の性能が低下するおそれがある。
The deprotection catalyst (C) is not particularly limited as long as it is a compound capable of catalyzing the deprotection reaction of a carboxylic acid compound in which an acid site is protected, but is preferably an acid having a pKa of 9 or less and / or a salt thereof, or A compound capable of generating the acid and / or a salt thereof. Alternatively, it is a deprotection catalyst having a structure including a sulfonic acid moiety, a perfluoroalkyl moiety, a perfluorophosphine moiety, and an antimony moiety in a part of its chemical structure. An acid having a pKa of 9 or less and / or a salt thereof, or a compound capable of generating the acid and / or a salt thereof, and having a sulfonic acid moiety, a perfluoroalkyl moiety, a perfluorophosphorus moiety, an antimony moiety in a part of its chemical structure. Particularly preferred is a deprotection catalyst having a structure containing a site.
An acid having a pKa of 9 or less and / or a salt thereof, or a compound capable of generating the acid and / or a salt thereof will be described in detail.
Examples of the acid having a pKa of 9 or less and / or a salt thereof include, for example, p-toluenesulfonic acid, pyridinium p-toluenesulfonic acid, trifluoromethanesulfonic acid, zinc trifluoromethanesulfonic acid, and the like. It is not something to be done. Examples of the compound capable of generating an acid having a pKa of 9 or less and / or a salt thereof include, for example, San Aid SI-80L and SI-100L (manufactured by Sanshin Chemical Co., Ltd.) which are thermal cationic polymerization initiators. The invention is not limited only to such examples. These deprotection catalysts may be used alone or in combination of two or more. Among these deprotection catalysts, trifluoromethanesulfonic acid, zinc trifluoromethanesulfonate, and San Aid SI-80L are preferred.
The addition amount of the deprotection catalyst is preferably from 0.1 to 5.0% by mass, and particularly preferably from 0.1 to 3.0% by mass, based on the poly (meth) acrylate having a protective group (A). . When the amount is less than 0.1% by mass, the catalyst for the deprotection reaction is insufficient. On the contrary, when the amount is more than 5% by mass, the performance of the obtained coating film may be deteriorated.
上記(D)希釈溶媒としては、(A)酸部位が保護されたカルボン酸化合物および(C)脱保護触媒を溶解しうる溶剤であれば何でもよく、例えば酢酸エチル、トルエン、クロロホルム等が挙げられるが、本発明はかかる例示にのみ限定されるものではない。また、一種類の希釈溶媒を単独で使用してもよいし、二種以上を併用してもよい。希釈溶媒としては酢酸エチルが好ましい。
希釈溶媒の添加量は、使用する酸部位が保護されたカルボン酸化合物および脱保護触媒の希釈溶媒に対する溶解性にもよるが、組成物全量基準で、好ましくは20〜90質量%、より好ましくは50〜80質量%である。
As the diluting solvent (D), any solvent can be used as long as it can dissolve the (A) carboxylic acid compound in which the acid moiety is protected and (C) the deprotection catalyst, and examples thereof include ethyl acetate, toluene, and chloroform. However, the present invention is not limited only to such an example. Further, one kind of diluting solvent may be used alone, or two or more kinds may be used in combination. Ethyl acetate is preferred as the diluting solvent.
The amount of the diluting solvent to be added depends on the solubility of the carboxylic acid compound in which the acid moiety used is protected and the deprotecting catalyst in the diluting solvent, but is preferably 20 to 90% by mass, more preferably 20 to 90% by mass, based on the total amount of the composition. It is 50 to 80% by mass.
本発明において、該組成物の固形分濃度は、10〜80質量%、好ましくは20〜50質量%である。本発明において、「固形分濃度」とは、希釈溶媒、その他の揮発する溶媒以外の成分(合計量)の質量%を意味するものとする。 In the present invention, the solid content concentration of the composition is 10 to 80% by mass, preferably 20 to 50% by mass. In the present invention, “solid content concentration” means the mass% of components (total amount) other than a diluting solvent and other volatile solvents.
このようにして得られる組成物は、通常さらに他の成分と配合され、塗工液とされる。以下に詳述する。 The composition thus obtained is usually further mixed with other components to form a coating liquid. Details will be described below.
本発明で使用する塗工液には、本発明の効果を阻害しない範囲内において、必要に応じて、他の重合体(例えば、ポリビニルアルコール、ポリエチレングリコール、ポリプロピレングリコール、キトサンなど)、グリセリン、増粘剤、無機層状化合物、分散剤、界面活性剤、柔軟剤、熱安定剤、酸化防止剤、酸素吸収剤、着色剤、アンチブロッキング剤、単官能モノマー、多官能モノマー、反応性ポリマー、重合開始剤、その他のカルボン酸金属塩などを含有させることができる。 The coating liquid used in the present invention may contain other polymers (for example, polyvinyl alcohol, polyethylene glycol, polypropylene glycol, chitosan, etc.), glycerin, Viscous agent, inorganic layer compound, dispersant, surfactant, softener, heat stabilizer, antioxidant, oxygen absorber, coloring agent, antiblocking agent, monofunctional monomer, polyfunctional monomer, reactive polymer, polymerization initiation Agents and other metal salts of carboxylic acids.
単官能モノマーとしては、例えば、イソボルニルアクリレートや2−ヒドロキシエチルメタクリレートなどのアクリル酸エステルが挙げられるが、本発明はかかる例示にのみ限定されるものではない。
単官能モノマーの添加量は、ポリ(メタ)アクリル酸金属塩100質量部に対して、好ましくは30質量部以下、より好ましくは20質量部以下、特に好ましくは10質量部以下であり、添加量の下限値は、ポリ(メタ)アクリル酸金属塩100質量部に対して、好ましくは0.001質量部である。
Examples of the monofunctional monomer include acrylic acid esters such as isobornyl acrylate and 2-hydroxyethyl methacrylate, but the present invention is not limited to such examples.
The amount of the monofunctional monomer to be added is preferably 30 parts by mass or less, more preferably 20 parts by mass or less, particularly preferably 10 parts by mass or less with respect to 100 parts by mass of the metal poly (meth) acrylate. Is preferably 0.001 part by mass with respect to 100 parts by mass of the metal poly (meth) acrylate.
多官能モノマーとしては、例えば、特願2015−165399記載の化合物が挙げられるが、本発明はかかる例示にのみ限定されるものではない。 Examples of the polyfunctional monomer include compounds described in Japanese Patent Application No. 2015-165399, but the present invention is not limited only to such examples.
多官能モノマーの添加量は、ポリ(メタ)アクリル酸金属塩100質量部に対して、好ましくは30質量部以下、より好ましくは20質量部以下、特に好ましくは10質量部以下であり、添加量の下限値は、ポリ(メタ)アクリル酸金属塩100質量部に対して、好ましくは0.001質量部である。 The addition amount of the polyfunctional monomer is preferably 30 parts by mass or less, more preferably 20 parts by mass or less, particularly preferably 10 parts by mass or less, based on 100 parts by mass of the metal poly (meth) acrylate. Is preferably 0.001 part by mass with respect to 100 parts by mass of the metal poly (meth) acrylate.
反応性ポリマーとしては、ウレタンアクリレート、エポキシアクリレート、ポリエステルアクリレート、ブタジエンアクリレートなどが挙げられるが、本発明はかかる例示にのみ限定されるものではない。 Examples of the reactive polymer include urethane acrylate, epoxy acrylate, polyester acrylate, and butadiene acrylate, but the present invention is not limited to such examples.
反応性ポリマーの添加量は、ポリ(メタ)アクリル酸金属塩100質量部に対して、好ましくは30質量部以下、より好ましくは20質量部以下、特に好ましくは10質量部以下であり、添加量の下限値は、ポリ(メタ)アクリル酸金属塩100質量部に対して、好ましくは0.001質量部である。
重合開始剤としては、光重合開始剤と熱重合開始剤とが挙げられる。熱重合開始剤には、電離放射線の照射により活性化するアゾ化合物や過酸化物も含まれる。
光重合開始剤としては、例えば、特願2015−165399記載の化合物が挙げられるが、本発明はかかる例示にのみ限定されるものではない。
The amount of the reactive polymer to be added is preferably 30 parts by mass or less, more preferably 20 parts by mass or less, particularly preferably 10 parts by mass or less, based on 100 parts by mass of the metal poly (meth) acrylate. Is preferably 0.001 part by mass with respect to 100 parts by mass of the metal poly (meth) acrylate.
Examples of the polymerization initiator include a photopolymerization initiator and a thermal polymerization initiator. The thermal polymerization initiator also includes an azo compound and a peroxide activated by irradiation with ionizing radiation.
Examples of the photopolymerization initiator include the compounds described in Japanese Patent Application No. 2015-165399, but the present invention is not limited to these examples.
これらの光重合開始剤を硬化性組成物中に添加する場合には、硬化性組成物中に、通常0.001〜10質量%、好ましくは0.01〜5質量%の割合で添加する。光重合開始剤とともに、その他の増感剤、光安定剤などの汎用の添加剤を添加してもよい。
熱重合を行う場合には、熱解離して開始剤としての機能を発揮する熱重合開始剤を使用することが好ましい。熱重合開始剤としては、例えば、特願2015−165399記載の化合物が挙げられるが、本発明はかかる例示にのみ限定されるものではない。
熱重合開始剤を使用する場合には、硬化性組成物中に、通常0.001〜10質量%、好ましくは0.01〜5質量%の割合で添加する。
その他のカルボン酸金属塩としては、酢酸亜鉛、コハク酸亜鉛、(メタ)アクリル酸亜鉛などが挙げられるが、本発明はかかる例示にのみ限定されるものではない。
When these photopolymerization initiators are added to the curable composition, they are usually added to the curable composition at a ratio of 0.001 to 10% by mass, preferably 0.01 to 5% by mass. General-purpose additives such as other sensitizers and light stabilizers may be added together with the photopolymerization initiator.
In the case of performing thermal polymerization, it is preferable to use a thermal polymerization initiator which dissociates thermally and exhibits a function as an initiator. Examples of the thermal polymerization initiator include the compounds described in Japanese Patent Application No. 2015-165399, but the present invention is not limited to such examples.
When a thermal polymerization initiator is used, it is added to the curable composition at a ratio of usually 0.001 to 10% by mass, preferably 0.01 to 5% by mass.
Other metal carboxylate salts include zinc acetate, zinc succinate, zinc (meth) acrylate, and the like, but the present invention is not limited to these examples.
本発明の塗膜は、上記塗工液をシート状の基材上に塗布し、加熱した後、好ましくは湿熱下にさらすことで得られる。 The coating film of the present invention can be obtained by applying the above-mentioned coating liquid on a sheet-like substrate, heating the coating liquid, and preferably exposing it to moist heat.
基材としては、特に限定されないが、紙及びプラスチックフィルム(シートを含む)が好ましく用いられる。基材は、一般に、フィルムまたはシートの形態で使用されるが、所望によりプラスチック容器などの立体形状を有する成形体であってもよい。この他の基材として、ガラス板、金属板、アルミニウム箔などを挙げることができる。本発明の硬化性組成物を塗布するのに使用する基材は、塗膜の支持体として機能する。
基材のプラスチックフィルムを構成するプラスチックの種類としては、例えば、特願2015−165399記載のプラスチックが挙げられるが、本発明はかかる例示にのみ限定されるものではない。
基材としては、これらプラスチック類からなる未延伸フィルムまたは延伸フィルムが好ましい。プラスチックフィルムには、必要に応じて、エッチング、コロナ放電、プラズマ処理、電子線照射などの前処理を施したり、接着剤を予め塗布したりすることができる。プラスチックフィルムの表面に、ケイ素酸化物、酸化アルミニウム、アルミニウム、窒化ケイ素などの無機物;金属化合物などの薄膜が、蒸着法、スパッタリング法、イオンプレーティング法により形成されたものを基材として用いることができる。基材として使用するプラスチックフィルムの表面には、印刷が施されていてもよい。プラスチックフィルムは、複数のプラスチックフィルムからなる多層フィルムや紙などの他の材質のものとの積層フィルムであってもよい。
The substrate is not particularly limited, but paper and plastic films (including sheets) are preferably used. The substrate is generally used in the form of a film or sheet, but may be a molded article having a three-dimensional shape such as a plastic container, if desired. Other substrates include a glass plate, a metal plate, and aluminum foil. The substrate used to apply the curable composition of the present invention functions as a coating support.
Examples of the type of plastic constituting the base plastic film include plastics described in Japanese Patent Application No. 2015-165399, but the present invention is not limited to such examples.
As the substrate, an unstretched film or stretched film made of these plastics is preferable. The plastic film may be subjected to a pretreatment such as etching, corona discharge, plasma treatment, or electron beam irradiation, or may be pre-coated with an adhesive, if necessary. Inorganic substances such as silicon oxide, aluminum oxide, aluminum and silicon nitride; thin films such as metal compounds formed on the surface of a plastic film by vapor deposition, sputtering, or ion plating can be used as a base material. it can. The surface of the plastic film used as the base material may be printed. The plastic film may be a multilayer film composed of a plurality of plastic films or a laminated film with another material such as paper.
本発明の塗工液を基材上に塗布するには、該基材の片面または両面に、スプレー法、ディッピング法、コーターを用いた塗布法、印刷機による印刷法など任意の塗工法を利用することができる。コーターや印刷機を用いて塗布する場合には、例えば、特願2015−165399記載のプラスチックが挙げられるが、本発明はかかる例示にのみ限定されるものではない。
本発明では、基材上に該塗工液を塗布した後、形成された被膜を加熱することでポリ(メタ)アクリル酸の金属塩が生成される。そのメカニズムは定かではないが、形成された被膜を加熱することで希釈溶媒を揮発させると同時に、ポリ(メタ)アクリル酸エステルの脱保護反応が進行し、生じたポリ(メタ)アクリル酸と金属化合物との中和反応が進行することによってポリ(メタ)アクリル酸の金属塩が生成するものと推察される。また、加熱後に被膜を湿熱下にさらすことで、被膜中での金属種の拡散が活発になり、中和反応が加速するものと推察される。
加熱条件は、保護基の種類や脱保護触媒の触媒能にもよるが、温度は100℃〜200℃、時間は数秒〜120分で加熱することが好ましい。100℃未満では脱保護反応に多くの時間を要してしまい、反対に200℃以上では基材であるプラスチックフィルムを傷めてしまうおそれがある。量産性の観点からは、加熱時間は数秒〜10分であることが好ましい。その他、本発明の効果を阻害しない範囲で、UV光や電子線などの電離放射線を照射してもよい。電離放射線としては、例えば、特願2015−165399記載の種類、および、照射方法が挙げられるが、本発明はかかる例示にのみ限定されるものではない。
In order to apply the coating liquid of the present invention onto a substrate, an arbitrary coating method such as a spraying method, a dipping method, an application method using a coater, a printing method using a printing machine is used on one or both surfaces of the substrate. can do. When applying using a coater or a printing machine, for example, plastics described in Japanese Patent Application No. 2015-165399 may be mentioned, but the present invention is not limited to such examples.
In the present invention, a metal salt of poly (meth) acrylic acid is generated by applying the coating liquid on a substrate and then heating the formed film. The mechanism is not clear, but heating the formed film volatilizes the diluting solvent, and at the same time, the deprotection reaction of poly (meth) acrylate progresses, and the resulting poly (meth) acrylic acid and metal It is presumed that a metal salt of poly (meth) acrylic acid is generated as the neutralization reaction with the compound proceeds. Further, it is presumed that, by exposing the coating film to heat and humidity after heating, diffusion of metal species in the coating film becomes active and the neutralization reaction is accelerated.
The heating conditions depend on the type of the protecting group and the catalytic ability of the deprotection catalyst, but it is preferable that the heating be performed at a temperature of 100 ° C to 200 ° C and for a time of several seconds to 120 minutes. If the temperature is lower than 100 ° C., much time is required for the deprotection reaction, while if it is higher than 200 ° C., the plastic film as a base material may be damaged. From the viewpoint of mass productivity, the heating time is preferably several seconds to 10 minutes. In addition, ionizing radiation such as UV light or an electron beam may be applied as long as the effects of the present invention are not impaired. Examples of the ionizing radiation include the types described in Japanese Patent Application No. 2015-165399 and the irradiation method, but the present invention is not limited to such examples.
また、養生のために室温〜100℃で数分〜2週間の後加熱を行ってもよい。
硬化膜の厚みは、通常0.001μm〜1mm、好ましくは0.01〜100μm、より好ましくは0.1〜10μmの範囲となるように調整することが好ましい。
Further, post-heating may be performed at room temperature to 100 ° C. for several minutes to two weeks for curing.
The thickness of the cured film is preferably adjusted so as to be usually in the range of 0.001 μm to 1 mm, preferably 0.01 to 100 μm, and more preferably 0.1 to 10 μm.
以下に実施例を挙げて本発明を具体的に説明するが、本発明はこれらに限定されるものではない。
1.ポリt−ブチルメタクリレートの作製(調製例1)
冷却管、温度センサー、窒素吹き込み管、および、撹拌羽を取り付けた500mLのセパラブルフラスコに、t−ブチルメタクリレート(三菱レーヨン製、商品名「TBMA」)10g、酢酸エチル85gを加え、窒素を100mL/minで導入しながら撹拌した。湯浴で加熱し、内温が55℃になった時点で、あらかじめ重合開始剤2,2‘−アゾビス(4−メトキシ−2,4−ジメチルバレロニトリル)0.1gを酢酸エチル5gに溶解させておいた溶液を投入し、重合反応を開始した。内温が60℃となるように湯浴を調整しながら、120分間反応を行った。得られたポリt−ブチルメタクリレートの分子量はMn6700、Mw13800であった。
2.塗工液の調製
サンプル瓶にポリt−ブチルメタクリレートの酢酸エチル溶液(不揮発分10%)2g、酸化亜鉛微粒子(CI化成、粒径38nm)0.057gを添加した。超音波ホモジナイザーを用いて酸化亜鉛微粒子を分散させ、サスペンジョンとした。さらに熱カチオン重合開始剤SI−80L(三新化学)0.012gを加え、溶解させることで塗工液を得た。
3.塗膜の作製
シリコン基板上に塗工液を塗布した後、ホットプレート上で160℃2分間加熱した。さらに85℃85%の環境下に3時間さらし、塗膜を得た。
4.脱保護反応進行の確認
脱保護反応はシリコン板を用いたFT−IRの透過法で確認を行った。すなわち、脱保護反応が進行するにつれて、カルボン酸エステルに起因する1730cm−1付近のピーク、および、t−ブチル基に起因する840cm−1付近のピークが減少し、代わりにカルボン酸に起因する1690cm−1付近のピークおよび3000〜3500cm−1付近のブロードなピークが増大することを利用して確認した。
5.中和反応進行の確認
中和反応はシリコン板を用いたFT−IRの透過法で確認を行った。すなわち、中和反応が進行するにつれて、カルボン酸に起因する1690cm−1付近のピークが減少し、代わりにカルボン酸金属塩に起因する1560cm−1付近のピークが増大することを利用して確認した。
まず、酸化亜鉛微粒子の含まれていない塗工液を用いて、脱保護触媒の選定を行った。
結果を表1に示す。pKaが9以上であるフェノールは脱保護触媒として働かないことがわかる(製造例1)。また、トリフルオロメタンスルホン酸は超強酸であるため、溶液状態において室温で脱保護反応が進行し、白濁したものと推察される(製造例2)。
Hereinafter, the present invention will be described specifically with reference to Examples, but the present invention is not limited thereto.
1. Preparation of poly-t-butyl methacrylate (Preparation Example 1)
To a 500 mL separable flask equipped with a cooling tube, a temperature sensor, a nitrogen blowing tube, and a stirring blade, 10 g of t-butyl methacrylate (trade name “TBMA” manufactured by Mitsubishi Rayon) and 85 g of ethyl acetate were added, and 100 mL of nitrogen was added. / Min while stirring. The mixture was heated in a water bath, and when the internal temperature reached 55 ° C., 0.1 g of 2,2′-azobis (4-methoxy-2,4-dimethylvaleronitrile), a polymerization initiator, was dissolved in 5 g of ethyl acetate in advance. The prepared solution was added, and the polymerization reaction was started. The reaction was carried out for 120 minutes while adjusting the hot water bath so that the internal temperature became 60 ° C. The molecular weight of the obtained poly-t-butyl methacrylate was Mn6700 and Mw13800.
2. Preparation of Coating Solution To a sample bottle, 2 g of an ethyl acetate solution of poly-t-butyl methacrylate (nonvolatile content: 10%) and 0.057 g of zinc oxide fine particles (CI chemical, particle size: 38 nm) were added. The zinc oxide fine particles were dispersed using an ultrasonic homogenizer to form a suspension. Further, 0.012 g of thermal cationic polymerization initiator SI-80L (Sanshin Chemical) was added and dissolved to obtain a coating liquid.
3. Preparation of Coating Film The coating liquid was applied on a silicon substrate, and then heated on a hot plate at 160 ° C. for 2 minutes. It was further exposed to an environment of 85 ° C. and 85% for 3 hours to obtain a coating film.
4. Confirmation of Deprotection Reaction Progress The deprotection reaction was confirmed by a FT-IR transmission method using a silicon plate. That is, as the deprotection reaction progresses, the peak around 1730 cm -1 due to the carboxylic acid ester and the peak around 840 cm -1 due to the t-butyl group decrease, and 1690 cm -1 due to the carboxylic acid instead. broad peak peaks and 3000~3500cm around -1 around -1 was identified using increasing.
5. Confirmation of Neutralization Reaction Progress The neutralization reaction was confirmed by an FT-IR transmission method using a silicon plate. That is, as the neutralization reaction proceeds, decreases the peak around 1690 cm -1 due to carboxylic acid, peak near 1560 cm -1 attributable to a carboxylic acid metal salt was identified using increasing instead .
First, a deprotection catalyst was selected using a coating solution containing no zinc oxide fine particles.
Table 1 shows the results. It is found that phenol having a pKa of 9 or more does not work as a deprotection catalyst (Production Example 1). In addition, since trifluoromethanesulfonic acid is a super strong acid, it is presumed that the deprotection reaction proceeds at room temperature in a solution state and the solution becomes cloudy (Production Example 2).
△:脱保護反応が0〜50%進行
×:脱保護反応が進行しない
次に、酸化亜鉛微粒子を含有する塗工液にて脱保護反応および中和反応の確認を行った。結果を表2に示す。被膜を加熱することによって脱保護反応および中和反応を進行させることができた。また、加熱後に湿熱下にさらすことで、中和反応が促進した(製造例10〜製造例16)。脱保護触媒としてサンエイドSI−80Lを用いて作製した塗膜の中和度は98%であった(製造例15)。
〇:脱保護反応が50%以上進行
△:脱保護反応が0〜50%進行
×:脱保護反応が進行しない
<中和反応>
〇:中和反応が20%以上進行
△:中和反応が0〜20%進行
×:中和反応が進行しない
表1及び表2の結果から本発明の効果を確認できた。
〇: Deprotection reaction progresses 50% or more △: Deprotection reaction progresses 0 to 50% ×: Deprotection reaction does not progress <Neutralization reaction>
〇: Neutralization reaction progresses 20% or more 以上: Neutralization reaction progresses 0 to 20% x: Neutralization reaction does not progress
The effects of the present invention were confirmed from the results in Tables 1 and 2.
すなわち、本発明の製造方法により、1液でポリメタクリル酸亜鉛膜を作製することができた。 That is, by the production method of the present invention, a polyzinc methacrylate film could be produced with one liquid.
本発明の製造方法は、カルボン酸金属塩の塗膜、特にポリ(メタ)アクリル酸金属塩膜の製造方法として好適である。また、本発明の製造方法によって得られた塗膜は、例えば、塗料、ガスバリア材料、ハードコート材料などに使用することが期待されるものである。 The production method of the present invention is suitable as a method for producing a coating film of a metal carboxylate, particularly a film of a metal poly (meth) acrylate. Further, the coating film obtained by the production method of the present invention is expected to be used for, for example, a paint, a gas barrier material, a hard coat material and the like.
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