JP6287672B2 - Substrate cleaning apparatus, cleaning method, and substrate manufacturing method using the cleaning method. - Google Patents

Description

  The present invention relates to a substrate cleaning apparatus, a cleaning method, and a substrate manufacturing method using the cleaning method, and more particularly, to a substrate cleaning apparatus, a cleaning method, and a substrate cleaning method using the cleaning method. It relates to a manufacturing method.

  Conventionally, as a method for cleaning the surface of a substrate, a method in which high-pressure water is sprayed onto a substrate, a sponge, buff, brush, polishing pad, or the like impregnated with a cleaning liquid or an abrasive is rotated and slid while pressed against the curved surface of the substrate. Methods are known (Patent Documents 1 and 2).

JP 2011-18668 A JP 2005-271713 A

  However, the method of injecting high-pressure water has insufficient cleaning ability, and a large cleaning effect cannot be obtained for adhesive foreign substances. Further, in the method by mechanical sliding using a rotating body, wear powder and machine oil of the rotating mechanism part scatters and adheres to the substrate that is the object to be cleaned, which adversely affects cleaning. There was a case. Further, when the substrate has a curved shape, in order to clean along the curved surface, it is necessary to provide a more complicated mechanism that presses the rotating body against the curved surface with a constant pressure, which further adversely affects cleaning. There was a problem that the factor increased.

  Therefore, the present application provides a substrate cleaning apparatus, a cleaning method, and a substrate manufacturing method using the cleaning method, which have a high cleaning power and a simple mechanism.

In order to achieve the above object, the present invention provides:
A relative motion section for relatively moving the substrate and the cleaning device;
An elastic film having a first surface in contact with the substrate and a second surface facing the first surface, and having an elastic function;
Fluid ejection means for ejecting fluid toward the second surface of the elastic film;
An apparatus for cleaning a substrate is provided.

  According to the present invention, there are provided a substrate cleaning apparatus, a cleaning method, and a substrate manufacturing method using the cleaning method having a high cleaning power and a simple mechanism.

Schematic which shows the whole 1st Embodiment of the washing | cleaning apparatus which concerns on this invention. Sectional drawing which looked at the washing | cleaning process of 1st Embodiment from the orthogonal direction. Sectional drawing of the state before the glass conveyance which looked at the washing | cleaning process of 1st Embodiment from the conveyance direction downstream. Sectional drawing of the state during the glass conveyance which looked at the washing | cleaning process of 1st Embodiment from the conveyance direction downstream. Sectional drawing seen from the orthogonal direction which shows 2nd Embodiment of the cleaning apparatus which concerns on this invention Sectional drawing seen from the orthogonal direction which shows 3rd Embodiment of the cleaning apparatus which concerns on this invention Sectional drawing seen from the orthogonal direction which shows 4th Embodiment of the cleaning apparatus which concerns on this invention

  Hereinafter, specific embodiments of a manufacturing apparatus and a manufacturing method for a curved glass sheet according to the present invention will be described with reference to the drawings. Note that in the drawings for explaining the embodiments, unless there is a particular description of the direction, the direction on the drawing is referred to, and the reference direction in each drawing corresponds to the direction of a symbol or number.

  Hereinafter, the “transport direction” refers to the direction in which the glass plate is transported (the direction of the arrow X in FIG. 1), and the “direction orthogonal to the transport direction (hereinafter referred to as the orthogonal direction)” refers to any glass transporting glass. It refers to the direction (arrow Y direction in FIG. 1) perpendicular to the transport direction on the transport surface.

  In the following embodiments, a case where a glass plate is used as the substrate will be described as an example. However, it can be used for cleaning substrates other than glass.

  Further, “curved in one direction” means that the substrate has a single curved shape that is curved around a certain axis. Further, “curved in two directions” means a compounded shape in which the shape of the substrate is curved around two orthogonal axes.

(First embodiment)
<Cleaning device of the first embodiment>
FIG. 1 is a schematic view showing the entirety of a first embodiment of a cleaning apparatus according to the present invention. The cleaning apparatus 101 according to the first embodiment includes a transport unit and a cleaning unit. The cleaning means includes support means 102, fluid ejection means 103, and elastic film 104.

<Conveying means>
The conveying means conveys the glass plate G from the upstream side to the downstream side in the conveying direction while supporting the glass plate G. In FIG. 1, the glass plate G is transported in the direction of the arrow 106 along the transport surface 105 indicated by a broken line.

  In FIG. 1, a glass conveying unit using a roller conveyor is shown as an example of the conveying unit, but any configuration of a conventionally known conveying unit may be used. In particular, when the surfaces on both sides of the glass plate G are cleaned in the same process (in the case of the third embodiment to be described later), the conveying means minimizes the contact with the surface of the glass plate G and prevents cleaning. It is preferable that the configuration does not. For example, a roller bear having a gap for cleaning from the back side of the glass as shown in FIG. 1 or a configuration in which only two opposite side portions of the glass plate G are supported by two conveyor belts and there are no supporting members in the plane. Is preferable.

  Moreover, it is not limited to this embodiment, The structure which conveys the glass plate G to a Y direction and also the Z direction may be sufficient.

  Furthermore, the glass plate G may be stopped as long as the cleaning means and the glass plate G are relatively moved. In this case, the supporting means 102, the elastic film 104, and the fluid ejecting means 103 may be provided with a driving means that slides or swings with respect to the glass plate, for example, and includes both the conveying means and the driving means. Also good. In this specification, the term “relative motion means” is used as a superordinate concept of the transport means and the drive means.

  Hereinafter, in this specification, the case where only a conveyance means is provided will be described. Further, in this specification, the “motion surface” refers to a momentary superposition of the movement of the glass plate G relative to the cleaning device 101 by relative movement means, and has a thickness corresponding to the thickness of the glass plate G. . The “conveying surface” refers to a conveying path of the glass plate in which the movement of the glass plate G by the conveying means is momentarily superimposed, and has a thickness corresponding to the thickness of the glass plate G.

<Supporting means and elastic film>
The support means 102 is provided at a position facing the transport surface 105 across a space, and supports a part of the elastic film 104 by fixing it.

  The specific configuration of the support means 102 may be any configuration as long as it can support the elastic film 104, for example, a configuration that sandwiches the elastic film 104. In the case of the rod-like support means 102 as shown in FIG. 1, the support means 102 may be rotatable with respect to the axial direction.

  The elastic film 104 includes a first surface 108 and a second surface 109 that face each other. In FIG. 1, the elastic film 104 is provided so as to be in contact with the transport surface 105 and has a configuration that hangs down in a warm manner due to gravity. The elastic film 104 has a length connecting at least the position where the support means 102 is provided and the position of the intersection of the axis of the opening 107 of the fluid ejection means 103 and the transport surface 105 described later.

  The material of the elastic film 104 may be any material that can be easily deformed, and examples thereof include a material having a low elastic modulus and difficult to plastically deform, for example, a polymer material such as polyethylene terephthalate (PET).

  As the range of the elastic modulus, for example, a material of 100 MPa to 5000 MPa, more preferably 500 MPa to 4500 MPa, and still more preferably 1000 MPa to 4000 MPa is preferable.

  The elastic film 104 has a thickness of 100 μm or less, desirably 50 μm or less, more preferably 10 μm or less, because it can be easily deformed, which is preferable.

  The elastic film 104 is disposed such that the first surface 108 faces the upstream side in the transport direction and the second surface 109 faces the downstream side in the transport direction. It is desirable that the first surface 108 has an uneven shape having a polishing property. For example, a fine concavo-convex shape may be formed by forming a mixture in which abrasive grains and a binder are mixed on the first surface 108. Thus, the cleaning capability is improved by making the first surface 108 have a concavo-convex shape having an abrasive property.

  Moreover, the elastic film 104 has the notch part 110, and the side which contacts the glass plate G among elastic films may be strip shape. The number of the cut-out parts 110 to be provided can be appropriately set depending on the shape of the glass plate G to be cleaned. By providing the cut portions 110, the followability of the elastic film 104 to the curved shape of the glass plate G is increased, and the more the number of cut portions 110 to be provided, the more complicated the curve is curved in one direction or two directions. It can correspond to the shape.

  Further, a plurality of elastic films 104 may be arranged in the transport direction or the orthogonal direction. By disposing a plurality in the transport direction, higher cleaning ability can be obtained. Moreover, the followability to the curved shape of the glass plate G of the elastic film 104 increases by providing two or more by the orthogonal direction similarly to providing the notch part 110. FIG.

  Moreover, in FIG. 1, although the thickness direction of the part supported by the support means 102 of the elastic film 104 has faced the same direction as a conveyance direction, it is not limited to this embodiment. That is, depending on the shape of the glass plate G, the thickness direction of the portion supported by the support means 102 of the elastic film 104 may have any inclination with respect to the transport direction.

<Fluid ejection means>
The fluid ejection means 103 is provided on the same side as the position where the support means 102 is provided with respect to the transport surface 105 and at a position facing the transport surface 105 with a space therebetween. In the present embodiment, the fluid ejecting means 103 includes a tube and a nozzle, and has an opening 107 that ejects fluid toward the transport surface 105.

  The intersection between the axis of the aperture 107 and the conveyance surface 105 is provided on the downstream side in the conveyance direction with respect to the intersection between the elastic film 104 and the conveyance surface 105, but is not limited to this embodiment. The intersection between the axis of the aperture 107 and the conveying surface 105 may be at the same position as the contact point between the elastic film 104 and the conveying surface 105.

  In the present embodiment, a plurality of apertures 107 are provided in the orthogonal direction. When viewed from the downstream side in the transport direction, the cut portion 110 is positioned between the plurality of aperture portions 107, 107. By doing so, the fluid can be accurately applied to the second surface 109 of the elastic film 104, and the first surface 108 of the elastic film 104 can be pressed against the glass plate G being conveyed. However, the present invention is not limited to this embodiment. In particular, when a plurality of cut portions 110 are provided, when viewed from the downstream side in the transport direction, the shaft of the opening portion 107 and the cut portions 110 are provided at the same position. May be.

  The fluid ejected by the fluid ejecting means 103 may be a cleaning liquid or air. The cleaning liquid may be water or a mixture of water and a detergent.

  Further, the pressure of the fluid ejected from the opening 107 is appropriately adjusted so that the first surface 108 of the elastic film 104 can be suitably pressed along the curved surface of the glass plate G. Specifically, if the pressure of the fluid ejected from the opening 107 is 0.05 MPa to 3 MPa, more preferably 0.1 MPa to 2 MPa, and even more preferably 0.5 MPa to 1 MPa, the first surface 109 is preferable because adhesive foreign matter can be removed without scratching the glass plate G.

  The above is the overall configuration of the cleaning apparatus.

<Cleaning method of the first embodiment>
FIG. 2 is a cross-sectional view showing a cleaning process using the cleaning apparatus of this embodiment. 3 and 4 are views showing the cleaning device of the present embodiment as viewed from the downstream side in the transport direction. FIG. 3 shows a cross section taken along the line AA in FIG. 2, and FIG. B section is shown. The same reference numerals are used for the configurations already described in the description of the cleaning apparatus in FIG. 1, and descriptions thereof are omitted.

  First, the glass plate G is transported on the transport surface 105 by a transport means, and passes through a transport process in which the glass plate G is transported into the cleaning apparatus 101. As described above, the glass plate G and the cleaning unit may be moved relatively, and a driving process for moving the cleaning unit may be used. In this specification, the term “relative motion process” is used as a superordinate concept of the transport process and the drive process. At this time, in FIG. 2, the adherent foreign material 204 is attached to the glass plate G.

  The support means 102 and the fluid ejecting means 103 are arranged in this order in the transport direction, and there is an intersection 202 between the shaft 201 of the opening 107 of the fluid ejecting means 103 and the transport surface 105. Further, in a state before the glass plate G is conveyed, the elastic film 104 hangs down directly below the support means 102 by gravity as shown in FIG.

  Next, the glass plate G is transported so that the tip of the glass plate G is located downstream in the transport direction from the position where the fixing means 102 is provided. During the conveyance at this time, the elastic film 104 is lifted by the glass plate G and elastically deforms so as to follow the shape of the glass plate G, and a part of the first surface 108 of the elastic film 104 faces the glass plate G. Move to the position you want. On the other hand, the second surface 109 of the elastic film 104 moves to a position facing the opening 107. By being further conveyed in this state, the first surface 108 and the surface of the glass plate G slide on each other by the relative motion process.

  Here, the fluid ejection means 103 further performs a fluid ejection process for ejecting the fluid 203 onto the second surface 109 of the elastic film, and the first surface 108 of the elastic film 104 is caused to be the surface of the glass plate G by the pressure of the fluid 203. It passes through the pressing process pressed against. As described above, the pressing process is performed during the relative movement process, and the glass plate G and the elastic film 104 slide, whereby the first surface 108 is pressed against the surface of the glass plate G, and the elastic film 104 is It becomes possible to deform appropriately along the surface shape of the glass plate G, and to scrape off the adherent foreign matter 204 on the surface of the glass plate G and clean it appropriately.

  Since the cleaning device and the cleaning method described above do not use a complicated mechanical structure, it is possible to remove factors that adversely affect cleaning due to wear powder, machine oil, and the like from the mechanism of the cleaning device. Further, if an abrasive concavo-convex shape is formed on the first surface 108 of the elastic film 104, a high cleaning power can be obtained with a simple mechanism.

  Furthermore, even in the case of a complicated shape in which a part of the glass plate G is bent sharply, or in the case of the glass plate G curved in one direction or two directions, it can be dealt with by flexible deformation of the elastic film, and the entire glass surface It can wash | clean with a uniform pressure over it.

  In addition, if the line already has a high-pressure water cleaning process, a high cleaning effect can be achieved simply by installing the fixing means and elastic film upstream in the transport direction without installing a new cleaning device in the line. It is possible to change to the present configuration in which is obtained.

  Here, it is desirable that the fluid 203 ejected from the opening 107 is configured to spread radially as shown in FIGS. If the fluid 203 is configured to spread radially, pressure can be applied over a wide range of the elastic film 104 with one aperture 10. Moreover, it is preferable that it is the structure which applies a pressure to the whole curved surface of the glass plate G by such a some aperture part 107. FIG. The radiation ranges of the plurality of apertures 107 may interfere with each other. On the other hand, if the nozzle which suppressed spreading radially is used, the elastic film 104 can be accurately pressed to a desired position with a high pressure.

  Moreover, if the length which the elastic film 104 and the glass plate G are contacting in cross section is 20 mm or more, More preferably, it is 30 mm or more, More preferably, it is 40 mm or more, and sufficient cleaning effect will be acquired.

  Moreover, the fluid ejection process may be performed constantly or at an appropriate timing. That is, the fluid ejecting means 103 may eject the fluid 203 only when the elastic film 104 is on the shaft 201 of the aperture 107 and between the glass plate G and the fluid ejecting means 103. It is desirable to provide a position detection device and a controller so that the fluid ejection means 103 ejects the fluid 203 according to the position of the glass plate G. Further, the fluid ejecting means 103 may continuously eject the fluid 203 toward the transport surface 105 regardless of the positions of the glass plate G and the elastic film 104.

(Second Embodiment)
<Cleaning apparatus and cleaning method of the second embodiment>
FIG. 5 is a sectional view showing a second embodiment of the cleaning apparatus according to the present invention. The same reference numerals are used for the configurations already described in the description of the first embodiment, and descriptions thereof are omitted.

  The second embodiment includes a curved elastic film 504, and further includes fluid ejection means 503 provided at a different position from that of the first embodiment.

  Although the elastic film 504 has a curved shape, the length of the elastic film 504 is at the intersection of at least the position where the support means 102 is provided, the axis of the opening 107 of the fluid ejection means 503 and the conveying surface 105. It has a length connecting with the position.

  If such a curved elastic film 504 exists on the shaft 511 of the aperture 107 and between the glass plate G and the fluid ejection means 503, the elastic film 504 is accompanied by the conveyance of the glass plate G. The structure does not have to be brought into contact with the glass plate and lifted.

  In the case of FIG. 5, the curved elastic film 504 is not in contact with the glass plate G when the fluid ejection means 103 is stopped. When the glass plate G is conveyed by the conveying means in this state, the first surface 108 faces the glass plate G on the shaft 511 of the opening 107 and between the glass plate G and the fluid ejection means 503. And the second surface 109 is in a state of facing the opening 107.

  The fluid ejecting means 103 ejects the fluid 203 and applies pressure to the second surface 109 of the elastic film 504, whereby the elastic film 504 is elastically deformed and pressed against the surface of the glass plate G. Even in such a configuration, the first surface 108 is pressed against the surface of the glass plate G, and the adhering foreign matter 204 on the surface of the glass plate G can be scraped off and cleaned appropriately.

  Further, as shown in FIG. 5, the fluid ejection means 503 may be provided at the same position as the support means 102, and the shaft 511 of the opening 107 may be applied to the elastic film 504 obliquely. That is, the shaft 511 of the opening 107 can be set at a desired angle, and the fluid ejection means 503 does not have to be disposed downstream of the support means 102 in the transport direction, and is at the same position as the support means 102 or upstream of the transport direction. It may be provided on the side.

  As described above, the angle of the axis of the aperture 107 is adjusted so that the fluid 203 can be applied from an appropriate angle in accordance with the shape of the glass plate G to be cleaned, and the glass plate G has been conveyed through the elastic film. At this time, if it is arranged so as to be present on the axis of the opening 107, the elastic film is pressed against the glass plate G by the fluid 203, so that the adhering foreign matter can be scraped off and cleaned appropriately. .

  In addition, such a structure is used suitably when wash | cleaning the 4th surface G4 of the glass plate mentioned later. When this configuration is used on the fourth surface G4 side in FIG. 6 described later, it is not necessary to lift the elastic film 104 as compared with the configuration in FIG.

(Third embodiment)
FIG. 6 is a cross-sectional view showing a third embodiment of the cleaning apparatus according to the present invention. According to the third embodiment, both side surfaces of the glass plate G can be cleaned simultaneously. In the following third embodiment, the surface of the glass plate G that contacts the elastic film 104 (hereinafter referred to as the first elastic film 104) is the third surface G3 and the elastic film 604 (hereinafter referred to as the second elastic film 604). The surface in contact with this is called the fourth surface G4.

  In addition, the same reference numerals are used for the configurations already described in the description of the first embodiment, and the description thereof is omitted. In addition, about the name which is the structure demonstrated in 1st Embodiment, and overlaps with the structure newly provided in 3rd Embodiment, suppose that it is attached to "first" before the name of a structure hereafter. Similarly, in the configuration provided in the third embodiment, a name that is the same as that in the first embodiment is denoted as “second”.

<Cleaning device of the third embodiment>
In 3rd Embodiment, in addition to the structure of the 1st elastic film 104 etc. which wash | clean the 3rd surface G3 of the glass plate G shown in 1st Embodiment, the structure for wash | cleaning the 4th surface G4 of the glass plate G It has.

  The second support means 602 is provided at a position facing the transport surface 105 with a space therebetween and on the opposite side of the first support means 102 via the transport surface 105, and the second elastic film 604. A part is fixed and supported.

  The specific configuration of the second support unit 602 may be any configuration as long as it can support the elastic film 604, and FIG. 6 illustrates the rotatable support unit 602 as an example.

  The second elastic film 604 includes a fifth surface 608 and a sixth surface 609 that face each other. In a state before the fluid is ejected by the second fluid ejecting means 603 to be described later, the second elastic film 604 is configured to hang downward due to gravity in FIG.

  The second elastic film 604 includes at least a position where the second support means 602 is provided, and a position of an intersection 612 between the shaft 611 of the second opening 607 of the second fluid ejection means 603 and the conveying surface 105. It has the length which ties.

  The configuration, arrangement, and the like of the second elastic film 604 are the same as those obtained by replacing the first surface 108 of the first elastic film 104 with the fifth surface 608 and the second surface 109 with the sixth surface 609. Description is omitted. Similarly, the description of the second fluid ejection means 603 is also omitted.

<Cleaning method of the third embodiment>
Since the cleaning on the third surface G3 side of the glass plate G is the same as in the first embodiment, the description is omitted, and only the cleaning on the fourth surface G4 side of the glass plate G will be described.

  According to the third embodiment, first, the glass plate G is transported on the transport surface by the transport means, and is subjected to a transport process in which the glass plate G is transported into the cleaning machine 101. In FIG. 6, the adherent foreign substance 204 is attached to the fourth surface G4 of the glass plate G.

  In the transport direction, the support means 602 and the fluid ejection means 603 are arranged in this order, and there is an intersection 612 between the shaft 611 of the opening 607 of the second fluid ejection means 603 and the transport surface 105. Moreover, in the state before the glass plate G is conveyed, the second elastic film hangs down due to gravity.

  Next, the front end of the glass plate G is transported so as to be located on the downstream side in the transport direction from the position where the fixing means 602 is provided and further the position where the second fluid ejection means 603 is provided. Here, the second elastic film 604 is lifted by the fluid ejection step in which the fluid 613 is ejected from the second fluid ejection means 603 toward the sixth surface 609, and further pressed against the glass plate G by the pressure of the fluid 613. It goes through a pressing process. By this pressing step, the elastic film 604 is elastically deformed so as to follow the shape of the fourth surface G4 of the glass plate G, and the elastic film 604 and the glass plate G slide by the conveying step.

  At this time, by adjusting the pressure of the fluid 613 to be pressed, the second elastic film 604 is pressed while appropriately deforming along the surface shape of the fourth surface G4 of the glass plate G, and the fourth surface G4 adhesive foreign matter 204 can be scraped off and cleaned appropriately.

  If it is the above washing | cleaning apparatuses and washing | cleaning methods, in addition to the effect of 1st Embodiment, since the 3rd surface G3 and 4th surface G4 of the glass plate G can be wash | cleaned simultaneously during conveyance, it is efficient. is there.

(Fourth embodiment)
<Cleaning device of 4th Embodiment>
FIG. 7 is a cross-sectional view showing a fourth embodiment of the cleaning apparatus according to the present application. In the fourth embodiment, the cleaning device 701 includes a transport unit and a cleaning unit, and the cleaning unit includes a support unit 702, an elastic film 704, and contents 703.

  Since the conveying means is the same as that of the first embodiment, the description thereof is omitted.

  The support means 702 is provided at a position facing the transport surface 105 with a space therebetween, and fixes and supports a part of the elastic film 704.

  The specific configuration of the support means 702 may be any configuration as long as it can support the elastic film 704, for example, a configuration that sandwiches the elastic film 704. Further, the support means 702 may be rotatable with respect to the axial direction.

  The elastic film 704 includes a first surface 708 and a second surface 709 that face each other, and is supported by the support means 702 in a bag shape having the first surface 708 as an outer surface and the second surface 709 as an inner surface (hereinafter referred to as a bag shape). A bag-like elastic film 704). The “bag shape” may be any structure that can hold a certain amount of the content 703 in the space formed by the second surface 709. For example, a mortar shape or a semi-cylindrical shape obtained by vertically dividing a cylindrical tube Etc. In this embodiment, the elastic film 704 is supported by two support means 702 so as to form a semi-cylindrical shape.

  Further, the bag-like elastic film 704 is disposed so as to have the conveyance surface 105 and the contact point 705 before the glass plate G is conveyed. In FIG. 7, the contact point 705 is drawn in the same manner as the intersection, but it is sufficient that the contact point 705 is at least in contact with the glass plate G to which the bag-like elastic film 704 is conveyed. In FIG. 7, the bag-like elastic film 704 is configured to hang depending on the weight of the contents 703.

  Moreover, since the raw material of the bag-like elastic film 704, the thickness, the surface property of the first surface 708, and the like are the same as those in the first embodiment, description thereof is omitted.

  The contents 703 are disposed in a space formed by the second surface 708 of the bag-like elastic film 704. The contents 703 play a role of pressing the bag-like elastic film 704 against the surface of the glass plate by its weight. Therefore, the contents 703 may be any liquid or sand that can be flexibly deformed as an aggregate and has some weight.

The weight of the contents 703 may be set so that, for example, the pressure applied to the glass plate G by gravity is 70 gf / cm ² , more preferably 100 gf / cm ² or more.

<Cleaning Method of Fourth Embodiment>
First, the glass plate G is transported on the transport surface 105 by a transport means, and passes through a transport process in which the glass plate G is transported into the cleaning apparatus 101. In FIG. 7, the adherent foreign material 204 is attached to the glass plate G.

  A bag-like elastic film 704 exists on the carrying surface in the carrying direction, and as the glass plate G is carried, the glass plate G and the bag-like elastic film 704 come into contact with each other. It is lifted by the plate G and elastically deforms so as to follow the shape of the glass plate G. By being further conveyed in this state, the first surface 708 and the surface of the glass plate G undergo a sliding process in which they are slid relative to each other.

  Here, the first surface 708 of the bag-like elastic film 704 is pressed against the surface of the glass plate G by the gravity related to the contents 703. By doing in this way, the bag-like elastic film 704 is deformed along the surface shape of the glass plate G, and the first surface 708 is pressed against the surface of the glass plate G. The adhesive foreign matter 204 can be scraped off and cleaned appropriately.

  If it is the above washing | cleaning apparatuses and washing | cleaning methods, even if it does not provide a fluid ejection means, the effect of 1st Embodiment can be acquired and an installation becomes a further simple structure. Further, it is not necessary to circulate fluid or the like, and the cleaning effect can be obtained almost permanently.

  A description will be given of a result of comparing the cleaning ability of the substrate with the adhering foreign matter with the cleaning device according to the present invention and the cleaning device using only high-pressure water.

  The water pressure at the opening of the fluid ejection means, the distance from the opening to the conveying surface, and the diameter of the opening were adjusted so that a water pressure of about 0.6 MPa was applied on the conveying surface. The transport conveyor transports the glass plate G at a speed of 230 mm per second.

  Further, in the examples, as the elastic film, a 75 μm thick PET was used as the base material, and the first surface thereof was formed with an uneven shape by a mixture of abrasive grains and a binder.

  In addition, an automotive windshield is used as the substrate, and adhesive foreign substances include glass pen (dirt 1), poster color (dirt 2), whiteboard marker (dirt 3), solid marker (dirt 4), sign pen ( Five types of stains 5) were used as simulated stains. In addition, after cleaning, the presence or absence of scratches on the substrate surface was visually confirmed.

  The results of the experiment as described above are shown in Table 1.

  In Table 1, double circles indicate that dirt is removed by 80% or more, circles indicate that dirt is removed by 50% or more, triangle marks indicate that dirt is removed by 20% or more, and cross marks indicate that the dirt is not changed.

  Thus, it turned out that the washing | cleaning capability is improving rather than the washing | cleaning by high pressure water by using an elastic film.

  Moreover, it was confirmed that there was no flaw that could be visually confirmed and there was no problem with the appearance quality.

  The substrate cleaning apparatus, the cleaning method, and the substrate manufacturing method using the cleaning method of the present invention can be suitably used particularly for cleaning a substrate bent into a curved shape, for example, an automotive glass plate.

101, 501, 601, 701 Cleaning device 102, 602, 702 Support means 103, 503, 603 Fluid ejection means 104, 504, 604, 704 Elastic film 105 Conveying surface 106 Arrow 107, 607 Opening part 108, 708 First surface 109, 709 Second surface 110 Cut portion 201, 511, 611 Shaft 202, 612 Intersection 203, 613 Fluid 204 Adhesive foreign matter 608 Fifth surface 609 Sixth surface 703 Contents 705 Contact point G Glass plate G3 Third surface G4 4th surface

Claims (15)

A relative motion section for relatively moving the substrate and the cleaning device;
An elastic film having a first surface in contact with the substrate and a second surface facing the first surface, and having an elastic function;
Fluid ejection means for ejecting fluid toward the second surface of the elastic film;
An apparatus for cleaning a substrate, comprising:   The substrate cleaning apparatus according to claim 1, wherein the relative motion unit is a transport unit that transports the substrate. The elastic film is a first elastic film, the fluid ejecting means is a first fluid ejecting means, the surface of the substrate against which the first surface is pressed is a third surface, and the surface facing the third surface is a first surface. When it is 4 surfaces,
A second elastic film having a fifth surface contacting the fourth surface of the substrate and a sixth surface facing the fifth surface, and having an elastic function;
Second fluid ejecting means for ejecting fluid toward the sixth surface of the second elastic film;
The substrate cleaning apparatus according to claim 1, further comprising:   The substrate cleaning apparatus according to claim 1, wherein the fluid is water.   The substrate cleaning apparatus according to any one of claims 1 to 4, wherein a pressure of the fluid ejected from the fluid ejecting unit is 0.05 MPa or more and 3 MPa or less.   The said elastic film is a board | substrate washing | cleaning apparatus as described in any one of Claim 1 to 5 which has a notch | incision part.   The thickness of the said elastic film is 100 micrometers or less, The board | substrate washing | cleaning apparatus as described in any one of Claim 1 to 6. A relative motion section for relatively moving the substrate and the cleaning device;
An elastic film having an elastic function, having a first surface in contact with the substrate and a second surface facing the first surface, forming a bag shape with the first surface as an outer side and the second surface as an inner surface. When,
A deformable content provided in a space surrounded by the second surface of the elastic film;
An apparatus for cleaning a substrate, comprising:   The substrate cleaning apparatus according to claim 1, wherein the substrate is a substrate curved in two directions.   The substrate cleaning apparatus according to claim 1, wherein the substrate is a glass plate.   The said 1st surface of the said elastic film is uneven | corrugated shape, The cleaning apparatus of the board | substrate as described in any one of Claim 1 to 10. The elastic film includes abrasive grains and a binder,
The substrate cleaning apparatus according to claim 11, wherein the uneven shape of the first surface is formed by a mixture of the abrasive grains and the binder. A cleaning method for cleaning the surface of a substrate with a cleaning device,
A relative motion step of relatively moving the substrate and the cleaning device by relative motion means;
A fluid ejection step of ejecting fluid to the second surface of the elastic film provided in the cleaning device and having a first surface and a second surface facing each other;
A pressing step of pressing the first surface against the surface of the substrate by the fluid ejection step;
With
The method of cleaning a substrate, wherein the pressing step is performed during the relative motion step. A cleaning method for cleaning the surface of a substrate with a cleaning device,
A relative motion step of relatively moving the substrate and the cleaning device by relative motion means;
A bag-like elastic film provided in the cleaning apparatus, having a first surface as an outer surface, a second surface as an inner surface, and having a deformable content in a space surrounded by the second surface, and the substrate, And a sliding step that is slid by the relative motion means.   The manufacturing method of the board | substrate manufactured using the said cleaning method of Claim 13 or 14.

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